JP2005125305A - Treating agent and method for forming transparent electrically-conductive film - Google Patents
Treating agent and method for forming transparent electrically-conductive film Download PDFInfo
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本発明は、液晶ディスプレイ、タッチパネル、太陽電池等に用いられる透明導電膜形成用処理剤ならびに透明導電膜形成方法に関する。 The present invention relates to a transparent conductive film forming treatment agent and a transparent conductive film forming method used for liquid crystal displays, touch panels, solar cells and the like.
透明導電膜の製造方法として、1)酸化錫等を直接基板に蒸着製膜する方法、ITO等をターゲットにしてスパッタリングで製膜する方法、金属アルコキシドを用いるCVD法、などの気相法と、2)錫やインジウムの有機塩を基板に塗布し熱分解する方法、導電性微粒子を含むインキを印刷・塗布する方法、などの塗布法が知られている。しかし、1)スパッタリング法やCVD法などの気相法は装置が大掛かりになり、生産性が悪いことから、近年、2)塗布法が注目を集めている。 As a method for producing a transparent conductive film, 1) a vapor deposition method such as a method of directly depositing tin oxide or the like on a substrate, a method of forming a film by sputtering using ITO or the like, a CVD method using a metal alkoxide, 2) Coating methods such as a method in which an organic salt of tin or indium is applied to a substrate and thermally decomposed, and a method in which an ink containing conductive fine particles is printed or applied are known. However, 1) gas phase methods such as sputtering and CVD require a large apparatus and have poor productivity, and in recent years, 2) coating methods have attracted attention.
このような塗布法に用いられる処理剤として、インジウム化合物に抵抗調整用として錫化合物と粘性剤として、ニトロセルロースと、溶媒としてブチルセロソルブ、ブチルカルビトール、ベンジルアセテート及びジメチルフタレートの混合溶媒とを添加混合して得られる透明導電膜性被膜形成用ペーストが開示されている。(例えば特許文献1参照)
前記発明においては、ニトロセルロースに起因するスクリーン印刷性の悪さと寿命の短さを改善するために、ニトロセルロースをよく溶解するセルソルブ、或いはカルビトール類を使用しているが、この溶剤系はインジウム化合物の溶解性が悪く、処理剤中の金属分濃度をあげることが困難であるという問題があった。 In the above invention, cellsolve or carbitols that dissolve nitrocellulose well are used in order to improve the poor screen printability and short life caused by nitrocellulose. There was a problem that the solubility of the compound was poor and it was difficult to increase the metal concentration in the treatment agent.
上記問題に鑑みて鋭意研究を重ねた結果、各配合剤を良く溶解し、透過率が高く、低抵抗値を有する透明導電膜形成用処理剤ならびに透明導電膜形成方法を提供する。 As a result of intensive studies in view of the above problems, a transparent conductive film forming treatment agent and a transparent conductive film forming method that dissolve each compounding agent well, have high transmittance, and have a low resistance value are provided.
即ち、本発明は、(1)インジウム化合物、(2)錫化合物、(3)増粘剤、そして(4)有機溶剤を含有する透明導電膜形成用処理剤において、(3)増粘剤がニトロセルロースであって、(4)有機溶剤がフェノール類と二塩基性酸エステルの混合溶剤であることを特徴とする透明導電膜形成用処理剤である。本発明はまた前記透明導電膜形成用処理剤であって、フェノール類がクレゾール、キシレノール、およびエチルフェノールからなる群より少なくとも一種選ばれてなる;二塩基性酸エステルがマロン酸ジエチルである;(4)有機溶剤が、更にオレフィン系溶剤を混合したものである;(4)有機溶剤が、更に低級脂肪酸の低級アルキルエステルを混合したものである透明導電膜形成用処理剤である。更に、本発明は基板に前記透明導電膜形成用処理剤を塗布、乾燥の後、焼成することを特徴とした透明導電膜形成方法である。 That is, the present invention relates to (1) an indium compound, (2) a tin compound, (3) a thickener, and (4) a treatment agent for forming a transparent conductive film containing an organic solvent. A processing agent for forming a transparent conductive film, characterized in that it is nitrocellulose and (4) the organic solvent is a mixed solvent of phenols and dibasic acid esters. The present invention also provides the transparent conductive film forming treatment agent, wherein the phenol is selected from the group consisting of cresol, xylenol, and ethylphenol; the dibasic acid ester is diethyl malonate; 4) The organic solvent is a mixture obtained by further mixing an olefin solvent; (4) The organic solvent is a treatment agent for forming a transparent conductive film, which is a mixture obtained by further mixing a lower alkyl ester of a lower fatty acid. Furthermore, the present invention is a method for forming a transparent conductive film, wherein the transparent conductive film forming treatment agent is applied to a substrate, dried and then fired.
