JP2005285941A5 - - Google Patents
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- Publication number
- JP2005285941A5 JP2005285941A5 JP2004095126A JP2004095126A JP2005285941A5 JP 2005285941 A5 JP2005285941 A5 JP 2005285941A5 JP 2004095126 A JP2004095126 A JP 2004095126A JP 2004095126 A JP2004095126 A JP 2004095126A JP 2005285941 A5 JP2005285941 A5 JP 2005285941A5
- Authority
- JP
- Japan
- Prior art keywords
- heating element
- heater unit
- processing chamber
- substrate
- processing apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims 14
- 239000000758 substrate Substances 0.000 claims 9
- 238000004519 manufacturing process Methods 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000004065 semiconductor Substances 0.000 claims 2
- 239000002994 raw material Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004095126A JP2005285941A (ja) | 2004-03-29 | 2004-03-29 | 基板処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004095126A JP2005285941A (ja) | 2004-03-29 | 2004-03-29 | 基板処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005285941A JP2005285941A (ja) | 2005-10-13 |
| JP2005285941A5 true JP2005285941A5 (https=) | 2007-10-25 |
Family
ID=35184021
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004095126A Pending JP2005285941A (ja) | 2004-03-29 | 2004-03-29 | 基板処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2005285941A (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007063363B4 (de) | 2007-05-21 | 2016-05-12 | Centrotherm Photovoltaics Ag | Vorrichtung zur Dotierung und Beschichtung von Halbleitermaterial bei niedrigem Druck |
-
2004
- 2004-03-29 JP JP2004095126A patent/JP2005285941A/ja active Pending
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