JP2005154864A - High rigidity and high hardness plating method for casing made of resin - Google Patents

High rigidity and high hardness plating method for casing made of resin Download PDF

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JP2005154864A
JP2005154864A JP2003397353A JP2003397353A JP2005154864A JP 2005154864 A JP2005154864 A JP 2005154864A JP 2003397353 A JP2003397353 A JP 2003397353A JP 2003397353 A JP2003397353 A JP 2003397353A JP 2005154864 A JP2005154864 A JP 2005154864A
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plating
resin
bath
nickel
resin casing
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JP4636790B2 (en
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Kunihiro Kakihara
邦博 柿原
Yoshinori Noda
義則 野田
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Kakihara Kogyo Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To increase the rigidity and hardness of resin plating by using nickel sulfamate for a plating bath, thus performing plating treatment having high uniformity. <P>SOLUTION: A catalyst is adsorbed on a casing made of resin such as light electrical products, e.g., a portable telephone and a notebook personal computer. A base metal is precipitated over the casing made of resin by an electroless plating bath. The casing made of resin is dipped into a plating bath obtained by adding organic acid or organic acid salt such as acetic acid or nickel acetate into a nickel sulfamate bath or a nickel sulfamate-cobalt bath, and nickel is electrolytically precipitated so that the thickness of the nickel plated film reaches about 5 to 30 μm. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、樹脂製筺体に金属めっきを施す樹脂めっき技術に係り、特に樹脂製筐体のめっき膜厚を均一にめっきすることができる高剛性・高硬度めっき方法に関するものである。   The present invention relates to a resin plating technique for performing metal plating on a resin casing, and more particularly to a high-rigidity and high-hardness plating method capable of uniformly plating a plating film thickness of a resin casing.

携帯電話やノートパソコン等の弱電製品の筐体には、高い剛性が要求される。そこで、従来からMgのダイキャストやチクソモールディングで成形された金属製筐体が多く使用されている。例えば、Mg等の金属製筐体の代替品とするために、ポリカーボネイト樹脂やポリカーボネイト・ABS樹脂等の樹脂製筐体に電気めっきで金属を厚付けして剛性を高めていた。   High rigidity is required for the housing of weak electrical products such as mobile phones and notebook computers. Therefore, a metal casing formed by Mg die-casting or thixo molding has been conventionally used. For example, in order to substitute for a metal casing such as Mg, rigidity has been increased by thickening metal by electroplating on a resin casing such as polycarbonate resin, polycarbonate / ABS resin, or the like.

この樹脂製筐体の樹脂めっき方法は、光沢銅めっき(高硫酸銅浴)や光沢ニッケルめっき(ワット浴)等の一般の装飾めっきの厚付けによって行われている。このときの膜厚は約15〜30μm程度であった。しかし、これら一般の装飾めっき用のめっき液で樹脂製筐体を樹脂めっきすると、その樹脂製筐体の凸部にめっき析出が極端に集中して盛り上がり部が生じ、めっき膜厚が不均一になりやすかった。そのために、めっき処理した樹脂製筐体の寸法清度が悪く樹脂製筐体同士の嵌合に不具合が生じていた。   A resin plating method for the resin casing is performed by thickening general decorative plating such as bright copper plating (high copper sulfate bath) or bright nickel plating (watt bath). The film thickness at this time was about 15 to 30 μm. However, when a resin casing is resin-plated with these general plating solutions for decorative plating, plating deposits are extremely concentrated on the convex portions of the resin casing, resulting in a bulging portion, resulting in uneven plating film thickness. It was easy to be. For this reason, the dimensional cleanliness of the plated resin casing is poor, and there is a problem in fitting between the resin casings.

図3は樹脂製筐体の一例を示すものであり、樹脂めっきをするノートパソコンの筐体の斜視図である。図4は樹脂製筐体の一例を示すものであり、樹脂めっきをする携帯電話の筐体の分解正面図である。
例えば、樹脂製筐体の凹凸部には、図3のノートパソコン1に示すように、本体ケース2の下側本体ケース3と上側本体ケース4の周縁の嵌合部分、特に各角部5にめっきの盛り上がり部が生じやすい。また、本体ケース2と上蓋6とのヒンジ7部分にも凹凸部があり、ここにめっきの盛り上がり部が生じやすい。
FIG. 3 shows an example of a resin casing, and is a perspective view of a casing of a notebook computer on which resin plating is performed. FIG. 4 shows an example of a resin casing, and is an exploded front view of a casing of a mobile phone on which resin plating is performed.
For example, as shown in the notebook personal computer 1 in FIG. 3, the concave and convex portions of the resin casing are fitted to the fitting portions of the lower body case 3 and the upper body case 4, particularly the corners 5. Plating bulges are likely to occur. In addition, the hinge 7 portion of the main body case 2 and the upper lid 6 also has an uneven portion, and a bulge portion of the plating tends to occur here.

