JP2005251771A - Semiconductor device and its manufacturing method - Google Patents

Semiconductor device and its manufacturing method Download PDF

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JP2005251771A
JP2005251771A JP2004055666A JP2004055666A JP2005251771A JP 2005251771 A JP2005251771 A JP 2005251771A JP 2004055666 A JP2004055666 A JP 2004055666A JP 2004055666 A JP2004055666 A JP 2004055666A JP 2005251771 A JP2005251771 A JP 2005251771A
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electrode
lead
bonding material
metal
semiconductor element
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Shunichi Haga
俊一 羽賀
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Canon Inc
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Canon Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L24/33Structure, shape, material or disposition of the layer connectors after the connecting process of a plurality of layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32151Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32245Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic

Abstract

<P>PROBLEM TO BE SOLVED: To provide a highly reliable semiconductor device where short circuit between electrodes due to protrusion of bonding material to the side of a semiconductor element does not exist in bonding of the electrodes of the semiconductor element such as a diode chip and the like and leads, and to provide its manufacturing method. <P>SOLUTION: The electrodes 2 and 4 are provided on both faces of the semiconductor element 1. Woven fabric-like or non-woven fabric-like metal conductors 601 and 602 formed of metal wires or metal fibers are inserted between the electrodes and sheet-like leads 3 and 5 confronted with the electrodes through a member with which the bonding material is filled. The bonding material is heated and melted. Thus, the electrodes of the semiconductor element and the leads are connected, or it is bonded with the electrodes of the semiconductor element with the planar metal conductors themselves as the leads. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、半導体装置およびその製造方法に関し、たとえばダイオード等、半導体素子チップの対向する両面の電極とリードとが接続されたリード付きの半導体装置及びその製造方法に関する。   The present invention relates to a semiconductor device and a manufacturing method thereof, for example, a semiconductor device with leads in which electrodes on both sides of a semiconductor element chip facing each other and leads are connected, and a manufacturing method thereof.

近年、各種装置の薄型化が進展しており、薄型実装に適した半導体装置に注目が集まっている。たとえば、太陽電池パネル等で、薄板形状の太陽電池セルに実装されるバイパスダイオードなどに用いられるダイオードは、太陽電池セルが薄いため、従来の樹脂封止タイプのダイオードを使用した場合、太陽電池モジュールの平面性を悪くするので、薄型実装に適した薄型のリード付きダイオードを用いている。   In recent years, various devices have been made thinner, and attention has been focused on semiconductor devices suitable for thin packaging. For example, a diode used for a bypass diode mounted on a thin plate-shaped solar cell in a solar panel or the like is a solar cell module when a conventional resin-encapsulated diode is used because the solar cell is thin. Therefore, a thin leaded diode suitable for thin mounting is used.

図7に、薄型のリード付きダイオードの一例をあらわすダイオードの断面図を示す。   FIG. 7 is a sectional view of a diode showing an example of a thin leaded diode.

図7において、1はダイオードチップ、2はダイオードチップ1の一方の面に設けられたカソード電極、3はカソード電極2に対向して設けられたリード、4はダイオードチップ1の他方の面に設けられたアノード電極、5はアノード電極4に対向して設けられたリードである。従来、ダイオードチップ1は、その両面に設けられた電極2及び4に対向する薄板状のリード3及び5にはんだ701、702等接合材を介して挟持して、その後、はんだ等の接合材を加熱溶融させて、ダイオードチップ1の電極2とリード3の接合部およびダイオードチップ1の電極4とリード5の接合部を形成する構造が一般的である。また、これらダイオードの製造方法について、接合材がはんだの場合、はんだ供給はスクリーン印刷によるのが一般的であり、まずリードの所定部分にはんだペーストを塗布し、次にリードのはんだペーストを塗布した面上にダイオードチップを搭載する。そして、これらを挟み、はんだリフロー工程ではんだを加熱することでダイオードチップの電極とリードが接合されリードとダイオードチップ電極が接続される方法が一般的である。   In FIG. 7, 1 is a diode chip, 2 is a cathode electrode provided on one surface of the diode chip 1, 3 is a lead provided opposite to the cathode electrode 2, and 4 is provided on the other surface of the diode chip 1. The anode electrodes 5 and 5 are leads provided to face the anode electrode 4. Conventionally, the diode chip 1 is sandwiched between thin plate-like leads 3 and 5 facing the electrodes 2 and 4 provided on both surfaces thereof via a bonding material such as solders 701 and 702, and thereafter a bonding material such as solder is applied. A structure in which the joint between the electrode 2 of the diode chip 1 and the lead 3 and the joint between the electrode 4 and the lead 5 of the diode chip 1 are formed by heating and melting is common. As for the manufacturing method of these diodes, when the bonding material is solder, the solder is generally supplied by screen printing. First, the solder paste is applied to a predetermined portion of the lead, and then the solder paste of the lead is applied. A diode chip is mounted on the surface. Then, a method is generally used in which the electrodes and leads of the diode chip are joined and the leads and the diode chip electrodes are connected by sandwiching them and heating the solder in a solder reflow process.

接合材料の供給方法としては、はんだペーストを印刷等で供給する方法のほかに、メッキ、蒸着等の方法や、はんだ箔切片を所定の位置に配置する方法がある。はんだの加熱方法としては、リフロー加熱が一般的であるが、ヒーターを内蔵したプレートで加熱する方法もある。   As a method for supplying the bonding material, in addition to a method for supplying the solder paste by printing or the like, there are a method such as plating or vapor deposition, and a method for arranging the solder foil piece at a predetermined position. As a method for heating the solder, reflow heating is generally used, but there is also a method of heating with a plate having a built-in heater.

