JP2005217177A - Electronic component device - Google Patents

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JP2005217177A
JP2005217177A JP2004021943A JP2004021943A JP2005217177A JP 2005217177 A JP2005217177 A JP 2005217177A JP 2004021943 A JP2004021943 A JP 2004021943A JP 2004021943 A JP2004021943 A JP 2004021943A JP 2005217177 A JP2005217177 A JP 2005217177A
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electronic component
solder
base substrate
outer peripheral
electrode
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Masafumi Hisataka
将文 久高
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Kyocera Corp
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Kyocera Corp
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  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide an electronic component device in which short-circuits due to thermal melting and outflowing of internal solder by heat at the time of mounting are prevented when mounted on a mother board. <P>SOLUTION: The electronic component device 1 is composed by joining an electronic component element 2 for which a connection electrode 8 and an outer peripheral sealing electrode 9 are formed on one main surface, an electrode 10 for element connection connected to the connection electrode 8 through a solder bump member 4 on an upper surface, an outer peripheral sealing conductor film 11 joined with the outer peripheral sealing electrode 9 through a solder joining member 5, and a base substrate 3 where an external terminal electrode is formed, respectively. These elements are joined to form a prescribed interval between the base substrate 3 and the electronic component element 2, and an exterior member 6 is arranged on the side face of the electronic component element 2 and the outer peripheral surface of the solder joining member 5. In the electronic component device 1, the exterior member 6 is formed of a low elastic material whose volume expansion rate is 6% to 11% and elastic modulus at the melting temperature of the solder joining member 5 is ≤0.3 GPa. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、電子部品素子をベース基板にハンダを用いてフリップチップ実装して成る電子部品装置に関するものである。   The present invention relates to an electronic component device in which electronic component elements are flip-chip mounted on a base substrate using solder.

従来、電子部品装置の小型化の要求に伴い、電子部品素子の入出力電極にバンプを形成し、ベース基板の接続電極とフェイスダウンにてフリップチップ実装を行なうことにより製作された電子部品装置が知られている。このような例として図4に、電子部品素子(弾性表面波素子)101をハンダを用いてフリップチップ実装して成る電子部品装置としての弾性表面波装置100の断面図を示す。   2. Description of the Related Art Conventionally, an electronic component device manufactured by forming bumps on input / output electrodes of an electronic component element and performing flip-chip mounting face-down with a connection electrode of a base substrate in response to a demand for downsizing of an electronic component device. Are known. As an example of this, FIG. 4 shows a cross-sectional view of a surface acoustic wave device 100 as an electronic component device in which an electronic component element (surface acoustic wave element) 101 is flip-chip mounted using solder.

電子部品素子101は、タンタル酸リチウム基板、ニオブ酸リチウム基板などの単結晶圧電基板の一方主面(図4では下面)にIDT電極110が形成され、さらに同じ主面に、このIDT電極110に信号を供給したり、IDT電極110から信号を取り出したりする接続電極104が形成されている。なお、これらのIDT電極110や接続電極104は、圧電基板上に薄膜技法を用いてアルミニウムなどで形成されている。   In the electronic component element 101, an IDT electrode 110 is formed on one main surface (lower surface in FIG. 4) of a single crystal piezoelectric substrate such as a lithium tantalate substrate or a lithium niobate substrate, and the IDT electrode 110 is formed on the same main surface. A connection electrode 104 for supplying a signal and taking out a signal from the IDT electrode 110 is formed. These IDT electrodes 110 and connection electrodes 104 are formed of aluminum or the like on a piezoelectric substrate using a thin film technique.

また、ベース基板102は例えば、アルミナセラミックスなどからなり、ベース基板の上面に、弾性表面波素子101の接続電極104と接続される素子接続用電極105が配置されている。   The base substrate 102 is made of, for example, alumina ceramics, and an element connection electrode 105 connected to the connection electrode 104 of the surface acoustic wave element 101 is disposed on the upper surface of the base substrate.

そして、電子部品素子である弾性表面波素子101は、その下面とベース基板102の上面との間に所定間隔を形成するように、弾性表面波素子101の接続電極104とベース基板102の素子接続用電極105とがハンダバンプ部材103を用いて接続されている。また、弾性表面波素子101の外周には外周封止電極106が形成され、この部分とベース基板102の外周封止導体膜107とがハンダ接合部材108によって接合され、弾性表面波素子101の下面とベース基板102の上面との間の空隙が気密封止されている。この結果、弾性表面波素子101の下面に形成されたIDT電極110は、水分の浸入等による変質を防ぐことができ、安定した信頼性性能を確保できる。   The surface acoustic wave element 101 that is an electronic component element is connected to the connection electrode 104 of the surface acoustic wave element 101 and the base substrate 102 so that a predetermined interval is formed between the lower surface thereof and the upper surface of the base substrate 102. The electrode 105 is connected with the solder bump member 103. An outer peripheral sealing electrode 106 is formed on the outer periphery of the surface acoustic wave element 101, and this portion and the outer peripheral sealing conductor film 107 of the base substrate 102 are bonded together by a solder bonding member 108. And the upper surface of the base substrate 102 are hermetically sealed. As a result, the IDT electrode 110 formed on the lower surface of the surface acoustic wave element 101 can prevent deterioration due to moisture intrusion and the like, and can ensure stable reliability performance.

また、より気密性を高めて信頼性を向上させるために通常は、ベース基板102と接続・封止を行なった弾性表面波素子101の上面側から、エポキシ樹脂ペースト等を塗布、硬化処理することにより外装樹脂層109が形成されている。   In order to improve airtightness and improve reliability, usually, an epoxy resin paste or the like is applied and cured from the upper surface side of the surface acoustic wave element 101 connected and sealed with the base substrate 102. Thus, the exterior resin layer 109 is formed.

