JP4381129B2 - Color filter and manufacturing method thereof - Google Patents

Description

  The present invention relates to a color filter suitable for a color liquid crystal display, which is obtained by coloring a pixel portion by an inkjet method, and a method for manufacturing the color filter.

  In recent years, with the development of personal computers, especially portable personal computers, the demand for liquid crystal displays, particularly color liquid crystal displays, has been increasing. However, since this color liquid crystal display is expensive, there is an increasing demand for cost reduction, and in particular, there is a high demand for cost reduction for a color filter having a high specific gravity.

  In such a color filter, it is usually provided with coloring patterns of three primary colors of red (R), green (G), and blue (B), and electrodes corresponding to the respective pixels of R, G, and B are turned on, By turning it off, the liquid crystal operates as a shutter, and light passes through each of the R, G, and B pixels, and color display is performed.

  As a conventional method for producing a color filter, for example, a staining method can be mentioned. In this dyeing method, first, a water-soluble polymer material, which is a dyeing material, is formed on a glass substrate, patterned into a desired shape by a photolithography process, and then the obtained pattern is immersed in a dyeing bath. To get a colored pattern. By repeating this three times, R, G, and B color filter layers are formed.

  Another method is a pigment dispersion method. In this method, a photosensitive resin layer in which a pigment is dispersed is first formed on a substrate, and this is patterned to obtain a monochromatic pattern. Further, this process is repeated three times to form R, G, and B color filter layers.

  Still other methods include an electrodeposition method, a method in which a pigment is dispersed in a thermosetting resin, R, G, and B are printed three times, and then the resin is thermoset. However, in any method, it is necessary to repeat the same process three times in order to color the three colors of R, G, and B, and there is a problem that the cost is high, and the yield decreases because the process is repeated. There's a problem.

  As a method of manufacturing a color filter that solves these problems, a method of forming a colored layer (pixel portion) by spraying colored ink by an inkjet method has been proposed (Patent Document 1). Here, when ink having good wettability with respect to the glass substrate is used, a method of printing a convex portion that is a boundary in advance with a substance with poor wettability with respect to the ink, or poor wettability with respect to the glass. In the case of using ink, a method is disclosed in which a pattern is formed in advance with a material having good wettability with ink, and the ink is fixed. However, there is no description on how to specifically paint a material having good wettability and a material having poor wettability.

  On the other hand, as another method for producing a color filter by spraying colored ink by an ink jet method and manufacturing a color filter, Patent Document 2 discloses a method of treating a recess with an ink-philic treatment agent. . In this method, a convex portion is formed on a substrate in advance, and the convex portion is made ink repellent, and then the entire substrate is surface-treated with an ink-philic treatment agent. However, this method has a problem in that it is necessary to perform the ink repellent process and the parent ink process twice because the convex portion needs to be made ink repellent in advance when performing the parent ink process.

  Similarly, as a method for producing a color filter by forming a colored layer by an ink jet method, in Patent Document 3 and Patent Document 4, an ink absorption layer is provided on a substrate, and the ink absorptivity of the absorption layer is exposed. A method of forming a colored layer (pixel portion) by changing between a non-exposed portion and a non-exposed portion is described. However, in this method, an absorbing layer is formed and the ink is absorbed into the absorbing layer to form a colored layer. Therefore, there is a difference in coloring between the central portion and the peripheral portion of the ink dot, and color unevenness occurs. There is a problem that it occurs. In addition, this absorbing layer also has a problem that a predetermined thickness is necessary for its function of absorbing ink.

JP 59-75205 A JP-A-9-203803 Japanese Patent Laid-Open No. 8-230314 JP-A-8-227010

  The present invention has been made in view of the above-mentioned problems, and as regards the wettability of the substrate, which is a problem when forming the pixel portion by the ink jet method, the wettability portion and the bad portion are formed with a single layer. It is possible to easily and easily form patterns with good and bad wettability in a few steps, and no ink absorption layer is required, and the quality is good and the manufacturing cost is low. The main object of the present invention is to provide a color filter and a method for manufacturing the same.

  In order to achieve the above object, according to the present invention, a transparent substrate, a pixel portion in which a plurality of colors are provided in a predetermined pattern by an ink jet method on the transparent substrate, and a boundary portion of the pixel portion are provided. A color filter comprising: a light shielding portion; and a wettability variable layer capable of changing wettability provided to form the pixel portion or the pixel portion and the light shielding portion. To do.

  As described above, the present invention is characterized in that it has a wettability variable layer for forming the pixel portion or for forming the pixel portion and the light shielding portion. Therefore, it is possible to accurately form the pixel portion, or the pixel portion and the light-shielding portion by utilizing the change in wettability of the wettability variable layer, and a high-quality color filter free from problems such as color loss and color unevenness. Can be provided.

  In this case, as described in claim 2, at least the pixel portion may be provided on the wettability variable layer. By forming the pixel portion on the wettability variable layer in this way, the wettability variable layer in the portion where the pixel portion is previously formed on the wettability variable layer is made an ink-philic region having a small contact angle with the liquid. be able to. By coloring the pixel portion forming portion, which is an ink-philic region, by an ink jet method, ink adheres only to the pixel portion forming portion, which is an ink-philic region having a small contact angle with the liquid. Ink is uniformly applied in the pixel portion forming portion. Accordingly, it is possible to provide a color filter free from defects such as color unevenness and color loss.

  Thus, if at least the pixel portion is provided on the wettability variable layer, as described in claim 3, the light shielding portion is formed on the transparent substrate, and at least on the light shielding portion and the transparent The wettability variable layer is provided on the pixel portion forming portion on which the pixel portion is formed on the substrate, and even if the pixel portion is formed on the wettability variable layer (the pixel portion is wet) The color filter formed on the property variable layer and provided with the wettability variable layer on the light shielding portion (hereinafter referred to as a first embodiment)), on the transparent substrate as described in claim 7. The wettability variable layer is formed, and even if the pixel portion and the light shielding portion are provided at predetermined positions on the wettability variable layer (the pixel portion and the light shielding portion are formed on the wettability variable layer). Color filter, hereinafter referred to as second embodiment)), Further, as described in claim 8, the wettability variable layer is provided on the pixel portion forming portion where the light shielding portion is provided on the transparent substrate and the pixel portion on the transparent substrate is formed. A pixel part may be formed on the wettability variable layer (a color filter in which the pixel part is formed on the wettability variable layer and the wettability variable layer is not formed on the light shielding part, Hereinafter, the third embodiment will be described.)

  In the first embodiment, as described in claim 4, it is preferable that the width of the pixel portion formed on the wettability variable layer is wider than the width of the opening formed by the light shielding portion. In this way, by forming the width of the pixel portion so as to be wider than the width of the opening of the light shielding portion, there is a problem such as color loss such as backlight light passing through a portion where the pixel portion is not formed. This is because it can be prevented.

  In the present invention, it is preferable that an ink-repellent convex portion is formed on the surface of the wettability variable layer provided on the light shielding portion. As described above, when the ink repellent convex portion is formed on the surface of the wettability variable layer provided on the light shielding portion, the pixel portion is formed using the wettability variable layer of the pixel portion forming portion as the ink-philic region. In addition, since the ink-repellent convex portions are formed between the pixel portion forming portions, it is preferable that there are no problems such as ink mixing during coloring.

  In this case, it is preferable that the width of the ink-repellent convex portion is narrower than the width of the light shielding portion. Thus, by forming the width of the ink-repellent convex portion narrower than the width of the light-shielding portion, the width of the pixel portion formed between the ink-repellent convex portions is larger than the width of the opening formed by the light-shielding portion. It is because it can form widely and the effect as mentioned above can be acquired.

  On the other hand, in the color filter of the present invention, as described in claim 9, the wettability variable layer may be provided in the boundary portion of the pixel portion. Thus, by setting the wettability on the wettability variable layer at the boundary portion of the pixel portion as an ink repellent region having a contact angle with the liquid larger than the portion on the transparent substrate on which the pixel portion is formed, When the portion where the portion is provided (pixel portion forming portion) is colored by the ink jet method, it is difficult for the ink to move beyond the boundary portion of the pixel portion having ink repellency. No color filter can be provided. After that, by setting the wettability variable layer at the boundary portion of the pixel portion to an ink-philic region having a small contact angle with the liquid, a light shielding layer is provided on the boundary portion of the pixel portion, or the protective layer is entirely covered. This can be done easily, and a high quality color filter can be obtained.

  In this case, as described in claim 10, the light shielding portion is formed on the transparent substrate, a wettability variable layer is formed on the light shielding portion, and a pixel portion is formed between the wettability variable layers. Even if (a color filter in which a wettability variable layer is provided on the light shielding portion, hereinafter referred to as a fourth embodiment), the light shielding portion on the transparent substrate is formed as described in claim 12. The wettability variable layer may be formed on the light shielding part forming portion which is a part, the light shielding part may be formed on the wettability variable layer, and the pixel part may be formed between the light shielding parts (wetability variable layer A color filter having a light shielding portion formed thereon, hereinafter referred to as a fifth embodiment).

  In the fourth embodiment, as described in claim 11, it is preferable that the wettability variable layer has a width narrower than the width of the light shielding portion. Thus, the width of the wettability variable layer is narrower than the width of the light shielding portion, so that the width of the pixel portion formed between the wettability variable layers can be formed larger than the width of the opening of the light shielding portion. This is because problems such as color loss can be prevented.

  In the case of the color filter in which the wettability variable layer is provided in the boundary portion of the pixel portion as described above and the third embodiment described above, as described in claim 13, on the transparent substrate The wettability is preferably less than 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m. This is because, in the third embodiment, the light shielding part ink or the like spreads uniformly in the light shielding part forming part, so that a uniform light shielding part can be formed with high accuracy, and the boundary part of the pixel part is wettable. In the case of a color filter in which a variable layer is provided, since the pixel portion uniformly spreads within the pixel portion forming portion on the transparent substrate, it is possible to provide a good color filter with no color unevenness and the like. It is.

  In the present invention, as described in claim 14, the wettability variable layer is a photocatalyst-containing layer composed of at least a photocatalyst and a binder, and is wetted so that a contact angle with a liquid is reduced by irradiation of energy. It is preferable that the layer has a property change. In this way, if a photocatalyst-containing layer whose wettability changes so that the contact angle with the liquid is lowered by energy irradiation is formed, the wettability of this layer can be easily changed by performing energy pattern irradiation, etc. Thus, an ink-philic region having a small contact angle with the liquid can be formed. For example, only the portion where the pixel portion is formed can be easily formed as the ink-philic region. Therefore, a color filter can be manufactured efficiently, which is advantageous in terms of cost.

  In the color filter described in claim 14, as described in claim 15, the photocatalyst-containing layer contains fluorine, and when the photocatalyst-containing layer is irradiated with energy, the action of the photocatalyst is achieved. Thus, the photocatalyst-containing layer is preferably formed so that the fluorine content on the surface of the photocatalyst-containing layer is lower than that before energy irradiation.

  Thus, the color filter of the present invention is configured so that the fluorine content of the energy irradiation portion on the photocatalyst-containing layer formed on the transparent substrate is reduced. A pattern composed of a portion having a reduced content can be formed. When the fluorine content is reduced, the portion becomes a region having higher ink affinity compared to other portions, so that only the portion where the pixel portion or the like is formed can be easily made an ink-philic region. A color filter can be manufactured.

  Furthermore, in the color filter according to claim 15, as described in claim 16, energy irradiation is performed on the photocatalyst-containing layer, and the fluorine content in the portion where the fluorine content is reduced is energy irradiation. When the fluorine content of the part that has not been made is 100, it is preferably 10 or less.

  Thus, when the fluorine content in the portion having a low fluorine content formed by energy irradiation on the photocatalyst-containing layer is 100, the fluorine content of the portion not irradiated with energy is 10 or less on a weight basis. If so, it is possible to make a great difference in the ink affinity between the energy irradiated portion and the non-irradiated portion. Therefore, by forming the pixel portion or the like in the photocatalyst containing layer in which such a pattern is formed, it becomes possible to accurately form the pixel portion or the like only in the ink-philic region where the fluorine content is reduced, and with high accuracy. A color filter can be manufactured.

The photocatalyst-containing layer used in the present invention is composed of at least a photocatalyst and a binder as described above. Among these, the photocatalyst is composed of titanium oxide (TiO ₂ ), zinc oxide (ZnO) as described in claim 17. ), Tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), bismuth oxide (Bi ₂ O ₃ ), and iron oxide (Fe ₂ O ₃ ) It is preferable that the substance is a species or more. Of these, titanium oxide (TiO ₂ ) is preferable as described in claim 18. This is because titanium oxide is effective as a photocatalyst because of its high band gap energy, is chemically stable, has no toxicity, and is readily available.

  In the case of a color filter in which the photocatalyst described in claim 18 is titanium oxide, the fluorine content on the surface of the photocatalyst-containing layer is analyzed by X-ray photoelectron spectroscopy as described in claim 19. When quantified, when the titanium element is 100, it is preferable to have a photocatalyst-containing layer in which the fluorine element is contained on the surface of the photocatalyst-containing layer at a ratio of fluorine element of 500 or more.

  If this amount of fluorine (F) element is included, the ink repellency of the non-energy-irradiated part is sufficient, and the pattern of the part where the fluorine (F) element content is reduced by irradiation with energy is formed. This is because when the pixel portion or the like is formed here, the ink or the like does not protrude from a portion other than the portion where the pixel portion is formed, and the color filter can be manufactured more accurately.

  On the other hand, in the color filter according to any one of claims 14 to 19, the binder which is another component constituting the photocatalyst-containing layer has a fluoroalkyl group as described in claim 20. It is preferable that it is the organopolysiloxane which has.

  In the color filter of the present invention, various methods can be exemplified as a method for containing a fluorine element in the photocatalyst-containing layer. By using an organopolysiloxane having a fluoroalkyl group as a binder, the photocatalyst-containing layer can be easily prepared. This is because elemental fluorine can be contained therein and the content can be easily reduced by energy irradiation.

Similarly, in the color filter according to any one of claims 14 to 19, the binder which is another component constituting the photocatalyst-containing layer is Y as described in claim 21. _n SiX _(4-n) (wherein Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, X represents an alkoxyl group or a halogen. n represents 0 to 3) It is preferably an organopolysiloxane that is one or two or more hydrolysis condensates or cohydrolysis condensates of a silicon compound represented by

  In the color filter described in claim 21, as described in claim 22, among the silicon compounds constituting the organopolysiloxane, the silicon compound containing a fluoroalkyl group is 0.01 mol% or more. It is preferably included.

  Thus, if the silicon compound containing a fluoroalkyl group is contained in an amount of 0.01 mol% or more, the surface of the photocatalyst containing layer will contain sufficient fluorine element, and energy will be irradiated to contain the fluorine element. Since the difference in wettability between the ink-affinity region on the photocatalyst-containing layer whose amount is reduced and the ink-repellent region on the surface of the photocatalyst-containing layer that has not been irradiated with energy can be increased, a pixel portion is formed in the ink-philic region. This is because ink or the like can be accurately deposited without protruding into the ink repellent region, and a color filter with good quality can be manufactured.

  In the present invention, the contact angle with the liquid having a surface tension of 40 mN / m on the photocatalyst-containing layer is 10 degrees or more in a portion where energy is not irradiated and is less than 10 degrees in a portion where energy is irradiated. It is preferable (claims 23 and 40). Since the portion not irradiated with energy is a portion that requires ink repellency, if the contact angle with a liquid having a surface tension of 40 mN / m is less than 10 degrees, the ink repellency is not sufficient, This is not preferable because there is a possibility that the ink, the coating material for the light shielding part, and the like remain. Further, when the contact angle with the liquid having a surface tension of 40 mN / m in the portion irradiated with energy is 10 degrees or more, there is a possibility that the spread of the ink or the coating material for the light shielding portion in this portion is inferior. This is because color loss or the like may occur.