これらダイオード等の半導体装置では、熱抵抗を下げ温度特性を向上させるため、リードと接合されるダイオードチップは薄く加工することが多い。したがってこれら薄いダイオードチップを薄板状のリードとはんだで接合する際、供給されたはんだ量が多いと、図8に示すようにはんだが接合面からチップ外周側面にはみ出し、そのはんだにより、ダイオードの電極間が接触しリード間がショートするという致命的な不良を発生する。また、はんだ量が少ないと、接合面全体にはんだが行き渡らず、接合部の熱抵抗が大きくなり、発熱により放熱性が悪くなりダイオードが正常な特性を示さない。   In these semiconductor devices such as diodes, in order to reduce the thermal resistance and improve the temperature characteristics, the diode chip joined to the lead is often processed thinly. Therefore, when these thin diode chips are joined to the thin plate-shaped leads with solder, if a large amount of solder is supplied, the solder protrudes from the joint surface to the outer peripheral surface of the chip as shown in FIG. A fatal defect occurs in which the lead contacts and the leads short. Also, if the amount of solder is small, the solder does not spread over the entire joint surface, the thermal resistance of the joint becomes large, the heat dissipation becomes poor due to heat generation, and the diode does not show normal characteristics.

特にプレーナー型ダイオードチップのような、通例、側面に絶縁コートされていない場合、電極間のショートが発生しないためには、厳密な半田量の供給を管理することが必須である。   In particular, when a side surface is not coated with an insulating coating such as a planar type diode chip, it is essential to manage the supply of a strict solder amount in order to prevent a short circuit between electrodes.

また、特許文献1に開示されているようなメサ型ダイオードチップの場合のように、チップ側面がエッチングされ、チップ側面にガラスパシベーション等でコート処理がなされた構造の場合、側面にはんだがはみ出し盛り上がってもコート処理により絶縁されているので、電極間ショートの発生はプレーナー型に比較して少ないが、厳密にはんだ量を管理しないとはんだはみ出しによる電極間ショートが多発する可能性は十分にある。   Further, as in the case of a mesa type diode chip as disclosed in Patent Document 1, in the case of a structure in which the side surface of the chip is etched and the side surface of the chip is coated with glass passivation or the like, the solder protrudes from the side surface. However, since insulation is achieved by the coating process, the occurrence of short-circuit between electrodes is less than that of the planar type. However, if the amount of solder is not strictly controlled, there is a sufficient possibility that short-circuit between electrodes due to solder protrusion will occur frequently.

特開平2002−158324号公報Japanese Patent Laid-Open No. 2002-158324

本発明は、上述した点を鑑みなされたものであり、ダイオードチップ等の半導体素子の電極とリードとの接合において、接合材料の半導体素子側面へのはみ出しによる電極間ショートのない信頼性の高い半導体装置およびその製造方法を提供するものである。   The present invention has been made in view of the above-described point, and a highly reliable semiconductor in which there is no short-circuit between electrodes due to protrusion of a bonding material to a side surface of a semiconductor element in bonding between an electrode of a semiconductor element such as a diode chip and a lead. An apparatus and a method for manufacturing the same are provided.

前記課題を解決するために請求項1の発明は、半導体素子の一方の面に第一の電極を有し、前記半導体素子の他方の面に第二の電極を有し、前記第一の電極が前記第一の電極と対向する第一のリードと接合材で接合され、前記第二の電極が前記第二の電極と対向する第二のリードと接合材で接合されてなる半導体装置において、前記第一の電極と前記第一のリードとの隙間および前記第二の電極と前記第二のリードとの隙間のうち少なくとも片方の隙間に、金属線もしくは金属繊維から成る織布状もしくは不織布状の金属導体に接合材を充填した部材、または表面に窪みや溝加工を施した薄板状の金属導体に接合材を充填した部材、または表面および内部に空隙部を有する加工を施した薄板状の金属導体に接合材を充填した部材を設けて前記第一のリードと前記第二のリードで前記半導体素子を挟持して前記半導体素子の電極と前記リード間とを接合したことを特徴とする。   In order to solve the above problems, the invention of claim 1 has a first electrode on one surface of a semiconductor element, a second electrode on the other surface of the semiconductor element, and the first electrode. In the semiconductor device in which the first lead facing the first electrode is bonded with a bonding material, and the second electrode is bonded with the second lead facing the second electrode with a bonding material, At least one of the gap between the first electrode and the first lead and the gap between the second electrode and the second lead has a woven or non-woven shape made of a metal wire or metal fiber. A member in which a metal conductor is filled with a bonding material, or a member in which a thin plate-like metal conductor with a recess or groove formed on the surface is filled with a bonding material, or a sheet-like shape in which the surface and inside are processed to have a gap portion Providing a member filled with a bonding material in a metal conductor, Characterized in that to sandwich the semiconductor device in the as one of the leading second lead and bonding the between the lead and the electrode of the semiconductor element.

前記課題を解決するために請求項2の発明は、半導体素子の一方の面に第一の電極を有し、前記半導体素子の他方の面に第二の電極を有し、前記第一の電極が前記第一の電極と対向する第一のリードと接合材で接合され、前記第二の電極が前記第二の電極と対向する第二のリードと接合材で接合されてなる半導体装置において、前記第一のリードと前記第二のリードのうち少なくとも一方のリードが、金属線もしくは金属繊維から成る織布状もしくは不織布状の金属導体に接合材を充填した部材、または表面に窪みや溝加工を施した薄板状の金属導体に接合材を充填した部材、または表面および内部に空隙部を有する加工を施した薄板状の金属導体に接合材を充填した部材で構成され、該第一のリードと該第二のリードで前記半導体素子を挟持して前記半導体素子の電極と前記リード間とを接合したことを特徴とする。   In order to solve the above-mentioned problem, the invention of claim 2 has a first electrode on one surface of a semiconductor element, a second electrode on the other surface of the semiconductor element, and the first electrode. In the semiconductor device in which the first lead facing the first electrode is bonded with a bonding material, and the second electrode is bonded with the second lead facing the second electrode with a bonding material, At least one of the first lead and the second lead is a member in which a woven or non-woven metal conductor made of a metal wire or metal fiber is filled with a bonding material, or a recess or groove is formed on the surface. The first lead is composed of a member obtained by filling a thin plate-like metal conductor with a bonding material, or a member obtained by filling a thin plate-shaped metal conductor having a void portion on the surface and inside with a bonding material. And the second lead Characterized in that bonding the between the lead and the electrode of the semiconductor element is.