なお、ハンダバンプ部材103やハンダ接合部材108に用いられるハンダは、一般的には、Pb/Snを主成分とし、その体積膨張率が3〜5%程度となっている。
特願2002−222582号
The solder used for the solder bump member 103 and the solder bonding member 108 generally has Pb / Sn as a main component and has a volume expansion coefficient of about 3 to 5%.
Japanese Patent Application No. 2002-222582

しかしながら、従来の弾性表面波装置100においては、マザーボードへの実装時において、ハンダリフロー等の熱が弾性表面波装置100の内部にも加わるため、弾性表面波素子101の外周封止電極106とベース基板102の外周封止導体膜107とを接合しているハンダ接合部材108及び接続電極104と素子接続電極105とを接続しているハンダバンプ部材103にも熱が加わる。この時、ハンダバンプ部材103及びハンダ接合部材108に過度の熱が加わると、これらが再溶融するとともに前述したように体積が3〜5%膨張する。   However, in the conventional surface acoustic wave device 100, heat such as solder reflow is also applied to the inside of the surface acoustic wave device 100 when mounted on the mother board. Heat is also applied to the solder bonding member 108 that bonds the outer peripheral sealing conductor film 107 of the substrate 102 and the solder bump member 103 that connects the connection electrode 104 and the element connection electrode 105. At this time, if excessive heat is applied to the solder bump member 103 and the solder bonding member 108, they are remelted and the volume expands by 3 to 5% as described above.

しかしハンダ接合部材108の外周面が、外装樹脂層109によって覆われていることから、外装樹脂109の体積膨張率が低すぎる場合には、再溶融して体積が膨張したハンダバンプ部材103及びハンダ接合部材108が弾性表面波素子101とベース基板102との間の空隙を互いの方向に流れ出すこととなり、その結果、弾性表面波素子101の接続電極104と外周封止電極106とが短絡してしまうという問題を、また、外装樹脂109の体積膨張率が大きすぎる場合には、加熱によって外層樹脂109が膨張した際に外装樹脂109が弾性表面波素子101をベース基板102から引き剥がしてしまい、その結果、ハンダ接合部材108が細り、接続不良を発生させてしまうという問題点を有していた。   However, since the outer peripheral surface of the solder bonding member 108 is covered with the outer resin layer 109, when the volume expansion coefficient of the outer resin 109 is too low, the solder bump member 103 and the solder bonding member whose volume is expanded by re-melting. The member 108 flows in the gap between the surface acoustic wave element 101 and the base substrate 102 in the mutual direction. As a result, the connection electrode 104 and the outer peripheral sealing electrode 106 of the surface acoustic wave element 101 are short-circuited. If the volume expansion coefficient of the exterior resin 109 is too large, the exterior resin 109 peels off the surface acoustic wave element 101 from the base substrate 102 when the outer layer resin 109 expands due to heating. As a result, there is a problem that the solder joint member 108 is thinned and connection failure occurs.

本発明は上述の課題に鑑みて案出されたものであり、その目的は、マザーボードに実装する際、内部のハンダの再溶融による短絡や接続不良を防止することができる電子部品装置を提供することにある。   The present invention has been devised in view of the above-described problems, and an object of the present invention is to provide an electronic component device that can prevent a short circuit and poor connection due to remelting of internal solder when mounted on a motherboard. There is.

本発明の電子部品装置は、一方主面に接続電極及び外周封止電極が形成された電子部品素子と、上面にハンダバンプ部材を介して前記接続電極と接続する素子接続用電極、ハンダ接合部材を介して前記外周封止電極と接合する外周封止導体膜及び外部端子電極が夫々形成されたベース基板とを、前記ベース基板と前記電子部品素子との間に所定間隔が形成されるようにして接合するとともに、前記電子部品素子の側面及及びハンダ接合部材の外周面に外装部材を配して成る電子部品装置において、前記外装部材を、体積膨張率が6%〜11%で、且つ、前記ハンダ接合部材の溶融温度における弾性率が0.3GPa以下の低弾性材料により形成することを特徴とするものである。   An electronic component device according to the present invention includes an electronic component element having a connection electrode and a peripheral sealing electrode formed on one main surface, an element connection electrode connected to the connection electrode via a solder bump member, and a solder joint member on an upper surface. A base substrate on which an outer peripheral sealing conductor film and an external terminal electrode that are joined to the outer peripheral sealing electrode are respectively formed so that a predetermined interval is formed between the base substrate and the electronic component element. In the electronic component device, in which an exterior member is disposed on the side surface of the electronic component element and the outer peripheral surface of the solder joint member, the exterior member has a volume expansion coefficient of 6% to 11%, and The solder bonding member is formed of a low elastic material having an elastic modulus at a melting temperature of 0.3 GPa or less.

また、本発明の電子部品装置は、上記構成において、前記ハンダバンプ部材と前記ハンダ接合部材とが同一組成のハンダから成ることを特徴とするものである。   The electronic component device of the present invention is characterized in that, in the above configuration, the solder bump member and the solder joint member are made of solder of the same composition.

さらに、本発明の電子部品装置は、上記構成において、外装部材がエポキシ樹脂を主成分とし、かつ、シリカフィラ60wt%〜70wt%とシリコーン樹脂5wt%〜10wt%とを含有させた低弾性材料から成ることを特徴とするものである。   Furthermore, in the electronic component device of the present invention, in the above configuration, the exterior member is composed of an epoxy resin as a main component, and a low-elasticity material containing silica filler 60 wt% to 70 wt% and silicone resin 5 wt% to 10 wt%. It is characterized by comprising.

また、本発明の電子部品装置は、上記構成において、前記電子部品素子の一方主面、ベース基板の上面及びハンダ接合部材の内周面によって囲まれる領域に、気体が充填されていることを特徴とするとするものである。   In the electronic component device of the present invention, in the above configuration, a gas is filled in a region surrounded by the one main surface of the electronic component element, the upper surface of the base substrate, and the inner peripheral surface of the solder joint member. It is supposed to be.