  Furthermore, in the present invention, it is preferable that the pixel portion colored by the ink jet method is a pixel portion colored by an ink jet method using a UV curable ink (claims 24 and 41). By using UV curable ink, the ink can be colored by ink jet method to form a pixel part, and then irradiated with UV to quickly cure the ink and immediately send it to the next process. This is because it is preferable.

  A liquid crystal panel having a color filter as described above and a substrate opposite to the color filter and encapsulating a liquid crystal compound between the two substrates has the advantage of the color filter as described above, that is, the color loss of the pixel portion. There is no color unevenness and there is an advantage that it is advantageous in terms of cost (claim 42).

  In the present invention, in order to achieve the above object, as described in claim 25, (1) a step of forming a light shielding portion on the transparent substrate; and (2) a light shielding portion on the transparent substrate is formed. A step of providing a photocatalyst containing layer in which the wettability of the energy irradiation portion changes in the direction in which the contact angle of the liquid decreases, and (3) a portion for forming a pixel portion on the photocatalyst containing layer. Irradiating energy to the pixel portion forming portion to form a pixel portion exposure portion; and (4) coloring the pixel portion exposure portion by an inkjet method to form a pixel portion. A color filter manufacturing method (hereinafter, referred to as a sixth embodiment) is provided.

  As described above, in this embodiment, the pixel portion can be easily formed by providing the photocatalyst containing layer on the transparent substrate on which the light shielding portion is formed in advance, and irradiating the pixel portion forming portion on the photocatalyst containing layer with a pattern. Only the portion where the is formed can be made ink-philic. Therefore, by applying ink to the pixel portion exposure portion where the pixel portion is formed by an inkjet method, a pixel portion to which the ink is uniformly attached can be obtained, and there is no color loss and no color unevenness. Can be formed.

  In the case of the sixth embodiment, as described in claim 26, after the step of providing the photocatalyst-containing layer, the photocatalyst-containing layer on the light-shielding portion is irradiated with a pattern to form an ink-repellent convex exposure portion. You may make it have the process of forming and forming an ink-repellent convex part here.

  As described above, the photocatalyst-containing layer on the light-shielding portion is also irradiated with energy to provide the ink-repellent convex portion exposure, so that the ink-repellent convex portion exposure portion is formed with a predetermined width. Can do. Therefore, an ink-repellent convex portion having a predetermined width can be obtained at a uniform height by applying an ink-repellent convex coating material to this region.

  Furthermore, in a sixth embodiment of the present invention, as described in claim 27, in the step of forming the pixel portion exposure portion, the pixel portion exposure portion is exposed from the transparent substrate side using the light shielding portion as a mask. An exposed portion may be formed. By exposing the entire surface from the transparent substrate side, that is, the side where the light shielding portion is not formed, only the portion of the photocatalyst containing layer formed on the upper surface of the light shielding portion is not exposed, and other portions can be exposed. Therefore, energy pattern irradiation can be performed without using a photomask or the like, which is advantageous in terms of cost.

  Furthermore, the present invention provides, as described in claim 28, (1) a step of providing a photocatalyst-containing layer on the transparent substrate in which the wettability of the energy irradiated portion changes in a direction in which the contact angle with the liquid decreases; 2) a step of irradiating the light-shielding part forming part, which is a part where the light-shielding part on the transparent substrate is formed, with a pattern to form an exposure part for the light-shielding part; and (3) light shielding the light-shielding part exposure part. A step of providing a portion; (4) a step of forming an exposure portion for the pixel portion by irradiating energy to the transparent substrate provided with the light shielding portion; and (5) an ink jet method for the exposure portion for the pixel portion. A method of manufacturing a color filter (hereinafter, referred to as a seventh embodiment) including a step of coloring and forming a pixel portion.

  As described above, in the method for producing a color filter of the present embodiment, the photocatalyst containing layer is provided on the transparent substrate, and the photocatalyst containing layer is irradiated with energy to reduce the contact angle with the liquid in the exposed portion. Can do. Therefore, when forming the light-shielding part, simply irradiate the photocatalyst-containing layer with an energy pattern so that only the area where the light-shielding part is to be formed is an ink-philic region, and then the light-shielding part paint is applied to this part. A light shielding part can be formed. Therefore, it is not necessary to perform a development process or an etching process after pattern exposure, which is performed when the conventional light shielding part is provided, so that the light shielding part can be formed efficiently. Thereafter, for example, by irradiating the entire surface with energy, an area where the pixel portion is easily formed can be made an ink-philic area. Therefore, if this portion is colored by an inkjet method, a pixel portion to which ink is uniformly attached can be obtained, and a color filter free from color loss and color unevenness can be formed.

  Furthermore, the present invention provides, as described in claim 29, (1) a step of providing a photocatalyst-containing layer on the transparent substrate in which the wettability of the energy irradiated portion changes in the direction in which the liquid contact angle decreases; ) Forming a pixel part exposure part by pattern irradiating energy to a pixel part formation part which is a part where the pixel part on the transparent substrate is formed; and (3) an ink jet system for the pixel part exposure part. And forming a pixel portion, (4) irradiating energy to the photocatalyst containing layer at least at the boundary portion of the pixel portion, and (5) shielding the boundary portion of the pixel portion irradiated with the energy. And a step of forming a part. A method for producing a color filter (hereinafter, referred to as an eighth embodiment) is provided.

  In this case, a photocatalyst-containing layer is formed on the pixel portion forming portion that is a portion where at least the pixel portion is formed on the transparent substrate and the light shielding portion forming portion that is a portion where the light shielding portion is formed. First, the pixel portion forming portion of the photocatalyst-containing layer can be made an ink-philic region by pattern irradiating energy to the pixel portion forming portion. Therefore, by attaching the ink here by the ink jet method, the ink spreads uniformly and no color unevenness occurs. Further, the light shielding portion forming portion which is a boundary portion with the pixel portion remains an ink repellent region because no energy is irradiated. Therefore, it can be said that it is difficult for the ink attached to the pixel portion forming portion that is the ink-philic region to move beyond the light shielding portion forming portion that is the ink repellent region. Therefore, problems such as ink mixing do not occur. After forming the pixel portion in this way, this portion can be made an ink-philic region by irradiating energy to the light shielding portion forming portion between the pixel portions. Therefore, the light shielding part can be easily formed by applying the light shielding part ink to this part, for example.

  Furthermore, the present invention provides, as described in claim 30, (1) a photocatalyst-containing layer on the transparent substrate, wherein the wettability of the energy irradiation portion changes in a direction in which the contact angle with the liquid decreases. (2) a step of providing a light-shielding portion at a boundary portion of the pixel portion forming portion provided with the photocatalyst-containing layer; and (3) the photocatalyst. A color comprising: a step of irradiating the content layer with energy to form a pixel portion exposure portion; and (4) a step of coloring the pixel portion exposure portion by an inkjet method to form a pixel portion. A method for manufacturing a filter (hereinafter, referred to as a ninth embodiment) is provided.

  In this case, a photocatalyst containing layer is first formed in the pixel part forming part which is a part where the pixel part on the transparent substrate is formed. When a material having a higher contact angle with the liquid than the substrate surface is used for the photocatalyst-containing layer before the irradiation of energy, the pixel-portion forming portion on which the photocatalyst-containing layer is formed is more The light shielding part forming part on the substrate is an ink-philic area having a smaller contact angle with the liquid. By forming the light-shielding portion in the ink-philic region using, for example, a light-shielding portion coating material, the light-shielding portion can be easily formed first. Next, for example, by irradiating energy on the entire surface on which the light shielding portion is formed, the pixel portion forming portion can be made an ink-philic region. Therefore, by coloring this region by the ink jet method, a pixel portion to which the ink is uniformly attached can be obtained, and a color filter having no color loss and no color unevenness can be formed.

  In the present invention, as described in claim 31, (1) a step of forming a light shielding portion on the transparent substrate, and (2) the wettability of the energy irradiation portion on the upper surface of the light shielding portion is in contact with the liquid. A step of providing a photocatalyst-containing layer that changes in a direction in which the angle decreases; and (3) an ink jet method for forming a pixel portion on a transparent substrate on which the photocatalyst-containing layer is not provided. A method for producing a color filter, which includes coloring and forming a pixel portion (hereinafter, referred to as a tenth embodiment).

  In this case, a light-shielding part is first formed on the transparent substrate, and a photocatalyst-containing layer is formed on the light-shielding part. When a material with a high contact angle is used, the pixel portion forming portion between the photocatalyst containing layers becomes an ink-philic region having a smaller contact angle with the liquid, and contains a photocatalyst that is a boundary portion of the pixel portion forming portion. The layer becomes an ink repellent region. Therefore, when ink is attached to the pixel portion forming portion that is an ink-philic region by the ink jet method, it is difficult for the attached ink to move beyond the light shielding portion forming portion that is the ink repellent region. Therefore, problems such as ink color mixing are unlikely to occur.

  Furthermore, in the present invention, as described in claim 32, (1) a photocatalyst-containing layer in which the wettability of the energy irradiation portion is changed on the transparent substrate in a direction in which the contact angle of the liquid decreases is provided on the transparent substrate. A step of providing in a light-shielding part forming part which is a part where the light-shielding part is formed; and (2) a step of coloring the part where the photocatalyst-containing layer on the transparent substrate is not formed by an inkjet method to form a pixel part; (3) A method for producing a color filter, comprising: at least irradiating energy to the photocatalyst-containing layer; and (4) forming a light-shielding layer on the photocatalyst-containing layer irradiated with the energy ( Hereinafter, the eleventh embodiment is provided.

  In this case, the photocatalyst-containing layer is provided in the light shielding part forming part where the light shielding part on the substrate is formed. When this photocatalyst-containing layer is made of a material having a higher contact angle with the liquid than the surface of the transparent substrate before energy irradiation, the pixel portion is formed between the light-shielding portion forming portion on which the photocatalyst-containing layer is formed. The portion is an ink-philic region having a smaller contact angle with the liquid, and the light-shielding portion forming portion that is a boundary portion with the pixel portion forming portion is an ink-repellent region. Therefore, when ink is attached to the pixel portion forming portion that is an ink-philic region by the ink jet method, the attached ink does not move beyond the light shielding portion forming portion that is the ink repellent region. Therefore, problems such as ink color mixing do not occur. After forming the pixel portion in this manner, this portion can be made an ink-philic region by irradiating energy to the photocatalyst containing layer in the light shielding portion forming portion between the pixel portions. Therefore, the light shielding part can be easily formed by applying the light shielding part ink to this part, for example.

  Furthermore, in the sixth embodiment and the eighth embodiment of the present invention, as described in claim 33, after forming the pixel portion exposure portion, the pixel portion is colored by an inkjet method. Forming a first pixel portion exposure portion by pattern irradiating a part of the portion forming the pixel portion on the photocatalyst-containing layer with energy; and (b) forming the first portion. A step of forming the first pixel portion by coloring the exposure portion for the pixel portion by an ink jet method, and (c) exposing the portion forming the remaining pixel portion on the photocatalyst-containing layer to expose the second pixel portion. And (d) coloring the second pixel portion exposure portion by an inkjet method to form the second pixel portion.

  That is, in any of the embodiments, the pixel portion exposure portion is formed, and the pixel portion is formed by coloring this portion by an ink jet method. When the pixel portion is formed, the pixel portion is changed to the first pixel portion. In addition, it is divided into the second pixel portion to perform energy irradiation and coloring by an inkjet method, respectively.

  When pixel portions are formed by coloring the pixel portion exposure portions that are made to be ink-philic regions by energy irradiation by an ink jet method, when the interval between the pixel portion exposure portions is narrow, the pixel portions are formed during the pixel portion formation. There is a possibility that the ink in the pixel portion adjacent to the ink repellent area is mixed. Therefore, when forming the pixel portion, it is desirable to form the pixel portions as far apart as possible. As described above, after forming the first pixel portion and then forming the second pixel portion, for example, when forming the first pixel portion, every other pixel portion is formed. Pattern exposure can be performed, and adjacent pixel portions can be separated from each other when the first image portion is formed. In this way, the first pixel portion exposure portion is formed in a state having a relatively wide ink repellency region between the colored regions, and the ink in the adjacent pixel portion is made to be colored by the ink jet method. There is no possibility of inconvenience of mixing. By irradiating energy again between the first pixel portions thus provided, a second pixel portion exposure portion is formed, and coloring is performed by an ink jet method so that there is no problem such as ink mixing. A filter can be formed.

  In the sixth embodiment and the tenth embodiment of the present invention, as described in claim 34, the width of the pixel portion is formed wider than the width of the opening formed by the light shielding portion. Is preferred. In this way, by making the width of the pixel portion wider than the opening formed by the light shielding portion, the possibility of backlight light passing through a portion other than the pixel portion can be reduced, and color loss and the like can be prevented. Because you can.

  Further, in the ninth embodiment, the tenth embodiment, and the eleventh embodiment of the present invention, as described in claim 35, the wettability on the transparent substrate is a liquid with a surface tension of 40 mN / m. The contact angle is preferably less than 10 degrees. In any of the embodiments, after the photocatalyst containing layer having ink repellency as compared with the transparent substrate is formed, the pixel portion or the light shielding portion is provided in the non-formed portion. If the wettability is less than 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m, the liquid is easy to spread. For example, in the case of a pixel portion, the ink for ink jet spreads uniformly, thereby obtaining a pixel portion having no color unevenness. And a high-quality color filter can be obtained.

  In the present invention, the energy for irradiating and exposing the photocatalyst-containing layer is usually light including ultraviolet light as described in claim 36, but pattern formation or the like is performed by light drawing irradiation. In this case, as described in claim 37, the photocatalyst reaction initiation energy and the reaction rate increase energy are used as the energy, and the exposed portion of the photocatalyst reaction initiation energy is irradiated with the reaction rate increase energy. May be formed.

  In this method, a photocatalytic reaction initiation energy is added to the photocatalyst containing layer, and a pattern of an exposed portion is formed by adding a reaction rate increasing energy in a pattern in a region where the photocatalytic reaction initiation energy is added. That is, the pattern formation by light drawing irradiation that has been proposed by the inventors up to now has used the photocatalytic reaction initiation energy such as ultraviolet rays, so that the apparatus is expensive, difficult to handle, and cannot continuously output. In some cases, there are problems. However, in this method, a photocatalytic reaction initiation energy such as ultraviolet rays is added, and a pattern is formed using a reaction rate increasing energy such as infrared rays in the region where the photocatalytic reaction initiation energy is applied. In forming a pattern, there is an advantage that energy which is relatively inexpensive and easy to handle, such as an infrared laser, can be used.

  In the present invention, when using two energies, photocatalytic reaction initiation energy and reaction rate increase energy, as described in claim 38, the photocatalytic reaction initiation energy is light containing ultraviolet light, and The reaction rate increasing energy is preferably thermal energy. This is because in the present invention, titanium dioxide is suitably used as a photocatalyst, but ultraviolet light is preferable as the photocatalytic reaction initiation energy because of the band gap of titanium dioxide. In addition, it is preferable that the reaction rate increasing energy is heat. However, as described in claim 39, this thermal energy is preferably applied by an infrared laser. This is because the method using an infrared laser is relatively inexpensive and easy to handle.

  The present invention includes a transparent substrate, a pixel portion provided with a plurality of colors in a predetermined pattern on the transparent substrate by an ink jet method, a light shielding portion provided at a boundary portion of the pixel portion, the pixel portion or the pixel portion, and It is a color filter characterized by having a wettability variable layer provided to form a light shielding portion and capable of changing wettability. Therefore, it is possible to accurately form the pixel portion or the pixel portion and the light shielding portion by utilizing the change in wettability of the wettability variable layer, and a high-quality color filter free from problems such as color loss and color unevenness can be obtained. Can be provided at a cost.

  Hereinafter, the present invention will be described in detail. First, a color filter will be described, and then a method for manufacturing the color filter will be described.

A. First, the color filter of the present invention will be described in detail. The color filter of the present invention includes a transparent substrate, a pixel portion in which a plurality of colors are provided in a predetermined pattern on the transparent substrate by an ink jet method, a light shielding portion provided at a boundary portion of the pixel portion, the pixel portion, Or it has the wettability variable layer which is provided in order to form a pixel part and a light-shielding part and can change wettability.