前記課題を解決するために請求項3の発明は、前記請求項1または2の発明において、前記金属導体は、加熱時に前記接合材との濡れ性が良好であることを特徴とする。   In order to solve the above problem, the invention of claim 3 is characterized in that, in the invention of claim 1 or 2, the metal conductor has good wettability with the bonding material when heated.

前記課題を解決するために請求項4の発明は、前記請求項1から請求項3のいずれかの発明において、前記接合材がはんだであることを特徴とする。   In order to solve the above-mentioned problems, the invention of claim 4 is characterized in that, in the invention of any one of claims 1 to 3, the bonding material is solder.

前記課題を解決するために請求項5の発明は、半導体素子の一方の面に第一の電極を有し、前記半導体素子の他方の面に第二の電極を有し、前記第一の電極が前記第一の電極と対向する第一のリードと接合材で接合され、前記第二の電極が前記第二の電極と対向する第二のリードと接合材で接合されてなる半導体装置の製造方法において、前記第一の電極と前記第一のリードとの隙間および前記第二の電極と前記第二のリードとの隙間のうち少なくとも片方の隙間に、金属線もしくは金属繊維から成る織布状もしくは不織布状の金属導体に接合材を充填した部材、または表面に窪みや溝加工を施した薄板状の金属導体に接合材を充填した部材、または表面および内部に空隙部を有する加工を施した薄板状の金属導体に接合材を充填した部材を設ける工程と、前記第一のリードと前記第二のリードで前記半導体素子を挟持する工程と、前記接合材を加熱溶融する工程を有することを特徴とする。   In order to solve the above problem, the invention of claim 5 has a first electrode on one surface of a semiconductor element, a second electrode on the other surface of the semiconductor element, and the first electrode. Is bonded to the first lead facing the first electrode with a bonding material, and the second electrode is bonded to the second lead facing the second electrode with a bonding material. In the method, at least one of the gap between the first electrode and the first lead and the gap between the second electrode and the second lead has a woven cloth shape made of a metal wire or metal fiber. Or a member in which a non-woven metal conductor is filled with a bonding material, or a member in which a thin plate-like metal conductor whose surface is hollowed or grooved is filled with a bonding material, or a process having voids on the surface and inside. A sheet metal conductor filled with a bonding material And kicking step, a step of sandwiching said semiconductor device in said first lead the second lead, and having a step of heating and melting the joining material.

前記課題を解決するために請求項6の発明は、半導体素子の一方の面に第一の電極を有し、前記半導体素子の他方の面に第二の電極を有し、前記第一の電極が前記第一の電極と対向する第一のリードと接合材で接合され、前記第二の電極が前記第二の電極と対向する第二のリードと接合材で接合されてなる半導体装置の製造方法において、前記第一のリードと前記第二のリードのうち少なくとも一方のリードを接合材が金属線もしくは金属繊維から成る織布状もしくは不織布状の金属導体に接合材を充填した部材、または表面に窪みや溝加工を施した薄板状の金属導体に接合材を充填した部材、または表面および内部に空隙部を有する加工を施した薄板状の金属導体に接合材を充填した部材で構成する工程と、該第一のリードと該第二のリードで前記半導体素子を挟持する工程と、前記接合材を加熱溶融する工程を有することを特徴とする。   In order to solve the above-described problem, the invention of claim 6 has a first electrode on one surface of a semiconductor element, a second electrode on the other surface of the semiconductor element, and the first electrode. Is bonded to the first lead facing the first electrode with a bonding material, and the second electrode is bonded to the second lead facing the second electrode with a bonding material. In the method, at least one of the first lead and the second lead is a member in which a bonding material is filled in a woven or non-woven metal conductor whose bonding material is made of a metal wire or metal fiber, or a surface A process comprising a member obtained by filling a thin plate-like metal conductor with a recess or groove processed with a bonding material, or a member obtained by filling a thin plate-shaped metal conductor having a void portion on the surface and inside with a bonding material. And the first lead and the second lead A step of clamping the semiconductor device in, characterized by having a step of heating and melting the joining material.

本発明によれば、半導体素子の電極とリードとの電極接合において、金属線もしくは金属繊維から成る織布状もしくは不織布状の金属導体、または表面に窪みや溝加工を施した薄板状の金属導体、または表面および内部に空隙部を有する加工を施した薄板状の金属導体に充填された接合材が加熱溶融することで、これら金属導体の表面およびこれら金属導体の空隙部表面が接合材と濡れることにより、これら部材間の空隙に接合材が含浸するため、半導体素子の電極とリードとの電極接合に余分な接合材が吸収され接合材の半導体素子の側面へのはみ出しが無くなることで、半導体素子の両電極間がショートすることを防止できる。また、第一のリードと第二のリードで半導体素子を挟持して加熱溶融することで電極接合部は面加圧されて、接合層厚を薄く均一に形成できるので放熱性が向上する。これにより、信頼性の高い半導体装置が実現される。   According to the present invention, a woven or non-woven metal conductor made of a metal wire or a metal fiber, or a thin plate-like metal conductor whose surface is recessed or grooved in electrode bonding between an electrode and a lead of a semiconductor element. Or, the surface of the metal conductor and the surface of the void portion of these metal conductors get wet with the bonding material by heating and melting the bonding material filled in the thin plate-shaped metal conductor which has been processed to have voids on the surface and inside. As a result, the bonding material is impregnated in the gap between these members, so that excess bonding material is absorbed in the electrode bonding between the electrode of the semiconductor element and the lead, and the protrusion of the bonding material to the side surface of the semiconductor element is eliminated. It is possible to prevent a short circuit between both electrodes of the element. In addition, the semiconductor element is sandwiched between the first lead and the second lead and heated and melted to pressurize the surface of the electrode bonding portion, so that the thickness of the bonding layer can be made thin and uniform, thereby improving heat dissipation. Thereby, a highly reliable semiconductor device is realized.

