JP2005109147A - Semiconductor device and manufacturing method thereof - Google Patents

Semiconductor device and manufacturing method thereof Download PDF

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JP2005109147A
JP2005109147A JP2003340642A JP2003340642A JP2005109147A JP 2005109147 A JP2005109147 A JP 2005109147A JP 2003340642 A JP2003340642 A JP 2003340642A JP 2003340642 A JP2003340642 A JP 2003340642A JP 2005109147 A JP2005109147 A JP 2005109147A
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semiconductor device
circuit board
heat spreader
heat sink
welded
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JP4160889B2 (en
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Sadatane Kato
禎胤 加藤
Kazuto Tsuji
和人 辻
Yoshihiro Kubota
義浩 久保田
Kazuhiro Watabe
一寛 渡部
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Fujitsu Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • H01L2224/48465Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond the other connecting portion not on the bonding area being a wedge bond, i.e. ball-to-wedge, regular stitch
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors

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  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To surely and stably weld a heat radiating plate to the weld zone of a semiconductor device even when a small energy laser is used. <P>SOLUTION: The semiconductor device comprises a semiconductor element 11, a circuit board 12 to which the semiconductor device is electrically connected, and a metal heat spreader 30 joined to the semiconductor element. The circuit board 12 has metal weld zones 22, and the heat spreader 30 is welded to the weld zones 22 of the circuit board 12. Recesses 30a are formed in the surface of the heat spreader 30 opposite to the surface thereof facing the weld zones 22. The heat spreader 30 is welded to the weld zones 22 within the recesses 30a by the laser. The recesses 30a are formed by etching. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は半導体装置に係わり、特に半導体素子から発生する熱を外部に放出するための放熱板を有する半導体装置及びその製造方法に関する。   The present invention relates to a semiconductor device, and more particularly to a semiconductor device having a heat dissipation plate for releasing heat generated from a semiconductor element to the outside, and a method for manufacturing the same.

近年の半導体素子は高密度化に伴い消費電力も増え、半導体素子が発生する発熱量も増大する傾向にある。このため、半導体素子を搭載した半導体装置に放熱板を設け、半導体素子で発生する熱を放熱板を介して効率よく外部に放出することが行なわれている。   In recent years, semiconductor devices tend to increase in power consumption as the density increases and the amount of heat generated by the semiconductor devices also increases. For this reason, a heat sink is provided in a semiconductor device on which a semiconductor element is mounted, and heat generated by the semiconductor element is efficiently released to the outside through the heat sink.

一般的に、放熱板を有する半導体装置では、接着剤を用いて放熱板を配線基板に固定する。また、半導体素子は放熱板に直接搭載されており、放熱板は半導体装置の上面に露出するように構成される。したがって、半導体素子で発生した熱は放熱板に直接伝達され、放熱板から外部に放出される。これにより、半導体素子を効率よく冷却することができる。   Generally, in a semiconductor device having a heat sink, the heat sink is fixed to a wiring board using an adhesive. The semiconductor element is directly mounted on the heat sink, and the heat sink is configured to be exposed on the upper surface of the semiconductor device. Therefore, the heat generated in the semiconductor element is directly transmitted to the heat sink and released from the heat sink to the outside. Thereby, a semiconductor element can be cooled efficiently.

ところが、上述のように放熱板を配線基板に接着剤を用いて固定した半導体装置において、接着剤の経時劣化により放熱板が配線基板から剥離するおそれがある。このため、接着剤の使用に起因して半導体装置の信頼性が低下するおそれがある。また、半導体装置を製造する際、放熱板を配線基板に接着剤を用いて固定する半導体装置では、その製造工程において接着剤を放熱板または配線基板に塗布する工程が必要となる。接着剤塗布工程は自動化することが難しく、よって半導体装置の製造コストが上昇してしまう。   However, in the semiconductor device in which the heat radiating plate is fixed to the wiring board using an adhesive as described above, the heat radiating board may be peeled off from the wiring board due to deterioration of the adhesive over time. For this reason, there exists a possibility that the reliability of a semiconductor device may fall resulting from use of an adhesive agent. Further, when manufacturing a semiconductor device, a semiconductor device in which a heat sink is fixed to a wiring board using an adhesive requires a step of applying the adhesive to the heat sink or the wiring board in the manufacturing process. The adhesive application process is difficult to automate, and the manufacturing cost of the semiconductor device increases.

そこで、上述のような問題を解決するために、配線基板に金属製の接合部を形成し、金属製の放熱板を接合部に対してレーザ溶接等を用いて溶着することにより、放熱板と回路基板とを接続する構成が提案されている(例えば、特許文献1参照。)。   Therefore, in order to solve the above-described problems, a metal joint is formed on the wiring board, and the metal heat sink is welded to the joint using laser welding or the like. The structure which connects a circuit board is proposed (for example, refer patent document 1).

上述のように放熱板と回路基板とが溶着により接続された半導体装置の断面図を図1に示す。図1に示す半導体装置は、大略すると半導体素子11、プリント配線基板12(回路基板)、ヒートスプレッダ13(放熱板)、封止樹脂14、及びはんだボール15等により構成される。ヒートスプレッダ13は中央に凹部が形成され、凹部内に半導体素子11が収容される。半導体素子11の背面はヒートスプレッダ13の凹部の底面にダイボンド材16により固定される。   FIG. 1 shows a cross-sectional view of the semiconductor device in which the heat sink and the circuit board are connected by welding as described above. The semiconductor device shown in FIG. 1 generally includes a semiconductor element 11, a printed wiring board 12 (circuit board), a heat spreader 13 (heat sink), a sealing resin 14, and solder balls 15. The heat spreader 13 has a recess in the center, and the semiconductor element 11 is accommodated in the recess. The back surface of the semiconductor element 11 is fixed to the bottom surface of the recess of the heat spreader 13 with a die bond material 16.