同様に、図4の携帯電話8に示すように、画面のある表示側ケース9とキーがある操作側ケース10とのヒンジ11にめっきの盛り上がり部が生じやすい。特に携帯電話8は小型で精密に設計されているために、めっきの盛り上がり部があると両者を組み立てることができないことがあった。   Similarly, as shown in the mobile phone 8 of FIG. 4, a bulge portion of the plating tends to occur on the hinge 11 between the display side case 9 with a screen and the operation side case 10 with a key. In particular, since the mobile phone 8 is small and precisely designed, it may be impossible to assemble the two if there is a raised portion of the plating.

めっき膜厚を均一にする手段としては、特許文献1の特開2001−329400公報「めっき装置及びめっき方法」のようにめっき槽に一枚の遮蔽板を構成することで、膜厚分布を容易に制御調整できるめっき方法が提案されている。   As a means for making the plating film thickness uniform, it is easy to distribute the film thickness by configuring a single shielding plate in the plating tank as disclosed in Japanese Patent Application Laid-Open No. 2001-329400, “Plating apparatus and plating method”. A plating method that can be controlled and adjusted has been proposed.

特開2001−329400JP 2001-329400 A

そこで、樹脂製筐体の凸部にめっき析出が極端に集中することを防止するために、めっき処理の際にその樹脂製筐体の凸部の周りを塩ビ等の合成樹脂製や金属製の遮蔽板で取り囲み、この凸部へのめっき析出を抑制して、部分的に厚く盛り上がらないようにしていた。   Therefore, in order to prevent plating deposition from concentrating on the convex part of the resin casing, the resin casing is made of a synthetic resin such as vinyl chloride or metal around the convex part of the resin casing. It was surrounded by a shielding plate to suppress plating deposition on this convex part, so that it did not rise partially thick.

更に、樹脂めっき処理で盛り上がった樹脂製筐体の凸部のめっき部分は、後処理工程でその部分を削り取る切削加工又はその部分を研磨加工して樹脂製筐体としての嵌合性能を確保していた。   Further, the plating portion of the convex portion of the resin casing that has been swelled by the resin plating treatment is cut off by polishing the portion in the post-processing step or polished to ensure the fitting performance as a resin casing. It was.

しかし、めっき時に樹脂製筐体の凸部の周りを遮蔽板で取り囲みながらめっき処理する方法では、めっき槽内においてこの遮蔽板を配置する作業工程が煩雑な作業になりやすいという問題を有していた。   However, in the method of plating while surrounding the convex portion of the resin casing with a shielding plate at the time of plating, there is a problem that the work process of arranging the shielding plate in the plating tank tends to be complicated work. It was.

また、樹脂めっき処理を施した樹脂製筐体の凸部のめっきの盛り上り部を切削加工又は研磨加工する方法では、めっき処理工程が一工程増加するだけでなく、後加工で削りとった削りカスが樹脂製筐体に付着するおそれがあり、その清掃作業も増加するという問題を有していた。特に、ノートパソコン1の本体ケース2と上蓋6とのヒンジ7部分における凹凸部の盛り上がり部や、携帯電話8のヒンジ11におけるめっきの盛り上がり部は、精密部分であるために、後加工の処理時間が長くなりやすいという問題を有していた。   Moreover, in the method of cutting or polishing the plating raised portion of the convex portion of the resin casing subjected to the resin plating treatment, the plating treatment step is not only increased by one step, but also the shaving removed by post-processing. There is a possibility that the residue may adhere to the resin casing, and the cleaning work increases. In particular, the bulging portion of the uneven portion in the hinge 7 portion of the main body case 2 and the upper lid 6 of the notebook computer 1 and the bulging portion of the plating in the hinge 11 of the mobile phone 8 are precision portions. Had the problem of being prone to become long.

そこで、本発明の発明者らは、ワット浴ニッケルめっきよりも凸部の盛り上がりが少なく、めっきの均一性が高いスルフアミン酸ニッケル浴について着目した。しかし、このスルフアミン酸ニッケル浴に、同量の光沢剤、例えばサッカリンやアリルスルフォン酸塩を0.5〜3g/Lを添加しただけのめっきは、そのめっき膜が柔らかく、その剛性も低く、十分な剛性と硬度を得ることできなかった。   Therefore, the inventors of the present invention have focused on a nickel sulfamate bath that has less protrusions than Watt bath nickel plating and has high plating uniformity. However, plating in which only the same amount of brightener, for example, saccharin or allyl sulfonate, is added to this nickel sulfamate bath in an amount of 0.5 to 3 g / L, the plating film is soft, its rigidity is low, High rigidity and hardness could not be obtained.