以下、本発明の実施の形態を図面に基づいて説明するが、本発明はこれらの実施形態に限定されるものではない。   Hereinafter, embodiments of the present invention will be described with reference to the drawings. However, the present invention is not limited to these embodiments.

(第1の実施の形態)
図1は本発明の第1の実施形態に係わる半導体装置の要部をあらわす断面図である。図1において、1はダイオードチップ、2はダイオードチップ1の一方の面に設けられた第一の電極(カソード電極)、3は第一の電極2と対向する第一のリード、4は第一の電極2の反対面に設けられた第二の電極(アノード電極)、5は第二の電極4と対向する第二のリードである。また、601、602は、はんだ701、702を予め充填した金属網状部材(金属導体)である。
(First embodiment)
FIG. 1 is a sectional view showing a main part of a semiconductor device according to the first embodiment of the present invention. In FIG. 1, 1 is a diode chip, 2 is a first electrode (cathode electrode) provided on one surface of the diode chip 1, 3 is a first lead facing the first electrode 2, and 4 is a first lead. The second electrode (anode electrode) 5 provided on the opposite surface of the electrode 2 is a second lead facing the second electrode 4. Reference numerals 601 and 602 denote metal mesh members (metal conductors) filled with solder 701 and 702 in advance.

本実施の形態では、上記構成において、第一のリード3、第二のリード5はともに銅箔より構成され、ダイオードチップ1の第一の電極2と対向する第一のリード3との隙間には金属網状部材601が配置され、第二の電極4と対向する第二のリード5の隙間には金属網状部材602が配置されている。これらの金属網状部材601、602は、はんだメッキされた銅細線を格子状に編み込んだ構造のシート状で、厚さが均一の構成のもので、銅細線間の隙間にはんだペーストを予め充填した部材であり、加熱溶融によりはんだとの濡れ性が良好となる。   In the present embodiment, in the above configuration, the first lead 3 and the second lead 5 are both made of copper foil, and are formed in the gap between the first lead 3 facing the first electrode 2 of the diode chip 1. A metal mesh member 601 is arranged, and a metal mesh member 602 is arranged in the gap between the second leads 5 facing the second electrode 4. These metal net-like members 601 and 602 have a sheet-like structure in which solder-plated copper fine wires are knitted in a lattice shape, and have a uniform thickness, and a solder paste is pre-filled in a gap between the copper fine wires. It is a member, and the wettability with solder is improved by heating and melting.

予めはんだを金属網状部材に充填する方法としては、はんだペーストを印刷等で充填しても良いし、リードの接続前にはんだ箔切片を配置した状態で予備加熱して充填するなどしても良い。なお、はんだ等接合材の供給方法において、はんだの吸収効果および、電極間ショート防止効果に問題がなければ、従来のように、半導体素子の電極あるいはリードに予め接合材を供給する方法もある。   As a method of filling the metal mesh member with the solder in advance, the solder paste may be filled by printing or the like, or may be preheated and filled in a state where the solder foil piece is arranged before the lead is connected. . If there is no problem in the solder absorption effect and the inter-electrode short-circuit preventing effect in the method for supplying a bonding material such as solder, there is also a method for supplying a bonding material in advance to the electrodes or leads of the semiconductor element as in the prior art.

上記構成の製造過程では、まず、はんだペーストを充填した金属網状部材601、602を介して第一のリード3と第二のリード5でダイオードチップ1を挟持した状態で加熱することで、はんだが溶融し、第一の電極2と第一のリード3とが金属網部材601を介して接合され、第二の電極4と第二のリード5とが金属網部材602を介して接合される。このとき、金属網状部材601、602を構成している金属細線の表面ははんだメッキされており、はんだとの濡れ性が良好であるので、余分なはんだは金属細線間の空隙に吸収され、はんだがチップ外周側面へはみ出すことがない。したがって上記構成により、第一電極2と第二電極間4とのショートを防止できる。   In the manufacturing process of the above configuration, first, the solder is heated by sandwiching the diode chip 1 between the first lead 3 and the second lead 5 via the metal mesh members 601 and 602 filled with the solder paste. After melting, the first electrode 2 and the first lead 3 are joined via the metal mesh member 601, and the second electrode 4 and the second lead 5 are joined via the metal mesh member 602. At this time, the surfaces of the fine metal wires constituting the metal mesh members 601 and 602 are solder-plated and have good wettability with the solder. Therefore, excess solder is absorbed in the gaps between the fine metal wires, and the solder Does not protrude to the outer peripheral side surface of the chip. Therefore, with the above configuration, a short circuit between the first electrode 2 and the second electrode 4 can be prevented.

また、厚さの均一な金属網状部材601、602を介して、第一のリード3と第二のリード5でダイオードチップを挟持して加熱溶融することで面加圧されて、はんだ接合層厚を薄く均一に形成できるので放熱性が向上する。   Also, the surface pressure is applied by sandwiching the diode chip between the first lead 3 and the second lead 5 through the metal mesh members 601 and 602 having a uniform thickness, and heating and melting the solder chip. Can be formed thinly and uniformly, improving heat dissipation.

上記の金属網状部材とは、各種の編み方で金属細線を互いに網目状に編み込んだ形態のシート状の構造体であり、金属細線間の空隙部は、編み方、金属細線径、メッシュ(間隔)を変えることで設定できる形態のものである。   The metal mesh member is a sheet-like structure in which fine metal wires are knitted into each other by various knitting methods, and the gap between the fine metal wires includes the knitting method, fine metal wire diameter, mesh (interval). ) Can be set by changing.

金属細線の材質としては、軟らかく加工しやすい材質で熱抵抗、電気抵抗が低い金、銀、真鍮、アルミ等があげられ、金属細線の表面は、はんだとの濡れ性が良好なら、電気メッキ、金属蒸着等の方法で金、銀、スズ、ニッケル等の表面処理を施した構成の部材でも良い。   As the material of the metal thin wire, there are gold, silver, brass, aluminum, etc. that are soft and easy to process and have low heat resistance and electrical resistance. If the surface of the metal thin wire has good wettability with the solder, electroplating, The member of the structure which gave surface treatments, such as gold | metal | money, silver, tin, nickel, by methods, such as metal vapor deposition, may be sufficient.