回路基板12の中央において、ヒートスプレッダ13の凹部に対応した位置に開口が設けられ半導体素子11の各電極は、ボンディングワイヤ17により、回路基板12の開口を通じて回路基板12に形成された導電層よりなるパターン配線18に電気的に接続されている。回路基板12は、ガラス−エポキシ等よりなるコア材19と、コア材19上に形成された導電層よりなるパターン配線18とにより構成される。また、回路基板12の両面には絶縁保護のためのレジスト層20,21が設けられる。   In the center of the circuit board 12, an opening is provided at a position corresponding to the recess of the heat spreader 13, and each electrode of the semiconductor element 11 is made of a conductive layer formed on the circuit board 12 through the opening of the circuit board 12 by a bonding wire 17. It is electrically connected to the pattern wiring 18. The circuit board 12 includes a core material 19 made of glass-epoxy or the like, and a pattern wiring 18 made of a conductive layer formed on the core material 19. Further, resist layers 20 and 21 for insulation protection are provided on both surfaces of the circuit board 12.

以上のような構成の半導体装置において、図2に示すように、回路基板12に溶接部22が形成され、この溶接部22に対してヒートスプレッダ13が、レーザ溶接により溶着されている。溶接部22は、コア材19のパターン配線18が形成される側とは反対側に形成されており、溶接部22の周囲はレジスト層20により覆われている。   In the semiconductor device having the above configuration, as shown in FIG. 2, the welded portion 22 is formed on the circuit board 12, and the heat spreader 13 is welded to the welded portion 22 by laser welding. The welded portion 22 is formed on the side opposite to the side on which the pattern wiring 18 of the core material 19 is formed, and the periphery of the welded portion 22 is covered with a resist layer 20.

図2において点線円Aで囲まれた部分を拡大した図を図3に示す。なお、図3に示す状態はヒートスプレッダ13が溶接部22に対して溶接される前の状態である。溶接部22の側面及び周囲部分はレジスト21により覆われ、レジスト21の開口により形成される間隙23を介して溶接部22の表面がヒートスプレッダ13の表面に対向している。この状態で、ヒートスプレッダ13側からレーザを照射することにより、ヒートスプレッダ13及び溶接部22の一部を溶接(溶着)する。溶接部22の周囲をレジスト21により覆う目的は、直径1.2mm程度の溶接部22がコア材19から剥離しないように固定するためである。   FIG. 3 is an enlarged view of a portion surrounded by a dotted circle A in FIG. The state shown in FIG. 3 is a state before the heat spreader 13 is welded to the welded portion 22. The side surface and the peripheral portion of the welded portion 22 are covered with a resist 21, and the surface of the welded portion 22 faces the surface of the heat spreader 13 through a gap 23 formed by the opening of the resist 21. In this state, the heat spreader 13 and a part of the welded portion 22 are welded (welded) by irradiating the laser from the heat spreader 13 side. The purpose of covering the periphery of the welded portion 22 with the resist 21 is to fix the welded portion 22 having a diameter of about 1.2 mm so as not to peel from the core material 19.

以上のような溶着方法によりヒートスプレッダ13を溶着した場合、ヒートスプレッダ13が金属の溶接により回路基板12に接続されるため、熱が伝わりやすく、ヒートスプレッダ13の放熱効果を向上することができる。また、ヒートスプレッダ13を金属の溶接により確実且つ強固に回路基板12に接続することができる。すなわち、接着剤により接続した場合にはヒートスプレッダ13と基板とが接着面にて剥離してしまうおそれがあるが、金属溶接により接続した場合には剥離するおそれはない。
特開2001−168244号公報(第4−9頁、第2図)
When the heat spreader 13 is welded by the above-described welding method, since the heat spreader 13 is connected to the circuit board 12 by metal welding, heat is easily transmitted, and the heat dissipation effect of the heat spreader 13 can be improved. Further, the heat spreader 13 can be reliably and firmly connected to the circuit board 12 by metal welding. That is, when connected by an adhesive, the heat spreader 13 and the substrate may be peeled at the bonding surface, but when connected by metal welding, there is no fear of peeling.
JP 2001-168244 A (page 4-9, FIG. 2)

上述のように、ヒートスプレッダ13と溶接部22とが、レーザ溶接でうまく接合されていれば、上述のように剥離のおそれはない。しかし、間隙23の寸法にばらつきがあると、レーザ溶接において不具合が生じるおそれがある。すなわち、レーザ溶接において照射すべきレーザの強度を決定する要因の一つは間隙23の寸法であり、間隙23の寸法が大きすぎると溶接部22までレーザのエネルギが十分届かずに溶着が不十分となるおそれがある。一方、間隙23が小さすぎると、溶接部22に印加されるレーザのエネルギが大きすぎて、溶接部22を貫通して下のコア部材19を損傷してしまうおそれがある。   As described above, if the heat spreader 13 and the welded portion 22 are well joined by laser welding, there is no fear of peeling as described above. However, if there are variations in the size of the gap 23, there is a risk that problems may occur in laser welding. That is, one of the factors that determine the intensity of the laser to be irradiated in laser welding is the size of the gap 23. If the size of the gap 23 is too large, the laser energy does not reach the welded portion 22 sufficiently and welding is insufficient. There is a risk of becoming. On the other hand, if the gap 23 is too small, the energy of the laser applied to the welded portion 22 is too large, and the lower core member 19 may be damaged by penetrating the welded portion 22.

