JP2005177567A - Method and apparatus for washing - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To store washing water having a different grade into a plurality of tanks while accommodating an article to be washed in a single washing tank, to supply the washing water having an enhanced water quality grade to wash in turn, thereby saving the amount of the washing water consumed, eliminating the need for a transport mechanism of the article to be washed and simplifying an apparatus. <P>SOLUTION: The washing method and apparatus are provided with the single washing tank 3 accommodating the the article to be washed, a plurality of tanks T1, T2 and T3 storing the washing water having a different grade of the water quality, and a water supply and discharge system including pumps P1 and P2; and comprise, by the water supply and discharge system, supplying the washing water from the tank T1 storing the lowest grade washing water to the washing tank 3 to wash the article to be washed, and supplying the washing water from the tanks T2 and T3 storing higher grade washing water to the washing tank 3 to wash the article to be washed in turn. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a cleaning method and apparatus for an object to be cleaned that is suitable for being housed in a magazine such as a hybrid substrate or a collective substrate for producing chip-shaped electronic components and cleaning, and in particular, cleaning water such as pure water is used. When using and cleaning, it is suitable to reduce the water supply of cleaning water such as pure water by supplying water with improved water quality sequentially into a single cleaning tank. The present invention relates to a cleaning method and apparatus suitable for conversion.

  In recent years, in electronic devices such as communication devices and information devices, it has become obvious to use a hybrid substrate in which passive circuit elements such as inductors, resistors, and capacitors are incorporated in a wiring substrate on which an electronic circuit is formed. .

  In this type of hybrid substrate, a process of forming passive circuit elements and circuit wiring is accompanied by a pickling process or an alkali cleaning process, but if the acid or alkali used in these processes remains, soldering, etc. It is known that the mounting process of electronic components will be hindered, and the elements and wirings formed on the hybrid substrate will change over time and deteriorate due to the promotion of chemical reaction over time. Cleaning with tap water or industrial water).

  In addition, the collective substrate used in the manufacturing process of various electronic components such as chip-shaped electronic components needs to be cleaned in a later process such as plating.

  The conventional cleaning device has a plurality of cleaning tanks into which the objects to be cleaned are put, and the objects to be cleaned are sequentially transferred to each cleaning tank while performing the replacement of the cleaning water into the plurality of cleaning tanks or the overflow water supply. The method of taking out and performing predetermined washing | cleaning in the washing tank is taken.

  In addition, when there is one type of cleaning water and multiple cleaning tanks are provided depending on the degree of contamination, the object to be cleaned is transferred between tanks using a transfer device, etc., and is sequentially put into each tank. Need to be taken out. For this reason, there is a drawback in that an apparatus for transporting an object to be cleaned is required, and the cost is high, the apparatus size is large, and the installation space is increased.

  In addition, as a cleaning device with overflow water supply using a plurality of continuously connected cleaning tanks, high-grade cleaning water is supplied downstream of the flow of the object to be cleaned, and the lowest grade upstream of the flow of the object to be cleaned. A multi-stage counter-current type cleaning method in which the cleaning water overflows and is discharged to the outside is disclosed in Patent Document 1 and Patent Document 2 below.

Japanese Patent Laid-Open No. 7-100444 JP-A-9-302487

  According to these methods of Patent Document 1 and Patent Document 2, each time the object to be cleaned moves upstream of the flow, the object to be cleaned is lifted from the cleaning tank, and during that time, high-grade cleaning water is supplied from the uppermost stream. This leads to a first problem that consumption of cleaning water (pure water, tap water, industrial water, etc.) used as high-grade cleaning water becomes large.

  Furthermore, in addition to the second problem that the transport mechanism for the object to be cleaned is required and the installation cost is increased, the third problem is that the cleaning device is enlarged and requires a large facility space. Arise.

  In view of the above points, the present invention stores wash water of different grades in a plurality of tanks, and sequentially supplies wash water with improved water quality grades while keeping the object to be washed in a single wash tank. Cleaning reduces the consumption of cleaning water, eliminates the need for a mechanism for transporting the object to be cleaned, simplifies equipment, reduces equipment costs, and enables downsizing of equipment and, consequently, facility space. An object is to provide a cleaning method and apparatus.