  The present invention has a wettability variable layer provided to form the pixel portion as described above or to form the pixel portion and the light shielding portion. Therefore, by changing the wettability of the wettability variable layer, the pixel portion or the pixel portion and the light-shielding portion can be easily formed, so that a high-quality color filter can be obtained at low cost. Here, to form the pixel portion or the pixel portion and the light shielding portion includes the meaning that the pixel portion or the pixel portion and the light shielding portion are positioned on the transparent substrate.

  As a specific positional relationship of each element of such a color filter, for example, at least the pixel portion can be provided on the wettability variable layer.

  As described above, since at least the pixel portion is provided on the wettability variable layer, the wettability of the portion where the pixel portion is provided in advance is set to an ink-philic region having a small contact angle with the liquid, and the other portion is connected to the liquid. An ink-repellent region having a large contact angle can be obtained. By coloring the portion where the pixel portion is provided by an ink jet method, the ink adheres only to the ink-philic region where the liquid contact angle is small, so that the ink is evenly distributed throughout the pixel portion, and there is no ink in the pixel portion. In addition, color unevenness does not occur, and ink does not adhere to other ink repellent areas.

  As another specific positional relationship of each element in the color filter of the present invention, for example, an example in which a wettability variable layer is formed at the boundary portion of the pixel portion can be given. In this case, by setting the wettability of the boundary portion of the pixel portion to an ink repellent region that is worse than the wettability of the portion where the pixel portion is provided, when the portion where the pixel portion is provided is colored by the inkjet method, the ink repellency Since it is difficult for the ink to move beyond the boundary portion of the pixel portion having, a color filter free from problems in ink mixing or the like can be provided. After that, by applying a stimulus or the like to make the wettability variable layer at the boundary portion of the pixel portion an ink-philic region with a small contact angle with the liquid, a light shielding layer is provided on the boundary portion of the pixel portion, or Covering the protective layer can be easily performed, and a high-quality color filter can be obtained.

  Hereinafter, the color filter of the present invention having such a wettability variable layer will be described in detail using some embodiments.

1. About the first embodiment In the first embodiment of the present invention, a light shielding portion is formed on a transparent substrate, and at least a pixel portion forming portion which is a portion where the pixel portion on the light shielding portion and the transparent substrate is formed. Is a color filter in which a wettability variable layer is provided and a pixel portion can be formed with high accuracy by a change in wettability on the wettability variable layer. This shows an example in which the wettability variable layer is provided to form the pixel portion, and at least the pixel portion described above is one of specific examples of the color filter provided on the wettability variable layer. is there.

  FIG. 1 shows an example of the first embodiment. The color filter 1 is provided on the light shielding portion 3 provided on the transparent substrate 2, and further on the light shielding portion 3 and the pixel portion forming portion 4 which is a portion where the pixel portion on the transparent substrate 2 is formed. The wettability variable layer 5 and the pixel portion 6 formed in the pixel portion forming portion 4 on the wettability variable layer 5 are provided. Here, the pixel portion forming portion 4 indicates a horizontal position on the surface of the transparent substrate 2 on which the pixel portion 6 is formed, and may be on the transparent substrate 2 or the wettability variable layer 5. . The light shielding portion 3 is also called a black matrix and is usually formed at the boundary portion of the pixel portion 6.

  In the color filter of the first embodiment, the pixel portion forming portion 4 on the wettability variable layer 5 is made to have ink affinity by irradiating the portion of the pixel portion forming portion 4 on the wettability variable layer 5 with energy. Can be an area. Therefore, by coloring the ink in this region by an ink jet method, a high-quality color filter having a uniform and non-uniform pixel portion can be obtained.

  In the first embodiment of the present invention, it is preferable that the width of the pixel portion 6 is wider than the width of the opening formed by the light shielding portion 3. By adopting such a configuration, when this color filter is mounted and a backlight is applied, the backlight does not pass through the portion where the pixel portion is not formed, and there is no color loss and high quality. It is because it can be set as a color filter.

  FIG. 2 shows another example of the first embodiment. In this example, an ink-repellent convex portion 7 is formed on the wettability variable layer 5 on the light shielding portion 3. Thus, since the ink-repellent convex portion 7 is formed in the color filter 1 of this example, when the ink is attached to the pixel portion forming portion 4 by the ink jet method, the ink-repellent convex portion 7 is exceeded. Since ink does not flow out, a color filter having a pixel portion that does not mix with other color inks can be obtained. In this case, the width of the ink-repellent convex portion 7 is not particularly limited, but is preferably narrower than the width of the light-shielding portion 3 as shown in FIG. With this configuration, when the pixel portion 6 is formed, the width of the pixel portion 6 can be made wider than the width of the opening of the light shielding portion 3, and the above-described effects can be obtained. . This is because a high-quality color filter without color loss can be obtained.

  Hereinafter, each part constituting such a color filter will be described.

(Wettability variable layer)
The wettability variable layer 5 is not particularly limited as long as the wettability of the surface can be changed by an external stimulus such as a physical stimulus or a chemical stimulus. For example, the surface roughness may be changed by acid or alkali, and the wettability may be changed. The wettability variable layer may be formed by irradiation with energy such as ultraviolet rays, visible light, or heat. It may be a layer or the like in which the wettability is changed by changing the substance inside.

  Regarding the change in wettability, even if the wettability variable layer changes so that the contact angle with the liquid is large before the stimulus is applied and the contact angle with the liquid is small after the stimulus is applied. Alternatively, it may be a wettability variable layer in which the contact angle with the liquid is small before the stimulus is applied and the contact angle with the liquid changes greatly after the stimulus is applied.

(Photocatalyst containing layer)
In the present invention, the wettability variable layer is preferably a photocatalyst-containing layer whose wettability changes so that the contact angle with the liquid is reduced by energy irradiation. In this way, the wettability is reduced so that the contact angle with the liquid is reduced by exposure (in the present invention, not only light is irradiated but also energy is applied). By providing a photocatalyst-containing layer that changes, wettability can be easily changed by performing pattern irradiation of energy, etc., and an ink-philic region having a small contact angle with the liquid can be formed. It is possible to easily make an ink-philic region only in a portion. Therefore, a color filter can be manufactured efficiently, which is advantageous in terms of cost. In this case, light containing ultraviolet light is usually used as energy.

  Here, the ink-philic region is a region having a small contact angle with the liquid, and refers to a region having good wettability with respect to ink-jet ink, light-shielding part paint, and the like. The ink repellent region is a region having a large contact angle with the liquid, and refers to a region having poor wettability with respect to the ink for ink jet or the coating material for the light shielding part.

  In the unexposed portion, the photocatalyst-containing layer has a contact angle with a liquid with a surface tension of 40 mN / m of 10 degrees or more, preferably a contact angle with a liquid with a surface tension of 30 mN / m of 10 degrees or more, particularly a surface The contact angle with a liquid having a tension of 20 mN / m is preferably 10 degrees or more. This is because the unexposed portion is a portion that requires ink repellency in the present invention, and therefore, when the contact angle with the liquid is small, the ink repellency is not sufficient, and the ink or light shielding portion is used. This is because there is a possibility that the paint may remain, which is not preferable.

  In addition, the photocatalyst-containing layer has a contact angle with a liquid that decreases when exposed to light, and a contact angle with a liquid with a surface tension of 40 mN / m is less than 10 degrees, preferably a liquid with a surface tension of 50 mN / m. It is preferable that the layer has a contact angle with a liquid of 10 degrees or less, particularly a surface tension of 60 mN / m, of 10 degrees or less. This is because if the contact angle of the exposed portion with the liquid is high, the spread of the ink or the light shielding portion paint in this portion may be inferior, and color loss or the like may occur in the pixel portion.

  In addition, the contact angle with the liquid here is measured using a contact angle measuring instrument (Kyowa Interface Science Co., Ltd. CA-Z type) with a liquid having various surface tensions (from the microsyringe to the liquid. 30 seconds after dropping), and the result was obtained or the result was graphed. In this measurement, as a liquid having various surface tensions, a wetting index standard solution manufactured by Pure Chemical Co., Ltd. was used.

  The photocatalyst-containing layer of the present invention is preferably composed of at least a photocatalyst and a binder. By using such a layer, the critical surface tension can be increased by the action of the photocatalyst by light irradiation, and the contact angle with the liquid can be decreased.

  In such a photocatalyst-containing layer, the mechanism of action of a photocatalyst represented by titanium oxide as described later is not necessarily clear, but carriers generated by light irradiation react directly with nearby compounds, or It is considered that the active oxygen species generated in the presence of oxygen and water change the chemical structure of organic matter.

  Using the action of such a photocatalyst, oily soil is decomposed by light irradiation to be hydrophilic and washable with water, or a hydrophilic film is formed on the surface of glass or the like to impart antifogging properties, Or what is called an antibacterial tile etc. which form the content layer of a photocatalyst on the surface of a tile etc. and reduce the number of airborne microbes in the air is proposed.

  When a photocatalyst-containing layer is used as the wettability variable layer in the present invention, the photocatalyst is used to change the wettability of the exposed portion by using an action such as oxidation or decomposition of an organic group or additive that is part of the binder. It can be made ink-philic and can make a great difference in wettability with the non-exposed portion. Therefore, by improving the receptivity (ink affinity) and repellent property (ink repellency) of the light shielding part paint and the ink jet ink, it is possible to obtain a color filter with good quality and advantageous in cost. it can.

  Further, when such a photocatalyst containing layer is used in the present invention, the photocatalyst containing layer contains at least a photocatalyst and fluorine, and the fluorine content on the surface of the photocatalyst containing layer irradiates the photocatalyst containing layer with energy. In this case, the photocatalyst-containing layer may be formed so as to be lower than that before energy irradiation due to the action of the photocatalyst.

  In a color filter having such a feature, a pattern composed of a portion having a low fluorine content can be easily formed by irradiating energy with a pattern. Here, fluorine has an extremely low surface energy. Therefore, the surface of a substance containing a large amount of fluorine has a smaller critical surface tension. Therefore, the critical surface tension of the portion having a small fluorine content is larger than the critical surface tension of the surface of the portion having a large fluorine content. This means that the portion with a low fluorine content is an ink-philic region compared to the portion with a high fluorine content. Therefore, forming a pattern composed of a portion having a lower fluorine content than the surrounding surface forms a pattern of an ink-philic region in the ink repellent region.

  Therefore, when such a photocatalyst-containing layer is used, the pattern of the ink-repellent region can be easily formed in the ink-repellent region by irradiating the pattern with energy. Thus, it is possible to easily form a pixel portion or the like, and a color filter with good quality can be obtained.

  As described above, the fluorine content contained in the fluorine-containing photocatalyst-containing layer is a portion where the fluorine content in the low ink content region formed by irradiation with energy is not irradiated with energy. When the fluorine content is 100, it is preferably 10 or less, preferably 5 or less, particularly preferably 1 or less.

  By setting it within such a range, it is possible to make a great difference in the ink affinity between the energy irradiated portion and the unirradiated portion. Therefore, by forming a pixel portion or the like in such a photocatalyst-containing layer, it becomes possible to form the pixel portion or the like accurately only in the ink-philic region having a reduced fluorine content, and to obtain a color filter with high accuracy. Because you can. This rate of decrease is based on weight.

  For the measurement of the fluorine content in the photocatalyst-containing layer, various commonly used methods can be used. For example, X-ray photoelectron spectroscopy (ES-ray photoelectron spectroscopy, ESCA) for Chemical Analysis)), and any method that can quantitatively measure the amount of fluorine on the surface, such as X-ray fluorescence analysis and mass spectrometry, is not particularly limited.

Examples of the photocatalyst used in the present invention include titanium oxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), which are known as optical semiconductors. Bismuth oxide (Bi ₂ O ₃ ) and iron oxide (Fe ₂ O ₃ ) can be mentioned, and one or a mixture of two or more selected from these can be used.

  In the present invention, titanium oxide is particularly preferably used because it has a high band gap energy, is chemically stable, has no toxicity, and is easily available. Titanium oxide includes anatase type and rutile type, and both can be used in the present invention, but anatase type titanium oxide is preferable. Anatase type titanium oxide has an excitation wavelength of 380 nm or less.

  Examples of such anatase-type titanium oxide include hydrochloric acid peptizer-type anatase-type titania sol (STS-02 manufactured by Ishihara Sangyo Co., Ltd. (average particle size 7 nm), ST-K01 manufactured by Ishihara Sangyo Co., Ltd.), nitric acid solution An anatase type titania sol (TA-15 manufactured by Nissan Chemical Co., Ltd. (average particle size 12 nm)) and the like can be mentioned.

  The smaller the particle size of the photocatalyst, the more effective the photocatalytic reaction occurs. The average particle size is preferably 50 nm or less, and it is particularly preferable to use a photocatalyst of 20 nm or less. Further, the smaller the particle size of the photocatalyst, the smaller the surface roughness of the formed photocatalyst-containing layer, which is preferable. When the particle size of the photocatalyst exceeds 100 nm, the centerline average surface roughness of the photocatalyst-containing layer becomes coarse, and the photocatalyst This is not preferable because the ink repellency of the non-exposed portion of the containing layer is lowered and the ink affinity of the exposed portion becomes insufficient.

  The color filter of the present invention contains fluorine on the surface of the photocatalyst containing layer as described above, and reduces the fluorine content on the surface of the photocatalyst containing layer by pattern irradiating energy on the surface of the photocatalyst containing layer. Alternatively, a color filter obtained by forming a pattern of an ink-philic region in the color region and forming a pixel portion or the like therein may be used. Even in this case, it is preferable to use the titanium dioxide as described above as the photocatalyst. However, the content of fluorine contained in the photocatalyst containing layer in the case of using titanium dioxide in this way is X-ray photoelectron. When analyzed and quantified by spectroscopy, when the titanium (Ti) element is defined as 100, the fluorine (F) element is in a ratio of 500 or more, preferably 800 or more, particularly preferably 1200 or more. It is preferable that the element is contained on the surface of the photocatalyst containing layer.

  By including fluorine (F) in the photocatalyst-containing layer to such an extent, the critical surface tension on the photocatalyst-containing layer can be sufficiently lowered, so that the ink repellency on the surface can be ensured, thereby irradiating the pattern with energy. This is because the difference in wettability with the ink-affinity region on the surface in the pattern portion where the fluorine content is reduced can be increased, and the quality of the color filter finally obtained can be improved.

  Further, in such a color filter, the fluorine content in the parent ink region formed by pattern irradiation of energy is 50 or less when the titanium (Ti) element is 100, preferably It is preferably contained in a ratio of 20 or less, particularly preferably 10 or less.

  If the fluorine content in the photocatalyst-containing layer can be reduced to this extent, sufficient ink affinity can be obtained for forming the pixel portion and the like, and the ink repellency of the portion where the energy is not irradiated. Due to the difference in wettability, the pixel portion and the like can be formed with high accuracy, and a color filter with good quality can be obtained.

  In the present invention, the binder used in the photocatalyst-containing layer preferably has a high binding energy such that the main skeleton is not decomposed by the photoexcitation of the photocatalyst. For example, (1) chloro or alkoxysilane or the like by sol-gel reaction or the like. Examples include organopolysiloxanes that exhibit high strength by hydrolysis and polycondensation, and (2) organopolysiloxanes crosslinked with reactive silicones that are excellent in water repellency and oil repellency.

In the case of (1) above, the general formula:
Y _n SiX _(4-n)
(Here, Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, X represents an alkoxyl group, an acetyl group or a halogen. N is an integer from 0 to 3. )
It is preferable that it is the organopolysiloxane which is a 1 type, or 2 or more types of hydrolysis condensate or cohydrolysis condensate of the silicon compound shown by these. Here, the number of carbon atoms of the group represented by Y is preferably in the range of 1 to 20, and the alkoxy group represented by X is a methoxy group, an ethoxy group, a propoxy group, or a butoxy group. preferable.