間隙23の寸法は、溶接部22の周囲を被覆するレジスト21の厚みに相当するが、レジスト21の厚みを精度よく制御することは難しいため、間隙23の寸法にある程度ばらつきが生じることは避けられない。したがって、上述のようなレーザ溶接時の問題が発生するおそれがある。   The dimension of the gap 23 corresponds to the thickness of the resist 21 covering the periphery of the welded portion 22, but it is difficult to control the thickness of the resist 21 with high accuracy, and therefore it is unavoidable that the dimension of the gap 23 varies to some extent. Absent. Therefore, there is a possibility that the problem at the time of laser welding as described above may occur.

また、間隙23内の空気が溶接時に膨張し、ヒートスプレッダ13の表面が盛り上がるといった現象が発生するおそれがある。このような現象が発生すると、ヒートスプレッダ13のレーザ照射側表面が大きく膨らんでヒートスプレッダ13の表面に塊(通常、ナゲットと称する)が形成されるという問題が発生するおそれがある。   Further, there is a possibility that a phenomenon occurs in which the air in the gap 23 expands during welding and the surface of the heat spreader 13 rises. When such a phenomenon occurs, there is a possibility that the laser spread side surface of the heat spreader 13 swells greatly and a lump (usually called a nugget) is formed on the surface of the heat spreader 13.

本発明は上述の問題に鑑みなされたものであり、小さなエネルギのレーザでも安定して確実に放熱板を基板の溶接部に溶接することができる半導体装置を提供することを目的とする。   The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a semiconductor device that can stably and reliably weld a heat radiating plate to a welded portion of a substrate even with a small energy laser.

上述の目的を達成するために、本発明によれば、半導体素子と、該半導体素子が電気的に接続された回路基板と、該半導体素子に接合された金属製の放熱板とを有する半導体装置であって、前記回路基板は金属製の溶接部を有し、前記放熱板の前記溶接部に対向する面の反対側の面に凹部が形成され、前記放熱板は該凹部内で前記溶接部に対して溶接されていることを特徴とする半導体装置が提供される。上述の発明において、該放熱板の前記凹部はエッチングにより形成されることが好ましい。   In order to achieve the above object, according to the present invention, a semiconductor device having a semiconductor element, a circuit board to which the semiconductor element is electrically connected, and a metal heat sink joined to the semiconductor element. The circuit board has a welded portion made of metal, and a recess is formed on a surface opposite to the surface facing the welded portion of the heat sink, and the heat sink has the welded portion in the recess. A semiconductor device is provided which is welded to the semiconductor device. In the above-described invention, it is preferable that the concave portion of the heat sink is formed by etching.

また、本発明によれば、回路基板の溶接部に溶接される金属製の放熱板を備える半導体装置であって、前記溶接部に対向する面の反対側の面に凹部が形成され、前記溶接部に対向する面に突起部が形成された放熱板を備えることを特徴とする半導体装置が提供される。   According to the invention, there is provided a semiconductor device including a metal heat dissipating plate welded to a welded portion of a circuit board, wherein a recess is formed on a surface opposite to the surface facing the welded portion, and the welding is performed. There is provided a semiconductor device comprising a heat sink having a protrusion formed on a surface facing the portion.

また、本発明によれば、回路基板の溶接部に溶接された放熱板を備える半導体装置の製造方法であって、該回路基板をセット治具のフローティング部の上に載置し、且つ該放熱板を前記回路基板上に載置し、前記放熱板の上から溶接マスクを押圧して、該フローティング部と該溶接マスクとの間に前記回路基板と前記放熱板とを挟み込み、前記溶接マスクに設けられた貫通孔を通じてレーザを前記放熱板の所定の部位に照射して前記放熱板を前記回路基板の前記溶接部にレーザ溶接することを特徴とする半導体装置の製造方法が提供される。   According to the present invention, there is also provided a method for manufacturing a semiconductor device comprising a heat sink welded to a welded portion of a circuit board, the circuit board being placed on a floating portion of a set jig, and the heat dissipation. A plate is placed on the circuit board, a welding mask is pressed from above the heat radiating plate, the circuit board and the heat radiating plate are sandwiched between the floating portion and the welding mask, and the welding mask There is provided a method for manufacturing a semiconductor device, characterized in that a laser is irradiated to a predetermined portion of the heat radiating plate through a provided through-hole and the heat radiating plate is laser-welded to the welded portion of the circuit board.

さらに、本発明によれば、突起部が形成された放熱板を備える半導体装置の製造方法であって、該放熱板の突起部を設ける位置に対応した位置に圧入ピンを有する金型を準備し、前記放熱板の一方の面に前記圧入ピンを押圧して前記放熱板を変形させることにより、前記放熱板の他方の面に前記突起部を形成することを特徴とする半導体装置の製造方法が提供される。   Furthermore, according to the present invention, there is provided a method for manufacturing a semiconductor device including a heat sink having a protrusion formed thereon, wherein a mold having a press-fit pin is prepared at a position corresponding to a position where the protrusion of the heat sink is provided. A method of manufacturing a semiconductor device, wherein the protrusion is formed on the other surface of the heat radiating plate by deforming the heat radiating plate by pressing the press-fit pin on one surface of the heat radiating plate. Provided.

本発明によれば、放熱板の溶接する部分の厚みが小さくなるため、小さなエネルギのレーザでも安定して確実に放熱板を基板の溶接部に溶接することができる。また、放熱板の溶接部に対向する面に突起部を設けて突起部が溶接部に接触した状態でレーザ溶接を行なうことにより、より一層確実なレーザ溶接を行なうことができる。   According to the present invention, since the thickness of the welded portion of the heat sink is reduced, the heat sink can be stably and reliably welded to the welded portion of the substrate even with a small energy laser. Further, laser welding can be performed more reliably by providing a protrusion on the surface of the heat sink opposite to the weld and performing laser welding in a state where the protrusion is in contact with the weld.

