JP2005103505A - Method for manufacturing magnesium metallic material having photocatalytically active surface - Google Patents
Method for manufacturing magnesium metallic material having photocatalytically active surface Download PDFInfo
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- JP2005103505A JP2005103505A JP2003343953A JP2003343953A JP2005103505A JP 2005103505 A JP2005103505 A JP 2005103505A JP 2003343953 A JP2003343953 A JP 2003343953A JP 2003343953 A JP2003343953 A JP 2003343953A JP 2005103505 A JP2005103505 A JP 2005103505A
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- 239000011777 magnesium Substances 0.000 title claims abstract description 14
- 229910052749 magnesium Inorganic materials 0.000 title claims abstract description 13
- 238000000034 method Methods 0.000 title claims description 47
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 title claims description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000007769 metal material Substances 0.000 title abstract description 16
- 239000011941 photocatalyst Substances 0.000 claims abstract description 34
- 239000000463 material Substances 0.000 claims abstract description 25
- 239000011148 porous material Substances 0.000 claims abstract description 22
- 229910000861 Mg alloy Inorganic materials 0.000 claims abstract description 13
- 238000007743 anodising Methods 0.000 claims abstract description 10
- 239000010407 anodic oxide Substances 0.000 claims description 11
- 238000005470 impregnation Methods 0.000 claims description 11
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 9
- -1 salts Chemical class 0.000 claims description 8
- 238000007654 immersion Methods 0.000 claims description 7
- 239000003381 stabilizer Substances 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 7
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 7
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 150000002894 organic compounds Chemical class 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 5
- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 claims description 4
- 238000005530 etching Methods 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 4
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 claims description 3
- 239000003513 alkali Substances 0.000 claims description 3
- 229910001860 alkaline earth metal hydroxide Inorganic materials 0.000 claims description 3
- 150000002484 inorganic compounds Chemical class 0.000 claims description 3
- 229910010272 inorganic material Inorganic materials 0.000 claims description 3
- 230000003647 oxidation Effects 0.000 claims description 3
- 238000007254 oxidation reaction Methods 0.000 claims description 3
- 125000003158 alcohol group Chemical group 0.000 claims description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 2
- 238000001962 electrophoresis Methods 0.000 claims description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 claims description 2
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 claims description 2
- 239000000347 magnesium hydroxide Substances 0.000 claims description 2
- 229910001862 magnesium hydroxide Inorganic materials 0.000 claims description 2
- 239000000395 magnesium oxide Substances 0.000 claims description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 2
- 238000009996 mechanical pre-treatment Methods 0.000 claims description 2
- 239000011707 mineral Chemical class 0.000 claims description 2
- 238000003980 solgel method Methods 0.000 claims description 2
- 125000001174 sulfone group Chemical group 0.000 claims description 2
- 230000005284 excitation Effects 0.000 claims 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims 1
- 238000010028 chemical finishing Methods 0.000 claims 1
- 238000004140 cleaning Methods 0.000 claims 1
- 238000004040 coloring Methods 0.000 claims 1
- 239000002131 composite material Substances 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 238000005868 electrolysis reaction Methods 0.000 claims 1
- 239000000835 fiber Substances 0.000 claims 1
- 229910001385 heavy metal Inorganic materials 0.000 claims 1
- 239000001023 inorganic pigment Substances 0.000 claims 1
- 239000010970 precious metal Substances 0.000 claims 1
- 238000006748 scratching Methods 0.000 claims 1
- 230000002393 scratching effect Effects 0.000 claims 1
- 239000004408 titanium dioxide Substances 0.000 claims 1
- 230000001699 photocatalysis Effects 0.000 abstract description 6
- 239000000956 alloy Substances 0.000 abstract description 4
- 238000000151 deposition Methods 0.000 abstract 1
- 239000002932 luster Substances 0.000 abstract 1
- 150000002680 magnesium Chemical class 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 9
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 8
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 6
- 230000009931 harmful effect Effects 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 230000000844 anti-bacterial effect Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000008151 electrolyte solution Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 2