Specifically, methyltrichlorosilane, methyltribromosilane, methyltrimethoxysilane, methyltriethoxysilane, methyltriisopropoxysilane, methyltri-t-butoxysilane; ethyltrichlorosilane, ethyltribromosilane, ethyltrimethoxysilane, Ethyltriethoxysilane, ethyltriisopropoxysilane, ethyltri-t-butoxysilane; n-propyltrichlorosilane, n-propyltribromosilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, n-propyltriisopropoxy Silane, n-propyltri-t-butoxysilane; n-hexyltrichlorosilane, n-hexyltribromosilane, n-hexyltrimethoxysilane, n-hexyltriethoxysilane, n-hexyl Lutriisopropoxysilane, n-hexyltri-t-butoxysilane; n-decyltrichlorosilane, n-decyltribromosilane, n-decyltrimethoxysilane, n-decyltriethoxysilane, n-decyltriisopropoxysilane, n -Decyltri-t-butoxysilane; n-octadecyltrichlorosilane, n-octadecyltribromosilane, n-octadecyltrimethoxysilane, n-octadecyltriethoxysilane, n-octadecyltriisopropoxysilane, n-octadecyltri-t-butoxysilane Phenyltrichlorosilane, phenyltribromosilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltriisopropoxysilane, phenyltri-t-butoxysilane; tetrachlorosilane Tetrabromosilane, tetramethoxysilane, tetraethoxysilane, tetrabutoxysilane, dimethoxydiethoxysilane; dimethyldichlorosilane, dimethyldibromosilane, dimethyldimethoxysilane, dimethyldiethoxysilane; diphenyldichlorosilane, diphenyldibromosilane, Diphenyldimethoxysilane, diphenyldiethoxysilane;
Phenylmethyldichlorosilane, phenylmethyldibromosilane, phenylmethyldimethoxysilane, phenylmethyldiethoxysilane; trichlorohydrosilane, tribromohydrosilane, trimethoxyhydrosilane, triethoxyhydrosilane, triisopropoxyhydrosilane, tri-t-butoxyhydrosilane; vinyl Trichlorosilane, vinyltribromosilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriisopropoxysilane, vinyltrit-butoxysilane; trifluoropropyltrichlorosilane, trifluoropropyltribromosilane, trifluoropropyltrimethoxysilane, Trifluoropropyltriethoxysilane, trifluoropropyltriisopropoxysilane, trifluoropro Lutri-t-butoxysilane; γ-glycidoxypropylmethyldimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-glycyl Sidoxypropyltriisopropoxysilane, γ-glycidoxypropyltri-t-butoxysilane; γ-methacryloxypropylmethyldimethoxysilane, γ-methacryloxypropylmethyldiethoxysilane, γ-methacryloxypropyltrimethoxysilane , Γ-methacryloxypropyltriethoxysilane, γ-methacryloxypropyltriisopropoxysilane, γ-methacryloxypropyltrit-butoxysilane; γ-aminopropylmethyldimethoxysilane, γ-aminopropyl Tildiethoxysilane, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-aminopropyltriisopropoxysilane, γ-aminopropyltrit-butoxysilane; γ-mercaptopropylmethyldimethoxysilane, γ- Mercaptopropylmethyldiethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropyltriethoxysilane, γ-mercaptopropyltriisopropoxysilane, γ-mercaptopropyltri-t-butoxysilane; β- (3,4-epoxy Cyclohexyl) ethyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxysilane; and partial hydrolysates thereof; and mixtures thereof.

As the binder, polysiloxane containing a fluoroalkyl group can be particularly preferably used. Specifically, one or more of the following hydrocondensation condensates and cohydrolysis condensates of fluoroalkylsilanes can be used. And those generally known as fluorine-based silane coupling agents can be used.
_{CF 3 (CF 2) 3 CH} 2 CH 2 Si (OCH 3) 3;
_{CF 3 (CF 2) 5 CH} 2 CH 2 Si (OCH 3) 3;
_{CF 3 (CF 2) 7 CH} 2 CH 2 Si (OCH 3) 3;
_{CF 3 (CF 2) 9 CH} 2 CH 2 Si (OCH 3) 3;
(CF ₃ ) ₂ CF (CF ₂ ) ₄ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
_{(CF 3) 2 CF (CF} 2) 6 CH 2 CH 2 Si (OCH 3) 3;
_{(CF 3) 2 CF (CF} 2) 8 CH 2 CH 2 Si (OCH 3) 3;
_{CF 3 (C 6 H 4)} C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 3 (} C 6 H 4) C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 5 (} C 6 H 4) C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 7 (} C 6 H 4) C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 3 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 5 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 7 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 9 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{(CF 3) 2 CF (CF} 2) 4 CH 2 CH 2 SiCH 3 (OCH 3) 2;
_{(CF 3) 2 CF (CF} 2) 6 CH 2 CH 2 Si CH 3 (OCH 3) 2;
_{(CF 3) 2 CF (CF} 2) 8 CH 2 CH 2 Si CH 3 (OCH 3) 2;
_{CF 3 (C 6 H 4)} C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 3 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 5 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 7 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 3 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 5 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 7 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 9 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 7 SO} 2 N (C 2 H 5) C 2 H 4 CH 2 Si (OCH 3) 3
By using a polysiloxane containing a fluoroalkyl group as described above as a binder, the ink repellency of the non-exposed part of the photocatalyst-containing layer is greatly improved, and the function of preventing the adhesion of the light-shielding part paint or the ink for ink jet system. To express.

  Examples of the reactive silicone (2) include compounds having a skeleton represented by the following general formula.

ただし、ｎは２以上の整数であり、Ｒ^１，Ｒ^２はそれぞれ炭素数１〜１０の置換もしくは非置換のアルキル、アルケニル、アリールあるいはシアノアルキル基であり、モル比で全体の４０％以下がビニル、フェニル、ハロゲン化フェニルである。また、Ｒ^１、Ｒ^２がメチル基のものが表面エネルギーが最も小さくなるので好ましく、モル比でメチル基が６０％以上であることが好ましい。また、鎖末端もしくは側鎖には、分子鎖中に少なくとも１個以上の水酸基等の反応性基を有する。

However, n is an integer of 2 or more, R ^1, R ² are each a substituted or unsubstituted alkyl having 1 to 10 carbon atoms, alkenyl, aryl or cyanoalkyl group, the total molar ratio of 40% or less Vinyl, phenyl and phenyl halide. Further, those in which R ¹ and R ² are methyl groups are preferable because the surface energy becomes the smallest, and the methyl groups are preferably 60% or more by molar ratio. In addition, the chain end or side chain has at least one reactive group such as a hydroxyl group in the molecular chain.

  In addition to the above organopolysiloxane, a stable organosilicon compound that does not undergo a crosslinking reaction, such as dimethylpolysiloxane, may be mixed in the binder.

  In the color filter of the present invention, various binders such as organopolysiloxane can be used in the photocatalyst-containing layer. In the present invention, as described above, the photocatalyst-containing layer containing such a binder and the photocatalyst contains fluorine, and the pattern is irradiated with energy to reduce the fluorine on the surface of the photocatalyst-containing layer. An ink-philic region may be formed inside. At this time, it is necessary to contain fluorine in the photocatalyst-containing layer. As a method of incorporating fluorine into the photocatalyst-containing layer containing such a binder, a fluorine compound is relatively used for a binder having a high binding energy. Examples thereof include a method of bonding with weak binding energy and a method of mixing a fluorine compound bonded with relatively weak binding energy into the photocatalyst containing layer. By introducing fluorine by such a method, when energy is irradiated, a fluorine bonding site having a relatively low binding energy is first decomposed, and thus fluorine can be removed from the photocatalyst containing layer. is there.

  Examples of the first method, that is, a method of bonding a fluorine compound with a relatively weak binding energy to a binder having a high binding energy include a method of introducing a fluoroalkyl group as a substituent into the organopolysiloxane. be able to.

For example, as described in (1) above, as a method for obtaining an organopolysiloxane, an organopolysiloxane exhibiting high strength can be obtained by hydrolyzing and polycondensing chloro or alkoxysilane, etc. by sol-gel reaction or the like. . Here, in this method, as described above, the above general formula:
Y _n SiX _(4-n)
(Here, Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, X represents an alkoxyl group, an acetyl group or a halogen. N is an integer from 0 to 3. )
An organopolysiloxane is obtained by hydrolyzing or co-hydrolyzing and condensing one or two or more of the silicon compounds represented by formula (1). In this general formula, silicon having a fluoroalkyl group as the substituent Y By synthesizing using a compound, an organopolysiloxane having a fluoroalkyl group as a substituent can be obtained. When an organopolysiloxane having such a fluoroalkyl group as a substituent is used as a binder, the carbon bond portion of the fluoroalkyl group is decomposed by the action of the photocatalyst in the photocatalyst-containing layer when irradiated with energy. Therefore, the fluorine content in the portion where the surface of the photocatalyst containing layer is irradiated with energy can be reduced.

  The silicon compound having a fluoroalkyl group used at this time is not particularly limited as long as it has a fluoroalkyl group, but has at least one fluoroalkyl group, and the carbon number of the fluoroalkyl group A silicon compound in which is 4 to 30, preferably 6 to 20, particularly preferably 6 to 16, is preferably used. Specific examples of such a silicon compound are as described above, and among these, the above silicon compound having a fluoroalkyl group having 6 to 8 carbon atoms, that is, a fluoroalkylsilane is preferable.

  In the present invention, such a silicon compound having a fluoroalkyl group may be used in combination with the above-mentioned silicon compound having no fluoroalkyl group, and these cohydrolyzed condensates may be used as the organopolysiloxane. In addition, one or two or more silicon compounds having such a fluoroalkyl group may be used, and these hydrolyzed condensates and cohydrolyzed condensates may be used as the organopolysiloxane.

  In the organopolysiloxane having a fluoroalkyl group thus obtained, among the silicon compounds constituting the organopolysiloxane, the silicon compound having the fluoroalkyl group is 0.01 mol% or more, preferably 0.1%. It is preferable that it is contained in mol% or more.

  By including the fluoroalkyl group to such an extent, the ink repellency on the photocatalyst-containing layer can be increased, and the difference in wettability with the portion that is irradiated with energy to form the ink-philic region can be increased. Because.

In the method shown in (2) above, organopolysiloxane is obtained by crosslinking reactive silicone having excellent water repellency and oil repellency. In this case as well, R in the above general formula is similarly used. ^{By making} either one or both of R ¹ and R ² a substituent containing fluorine such as a fluoroalkyl group, it is possible to include fluorine in the photocatalyst-containing layer, and when energy is irradiated, Since the portion of the fluoroalkyl group having a bond energy smaller than that of the siloxane bond is decomposed, the fluorine content on the surface of the photocatalyst containing layer can be reduced by energy irradiation.

  On the other hand, as a method for introducing a fluorine compound bonded with energy lower than the binding energy of the binder, for example, when introducing a low molecular weight fluorine compound, for example, a fluorine-based surfactant is mixed. Examples of the method of introducing a high molecular weight fluorine compound include a method of mixing a fluorine resin having high compatibility with the binder resin.

  In the present invention, the photocatalyst-containing layer can contain a surfactant in addition to the above-mentioned photocatalyst and binder. Specifically, hydrocarbons such as NIKKOL BL, BC, BO, BB series manufactured by Nikko Chemicals Co., Ltd., ZONYL FSN, FSO manufactured by DuPont, Surflon S-141, 145 manufactured by Asahi Glass Co., Ltd., Dainippon Megafac F-141, 144 manufactured by Ink Chemical Industry Co., Ltd., Footgent F-200, F251 manufactured by Neos Co., Ltd., Unidyne DS-401, 402 manufactured by Daikin Industries, Ltd., Fluorard FC-170 manufactured by 3M Co., Ltd. Fluorine-based or silicone-based nonionic surfactants such as 176 can be used, and cationic surfactants, anionic surfactants, and amphoteric surfactants can also be used.

  In addition to the above surfactants, the photocatalyst-containing layer includes polyvinyl alcohol, unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine resin, polycarbonate, Polyvinyl chloride, polyamide, polyimide, styrene butadiene rubber, chloroprene rubber, polypropylene, polybutylene, polystyrene, polyvinyl acetate, polyester, polybutadiene, polybenzimidazole, polyacrylonitrile, epichlorohydrin, polysulfide, polyisoprene, oligomers, polymers, etc. It can be included.

  The content of the photocatalyst in the photocatalyst containing layer can be set in the range of 5 to 60% by weight, preferably 20 to 40% by weight. The thickness of the photocatalyst containing layer is preferably in the range of 0.05 to 10 μm.

  The photocatalyst-containing layer can be formed by dispersing a photocatalyst and a binder in a solvent together with other additives as necessary to prepare a coating solution, and applying the coating solution. As the solvent to be used, alcohol-based organic solvents such as ethanol and isopropanol are preferable. The coating can be performed by a known coating method such as spin coating, spray coating, dip coating, roll coating or bead coating. When an ultraviolet curable component is contained as the binder, the photocatalyst-containing layer can be formed by irradiating ultraviolet rays and performing a curing treatment.

(Pixel part)
In the first embodiment, the pixel portion 6 is provided on the wettability variable layer 5, particularly the photocatalyst-containing layer described above, as shown in FIGS. 1 and 2. In the first embodiment, the photocatalyst-containing layer is exposed, and pixel portions are formed in a predetermined pattern with a plurality of colors of ink by an inkjet method in an ink-philic region having a low contact angle with the liquid. The normal pixel portion is formed of three colors of red (R), green (G), and blue (B). The coloring pattern and the coloring area in the pixel portion can be arbitrarily set.

  Ink-jet inks that form such pixel portions are largely classified into water-based and oil-based inks. In the present invention, any ink can be used, but water-based inks are used because of surface tension. The water-based ink is preferably used.

  In the water-based ink used in the present invention, water alone or a mixed solvent of water and a water-soluble organic solvent can be used as a solvent. On the other hand, an oil-based ink is preferably used based on a solvent having a high boiling point in order to prevent clogging of the head. Known colorants and dyes are widely used as colorants used in such ink jet inks. Further, in order to improve dispersibility and fixability, resins that are soluble or insoluble in a solvent can be contained. Other surfactants such as nonionic surfactants, cationic surfactants and amphoteric surfactants; antiseptics; antifungal agents; pH adjusters; antifoaming agents; UV absorbers; viscosity modifiers: surface tension modifiers, etc. May be added as necessary.

  Ordinary ink jet inks cannot contain a large amount of binder resin due to their low suitable viscosity. However, the colorant itself can have fixing ability by granulating it in the form of wrapping the colorant particles in the ink. it can. Such an ink can also be used in the present invention. Furthermore, so-called hot melt inks and UV curable inks can also be used.

  In the present invention, it is particularly preferable to use a UV curable ink. By using a UV curable ink, the ink can be colored by an ink jet method to form a pixel portion, and then irradiated with UV, whereby the ink can be quickly cured and immediately sent to the next step. Therefore, a color filter can be manufactured efficiently.

  Such a UV curable ink is mainly composed of a prepolymer, a monomer, a photoinitiator and a colorant. As the prepolymer, any of prepolymers such as polyester acrylate, polyurethane acrylate, epoxy acrylate, polyether acrylate, oligo acrylate, alkyd acrylate, polyol acrylate, and silicon acrylate can be used without any particular limitation.

  Monomers include vinyl monomers such as styrene and vinyl acetate; monofunctional acrylic monomers such as n-hexyl acrylate and phenoxyethyl acrylate; diethylene glycol diacrylate, 1,6-hexanediol diacrylate, hydroxypiperic acid ester neopentyl glycol diacrylate Polyfunctional acrylic monomers such as trimethylolpropane triacrylate and dipentaerystol hexaacrylate can be used. The prepolymer and the monomer may be used alone or in combination of two or more.