また、本実施の形態では、リードと電極間に設ける構成部材として金属網状部材を用いたが、部材に空隙部があり加熱溶融ではんだ等接合部材との濡れ性が良好である材質あるいは表面処理された構成で接合材を空隙に含浸吸収するものであれば、金属繊維を網状に織り込んだりあるいは絡ませて形成した織布状もしくは不織布状の金属導体、または表面に窪みや溝加工を施した薄板状の金属導体、または表面および内部に空隙部を有する加工を施したパンチングメタルやエキスパンドメタル等の面状の金属導体のような形態の部材でもかまわない。   In this embodiment, a metal mesh member is used as a constituent member provided between the lead and the electrode. However, a material or surface treatment that has a void in the member and has good wettability with a joining member such as solder by heat melting. As long as the bonding material is impregnated and absorbed in the gaps, the woven or non-woven metal conductor formed by weaving or entwining metal fibers in the form of a net, or a thin plate with dents or grooves on the surface It may be a member in the form of a planar metal conductor, or a planar metal conductor such as punched metal or expanded metal that has been processed to have a void on the surface and inside.

上記のパンチングメタルとは、薄板状の金属を、複数の孔あけ加工を施した形態の構造体である。孔形状、孔寸法、孔位置、孔間隔、孔配置については、プレス加工あるいはエッチング加工等により比較的自由に設計できる。   The punching metal is a structure in a form in which a thin plate metal is subjected to a plurality of holes. The hole shape, hole size, hole position, hole interval, and hole arrangement can be designed relatively freely by pressing or etching.

また上記のエキスパンドメタルとは、薄板状の金属に、網目形状に合わせた切れ目加工を施し引きのばし網目を形成した形態の構造体である。パンチングメタル同様、一体構造体である。   Moreover, said expanded metal is a structure of the form which gave the cut | interruption process match | combined with the mesh shape on the thin plate-shaped metal, and formed the stretched mesh. Like the punching metal, it is an integral structure.

なお、リードと電極間に設ける構成部材(金属導体)としてパンチングメタルを適用した場合、パンチングメタルは孔加工以外従来の金属箔で構成されたリードと近い形態のため、リード取り付け工程をはじめ従来と同等の取り扱いができる利点がある。また、パンチングメタルは、孔形状、孔寸法、孔位置、孔間隔、孔配置等を比較的容易に変更し加工できるなど加工の自由度が高いこと、はんだ等の接合材との濡れ性の確保についても、部分メッキ、孔配置等で対応できるため、上記リフロー工程等加熱プロセスを考慮した接合材吸収効果の最適化が比較的容易に実現できる。   In addition, when punching metal is applied as a constituent member (metal conductor) provided between the lead and the electrode, the punching metal is similar to a lead made of a conventional metal foil except for drilling, so that the conventional method including the lead attachment process is used. There is an advantage that equivalent handling is possible. In addition, punching metal has a high degree of freedom in processing, such as being able to change and process the hole shape, hole size, hole position, hole interval, hole arrangement, etc. relatively easily, and ensure wettability with bonding materials such as solder. Can be dealt with by partial plating, hole arrangement, etc., so that the optimization of the bonding material absorption effect in consideration of the heating process such as the reflow process can be realized relatively easily.

また、リードと電極間に設ける構成部材について、平坦性、はんだ等の接合材の吸収効果に問題なければ、金属網状部材よりエキスパンドメタルあるいはパンチングメタルの方が、部材の形状加工による金属細線のほつれなどの心配がなく、部材の加工及び取り扱い時のメリットがある。   In addition, regarding the components provided between the lead and the electrode, if there is no problem in the flatness and the absorption effect of the bonding material such as solder, the expanded metal or the punching metal is more likely to fray the fine metal wire due to the shape processing of the member than the metal mesh member. There is no need to worry about this, and there are advantages when processing and handling parts.

なお、本実施の形態では第一の電極2と第一のリード3との隙間および第二の電極4と第二のリード5との隙間の双方の隙間にはんだを充填した金属網状部材を設けているが、接合材料の半導体素子側面へのはみ出しによる電極間ショートを防止する効果が得られれば片方の隙間にのみに設けても良い。   In the present embodiment, a metal net-like member filled with solder is provided in both the gap between the first electrode 2 and the first lead 3 and the gap between the second electrode 4 and the second lead 5. However, it may be provided only in one gap as long as the effect of preventing a short circuit between the electrodes due to the protrusion of the bonding material to the side surface of the semiconductor element can be obtained.

(第2の実施の形態)
図2は本発明の第2の実施形態に係わる半導体装置の要部をあらわす断面図である。
(Second Embodiment)
FIG. 2 is a cross-sectional view showing the main part of a semiconductor device according to the second embodiment of the present invention.

本実施の形態は、第二のリード自体が金網網状部材602で構成されており、銅箔より構成された第二のリード部材がない点が第1の実施形態とは異なる。かかる構成によれば、構成部材が少ないので安く構成できる。   The present embodiment is different from the first embodiment in that the second lead itself is constituted by a wire mesh member 602 and there is no second lead member made of copper foil. According to this structure, since there are few structural members, it can comprise cheaply.