本発明は、かかる問題点を解決するために創案されたものである。すなわち、本発明の目的は、スルファミン酸ニッケルをめっき浴に使用することで、均一性の高いめっき処理をして、樹脂めっきの剛性と硬度を高めることができる樹脂製筐体の高剛性・高硬度めっき方法を提供することにある。   The present invention has been developed to solve such problems. That is, the object of the present invention is to provide a highly rigid and high resin casing that can increase the rigidity and hardness of resin plating by using nickel sulfamate in a plating bath and performing plating treatment with high uniformity. It is to provide a hardness plating method.

本発明によれば、樹脂製筐体に触媒を吸着させ、無電解めっき浴で該樹脂製筐体に下地金属を析出させ、スルファミン酸ニッケル浴に有機酸を添加しためっき浴中に、前記樹脂製筐体を浸漬して、そのニッケルのめっき膜厚が5〜30μmになるように電解析出させる、ことを特徴とする樹脂製筐体の高剛性・高硬度めっき方法が提供される。前記スルファミン酸ニッケル浴濃度が300〜600g/Lであり、前記有機酸の含有量が3〜10g/Lである。前記有機酸は酢酸である。   According to the present invention, a catalyst is adsorbed on a resin casing, a base metal is deposited on the resin casing in an electroless plating bath, and the resin is added to the plating bath in which an organic acid is added to a nickel sulfamate bath. There is provided a high rigidity / high hardness plating method for a resin casing, characterized in that the casing is immersed and electrolytically deposited so that the nickel plating film thickness is 5 to 30 μm. The nickel sulfamate bath concentration is 300 to 600 g / L, and the organic acid content is 3 to 10 g / L. The organic acid is acetic acid.

樹脂製筐体に触媒を吸着させ、無電解めっき浴で該樹脂製筐体に下地金属を析出させ、スルファミン酸ニッケル浴に酢酸ニッケルを添加しためっき浴中に、前記樹脂製筐体を浸漬して、そのニッケルのめっき膜厚が5〜30μmになるように電解析出させることができる。この置き換える酢酸ニッケルは、上述した酢酸の約2倍量が好ましい。   The resin casing is adsorbed on a resin casing, a base metal is deposited on the resin casing with an electroless plating bath, and the resin casing is immersed in a plating bath in which nickel acetate is added to a nickel sulfamate bath. Then, it can be electrolytically deposited so that the nickel plating film thickness is 5 to 30 μm. This replacing nickel acetate is preferably about twice the amount of acetic acid described above.

また、樹脂製筐体に触媒を吸着させ、無電解めっき浴中で該樹脂製筐体に下地金属を析出させ、スルファミン酸ニッケル・コバルト合金浴に有機酸を添加しためっき浴中に、前記樹脂製筐体を浸漬して、そのニッケルのめっき膜厚が5〜30μmになるように電解析出させることができる。前記スルファミン酸ニッケル浴濃度が300〜600g/Lであり、かつスルファミン酸コバルトをスルファミン酸ニッケルの10〜15重量%量添加したスルファミン酸ニッケル・コバルト合金溶液であり、前記有機酸の含有量が3〜10g/Lである。前記有機酸は酢酸である。   In addition, a catalyst is adsorbed on a resin casing, a base metal is deposited on the resin casing in an electroless plating bath, and the resin is added in a plating bath in which an organic acid is added to a nickel sulfamate / cobalt alloy bath. The case made by immersion can be immersed and electrolytically deposited so that the nickel plating film thickness is 5 to 30 μm. The nickel sulfamate bath concentration is 300 to 600 g / L, and a nickel sulfamate / cobalt alloy solution in which cobalt sulfamate is added in an amount of 10 to 15% by weight of nickel sulfamate, and the organic acid content is 3 -10 g / L. The organic acid is acetic acid.

樹脂製筐体に触媒を吸着させ、無電解めっき浴中で該樹脂製筐体に下地金属を析出させ、スルファミン酸ニッケル・コバルト合金浴に酢酸ニッケルを添加しためっき浴中に、前記樹脂製筐体を浸漬して、そのニッケルのめっき膜厚が5〜30μmになるように電解析出させることができる。この置き換える酢酸ニッケルは、上述した酢酸の約2倍量が好ましい。   A catalyst is adsorbed on a resin casing, a base metal is deposited on the resin casing in an electroless plating bath, and the resin casing is placed in a plating bath in which nickel acetate is added to a nickel sulfamate / cobalt alloy bath. The body can be immersed and electrolytically deposited so that the nickel plating film thickness is 5 to 30 μm. This replacing nickel acetate is preferably about twice the amount of acetic acid described above.

前記樹脂めっきの導電化めっきは、化学銅めっき以外に、化学ニッケルめっき又はダイレクトめっきなど、その種類にとらわれない。   The conductive plating of the resin plating is not limited to the type such as chemical nickel plating or direct plating other than chemical copper plating.