本発明の電子部品装置によれば、一方主面に接続電極及び外周封止電極が形成された電子部品素子と、上面にハンダバンプ部材を介して接続電極と接続する素子接続用電極、ハンダ接合部材を介して外周封止電極と接合する外周封止導体膜及び外部端子電極が夫々形成されたベース基板とを、ベース基板と電子部品素子との間に所定間隔が形成されるようにして接合するとともに、電子部品素子の側面及びハンダ接合部材の外周面に外装部材を配して成る電子部品装置において、側面外装部材を、体積膨張率が6%〜11%で、且つ、ハンダ接合部材の溶融温度における弾性率が0.3GPa以下の低弾性材料により形成したことから、電子部品装置をマザーボードに実装する際、ハンダリフロー等の熱でハンダバンプ部材及びハンダ接合部材が溶融し体積膨張が生じ、その体積膨張による応力によって電子部品素子を上方に持ち上げる力が働いた時に、側面外装部材も同時に良好に伸びてベース基板の表面と電子部品素子の一方主面との間の間隔の変化に追従するので、再溶融したハンダが電子部品素子とベース基板との空隙内を互いの方向に向かって流れ出して短絡を発生させることはない。また、外装部材の体積膨張率が適切に選ばれているため、ハンダバンプ部材の接続不良やハンダ接合部材の細りによる気密封止不良の発生を防止することができる。   According to the electronic component device of the present invention, an electronic component element having a connection electrode and a peripheral sealing electrode formed on one main surface, an element connection electrode connected to the connection electrode via a solder bump member on the upper surface, and a solder joint member The outer peripheral sealing conductor film to be bonded to the outer peripheral sealing electrode and the base substrate on which the external terminal electrode is formed are bonded so that a predetermined interval is formed between the base substrate and the electronic component element. In addition, in the electronic component device in which the exterior member is disposed on the side surface of the electronic component element and the outer peripheral surface of the solder joint member, the side surface exterior member has a volume expansion coefficient of 6% to 11% and the solder joint member is melted. Because it is made of a low elastic material with an elastic modulus at a temperature of 0.3 GPa or less, when mounting an electronic component device on a mother board, solder bump members and solder joints are heated by heat such as solder reflow. When the force that lifts the electronic component element upward due to the stress due to the volume expansion is applied, the side surface exterior member also stretches well at the same time, and the surface of the base substrate and one main surface of the electronic component element Therefore, the remelted solder does not flow out in the gap between the electronic component element and the base substrate in the direction of each other to cause a short circuit. Moreover, since the volume expansion coefficient of the exterior member is appropriately selected, it is possible to prevent the occurrence of poor airtight sealing due to poor connection of the solder bump member or narrowing of the solder joint member.

また、本発明の電子部品装置よれば、上記構成において、ハンダバンプ部材とハンダ接合部材とが同一組成のハンダから成る場合には、ハンダバンプ部材とハンダ接合部材とを同一の工程で同時に形成できることから工程短縮が可能となり、さらに、両者の体積膨張率が同一であるために、電子部品装置をマザーボードに実装する際ハンダリフロー等の熱によるハンダバンプ部材とハンダ接合部材との体積膨張率差による接続不良が発生することがない。   In addition, according to the electronic component device of the present invention, in the above configuration, when the solder bump member and the solder joint member are made of solder of the same composition, the solder bump member and the solder joint member can be formed simultaneously in the same process. Furthermore, since the volume expansion coefficient of both is the same, there is a poor connection due to the difference in volume expansion coefficient between the solder bump member and the solder joint member due to heat such as solder reflow when mounting the electronic component device on the motherboard. It does not occur.

さらに、本発明の電子部品装置によれば上記構成おいて、外装部材がエポキシ樹脂を主成分とし、かつ、シリカフィラ60wt%〜70wt%とシリコーン樹脂5wt%〜10wt%とを含有させた低弾性材料から成る場合には、外装部材を、体積膨張率が6〜11%で、且つ、ハンダ接合部材の溶融温度における弾性率が0.3GPa以下の低弾性材料とすることができる。   Furthermore, according to the electronic component device of the present invention, in the above configuration, the exterior member is mainly composed of epoxy resin, and low elasticity including 60 wt% to 70 wt% of silica filler and 5 wt% to 10 wt% of silicone resin. When made of a material, the exterior member can be a low elastic material having a volume expansion coefficient of 6 to 11% and an elastic modulus at the melting temperature of the solder joint member of 0.3 GPa or less.

また、本発明の電子部品装置よれば、上記構成において、電子部品素子の下面、ベース基板の上面及びハンダ接合部材の内周面によって囲まれる領域に気体が充填されている場合には、電子部品装置のマザーボードへの実装時の熱で気体も同時に膨張し、電子部品素子を上方に持ち上げる力がさらに強化されるので、ベース基板の上面と電子部品素子の下面との間を広げることがより確実になり、ハンダの流れ出しによる短絡防止はいっそう確実なものにすることができる。   According to the electronic component device of the present invention, in the above configuration, when the gas is filled in the region surrounded by the lower surface of the electronic component element, the upper surface of the base substrate, and the inner peripheral surface of the solder joint member, When the device is mounted on the motherboard, the gas expands at the same time, and the force to lift the electronic component element upward is further strengthened, so it is more certain that the space between the upper surface of the base substrate and the lower surface of the electronic component element is widened. Thus, it is possible to further prevent the short circuit due to the flowing out of the solder.

以下、本発明の電子部品装置を添付の図面に基づいて詳説する。なお、説明は電子部品素子として弾性表面波素子を用いた弾性表面波装置を例にとって行なう。   Hereinafter, an electronic component device of the present invention will be described in detail with reference to the accompanying drawings. The description will be made by taking a surface acoustic wave device using a surface acoustic wave element as an electronic component element as an example.

図1は本発明の電子部品装置の一実施例である弾性表面波装置の断面図であり、図2は弾性表面波装置1に用いるベース基板3の平面図である。また、図3(a)はハンダバンプ部材及びハンダ接合部材の固化時の弾性表面波装置の断面図であり、(b)はハンダバンプ部材及びハンダ接合部材の溶融時の弾性表面波装置の断面図である。   FIG. 1 is a cross-sectional view of a surface acoustic wave device which is an embodiment of an electronic component device of the present invention, and FIG. 2 is a plan view of a base substrate 3 used in the surface acoustic wave device 1. 3A is a sectional view of the surface acoustic wave device when the solder bump member and the solder joint member are solidified, and FIG. 3B is a sectional view of the surface acoustic wave device when the solder bump member and the solder joint member are melted. is there.

弾性表面波装置(電子部品装置)1は、主に弾性表面波素子(電子部品素子)2、ベース基板3、ハンダバンプ部材4、ハンダ接合部材5、外装部材6より構成されている。   A surface acoustic wave device (electronic component device) 1 mainly includes a surface acoustic wave element (electronic component element) 2, a base substrate 3, a solder bump member 4, a solder bonding member 5, and an exterior member 6.