- 238000002048 anodisation reaction Methods 0.000 description 2
- 230000003373 anti-fouling effect Effects 0.000 description 2
- 230000000843 anti-fungal effect Effects 0.000 description 2
- 229940121375 antifungal agent Drugs 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 238000004332 deodorization Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000003100 immobilizing effect Effects 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 2
- 235000011118 potassium hydroxide Nutrition 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- APLNAFMUEHKRLM-UHFFFAOYSA-N 2-[5-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-1,3,4-oxadiazol-2-yl]-1-(3,4,6,7-tetrahydroimidazo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1=NN=C(O1)CC(=O)N1CC2=C(CC1)N=CN2 APLNAFMUEHKRLM-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical compound SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 1
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 1
- 229910017855 NH 4 F Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910004283 SiO 4 Inorganic materials 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- PGTXKIZLOWULDJ-UHFFFAOYSA-N [Mg].[Zn] Chemical compound [Mg].[Zn] PGTXKIZLOWULDJ-UHFFFAOYSA-N 0.000 description 1
- UQCVYEFSQYEJOJ-UHFFFAOYSA-N [Mg].[Zn].[Zr] Chemical compound [Mg].[Zn].[Zr] UQCVYEFSQYEJOJ-UHFFFAOYSA-N 0.000 description 1
- XVYHFPMIBWTTLH-UHFFFAOYSA-N [Zn].[Mg].[Ca] Chemical compound [Zn].[Mg].[Ca] XVYHFPMIBWTTLH-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- SNAAJJQQZSMGQD-UHFFFAOYSA-N aluminum magnesium Chemical compound [Mg].[Al] SNAAJJQQZSMGQD-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- RQPZNWPYLFFXCP-UHFFFAOYSA-L barium dihydroxide Chemical compound [OH-].[OH-].[Ba+2] RQPZNWPYLFFXCP-UHFFFAOYSA-L 0.000 description 1
- 229910001863 barium hydroxide Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- NKWPZUCBCARRDP-UHFFFAOYSA-L calcium bicarbonate Chemical compound [Ca+2].OC([O-])=O.OC([O-])=O NKWPZUCBCARRDP-UHFFFAOYSA-L 0.000 description 1
- 229910000020 calcium bicarbonate Inorganic materials 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000001877 deodorizing effect Effects 0.000 description 1
- 238000004512 die casting Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 229940104869 fluorosilicate Drugs 0.000 description 1
- 238000005242 forging Methods 0.000 description 1
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000002370 magnesium bicarbonate Substances 0.000 description 1
- 235000014824 magnesium bicarbonate Nutrition 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000033116 oxidation-reduction process Effects 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 238000007146 photocatalysis Methods 0.000 description 1
- 230000001443 photoexcitation Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical class O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000009716 squeeze casting Methods 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
- 238000004659 sterilization and disinfection Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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Abstract
Description
本発明は、浄水、脱臭、殺菌、油汚れ防止、有害ガスの分解等、広範囲な用途に用いられる、光触媒活性表面を有するマグネシウム系金属材料及びその製法に関するものである。 The present invention relates to a magnesium-based metal material having a photocatalytically active surface and a method for producing the same, which are used in a wide range of applications such as water purification, deodorization, sterilization, oil stain prevention, and decomposition of harmful gases.
半導体にそのバンドギャップ以上のエネルギーを有する波長の光を照射すると光励起により価電子帯での正孔生成と伝導体への電子移動によってこれらに接触する有機物等を酸化還元反応で分解してしまういわゆる光触媒については良く知られている。 When a semiconductor is irradiated with light having a wavelength greater than its band gap, the organic matter that contacts these is decomposed by redox reaction due to the generation of holes in the valence band and the transfer of electrons to the conductor by photoexcitation. Photocatalysts are well known.
しかしながら、光触媒を基材表面に固定化することが困難であるため光触媒活性表面を持つ各種材料の開発が遅れている。これは光触媒が励起されたときに生ずる酸化還元能力は大変強力で殆どの有機物を分解するので光触媒を基材表面に固定化するためのバインダーとして有機物を用いることが出来ないためである。また前述の光触媒効果を生じさせるためには紫外光などが触媒体に照射されることと、被処理物質と触媒体との直接接触が必要であることからバインダーは透明で且つ多孔質である事が必要である。このため光触媒の基材への固定化には主にシリケート類などの無機バインダーが用いられてきた。 However, since it is difficult to fix the photocatalyst to the substrate surface, development of various materials having a photocatalytic active surface is delayed. This is because the redox ability generated when the photocatalyst is excited is very strong and decomposes most organic substances, so that the organic substances cannot be used as a binder for fixing the photocatalyst to the substrate surface. In order to produce the above-mentioned photocatalytic effect, the binder must be transparent and porous because it is necessary to irradiate the catalyst body with ultraviolet light or the like and to make direct contact between the material to be treated and the catalyst body. is required. For this reason, inorganic binders such as silicates have been mainly used for immobilizing photocatalysts on substrates.