例えば、樹脂製筐体にダイレクトめっき法で直接金属を析出させ、スルファミン酸ニッケル浴又はスルファミン酸ニッケル・コバルト合金浴に有機酸又は酢酸ニッケルを添加しためっき浴中に、前記樹脂製筐体を浸漬して、そのニッケルのめっき膜厚が5〜30μmになるように電解析出させることも可能である。   For example, the metal casing is directly deposited on the resin casing by direct plating, and the resin casing is immersed in a plating bath in which an organic acid or nickel acetate is added to a nickel sulfamate bath or a nickel sulfamate / cobalt alloy bath. It is also possible to perform electrolytic deposition so that the nickel plating film thickness is 5 to 30 μm.

上述したように、本発明の樹脂製筐体の高剛性・高硬度めっき方法は、スルファミン酸ニッケル浴が従来のワット浴より、樹脂製筐体における凸部のめっきの盛り上がりが少なく析出させることを利用した。このスルファミン酸ニッケル浴に酢酸又は酢酸ニッケル等の有機酸又は有機酸塩を添加すると、めっき応力を下げる効果と凸部盛り上がりを更に少なくする効果がある。いわゆる、高電部めっき析出抑制効果がある。そこで、ニッケル・コバルト合金めっきは、硬さが硬いのでめっき膜厚を下げても高い剛性を得ることができる。
更に、本発明では、ニッケル・コバルト合金めっきはめっき電着応力が高いが、スルファミン酸ニッケル浴に酢酸又は酢酸ニッケルを適量添加することで電着応力を下げることができる。
As described above, the high rigidity / high hardness plating method of the resin casing of the present invention is such that the nickel sulfamate bath deposits less than the protrusion of the plating on the resin casing than the conventional Watt bath. used. When an organic acid or an organic acid salt such as acetic acid or nickel acetate is added to the nickel sulfamate bath, the effect of lowering the plating stress and the effect of further increasing the protrusions are obtained. There is a so-called high electric part plating deposition suppressing effect. Therefore, since nickel / cobalt alloy plating is hard, high rigidity can be obtained even if the plating film thickness is reduced.
Furthermore, in the present invention, nickel / cobalt alloy plating has high plating electrodeposition stress, but the electrodeposition stress can be lowered by adding an appropriate amount of acetic acid or nickel acetate to a nickel sulfamate bath.

このように、本発明は樹脂製筐体の凸部のめっき盛り上がりの少ないめっき浴を使用したので、樹脂製筐体について全体的にめっき膜厚を下げることにより、めっき製品の寸法精度を良好にすることもできる。そこで、樹脂めっきの樹脂製筐体の寸法精度が良くなり、より厚いめっき膜を付けることが可能となるので、めっき処理した樹脂めっき筐体の剛性を更に高めることができる。   As described above, the present invention uses a plating bath that has a small plating bulge on the convex portion of the resin casing. Therefore, by reducing the overall plating film thickness of the resin casing, the dimensional accuracy of the plated product is improved. You can also Therefore, since the dimensional accuracy of the resin-plated resin casing is improved and a thicker plating film can be applied, the rigidity of the plated resin-plated casing can be further increased.

本発明の樹脂製筐体の高剛性・高硬度めっき方法は、先ず、嵌合性能が要求される弱電製品等の樹脂製筐体に触媒を吸着させ、無電解めっき浴でこの樹脂製筐体に下地金属を析出させる。本発明では、スルファミン酸ニッケル浴又はスルファミン酸ニッケル・コバルト合金浴に有機酸等を添加しためっき浴中に、この樹脂製筐体を浸漬してそのニッケルのめっき膜厚が薄くなるように電解析出させる。   The high rigidity / high hardness plating method of the resin casing of the present invention is as follows. First, a catalyst is adsorbed on a resin casing such as a weak electrical product that requires fitting performance, and this resin casing is used in an electroless plating bath. A base metal is deposited on the substrate. In the present invention, electrolysis is performed so that the nickel plating film thickness is reduced by immersing this resin casing in a plating bath in which an organic acid or the like is added to a nickel sulfamate bath or a nickel sulfamate / cobalt alloy bath. Let it come out.