弾性表面波素子2としては弾性表面波共振子、弾性表面波フィルタなどが例示でき、このような弾性表面波素子2は、水晶やニオブ酸リチウム、タンタル酸リチウムなどの圧電基板の一方主面(図1では下面)に、図示しないインターデジタルトランスデューサ電極(本発明では櫛歯状電極及び反射器電極を含み、以下単にIDT電極という)およびこのIDT電極と接続する接続電極8を形成することにより製作される。また、この圧電基板下面の外周には全周にわたって、IDT電極や接続電極8を取り囲むように環状の外周封止電極9が形成されている。これらの各電極はAl、Cu等の金属材料からなり、例えばフォトリソグラフィ技術により形成される。また、必要に応じてその表面にCr、Ni、Auなどの層が形成される。   Examples of the surface acoustic wave element 2 include a surface acoustic wave resonator, a surface acoustic wave filter, and the like. The surface acoustic wave element 2 has one main surface of a piezoelectric substrate such as quartz, lithium niobate, or lithium tantalate ( It is manufactured by forming an interdigital transducer electrode (in the present invention, including a comb-like electrode and a reflector electrode, hereinafter simply referred to as an IDT electrode) and a connection electrode 8 connected to the IDT electrode on the lower surface in FIG. Is done. An annular outer peripheral sealing electrode 9 is formed on the outer periphery of the lower surface of the piezoelectric substrate so as to surround the IDT electrode and the connection electrode 8 over the entire periphery. Each of these electrodes is made of a metal material such as Al or Cu, and is formed by, for example, a photolithography technique. Further, a layer of Cr, Ni, Au or the like is formed on the surface as necessary.

ベース基板3は、例えばガラス−セラミック材料などの多層基板から成り、表面(図1では上面)には、弾性表面波素子2の接続電極8と対向する素子接続用電極10、及び外周封止電極9と対向する環状の外周封止導体膜11が形成されている。また、ベース基板3の下面には、外部端子電極12が形成されており、素子接続電極10と外部端子電極12とはビアホール導体13を含む内部配線パターンにて接続されている。   The base substrate 3 is made of, for example, a multilayer substrate such as a glass-ceramic material, and has an element connection electrode 10 facing the connection electrode 8 of the surface acoustic wave element 2 and an outer peripheral sealing electrode on the surface (upper surface in FIG. 1). An annular outer peripheral sealing conductor film 11 facing 9 is formed. An external terminal electrode 12 is formed on the lower surface of the base substrate 3, and the element connection electrode 10 and the external terminal electrode 12 are connected by an internal wiring pattern including a via-hole conductor 13.

ここで弾性表面波素子2は、接続電極8とベース基板3の素子接続用電極10とをハンダバンプ部材4によって、弾性表面波素子2の下面とベース基板3の上面との間に所定の空隙を形成するようにベース基板3と電気的に接続されている。そして、外周封止電極9と外周導体膜11とをハンダ接合部材5によって接合することによって、弾性表面波素子2の下面とベース基板3の上面との間の空隙が気密に封止され、空隙内部を気密に保つことができ、空気中の湿気の浸入などによるIDT電極の劣化を防止することができる。   Here, in the surface acoustic wave element 2, a predetermined gap is formed between the lower surface of the surface acoustic wave element 2 and the upper surface of the base substrate 3 by connecting the connection electrode 8 and the element connection electrode 10 of the base substrate 3 with the solder bump member 4. The base substrate 3 is electrically connected so as to be formed. Then, by bonding the outer peripheral sealing electrode 9 and the outer peripheral conductor film 11 with the solder bonding member 5, the air gap between the lower surface of the surface acoustic wave element 2 and the upper surface of the base substrate 3 is hermetically sealed. The inside can be kept airtight, and deterioration of the IDT electrode due to infiltration of moisture in the air can be prevented.

弾性表面波素子2とベース基板3との接続・接合にあたっては、まず、ベース基板2にハンダバンプ部材4とハンダ接合部材5とをそれぞれ形成する。このハンダバンプ部材4とハンダ接合部材5は、素子接続用電極10の表面及び外周封止導体膜11の表面にペースト状のハンダをそれぞれ塗布して形成する。なお、バンプ状の形状とするために、塗布したハンダの一次加熱処理及び洗浄処理を行なう。これによって、塗布されたハンダは、素子接続用電極10及び外周封止導体膜11上で半球状となり、さらに、不要なフラックス成分を除去することができる。そして、上述のバンプ状のハンダが形成されたベース基板3に弾性表面波素子2を載置し、リフロー処理を行なうことによりハンダバンプ部材4によって電気的な接続を施し、ハンダ接合部材5によって機械的な接合を行なうとともに気密封止を行なう。これにより、ハンダバンプ部材4及びハンダ接合部材5の高さに相当する空隙が、弾性表面波素子2の下面とベース基板3の上面との間にできかつ気密封止されるため、弾性表面波素子2の下面において安定した弾性表面波を振動させることができる。   In connecting / bonding the surface acoustic wave element 2 and the base substrate 3, first, the solder bump member 4 and the solder bonding member 5 are respectively formed on the base substrate 2. The solder bump member 4 and the solder bonding member 5 are formed by applying paste-like solder on the surface of the element connecting electrode 10 and the surface of the outer peripheral sealing conductor film 11, respectively. In order to obtain a bump-like shape, primary heat treatment and cleaning treatment of the applied solder are performed. As a result, the applied solder becomes hemispherical on the element connection electrode 10 and the outer peripheral sealing conductor film 11, and an unnecessary flux component can be removed. Then, the surface acoustic wave element 2 is placed on the base substrate 3 on which the above-described bump-shaped solder is formed, and is electrically connected by the solder bump member 4 by performing a reflow process, and mechanically by the solder bonding member 5. And performing hermetic sealing. As a result, a gap corresponding to the height of the solder bump member 4 and the solder bonding member 5 is formed between the lower surface of the surface acoustic wave element 2 and the upper surface of the base substrate 3 and is hermetically sealed. A stable surface acoustic wave can be oscillated on the lower surface of 2.

なお、上述の、ベース基板3に電気的な接続及び機械的な接合が施された弾性表面波素子2には、上面側及び側面外周を覆って外装部材6が被着形成される。ただし、上面側の外装部材6は外部からの機械的衝撃に対し充分な強度を確保できれば、必ずしも形成する必要はない。   The surface acoustic wave element 2 that is electrically connected and mechanically bonded to the base substrate 3 is provided with an exterior member 6 that covers the upper surface side and the outer periphery of the side surface. However, it is not always necessary to form the exterior member 6 on the upper surface side as long as sufficient strength against mechanical shock from the outside can be secured.