本実施の形態では、第一の電極2と対向する第1のリード3との隙間には、第1の実施形態同様はんだ701が充填された金属網状部材601が配置されている。一方、第二の電極4(アノード電極)に対向して、金網網状部材602よりなる第二のリード5が配置されている。上記金網網状部材602のうち、第2の電極4と対向する領域には、第1の実施形態同様、予めはんだ702が充填されている。したがって、第一のリード3と第二のリード5でダイオードチップ1を挟持して、加熱することで、第1の実施形態同様はんだのはみ出しのない第一の電極2と第一のリード3の接合および第二の電極4と第二のリード5とのはんだ接合が可能となる。   In the present embodiment, a metal mesh member 601 filled with solder 701 is disposed in the gap between the first electrode 2 and the first lead 3 facing the first electrode 2. On the other hand, a second lead 5 made of a wire mesh member 602 is arranged opposite to the second electrode 4 (anode electrode). A region facing the second electrode 4 in the wire mesh member 602 is filled with solder 702 in advance as in the first embodiment. Therefore, by sandwiching the diode chip 1 between the first lead 3 and the second lead 5 and heating, the first electrode 2 and the first lead 3 with no protrusion of solder as in the first embodiment. Bonding and solder bonding between the second electrode 4 and the second lead 5 are possible.

なお、上記構成では第二のリード5が、はんだの充填された金属細線を織り込んだ構造なので、従来の金属箔のリードに比べて可撓性が良く曲げ加工に適しており、たとえば、薄型実装(薄板状の素子電極への実装)に好適である。   In the above configuration, since the second lead 5 has a structure in which a fine metal wire filled with solder is woven, the second lead 5 is more flexible than the conventional metal foil lead and is suitable for bending. It is suitable for (mounting on a thin plate-like element electrode).

上記構成において、金属網状部材602は、少なくとも第二の電極4に対応した領域にはんだが充填されダイオードチップ1の側面にはみ出すはんだを吸収する構造であれば良く、図3に示すような第二のリード5の引き出し部にもはんだを充填した形態の部材でも良い。   In the above configuration, the metal mesh member 602 may have a structure in which solder is filled in at least a region corresponding to the second electrode 4 and absorbs the solder protruding from the side surface of the diode chip 1. The lead 5 may be a member filled with solder.

更に、上記構成の製造方法において、放熱性に問題がないレベルなら、リード間を挟持せず、はんだ接合部に圧力を印加せずに、リフロー工程を通すことだけではんだ接合をする方法もある。   Furthermore, in the manufacturing method having the above configuration, if there is no problem in heat dissipation, there is also a method in which solder bonding is performed only by passing through a reflow process without sandwiching the leads and applying pressure to the solder joint. .

なお、本実施の形態では、第一の電極2と第一のリード3との隙間にはんだを充填した金属網状部材601を設けると共に、第二のリード5としてはんだを充填した金属網状部材602を用いているが、第一のリードと第二のリードの双方にはんだを充填した金属網状部材で構成しても良い。また、接合材料の半導体素子側面へのはみ出しによる電極間ショートを防止する効果が得られれば、第一のリードと第二のリードの片方ははんだを充填した金属網状部材で構成し、他方は従来のような構成とすることもできる。   In the present embodiment, the metal mesh member 601 filled with solder is provided in the gap between the first electrode 2 and the first lead 3, and the metal mesh member 602 filled with solder is used as the second lead 5. Although it is used, both the first lead and the second lead may be constituted by a metal mesh member filled with solder. If the effect of preventing the short circuit between the electrodes due to the protrusion of the bonding material to the side surface of the semiconductor element can be obtained, one of the first lead and the second lead is constituted by a metal mesh member filled with solder, and the other is conventional. It can also be set as the following.

また、本実施の形態は、第1の実施の形態同様、金属網状部材を適用した実施形態であるが、本実施の形態と同等のはんだ吸収効果があれば、金属網状部材以外のパンチングメタルやエキスパンドメタル等の形態の部材でもかまわない。   Further, the present embodiment is an embodiment to which a metal mesh member is applied as in the first embodiment, but if there is a solder absorption effect equivalent to this embodiment, punching metal other than the metal mesh member or A member in the form of expanded metal may be used.

(第3の実施の形態)
図4は、本発明の第3の実施形態に係わる半導体装置の要部をあらわす断面図であり、図5は本発明の第3の実施形態に係わる金属網状部材602の上面図であり、図6は本発明の第3の実施形態に係わる半導体装置の製造方法の説明図である。
(Third embodiment)
FIG. 4 is a cross-sectional view showing a main part of a semiconductor device according to the third embodiment of the present invention, and FIG. 5 is a top view of a metal net member 602 according to the third embodiment of the present invention. FIG. 6 is an explanatory diagram of a method for manufacturing a semiconductor device according to the third embodiment of the present invention.

本実施の形態は、ダイオードチップ1の第二の電極4と対向する第二のリード5との隙間に配置された金属網状部材602が予めはんだで充填されていないこと、金属網状部材602の形状が図5に示すように中央に開口部(中空部)602aを有しチップ外周に対応する枠形状であること、第一の実施形態で第一の電極2と対向する第一のリード3の隙間に設けられていた金属網状部材601が設けられていないことが、第一の実施形態と異なる点である。かかる構成によれば、従来の電極接合に近い構成と従来に近い接合工程ではんだのはみ出しのない第二の電極4と第二のリード5とのはんだ接合が可能となる。   In the present embodiment, the metal mesh member 602 disposed in the gap between the second electrode 4 of the diode chip 1 and the second lead 5 facing the diode chip 1 is not filled with solder in advance, and the shape of the metal mesh member 602 5 has a frame shape having an opening (hollow part) 602a at the center and corresponding to the outer periphery of the chip, as shown in FIG. 5, and the first lead 3 facing the first electrode 2 in the first embodiment. The difference from the first embodiment is that the metal mesh member 601 provided in the gap is not provided. According to such a configuration, it is possible to perform solder bonding between the second electrode 4 and the second lead 5 with no protrusion of solder in a configuration close to conventional electrode bonding and a bonding process similar to the conventional one.

