JP2005286162A - 基板処理装置およびその処理方法 - Google Patents

基板処理装置およびその処理方法 Download PDF

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Publication number
JP2005286162A
JP2005286162A JP2004099129A JP2004099129A JP2005286162A JP 2005286162 A JP2005286162 A JP 2005286162A JP 2004099129 A JP2004099129 A JP 2004099129A JP 2004099129 A JP2004099129 A JP 2004099129A JP 2005286162 A JP2005286162 A JP 2005286162A
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Japan
Prior art keywords
processing
substrate
space
processing chamber
processing apparatus
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Pending
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JP2004099129A
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English (en)
Japanese (ja)
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JP2005286162A5 (online.php
Inventor
Kenji Furusawa
建二 古澤
Hideto Goto
日出人 後藤
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Sprout Co Ltd
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Sprout Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Sprout Co Ltd filed Critical Sprout Co Ltd
Priority to JP2004099129A priority Critical patent/JP2005286162A/ja
Priority to US10/909,977 priority patent/US20050028929A1/en
Publication of JP2005286162A publication Critical patent/JP2005286162A/ja
Publication of JP2005286162A5 publication Critical patent/JP2005286162A5/ja
Pending legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2004099129A 2003-08-07 2004-03-30 基板処理装置およびその処理方法 Pending JP2005286162A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004099129A JP2005286162A (ja) 2004-03-30 2004-03-30 基板処理装置およびその処理方法
US10/909,977 US20050028929A1 (en) 2003-08-07 2004-08-03 Substrate processing apparatus and method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004099129A JP2005286162A (ja) 2004-03-30 2004-03-30 基板処理装置およびその処理方法

Publications (2)

Publication Number Publication Date
JP2005286162A true JP2005286162A (ja) 2005-10-13
JP2005286162A5 JP2005286162A5 (online.php) 2007-05-17

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JP2004099129A Pending JP2005286162A (ja) 2003-08-07 2004-03-30 基板処理装置およびその処理方法

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JP (1) JP2005286162A (online.php)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009054174A1 (ja) * 2007-10-22 2009-04-30 Sharp Kabushiki Kaisha 液晶パネル用基板の製造方法及び液晶パネル用基板の製造装置
JP2014209548A (ja) * 2013-03-28 2014-11-06 ウシオ電機株式会社 光照射装置
JP2016140833A (ja) * 2015-02-03 2016-08-08 株式会社ブルー・スターＲ＆Ｄ 薄板状被洗浄物の洗浄装置
CN112216631A (zh) * 2019-07-11 2021-01-12 细美事有限公司 用于处理基板的装置和方法

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009054174A1 (ja) * 2007-10-22 2009-04-30 Sharp Kabushiki Kaisha 液晶パネル用基板の製造方法及び液晶パネル用基板の製造装置
JP2014209548A (ja) * 2013-03-28 2014-11-06 ウシオ電機株式会社 光照射装置
JP2016140833A (ja) * 2015-02-03 2016-08-08 株式会社ブルー・スターＲ＆Ｄ 薄板状被洗浄物の洗浄装置
CN112216631A (zh) * 2019-07-11 2021-01-12 细美事有限公司 用于处理基板的装置和方法
JP2021015977A (ja) * 2019-07-11 2021-02-12 セメス カンパニー，リミテッド 基板処理装置及び基板処理方法
JP7280225B2 (ja) 2019-07-11 2023-05-23 セメス カンパニー，リミテッド 基板処理装置及び基板処理方法
US11862491B2 (en) 2019-07-11 2024-01-02 Semes Co., Ltd. Apparatus and method for treating substrate

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