JP2005231954A5 - - Google Patents
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- Publication number
- JP2005231954A5 JP2005231954A5 JP2004044127A JP2004044127A JP2005231954A5 JP 2005231954 A5 JP2005231954 A5 JP 2005231954A5 JP 2004044127 A JP2004044127 A JP 2004044127A JP 2004044127 A JP2004044127 A JP 2004044127A JP 2005231954 A5 JP2005231954 A5 JP 2005231954A5
- Authority
- JP
- Japan
- Prior art keywords
- dispersion
- wet silica
- silica particles
- wet
- silica
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 8
- 239000006185 dispersion Substances 0.000 claims 6
- 239000000377 silicon dioxide Substances 0.000 claims 2
- 238000010521 absorption reaction Methods 0.000 claims 1
- 239000002245 particle Substances 0.000 claims 1
- 239000002798 polar solvent Substances 0.000 claims 1
- 239000002994 raw material Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004044127A JP4377257B2 (ja) | 2004-02-20 | 2004-02-20 | 湿式シリカ分散液及びその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004044127A JP4377257B2 (ja) | 2004-02-20 | 2004-02-20 | 湿式シリカ分散液及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005231954A JP2005231954A (ja) | 2005-09-02 |
| JP2005231954A5 true JP2005231954A5 (https=) | 2007-01-18 |
| JP4377257B2 JP4377257B2 (ja) | 2009-12-02 |
Family
ID=35015298
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004044127A Expired - Fee Related JP4377257B2 (ja) | 2004-02-20 | 2004-02-20 | 湿式シリカ分散液及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4377257B2 (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4729914B2 (ja) * | 2004-12-09 | 2011-07-20 | 株式会社豊田中央研究所 | 微細酸化鉄粉末及びその製造方法 |
| JP5219335B2 (ja) * | 2005-12-20 | 2013-06-26 | 株式会社トクヤマ | 被覆組成物用原液 |
| JP2007277023A (ja) * | 2006-04-03 | 2007-10-25 | Tosoh Corp | 高濃度シリカスラリ−及びその製造法 |
| KR101296840B1 (ko) * | 2011-02-11 | 2013-08-14 | (주)석경에이티 | 단분산 고순도 실리카 미세입자의 제조방법 |
| JP7316177B2 (ja) * | 2019-10-03 | 2023-07-27 | 東ソー・シリカ株式会社 | 含水ケイ酸スラリー及びその製造方法 |
| JP7557300B2 (ja) * | 2020-07-29 | 2024-09-27 | 株式会社アドマテックス | 高濃度高分散スラリー組成物及びその製造方法 |
| JP7148001B2 (ja) * | 2020-10-01 | 2022-10-05 | 堺化学工業株式会社 | ホウ素含有シリカ分散体及びその製造方法 |
-
2004
- 2004-02-20 JP JP2004044127A patent/JP4377257B2/ja not_active Expired - Fee Related
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