  Photopolymerization initiators are isobutyl benzoin ether, isopropyl benzoin ether, benzoin ethyl ether, benzoin methyl ether, 1-phenyl-1,2-propadion-2-oxime, 2,2-dimethoxy-2-phenylacetophenone, benzyl, hydroxy Cyclohexyl phenyl ketone, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzophenone, chlorothioxanthone, 2-chlorothioxanthone, isopropylthioxanthone, 2-methylthioxanthone, chlorine-substituted benzophenone, halogen-substituted alkyl -From the allyl ketone etc., what can obtain desired hardening characteristics and recording characteristics can be selected and used. In addition, photoinitiators such as aliphatic amines and aromatic amines; and photosensitizers such as thioxanthone may be added as necessary.

(Shading part)
In the first embodiment of the present invention, as shown in FIGS. 1 and 2, the light shielding portion 3 is formed on the transparent substrate 2 and at the boundary portion of the pixel portion forming portion 4.

  The light shielding part in the first embodiment is formed by forming a metal thin film of chromium or the like having a thickness of about 1000 to 2000 mm by sputtering, vacuum vapor deposition or the like, and patterning this thin film. As this patterning method, a normal patterning method such as sputtering can be used.

  The light shielding part may be a layer in which light shielding particles such as carbon fine particles, metal oxides, inorganic pigments, and organic pigments are contained in a resin binder. As the resin binder to be used, polyimide resin, acrylic resin, epoxy resin, polyacrylamide, polyvinyl alcohol, gelatin, casein, cellulose, or a mixture of one or more kinds, photosensitive resin, or O / A W emulsion type resin composition, for example, an emulsion of a reactive silicone can be used. The thickness of such a resin light-shielding portion can be set within a range of 0.5 to 10 μm. As a method for patterning the resin light-shielding part, a generally used method such as a photolithography method or a printing method can be used.

(Transparent substrate)
In the first embodiment of the present invention, as shown in FIGS. 1 and 2, the light-shielding portion 3 and the wettability variable layer 5, particularly the photocatalyst-containing layer described above, are provided on the transparent substrate 2.

  The transparent substrate is not particularly limited as long as it is conventionally used for a color filter. For example, a transparent substrate having no flexibility such as quartz glass, Pyrex (registered trademark) glass, synthetic quartz plate, etc. A transparent material having flexibility such as a rigid material or a transparent resin film or an optical resin plate can be used. Among them, Corning 7059 glass is a material having a small coefficient of thermal expansion, excellent dimensional stability and workability in high-temperature heat treatment, and is an alkali-free glass containing no alkali component in the active matrix. Suitable for color filters for color liquid crystal display devices. In the present invention, a transparent substrate is usually used, but a reflective substrate or a white substrate can also be used. Further, the transparent substrate may be subjected to surface treatment for preventing alkali elution, imparting a gas barrier property or other purposes as required.

(Ink-repellent convex part)
In the first embodiment of the present invention, as shown in FIG. 2, an ink-repellent convex portion 7 may be formed on the wettability variable layer 5 covering the upper portion of the light shielding portion 3. The composition of such an ink repellency convex part is not particularly limited as long as it is a resin composition having ink repellency. Moreover, it does not need to be transparent in particular and may be colored. For example, a material that is used for a black matrix (light-shielding portion) and does not include a black material can be used. Specifically, a composition in which one or more aqueous resins such as polyacrylamide, polyvinyl alcohol, gelatin, casein, and cellulose are mixed, or an O / W emulsion type resin composition, for example, reactive silicone emulsion And the like. In the present invention, a photocurable resin is preferably used for reasons such as easy handling and curing. In addition, since the ink-repellent convex portion is more preferable as the ink repellency is stronger, the surface may be treated with an ink-repellent treatment agent such as a silicone compound or a fluorine-containing compound.

  The height of the ink-repellent convex portion in the first embodiment is preferably high to some extent because it is provided to prevent ink from being mixed when colored by the inkjet method as described above. However, considering the overall flatness of the color filter, the thickness is preferably close to the thickness of the pixel portion. Specifically, although it varies depending on the amount of ink deposited, it is preferably in the range of 0.1 to 2 μm.

(Protective layer)
Although not shown in FIG. 1 or 2, a protective layer may be further formed on the pixel portion 6 in the first embodiment. This protective layer is provided to flatten the color filter and to prevent elution of the components contained in the pixel portion or the pixel portion and the photocatalyst containing layer into the liquid crystal layer.

  The thickness of the protective layer can be set in consideration of the light transmittance of the material used, the surface state of the color filter, and the like, and can be set, for example, in the range of 0.1 to 2.0 μm. The protective layer can be formed using, for example, a known transparent photosensitive resin, two-component curable transparent resin, or the like having a light transmittance required as a transparent protective layer.

2. Regarding the Second Embodiment In the second embodiment of the present invention, the wettability variable layer is formed over the entire surface of the transparent substrate, and the pixel portion and the light shielding portion are provided at predetermined positions on the wettability variable layer. It is a color filter. This shows an example in which the wettability variable layer is provided to form the pixel portion and the light-shielding portion, and is a specific example of a color filter in which at least the pixel portion described above is provided on the wettability variable layer. One.

  FIG. 3 shows an example of the second embodiment. The color filter 1 is formed on the wettability variable layer 5 provided on the transparent substrate 2, the light shielding part 3 and the pixel part 6 formed on the wettability variable layer 5, and the pixel part 6 and the light shielding part 3. And formed protective layer 8.

  In the color filter of the second embodiment, the pixel portion 6 and the light-shielding portion 3 are formed on the wettability variable layer 5, and as described in detail in the manufacturing method described later, the pixels of the pixel portion 6 are formed. First, the wettability is lowered by irradiating the part forming part with energy or the like, and after forming the pixel part 6 in this part, the wettability of the wettability variable layer 5 of the light shielding part forming part of the light shielding part 3 is lowered. Alternatively, the light-shielding portion 3 may be formed, and conversely, the wettability of the light-shielding portion forming portion is reduced first, and after forming the light-shielding portion, the wettability of the wettability variable layer of the pixel portion forming portion is increased. The pixel portion 6 may be formed by lowering.

  Regardless of the manufacturing method, when the pixel portion 6 is formed, the wettability variable layer has a reduced ink wettability region. Ink can spread uniformly in the pixel portion forming portion, and a color filter without color unevenness can be obtained. Further, when the pixel portion is colored by the ink jet method, the light shielding portion 3 is formed around the pixel portion, or the wettability of the wettability variable layer is not changed, that is, an ink repellent region. Therefore, the ink does not mix beyond this portion, and a color filter free from problems such as color mixing can be obtained.

  The materials of the transparent substrate 2, the light shielding part 3, the wettability variable layer 5, the pixel part 6, and the protective layer 8 used in this embodiment are the same as those in the first embodiment, so here Description is omitted. In this embodiment, since the light shielding portion is formed on the wettability variable layer, a portion having good wettability is formed in advance on the wettability variable layer, and the paint for the light shielding portion is applied to the portion. The light shielding part is easily formed. Therefore, it can be said that the light shielding part is preferably formed of a coating material for the light shielding part in which the light shielding fine particles and the resin are dissolved in a solvent or the like.

3. About the third embodiment In the third embodiment of the present invention, the wettability variable layer is provided in the pixel portion forming portion where the light shielding portion is provided on the transparent substrate and the pixel portion on the transparent substrate is formed. A color filter provided and having a pixel portion formed on the wettability variable layer. This shows an example in which the wettability variable layer is provided to form the pixel portion and the light-shielding portion, and is a specific example of a color filter in which at least the pixel portion described above is provided on the wettability variable layer. One.

  FIG. 4 shows an example of the third embodiment. The color filter 1 includes a light shielding portion 3 provided on a transparent substrate 2 and a wettability variable layer 5 formed in a pattern on a pixel portion forming portion 4 that is a region between the light shielding portions 3 on the transparent substrate 2. The pixel portion 6 formed on the wettability variable layer 5 and the protective layer 8 formed on the pixel portion 6 and the light shielding portion 3 are formed.

  The feature of this embodiment is that the wettability variable layer is formed only on the pixel portion forming portion 4 on the transparent substrate 2, and the wettability variable layer 5 is formed in the light shielding portion forming portion where the light shielding portion 3 is formed. It is not in the point. As described above, in the third embodiment, the wettability variable layer 5 is formed only in the pixel portion forming unit 4, and therefore, when the wettability variable layer is stimulated to change the wettability, the stimulus is applied. It only needs to be applied over the entire surface, and there is no need to apply stimuli in a pattern. Therefore, the process after forming the wettability variable layer can be simplified.

  In this embodiment, since the light shielding part 3 is formed directly on the transparent substrate 2, the transparent substrate 2 is preferably ink-philic. In particular, after the wettability variable layer 5 is formed in a pattern, when the light shielding portion 3 is formed in the light shielding portion forming portion therebetween, the wettability variable layer that is the ink repellent region before the wettability changes is used. It is preferable that the transparent substrate 2 is an ink-philic region in order to form the light shielding portion 3. Therefore, in the third embodiment, the wettability on the transparent substrate 2 is preferably less than 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m, more preferably 5 degrees or less, and particularly preferably 1 Less than or equal to degrees.

  As described above, the transparent substrate whose surface is an ink-affinity region includes an ink-philic material, a surface treated so that the surface of the material becomes ink-philic, and an ink-philic property on the transparent substrate. However, the present embodiment is not particularly limited.

  Examples of the surface treatment so that the surface of the material becomes ink-philic include ink-philic surface treatment by plasma treatment using argon or water, and the ink-philic layer provided on the transparent substrate is as follows: For example, a silica film obtained by a sol-gel method of tetraethoxysilane can be used.

  The materials other than the transparent substrate 2 used in this embodiment, that is, the materials of the light shielding portion 3, the wettability variable layer 5, the pixel portion 6, and the protective layer 8 are the same as those in the first embodiment. The description here is omitted.

4). About the Fourth Embodiment In the fourth embodiment of the present invention, a light shielding portion is formed on a transparent substrate, a wettability variable layer is formed on the light shielding portion, and a pixel portion is formed between the wettability variable layers. Color filter. This is an example in which a wettability variable layer is provided to form a pixel portion, and is one specific example of a color filter in which a wettability variable layer is provided at the boundary portion of the pixel portion described above. is there.

  FIG. 5 shows an example of the fourth embodiment of the present invention. In the color filter 1, a light shielding part 3 is formed on a transparent substrate 2, and a wettability variable layer 5 is formed on the light shielding part 3. Further, a pixel portion 6 is formed between the wettability variable layers 5. A protective layer 8 is formed so as to cover the upper side of the pixel portion 6 and the wettability variable layer 5. In this embodiment, since the wettability variable layer is formed in a pattern, the change in wettability of the wettability variable layer may be stimulated over the entire surface. It is not necessary to perform pattern irradiation of energy using the above, and the process can be simplified. Further, since the wettability variable layer 5 is formed only at the boundary portion of the pixel portion 6, the amount of use is extremely small. Therefore, it is effective when there is a problem in applying a large amount of the wettability changing layer on the color filter, such as being expensive.

  Here, the wettability variable layer 5 is preferably formed to have a width narrower than that of the light shielding portion 3. Since the width of the wettability variable layer 5 is narrower than the width of the light shielding portion 3, the width of the pixel portion 6 formed between the wettability variable layers 5 is larger than the width of the opening of the light shielding portion 3. Can do. This is because problems such as color loss can be prevented.

  In this embodiment, since the light shielding portion 3 and the pixel portion 6 are formed directly on the transparent substrate 2, the transparent substrate 2 is preferably ink-philic. In particular, when the pixel portion 6 is formed by adhering between the wettability variable layers 5 by an ink jet method, the more wettability on the transparent substrate 2 is the ink affinity, the more easily the ink spreads. It is difficult to cause defects such as unevenness. Therefore, also in the fourth embodiment, as in the third embodiment, the wettability on the transparent substrate 2 is preferably less than 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m.

  The material used in this embodiment is the same as that of the third embodiment with respect to the transparent substrate, and the other materials are the same as those of the first embodiment described above, so the description thereof is omitted here.

5). About the fifth embodiment In the fifth embodiment of the present invention, the wettability variable layer is formed on the light shielding portion forming portion, which is the portion where the light shielding portion on the transparent substrate is formed, and the light shielding portion is formed on the wettability variable layer. The color filter is formed, and a pixel portion is formed between the light shielding portions. This shows an example in which the wettability variable layer is provided to form the pixel portion and the light shielding portion, and is a specific example of the color filter in which the wettability variable layer is provided at the boundary portion of the pixel portion described above. One.

  FIG. 6 shows an example of the fifth embodiment of the present invention. In this color filter 1, the wettability variable layer 5 is formed in a pattern on the light-shielding portion forming portion 9, which is a portion where the light-shielding portion is formed on the transparent substrate 2, and the wettability variable layer formed in this pattern shape. On the transparent substrate 2 between 5, the pixel portion 6 is formed. Further, the light shielding portion 3 is formed on the wettability variable layer 5.

  In this embodiment, since the wettability variable layer is formed in a pattern, in order to change the wettability of the wettability variable layer, stimulation may be applied over the entire surface. At this time, it is not necessary to perform energy pattern irradiation using a mask or the like, and the process can be simplified. Similarly to the fourth embodiment, since the wettability variable layer 5 is formed only at the boundary portion of the pixel portion 6, in the case of this embodiment, only the light shielding portion forming portion 9, the amount of use is small. Therefore, it is effective when there is a problem in forming a large amount of wettability variable layer on the color filter.

  In this embodiment, as in the fourth embodiment, since the pixel portion 6 is formed directly on the transparent substrate 2, the transparent substrate 2 is preferably ink-philic. Therefore, also in the fifth embodiment, as in the third and fourth embodiments, the wettability on the transparent substrate 2 is preferably less than 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m.

  The material used in this embodiment is the same as that of the third embodiment with respect to the transparent substrate, and the other materials are the same as those of the first embodiment described above, so the description thereof is omitted here.

B. About the manufacturing method of a color filter Next, the manufacturing method of the color filter of this invention is demonstrated using some embodiments.

1. About 6th Embodiment 6th embodiment of this invention is a manufacturing method for manufacturing the color filter which is 1st embodiment in the said invention,
(1) forming a light shielding portion on a transparent substrate;
(2) A step of providing a photocatalyst-containing layer on the surface of the transparent substrate on which the light-shielding part is formed, in which the wettability of the energy irradiation part changes in a direction in which the liquid contact angle decreases;
(3) forming a pixel part exposure part by irradiating energy to the pixel part formation part, which is a part for forming the pixel part on the photocatalyst-containing layer;
(4) The pixel portion exposure portion is colored by an inkjet method to form a pixel portion.

(Description of each process)
FIG. 7 is a view for explaining each step of the sixth embodiment of the present invention. In this example, first, the light shielding portion 3 is formed on the transparent substrate 2 by a conventional method (FIG. 7A). The manufacturing method of this light-shielding part 3 is not specifically limited, For example, it forms by forming metal thin films, such as chromium about 1000-2000 mm in thickness by sputtering method, a vacuum evaporation method, etc., and patterning this thin film. The method etc. can be mentioned.

  Next, the photocatalyst containing layer 5 is formed on the transparent substrate 2 on which the light shielding portion 3 is formed (FIG. 7B). The photocatalyst-containing layer 5 is formed by dispersing a photocatalyst and a binder as described above in a solvent together with other additives as necessary to prepare a coating solution, and after applying this coating solution, hydrolysis, It is formed by advancing the polycondensation reaction to firmly fix the photocatalyst in the binder. As the solvent to be used, alcohol-based organic solvents such as ethanol and isopropylol are preferable, and the coating can be performed by a known coating method such as spin coating, spray coating, dip coating, roll coating, and bead coating.

  In this way, the transparent substrate 2 on which the photocatalyst containing layer 5 is formed is irradiated with a pattern 10 of energy 10 such as ultraviolet light using a photomask 11. Thereby, the pixel part exposure part 12 which made the pixel part formation part which is a site | part in which the pixel part on the photocatalyst content layer 5 is formed into the ink-philic area | region by the effect | action of the photocatalyst in the photocatalyst content layer 5 is formed. (FIG. 7C).

