JP2005231954A5 - - Google Patents

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Publication number
JP2005231954A5
JP2005231954A5 JP2004044127A JP2004044127A JP2005231954A5 JP 2005231954 A5 JP2005231954 A5 JP 2005231954A5 JP 2004044127 A JP2004044127 A JP 2004044127A JP 2004044127 A JP2004044127 A JP 2004044127A JP 2005231954 A5 JP2005231954 A5 JP 2005231954A5
Authority
JP
Japan
Prior art keywords
dispersion
wet silica
silica particles
wet
silica
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004044127A
Other languages
English (en)
Japanese (ja)
Other versions
JP4377257B2 (ja
JP2005231954A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004044127A priority Critical patent/JP4377257B2/ja
Priority claimed from JP2004044127A external-priority patent/JP4377257B2/ja
Publication of JP2005231954A publication Critical patent/JP2005231954A/ja
Publication of JP2005231954A5 publication Critical patent/JP2005231954A5/ja
Application granted granted Critical
Publication of JP4377257B2 publication Critical patent/JP4377257B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004044127A 2004-02-20 2004-02-20 湿式シリカ分散液及びその製造方法 Expired - Fee Related JP4377257B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004044127A JP4377257B2 (ja) 2004-02-20 2004-02-20 湿式シリカ分散液及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004044127A JP4377257B2 (ja) 2004-02-20 2004-02-20 湿式シリカ分散液及びその製造方法

Publications (3)

Publication Number Publication Date
JP2005231954A JP2005231954A (ja) 2005-09-02
JP2005231954A5 true JP2005231954A5 (cg-RX-API-DMAC10.html) 2007-01-18
JP4377257B2 JP4377257B2 (ja) 2009-12-02

Family

ID=35015298

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004044127A Expired - Fee Related JP4377257B2 (ja) 2004-02-20 2004-02-20 湿式シリカ分散液及びその製造方法

Country Status (1)

Country Link
JP (1) JP4377257B2 (cg-RX-API-DMAC10.html)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4729914B2 (ja) * 2004-12-09 2011-07-20 株式会社豊田中央研究所 微細酸化鉄粉末及びその製造方法
JP5219335B2 (ja) * 2005-12-20 2013-06-26 株式会社トクヤマ 被覆組成物用原液
JP2007277023A (ja) * 2006-04-03 2007-10-25 Tosoh Corp 高濃度シリカスラリ−及びその製造法
KR101296840B1 (ko) * 2011-02-11 2013-08-14 (주)석경에이티 단분산 고순도 실리카 미세입자의 제조방법
JP7316177B2 (ja) * 2019-10-03 2023-07-27 東ソー・シリカ株式会社 含水ケイ酸スラリー及びその製造方法
JP7557300B2 (ja) * 2020-07-29 2024-09-27 株式会社アドマテックス 高濃度高分散スラリー組成物及びその製造方法
KR20230075389A (ko) 2020-10-01 2023-05-31 사카이 가가쿠 고교 가부시키가이샤 붕소 함유 실리카 분산체 및 그 제조 방법

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