以下、本発明の好ましい実施の形態を図面を参照して説明する。
図1は本発明の樹脂製筐体の高剛性・高硬度めっき方法の工程図である。図2は本発明の樹脂製筐体の高剛性・高硬度めっき方法の他の工程図である。
樹脂製筐体となる成形材料は、UMGプラスチック製20%CF強化PC/ASA(FA−440CA)を使用した。なお、本発明の樹脂製筐体の高剛性・高硬度めっき方法はこの合成樹脂に限定されないことは勿論である。
本発明は、樹脂製筐体の表面調整工程、エッチング工程、コンディショナー処理、触媒付与工程、触媒活性化工程、無電解めっき工程でこの樹脂製筐体に下地金属を析出させる。この樹脂製筐体をスルファミン酸ニッケル浴に有機酸を添加しためっき浴中に浸漬して、そのニッケルのめっき膜厚が薄くなるように電解析出させる。
Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a process diagram of a high rigidity / high hardness plating method for a resin casing of the present invention. FIG. 2 is another process diagram of the high rigidity / high hardness plating method for the resin casing of the present invention.
As a molding material to be a resin casing, UMG plastic 20% CF reinforced PC / ASA (FA-440CA) was used. Of course, the high rigidity / high hardness plating method of the resin casing of the present invention is not limited to this synthetic resin.
In the present invention, a base metal is deposited on the resin casing in a surface adjustment process, an etching process, a conditioner treatment, a catalyst application process, a catalyst activation process, and an electroless plating process of the resin casing. This resin casing is immersed in a plating bath obtained by adding an organic acid to a nickel sulfamate bath, and electrolytically deposited so that the plating film thickness of the nickel becomes thin.

めっき工程では、先ず樹脂成形品の表面調整のために、プラコン(10ml/L)と硫酸(80ml/L)の浴液に浸漬処理する。このときの液温と処理時間は60℃/6minが最適であった。
なお、樹脂製筐体が図3に示したノートパソコン1のようなPC材料のときは、プラコンの代わりに溶剤による膨潤工程を入れる。この膨潤工程としては、スエラー工程もしくは、溶剤プリエッチング工程がある。
In the plating step, first, in order to adjust the surface of the resin molded product, it is immersed in a bath solution of placon (10 ml / L) and sulfuric acid (80 ml / L). The liquid temperature and treatment time at this time were optimally 60 ° C./6 min.
When the resin casing is a PC material such as the notebook computer 1 shown in FIG. 3, a swelling process using a solvent is performed instead of the platen. As this swelling process, there is a swell process or a solvent pre-etching process.

エッチング工程では、樹脂製筺体を無水クロム酸(400g/L)と硫酸(400g/L)の浴液に浸漬処理する。液温と処理時間は65℃/12minが最適であった。クロム酸を中和するときは、塩酸(50ml/L )と硫酸ヒドラジン(6g/L)の浴液に浸漬処理する。液温と処理時間は30℃/2minが最適であった。   In the etching step, the resin casing is immersed in a bath solution of chromic anhydride (400 g / L) and sulfuric acid (400 g / L). The optimum liquid temperature and treatment time were 65 ° C./12 min. When neutralizing chromic acid, it is immersed in a bath solution of hydrochloric acid (50 ml / L) and hydrazine sulfate (6 g / L). The optimal liquid temperature and processing time were 30 ° C./2 min.

コンディショナー処理工程では、樹脂筺体をコンディライザーFRコンク(10ml/L)の浴液に浸漬処理する。液温と処理時間は40℃/2minが最適であった。
なお、このコンディショナー処理工程は、樹脂製筺体の材料に応じて省略することができる。
In the conditioner treatment step, the resin casing is dipped in a bath solution of a conditioner FR concrete (10 ml / L). The optimum liquid temperature and treatment time were 40 ° C./2 min.
This conditioner treatment step can be omitted depending on the material of the resin casing.

触媒付与工程では、めっき析出のためにパラジウム・錫系コロイド触媒を吸着させる。触媒付与工程、触媒活性化工程では、無電解めっき浴中の銅及びニッケル金属イオンの化学反応(還元作用)を促進する目的で触媒を付加する。   In the catalyst application step, a palladium / tin colloidal catalyst is adsorbed for plating deposition. In the catalyst application step and the catalyst activation step, a catalyst is added for the purpose of promoting the chemical reaction (reduction action) of copper and nickel metal ions in the electroless plating bath.

無電解めっき工程では、触媒を付加した樹脂筺体を化学めっき浴中に浸漬し、金属イオンを還元し下地金属を析出させる。この化学めっき浴としては、クエン酸・アンモニアキレート系化学ニッケルめっき液を用い、その浴のニッケル濃度は4.5〜6.7g/Lにした。その浴温と処理時間は38℃/8minが最適であった。更に、樹脂製筐体の導電化について、このような化学めっき法にとらわれず、樹脂製筐体に直接金属を析出させるダイレクトめっき法も採用することができる。例えば、樹脂上に数μm程度の電気銅めっき処理した樹脂製筐体に本発明のめっき方法でめっきすることができる。   In the electroless plating process, the resin casing to which the catalyst is added is immersed in a chemical plating bath, metal ions are reduced, and the base metal is deposited. As this chemical plating bath, a citric acid / ammonia chelate chemical nickel plating solution was used, and the nickel concentration in the bath was 4.5 to 6.7 g / L. The bath temperature and treatment time were optimally 38 ° C./8 min. Furthermore, the conductive plating of the resin casing is not limited to such a chemical plating method, and a direct plating method in which a metal is directly deposited on the resin casing can also be employed. For example, it can be plated by the plating method of the present invention on a resin casing on which a copper electroplating treatment of about several μm on the resin.