  Other objects and novel features of the present invention will be clarified in embodiments described later.

In order to achieve the above object, a cleaning method according to the invention of claim 1 of the present application uses a plurality of tanks for storing cleaning waters of different water quality grades and a single cleaning tank for storing objects to be cleaned.
The cleaning water is supplied to the cleaning tank from the tank storing the lowest-grade cleaning water to wash the objects to be cleaned, and the cleaning water is supplied to the cleaning tank from the tank storing the high-grade cleaning water in order. It is characterized by doing.

  The cleaning method according to claim 2 of the present application is the cleaning method according to claim 1, wherein the first replacement operation of the cleaning water for the cleaning tank returns the cleaning water to the supply tank of the cleaning water, and then It is characterized by supplying the next washing water of a higher grade by one rank from the tank.

In the cleaning method according to the invention of claim 3 of the present application, the second replacement operation of the cleaning water for the cleaning tank in claim 1 or 2,
Supplying the washing water from the tank storing the washing water of the lowest grade to the washing tank to wash the object to be washed, and then draining the washing water;
After supplying the next washing water of a higher grade by 1 rank from the next tank to the washing tank and washing it, the tank that stored the washing water of a grade lower by 1 rank than the tank of the supply source Step to move to,
And supplying a new cleaning water to a tank for storing the highest grade cleaning water.

  The cleaning method according to claim 4 of the present application is the cleaning method according to claim 1, 2 or 3, wherein the cleaning water overflowed from the tank storing the high-grade cleaning water enters the tank storing the low-grade cleaning water by one rank. It is characterized by that.

A cleaning apparatus according to the invention of claim 5 includes a single cleaning tank for storing an object to be cleaned, a plurality of tanks for storing cleaning water of different water quality grades, and a water supply / drainage system including a pump,
The water supply / drainage system supplies the cleaning water from the tank storing the lowest grade cleaning water to the cleaning tub to clean the object to be cleaned, and sequentially stores the high grade cleaning water from the tank storing the cleaning water into the cleaning tub. It is characterized by supplying and cleaning.

  According to the cleaning method and apparatus according to the present invention, a plurality of tanks each storing different levels of cleaning water and a single cleaning tank for storing an object to be cleaned are used, and the lowest grade cleaning water is stored. The cleaning water is supplied from the tank to the cleaning tank to wash the object to be cleaned, and the cleaning water is supplied to the cleaning tank from the tank in which the high-grade cleaning water is stored in order. The consumption of high-grade (high cleanliness) cleaning water (pure water, tap water, industrial water, etc.) can be reduced, and no equipment transport mechanism is required, simplifying equipment and installation costs. Can be reduced, the device can be downsized, and the facility space can be reduced.

  Hereinafter, as a best mode for carrying out the present invention, an embodiment of a cleaning method and apparatus will be described with reference to the drawings.

  FIGS. 1 to 3 show an embodiment of a cleaning method and apparatus according to the present invention. FIG. 1 includes a plurality of tanks, a single cleaning tank containing objects to be cleaned, and a water supply / drainage system including a pump. Fig. 2 shows a perspective view of the cleaning device. Fig. 2 is a water supply system for supplying cleaning water from the water supply source and tank to the cleaning tank, returning the cleaning water from the cleaning tank to the tank, and discarding it from the discharge port. FIG. 3 shows a replacement pattern diagram of cleaning water in the cleaning tank and the tank, respectively.

  As shown in FIG. 1, the cleaning apparatus accommodates a magazine 2 that is a cleaning object holder that stores a plurality of substrates 1 that are objects to be cleaned (hybrid substrates, collective substrates of chip-like electronic components, etc.). The first tank T1, the second tank T2, and the third tank T3 for storing different cleaning waters of different water quality, and sequentially supplying water to the plurality of tanks (returning the cleaning water). Pump P1 for draining, pump P2 for sequentially supplying the cleaning water of different water quality stored in each tank to the cleaning tank 3, and water having the highest water quality from the water supply source to the third tank T3 (this In the embodiment, a water supply pipe H1 for supplying pure water) and a drain pipe H2 for draining the lowest water quality water overflowing from the first tank T1 are provided.