上記構成の製造過程では、図6に示すように、第一の電極2の電極接合については、従来の電極接合工程同様、第一のリード3にはんだ701を供給する。第二の電極4の電極接合については、第2のリード5にはんだ702を供給して、第二の電極4と対向する第2のリード5との隙間には、図5に示すように第二のリード5にはんだ702を供給する部分に対応して中空部602aが設けられている金属網状部材602を配置する。そして、第一のリード3と第2のリード5でダイオードチップ1を挟持してリフロー加熱することで、第二の電極4(アノード電極)と第二のリード5のはんだ接合について、第1の実施形態同様、金属網状部材602の空隙に余分なはんだが吸収されるために、はんだのはみ出しが防止できる。したがって、カソード側は多少のはみ出しがあっても、電極間ショート不良の発生を防止できる。   In the manufacturing process of the above configuration, as shown in FIG. 6, for the electrode bonding of the first electrode 2, the solder 701 is supplied to the first lead 3 as in the conventional electrode bonding process. As for the electrode bonding of the second electrode 4, the solder 702 is supplied to the second lead 5, and the gap between the second electrode 4 and the second lead 5 facing the second electrode 5 is as shown in FIG. A metal net member 602 provided with a hollow portion 602a corresponding to a portion where the solder 702 is supplied to the second lead 5 is disposed. The diode chip 1 is sandwiched between the first lead 3 and the second lead 5 and reflow heating is performed, so that the first electrode 4 (anode electrode) and the second lead 5 are soldered together with the first lead 3. As in the embodiment, since excess solder is absorbed in the gaps of the metal mesh member 602, it is possible to prevent the solder from protruding. Therefore, even if there is some protrusion on the cathode side, it is possible to prevent the occurrence of a short circuit between the electrodes.

なお、本実施の形態は、第1の実施の形態同様、金属網状部材を適用した実施形態であるが、本実施の形態と同等のはんだ吸収効果があれば、金属網状部材以外のパンチングメタルやエキスパンドメタル等の形態の部材でもかまわない。   This embodiment is an embodiment to which a metal mesh member is applied, as in the first embodiment, but if there is a solder absorption effect equivalent to this embodiment, punching metal other than the metal mesh member or A member in the form of expanded metal may be used.

本発明の第1の実施形態に係わる半導体装置の要部をあらわす断面図である。It is sectional drawing showing the principal part of the semiconductor device concerning the 1st Embodiment of this invention. 本発明の第2の実施形態に係わる半導体装置の要部をあらわす断面図である。It is sectional drawing showing the principal part of the semiconductor device concerning the 2nd Embodiment of this invention. 本発明の第2の実施形態において説明する別の半導体装置の要部をあらわす断面図である。It is sectional drawing showing the principal part of another semiconductor device demonstrated in the 2nd Embodiment of this invention. 本発明の第3の実施形態に係わる半導体装置の要部をあらわす断面図である。It is sectional drawing showing the principal part of the semiconductor device concerning the 3rd Embodiment of this invention. 本発明の第3の実施形態に係わる金属網状部材の上面図である。It is a top view of the metal net-like member concerning the 3rd Embodiment of this invention. 本発明の第3の実施形態に係わる半導体装置の製造方法の説明図である。It is explanatory drawing of the manufacturing method of the semiconductor device concerning the 3rd Embodiment of this invention. 従来例に係わる半導体装置の要部をあらわす断面図である。It is sectional drawing showing the principal part of the semiconductor device concerning a prior art example. 従来例での問題点を説明するための図である。It is a figure for demonstrating the problem in a prior art example.

符号の説明Explanation of symbols

1 半導体素子(ダイオードチップ)
2 第一の電極(カソード電極)
3 第一のリード
4 第二の電極(アノード電極)
5 第二のリード
601、602 金属網状部材
602a 開口部(中空部)
7、701、702 はんだ
1 Semiconductor element (diode chip)
2 First electrode (cathode electrode)
3 First lead 4 Second electrode (anode electrode)
5 Second lead 601, 602 Metal mesh member 602a Opening (hollow part)
7,701,702 Solder

Claims (6)