次の電気めっき工程では、スルファミン酸ニッケル浴に有機酸を添加しためっき浴中に、樹脂製筐体を浸漬し電解処理する。このとき、スルファミン酸ニッケル浴の濃度は500g/Lが最適であった。このスルファミン酸ニッケル浴には、有機酸として酢酸を添加する。この酢酸の含有量は7.2g/Lが最適であった。その浴温と処理時間は 45℃/72minが最適であった。これで樹脂めっきが完了する。この酢酸に代えて酢酸ニッケルを添加することも可能である。本発明は、このスルファミン酸ニッケル浴に酢酸又は酢酸ニッケルを添加することにより、めっき応力を下げる効果と凸部盛り上がりを更に少なくする効果がある(高電部めっき析出抑制効)。   In the next electroplating step, the resin casing is immersed in a plating bath obtained by adding an organic acid to a nickel sulfamate bath and subjected to electrolytic treatment. At this time, the concentration of the nickel sulfamate bath was optimally 500 g / L. Acetic acid is added as an organic acid to the nickel sulfamate bath. The acetic acid content was optimally 7.2 g / L. The bath temperature and treatment time were optimally 45 ° C./72 min. This completes the resin plating. It is also possible to add nickel acetate instead of acetic acid. In the present invention, by adding acetic acid or nickel acetate to the nickel sulfamate bath, there is an effect of lowering the plating stress and an effect of further reducing the bulge of the convex part (high electric part plating precipitation suppressing effect).

本発明の高剛性・高硬度めっき方法により得られためっきの硬度としては、スルファミン酸ニッケルめっき浴でめっき処理したときのめっき被膜は、Hv280〜350であった。   As the hardness of the plating obtained by the high-rigidity / high-hardness plating method of the present invention, the plating film when plated with a nickel sulfamate plating bath had a Hv of 280 to 350.

なお、スルファミン酸ニッケル浴に代えてスルファミン酸ニッケル・コバルト合金浴を使用することができる。そのときのスルファミン酸ニッケル・コバルト合金浴の濃度はスルファミン酸ニッケルが300〜600g/Lであり、かつスルファミン酸コバルトを30〜60g/L加える。有機酸の含有量は3〜10g/Lが最適であった。その浴温と処理時間は45℃/60minが最適であった。なお、有機酸として酢酸又は酢酸ニッケルを添加することができる。   A nickel sulfamate / cobalt alloy bath can be used instead of the nickel sulfamate bath. The concentration of the nickel sulfamate / cobalt alloy bath is 300 to 600 g / L for nickel sulfamate and 30 to 60 g / L for cobalt sulfamate. The optimum content of organic acid was 3 to 10 g / L. The bath temperature and treatment time were optimally 45 ° C./60 min. In addition, acetic acid or nickel acetate can be added as an organic acid.

そのニッケルのめっき膜厚は20〜25μmになるように電解析出させる。これはスルファミン酸ニッケル浴でニッケルめっきすると、樹脂筐体の寸法精度を低下させることなく、樹脂製筐体の凸部のめっき盛り上がりが少ないめっき処理をすることができる。このように樹脂製筐体の寸法精度が良くなるために、厚いめっき膜を付けることが可能となるので、めっき処理した樹脂筐体の剛性を高めることができる。   The nickel plating film thickness is electrolytically deposited so as to be 20 to 25 μm. When this is nickel-plated in a nickel sulfamate bath, a plating process in which the protrusion of the convex portion of the resin casing is less prominent can be performed without reducing the dimensional accuracy of the resin casing. As described above, since the dimensional accuracy of the resin casing is improved, a thick plating film can be applied, so that the rigidity of the plated resin casing can be increased.

本発明の高剛性・高硬度めっき方法により得られためっきの硬度としては、スルファミン酸ニッケル・コバルト合金浴でめっき処理したときのめっき被膜は、Hv430〜470であった。上述したスルファミン酸ニッケル浴に比較して高い硬度を得ることができた。そこで、ニッケル・コバルト合金めっきは、硬さが硬いのでめっき膜厚を下げても高い剛性を得ることができる。また、ニッケル・コバルト合金めっきはめっき電着応力が高いが、スルファミン酸ニッケル浴に酢酸又は酢酸ニッケルを適量添加することで電着応力を下げることができる。   The plating hardness obtained by the high rigidity / high hardness plating method of the present invention was Hv 430 to 470 when the plating film was plated with a nickel sulfamate / cobalt alloy bath. High hardness was able to be obtained compared with the nickel sulfamate bath mentioned above. Therefore, since nickel / cobalt alloy plating is hard, high rigidity can be obtained even if the plating film thickness is reduced. Nickel-cobalt alloy plating has high plating electrodeposition stress, but the electrodeposition stress can be lowered by adding an appropriate amount of acetic acid or nickel acetate to a nickel sulfamate bath.