本発明によれば、特定の有機溶剤を併用することで各配合剤をよく溶解し、処理剤の安定性に優れるといった効果がある。またこの処理剤により作製された透明導電膜は、高透過率で、抵抗値が低いといった特性を有する。更にオレフィン系溶剤を併用すると、印刷性などの作業性が改善されると共に、より低抵抗値を有する透明導電膜が得られる。更に低級脂肪酸の低級アルキルエステルを併用するとニトロセルロースの溶解性が増し、高粘度な処理剤を得ることが可能になる。 According to the present invention, by using a specific organic solvent in combination, there is an effect that each compounding agent is well dissolved and the stability of the treatment agent is excellent. Moreover, the transparent conductive film produced with this processing agent has characteristics such as high transmittance and low resistance. Furthermore, when an olefin solvent is used in combination, workability such as printability is improved, and a transparent conductive film having a lower resistance value is obtained. Further, when a lower alkyl ester of a lower fatty acid is used in combination, the solubility of nitrocellulose increases, and a high-viscosity treatment agent can be obtained.
本発明に係る透明導電膜形成用処理剤は、(1)インジウム化合物、(2)錫化合物、(3)増粘剤、そして(4)有機溶剤を含有し、(3)増粘剤がニトロセルロースであって、(4)有機溶剤がフェノール類と二塩基性酸エステルであることを特徴とする。 The processing agent for forming a transparent conductive film according to the present invention contains (1) an indium compound, (2) a tin compound, (3) a thickener, and (4) an organic solvent, and (3) the thickener is nitro. Cellulose, wherein (4) the organic solvent is a phenol and a dibasic acid ester.
(1)インジウム化合物は有機インジウム化合物であることが好ましく、インジウムのエトキシド、プロポキシド、ブトキシド等のアルコキシド類、アセチルアセトナート等のキレート類、ステアレイト、オクチレート、ナフテネート等の有機酸塩類があげられる。 (1) The indium compound is preferably an organic indium compound, and examples thereof include alkoxides such as indium ethoxide, propoxide and butoxide, chelates such as acetylacetonate, and organic acid salts such as stearate, octylate and naphthenate. .
(2)錫化合物は、有機錫化合物であることが好ましく、錫のエトキシド、プロポキシド、ブトキシド等のアルコキシド類、アセチルアセトナート等のキレート類、ステアレイト、オクチレート、ナフテネート等の有機酸塩類があげられる。 (2) The tin compound is preferably an organic tin compound, and includes alkoxides such as tin ethoxide, propoxide and butoxide, chelates such as acetylacetonate, and organic acid salts such as stearate, octylate and naphthenate. It is done.
(1)インジウム化合物、(2)錫化合物の含有量は限定されるものではないが、膜厚を考慮すると、処理剤中にインジウム及び錫の総金属分が1〜10重量%含有するよう各化合物を配合することが好ましい。また重量比で、錫/(インジウム+錫)=5〜50とすることが望ましく、より低抵抗な膜を得るためには前記重量比を8〜10とすることが望ましい。尚、膜の抵抗値は錫を変量することでコントロールが可能である。 The contents of (1) indium compound and (2) tin compound are not limited, but considering the film thickness, each of the treatment agents contains 1 to 10% by weight of the total metal content of indium and tin. It is preferable to add a compound. Further, it is desirable that tin / (indium + tin) = 5-50 in terms of weight ratio, and in order to obtain a lower resistance film, the weight ratio is desirably 8-10. The resistance value of the film can be controlled by changing the amount of tin.