  Thus, when performing exposure using the photomask 11 for forming the pixel part exposure part 12, the width of the pixel part exposure part 12 formed by energy irradiation, that is, the width of the pixel part to be formed. However, it is preferable that the width of the opening formed by the light-shielding portion 3 is wider. By doing so, when the backlight is irradiated after the liquid crystal panel is completed, there is no possibility that the backlight passes through a portion where the pixel portion is not formed, and inconvenience such as color loss does not occur. Because.

  This energy irradiation can also be performed by exposing the entire surface from the transparent substrate 2 side as shown in FIG. When energy is irradiated to the entire surface from the transparent substrate 2 side, as is clear from FIG. 8, the light shielding portion 3 acts as a mask, and exposure is performed only on the portion without the light shielding portion 3. According to this method, energy irradiation can be performed without using a photomask or the like for forming the pixel portion, which can be said to be advantageous in terms of cost.

  In addition, when irradiating energy from the transparent substrate 2 side in this way, it is preferable to use a material that transmits energy to the transparent substrate 2. For example, when light containing ultraviolet light is used as energy, ultraviolet light such as quartz is used. It is preferable to use a material that transmits light.

  The ink 14 is ejected into the pixel exposure unit 12 which has become an ink-philic region by energy irradiation using the inkjet device 13 in the pixel exposure unit 12 thus formed. , Green, and blue (FIG. 7D). In this case, since the pixel unit exposure unit 12 is an ink-philic region having a small contact angle with the liquid due to energy irradiation as described above, the ink 14 ejected from the inkjet device 13 is used for the pixel unit. Spreads uniformly in the exposure unit 12. In addition, since the region of the photocatalyst containing layer that has not been exposed is an ink repellent region, the ink is repelled and removed in this region.

  The ink jet device used in the present invention is not particularly limited, but a method in which charged ink is continuously ejected and controlled by a magnetic field, a method in which ink is intermittently ejected using a piezoelectric element, and ink are used. An ink jet apparatus using various methods such as a method of heating and intermittently using the foaming can be used.

  Thus, the pixel part 6 is formed by solidifying the ink adhering in the pixel part exposure part 12 (FIG.7 (E)). In the present invention, the ink is solidified by various methods depending on the type of ink used. For example, water-soluble ink is solidified by removing water by heating or the like.

  Considering this ink solidification step, the ink used in the present invention is preferably a UV curable ink. This is because, in the case of a UV curable ink, it is possible to quickly solidify the ink by irradiating UV, so that the manufacturing time of the color filter can be shortened.

  As described above, since the ink in the pixel portion exposure unit 12 spreads uniformly, when the ink is solidified in this way, it is possible to form the pixel unit 6 free from color loss and color unevenness. And if necessary, you may provide a protective layer on this.

  By performing each of these steps, the color filter of the first embodiment of the present invention as shown in FIG. 1 can be manufactured.

(About ink-repellent protrusions)
In the sixth embodiment of the present invention, after the step of providing the photocatalyst-containing layer, the photocatalyst-containing layer on the light-shielding portion is irradiated with a pattern to form an ink-repellent convex exposed portion, and this ink-repellent convex portion is formed. You may make it have the process of forming an ink-repellent convex part in the part exposure part.

  The step of forming the ink repellent convex portion will be described with reference to FIG. In the same manner as the sixth embodiment shown in FIG. 7 described above, an ink-repellent convex mask is formed on a member in which the light-shielding portion 3 is formed on the transparent substrate 2 and the photocatalyst-containing layer 5 is formed so as to cover them. 15 is irradiated with energy (FIG. 9A). In this way, by exposing the pattern to energy through the ink repellent convex portion mask, the ink repellent convex portion exposed portion 16 is formed on the photocatalyst containing layer 5 on the light shielding portion.

  An ink-repellent convex ink 17 such as a UV curable resin monomer is attached to the ink-repellent convex exposure portion 16 by the inkjet device 13 (FIG. 9B). The method for applying the ink repellent convex ink is not limited to the method using an ink jet apparatus, and other methods such as dip coating can be used.

  Then, the ink-repellent convex portion 7 is formed on the surface of the photocatalyst containing layer 5 on the light shielding portion 3 by curing the ink-repellent convex portion ink 17 by UV irradiation or the like (FIG. 9C). The width of the ink-repellent convex portion 7 is preferably formed to be narrower than the width of the light-shielding portion 3 as shown in the drawing. This is because such a formation does not cause problems such as color loss as described above.

  By irradiating the entire surface with energy 10 or pattern irradiation from the photocatalyst containing layer 5 side to the member having the ink repellent convex portion 7 formed on the photocatalyst containing layer 5 in this manner, the ink repellent convex portion 7 is formed. Except for the formed part, the pixel part 6 is exposed to become a pixel part exposure part. Thereafter, in the same manner as described above, the ink part 14 is attached to this part using the ink jet device 13 and cured, whereby the pixel part 6 is cured. A color filter that is formed and provided with the ink-repellent convex portion 7 can be manufactured (FIGS. 9D, 9E, and 9F).

  In this method, since the photocatalyst-containing layer on the light-shielding portion is irradiated with a pattern to provide exposure for the ink-repellent convex portion, the ink-repellent convex portion can be formed with an arbitrary width. Therefore, by applying the ink-repellent convex ink here, an ink-repellent convex portion having an arbitrary width can be formed. Therefore, by adjusting the width of the ink repellent convex portion mask 15, the ink repellent convex portion 7 having a narrower width than the above-described light shielding portion 3 can be formed. By forming such an ink-repellent convex part 7 having a narrower width than the light-shielding part 3, the width of the pixel part 6 formed between the ink-repellent convex parts 7 is wider than the width of the opening of the light-shielding part 3. As described above, it is possible to obtain a color filter free from defects such as color loss.

  In this embodiment, the ink-repellent convex portions are formed by changing the wettability of the photocatalyst-containing layer. However, the present invention is not limited to this, and the ink-repellent convex portions are formed by, for example, photolithography. A part may be provided.

(Regarding the formation method of the pixel portion)
In the present invention, as in the sixth embodiment described above, the pixel portion 6 may be formed by one-time energy irradiation and ink adhesion to the exposure portion. The distance between the pixel portion exposure portions, which are ink-philic regions irradiated with energy upon attachment, is short. Therefore, there is a possibility that problems such as ink mixing may occur when the pixel portion is formed. As a method of avoiding such a problem, a method of performing energy irradiation and formation of a pixel portion as described below at least twice can be given.

  FIG. 10 shows an example in which energy irradiation and pixel portion formation are performed in two steps. In the same manner as the example shown in FIG. 7 described above, the light shielding part 3 is formed on the transparent substrate 2, and the mask 11 ′ is formed on the member on which the photocatalyst containing layer 5 is formed on the transparent substrate 2 so as to cover the light shielding part 3. Is used to irradiate energy 10 so that a pixel portion is formed at every other pixel portion forming portion to form a pixel portion forming exposure portion 12 (FIG. 10A). By attaching the ink 14 to the pixel unit exposure unit 12 using the inkjet device 13 (FIG. 10B), the pixel unit 6 is formed in every other portion of the pixel unit formation unit (FIG. 10 ( C)). Note that the pixel portion formed here is preferably ink-repellent in order to prevent the second ink jet device from coloring the ink on the pixel portion, and the surface of the pixel portion is preferably made of a silicone compound or the like. You may make it process with ink repellent processing agents, such as a fluorine-containing compound.

  Then, by irradiating energy 10 again from the photocatalyst containing layer 5 side where every other pixel unit 6 is formed, the pixel unit forming unit between the pixel units 6 is exposed to form a pixel unit forming exposure unit 12. A color filter can be obtained by attaching the ink 14 using the ink jet device 15 (FIG. 10D).

  According to this method, the distance between the pixel portions can be reduced or eliminated, so that a colored layer (an aggregate of pixel portions) having excellent smoothness can be formed. Further, when forming the first pixel portion, since the space between the formed pixel portions is wide, ink does not mix beyond this portion. Accordingly, it is possible to obtain a high-quality color filter free from ink color mixing.

  In the above-described method, every other pixel portion 6 is formed at the first time. However, the present invention is not limited to this, and the pixel portion formed first may not be adjacent. For example, the shape may be changed depending on the shape of the pixel portion of the color filter, such as a staggered pattern. In the above description, the pixel portion is formed in two steps. However, if necessary, the pixel portion may be formed three or more times.

(About energy to irradiate)
In the present invention, light including ultraviolet light can be used as the energy applied to the photocatalyst-containing layer. Examples of such a light source including ultraviolet light include a mercury lamp, a metal halide lamp, and a xenon lamp. The wavelength of light used for this exposure can be set within a range of 400 nm or less, preferably 380 nm or less, and the amount of light irradiation during the exposure is determined by the action of the photocatalyst at the exposed site. The irradiation dose required for expression can be obtained.

  When pattern irradiation is necessary during energy irradiation, it can be performed by pattern irradiation through a photomask using a light source as described above, but as another method, using a laser such as excimer or YAG It is also possible to use a pattern irradiation method. However, such a method may have problems such as an expensive apparatus, difficult handling, and inability to perform continuous output.

  Therefore, in the present invention, the photocatalytic reaction initiation energy is added to the photocatalyst-containing layer, and the pattern of the ink-philic region is formed by adding the reaction rate increasing energy in a pattern to the region where the photocatalytic reaction initiation energy is added. You may make it form. By forming a pattern using such an energy irradiation method, it is possible to use a reaction rate increasing energy that is relatively inexpensive and easy to handle, such as an infrared laser, during pattern formation. This is because no problem occurs.

  The reason why the ink-philic region pattern having changed wettability can be formed by applying such energy is as follows. That is, the photocatalytic reaction initiation energy is first applied to the region where the pattern is formed, thereby starting the catalytic reaction of the photocatalyst with respect to the photocatalyst containing layer. And reaction rate increase energy is added in the area | region where this photocatalytic reaction start energy was added. By adding the reaction rate increasing energy in this way, the photocatalytic reaction initiation energy is already added, and the reaction in the photocatalyst containing layer in which the reaction is initiated by the catalytic action of the photocatalyst is rapidly accelerated. Then, by adding the reaction rate increasing energy for a predetermined time, the change of the property in the property changing layer is changed to a desired range, and the pattern to which the reaction rate increasing energy is added is changed to the ink-philic region having changed wettability. It can be a pattern.

a. Photocatalytic reaction initiation energy The photocatalytic reaction initiation energy used in this energy irradiation method refers to the energy with which the photocatalyst initiates a catalytic reaction for changing the characteristics of the compound in the photocatalyst containing layer.

  The amount of photocatalytic reaction initiation energy added here is an amount that does not cause a sudden change in wettability in the photocatalyst-containing layer. When the amount of photocatalytic reaction initiation energy added is small, it is not preferable because the sensitivity at the time of forming a pattern by adding reaction rate increasing energy is lowered, and when this amount is too large, the photocatalyst added with photocatalytic reaction initiation energy is not preferable. It is not preferable because the degree of change in the characteristics of the containing layer becomes too large and the difference from the region to which the reaction rate increasing energy is added becomes unclear. The amount of energy to be added is determined by conducting a preliminary experiment or the like in advance on the amount of energy to be added and the amount of change in wettability in the photocatalyst containing layer.

  The photocatalytic reaction initiation energy in this method is not particularly limited as long as it is an energy capable of initiating the photocatalytic reaction, but light is particularly preferable.

  The photocatalyst used in the present invention has a different wavelength of light for initiating a catalytic reaction depending on its band gap. For example, cadmium sulfide has a visible light of 496 nm and iron oxide has a light of 539 nm, and titanium dioxide has an ultraviolet light of 388 nm. Therefore, any light, whether visible light or ultraviolet light, can be used in the present invention. However, as described above, titanium dioxide is preferably used as the photocatalyst because it is effective as a photocatalyst because of its high band gap energy, is chemically stable, has no toxicity, and is easily available. Light including ultraviolet light that initiates the catalytic reaction of titanium is preferable. Specifically, it is preferable that ultraviolet light in a range of 400 nm or less, preferably 380 nm or less is included.

  Examples of light sources including such ultraviolet light include various ultraviolet light sources such as mercury lamps, metal halide lamps, xenon lamps, and excimer lamps.

  In the present invention, this photocatalytic reaction initiation energy may be added to a part of the photocatalyst-containing layer. For example, this photocatalytic reaction initiation energy is added in a pattern, and the reaction rate increase energy described later is also patterned. In addition, it is possible to form a pattern of the ink-philic region having changed wettability. However, for reasons such as simplification and simplification of the process, this photocatalytic reaction initiation energy is applied over the entire region where the pattern is formed. It is preferable to add the reaction rate increasing energy to the region where the photocatalytic reaction initiation energy is applied over the entire surface in this manner, thereby forming a pattern of the ink-philic region on the photocatalyst-containing layer. Is preferred.

b. About reaction rate increase energy Next, the reaction rate increase energy used for this method is demonstrated. The reaction rate increasing energy used in this method refers to energy for increasing the reaction rate of the reaction for changing the wettability of the photocatalyst containing layer initiated by the photocatalytic reaction initiation energy. In the present invention, any energy having such an action can be used, but thermal energy is preferably used.

  The method of applying such thermal energy to the photocatalyst containing layer in a pattern is not particularly limited as long as it can form a heat pattern on the photocatalyst containing layer, but it is not limited to a method using an infrared laser or a thermal head. The method etc. can be mentioned. As such an infrared laser, for example, an infrared YAG laser (1064 nm) having an advantage of strong directivity and a long irradiation distance, and a diode laser (LED; 830 nm, 1064 nm, 1100 nm) having an advantage of being relatively inexpensive. In addition to the above, a semiconductor laser, a He—Ne laser, a carbon dioxide laser, and the like can be given.

  In this method, by adding the photocatalytic reaction initiation energy described above, the photocatalyst is activated to initiate a change in wettability due to the catalytic reaction in the photocatalyst-containing layer, and the reaction rate at the portion where the change in wettability occurs. By increasing the energy to promote the catalytic reaction of the part, the pattern of the ink-philic region is formed by the difference in the reaction rate between the region where the reaction rate increase energy is added and the region where the reaction rate increase energy is not added. Can do.

2. About the seventh embodiment The seventh embodiment of the present invention is one of the manufacturing methods for manufacturing the color filter according to the second embodiment of the present invention,
(1) A step of providing a photocatalyst-containing layer on the transparent substrate in which the wettability of the energy irradiation portion changes in a direction in which the contact angle with the liquid decreases;
(2) forming a light-shielding part exposure part by irradiating energy to the light-shielding part forming part which is a part where the light-shielding part on the transparent substrate is formed;
(3) a step of providing a light shielding part in the light shielding part exposure part;
(4) forming a pixel portion exposure portion by irradiating energy to the transparent substrate provided with the light shielding portion;
(5) The pixel portion exposure portion is colored by an inkjet method to form a pixel portion.

  FIG. 11 is for explaining each process of the seventh embodiment of the present invention. As shown in FIG. 11A, first, the photocatalyst containing layer 5 is formed on the transparent substrate 2. The formation of the photocatalyst-containing layer 5 can be performed in the same manner as in the sixth embodiment described above.

  Next, the light shielding part forming part of the photocatalyst containing layer 5 is irradiated with a pattern of energy 10 using the light shielding part photomask 19 to form the light shielding part exposure part 20. The light-shielding part exposure part 20 is a part where the contact angle with the liquid is lowered by the action of the photocatalyst in the photocatalyst-containing layer 5, and forms an ink-philic region. (FIG. 11B).

  The energy 10 is the same as that in the sixth embodiment, and includes not only ultraviolet light but also other energy.

  Then, after the light shielding part paint 21 is attached to the light shielding part exposure part 20 by the ink jet device 13, it is cured to form the light shielding part 3 (FIG. 11C). The application of the light shielding part coating 21 onto the light shielding part exposure part 20 can be performed by a known application method such as spray coating, dip coating, roll coating, bead coating, etc., in addition to the method using the ink jet apparatus. In this case, the applied light shielding part coating material 10 is removed by repelling in the ink repellent area of the photocatalyst containing layer 5 other than the light shielding part exposure part 20 having a high contact angle with the liquid, and is in contact with the liquid. It selectively adheres only to the light shielding part exposure part 20 which is an ink-philic area having a low corner.