  The first to third tanks T1 to T3 are arranged adjacent to each other and open on the upper surface, and the wash water overflowing from the tank for storing high-grade wash water is stored in the tank for storing low-grade wash water by one rank. It is supposed to enter. That is, the wash water that overflows from the third tank T3 enters the second tank T2, and the wash water that overflows the second tank T2 enters the first tank T1. The volumes of the tanks T1 to T3 are set larger than the volume of the cleaning tank 3.

  Moreover, as shown in the piping diagram of FIG. 2, pumps P1 and P2 and solenoid valves E1 to E10 are provided to supply new pure water from a water supply source, and to supply and drain water to each of the tanks T1 to T3 and the cleaning tank 3. Including water supply and drainage system.

  In the cleaning apparatus including the cleaning tank 3, the first tank T1, the second tank T2, the third tank T3, the water supply / drainage pump P1, the water supply pump P2, and the like as described above, as shown in FIG. After being supplied to the third tank T3 as the high-grade water Wh, the new pure water from No. 11 is used as the cleaning water for the substrate 1 that is the object to be cleaned in the cleaning tank 3 a predetermined number of times. After being transferred to the second tank T2 as intermediate-grade water Wm and stored, and similarly used as the cleaning water for the substrate 1 in the cleaning tank 3, the first tank T1 is used as the low-grade water We. It is transferred and stored, and is used as cleaning water for the substrate 1 that is the object to be cleaned in the cleaning tank 3 a predetermined number of times, and is finally discarded from the drain 25 of the cleaning device as dirty ultra-low grade water Wd. The That is, the difference in the water quality grades of the tanks T1 to T3 is the degree of soiling as a result of repeated use of pure water, and different tanks of different water quality grades are not independently supplied to the tanks T1 to T3.

  In the cleaning tank 3, as shown in FIG. 3, the low-grade water We supplied from the first tank T1 is first supplied to the substrate held by the magazine, and then supplied from the second tank T2. The medium-grade water Wm and finally the clear high-grade water Wh supplied from the third tank T3 are sequentially used as washing water to perform the washing operation. The cleaning tank 3 has measures for improving the cleaning effect suitable for the object to be cleaned, for example, functions such as shower spraying, rocking, bubbling, and ultrasonic radiation on the object to be cleaned.

  As shown in FIGS. 2 and 3, in the first cleaning process, after the low-grade water We stored in the first tank T1 passes through the open electromagnetic valve E1 and the manual valve 13 with a predetermined opening amount, By the action of the water supply pump P2, the water is supplied into the cleaning tank 3 from the water supply port 3a on the bottom surface of the cleaning tank 3 via the manual valve 14a having a predetermined opening amount, and via the manual valves 14b and 14c having predetermined opening amounts. The water is supplied into the cleaning tank 3 from the shower water supply means 3 c above the cleaning tank 3. In the cleaning tank 3, a plurality of substrates stored in the magazine 2 are cleaned by a method such as shower jet or bubble.

  In the second cleaning process, the medium-grade water Wm stored in the second tank T2 passes through the open electromagnetic valve E3 and the manual valve 13, and then passes through the manual valve 14a by the action of the water supply pump P2. In addition to being supplied into the cleaning tank 3 from the water supply port 3a on the bottom surface of the cleaning tank 3, it is supplied into the cleaning tank 3 from the shower water supply means 3c above the cleaning tank 3 via the manual valves 14b and 14c. In the cleaning tank 3, a plurality of substrates stored in the magazine 2 are cleaned by a method such as shower jet or bubble.

  In the third cleaning process, the high-grade water Wh stored in the third tank T3 passes through the open electromagnetic valve E5 and the manual valve 13, and then passes through the manual valve 14a by the action of the water supply pump P2. In addition to being supplied into the cleaning tank 3 from the water supply port 3a on the bottom surface of the cleaning tank 3, it is supplied into the cleaning tank 3 from the shower water supply means 3c above the cleaning tank 3 via the manual valves 14b and 14c. In the cleaning tank 3, a plurality of substrates stored in the magazine 2 are cleaned by a method such as shower jet or bubble.