本発明で使用する(3)増粘剤はニトロセルロースであり、透明度が高く、低抵抗値を有する透明導電膜が得られるといった効果がある。その含有量は使用するニトロセルロースの分子量や後述する(4)有機溶剤種等により異なるが、処理剤中に1〜10重量%含有されることが好ましい。1重量%未満では、厚膜化が困難であり、また、焼成後の透明導電膜の抵抗値が満足できるものではない。10重量%を超えると焼成時に樹脂の熱分解性が悪くなり、焼成後の透明導電膜の物性が悪くなる。また分子量は特に限定されるものではないが、10,500〜126,000のものが好ましく用いられる。尚、ニトロセルロースは増粘剤としてだけでなくバインダーとしても作用する。 The (3) thickener used in the present invention is nitrocellulose, which has an effect of obtaining a transparent conductive film having high transparency and a low resistance value. The content varies depending on the molecular weight of the nitrocellulose used and (4) the type of organic solvent described later, but is preferably contained in the treatment agent in an amount of 1 to 10% by weight. If it is less than 1% by weight, it is difficult to increase the thickness, and the resistance value of the transparent conductive film after firing is not satisfactory. When it exceeds 10% by weight, the thermal decomposability of the resin is deteriorated during firing, and the physical properties of the transparent conductive film after firing are deteriorated. Moreover, although molecular weight is not specifically limited, The thing of 10,500-126,000 is used preferably. Nitrocellulose acts not only as a thickener but also as a binder.
本発明で使用する(4)有機溶剤はフェノール類と二塩基性酸エステルの混合溶媒である。フェノール類としては、クレゾール、キシレノール、エチルフェノール、クロロフェノール、p−t−ブチルフェノール、オクチルフェノール等があげられるが、なかでも熱分解性を考慮するとクレゾール、キシレノール、エチルフェノールが好ましい。フェノール類は二塩基性酸エステルと併用することでインジウム化合物を溶解することができる。 (4) The organic solvent used in the present invention is a mixed solvent of phenols and dibasic acid esters. Examples of the phenols include cresol, xylenol, ethylphenol, chlorophenol, pt-butylphenol, octylphenol, and the like. Among them, cresol, xylenol, and ethylphenol are preferable in view of thermal decomposability. Phenols can dissolve indium compounds when used in combination with dibasic acid esters.
また二塩基性酸エステルとしては、マロン酸ジエチル、フタル酸ジメチル、グルタル酸ジメチル3−オキソグルタル酸ジメチル等があげられるが、構造上、溶解性に優れるマロン酸ジエチルが好ましい。二塩基性酸エステルはフェノール類と併用することでインジウム化合物を溶解せしめることが可能であると共に、ニトロセルロースを溶解することができる。 Examples of the dibasic acid ester include diethyl malonate, dimethyl phthalate, dimethyl glutarate, dimethyl 3-oxoglutarate, and the like. However, diethyl malonate having excellent solubility in terms of structure is preferable. A dibasic acid ester can dissolve an indium compound by using it together with phenols, and can dissolve nitrocellulose.
フェノール類と二塩基性酸エステルの混合溶剤の混合比は、前者:後者が質量比で18〜1:1:〜18であることが好ましく、処理剤における両者の含有量は、インジウム化合物、ニトロセルロースの種類・含有量などにより決定されるが、フェノール類の含有量はインジウム化合物100重量部に対して50〜1500重量部とすることが好ましい。また二塩基性酸エステルはニトロセルロース100重量部に対して100〜9500重量部含有することが望ましい。 The mixing ratio of the mixed solvent of phenols and dibasic acid ester is preferably 18 to 1: 1 to 18 in terms of mass ratio of the former: the latter, and the contents of both in the treating agent are indium compound, nitro Although it is determined by the type and content of cellulose, the content of phenols is preferably 50-1500 parts by weight with respect to 100 parts by weight of the indium compound. The dibasic acid ester is desirably contained in an amount of 100 to 9500 parts by weight based on 100 parts by weight of nitrocellulose.