次に本発明の実施の形態について図面を参照しながら説明する。   Next, embodiments of the present invention will be described with reference to the drawings.

まず、本発明の第1実施例による半導体装置について、図4及び図5を参照しながら説明する。図4は本発明の第1実施例による半導体装置に用いられるヒートスプレッダ及び回路基板の断面図である。図5は図4における点線円Bで囲まれた部分の拡大図である。なお、本発明の第1実施例による半導体装置において、ヒートスプレッダ以外の構成部品は図1に示す半導体装置の構成部品と同等であり、その図示及び説明は省略する。また、図4に示す状態は、ヒートスプレッダ30が溶接部22に対して溶接される前の状態である。   First, a semiconductor device according to a first embodiment of the present invention will be described with reference to FIGS. FIG. 4 is a cross-sectional view of a heat spreader and circuit board used in the semiconductor device according to the first embodiment of the present invention. FIG. 5 is an enlarged view of a portion surrounded by a dotted circle B in FIG. In the semiconductor device according to the first embodiment of the present invention, the components other than the heat spreader are the same as the components of the semiconductor device shown in FIG. 1, and illustration and description thereof are omitted. Further, the state shown in FIG. 4 is a state before the heat spreader 30 is welded to the welded portion 22.

図4に示すヒートスプレッダ30(放熱板)は、図1に示すヒートスプレッダ13の代わりに用いられる。ヒートスプレッダ30は銅板のような金属板により形成される。ヒートスプレッダ30の厚みは例えば0.25mmであり、図1に示すヒートスプレッダ13より大きな厚みとなっている。したがって、ヒートスプレッダ30の剛性はヒートスプレッダ13の剛性より大きくなっており、半導体装置として組立てる際にヒートスプレッダ30が変形したり撓んだりすることを抑制することができる。   A heat spreader 30 (heat radiating plate) shown in FIG. 4 is used instead of the heat spreader 13 shown in FIG. The heat spreader 30 is formed of a metal plate such as a copper plate. The thickness of the heat spreader 30 is, for example, 0.25 mm, which is larger than that of the heat spreader 13 shown in FIG. Therefore, the rigidity of the heat spreader 30 is larger than the rigidity of the heat spreader 13, and the heat spreader 30 can be prevented from being deformed or bent when assembled as a semiconductor device.

しかし、ヒートスプレッダ30の厚みを大きくすると、溶接あるいは溶着のためのレーザにはより大きなエネルギが必要となり、安定した溶接を得にくくなる。したがって、上述のように間隙23のバラツキに起因したレーザ溶接の不安定性にヒートスプレッダの厚みによる不安定性が加わり、確実なレーザ溶着を行なうことがより一層難しくなってしまう。   However, when the thickness of the heat spreader 30 is increased, more energy is required for the laser for welding or welding, making it difficult to obtain stable welding. Therefore, as described above, the instability due to the thickness of the heat spreader is added to the instability of laser welding due to the variation in the gap 23, and it becomes more difficult to perform reliable laser welding.

そこで、図4に示すヒートスプレッダ30では、ヒートスプレッダ30のレーザを照射する部分に凹部30aを設けている。すなわち、レーザ溶接される部分のヒートスプレッダ30の厚みを小さくして、小さなエネルギのレーザでも確実なレーザ溶接が行なえるようにしている。   Therefore, in the heat spreader 30 shown in FIG. 4, a recess 30 a is provided in the portion of the heat spreader 30 where the laser is irradiated. That is, the thickness of the heat spreader 30 at the portion to be laser-welded is reduced so that reliable laser welding can be performed even with a small energy laser.

ヒートスプレッダ30に設けられた凹部30aは、エッチングによりヒートスプレッダ30を部分的に取り除くことにより形成することが好ましい。例えば、0.25mm(250μm)の厚みのヒートスプレッダ30に対して、凹部30aの深さは0.1mm(100μm)程度とする。凹部30aは直径2mm程度の円形であることが好ましい。すなわち、回路基板12に設けられた溶接部22の直径が約1.2mmであれば、凹部30aの直径は溶接部22の直径より僅かに大きい程度でよい。   The recess 30a provided in the heat spreader 30 is preferably formed by partially removing the heat spreader 30 by etching. For example, with respect to the heat spreader 30 having a thickness of 0.25 mm (250 μm), the depth of the recess 30 a is about 0.1 mm (100 μm). The recess 30a is preferably circular with a diameter of about 2 mm. That is, if the diameter of the welded portion 22 provided on the circuit board 12 is about 1.2 mm, the diameter of the recessed portion 30 a may be slightly larger than the diameter of the welded portion 22.

凹部30aが形成された部分のヒートスプレッダ30の厚みは、0.15mm(150μm)程度となり、この程度の厚みであれば、比較的小さなエネルギのレーザを照射しても、安定して確実な溶接を行なうことができる。   The thickness of the heat spreader 30 in the portion where the recess 30a is formed is about 0.15 mm (150 μm). With this thickness, stable and reliable welding can be performed even when a relatively small energy laser is irradiated. Can be done.

なお、ヒートスプレッダ30及び溶接部22が銅で形成されている場合は、溶接部22の表面にはニッケル(Ni)めっきを施し、その上に金(Au)めっきを施すことが好ましい。また、ヒートスプレッダ30の溶接部22に対向する面には厚さ5μm程度のニッケル(Ni)めっきを施すことが好ましい。銅と銅とをレーザ溶接するのは難しいが、このようにニッケルめっきや金めっきを施すことで、銅製のヒートスプレッダを銅製の溶接部に容易にレーザ溶接することができる。   In addition, when the heat spreader 30 and the welding part 22 are formed with copper, it is preferable to give nickel (Ni) plating to the surface of the welding part 22, and to give gold (Au) plating on it. The surface of the heat spreader 30 facing the welded portion 22 is preferably plated with nickel (Ni) having a thickness of about 5 μm. Although it is difficult to laser weld copper and copper, by performing nickel plating or gold plating in this manner, a copper heat spreader can be easily laser welded to a copper weld.