半導体素子の一方の面に第一の電極を有し、前記半導体素子の他方の面に第二の電極を有し、前記第一の電極が前記第一の電極と対向する第一のリードと接合材で接合され、前記第二の電極が前記第二の電極と対向する第二のリードと接合材で接合されてなる半導体装置において、
前記第一の電極と前記第一のリードとの隙間および前記第二の電極と前記第二のリードとの隙間のうち少なくとも片方の隙間に、金属線もしくは金属繊維から成る織布状もしくは不織布状の金属導体に接合材を充填した部材、または表面に窪みや溝加工を施した薄板状の金属導体に接合材を充填した部材、または表面および内部に空隙部を有する加工を施した薄板状の金属導体に接合材を充填した部材を設けて前記第一のリードと前記第二のリードで前記半導体素子を挟持して前記半導体素子の電極と前記リード間とを接合したことを特徴とする半導体装置。
A first electrode having a first electrode on one surface of the semiconductor element, a second electrode on the other surface of the semiconductor element, wherein the first electrode is opposed to the first electrode; In the semiconductor device formed by bonding with a bonding material, and the second electrode is bonded with the second lead facing the second electrode with the bonding material,
At least one of the gap between the first electrode and the first lead and the gap between the second electrode and the second lead has a woven or non-woven shape made of metal wire or metal fiber. A member filled with a bonding material in the metal conductor, or a member filled with a bonding material in a thin plate-like metal conductor whose surface has been recessed or grooved, or a thin plate-like shape that has been processed to have a gap on the surface and inside A semiconductor comprising a metal conductor filled with a bonding material, the semiconductor element is sandwiched between the first lead and the second lead, and the electrode of the semiconductor element and the lead are bonded together. apparatus.
半導体素子の一方の面に第一の電極を有し、前記半導体素子の他方の面に第二の電極を有し、前記第一の電極が前記第一の電極と対向する第一のリードと接合材で接合され、前記第二の電極が前記第二の電極と対向する第二のリードと接合材で接合されてなる半導体装置において、
前記第一のリードと前記第二のリードのうち少なくとも一方のリードが、金属線もしくは金属繊維から成る織布状もしくは不織布状の金属導体に接合材を充填した部材、または表面に窪みや溝加工を施した薄板状の金属導体に接合材を充填した部材、または表面および内部に空隙部を有する加工を施した薄板状の金属導体に接合材を充填した部材で構成され、該第一のリードと該第二のリードで前記半導体素子を挟持して前記半導体素子の電極と前記リード間とを接合したことを特徴とする半導体装置。
A first electrode having a first electrode on one surface of the semiconductor element, a second electrode on the other surface of the semiconductor element, wherein the first electrode is opposed to the first electrode; In the semiconductor device formed by bonding with a bonding material, and the second electrode is bonded with the second lead facing the second electrode with the bonding material,
At least one of the first lead and the second lead is a member in which a woven or non-woven metal conductor made of a metal wire or metal fiber is filled with a bonding material, or a recess or groove is formed on the surface. The first lead is composed of a member obtained by filling a thin plate-like metal conductor with a bonding material, or a member obtained by filling a thin plate-shaped metal conductor having a void portion on the surface and inside with a bonding material. A semiconductor device characterized in that the semiconductor element is sandwiched between the second lead and the electrode of the semiconductor element and the lead are joined.
前記金属導体は、加熱時に前記接合材との濡れ性が良好であることを特徴とする請求項1または2記載の半導体装置。   The semiconductor device according to claim 1, wherein the metal conductor has good wettability with the bonding material when heated. 前記接合材が、はんだであることを特徴とする請求項1から請求項3のいずれか一項に記載の半導体装置。   The semiconductor device according to claim 1, wherein the bonding material is solder. 半導体素子の一方の面に第一の電極を有し、前記半導体素子の他方の面に第二の電極を有し、前記第一の電極が前記第一の電極と対向する第一のリードと接合材で接合され、前記第二の電極が前記第二の電極と対向する第二のリードと接合材で接合されてなる半導体装置の製造方法において、
前記第一の電極と前記第一のリードとの隙間および前記第二の電極と前記第二のリードとの隙間のうち少なくとも片方の隙間に、金属線もしくは金属繊維から成る織布状もしくは不織布状の金属導体に接合材を充填した部材、または表面に窪みや溝加工を施した薄板状の金属導体に接合材を充填した部材、または表面および内部に空隙部を有する加工を施した薄板状の金属導体に接合材を充填した部材を設ける工程と、前記第一のリードと前記第二のリードで前記半導体素子を挟持する工程と、前記接合材を加熱溶融する工程を有することを特徴とする半導体装置の製造方法。
A first electrode having a first electrode on one surface of the semiconductor element, a second electrode on the other surface of the semiconductor element, wherein the first electrode is opposed to the first electrode; In a method for manufacturing a semiconductor device, wherein the second electrode is bonded with a bonding material, and the second electrode is bonded with a second lead facing the second electrode with a bonding material.
At least one of the gap between the first electrode and the first lead and the gap between the second electrode and the second lead has a woven or non-woven shape made of metal wire or metal fiber. A member filled with a bonding material in the metal conductor, or a member filled with a bonding material in a thin plate-like metal conductor whose surface has been recessed or grooved, or a thin plate-like shape that has been processed to have a gap on the surface and inside A step of providing a member filled with a bonding material in a metal conductor; a step of sandwiching the semiconductor element between the first lead and the second lead; and a step of heating and melting the bonding material. A method for manufacturing a semiconductor device.
半導体素子の一方の面に第一の電極を有し、前記半導体素子の他方の面に第二の電極を有し、前記第一の電極が前記第一の電極と対向する第一のリードと接合材で接合され、前記第二の電極が前記第二の電極と対向する第二のリードと接合材で接合されてなる半導体装置の製造方法において、
前記第一のリードと前記第二のリードのうち少なくとも一方のリードを接合材が金属線もしくは金属繊維から成る織布状もしくは不織布状の金属導体に接合材を充填した部材、または表面に窪みや溝加工を施した薄板状の金属導体に接合材を充填した部材、または表面および内部に空隙部を有する加工を施した薄板状の金属導体に接合材を充填した部材で構成する工程と、該第一のリードと該第二のリードで前記半導体素子を挟持する工程と、前記接合材を加熱溶融する工程を有することを特徴とする半導体装置の製造方法。
A first electrode having a first electrode on one surface of the semiconductor element, a second electrode on the other surface of the semiconductor element, wherein the first electrode is opposed to the first electrode; In a method for manufacturing a semiconductor device, wherein the second electrode is bonded with a bonding material, and the second electrode is bonded with a second lead facing the second electrode with a bonding material.
A member in which at least one of the first lead and the second lead is bonded to a woven or non-woven metal conductor whose bonding material is a metal wire or metal fiber, or a depression or A step in which a thin plate-like metal conductor subjected to grooving is filled with a bonding material, or a thin plate-like metal conductor subjected to processing having a void portion on the surface and inside, and a member filled with the bonding material; A method of manufacturing a semiconductor device, comprising: a step of sandwiching the semiconductor element between a first lead and the second lead; and a step of heating and melting the bonding material.
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2437769A (en) * 2006-05-04 2007-11-07 Han-Ming Lee Heatsink
US20110221076A1 (en) * 2010-03-12 2011-09-15 Mitsubishi Electric Corporation Semiconductor device
US10840166B2 (en) 2018-03-20 2020-11-17 Kabushiki Kaisha Toshiba Semiconductor device

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2437769A (en) * 2006-05-04 2007-11-07 Han-Ming Lee Heatsink
GB2437769B (en) * 2006-05-04 2008-12-17 Han-Ming Lee Heatsink device having fiber-like fins
US20110221076A1 (en) * 2010-03-12 2011-09-15 Mitsubishi Electric Corporation Semiconductor device
CN102194784A (en) * 2010-03-12 2011-09-21 三菱电机株式会社 Semiconductor device
US8933568B2 (en) 2010-03-12 2015-01-13 Mitsubishi Electric Corporation Semiconductor device
CN102194784B (en) * 2010-03-12 2015-06-17 三菱电机株式会社 Semiconductor device
DE102011002535B4 (en) * 2010-03-12 2016-05-12 Mitsubishi Electric Corporation Semiconductor device with connection part
US10840166B2 (en) 2018-03-20 2020-11-17 Kabushiki Kaisha Toshiba Semiconductor device

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