また前記溶媒に加えて、オレフィン系溶剤を添加することができる。オレフィン系溶剤は、ニトロセルロースを溶解しない有機溶剤であるが、処理剤に添加することで、処理剤の印刷性を改善するとともに、得られる皮膜の抵抗値を更に低下させることが可能である。その含有量は、フェノール類、二塩基性酸エステル、後述の低級脂肪酸の低級アルキルエステル、そして(3)ニトロセルロースの種類・含有量などにより決定されるが、具体的には処理液中に1〜20重量%含有させることで顕著な効果が得られる。オレフィン系溶剤としては、ペンテン、ヘキセン、ヘプテンオクテン、デセン、ドデセン、などがあるが、なかでもドデセンが好ましく用いられる。 In addition to the solvent, an olefin solvent can be added. The olefin solvent is an organic solvent that does not dissolve nitrocellulose, but by adding to the treatment agent, it is possible to improve the printability of the treatment agent and further reduce the resistance value of the resulting film. The content is determined by phenols, dibasic acid esters, lower alkyl esters of lower fatty acids described below, and (3) the type and content of nitrocellulose. The remarkable effect is acquired by containing -20weight%. Examples of the olefin solvent include pentene, hexene, heptene octene, decene, and dodecene. Among these, dodecene is preferably used.
また、前記溶媒に加えて、低級脂肪酸の低級アルキルエステルを添加することができる。低級脂肪酸の低級アルキルエステルはニトロセルロースの良溶媒であるため、ニトロセルロースの溶解性が増し、処理剤の粘度を高めることが可能となって、スクリーン印刷に適した配合となる。低級脂肪酸の低級アルキルエステルとしては、酢酸エステル、乳酸エステルなどが挙げられ、なかでも乳酸エステルが高沸点を有することから好ましく用いられる。乳酸エステルとしては、乳酸メチル、乳酸エチル、乳酸ブチルなどがあげられるが、中でも高沸点な乳酸ブチルが好ましく用いられる。その含有量はインジウム化合物、錫化合物、及び、フェノール類、二塩基性酸エステル、オレフィン系溶剤、そして、(3)ニトロセルロースの種類・含有量などにより決定されるが、具体的には処理液中に0〜50重量%含有させることで顕著な効果が得られる。 Moreover, in addition to the said solvent, the lower alkyl ester of a lower fatty acid can be added. Since lower alkyl esters of lower fatty acids are good solvents for nitrocellulose, the solubility of nitrocellulose is increased, the viscosity of the treatment agent can be increased, and the composition is suitable for screen printing. Examples of the lower alkyl ester of the lower fatty acid include acetic acid ester and lactic acid ester. Among them, lactic acid ester is preferably used since it has a high boiling point. Examples of the lactic acid ester include methyl lactate, ethyl lactate, and butyl lactate, among which butyl lactate having a high boiling point is preferably used. Its content is determined by the indium compound, tin compound, phenols, dibasic acid ester, olefinic solvent, and (3) the type and content of nitrocellulose. The remarkable effect is acquired by making it contain 0 to 50 weight% in.
透明導電膜形成用処理剤の調整方法は限定されるものではないが、具体的には下記の2種類の調整方法を例示することができる。 Although the adjustment method of the processing agent for transparent conductive film formation is not limited, Specifically, the following two types of adjustment methods can be illustrated.
第1の調製方法としては、所望の有機溶剤を攪拌して溶解させた混合溶剤にインジウム化合物、錫化合物を添加し、80〜180℃に保持し、インジウム化合物、錫化合物を溶解させた後冷却する。この溶液を約50〜80℃に保持し、増粘剤となるニトロセルロースを溶解させて目的の透明導電膜形成用処理剤とする。尚、オレフィン系溶剤を添加する場合は、ニトロセルロースを添加した後に配合することが望ましい。この調整方法によれば、簡単な工程でインキの作製ができるといった利点がある。 As a first preparation method, an indium compound and a tin compound are added to a mixed solvent obtained by stirring and dissolving a desired organic solvent, and kept at 80 to 180 ° C., and then the indium compound and the tin compound are dissolved and then cooled. To do. This solution is kept at about 50 to 80 ° C., and nitrocellulose as a thickener is dissolved to obtain a target treatment agent for forming a transparent conductive film. In addition, when adding an olefin solvent, it is desirable to mix | blend after adding nitrocellulose. According to this adjustment method, there is an advantage that ink can be produced by a simple process.