次に、ヒートスプレッダ30と回路基板12とをレーザ溶接により接続する工程について、図6乃至図8を参照しながら説明する。図6は基板とヒートスプレッダとを治具上に配置する工程を示す図である。図7は基板とヒートスプレッダが治具上に配置された状態を示す図である。図8はレーザを照射してヒートスプレッダと基板の溶接部とを溶接する工程を示す図である。   Next, the process of connecting the heat spreader 30 and the circuit board 12 by laser welding will be described with reference to FIGS. FIG. 6 is a diagram showing a process of arranging the substrate and the heat spreader on the jig. FIG. 7 is a view showing a state in which the substrate and the heat spreader are arranged on the jig. FIG. 8 is a diagram showing a process of welding the heat spreader and the welded portion of the substrate by irradiating a laser.

まず、図6に示すように、溶接部22が形成された回路基板12を、溶接部22が露出した面を上に向けてセット治具40の上に配置し、次に凹部30aを上に向けた状態でヒートスプレッダ30を回路基板12の上に配置する。セット治具40は、回路基板12が載置される部分にフローティング部41を有しており、フローティング部41は底部がスプリング42により支持されて、上下に移動可能である。フローティング部41をセット治具40に設けることにより、レーザ溶接工程において後述するようにヒートスプレッダ30を回路基板12に対して均一に押し付けることができる。   First, as shown in FIG. 6, the circuit board 12 on which the welded portion 22 is formed is placed on the setting jig 40 with the surface where the welded portion 22 is exposed facing upward, and then the concave portion 30a is raised upward. The heat spreader 30 is placed on the circuit board 12 in the state of being directed. The setting jig 40 has a floating portion 41 at a portion where the circuit board 12 is placed. The bottom of the floating portion 41 is supported by a spring 42 and can move up and down. By providing the floating portion 41 on the setting jig 40, the heat spreader 30 can be uniformly pressed against the circuit board 12 as described later in the laser welding process.

回路基板12をセット治具40のフローティング部41の上に載置した後、ヒートスプレッダ30を回路基板12の上に載置する。この際、回路基板12の溶接部22とヒートスプレッダ30の凹部30aとが垂直方向に整列するように、ヒートスプレッダ30を回路基板12に対して位置決めする。回路基板12とヒートスプレッダ30とがセット治具に載置された状態が図7に示されている。   After placing the circuit board 12 on the floating portion 41 of the setting jig 40, the heat spreader 30 is placed on the circuit board 12. At this time, the heat spreader 30 is positioned with respect to the circuit board 12 so that the welded portion 22 of the circuit board 12 and the recess 30a of the heat spreader 30 are aligned in the vertical direction. FIG. 7 shows a state where the circuit board 12 and the heat spreader 30 are placed on the setting jig.

次に、図8に示すように、溶接マスク43をヒートスプレッダ30の上から押し付けてヒートスプレッダ30と回路基板12とをセット治具40に対して押圧する。溶接マスク43は中央に凹部43aを有しており、ヒートスプレッダ30の中央の凹部を形成する部分(反対側から見ると凸部となる)は溶接マスク43の凹部43aに収容される。また、溶接マスクは、ヒートスプレッダ30の凹部30aに対応する位置に溶接用貫通孔43bを有する。   Next, as shown in FIG. 8, the welding mask 43 is pressed from above the heat spreader 30 to press the heat spreader 30 and the circuit board 12 against the setting jig 40. The welding mask 43 has a concave portion 43 a at the center, and a portion forming a concave portion at the center of the heat spreader 30 (a convex portion when viewed from the opposite side) is accommodated in the concave portion 43 a of the welding mask 43. Further, the welding mask has a welding through-hole 43 b at a position corresponding to the recess 30 a of the heat spreader 30.

溶接マスク43をヒートスプレッダ30上に配置した後、溶接マスク43によりヒートスプレッダ30を回路基板12に対して押圧しながら、溶接用貫通孔43bを通じてレーザビームをヒートスプレッダ30の凹部30a内に順次照射する。照射されたレーザビームにより凹部30aの底部及び回路基板12の溶接部22が融解して直ちに固化し、レーザ溶接が行なわれる。   After the welding mask 43 is disposed on the heat spreader 30, the laser beam is sequentially irradiated into the recesses 30 a of the heat spreader 30 through the welding through holes 43 b while pressing the heat spreader 30 against the circuit board 12 by the welding mask 43. The bottom of the recess 30a and the welded portion 22 of the circuit board 12 are melted and solidified immediately by the irradiated laser beam, and laser welding is performed.

この際、回路基板12は上下移動可能なフローティング部41上に載置されているため、溶接マスク43が僅かに傾いていた場合や、回路基板12の厚みが一様でなかった場合でも、フローティング部41が傾くことで、ヒートスプレッダ30を全体的に均一な押圧力で回路基板12に押圧することができる。   At this time, since the circuit board 12 is placed on the floating portion 41 that can move up and down, even if the welding mask 43 is slightly inclined or the thickness of the circuit board 12 is not uniform, the circuit board 12 is floated. By tilting the portion 41, the heat spreader 30 can be pressed against the circuit board 12 with a uniform pressing force as a whole.