例えば特許文献1に基材表面への光触媒固定化法が提案されているが、この時用いられているバインダーはシリケート類である。しかしながら、シリケートバインダーは厚膜化するとひび割れが生じるので衝撃を受けると基材から剥離してしまう欠点があり、厚膜化によって光触媒付与量を多くすることが困難である。光触媒はこれと接触した有機物のみを酸化還元分解するのでその付与量が少ない場合は必然的に油汚れや有害ガスの分解能力も小さいために、実用上の点から、適度に荒れている立体的構造に粗面化された基材に光触媒を多量に表面に付着させる方法の開発が望まれていた。
又、従来の光触媒の場合、複雑形状については、例えばゼオライトを原料とした時、粉末にして型で固形化するか、粉末の状態で表面に付着させるか又は粉末を閉鎖領域に閉じ込めるかの方法であり、前者では多量の原料を使用した割には触媒効果が小さく、また表面付着では不十分な量しか固定化できなかった。 In the case of conventional photocatalysts, for complex shapes, for example, when zeolite is used as a raw material, the powder is solidified in a mold, adhered to the surface in the form of a powder, or the powder is confined in a closed region In the former, the catalytic effect was small even when a large amount of raw material was used, and only an insufficient amount could be fixed by surface adhesion.
本発明は従来技術では光触媒の基材表面への固定化付着量が少ない欠点を解決するために提案されたものであって、有害物質の分解性能が大きい光触媒体の提供を目的とする。 The present invention has been proposed in order to solve the disadvantage that the photocatalyst is immobilized on the substrate surface in a small amount in the prior art, and an object of the present invention is to provide a photocatalyst having a high ability to decompose harmful substances.
本発明は、マグネシウムまたはマグネシウム合金の表面に平均孔径が50〜1000nmである微細孔を多数有する多孔質ノン火花放電型陽極酸化皮膜を形成し、該多孔質皮膜の微細孔内部及び金属表面に光触媒を担持固定化したことを特徴とする光触媒活性表面を有するマグネシウム金属材料及びその製造法である。 The present invention forms a porous non-spark discharge type anodic oxide film having a large number of fine pores having an average pore diameter of 50 to 1000 nm on the surface of magnesium or a magnesium alloy, and a photocatalyst inside the fine pores of the porous film and on the metal surface Is a magnesium metal material having a photocatalytically active surface, and a method for producing the same.
本発明のマグネシウム金属材料の表面にはノン火花放電型の陽極酸化によって平均孔径が50〜1000nmの微細孔が多数存在する多孔質陽極酸化皮膜が存在する。この皮膜は表面からマグネシウム素地に向かって規則正しい六角柱又は円柱状で、バリヤー層まで達している。 On the surface of the magnesium metal material of the present invention, there is a porous anodic oxide film having many fine pores having an average pore diameter of 50 to 1000 nm by non-spark discharge type anodic oxidation. This film has a regular hexagonal column or columnar shape from the surface toward the magnesium substrate and reaches the barrier layer.
この様な細孔は火花放電を伴わない条件下で陽極酸化皮膜を施すことによって表面に多数形成させることが出来る。この多孔質ノン火花放電型陽極酸化皮膜の厚さは3〜50μmの範囲でかなり自由に設定することが可能で、従って細孔部分に充填する光触媒の量も必要に応じてかなりの自由度をもって変えることができる。 Many such pores can be formed on the surface by applying an anodized film under conditions that do not involve spark discharge. The thickness of the porous non-spark discharge type anodic oxide film can be set freely in the range of 3 to 50 μm. Therefore, the amount of the photocatalyst filled in the pores has a considerable degree of freedom as required. Can be changed.