  Further, the light shielding portion 3 may be formed by a vacuum thin film forming method. That is, a metal thin film is formed on the photocatalyst containing layer 5 after exposure by vapor deposition or the like, and the difference in adhesive strength between the photocatalyst containing layer 5 other than the light shielding part exposure part 20 and the light shielding part exposure part 20 is utilized. Then, the light shielding portion 3 can be formed by patterning by peeling using a pressure-sensitive adhesive tape, solvent treatment, or the like.

  Next, the energy 10 is irradiated on the entire surface or pattern of the photocatalyst containing layer 5 on which the light shielding portion 3 is formed. As a result, the portion where the light shielding portion 3 is not formed becomes a pixel portion exposure portion in the ink-philic region by the action of the photocatalyst in the photocatalyst containing layer 5 (FIG. 11D).

  Next, the inkjet device 13 ejects the ink 14 into the pixel portion exposure portion that has become an ink-philic region by exposure, and colors the red, green, and blue colors, respectively (FIG. 11E). As described above, since the partial exposure portion is an ink-philic region having a small contact angle with the liquid by irradiation of energy, the ink 14 ejected from the inkjet device 13 spreads uniformly in the pixel portion exposure portion. .

  In this way, the pixel portion 6 is formed between the light shielding portions 3 by solidifying the ink adhered in the pixel portion exposure portion 11 (FIG. 11F). If necessary, a protective layer may be formed thereon.

  When the color filter is manufactured by such a method, as described above, the ink in the pixel unit exposure unit 11 spreads uniformly, so that when the ink 14 is solidified, the pixel unit 5 having no color loss or color unevenness is formed. It can be formed and a high quality color filter can be obtained.

3. About the Eighth Embodiment The eighth embodiment of the present invention is another method of manufacturing the color filter according to the second embodiment of the present invention,
(1) A step of providing a photocatalyst-containing layer on the transparent substrate in which the wettability of the energy irradiation part changes in a direction in which the contact angle of the liquid decreases;
(2) forming a pixel portion exposure portion by pattern irradiating energy to a pixel portion forming portion which is a portion where the pixel portion on the transparent substrate is formed;
(3) Coloring the pixel portion exposure portion by an ink jet method to form a pixel portion;
(4) irradiating energy to the photocatalyst containing layer at least in the boundary portion of the pixel portion;
(5) including a step of forming a light shielding portion at a boundary portion of the pixel portion irradiated with the energy.

  FIG. 12 is for explaining the eighth embodiment. As in the seventh embodiment, first, the transparent substrate 2 having the photocatalyst containing layer 5 formed on one side is formed (FIG. 12A). . From the side of the transparent substrate 2 on which the photocatalyst-containing layer 5 is formed, energy 10 is pattern-irradiated through a mask 11 (FIG. 12B). Ink 14 is attached to the pixel portion exposure portion that has been irradiated with energy and becomes an ink-philic region using the inkjet device 13 to form the pixel portion 6 (FIG. 12C).

  In forming the pixel portion 6, the method of forming the energy irradiation and forming the pixel portion in two or more steps as described in the sixth embodiment may be used. This is because when the pixel portion 6 is formed, the ink repellency region between the pixel portions 6 is narrow, so that ink may be mixed.

  The surface on which the pixel portion 6 is formed in this manner is irradiated with energy 10 over the entire surface or in a pattern to change the ink repellency region between the pixel portions 6 into an ink-philic region (FIG. 12D). Then, the light shielding part 3 can be formed by attaching the light shielding part paint 21 to the boundary part of the pixel part 6 by, for example, the ink jet device 13 (FIG. 12E) and curing (FIG. 12 ( F)). And a color filter can be obtained by forming a protective layer on the surface as needed.

  Since the energy, ink jet device, and various inks used here are the same as those in the sixth embodiment described above, description thereof is omitted here.

4). About the ninth embodiment The ninth embodiment of the present invention is a manufacturing method for manufacturing a color filter according to the third embodiment of the present invention,
(1) A photocatalyst-containing layer in which the wettability of the energy irradiation portion on the transparent substrate changes in a direction in which the contact angle with the liquid decreases is applied to the pixel portion forming portion which is a portion where the pixel portion on the transparent substrate is formed. Providing, and
(2) providing a light shielding portion at a boundary portion of the pixel portion forming portion provided with the photocatalyst-containing layer;
(3) irradiating the photocatalyst-containing layer with energy to form a pixel portion exposure portion;
(4) The pixel portion exposure portion is colored by an inkjet method to form a pixel portion.

  This method will be described with reference to FIG. First, the photocatalyst containing layer 5 is formed at a site where the pixel portion is formed on the transparent substrate 2. That is, in this method, first, the photocatalyst containing layer 5 is formed in a pattern on the transparent substrate. As a method for forming the photocatalyst-containing layer in a pattern like this, for example, a method using a photosensitive sol-gel solution and a method using printing, a method using printing, and the like can be given.

  For example, an ink jet device or the like is used for a portion (light shielding portion forming portion) where the photocatalyst containing layer 5 is not formed on the transparent substrate 2 on which the photocatalyst containing layer 5 thus formed is formed. Thus, the light shielding part 3 is formed. At this time, the wettability of the surface of the transparent substrate 2 is ink-philic compared to the wettability of the surface of the photocatalyst containing layer 5. Therefore, when forming the light-shielding part 3, the light-shielding part coating or the like does not adhere to the photocatalyst-containing layer exhibiting ink repellency, and only the light-shielding part forming part on the transparent substrate 2 is attached to form the light-shielding part. Is done.

  In the present embodiment, the wettability on the transparent substrate 2 is preferably ink-philic, and specifically, the contact angle with a liquid having a surface tension of 40 mN / m is preferably less than 10 degrees. Preferably, the contact angle with a liquid having a surface tension of 40 mN / m is 5 degrees or less, particularly preferably 1 degree or less.

  After the light shielding portion 3 is formed in this way, energy is irradiated to the photocatalyst containing layer 5 to make this portion an ink-philic region. Then, the color filter can be formed by forming the pixel portion 6 on the photocatalyst-containing layer as the ink-philic region using an inkjet device or the like, and further forming a protective layer as necessary.

  Also in this embodiment, the energy to be irradiated, the ink jet device, and various inks are the same as those in the embodiment described above, and thus the description thereof is omitted here.

5). About the tenth embodiment The tenth embodiment of the present invention is a manufacturing method for manufacturing a color filter according to the fourth embodiment of the present invention,
(1) forming a light shielding portion on a transparent substrate;
(2) A step of providing a photocatalyst-containing layer on the upper surface of the light-shielding portion in which the wettability of the energy irradiation portion changes in a direction in which the liquid contact angle decreases;
(3) A step of coloring the pixel portion forming portion which is a portion where the pixel portion on the transparent substrate not provided with the photocatalyst-containing layer is formed by an inkjet method to form the pixel portion.

  This method will be described with reference to FIG. First, the light shielding part 3 is formed on the transparent substrate 2 (FIG. 13A). Next, the photocatalyst containing layer 5 is formed in a pattern on the light shielding portion 3 (FIG. 13B). Here, since the method for forming the light-shielding portion 3 and the photocatalyst-containing layer 5 in a pattern is the same as in the above-described embodiment, the description thereof is omitted here.

  Here, in this embodiment, it is preferable that the width of the photocatalyst-containing layer 5 is narrower than the width of the light shielding layer 3. By forming the photocatalyst-containing layer 5 to be narrower than the light-shielding layer 3, the width of the pixel portion formed between the photocatalyst-containing layers 5 in the subsequent process is reduced to the opening formed by the light-shielding portion 3. This is because problems such as color loss are less likely to occur as described above.

  And the pixel part 6 is formed by making the ink 14 adhere between the said photocatalyst containing layers using the inkjet apparatus 13 (FIG.13 (C)). At this time, since the ink 14 is directly attached to the transparent substrate 2, it is preferable that the transparent substrate 2 is an ink-philic region, specifically, contact with a liquid having a surface tension of 40 mN / m. The angle is preferably less than 10 degrees, more preferably 5 degrees or less, particularly preferably 1 degree or less, as a contact angle with a liquid having a surface tension of 40 mN / m. In this way, by setting the transparent substrate 2 as the ink-philic region, the ink 14 is uniformly distributed on the transparent substrate, and problems such as color unevenness do not occur.

  As described above, after the pixel portion 6 is formed, the energy 10 is irradiated on the side where the pixel portion 6 is formed (FIG. 13D), so that the protective layer 8 provided as necessary can be easily formed. (FIG. 13E).

  Also in this embodiment, the energy to be irradiated, the ink jet device, and various inks are the same as those in the embodiment described above, and thus the description thereof is omitted here.

6). About the eleventh embodiment The eleventh embodiment of the present invention is a manufacturing method for manufacturing a color filter according to the fifth embodiment of the present invention,
(1) A step of providing a photocatalyst-containing layer on the transparent substrate where the wettability of the energy-irradiated portion changes in the direction in which the liquid contact angle decreases, in the light-shielding portion forming portion that is a portion where the light-shielding portion on the transparent substrate is formed. When,
(2) Coloring the portion where the photocatalyst containing layer on the transparent substrate is not formed by an inkjet method to form a pixel portion;
(3) irradiating energy to at least the photocatalyst-containing layer;
(4) forming a light shielding layer on the photocatalyst containing layer irradiated with the energy.

  This method will be described with reference to FIG. 6. First, the photocatalyst containing layer 5 is formed in a pattern on the transparent substrate 2. The method for forming the photocatalyst-containing layer 5 in a pattern can be performed by the method used in the ninth embodiment. The position where the photocatalyst containing layer 5 is formed is a light shielding part forming part 9 which is a part where the light shielding part 3 is formed. Next, the pixel portion 6 is formed by attaching ink to a portion where the photocatalyst containing layer 5 is not formed, that is, a pixel portion forming portion where the pixel portion is formed, using an inkjet device or the like. At this time, for the same reason as in the tenth embodiment, the wettability on the transparent substrate is preferably an ink-philic region. Specifically, the contact angle with a liquid having a surface tension of 40 mN / m is 10. The contact angle with a liquid having a surface tension of 40 mN / m is more preferably 5 degrees or less, and particularly preferably 1 degree or less.

  Then, after the photocatalyst containing layer 5 is made ink-philic by energy irradiation, the light shielding portion 3 is formed on the photocatalyst containing layer 5. Finally, a protective layer 8 is formed as necessary.

  In this embodiment, the energy described in the other embodiments described above can be used for the energy to be irradiated, the ink jet device used, and various inks.

C. A color liquid crystal panel is formed by combining the color filter thus obtained for the color liquid crystal panel and a counter substrate facing the color filter and enclosing a liquid crystal compound therebetween. The color liquid crystal panel thus obtained has the advantages of the color filter of the present invention, that is, has no color loss or color loss and is advantageous in terms of cost.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

  Hereinafter, the present invention will be described in more detail through examples.

[Example 1]
1. Formation of a photocatalyst-containing layer 30 g of isopropyl alcohol and 0.4 g of MF-160E (manufactured by Tochem Products Co., Ltd.) and 3 g of trimethoxymethylsilane (manufactured by Toshiba Silicone Co., Ltd., TSL8113), 20 g of ST-K01 (manufactured by Ishihara Sangyo Co., Ltd.), which is a titanium oxide aqueous dispersion that is a photocatalyst, was mixed and stirred at 100 ° C. for 20 minutes. This was diluted 3 times with isopropyl alcohol to obtain a composition for a photocatalyst-containing layer.

  The composition was applied onto a soda glass transparent substrate with a spin coater and dried at 150 ° C. for 10 minutes to form a transparent photocatalyst-containing layer (thickness 0.2 μm).

2. Confirmation of formation of ink-philic region by exposure Pattern exposure is performed on this photocatalyst-containing layer with a mercury lamp (wavelength 365 nm) at an illuminance of 70 mW / cm ² through a mask for 50 seconds to form an exposed portion, an unexposed portion and an exposed portion The contact angle between the part and the liquid was measured. In the non-exposed area, a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science Co., Ltd.) is used for the contact angle with a liquid having a surface tension of 30 mN / m (manufactured by Junsei Chemical Co., Ltd., ethylene glycol monoethyl ether). As a result of measurement (30 seconds after dropping a droplet from the microsyringe), it was 30 degrees. In the exposed area, the contact angle with a liquid having a surface tension of 50 mN / m (manufactured by Junsei Co., Ltd., wetting index standard solution No. 50) was measured in the same manner, and as a result, it was 7 degrees. As described above, it was confirmed that the exposed portion became an ink-philic region, and a pattern could be formed due to the difference in wettability between the exposed portion and the non-exposed portion.

3. Formation of light shielding part Next, a photocatalyst containing layer was formed on the same transparent substrate in the same manner as described above. This photocatalyst-containing layer was exposed (50 seconds at an illuminance of 70 mW / cm ² ) with a mercury lamp (wavelength 365 nm) through a mask for a light-shielding part provided with a matrix-like open pattern (opening line width 30 μm), The light shielding part exposure part was defined as an ink-philic area (7 degrees or less in terms of a contact angle with a liquid having a surface tension of 50 mN / m).

On the other hand, a mixture having the following composition was heated to 90 ° C. for dissolution, centrifuged at 12,000 rpm, and then filtered through a 1 μm glass filter. To the resulting aqueous colored resin solution, 1% by weight of ammonium dichromate was added as a crosslinking agent to prepare a coating material for light shielding part.
Carbon black (Mitsubishi Chemical Co., Ltd. # 950) 4 parts by weight Polyvinyl alcohol 0.7 parts by weight (Nippon Gosei Co., Ltd. Gohsenol AH-26)
-Ion-exchanged water: 95.3 parts by weight Next, the light-shielding part coating material was applied onto the entire surface of the photocatalyst-containing layer with a blade coater. The coating material for the light shielding part thus applied was repelled by the non-exposed part of the photocatalyst-containing layer and selectively adhered only to the light shielding part exposed part. Thereafter, drying was performed at 60 ° C. for 3 minutes, and exposure with a mercury lamp was performed to cure the light-shielding portion coating material, followed by heat treatment at 150 ° C. for 30 minutes to form a light-shielding portion.

4). Formation of Pixel Part Next, the entire surface of the photocatalyst-containing layer on which the light shielding part was formed was exposed to make the pixel part exposure part ink-philic. Next, using an inkjet apparatus, the RGB curable polyfunctional acrylate monomer ink containing 5 parts by weight of a pigment, 20 parts by weight of a solvent, 5 parts by weight of a polymerization initiator, and 70 parts by weight of a UV curable resin is treated with an ink-philic property. It was made to adhere and color to the exposure part for pixel parts made above, and this was UV-processed and hardened. Here, for each of the red, green and blue inks, the solvent is polyethylene glycol monomethyl ethyl acetate, the polymerization initiator is Irgacure 369 (trade name, manufactured by Ciba Specialty Chemicals Co., Ltd.), and the UV curable resin. DPHA (dipentaerythritol hexaacrylate (manufactured by Nippon Kayaku Co., Ltd.)) was used, and CI Pigment Red 177 for red ink, CI Pigment Green 36 for green ink, and CI Pigment Green 36 for blue ink. Pigment Blue 15 + CI Pigment Violet 23 was used.

5. Formation of a protective layer As a protective layer, a two-component mixed thermosetting agent (SS7265 manufactured by Nippon Synthetic Rubber Co., Ltd.) is applied by a spin coater, cured at 200 ° C. for 30 minutes to form a protective layer, and a color filter Got. The obtained color filter was of a high quality with no color loss or color unevenness in the pixel portion.

[Example 2]
1. Formation of Photocatalyst-Containing Layer A photocatalyst-containing layer similar to that of Example 1 was formed in the same manner on a transparent substrate on which a light-shielding layer was formed of chromium by a sputtering method.