第2の調整方法としては、所望の有機溶剤を攪拌して溶解させた混合溶剤のインジウム化合物、錫化合物を添加し、80〜180℃に保持し、インジウム化合物、錫化合物を溶解させた後冷却したものをプレミクスチャーとする。このとき、前記混合溶剤として、エステル系溶剤は処理剤に加えるべき全量を混合しない。残部のエステル系溶液は約50〜80℃に保持され、増粘剤となるニトロセルロースを溶解させた後、前記プレミクスチャーを添加して攪拌し、目的の透明導電膜形成用処理剤とする。尚、オレフィン系溶剤を添加する場合は、ニトロセルロースを添加した後に配合することが望ましい。この調製方法によれば、短時間でニトロセルロースを溶解することができるといった利点がある。 As a second adjustment method, an indium compound and a tin compound in a mixed solvent obtained by stirring and dissolving a desired organic solvent are added, and kept at 80 to 180 ° C., and then the indium compound and the tin compound are dissolved and then cooled. This is the premixture. At this time, as the mixed solvent, the ester solvent does not mix the total amount to be added to the treating agent. The remaining ester-based solution is maintained at about 50 to 80 ° C., and after dissolving nitrocellulose as a thickener, the premixture is added and stirred to obtain a target treatment agent for forming a transparent conductive film. In addition, when adding an olefin solvent, it is desirable to mix | blend after adding nitrocellulose. According to this preparation method, there is an advantage that nitrocellulose can be dissolved in a short time.
透明導電膜の製造方法は、例えばソーダライムガラス、石英ガラス、無アルカリガラスからなるガラス基板上に、該透明導電膜形成用処理剤をスプレー、ディップ、ロールコ−ト、スピンコート等の方法で塗布し、50〜150℃のオーブン内で有機溶剤を乾燥させた後、酸素の存在する環境下、例えば空気中500〜800℃の炉中で10〜50分間焼成し、冷却を経て、透明導電膜を形成した基板を得ることができる。 The transparent conductive film is produced by, for example, applying the transparent conductive film forming treatment agent on a glass substrate made of soda lime glass, quartz glass, or non-alkali glass by a method such as spraying, dipping, roll coating, or spin coating. Then, after drying the organic solvent in an oven at 50 to 150 ° C., it is baked for 10 to 50 minutes in an oxygen-existing environment, for example, in a furnace at 500 to 800 ° C. in air, and after cooling, the transparent conductive film Can be obtained.
実施例1〜5、比較例1〜4
表1、表2の配合に従って、各有機溶剤にインジウム化合物、錫化合物を添加し、170℃で1.5時間攪拌した後ニトロセルロースを溶解させた溶液について、インジウム化合物の溶け残りの有無を目視で確認し、その溶解性を評価した。尚、表1及び表2の配合%は重量%である。
Examples 1-5, Comparative Examples 1-4
According to the composition of Table 1 and Table 2, an indium compound and a tin compound were added to each organic solvent, and the solution in which nitrocellulose was dissolved after stirring at 170 ° C. for 1.5 hours was visually inspected for the presence or absence of the indium compound. And the solubility was evaluated. In addition, the mixing | blending% of Table 1 and Table 2 is weight%.
表1の実施例1〜5より、二塩基性酸エステルとフェノール類の混合溶媒を用いた場合、有機インジウム化合物、有機錫化合物、ニトロセルロースを良好に溶解することが判るが、表2の比較例1〜4より、各有機溶剤単独ではインジウム化合物の溶け残りが観察され、溶解性が悪いことが判明した。また、比較例3はフェノール類の変わりにサリチルアルデヒド、比較例4では、二塩基性酸エステルの変わりにベンジルアルコールを用いたものであるが、いずれも溶解性に問題があった。 From Examples 1 to 5 in Table 1, it can be seen that when a mixed solvent of a dibasic acid ester and a phenol is used, an organic indium compound, an organic tin compound, and nitrocellulose are well dissolved. From Examples 1 to 4, it was found that each organic solvent alone showed undissolved undissolved indium compound and poor solubility. In Comparative Example 3, salicylaldehyde was used in place of phenols, and in Comparative Example 4, benzyl alcohol was used in place of dibasic acid ester, but both had problems with solubility.
