JP2005191496A - 濃度測定機構、露光装置、デバイスの製造方法 - Google Patents

濃度測定機構、露光装置、デバイスの製造方法 Download PDF

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Publication number
JP2005191496A
JP2005191496A JP2003434550A JP2003434550A JP2005191496A JP 2005191496 A JP2005191496 A JP 2005191496A JP 2003434550 A JP2003434550 A JP 2003434550A JP 2003434550 A JP2003434550 A JP 2003434550A JP 2005191496 A JP2005191496 A JP 2005191496A
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JP
Japan
Prior art keywords
concentration
concentration measuring
measuring device
space
sealed space
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2003434550A
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English (en)
Japanese (ja)
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JP2005191496A5 (enExample
Inventor
Yasuteru Tominaga
泰輝 冨永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003434550A priority Critical patent/JP2005191496A/ja
Priority to US11/015,411 priority patent/US7244346B2/en
Publication of JP2005191496A publication Critical patent/JP2005191496A/ja
Publication of JP2005191496A5 publication Critical patent/JP2005191496A5/ja
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light

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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2003434550A 2003-12-26 2003-12-26 濃度測定機構、露光装置、デバイスの製造方法 Withdrawn JP2005191496A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003434550A JP2005191496A (ja) 2003-12-26 2003-12-26 濃度測定機構、露光装置、デバイスの製造方法
US11/015,411 US7244346B2 (en) 2003-12-26 2004-12-17 Concentration measuring mechanism, exposure apparatus, and device production method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003434550A JP2005191496A (ja) 2003-12-26 2003-12-26 濃度測定機構、露光装置、デバイスの製造方法

Publications (2)

Publication Number Publication Date
JP2005191496A true JP2005191496A (ja) 2005-07-14
JP2005191496A5 JP2005191496A5 (enExample) 2007-02-15

Family

ID=34697765

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003434550A Withdrawn JP2005191496A (ja) 2003-12-26 2003-12-26 濃度測定機構、露光装置、デバイスの製造方法

Country Status (2)

Country Link
US (1) US7244346B2 (enExample)
JP (1) JP2005191496A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7411658B2 (en) 2005-10-06 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20240053314A1 (en) * 2022-08-15 2024-02-15 Preddio Technologies Inc. Purge gas monitor

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4770027A (en) * 1986-03-24 1988-09-13 Katuo Ehara Method of measuring concentrations of odors and a device therefor
US5872721A (en) * 1990-04-11 1999-02-16 Transfresh Corporation Monitor-control systems and methods for monitoring and controlling atmospheres in containers for respiring perishables
JPH1187230A (ja) 1997-09-01 1999-03-30 Canon Inc 露光装置およびデバイス製造方法
JPH11354409A (ja) 1998-06-09 1999-12-24 Canon Inc 照明装置、これを備えた投影露光装置、及び半導体装置の製造方法
JP2003173964A (ja) 2001-12-07 2003-06-20 Canon Inc 露光装置

Also Published As

Publication number Publication date
US7244346B2 (en) 2007-07-17
US20050140943A1 (en) 2005-06-30

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