以上のように、ヒートスプレッダ30の溶接する部分に凹部30aを設けることにより、ヒートスプレッダ30の厚みを大きくしても、小さなエネルギのレーザで確実にレーザ溶接を行なうことができる。   As described above, by providing the recess 30a in the welded portion of the heat spreader 30, even if the thickness of the heat spreader 30 is increased, laser welding can be reliably performed with a small energy laser.

次に本発明の第2実施例について、図9及び図10を参照しながら説明する。図9は本発明の第2実施例による半導体装置に用いられるヒートスプレッダ及び回路基板の断面図である。図10は図4における点線円Cで囲まれた部分の拡大図である。なお、本発明の第2実施例による半導体装置において、ヒートスプレッダ以外の構成部品は図1に示す半導体装置の構成部品と同等であり、その図示及び説明は省略する。また、図10に示す状態は、ヒートスプレッダ50が溶接部22に対して溶接される前の状態である。   Next, a second embodiment of the present invention will be described with reference to FIGS. FIG. 9 is a cross-sectional view of a heat spreader and circuit board used in the semiconductor device according to the second embodiment of the present invention. FIG. 10 is an enlarged view of a portion surrounded by a dotted circle C in FIG. In the semiconductor device according to the second embodiment of the present invention, the components other than the heat spreader are the same as those of the semiconductor device shown in FIG. The state shown in FIG. 10 is a state before the heat spreader 50 is welded to the welded portion 22.

図9に示すヒートスプレッダ50は、図4に示すヒートスップレッダ30と同様に、レーザが照射される部分に凹部50aを有する。ヒートスプレッダ50の各部寸法は、ヒートスプレッダ30と同様であり、その説明は省略する。ヒートスップレッダ50とヒートスプレッダ30との相違点は、ヒートスプレッダ50に突起部50bが形成されていることである。   The heat spreader 50 shown in FIG. 9 has a recess 50a in a portion irradiated with a laser, like the heat spreader 30 shown in FIG. The dimensions of each part of the heat spreader 50 are the same as those of the heat spreader 30, and a description thereof will be omitted. The difference between the heat spreader 50 and the heat spreader 30 is that a protrusion 50 b is formed on the heat spreader 50.

突起部50bは凹部50aが形成された部分の反対側に突出するように形成されている。したがって、レーザ溶接を行なうためにヒートスプレッダ50が回路基板12上に載置された際に、突起部50bは回路基板12の溶接部22が露出した間隙23内に配置される。突起部50bの突出寸法は、レーザ溶接する際に突起部50bの先端部が溶接部22に接触しているように、例えば、30μm〜50μm程度である。すなわち、溶接部22の周囲を覆うレジスト21の厚みが30μm〜50μm程度であるため、突起部50bの突出寸法を30μm〜50μmとすれば、突起部50bの先端を確実に溶接部22に接触させることができる。ただし、上記寸法は、レジスト21により画成される間隙23の寸法により変化するものであり、具体的に示された寸法に限られるものではない。   The protrusion 50b is formed so as to protrude to the opposite side of the portion where the recess 50a is formed. Therefore, when the heat spreader 50 is placed on the circuit board 12 for laser welding, the protrusion 50b is disposed in the gap 23 where the welded portion 22 of the circuit board 12 is exposed. The protrusion dimension of the protrusion 50b is, for example, about 30 μm to 50 μm so that the tip of the protrusion 50b is in contact with the weld 22 when laser welding is performed. That is, since the thickness of the resist 21 covering the periphery of the welded portion 22 is about 30 μm to 50 μm, if the protruding dimension of the protruding portion 50 b is set to 30 μm to 50 μm, the tip of the protruding portion 50 b is reliably brought into contact with the welded portion 22. be able to. However, the above dimensions vary depending on the dimension of the gap 23 defined by the resist 21, and are not limited to the specifically shown dimensions.

上述のように、突起部50bが溶接部22に接触した状態でレーザ溶接を行なうことにより、確実にレーザ溶接を行なうことができ、レーザ溶接不良率を大きく低減することができる。レーザ溶接が確実になる理由として、突起部50bが直接溶接部22に接触することで突起部50bを介してレーザエネルギが溶接部22に伝わり易くなることが考えられる。   As described above, by performing laser welding in a state where the protrusion 50b is in contact with the welded portion 22, laser welding can be reliably performed, and the laser welding defect rate can be greatly reduced. As a reason why laser welding is ensured, it is conceivable that the laser energy is easily transmitted to the welded portion 22 through the protruding portion 50b when the protruding portion 50b directly contacts the welded portion 22.

次に、上述の突起部50bのような小さな突起をヒートスプレッダ50のような金属板に形成する方法の一例について、図11及び図12を参照しながら説明する。図11は金属板に突起部を形成する工程を説明するための図であり、図12は図11において形成された突起部の近傍を拡大して示す断面図である。   Next, an example of a method for forming small protrusions such as the above-described protrusions 50b on a metal plate such as the heat spreader 50 will be described with reference to FIGS. FIG. 11 is a diagram for explaining a process of forming the protrusion on the metal plate, and FIG. 12 is an enlarged cross-sectional view showing the vicinity of the protrusion formed in FIG.

図11に示す突起部形成方法は、金型プレスにより金属板を変形させて突起部を形成する方法である。図11(a)において、突起部54aが形成される金属板54(ヒートスプレッダに相当する)は、下金型51のテーブル51a上に載置される。テーブル51aには、突起部54aが形成される部分に対応した位置に凹部51bが形成されている。下金型の上方には、上金型52が下金型51に対して移動可能に設けられる。   The protrusion forming method shown in FIG. 11 is a method of forming a protrusion by deforming a metal plate with a die press. In FIG. 11A, a metal plate 54 (corresponding to a heat spreader) on which the protrusion 54 a is formed is placed on the table 51 a of the lower mold 51. In the table 51a, a recess 51b is formed at a position corresponding to a portion where the protrusion 54a is formed. An upper mold 52 is provided above the lower mold so as to be movable with respect to the lower mold 51.