実施例6,7
180℃に温度調節されたホットステージにフラスコ、還流管を設置し、表3に示された配合量に従って、二塩基性酸エステルとフェノール類を混合した後、この混合溶剤にインジウム化合物、錫化合物を添加し、約1時間攪拌し、溶解させた。この溶液を自然冷却させた後、約80℃に保持し、増粘剤として、高分子量のニトロセルロース(RS−120ダイセル化学工業社製:Mw10,500〜126,500)を溶解した。その後室温まで自然冷却して各処理剤を作製した。尚、表3の配合%は重量%である。
Examples 6 and 7
A flask and a reflux tube were installed on a hot stage whose temperature was adjusted to 180 ° C., and after mixing a dibasic acid ester and a phenol according to the blending amounts shown in Table 3, an indium compound and a tin compound were mixed in this mixed solvent. Was added and stirred for about 1 hour to dissolve. After this solution was naturally cooled, it was kept at about 80 ° C., and high molecular weight nitrocellulose (RS-120 Daicel Chemical Industries, Ltd .: Mw 10,500 to 126,500) was dissolved as a thickener. Then, each treatment agent was produced by naturally cooling to room temperature. In Table 3, the blending percentage is weight percent.
これらの処理剤を用いて厚み3.0mmのソーダライムガラス板上にスクリーン印刷法により塗布し、塗布後のガラス板を100℃で10分間乾燥した後、600°Cのベルト炉で約10分間焼成して透明導電膜付きガラスを作製した。得られた透明導電膜付きガラスにつき1〜3の評価を実施した。 Using these treatment agents, a soda lime glass plate having a thickness of 3.0 mm was applied by screen printing, and the coated glass plate was dried at 100 ° C. for 10 minutes, and then in a belt furnace at 600 ° C. for about 10 minutes. Baking was performed to produce a glass with a transparent conductive film. 1-3 evaluation was implemented about the obtained glass with a transparent conductive film.
1.電気特性
ロレスタFP(三菱化学社製)を用いて、四探針法により透明導電膜付きガラスの電気特性を測定した。
1. Electrical characteristics Using Loresta FP (manufactured by Mitsubishi Chemical Corporation), electrical characteristics of the glass with a transparent conductive film were measured by a four-point probe method.
2.膜厚
触針式膜厚計を用いて、透明導電膜の膜厚を測定した。
2. Film thickness The film thickness of the transparent conductive film was measured using a stylus-type film thickness meter.
3.光学特性
透明導電膜付きガラスの透明性を判定するために濁度計(日本電色社製)、分光光度計(UV3100島津製作所社製)を用いて、Hz率、透過率を測定した。
3. Optical characteristics To determine the transparency of the glass with a transparent conductive film, the Hz rate and transmittance were measured using a turbidimeter (manufactured by Nippon Denshoku) and a spectrophotometer (manufactured by Shimadzu UV3100).
表3より、得られた透明導電膜はヘーズ率が0.5%未満であり、高透過率を示すことが判った。また10-3Ωcmオーダーの低い体積抵抗率を示すことも知見できた。 From Table 3, it was found that the obtained transparent conductive film had a haze ratio of less than 0.5% and exhibited high transmittance. It was also found that the volume resistivity was as low as 10 −3 Ωcm.
