JP2005259707A5 - - Google Patents
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- Publication number
- JP2005259707A5 JP2005259707A5 JP2005107008A JP2005107008A JP2005259707A5 JP 2005259707 A5 JP2005259707 A5 JP 2005259707A5 JP 2005107008 A JP2005107008 A JP 2005107008A JP 2005107008 A JP2005107008 A JP 2005107008A JP 2005259707 A5 JP2005259707 A5 JP 2005259707A5
- Authority
- JP
- Japan
- Prior art keywords
- sample
- irradiation angle
- changing means
- electron beam
- angle changing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Claims (1)
微小試料を固定し、イオンビーム及び電子ビームの微小試料への照射角度を変更する照射角度変更手段と;
試料台、及び照射角度変更手段が配置された試料室と;
試料台に載置された試料、及び照射角度変更手段に固定された微小試料にイオンビームを照射できる集束イオンビーム光学系と;
照射角度変更手段に固定された微小試料に電子ビームを照射できる電子ビーム光学系と;
を備え、
照射角度変更手段に固定された微小試料にイオンビームを照射し、観察断面を形成し、
電子ビームに対して観察断面が略垂直の角度となるよう、照射角度変更手段により電子ビームの微小試料への照射角度を変更し、
照射角度変更手段に固定された微小試料に電子ビームを照射し、観察断面を測定するように構成された微小試料加工観察装置。
A sample stage on which the sample is placed;
Irradiation angle changing means for fixing the minute sample and changing the irradiation angle of the ion beam and electron beam to the minute sample;
A sample stage and a sample chamber in which an irradiation angle changing means is arranged;
A focused ion beam optical system capable of irradiating a sample placed on a sample stage and a micro sample fixed to the irradiation angle changing means;
An electron beam optical system capable of irradiating a minute sample fixed to the irradiation angle changing means with an electron beam;
With
Irradiate an ion beam to a micro sample fixed to the irradiation angle changing means to form an observation cross section,
Change the irradiation angle of the electron beam to the minute sample by the irradiation angle changing means so that the observation cross section becomes an angle substantially perpendicular to the electron beam,
A micro sample processing and observation apparatus configured to irradiate a micro sample fixed to the irradiation angle changing means with an electron beam and measure an observation cross section.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005107008A JP3874011B2 (en) | 2005-04-04 | 2005-04-04 | Microsample processing observation method and apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005107008A JP3874011B2 (en) | 2005-04-04 | 2005-04-04 | Microsample processing observation method and apparatus |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004317452A Division JP4259454B2 (en) | 2004-11-01 | 2004-11-01 | Micro-sample processing observation equipment |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2005259707A JP2005259707A (en) | 2005-09-22 |
JP2005259707A5 true JP2005259707A5 (en) | 2006-03-09 |
JP3874011B2 JP3874011B2 (en) | 2007-01-31 |
Family
ID=35085184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005107008A Expired - Lifetime JP3874011B2 (en) | 2005-04-04 | 2005-04-04 | Microsample processing observation method and apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3874011B2 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006194907A (en) * | 2006-03-31 | 2006-07-27 | Hitachi Ltd | Sample observation device and method using electron beam |
JP5125123B2 (en) * | 2007-01-31 | 2013-01-23 | 株式会社日立製作所 | Microsample processing observation method and apparatus |
JP5825797B2 (en) * | 2011-02-08 | 2015-12-02 | 株式会社ブリヂストン | Evaluation method for polymer materials |
DE102020203580B4 (en) | 2020-03-20 | 2021-10-07 | Carl Zeiss Microscopy Gmbh | Method for changing the spatial orientation of a microsample in a microscope system, as well as computer program product |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2811073B2 (en) * | 1988-11-01 | 1998-10-15 | セイコーインスツルメンツ株式会社 | Cross section processing observation device |
JP3216881B2 (en) * | 1990-09-07 | 2001-10-09 | 株式会社日立製作所 | Sample cross section observation method |
JP3119959B2 (en) * | 1993-02-05 | 2000-12-25 | セイコーインスツルメンツ株式会社 | Focused ion beam device and processing observation device |
JP2972535B2 (en) * | 1993-12-08 | 1999-11-08 | 株式会社東芝 | Substrate cross-section observation device |
JP3805547B2 (en) * | 1999-01-21 | 2006-08-02 | 株式会社日立製作所 | Sample preparation equipment |
JP4534273B2 (en) * | 1999-08-31 | 2010-09-01 | 株式会社日立製作所 | Sample preparation device |
JP2004343131A (en) * | 2004-06-07 | 2004-12-02 | Hitachi Ltd | Method and device for analyzing sample |
-
2005
- 2005-04-04 JP JP2005107008A patent/JP3874011B2/en not_active Expired - Lifetime
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