JP2005231954A5 - - Google Patents

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Publication number
JP2005231954A5
JP2005231954A5 JP2004044127A JP2004044127A JP2005231954A5 JP 2005231954 A5 JP2005231954 A5 JP 2005231954A5 JP 2004044127 A JP2004044127 A JP 2004044127A JP 2004044127 A JP2004044127 A JP 2004044127A JP 2005231954 A5 JP2005231954 A5 JP 2005231954A5
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JP
Japan
Prior art keywords
dispersion
wet silica
silica particles
wet
silica
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004044127A
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English (en)
Japanese (ja)
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JP4377257B2 (ja
JP2005231954A (ja
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Publication date
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Priority to JP2004044127A priority Critical patent/JP4377257B2/ja
Priority claimed from JP2004044127A external-priority patent/JP4377257B2/ja
Publication of JP2005231954A publication Critical patent/JP2005231954A/ja
Publication of JP2005231954A5 publication Critical patent/JP2005231954A5/ja
Application granted granted Critical
Publication of JP4377257B2 publication Critical patent/JP4377257B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004044127A 2004-02-20 2004-02-20 湿式シリカ分散液及びその製造方法 Expired - Fee Related JP4377257B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004044127A JP4377257B2 (ja) 2004-02-20 2004-02-20 湿式シリカ分散液及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004044127A JP4377257B2 (ja) 2004-02-20 2004-02-20 湿式シリカ分散液及びその製造方法

Publications (3)

Publication Number Publication Date
JP2005231954A JP2005231954A (ja) 2005-09-02
JP2005231954A5 true JP2005231954A5 (cg-RX-API-DMAC7.html) 2007-01-18
JP4377257B2 JP4377257B2 (ja) 2009-12-02

Family

ID=35015298

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004044127A Expired - Fee Related JP4377257B2 (ja) 2004-02-20 2004-02-20 湿式シリカ分散液及びその製造方法

Country Status (1)

Country Link
JP (1) JP4377257B2 (cg-RX-API-DMAC7.html)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4729914B2 (ja) * 2004-12-09 2011-07-20 株式会社豊田中央研究所 微細酸化鉄粉末及びその製造方法
JP5219335B2 (ja) * 2005-12-20 2013-06-26 株式会社トクヤマ 被覆組成物用原液
JP2007277023A (ja) * 2006-04-03 2007-10-25 Tosoh Corp 高濃度シリカスラリ−及びその製造法
KR101296840B1 (ko) * 2011-02-11 2013-08-14 (주)석경에이티 단분산 고순도 실리카 미세입자의 제조방법
JP7316177B2 (ja) * 2019-10-03 2023-07-27 東ソー・シリカ株式会社 含水ケイ酸スラリー及びその製造方法
JP7557300B2 (ja) * 2020-07-29 2024-09-27 株式会社アドマテックス 高濃度高分散スラリー組成物及びその製造方法
WO2022071020A1 (ja) * 2020-10-01 2022-04-07 堺化学工業株式会社 ホウ素含有シリカ分散体及びその製造方法

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