上金型52は、金型が閉じられた際に下金型51のベース51cに当接する脚部52bが設けられる。脚部52bは上金型52のベース52aに対してシム52cを介して取り付けられ、シム52cの厚みを調節することにより、ベース52aから脚部52bの先端までの距離を調節することができる。   The upper mold 52 is provided with leg portions 52b that come into contact with the base 51c of the lower mold 51 when the mold is closed. The leg 52b is attached to the base 52a of the upper mold 52 via a shim 52c, and the distance from the base 52a to the tip of the leg 52b can be adjusted by adjusting the thickness of the shim 52c.

上金型52のベース52aの面で、下金型51のテーブル51aに対向する面には、圧入ピン52dが取り付けられている。圧入ピン52dは、金属板54の突起部54aを形成する位置に対応して設けられる。したがって、上金型52の圧入ピン52dは、下金型51の凹部51bと垂直方向に整列した状態で配置される。   A press-fit pin 52 d is attached to the surface of the base 52 a of the upper mold 52 that faces the table 51 a of the lower mold 51. The press-fit pins 52d are provided corresponding to positions where the protrusions 54a of the metal plate 54 are formed. Accordingly, the press-fit pin 52d of the upper mold 52 is arranged in a state of being aligned in the vertical direction with the concave portion 51b of the lower mold 51.

下金型51のテーブル51a上の所定の位置に金属板54が配置された後、図11(b)に示すように、上金型52を下金型51に向かって移動して金型を閉じる。したがって、金属板54は、上金型52のベース52aと下金型51のテーブル51aとの間に挟まれる状態となり、圧入ピン52dは金属板54に食い込むように圧入される。この圧入ピン52dの圧入により、金属板54は図12に示すように変形し、変形した部分が突起部54aとして形成される。   After the metal plate 54 is arranged at a predetermined position on the table 51a of the lower mold 51, the upper mold 52 is moved toward the lower mold 51 as shown in FIG. close up. Accordingly, the metal plate 54 is sandwiched between the base 52 a of the upper mold 52 and the table 51 a of the lower mold 51, and the press-fit pins 52 d are press-fitted so as to bite into the metal plate 54. By press-fitting the press-fit pin 52d, the metal plate 54 is deformed as shown in FIG. 12, and the deformed portion is formed as a protrusion 54a.

以上のような金型プレスによる突起部の形成方法を用いれば、上述の実施例におけるヒートスプレッダに突起部を容易に精度よく形成することができる。   By using the method for forming the protrusions by the above die press, the protrusions can be easily and accurately formed on the heat spreader in the above-described embodiment.

放熱板と回路基板とが溶接により接続された半導体装置の断面図である。It is sectional drawing of the semiconductor device with which the heat sink and the circuit board were connected by welding. 図1に示す放熱板と回路基板とを示す断面図である。It is sectional drawing which shows the heat sink and circuit board shown in FIG. 図2において点線円Aで囲まれた部分を拡大して示す断面図である。FIG. 3 is an enlarged cross-sectional view of a portion surrounded by a dotted circle A in FIG. 2. 本発明の第1実施例による半導体装置に用いられるヒートスプレッダ及び回路基板の断面図である。It is sectional drawing of the heat spreader and circuit board which are used for the semiconductor device by 1st Example of this invention. 図4における点線円Bで囲まれた部分を拡大して示す断面図である。It is sectional drawing which expands and shows the part enclosed by the dotted-line circle B in FIG. 基板とヒートスプレッダとを治具上に配置する工程を示す図である。It is a figure which shows the process of arrange | positioning a board | substrate and a heat spreader on a jig | tool. 基板とヒートスプレッダが治具上に配置された状態を示す図である。It is a figure which shows the state by which the board | substrate and the heat spreader are arrange | positioned on the jig | tool. レーザを照射してヒートスプレッダと基板の溶接部とを溶接する工程を示す図である。It is a figure which shows the process of irradiating a laser and welding the heat spreader and the welding part of a board | substrate. 本発明の第2実施例による半導体装置に用いられるヒートスプレッダ及び回路基板の断面図である。It is sectional drawing of the heat spreader and circuit board which are used for the semiconductor device by 2nd Example of this invention. 図9における点線円Cで囲まれた部分を拡大して示す断面図である。It is sectional drawing which expands and shows the part enclosed by the dotted line circle C in FIG. 図9示す突起部を形成する工程を説明するための図である。It is a figure for demonstrating the process of forming the projection part shown in FIG. 図11において形成された突起部の近傍を拡大して示す断面図である。It is sectional drawing which expands and shows the vicinity of the projection part formed in FIG.

符号の説明Explanation of symbols

11 半導体素子
12 基板
13 ヒートスプレッダ
14 封止樹脂
15 はんだボール
16 ダイ付け材
17 ボンディングワイヤ
18 パターン配線
19 コア材
20,21 レジスト
22 溶接部
23 空隙
30,50 ヒートスプレッダ
30a,50a 凹部
40 セット治具
41 フローティング部
42 スプリング
43 溶接マスク
43a 凹部
43b 溶接用貫通孔
50b 突起部
51 下金型
51a テーブル
51b 凹部
51c ベース
52 上金型
52a ベース
52b 脚部
52c シム
52d 圧入ピン
54 金属板
54a 突起部
DESCRIPTION OF SYMBOLS 11 Semiconductor element 12 Board | substrate 13 Heat spreader 14 Sealing resin 15 Solder ball 16 Die attachment material 17 Bonding wire 18 Pattern wiring 19 Core material 20,21 Resist 22 Welding part 23 Space | gap 30,50 Heat spreader 30a, 50a Concave 40 Set jig 41 Floating Part 42 Spring 43 Welding mask 43a Concave part 43b Welding through hole 50b Protrusion part 51 Lower mold 51a Table 51b Concave part 51c Base 52 Upper mold 52a Base 52b Leg part 52c Shim 52d Press-fit pin 54 Metal plate 54a Protrusion part