そして本発明の電子部品装置1の特徴的なことは、外装部材6を、体積膨張率が6%〜11%で、且つ、ハンダ接合部材5の溶融温度における弾性率が0.3GPa以下の低弾性材料により形成することである。外装部材6を、体積膨張率が6%〜11%の範囲することにより、外装部材6がハンダバンプ部材4及びハンダ接合部材5の溶融による体積膨張によるベース基板3の表面と弾性表面波素子2との間の間隔の変化に追従することができる。このため、弾性表面波装置1をマザーボードに実装する際に、ハンダリフロー等の熱でハンダバンプ部材4及びハンダ接合部材5が溶融し体積膨張が生じ、弾性表面波素子1を上方に持ち上げる力が働いたとしても、外装部材6が良好に伸びるためにベース基板3の表面と弾性表面波素子1の下面との間は広がることができる。すなわち、図3(a)に示すように、マザーボードに実装する前のベース基板3の上面と弾性表面波素子2の下面との間隔Aは、マザーボードに実装時ハンダバンプ部材4及びハンダ接合部材5が溶融し体積膨張が生じる結果、図3(b)に示す間隔Bとなる。このとき間隔A<間隔Bの関係となり、ベース基板3の上面と弾性表面波素子2の下面との間隔が広がることにより、ハンダバンプ部材4及びハンダ接合部材5の体積膨張(特に上下方向の動き)は妨げられることがない。よって、従来のように溶融したハンダが弾性表面波素子2とベース基板3との空隙を互いの方向に向かって流れ出し短絡を発生させることはない。   A characteristic of the electronic component device 1 of the present invention is that the exterior member 6 has a volume expansion coefficient of 6% to 11% and a low elastic modulus of 0.3 GPa or less at the melting temperature of the solder bonding member 5. It is made of an elastic material. By setting the volume expansion coefficient of the exterior member 6 in the range of 6% to 11%, the surface of the base substrate 3 and the surface acoustic wave element 2 due to the volume expansion of the exterior member 6 due to melting of the solder bump member 4 and the solder bonding member 5 It is possible to follow the change in the interval between the two. For this reason, when the surface acoustic wave device 1 is mounted on the mother board, the solder bump member 4 and the solder joint member 5 are melted by heat such as solder reflow to cause volume expansion, and the force to lift the surface acoustic wave element 1 upward works. Even so, since the exterior member 6 extends well, the space between the surface of the base substrate 3 and the lower surface of the surface acoustic wave element 1 can be widened. That is, as shown in FIG. 3A, the distance A between the upper surface of the base substrate 3 and the lower surface of the surface acoustic wave element 2 before being mounted on the mother board is such that the solder bump member 4 and the solder bonding member 5 are mounted on the mother board. As a result of melting and volume expansion, an interval B shown in FIG. At this time, the distance A <the distance B, and the distance between the upper surface of the base substrate 3 and the lower surface of the surface acoustic wave element 2 increases, so that the volume expansion (particularly the vertical movement) of the solder bump member 4 and the solder bonding member 5 occurs. Will not be disturbed. Therefore, the melted solder as in the prior art does not flow out through the gap between the surface acoustic wave element 2 and the base substrate 3 in the direction of each other, thereby causing a short circuit.

また、ハンダ接合部材5の溶融温度における弾性率が0.3GPa以下の低弾性材料により形成することにより、ハンダと外装部材6との体積膨張に差があっても、外装部材6のハンダ接合部材の溶融温度での弾性率を0.3GPa以下とすることで、ハンダの体積膨張にすぐに追随することが可能となり、溶融したハンダの体積膨張を外装部材6側で十分吸収することができる。   Moreover, even if there is a difference in volume expansion between the solder and the exterior member 6 by forming the solder joint member 5 with a low elastic material having an elastic modulus at a melting temperature of 0.3 GPa or less, the solder joint member of the exterior member 6 By setting the elastic modulus at the melting temperature of 0.3 GPa or less, it is possible to immediately follow the volume expansion of the solder, and the volume expansion of the molten solder can be sufficiently absorbed on the exterior member 6 side.

なお、外装部材6の体積膨張率が6%未満であるとハンダバンプ部材4及びハンダ接合部材5の体積膨張(特に上下方向の動き)が妨げられることになり、ハンダの流れ出しによる短絡不良の原因となる。また、外装部材6の体積膨張率が11%を超えるとハンダバンプ部材4及びハンダ接合部材5の体積膨張(特に上下方向の動き)よりも、外装部材6の体積膨張が大きくなりすぎるため、ハンダが細り接続不良の原因となる。また、外装部材6のハンダ接合部材の溶融温度での弾性率が0.3GPaを超えると、外装部材6の体積膨張に要する時間が長いものとなり、外装部材6の体積膨張が溶融したハンダの体積膨張に追随することができず、その結果、内部にハンダ流れが発生しやすくなる危険がある。従って、本発明においては、外装部材6を体積膨張率が6%〜11%で、且つ、ハンダ接合部材5の溶融温度における弾性率が0.3GPa以下の低弾性材料により形成することが重要である。   If the volume expansion rate of the exterior member 6 is less than 6%, the volume expansion (particularly the vertical movement) of the solder bump member 4 and the solder bonding member 5 will be hindered, which may cause a short circuit failure due to the solder flowing out. Become. Further, if the volume expansion rate of the exterior member 6 exceeds 11%, the volume expansion of the exterior member 6 becomes too large compared to the volume expansion (particularly the movement in the vertical direction) of the solder bump member 4 and the solder bonding member 5. It may cause a thin connection failure. Further, when the elastic modulus at the melting temperature of the solder bonding member of the exterior member 6 exceeds 0.3 GPa, the time required for the volume expansion of the exterior member 6 becomes long, and the volume of the solder in which the volume expansion of the exterior member 6 is melted. There is a risk that it cannot follow the expansion, and as a result, a solder flow tends to occur inside. Therefore, in the present invention, it is important to form the exterior member 6 from a low elastic material having a volume expansion coefficient of 6% to 11% and an elastic modulus at the melting temperature of the solder bonding member 5 of 0.3 GPa or less. is there.

また、本発明の電子部品装置において、ハンダバンプ部材4とハンダ接合部材5とが同一組成のハンダから成る場合には、ハンダバンプ部材4とハンダ接合部材5とを同一の工程で同時に形成できることから、工程短縮が可能となるとともに、両者の体積膨張率が同一であるために、電子部品装置をマザーボードに実装する際、ハンダリフロー等の熱によるハンダバンプ部材4とハンダ接合部材5との体積膨張率差に起因する接続不良が発生したりすることがなく接続信頼性を損なうこともない。   Further, in the electronic component device of the present invention, when the solder bump member 4 and the solder joint member 5 are made of solder having the same composition, the solder bump member 4 and the solder joint member 5 can be simultaneously formed in the same process. Since the volume expansion coefficient of both is the same, the volume expansion coefficient difference between the solder bump member 4 and the solder joint member 5 due to heat such as solder reflow is reduced when the electronic component device is mounted on the motherboard. There is no connection failure due to this, and connection reliability is not impaired.