2. Next, pattern exposure is performed for 50 seconds with a mercury lamp (wavelength 365 nm, 70 mW / cm ² ) from the photocatalyst containing layer side through a pixel portion mask, and the pixel portion exposure portion is changed to an ink-philic region (surface 7 degrees or less in terms of a contact angle with a liquid having a tension of 50 mN / m.

  In this pixel portion exposure portion, an RGB curable polyfunctional acrylate monomer ink for each color of RGB including 5 parts by weight of a pigment, 20 parts by weight of a solvent, 5 parts by weight of a polymerization initiator, and 70 parts by weight of a UV curable resin is used by using an inkjet device. Was attached to an exposure portion for a pixel portion having an affinity for ink and colored, and this was subjected to UV treatment and cured. Here, for each of the red, green and blue inks, the solvent is polyethylene glycol monomethyl ethyl acetate, the polymerization initiator is Irgacure 369 (trade name, manufactured by Ciba Specialty Chemicals Co., Ltd.), and the UV curable resin. DPHA (dipentaerythritol hexaacrylate (manufactured by Nippon Kayaku Co., Ltd.)) was used as the pigment, CI Pigment Red 177 for red ink, CI Pigment Green 36 for green ink, Pigment Blue 15 + CI Pigment Violet 23 was used.

3. Formation of a protective layer As a protective layer, a two-component mixed thermosetting agent (SS7265 manufactured by Nippon Synthetic Rubber Co., Ltd.) is applied by a spin coater, cured at 200 ° C. for 30 minutes to form a protective layer, and a color filter Got. The obtained color filter was of a high quality having no color loss or uneven color in the pixel portion as in the first embodiment.

[Example 3]
1. Formation of Photocatalyst Containing Layer 3 g of isopropyl alcohol, fluoroalkylsilane (manufactured by Tochem Products); MF-160E (trade name), N- [3- (trimethoxysilyl) propyl] -N-ethylperfluorooctanesulfonamide 0.014 g of isopropyl ether (solution of Ishihara Sangyo Co., Ltd .; STS-01 (trade name)) 2 g, silica sol (manufactured by Nippon Synthetic Rubber Co., Ltd .; Glasca HPC 7002 (trade name)) 0 .6 g and alkyl alkoxysilane (manufactured by Nippon Synthetic Rubber Co., Ltd .; HPC402II (trade name)) 0.2 g were mixed and stirred at 100 ° C. for 20 minutes. This solution was coated on a non-alkali glass substrate having a thickness of 0.7 mm by a spin coating method to obtain a photocatalyst-containing layer having a thickness of 0.15 μm.

2. Confirmation of formation of ink-philic region by exposure and reduction of fluorine content UV irradiation was performed on the surface of this photocatalyst-containing layer with a super high pressure mercury lamp through a lattice-like photomask at an illuminance of 70 mW / cm ² (365 nm) for 2 minutes. As a result of measuring the contact angle to n-octane (surface tension 21 mN / m) with a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science), the unexposed area was 52 degrees, while the exposed area was It was 0 degrees.

  Elemental analysis was performed on the unexposed area and the exposed area using an X-ray photoelectron spectrometer (ESCALAB220-I-XL manufactured by V. G. Sientific). When the results obtained by quantitative calculation using Shary's background correction and Scofield's relative sensitivity coefficient correction are shown as relative values by weight when titanium (Ti) is 100, the unexposed area is titanium (Ti). Whereas 100 (fluorine (F) 1279), the exposed area was fluorine (F) 6 with respect to titanium (Ti) 100.

  From these results, it was found that by exposing the photocatalyst-containing layer, the ratio of fluorine on the surface of the photocatalyst-containing layer was reduced, thereby changing the surface from ink repellency to ink repellency.

It is a schematic sectional drawing which shows an example of the 1st embodiment of the color filter of this invention. It is a schematic sectional drawing which shows the other example of the 1st embodiment of the color filter of this invention. It is a schematic sectional drawing which shows an example of the 2nd embodiment of the color filter of this invention. It is a schematic sectional drawing which shows an example of the 3rd embodiment of the color filter of this invention. It is a schematic sectional drawing which shows an example of the 4th embodiment of the color filter of this invention. It is a schematic sectional drawing which shows an example of the 5th embodiment of the color filter of this invention. It is process drawing for demonstrating the 6th embodiment of the manufacturing method of the color filter of this invention. FIG. 8 is a schematic diagram for explaining another example of an exposure method for a pixel portion in the method for manufacturing the color filter shown in FIG. 7. FIG. 8 is a process diagram for explaining a method for producing an ink-repellent convex portion in the method for producing a color filter shown in FIG. 7. FIG. 8 is a process diagram for explaining another example of the method for manufacturing the pixel portion in the method for manufacturing the color filter shown in FIG. 7. It is process drawing for demonstrating the 7th embodiment of the manufacturing method of the color filter of this invention. It is process drawing for demonstrating the 8th embodiment of the manufacturing method of the color filter of this invention. It is process drawing for demonstrating the 10th embodiment of the manufacturing method of the color filter of this invention.

Explanation of symbols

1 ... Color filter,
2 ... Transparent substrate,
3 ... light shielding part 4 ... pixel part formation part,
5 ... wettability variable layer (photocatalyst containing layer),
6 ... Pixel part,
7: Ink-repellent convex part,
9: Shading part forming part,
10 ... Energy.

Claims (42)

  A transparent substrate, a pixel portion provided with a plurality of colors in a predetermined pattern on the transparent substrate by an ink jet method, a light shielding portion provided at a boundary portion of the pixel portion, and the pixel portion or the pixel portion and the light shielding portion A color filter comprising: a wettability variable layer that is provided for forming the wettability and can change wettability.   The color filter according to claim 1, wherein at least the pixel portion is provided on the wettability variable layer.   The light shielding part is formed on the transparent substrate, and the wettability variable layer is provided at least on the light shielding part and a pixel part forming part that is a part where the pixel part is formed on the transparent substrate. The color filter according to claim 2, wherein the pixel portion is provided on a wettability variable layer.   The color filter according to claim 3, wherein a width of the pixel portion formed on the wettability variable layer is wider than a width of an opening formed by the light shielding portion.   5. The color filter according to claim 3, wherein an ink-repellent convex portion is formed on a surface of the wettability variable layer provided on the light shielding portion.   6. The color filter according to claim 5, wherein a width of the ink-repellent convex portion is narrower than a width of the light shielding portion.   3. The color filter according to claim 2, wherein a wettability variable layer is formed on the transparent substrate, and a pixel portion and a light-shielding portion are provided at predetermined portions on the wettability variable layer.   The light shielding portion is provided on the transparent substrate, and a wettability variable layer is provided in a pixel portion forming portion which is a portion where the pixel portion on the transparent substrate is formed, and the pixel portion is provided on the wettability variable layer. The color filter according to claim 2, wherein the color filter is formed.   The color filter according to claim 1, wherein the wettability variable layer is provided at a boundary portion of the pixel portion.   10. The light shielding portion is formed on the transparent substrate, the wettability variable layer is formed on the light shielding portion, and the pixel portion is formed between the wettability variable layers. The color filter described.   The color filter according to claim 10, wherein the wettability variable layer has a width narrower than that of the light shielding portion.   The wettability variable layer is formed in a light shielding portion forming portion, which is a portion where the light shielding portion is formed on the transparent substrate, and the light shielding portion is formed on the wettability variable layer, and the pixel is interposed between the light shielding portions. The color filter according to claim 9, wherein a portion is formed.   The color filter according to any one of claims 8 to 12, wherein the wettability on the transparent substrate is less than 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m. .   The wettability variable layer is a photocatalyst-containing layer comprising at least a photocatalyst and a binder, and the wettability variable layer is a layer whose wettability changes so that a contact angle with a liquid is reduced by energy irradiation. The color filter according to any one of claims 1 to 13.   The photocatalyst-containing layer contains fluorine, and when the photocatalyst-containing layer is irradiated with energy, the photocatalyst-containing layer has a fluorine content on the surface of the photocatalyst-containing layer that is reduced by the action of the photocatalyst as compared with that before energy irradiation. The color filter according to claim 14, wherein a content layer is formed.   The photocatalyst-containing layer is irradiated with energy, and the fluorine content at the site where the fluorine content is reduced is 10 or less when the fluorine content of the portion not irradiated with energy is 100. The color filter according to claim 15. The photocatalyst is composed of titanium oxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), bismuth oxide (Bi ₂ O ₃ ), and oxide. The color filter according to any one of claims 14 to 16, wherein the color filter is one or more substances selected from iron (Fe ₂ O ₃ ). The color filter according to claim 17, wherein the photocatalyst is titanium oxide (TiO ₂ ).   When the fluorine content on the surface of the photocatalyst containing layer is analyzed and quantified by X-ray photoelectron spectroscopy, when the Ti element is set to 100, the fluorine element is in a ratio of 500 or more to the photocatalyst containing layer surface. The color filter according to claim 18, further comprising a photocatalyst-containing layer contained in the color filter.   The color filter according to any one of claims 14 to 19, wherein the binder is an organopolysiloxane having a fluoroalkyl group. The binder is Y _n SiX _(4-n) (wherein Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, X represents an alkoxyl group or a halogen, and n represents It is an integer from 0 to 3.) It is an organopolysiloxane which is one kind or two or more kinds of hydrolysis condensates or co-hydrolysis condensates of silicon compounds represented by The color filter according to any one of claims 19 to 19.   The color filter according to claim 21, wherein a silicon compound containing a fluoroalkyl group in the silicon compound constituting the organopolysiloxane is contained in an amount of 0.01 mol% or more.   A contact angle with a liquid having a surface tension of 40 mN / m on the photocatalyst-containing layer is 10 degrees or more in a portion not irradiated with energy and less than 10 degrees in a portion irradiated with energy. The color filter according to any one of claims 14 to 22.   24. The pixel portion colored by the inkjet method is a pixel portion colored by an inkjet method using a UV curable ink, according to any one of claims 1 to 23. Color filter. (1) forming a light shielding portion on a transparent substrate;
(2) A step of providing a photocatalyst-containing layer on the surface of the transparent substrate on which the light-shielding part is formed, in which the wettability of the energy irradiation part changes in a direction in which the liquid contact angle decreases;
(3) forming a pixel part exposure part by irradiating energy to the pixel part formation part, which is a part for forming the pixel part on the photocatalyst-containing layer;
(4) A method for producing a color filter, comprising: coloring the exposure portion for pixel portion by an inkjet method to form a pixel portion.   After the step of providing the photocatalyst-containing layer, the photocatalyst-containing layer on the light-shielding portion is irradiated with a pattern to form an ink-repellent convex exposure portion, and the ink-repellent convex exposure portion is exposed to the ink-repellent convex portion. The method for producing a color filter according to claim 25, further comprising a step of forming a portion.   26. The method of manufacturing a color filter according to claim 25, wherein in the step of forming the pixel portion exposure portion, the pixel portion exposure portion is formed by exposing from the transparent substrate side using the light shielding portion as a mask. (1) A step of providing a photocatalyst-containing layer on the transparent substrate in which the wettability of the energy-irradiated portion is changed in a direction in which the contact angle with the liquid is reduced by energy irradiation;
(2) forming a light shielding part exposure part by pattern irradiating energy on a light shielding part forming part which is a part where the light shielding part on the transparent substrate is formed;
(3) a step of providing a light shielding part in the light shielding part exposure part;
(4) forming a pixel portion exposure portion by irradiating energy to the transparent substrate provided with the light shielding portion;
(5) A method of manufacturing a color filter, comprising: coloring the exposure portion for pixel portion by an inkjet method to form the pixel portion. (1) A step of providing a photocatalyst-containing layer on the transparent substrate in which the wettability of the energy irradiation part changes in a direction in which the contact angle of the liquid decreases;
(2) forming a pixel portion exposure portion by pattern irradiating energy to a pixel portion forming portion which is a portion where the pixel portion on the transparent substrate is formed;
(3) Coloring the pixel portion exposure portion by an ink jet method to form a pixel portion;
(4) irradiating energy to at least the photocatalyst containing layer in the boundary portion of the pixel portion;
(5) A method of manufacturing a color filter, comprising: forming a light shielding portion at a boundary portion of the pixel portion irradiated with the energy. (1) A photocatalyst-containing layer in which the wettability of the energy irradiation portion on the transparent substrate changes in a direction in which the contact angle with the liquid decreases is applied to the pixel portion forming portion which is a portion where the pixel portion on the transparent substrate is formed. Providing, and
(2) providing a light shielding portion at a boundary portion of the pixel portion forming portion provided with the photocatalyst-containing layer;
(3) irradiating the photocatalyst-containing layer with energy to form a pixel portion exposure portion;
(4) A method for producing a color filter, comprising: coloring the exposure portion for pixel portion by an inkjet method to form a pixel portion. (1) forming a light shielding portion on a transparent substrate;
(2) A step of providing a photocatalyst-containing layer on the upper surface of the light-shielding portion in which the wettability of the energy irradiation portion changes in a direction in which the liquid contact angle decreases;
(3) a step of coloring the pixel portion forming portion, which is a portion where the pixel portion on the transparent substrate not provided with the photocatalyst-containing layer is formed, with an inkjet method to form the pixel portion. A method for manufacturing a color filter. (1) A step of providing a photocatalyst-containing layer on the transparent substrate where the wettability of the energy-irradiated portion changes in the direction in which the liquid contact angle decreases, in the light-shielding portion forming portion that is a portion where the light-shielding portion on the transparent substrate is formed. When,
(2) coloring a portion of the transparent substrate where the photocatalyst-containing layer is not formed by an inkjet method to form a pixel portion;
(3) irradiating energy to at least the photocatalyst-containing layer;
(4) forming a light shielding layer on the photocatalyst containing layer irradiated with the energy. A method for producing a color filter, comprising: After forming the pixel portion exposure portion, the step of forming the pixel portion by coloring with an inkjet method,
(A) forming a first pixel portion exposure portion by pattern irradiating energy to a part of a portion of the photocatalyst-containing layer that forms the pixel portion;
(B) coloring the first pixel portion exposure portion by an inkjet method to form a first pixel portion;
(C) exposing a portion of the photocatalyst-containing layer to form the remaining pixel portion to form an exposure portion for the second pixel portion;
(D) The second pixel portion exposure portion is colored by an ink jet method to form a second pixel portion. The method for manufacturing a color filter according to claim 25 and 29.   The color according to any one of claims 25, 26, and 31, wherein a width of the pixel portion is formed wider than a width of an opening formed by the light shielding portion. A method for manufacturing a filter.   The wettability on the transparent substrate is less than 10 degrees as a contact angle with a liquid having a surface tension of 40 mN / m, according to any one of claims 30 to 32. A method for producing a color filter.   36. The method for producing a color filter according to any one of claims 25 to 35, wherein energy applied to the photocatalyst-containing layer is light including ultraviolet light.   The energy applied to the photocatalyst-containing layer is photocatalytic reaction initiation energy and reaction rate increase energy, and the exposed portion is formed by irradiating the reaction rate increased energy to the portion irradiated with the photocatalytic reaction initiation energy. 36. The method for producing a color filter according to any one of claims 25 to 35, wherein:   38. The method for producing a color filter according to claim 37, wherein the photocatalytic reaction initiation energy is light including ultraviolet light, and the reaction rate increase energy is thermal energy.   The method for producing a color filter according to claim 38, wherein the thermal energy is applied by an infrared laser.   A contact angle with a liquid having a surface tension of 40 mN / m on the photocatalyst-containing layer is 10 degrees or more in a portion not irradiated with energy and less than 10 degrees in a portion irradiated with energy. The method for producing a color filter according to any one of claims 25 to 39.   41. The coloring according to the ink jet method for the pixel portion exposure portion is coloring according to an ink jet method using a UV curable ink, according to any one of claims 25 to 40. A method for producing a color filter. A liquid crystal panel comprising the color filter according to any one of claims 1 to 24 and a substrate facing the color filter, wherein a liquid crystal compound is sealed between the substrates.

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