本発明の金属材料表面に陽極酸化によって形成される細孔は、主に孔、壁、無孔層の3層構造で、皮膜の主成分が水酸化マグネシウム60%以上と酸化マグネシウム0〜40%以下の組成で成り立っている。これら細孔は、表面に開口部を有し、平均孔径が50〜1000nmの大きさを有し、且つ、皮膜全体の80%以上を占めているため、光触媒として10乃至500nm程度の粒径を持つ例えば酸化チタンを使用した場合にこの微細孔内部及び表面に充填又は付着させることは容易である。この様な粒径の酸化チタンとして石原産業(株)などから市販されているSTシリーズの粉体あるいはSTSシリーズの分散体などがある。金属材料表面に形成されている細孔の数は1平方ミリメートルあたり少なくとも100個以上、通常1万個以上存在しているので基材表面全体に均一に光触媒を担持固定化することが出来る。
The pores formed by anodic oxidation on the surface of the metal material of the present invention mainly have a three-layer structure of pores, walls, and non-porous layers. The main components of the film are
本発明においてマグネシウム金属材料表面に特定の微細孔を有する皮膜を形成するには、該金属材料をアルカリまたはアルカリ土類金属の水酸化物、炭酸塩、重炭酸塩、ケイ酸塩もしくはケイフッ化塩の1種以上を0.2〜7モル/リットル、皮膜形成安定剤(表面硬化性添加剤)を0.01〜5モル/リットルの割合で含む水溶液中で電流密度0.5〜5A/デシ平方メートル、電圧2〜25Vで火花放電を伴わずに陽極酸化処理することによって達成される。 In the present invention, in order to form a film having specific fine pores on the surface of the magnesium metal material, the metal material is alkali, alkaline earth metal hydroxide, carbonate, bicarbonate, silicate or fluorosilicate. Current density in an aqueous solution containing 0.2 to 7 mol / liter of one or more of the above and 0.01 to 5 mol / liter of a film-forming stabilizer (surface hardening additive) at a rate of 0.5 to 5 A / deci It is achieved by anodizing at a square meter, voltage 2-25V without spark discharge.
本発明で用いられるアルカリ又はアルカリ土類金属の水酸化物、炭酸塩、重炭酸塩、ケイ酸塩もしくはケイフッ化塩の具体例としては、カ性ソーダ、カ性カリ、水酸化バリウム等の水酸化物、炭酸ソーダ、炭酸カルシウム、炭酸マグネシウム等の炭酸塩、重炭酸ソーダ、重炭酸カリ、重炭酸カルシウム、等の重炭酸塩があげられる。 Specific examples of the alkali, alkaline earth metal hydroxide, carbonate, bicarbonate, silicate or silicofluoride used in the present invention include caustic soda, caustic potash, barium hydroxide and the like. Examples thereof include carbonates such as oxide, sodium carbonate, calcium carbonate, and magnesium carbonate, and bicarbonates such as sodium bicarbonate, potassium bicarbonate, and calcium bicarbonate.
電解液には液の寿命の向上を目的として皮膜形成安定剤を添加するのが好ましい。安定剤としては無機化合物、有機化合物が用いられ、具体的にはNaNO3、CaNO3、MgNO3、Na2SO4、MgSO4などの鉱酸塩、KF、NH4Fなどのフッ化物、Na2SiO3、Na4SiO4、K2SiO2などのケイ酸化合物、Na2SiF6、MgSiF6、(NH4)2SiF6などのケイフッ化物、有機化合物としては(CH2OH)2、(CH2CH2OH)O、(CH2OH)2CHOHなどのアルコール基、(COOH)2、(CH2CH2COOH)2、〔CH(OH)COOH〕2、C6H4(OH・COOH)、C6H5COOH、C6H4(COOH)2どのカルボキシル基、C6H4(SO3H・COOH)、C6H3(COOH・OH・SO3H)などのスルフォン基を有する有機化合物が用いられる。
It is preferable to add a film formation stabilizer to the electrolytic solution for the purpose of improving the life of the solution. As the stabilizer, inorganic compounds and organic compounds are used. Specifically, mineral salts such as NaNO 3 , CaNO 3 , MgNO 3 , Na 2 SO 4 and MgSO 4 , fluorides such as KF and NH 4 F, Na 2 SiO 3 , Na 4 SiO 4 , silicic acid compounds such as K 2 SiO 2 , silicofluorides such as Na 2 SiF 6 , MgSiF 6 , (NH 4 ) 2 SiF 6 , (CH 2 OH) 2 as organic compounds, Alcohol groups such as (CH 2 CH 2 OH) O, (CH 2 OH) 2 CHOH, (COOH) 2 , (CH 2 CH 2 COOH) 2 , [CH (OH) COOH] 2 , C 6 H 4 (OH · COOH), C 6 H 5 COOH, C 6 H 4 (COOH) 2 which carboxyl group, C 6 H 4 (SO 3 H · COOH), C 6 H 3 (COOH · O ·
これらの皮膜形成安定剤は単独でも混合して用いても良い。特に無機化合物と有機化合物を組み合わせて使用するときは液管理が容易となり好ましい。この安定剤の添加量は電解液中、0.01〜4モル/リットルの範囲が好ましい。 These film formation stabilizers may be used alone or in combination. In particular, when an inorganic compound and an organic compound are used in combination, liquid management becomes easy, which is preferable. The amount of the stabilizer added is preferably in the range of 0.01 to 4 mol / liter in the electrolytic solution.