また、本発明の電子部品装置において、外装部材6をエポキシ樹脂を主成分とし、かつ、シリカフィラを60wt%〜70wt%とシリコーン樹脂5wt%〜10wt%を含有させた低弾性材料から成るものとした場合には、外装部材6を体積膨張率が6%〜11%で、且つ、ハンダ接合部材5の溶融温度における弾性率が0.3GPa以下の低弾性材料とすることが容易にできる。   Further, in the electronic component device of the present invention, the exterior member 6 is made of a low elastic material containing an epoxy resin as a main component, silica filler 60 wt% to 70 wt% and silicone resin 5 wt% to 10 wt%. In this case, the exterior member 6 can be easily made of a low elastic material having a volume expansion coefficient of 6% to 11% and an elastic modulus at the melting temperature of the solder bonding member 5 of 0.3 GPa or less.

なお、ここでエポキシ樹脂は外装部材6の主成分であり、ビスフェノールエポキシ樹脂やビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ナフタリン骨格型エポキシ樹脂、並びにフェノール樹脂と硬化剤としての酸無水物硬化剤、フェノール樹脂系硬化剤等の構成が例示される。   Here, the epoxy resin is the main component of the exterior member 6, and bisphenol epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, naphthalene skeleton type epoxy resin, and phenol resin and acid anhydride curing as a curing agent. Examples of the composition include an agent and a phenol resin curing agent.

また、シリカフィラは外装部材6の骨格成分で外装部材6の熱膨張係数の支配的要素となる。ここでシリカフィラが60wt%未満であると、外装部材6の体積膨張率が11%を超えるとともにリフロー後の封止不良が増加する傾向があり好ましくない。また、シリカフィラが70wt%を超えると、外装部材6が硬くなりハンダ接合部材5の溶融温度における弾性率が0.3GPaを超える傾向にある。   Further, the silica filler is a skeleton component of the exterior member 6 and becomes a dominant element of the thermal expansion coefficient of the exterior member 6. Here, when the silica filler is less than 60 wt%, the volume expansion coefficient of the exterior member 6 exceeds 11%, and the sealing failure after reflow tends to increase, which is not preferable. On the other hand, when the silica filler exceeds 70 wt%, the exterior member 6 becomes hard and the elastic modulus at the melting temperature of the solder joint member 5 tends to exceed 0.3 GPa.

さらにシリコーン樹脂は、樹脂の弾性率の制御が可能であると共に、外装部材6が硬化した後に熱応力の吸収体として作用する。シリコーン樹脂の含有量が5wt%未満では、外装部材6のハンダ接合部材5の溶融温度における弾性率が0.3GPaを超える傾向があり、また、樹脂の硬化収縮によりベース基板3の反りが大きくなる問題が発生する。シリコーン樹脂が10wt%を超えると、外装部材6の常温(25℃)における弾性率が3.5GPaと小さくなり、外部衝撃から弾性表面波素子2を保護するのに必要な強度を維持することが困難となる傾向がある。   Furthermore, the silicone resin can control the elastic modulus of the resin and acts as a thermal stress absorber after the exterior member 6 is cured. When the content of the silicone resin is less than 5 wt%, the elastic modulus at the melting temperature of the solder bonding member 5 of the exterior member 6 tends to exceed 0.3 GPa, and warping of the base substrate 3 increases due to curing shrinkage of the resin. A problem occurs. When the silicone resin exceeds 10 wt%, the elastic modulus of the exterior member 6 at normal temperature (25 ° C.) is as small as 3.5 GPa, and the strength necessary for protecting the surface acoustic wave element 2 from external impact can be maintained. It tends to be difficult.

なお、シリカはその平均粒子径が5μm、最大粒径が20μm程度であり、シリコーン樹脂はその平均粒径が1μm以下である。そして、これらの成分の含有量を制御することにより樹脂の体積膨張率の制御が可能となる。一般にこのような組成物の体積膨張率は次式で求められる。   Silica has an average particle size of 5 μm and a maximum particle size of about 20 μm, and silicone resin has an average particle size of 1 μm or less. The volume expansion coefficient of the resin can be controlled by controlling the contents of these components. In general, the volume expansion coefficient of such a composition is obtained by the following equation.

体積膨張率(%)=α1(Tg―25℃)+α2(220℃−Tg) (1)
(1) 式において、Tgは外装部材6のガラス転移温度であり、α1は外装部材6のガラス転移温度(Tg)より低温側での熱膨張係数であり、α2は外装部材6のTgより高温側での熱膨張係数である。
Volume expansion rate (%) = α1 (Tg−25 ° C.) + Α2 (220 ° C.−Tg) (1)
In the formula (1), Tg is the glass transition temperature of the exterior member 6, α1 is the thermal expansion coefficient on the lower temperature side than the glass transition temperature (Tg) of the exterior member 6, and α2 is higher than the Tg of the exterior member 6. Coefficient of thermal expansion on the side.

(1)式で求められる外装部材6の体積膨張率は、その値が6%〜11%となるように外装部材6のガラス転移温度(Tg)、熱膨張係数(α1,α2)を決定すればよい。それにより外装部材6はハンダバンプ部材4及びハンダ接合部材5の体積膨張に追従して変形し、ベース基板3の上面と弾性表面波素子2の下面との間の間隔が変化することができ、その結果、ハンダの流れ出しによる短絡不良もなく、弾性表面波素子2との密着強度も確保できる。   The volume expansion coefficient of the exterior member 6 obtained by the equation (1) is determined by determining the glass transition temperature (Tg) and the thermal expansion coefficient (α1, α2) of the exterior member 6 so that the values thereof are 6% to 11%. That's fine. As a result, the exterior member 6 is deformed following the volume expansion of the solder bump member 4 and the solder bonding member 5, and the distance between the upper surface of the base substrate 3 and the lower surface of the surface acoustic wave element 2 can be changed. As a result, there is no short circuit failure due to the flow of solder, and the adhesion strength with the surface acoustic wave element 2 can be secured.