なお、本発明は上述した発明の実施の形態に限定されず、スルファミン酸ニッケル浴又はスルファミン酸ニッケル・コバルト合金浴を用いて樹脂製筐体の凸部のめっき盛り上がりが少ないめっき処理をすることができ、樹脂製筐体の寸法精度を良好にしてその剛性を高めることができる方法であれば、図示した工程又は処理方法のような構成に限定されず、本発明の要旨を逸脱しない範囲で種々変更できることは勿論である。   In addition, this invention is not limited to embodiment of the invention mentioned above, A plating process with few plating bulging of the convex part of a resin-made housing | casing can be performed using a nickel sulfamate bath or a nickel sulfamate-cobalt alloy bath. As long as it is a method that can improve the dimensional accuracy of the resin casing and increase its rigidity, it is not limited to the configuration shown in the illustrated process or processing method, and various methods are possible without departing from the scope of the present invention. Of course, it can be changed.

本発明の樹脂製筐体の高剛性・高硬度めっき方法は、高い剛性が要求される携帯電話やノートパソコン等のその他の弱電製品の樹脂筐体に金属めっきすることができる。   The high rigidity / high hardness plating method of the resin casing of the present invention can perform metal plating on the resin casing of other weak electrical appliances such as a mobile phone and a notebook personal computer that require high rigidity.

本発明の樹脂製筐体の高剛性・高硬度めっき方法の工程図である。It is process drawing of the high rigidity and high hardness plating method of the resin-made housing | casing of this invention. 本発明の樹脂製筐体の高剛性・高硬度めっき方法の他の工程図である。It is another process drawing of the high rigidity and high hardness plating method of the resin casing of the present invention. 樹脂製筐体の一例を示すものであり、樹脂めっきをするノートパソコンの筐体の斜視図である。It is an example of a resin case and is a perspective view of a case of a notebook computer on which resin plating is performed. 樹脂製筐体の一例を示すものであり、樹脂めっきをする携帯電話の筐体の分解正面図である。It is an exploded front view of the case of the mobile phone which shows an example of resin cases and performs resin plating.

符号の説明Explanation of symbols

1 ノートパソコン(樹脂製筐体)
2 本体ケース
3 の下側本体ケース
4 上側本体ケース
5 角部
6 上蓋
7 ヒンジ
8 携帯電話(樹脂製筐体)
9 表示側ケース
10 操作側ケース
11 ヒンジ
1 Notebook PC (resin casing)
2 Main body case 3 Lower main body case 4 Upper main body case 5 Corner portion 6 Upper lid 7 Hinge 8 Mobile phone (resin casing)
9 Display side case 10 Operation side case 11 Hinge

Claims (11)