実施例8〜11
180℃に温度調節されたホットステージにフラスコ、還流管を設置し、表4に示された配合表に従って、有機溶媒を混合した後、インジウム化合物、錫化合物を添加し、溶解させた。この溶液を自然冷却させた後、80℃に保持し、増粘剤として、高分子量のニトロセルロース(RS−120ダイセル化学工業社製:Mw10,500〜126,500)を溶解し、更にオレフィン系溶剤としてドデセンを添加した。その後室温まで自然冷却して各処理剤を作製した。尚、表4の配合%は重量%である。
Examples 8-11
A flask and a reflux tube were placed on a hot stage whose temperature was adjusted to 180 ° C., and an organic solvent was mixed in accordance with the recipe shown in Table 4, and then an indium compound and a tin compound were added and dissolved. After naturally cooling this solution, it is kept at 80 ° C., and a high molecular weight nitrocellulose (RS-120 Daicel Chemical Industries, Ltd .: Mw 10,500 to 126,500) is dissolved as a thickener. Dodecene was added as a solvent. Then, each treatment agent was produced by naturally cooling to room temperature. In Table 4, the blending percentage is% by weight.
これらの処理剤を用いて厚み3.0mmのソーダライムガラス板上にスクリーン印刷法により塗布し、塗布後のガラス板を150℃で10分間乾燥した後、520℃のベルト炉で約20分間焼成して透明導電膜付きガラスを作製した。得られた透明導電膜付きガラスにつき1〜3の評価を実施した。 Using these treatment agents, a soda lime glass plate having a thickness of 3.0 mm was applied by screen printing, and the coated glass plate was dried at 150 ° C. for 10 minutes and then baked in a belt furnace at 520 ° C. for about 20 minutes. Thus, a glass with a transparent conductive film was produced. 1-3 evaluation was implemented about the obtained glass with a transparent conductive film.
表4より、得られた透明導電膜はヘーズ率が0.5%未満であり、高透過率を示した。また、ドデセンを添加することによって、抵抗値を下げることができ、10-3Ωcmオーダーの低い体積抵抗率を示すことが知見できた。 From Table 4, the obtained transparent conductive film had a haze ratio of less than 0.5% and a high transmittance. Further, it was found that the resistance value can be lowered by adding dodecene, and a low volume resistivity on the order of 10 −3 Ωcm is exhibited.
実施例12〜15
表5の配合に従って、透明導電膜形成用処理剤を作製し、ニトロセルロースの溶解性を目視にて評価した。
透明導電膜形成用処理剤の作製方法としては、120℃に温度調節されたオイルバスにフラスコ、還流管、温度計を設置し、表5に示された配合表に従って、有機溶媒、インジウム化合物、錫化合物を計量し、攪拌した。液温が120℃になったところで1時間保持し、溶解させた後、自然冷却させてプレミクスチャーを作製した。一方で、80℃に保持したエステル系溶剤に高分子量のニトロセルロース(RS−120ダイセル化学工業社製:Mw10,500〜126,500)を添加し、溶解させた後、プレミクスチャーを添加し攪拌した。その後、室温まで自然冷却して各処理液を作製した。尚、表5の配合%は重量%である。
Examples 12-15
According to the composition of Table 5, a transparent conductive film-forming treatment agent was prepared, and the solubility of nitrocellulose was visually evaluated.
As a method for producing the transparent conductive film forming treatment agent, a flask, a reflux tube, and a thermometer were installed in an oil bath whose temperature was adjusted to 120 ° C., and according to the recipe shown in Table 5, an organic solvent, an indium compound, The tin compound was weighed and stirred. When the liquid temperature reached 120 ° C., it was held for 1 hour, dissolved, and then naturally cooled to prepare a premixture. On the other hand, high molecular weight nitrocellulose (RS-120, manufactured by Daicel Chemical Industries, Ltd .: Mw 10,500 to 126,500) is added to an ester solvent maintained at 80 ° C. and dissolved, and then a premixture is added and stirred. did. Then, each processing liquid was produced by naturally cooling to room temperature. In addition, the compounding% of Table 5 is weight%.
結果、乳酸ブチルを配合した実施例では、より多量のニトロセルロースを溶解できることが知見できた。 As a result, it was found that a larger amount of nitrocellulose can be dissolved in the examples in which butyl lactate was blended.