また、本発明の電子部品装置1において、電子部品素子2の下面、ベース基板3の上面及びハンダ接合部材5の内周面によって囲まれる領域に、気体を充填した場合には、電子部品装置1のマザーボードへの実装時の熱で気体も同時に膨張し、電子部品素子2を上方に持ち上げる力がさらに強化されるので、ベース基板3の表面と電子部品素子2の下面との間を広げることがさらに確実になり、ハンダの流れ出しによる短絡防止はいっそう確実なものになる。   Further, in the electronic component device 1 of the present invention, when a gas is filled in a region surrounded by the lower surface of the electronic component element 2, the upper surface of the base substrate 3, and the inner peripheral surface of the solder bonding member 5, the electronic component device 1 Since the gas expands simultaneously with the heat when mounted on the mother board and the force for lifting the electronic component element 2 upward is further strengthened, the space between the surface of the base substrate 3 and the lower surface of the electronic component element 2 can be widened. Furthermore, it becomes more reliable, and the prevention of short circuit due to the flowing out of solder becomes even more reliable.

このような気体としてはアルゴン、窒素等の不活性ガスが例示される。   Examples of such a gas include inert gases such as argon and nitrogen.

なお、上述の実施例では、電子部品素子に弾性表面波素子を用いた電子部品装置である弾性表面波装置で説明したが、電子部品素子にハンダパンプを用いてベース基板に接続し、且つ側面を外装部材で被覆した電子部品装置にも広く利用できる。   In the above-described embodiment, the surface acoustic wave device, which is an electronic component device using a surface acoustic wave element as the electronic component element, has been described. However, the electronic component element is connected to the base substrate using a solder pump, and the side surface is The present invention can also be widely used for an electronic component device covered with an exterior member.

次に外装部材6において、体積膨張率の異なる10種類の樹脂を用いて評価を行なった。この外装部材6の体積膨張率は3.3〜16%の間で異なっているものであり、この10種類の樹脂で外装部材6を形成した弾性表面波装置1をそれぞれ作成した。ここでの体積膨張率の可変は、表1に示すようにシリカ、シリコーン樹脂、2種類のフェノール樹脂系硬化剤、酸無水硬化剤の含有量を調整して行なった。次に、これら作成した10種類の弾性表面波装置1をリフロー処理後(温度220℃、30秒 ピーク245℃)、封止状態をX線検査装置により封止部材の形状を検査した。これらの樹脂の体積膨張率、ガラス転移温度(Tg)、熱膨張係数(α1,α2)、弾性率(25℃、220℃)とX線検査装置による封止状態の評価結果を表1に示す。   Next, the exterior member 6 was evaluated using 10 types of resins having different volume expansion coefficients. The volume expansion coefficient of the exterior member 6 varies between 3.3 to 16%, and the surface acoustic wave devices 1 in which the exterior member 6 is formed of these 10 kinds of resins were respectively prepared. As shown in Table 1, the volume expansion coefficient was varied by adjusting the contents of silica, silicone resin, two types of phenol resin curing agents, and acid anhydride curing agents. Next, the 10 types of surface acoustic wave devices 1 thus prepared were subjected to reflow treatment (temperature: 220 ° C., peak: 245 ° C. for 30 seconds), and the sealing state was inspected with an X-ray inspection device. Table 1 shows the evaluation results of the volume expansion coefficient, glass transition temperature (Tg), thermal expansion coefficient (α1, α2), elastic modulus (25 ° C., 220 ° C.), and sealing state of these resins using an X-ray inspection apparatus. .

なお、ここで用いる弾性表面波装置1の外形サイズは1.6mm×1.8mm ×0.7mm程度であり、外装部材6の厚みは0.1mm程度である。また、本評価では、溶融温度が220℃のハンダを用いた。

Figure 2005217177
Note that the external size of the surface acoustic wave device 1 used here is about 1.6 mm × 1.8 mm × 0.7 mm, and the thickness of the exterior member 6 is about 0.1 mm. In this evaluation, solder having a melting temperature of 220 ° C. was used.
Figure 2005217177

リフロー処理後の封止状態の不良率が0%のものを合格と判定すると体積膨張率6%〜11%が合格となり体積膨張率5.9%以下と体積膨張率12.1〜16%の範囲が不合格となる。またこの体積膨張率6%〜11%の範囲にするためには、ガラス転移温度は126℃〜138℃、ガラス転移温度(Tg)より低温での熱膨張係数α1が18〜27ppm、ガラス転移温度(Tg)より高温での熱膨張係数α2が74〜81ppmとなるようにすればよいことがわかる。ここで、熱膨張係数(α1,α2)は外装部材6に含有される無機フィラとしてのシリカの配合量が支配的であり、シリカの配合量を増量すると熱膨張係数(α1,α2)が小さくなることから、体積膨張率を小さくすることができる。また、ガラス転移温度(Tg)の調整は外装部材6に含有されるエポキシ樹脂成分のビスフェノールA型樹脂とビスフェノールF型樹脂、ナフタリン骨格型エポキシ樹脂並びにフェノール樹脂の配合量を調整すればよい。即ち、ナフタリン骨格型エポキシ樹脂の配合を増量するとガラス転移温度(Tg)が上昇させることができる。   When the defective rate of the sealed state after the reflow process is determined to be acceptable, the volume expansion coefficient is 6% to 11% and the volume expansion coefficient is 5.9% or less and the volume expansion coefficient is 12.1 to 16%. The range is rejected. Further, in order to make the volume expansion ratio in the range of 6% to 11%, the glass transition temperature is 126 ° C. to 138 ° C., the thermal expansion coefficient α1 at a temperature lower than the glass transition temperature (Tg) is 18 to 27 ppm, and the glass transition temperature. It can be seen that the thermal expansion coefficient α2 at a higher temperature than (Tg) may be 74 to 81 ppm. Here, the thermal expansion coefficient (α1, α2) is dominated by the amount of silica as the inorganic filler contained in the exterior member 6, and when the amount of silica is increased, the thermal expansion coefficient (α1, α2) decreases. As a result, the volume expansion coefficient can be reduced. The glass transition temperature (Tg) may be adjusted by adjusting the blending amounts of the bisphenol A type resin, bisphenol F type resin, naphthalene skeleton type epoxy resin, and phenol resin of the epoxy resin component contained in the exterior member 6. That is, the glass transition temperature (Tg) can be increased by increasing the amount of the naphthalene skeleton type epoxy resin.