  In executing each process, the washing water of the immediately preceding process is drawn out from the washing tank 3 and the washing water of the next process is supplied. There are two methods for replacing the washing water in the washing tank as follows. .

  The first replacement operation is performed by returning the cleaning water to the tank from which the cleaning water is supplied and emptying the cleaning tank 3, and then supplying the next cleaning water having a higher grade by one rank from the next tank. It is.

  Specifically, this is the case of cleaning magazines # 1 and # 2 in the cleaning water replacement pattern of FIG. 3, and the low-grade water We (A) supplied from the first tank T1 to the cleaning tank 3 in the first process. After the magazine # 1 and # 2 are used for cleaning, the drainage port 3b on the bottom surface of the cleaning tank 3, the manual valve 18 with a predetermined opening amount, the water supply / drainage pump P1, and the original solenoid valve E2 are opened. Is returned to the tank T1. Similarly, the medium-grade water Wm (B) supplied from the second tank T2 to the cleaning tank 3 in the second process is used for cleaning the magazines # 1 and # 2, and then the drain port 3b on the bottom surface of the cleaning tank 3. , Returned to the original second tank T2 through the path of the manual valve 18 with a predetermined opening amount, the water supply / drainage pump P1, and the opened electromagnetic valve E4, and supplied to the washing tank 3 from the third tank T3 in the third process. After the grade water Wh (C) is used for washing the magazines # 1 and # 2, the drainage port 3b on the bottom surface of the washing tank 3, the manual valve 18 with a predetermined opening amount, the water supply / drainage pump P1, and the electromagnetic valve E6 in the open state. The route is returned to the original third tank T3.

When the first replacement operation is repeated, the cleaning water in each tank becomes contaminated. Therefore, after the first replacement operation is repeated once or a plurality of times, the second replacement operation is performed on the cleaning water. In the second replacement operation, the following steps are sequentially performed.
a. Supplying the washing water from the tank storing the washing water of the lowest grade to the washing tank to wash the object to be washed, and then draining the washing water to the outside;
b. After supplying the next washing water of a higher grade by 1 rank from the next tank to the washing tank and washing it, the tank that stored the washing water of a grade lower by 1 rank than the tank of the supply source Step to transfer to (This step is repeated one or more times depending on the number of tanks)
c. A step of supplying new washing water (D) to a tank storing the highest grade washing water.

  Specifically, in the case of cleaning magazine # 3 in the cleaning water replacement pattern of FIG. 3, the low-grade water We (A) supplied from the first tank T1 to the cleaning tank 3 in the first process is the magazine. After being used for cleaning # 3, as a very low-grade water Wd that is dirty, the cleaning device in the path of the drainage port 3b on the bottom surface of the cleaning tank 3, the manual valve 18 with a predetermined opening amount, the water supply / drainage pump P1, and the open electromagnetic valve E7 It is discarded from the discharge port 25. Further, the medium-grade water Wm (B) supplied from the second tank T2 to the cleaning tank 3 in the second process is used for cleaning the magazine # 3, and then the drain port 3b on the bottom surface of the cleaning tank 3 and a predetermined opening amount. The low-grade water We is transferred to the first tank T1 and stored in the path of the manual valve 18, the water supply / drainage pump P1, and the electromagnetic valve E2 in the open state. Similarly, the high-grade water Wh (C) supplied from the third tank T3 to the cleaning tank 3 in the third process is used for cleaning the magazine # 3, and then the drainage port 3b on the bottom surface of the cleaning tank 3 is opened to a predetermined extent. The medium-grade water Wm is transferred to the second tank T2 through the path of the manual valve 18, the water supply / drainage pump P1, and the open electromagnetic valve E4, and stored. As a result, the third tank T3 is emptied, but here, pure water is supplied from the water supply source 11 via the manual valve 22 having a predetermined opening amount, the electromagnetic valve E10 in an open state, and the manual valve 24 having a predetermined opening amount. Is supplied (supplemented) as high-grade water Wh (D).