Claims (5)

半導体素子と、該半導体素子が電気的に接続された回路基板と、該半導体素子に接合された金属製の放熱板とを有する半導体装置であって、
前記回路基板は金属製の溶接部を有し、前記放熱板の前記溶接部に対向する面の反対側の面に凹部が形成され、前記放熱板は該凹部内で前記溶接部に対して溶接されていることを特徴とする半導体装置。
A semiconductor device having a semiconductor element, a circuit board to which the semiconductor element is electrically connected, and a metal heat sink joined to the semiconductor element,
The circuit board has a welded portion made of metal, and a recess is formed on a surface of the heat sink opposite to the surface facing the weld, and the heat sink is welded to the weld in the recess. A semiconductor device which is characterized by being made.
請求項1記載の半導体装置であって、
該放熱板の前記凹部はエッチングにより形成されることを特徴とする半導体装置。
The semiconductor device according to claim 1,
The semiconductor device, wherein the recess of the heat sink is formed by etching.
回路基板の溶接部に溶接される金属製の放熱板を備える半導体装置であって、
前記溶接部に対向する面の反対側の面に凹部が形成され、前記溶接部に対向する面に突起部が形成された放熱板を備えることを特徴とする半導体装置。
A semiconductor device comprising a metal heat sink welded to a welded portion of a circuit board,
A semiconductor device comprising: a heat sink having a recess formed on a surface opposite to a surface facing the welded portion and a protrusion formed on a surface facing the welded portion.
回路基板の溶接部に溶接された放熱板を備える半導体装置の製造方法であって、
該回路基板をセット治具のフローティング部の上に載置し、且つ該放熱板を前記回路基板上に載置し、
前記放熱板の上から溶接マスクを押圧して、該フローティング部と該溶接マスクとの間に前記回路基板と前記放熱板とを挟み込み、
前記溶接マスクに設けられた貫通孔を通じてレーザを前記放熱板の所定の部位に照射して前記放熱板を前記回路基板の前記溶接部にレーザ溶接する
ことを特徴とする半導体装置の製造方法。
A method for manufacturing a semiconductor device comprising a heat sink welded to a welded portion of a circuit board,
Placing the circuit board on a floating portion of a setting jig, and placing the heat sink on the circuit board;
Pressing the welding mask from above the heat sink, sandwiching the circuit board and the heat sink between the floating part and the welding mask,
A method of manufacturing a semiconductor device, comprising: irradiating a predetermined portion of the heat radiating plate with a laser through a through hole provided in the welding mask to laser-weld the heat radiating plate to the welding portion of the circuit board.
突起部が形成された放熱板を備える半導体装置の製造方法であって、
該放熱板の突起部を設ける位置に対応した位置に圧入ピンを有する金型を準備し、
前記放熱板の一方の面に前記圧入ピンを押圧して前記放熱板を変形させることにより、前記放熱板の他方の面に前記突起部を形成する
ことを特徴とする半導体装置の製造方法。
A method of manufacturing a semiconductor device including a heat sink having protrusions formed thereon,
Prepare a mold having a press-fit pin at a position corresponding to the position where the protrusion of the heat sink is provided,
A method of manufacturing a semiconductor device, wherein the protrusion is formed on the other surface of the heat radiating plate by deforming the heat radiating plate by pressing the press-fit pin on one surface of the heat radiating plate.
JP2003340642A 2003-09-30 2003-09-30 Manufacturing method of semiconductor device Expired - Fee Related JP4160889B2 (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007149978A (en) * 2005-11-28 2007-06-14 Miyachi Technos Corp Semiconductor laser package device, and method of manufacturing same
JP2007165690A (en) * 2005-12-15 2007-06-28 Fuji Electric Holdings Co Ltd Method for joining heat spreader and metal plate
JP2008066561A (en) * 2006-09-08 2008-03-21 Fuji Electric Holdings Co Ltd Method of manufacturing semiconductor device
US20140203420A1 (en) * 2011-09-15 2014-07-24 Fuji Electric Co., Ltd. Method for producing semiconductor device, and semiconductor device produced using production method
CN104781940A (en) * 2012-10-30 2015-07-15 欧司朗有限公司 Method for producing an LED module comprising a heat sink
JPWO2014034411A1 (en) * 2012-08-27 2016-08-08 三菱電機株式会社 Power semiconductor device

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007149978A (en) * 2005-11-28 2007-06-14 Miyachi Technos Corp Semiconductor laser package device, and method of manufacturing same
JP2007165690A (en) * 2005-12-15 2007-06-28 Fuji Electric Holdings Co Ltd Method for joining heat spreader and metal plate
JP2008066561A (en) * 2006-09-08 2008-03-21 Fuji Electric Holdings Co Ltd Method of manufacturing semiconductor device
US20140203420A1 (en) * 2011-09-15 2014-07-24 Fuji Electric Co., Ltd. Method for producing semiconductor device, and semiconductor device produced using production method
US9468993B2 (en) 2011-09-15 2016-10-18 Fuji Electric Co., Ltd. Method for producing semiconductor device
JPWO2014034411A1 (en) * 2012-08-27 2016-08-08 三菱電機株式会社 Power semiconductor device
CN104781940A (en) * 2012-10-30 2015-07-15 欧司朗有限公司 Method for producing an LED module comprising a heat sink

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