JP2005191496A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2005191496A5 JP2005191496A5 JP2003434550A JP2003434550A JP2005191496A5 JP 2005191496 A5 JP2005191496 A5 JP 2005191496A5 JP 2003434550 A JP2003434550 A JP 2003434550A JP 2003434550 A JP2003434550 A JP 2003434550A JP 2005191496 A5 JP2005191496 A5 JP 2005191496A5
- Authority
- JP
- Japan
- Prior art keywords
- concentration measuring
- gas
- concentration
- mechanism according
- space
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000007789 gas Substances 0.000 claims 12
- 238000002955 isolation Methods 0.000 claims 7
- 238000005259 measurement Methods 0.000 claims 3
- 230000003287 optical effect Effects 0.000 claims 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 238000001739 density measurement Methods 0.000 claims 1
- 238000005286 illumination Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003434550A JP2005191496A (ja) | 2003-12-26 | 2003-12-26 | 濃度測定機構、露光装置、デバイスの製造方法 |
| US11/015,411 US7244346B2 (en) | 2003-12-26 | 2004-12-17 | Concentration measuring mechanism, exposure apparatus, and device production method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003434550A JP2005191496A (ja) | 2003-12-26 | 2003-12-26 | 濃度測定機構、露光装置、デバイスの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005191496A JP2005191496A (ja) | 2005-07-14 |
| JP2005191496A5 true JP2005191496A5 (enExample) | 2007-02-15 |
Family
ID=34697765
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003434550A Withdrawn JP2005191496A (ja) | 2003-12-26 | 2003-12-26 | 濃度測定機構、露光装置、デバイスの製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US7244346B2 (enExample) |
| JP (1) | JP2005191496A (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7411658B2 (en) | 2005-10-06 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US20240053314A1 (en) * | 2022-08-15 | 2024-02-15 | Preddio Technologies Inc. | Purge gas monitor |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4770027A (en) * | 1986-03-24 | 1988-09-13 | Katuo Ehara | Method of measuring concentrations of odors and a device therefor |
| US5872721A (en) * | 1990-04-11 | 1999-02-16 | Transfresh Corporation | Monitor-control systems and methods for monitoring and controlling atmospheres in containers for respiring perishables |
| JPH1187230A (ja) | 1997-09-01 | 1999-03-30 | Canon Inc | 露光装置およびデバイス製造方法 |
| JPH11354409A (ja) | 1998-06-09 | 1999-12-24 | Canon Inc | 照明装置、これを備えた投影露光装置、及び半導体装置の製造方法 |
| JP2003173964A (ja) | 2001-12-07 | 2003-06-20 | Canon Inc | 露光装置 |
-
2003
- 2003-12-26 JP JP2003434550A patent/JP2005191496A/ja not_active Withdrawn
-
2004
- 2004-12-17 US US11/015,411 patent/US7244346B2/en not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW473816B (en) | Exposure device, exposure method, and highly integrated device manufacturing method | |
| TW490731B (en) | Optical device, exposure system, and laser beam source, and gas feed method, exposure method, and device manufacturing method | |
| TWI230843B (en) | Exposure method and device | |
| US8721803B2 (en) | Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method | |
| TW409284B (en) | Optical apparatus and the exposure apparatus having said optical apparatus | |
| KR970017959A (ko) | 주사형 노광 장치 | |
| JPS6471122A (en) | Method of inspecting quality of reticle mask pattern and the like, its object for monitor and method of inspecting object | |
| TW200511470A (en) | Method and apparatus for monitoring and controlling imaging in immersion lithography systems | |
| TW200510965A (en) | Method and apparatus for monitoring and controlling imaging in immersion lithography systems | |
| TW200510495A (en) | Material for forming resist-protecting film for immersion exposure process, resist-protecting film made of such material and method for forming resist pattern using such resist-protection film | |
| TW200520053A (en) | Immersion lithographic process using a conforming immersion medium | |
| WO2005010612A3 (en) | Defect inspection of extreme ultraviolet lithography masks and the like | |
| US20070258072A1 (en) | Exposure apparatus, method for cleaning memeber thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device | |
| JP2007281441A (ja) | 露光装置、メンテナンス方法、露光方法、及びデバイス製造方法 | |
| NL1036596A1 (nl) | Re-flow and buffer system for immersion lithography. | |
| JP3629790B2 (ja) | 露光装置 | |
| WO2005108914A3 (en) | Apparatus and methods for measurement of critical dimensions of features and detection of defects in uv, vuv, and euv lithography masks | |
| JP2005109304A5 (enExample) | ||
| WO2001081907A1 (en) | Method and apparatus for measurement, and method and apparatus for exposure | |
| JP2005057205A5 (enExample) | ||
| JP2007250686A5 (enExample) | ||
| JPWO2006059720A1 (ja) | 露光装置、露光方法、及びデバイス製造方法 | |
| JPH09283401A5 (enExample) | ||
| JP2009141190A (ja) | 露光装置、露光方法及びデバイス製造方法 | |
| US7914687B2 (en) | Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method |