  Thereafter, magazines # 4 to # 6, magazines # 7 to # 9,... Are washed in the same manner as magazines # 1 to # 3. Note that the operation of loading and unloading the magazine into and from the washing tank 3 can be performed manually.

  In the washing water replacement pattern of FIG. 3, the second replacement operation is performed once after the first replacement operation is performed twice. However, the second replacement operation is not limited to the illustrated replacement pattern. After performing one replacement operation once or a plurality of times, the second replacement operation may be performed once. Depending on the object to be cleaned, the first replacement operation may not be performed, and only the second replacement operation may be performed.

  According to this embodiment, the following effects can be obtained.

(1) The cleaning water can be repeatedly used between the tank and the cleaning tank until the cleaning water becomes dirty due to the cleaning of the object to be cleaned, and the consumption of pure water newly replenished can be reduced.

(2) Since there is only one washing tank, it is possible to reduce the size of the washing device, reduce the facility space, and eliminate the need for a mechanism for transporting the object to be washed, such as a chain conveyor. Can be reduced.

  In the above embodiment, the cleaning water newly supplied from the water supply source has been described as pure water. However, tap water and industrial water may be supplied from the water supply source depending on the object to be cleaned.

  Although the embodiments of the present invention have been described above, it will be obvious to those skilled in the art that the present invention is not limited to these embodiments, and various modifications and changes can be made within the scope of the claims.

  The cleaning method and apparatus of the present invention is to supply cleaning water whose water quality grade has been sequentially increased to a single cleaning tank, and to wash the object to be cleaned.By storing the cleaning water in the tank and repeatedly using it, Water resources can be saved, and it can be suitably used for cleaning in the manufacturing process of a collective substrate of electronic components such as a hybrid substrate.

1 is a perspective view showing a schematic configuration of an embodiment of a cleaning method and apparatus according to the present invention. It is a piping diagram of the water supply / drainage system in an embodiment. In embodiment, it is a replacement pattern figure of the washing water in a washing tub and a tank.

Explanation of symbols

1 Substrate
2 Magazine 3 Cleaning tank 3a Water supply port 3b Drain port 11 Water supply source
25 Drainage port E1-E10 Solenoid valve H1 Water supply pipe H2 Drainage pipe T1 1st tank T2 2nd tank T3 3rd tank P1, P2 Pump

Claims (5)

Using a plurality of tanks each storing water with different water quality grades and a single washing tank containing the objects to be cleaned,
The cleaning water is supplied to the cleaning tank from the tank storing the lowest-grade cleaning water to wash the objects to be cleaned, and the cleaning water is supplied to the cleaning tank from the tank storing the high-grade cleaning water in order. A cleaning method comprising:   The first replacement operation of the cleaning water with respect to the cleaning tank is performed by returning the cleaning water to the tank from which the cleaning water is supplied and then supplying the next cleaning water having a higher grade by one rank from the next tank. The cleaning method according to claim 1. The second replacement operation of the cleaning water for the cleaning tank is as follows:
Supplying the washing water from the tank storing the washing water of the lowest grade to the washing tank to wash the object to be washed, and then draining the washing water;
After supplying the next washing water of a higher grade by 1 rank from the next tank to the washing tank and washing it, the tank that stored the washing water of a grade lower by 1 rank than the tank of the supply source Step to move to,
The cleaning method according to claim 1, further comprising a step of supplying new cleaning water to a tank that stores the highest grade cleaning water.   The cleaning method according to claim 1, 2 or 3, wherein the cleaning water overflowed from a tank for storing high-grade cleaning water enters a tank for storing cleaning water having a low grade by one rank. A single cleaning tank for storing the objects to be cleaned, a plurality of tanks for storing cleaning water of different water quality grades, and a water supply / drainage system including a pump,
The water supply / drainage system supplies the cleaning water from the tank storing the lowest grade cleaning water to the cleaning tub to clean the object to be cleaned, and sequentially stores the high grade cleaning water from the tank storing the cleaning water into the cleaning tub. A cleaning apparatus characterized by supplying and cleaning.

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