実施例16〜21
150℃に温度調節されたオイルバスにフラスコ、還流管、温度計を設置し、表5に示された配合表に従って、有機溶媒、インジウム化合物、錫化合物を計量し、攪拌した。液温が150℃になったところで1時間保持し、溶解させた後、自然冷却させてプレミクスチャーを作製した。一方で、80℃に保持した乳酸ブチルにニトロセルロースを添加し、溶解させた後、プレミクスチャーを添加し攪拌した。その後室温まで自然冷却して各処理液を作製した。尚、表6の配合%は重量%である。
Examples 16-21
A flask, a reflux tube, and a thermometer were installed in an oil bath whose temperature was adjusted to 150 ° C., and an organic solvent, an indium compound, and a tin compound were weighed and stirred according to a recipe shown in Table 5. When the liquid temperature reached 150 ° C., it was held for 1 hour, dissolved, and then naturally cooled to prepare a premixture. On the other hand, nitrocellulose was added to butyl lactate maintained at 80 ° C. and dissolved, and then a premixture was added and stirred. Thereafter, each treatment liquid was produced by naturally cooling to room temperature. In Table 6, the blending percentage is weight percent.
これらの処理剤を用いて厚み3.0mmのソーダライムガラス板上にスクリーン印刷法により塗布し、塗布後のガラス板を100℃で10分間乾燥した後、520℃のベルト炉で約20分間焼成して透明導電膜付きガラスを作製した。得られた透明導電膜付きガラスにつき、前述の1〜3の評価を実施した。 Using these treatment agents, a soda lime glass plate having a thickness of 3.0 mm was applied by screen printing, and the coated glass plate was dried at 100 ° C. for 10 minutes and then baked in a belt furnace at 520 ° C. for about 20 minutes. Thus, a glass with a transparent conductive film was produced. About the obtained glass with a transparent conductive film, the above-described evaluations 1 to 3 were performed.
表6より、得られた透明導電膜はヘーズ率が0.5%未満であり、高透過率を示すことが判った。また10-2Ωcm前半の低い体積抵抗率を示すことも知見できた。 From Table 6, it was found that the obtained transparent conductive film had a haze ratio of less than 0.5% and a high transmittance. It was also found that a low volume resistivity of the first half of 10 −2 Ωcm was exhibited.
本発明にかかる透明導電膜形成用処理剤および透明導電膜形成方法は、液晶ディスプレイ、タッチパネル、太陽電池や、建築物、車両等のガラスの防曇防止用発熱体などに適用される。
The treatment agent for forming a transparent conductive film and the method for forming a transparent conductive film according to the present invention are applied to a liquid crystal display, a touch panel, a solar battery, a heating element for preventing defogging of glass such as buildings and vehicles, and the like.
Claims (6)
A method for forming a transparent conductive film, comprising applying the treatment agent for forming a transparent conductive film according to any one of claims 1 to 5 to a substrate, drying, and baking.
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JPS6319713A (en) * | 1986-07-11 | 1988-01-27 | 日本曹達株式会社 | Paste-like composition for formation of transparent conductive film and formation method of transparent conductive film |
JPS6325448B2 (en) * | 1981-11-25 | 1988-05-25 | Alps Electric Co Ltd | |
JPH02234309A (en) * | 1989-03-06 | 1990-09-17 | Japan Synthetic Rubber Co Ltd | Composition for conductive film formation |
JPH06203658A (en) * | 1992-12-28 | 1994-07-22 | Sumitomo Metal Mining Co Ltd | Coating solution for stranparent conductive film formation |
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JPS6325448B2 (en) * | 1981-11-25 | 1988-05-25 | Alps Electric Co Ltd | |
JPS6319713A (en) * | 1986-07-11 | 1988-01-27 | 日本曹達株式会社 | Paste-like composition for formation of transparent conductive film and formation method of transparent conductive film |
JPH02234309A (en) * | 1989-03-06 | 1990-09-17 | Japan Synthetic Rubber Co Ltd | Composition for conductive film formation |
JPH06203658A (en) * | 1992-12-28 | 1994-07-22 | Sumitomo Metal Mining Co Ltd | Coating solution for stranparent conductive film formation |
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JP2020076054A (en) * | 2018-09-06 | 2020-05-21 | 花王株式会社 | Spray composition |
JP7336924B2 (en) | 2018-09-06 | 2023-09-01 | 花王株式会社 | composition for spray |
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