以上の結果より、本発明の電子部品装置によれば、外装部材6の体積膨張率を6〜11%、且つ、ハンダ接合部材5の溶融温度における弾性率を0.3GPa以下の範囲とすることにより、ハンダが再溶融してもハンダが内部方向に向かって流れ出すことを防止できることがわかった。   From the above results, according to the electronic component device of the present invention, the volume expansion coefficient of the exterior member 6 is 6 to 11%, and the elastic modulus at the melting temperature of the solder bonding member 5 is within a range of 0.3 GPa or less. Thus, it was found that the solder can be prevented from flowing out toward the inside even if the solder is remelted.

本発明の電子部品装置の一実施例の断面図である。It is sectional drawing of one Example of the electronic component apparatus of this invention. 図1に示す電子部品装置のベース基板の平面図である。It is a top view of the base substrate of the electronic component apparatus shown in FIG. (a)、(b)は、本発明の電子部品装置の一実施例の断面図であり、(a)はハンダバンプ部材及びハンダ接合部材の固化時の断面図、(b)はハンダバンプ部材及びハンダ接合部材の溶融時の断面図である。(A), (b) is sectional drawing of one Example of the electronic component apparatus of this invention, (a) is sectional drawing at the time of solidification of a solder bump member and a solder joining member, (b) is solder bump member and solder | pewter It is sectional drawing at the time of the fusion | melting of a joining member. 従来の電子部品装置の断面図である。It is sectional drawing of the conventional electronic component apparatus.

符号の説明Explanation of symbols

1・・・弾性表面波装置
2・・・弾性表面波素子
3・・・ベース基板
4・・・ハンダバンプ部材
5・・・ハンダ接合部材
6・・・外装部材
8・・・接続電極
9・・・外周封止電極
10・・・素子接続用電極
11・・・外周封止導体膜
DESCRIPTION OF SYMBOLS 1 ... Surface acoustic wave apparatus 2 ... Surface acoustic wave element 3 ... Base substrate 4 ... Solder bump member 5 ... Solder joining member 6 ... Exterior member 8 ... Connection electrode 9 ... Outer peripheral sealing electrode 10 ... Element connection electrode 11 ... Outer peripheral sealing conductor film

Claims (4)

一方主面に接続電極及び外周封止電極が形成された電子部品素子と、上面にハンダバンプ部材を介して前記接続電極と接続する素子接続用電極、ハンダ接合部材を介して前記外周封止電極と接合する外周封止導体膜及び外部端子電極が夫々形成されたベース基板とを、前記ベース基板と前記電子部品素子との間に所定間隔が形成されるようにして接合するとともに、前記電子部品素子の側面及びハンダ接合部材の外周面に外装部材を配して成る電子部品装置において、前記外装部材を、体積膨張率が6%〜11%で、且つ、前記ハンダ接合部材の溶融温度における弾性率が0.3GPa以下の低弾性材料により形成することを特徴とする電子部品装置。 On the other hand, an electronic component element having a connection electrode and an outer peripheral sealing electrode formed on the main surface, an element connection electrode connected to the connection electrode via a solder bump member on the upper surface, and the outer peripheral sealing electrode via a solder bonding member Joining the outer peripheral sealing conductor film to be joined and the base substrate on which the external terminal electrodes are respectively formed so as to form a predetermined interval between the base substrate and the electronic component element, and the electronic component element In the electronic component device in which the exterior member is disposed on the side surface of the solder and the outer peripheral surface of the solder joint member, the exterior member has a volume expansion coefficient of 6% to 11% and an elastic modulus at the melting temperature of the solder joint member. Is formed of a low-elasticity material of 0.3 GPa or less. 前記ハンダバンプ部材と前記ハンダ接合部材とが同一組成のハンダから成ることを特徴とする請求項1に記載の電子部品装置。 2. The electronic component device according to claim 1, wherein the solder bump member and the solder joint member are made of solder having the same composition. 前記外装部材が、エポキシ樹脂を主成分とし、かつ、シリカフィラ60wt%〜70wt%とシリコーン樹脂5wt%〜10wt%とを含有させた低弾性材料から成ることを特徴とする請求項1又は請求項2に記載の電子部品装置。 The said exterior member consists of a low elastic material which has an epoxy resin as a main component and contains silica filler 60wt% -70wt% and silicone resin 5wt% -10wt%. 2. The electronic component device according to 2. 前記電子部品素子の一方主面、前記ベース基板の上面及びハンダ接合部材の内周面によって囲まれる領域に、気体が充填されていることを特徴とする請求項1乃至請求項3のいずれかに記載の電子部品装置。 4. The gas is filled in a region surrounded by one main surface of the electronic component element, an upper surface of the base substrate, and an inner peripheral surface of a solder bonding member. 5. The electronic component device described.
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JP2007184690A (en) * 2006-01-05 2007-07-19 Matsushita Electric Ind Co Ltd Antenna duplexer
JPWO2011004665A1 (en) * 2009-07-07 2012-12-20 株式会社村田製作所 Acoustic wave device and method of manufacturing acoustic wave device
WO2014010197A1 (en) * 2012-07-11 2014-01-16 パナソニック株式会社 Electronic component
US9425767B2 (en) 2012-12-06 2016-08-23 Skyworks Panasonic Filter Solutions Japan Co., Ltd. Acoustic wave device and sealing body contained therein
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Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007184690A (en) * 2006-01-05 2007-07-19 Matsushita Electric Ind Co Ltd Antenna duplexer
JPWO2011004665A1 (en) * 2009-07-07 2012-12-20 株式会社村田製作所 Acoustic wave device and method of manufacturing acoustic wave device
JP5637136B2 (en) * 2009-07-07 2014-12-10 株式会社村田製作所 Acoustic wave device and method of manufacturing acoustic wave device
WO2014010197A1 (en) * 2012-07-11 2014-01-16 パナソニック株式会社 Electronic component
CN104521140A (en) * 2012-07-11 2015-04-15 天工松下滤波方案日本有限公司 Electronic component
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JPWO2014010197A1 (en) * 2012-07-11 2016-06-20 スカイワークス・パナソニック フィルターソリューションズ ジャパン株式会社 Electronic components
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US10084125B2 (en) 2012-07-11 2018-09-25 Skyworks Filter Solutions Japan Co., Ltd. Electronic component
US9425767B2 (en) 2012-12-06 2016-08-23 Skyworks Panasonic Filter Solutions Japan Co., Ltd. Acoustic wave device and sealing body contained therein
WO2019245693A1 (en) * 2018-06-21 2019-12-26 Intel Corporation Electrical interconnections with improved compliance
US10903137B2 (en) 2018-06-21 2021-01-26 Intel Corporation Electrical interconnections with improved compliance due to stress relaxation and method of making

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