樹脂製筐体に触媒を吸着させ、無電解めっき浴で該樹脂製筐体に下地金属を析出させ、
スルファミン酸ニッケル浴に有機酸を添加しためっき浴中に、前記樹脂製筐体を浸漬して、そのニッケルのめっき膜厚が5〜30μmになるように電解析出させる、ことを特徴とする樹脂製筐体の高剛性・高硬度めっき方法。
Adsorb the catalyst to the resin casing, deposit the base metal on the resin casing with an electroless plating bath,
A resin characterized in that the resin casing is immersed in a plating bath obtained by adding an organic acid to a nickel sulfamate bath and electrolytically deposited so that the nickel plating film thickness is 5 to 30 μm. High-rigidity and high-hardness plating method for chassis.
前記スルファミン酸ニッケル浴濃度が300〜600g/Lであり、前記有機酸の含有量が3〜10g/Lである、ことを特徴とする請求項1の樹脂製筐体の高剛性・高硬度めっき方法。 2. The high rigidity / high hardness plating of the resin casing according to claim 1, wherein the nickel sulfamate bath concentration is 300 to 600 g / L, and the content of the organic acid is 3 to 10 g / L. Method. 前記有機酸は酢酸である、ことを特徴とする請求項1又は2の樹脂製筐体の高剛性・高硬度めっき方法。 3. The method for plating a resin case with high rigidity and high hardness according to claim 1 or 2, wherein the organic acid is acetic acid. 樹脂製筐体に触媒を吸着させ、無電解めっき浴で該樹脂製筐体に下地金属を析出させ、
スルファミン酸ニッケル浴に酢酸ニッケルを添加しためっき浴中に、前記樹脂製筐体を浸漬して、そのニッケルのめっき膜厚が5〜30μmになるように電解析出させる、ことを特徴とする樹脂製筐体の高剛性・高硬度めっき方法。
Adsorb the catalyst to the resin casing, deposit the base metal on the resin casing with an electroless plating bath,
A resin characterized in that the resin casing is immersed in a plating bath obtained by adding nickel acetate to a nickel sulfamate bath and electrolytically deposited so that the nickel plating film thickness is 5 to 30 μm. High-rigidity and high-hardness plating method for chassis.
樹脂製筐体に触媒を吸着させ、無電解めっき浴中で該樹脂製筐体に下地金属を析出させ、
スルファミン酸ニッケル・コバルト合金浴に有機酸を添加しためっき浴中に、前記樹脂製筐体を浸漬して、そのニッケルのめっき膜厚が5〜30μmになるように電解析出させる、ことを特徴とする樹脂製筐体の高剛性・高硬度めっき方法。
Adsorb the catalyst to the resin casing, deposit the base metal on the resin casing in the electroless plating bath,
The resin casing is immersed in a plating bath obtained by adding an organic acid to a nickel sulfamate / cobalt alloy bath and electrolytically deposited so that the nickel plating film thickness is 5 to 30 μm. High-rigidity and high-hardness plating method for resin casings.
前記スルファミン酸ニッケル浴濃度が300〜600g/Lであり、かつスルファミン酸コバルトをスルファミン酸ニッケルの10〜15重量%量添加したスルファミン酸ニッケル・コバルト合金溶液であり、前記有機酸の含有量が3〜10g/Lである、ことを特徴とする請求項5の樹脂製筐体の高剛性・高硬度めっき方法。 The nickel sulfamate bath concentration is 300 to 600 g / L, and a nickel sulfamate / cobalt alloy solution in which cobalt sulfamate is added in an amount of 10 to 15% by weight of nickel sulfamate, and the organic acid content is 3 The high-rigidity / high-hardness plating method for a resin casing according to claim 5, wherein the plating method is 10 g / L. 前記有機酸は酢酸である、ことを特徴とする請求項5又は6の樹脂製筐体の高剛性・高硬度めっき方法。 The method for plating a resin case according to claim 5 or 6, wherein the organic acid is acetic acid. 樹脂製筐体に触媒を吸着させ、無電解めっき浴中で該樹脂製筐体に下地金属を析出させ、
スルファミン酸ニッケル・コバルト合金浴に酢酸ニッケルを添加しためっき浴中に、前記樹脂製筐体を浸漬して、そのニッケルのめっき膜厚が5〜30μmになるように電解析出させる、ことを特徴とする樹脂製筐体の高剛性・高硬度めっき方法。
Adsorb the catalyst to the resin casing, deposit the base metal on the resin casing in the electroless plating bath,
The resin casing is immersed in a plating bath obtained by adding nickel acetate to a nickel sulfamate / cobalt alloy bath and electrolytically deposited so that the nickel plating film thickness is 5 to 30 μm. High-rigidity and high-hardness plating method for resin casings.
前記無電解めっきは化学銅めっきである、ことを特徴とする請求項1、4、5又は8の樹脂製筐体の高剛性・高硬度めっき方法。 The high-rigidity / high-hardness plating method for a resin casing according to claim 1, wherein the electroless plating is chemical copper plating. 樹脂製筐体に直接金属を析出させ、
スルファミン酸ニッケル浴に有機酸を添加しためっき浴中に、前記樹脂製筐体を浸漬して、そのニッケルのめっき膜厚が5〜30μmになるように電解析出させる、ことを特徴とする樹脂製筐体の高剛性・高硬度めっき方法。
Deposit metal directly on the resin casing,
A resin characterized in that the resin casing is immersed in a plating bath obtained by adding an organic acid to a nickel sulfamate bath and electrolytically deposited so that the nickel plating film thickness is 5 to 30 μm. High-rigidity and high-hardness plating method for chassis.
樹脂製筐体に直接金属を析出させ、
スルファミン酸ニッケル・コバルト合金浴に有機酸を添加しためっき浴中に、前記樹脂製筐体を浸漬して、そのニッケルのめっき膜厚が5〜30μmになるように電解析出させる、ことを特徴とする樹脂製筐体の高剛性・高硬度めっき方法。
Deposit metal directly on the resin casing,
The resin casing is immersed in a plating bath obtained by adding an organic acid to a nickel sulfamate / cobalt alloy bath and electrolytically deposited so that the nickel plating film thickness is 5 to 30 μm. High-rigidity and high-hardness plating method for resin casings.
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