この様に調整された電解液中でのマグネシウム合金の陽極酸化処理は、浴温を10〜90℃でpH9以上の弱〜強アルカリ性の範囲で行うのが特に好ましい。 The anodizing treatment of the magnesium alloy in the electrolytic solution thus adjusted is particularly preferably carried out in a weak to strong alkaline range of pH 9 or higher at a bath temperature of 10 to 90 ° C.
陽極酸化処理後の処理として、乾燥がある。乾燥は50〜80℃で20〜60分乾燥する。 There is drying as a treatment after the anodizing treatment. Drying is performed at 50 to 80 ° C. for 20 to 60 minutes.
マグネシウム系の金属材料表面に多孔質ノン火花放電型陽極酸化皮膜を形成し、その細孔中に光触媒微粒子を担持固定化する方法には常圧含浸法、減圧含浸法、加圧含浸法、ゾルゲル法、電気泳動法、浸漬超音波含浸法などがあり、特に減圧加圧を併用する含浸法、浸漬超音波含浸法が好ましい。 Forming a porous non-spark discharge type anodic oxide film on the surface of a magnesium-based metal material and supporting and fixing the photocatalyst fine particles in the pores are the normal pressure impregnation method, the vacuum impregnation method, the pressure impregnation method, the sol-gel method. Method, electrophoresis method, immersion ultrasonic impregnation method and the like, and impregnation method using immersion under reduced pressure and immersion ultrasonic impregnation method are particularly preferable.
具体的な含浸法としては適当な真空容器中に陽極酸化皮膜を形成したマグネシウム合金材料を置き、内部を減圧にしてから前記STSシリーズなどの酸化チタン懸濁液を導入することによって、表面細孔内に酸化チタンを密に充填することが出来る。また懸濁液を導入してから容器を加圧にしてより多くの触媒を充填することもできる。この様な固定化はマグネシウム金属材料の成形後のメッキ、アルマイト処理、塗装などの後工程と同様に従来の一連の製造工程中で行うことが出来るという特徴を有している。 As a specific impregnation method, a magnesium alloy material in which an anodized film is formed is placed in a suitable vacuum vessel, the inside of the STS series or the like is introduced by introducing a titanium oxide suspension such as the STS series after reducing the pressure inside the surface pores. Titanium oxide can be densely filled inside. It is also possible to fill the catalyst by pressurizing the container after introducing the suspension. Such immobilization is characterized in that it can be carried out in a series of conventional manufacturing processes as in the post-process such as plating, alumite treatment, and painting after forming the magnesium metal material.
本発明で使用するマグネシウム金属材料は広範囲に応用可能で、純マグネシウム系、マグネシウム‐アルミニウム系、マグネシウム‐アルミニウム‐亜鉛系、マグネシウム‐アルミニウム‐ケイ素系、マグネシウム‐ジルコニウム‐希土類‐銀系、マグネシウム‐亜鉛‐ジルコニウム系、マグネシウム‐亜鉛系、マグネシウム‐希土類‐ジルコニウム系、マグネシウム‐アルミニウム‐希土類系、マグネシウム‐イットリウム‐希土類系、マグネシウム‐カルシウム‐亜鉛系など陽極酸化皮膜の形成が可能である材料ならば全て可能である。 The magnesium metal material used in the present invention can be widely applied, pure magnesium system, magnesium-aluminum system, magnesium-aluminum-zinc system, magnesium-aluminum-silicon system, magnesium-zirconium-rare earth-silver system, magnesium-zinc -Zirconium, Magnesium-Zinc, Magnesium-Rare Earth-Zirconium, Magnesium-Aluminum-Rare Earth, Magnesium-Yttrium-Rare Earth, Magnesium-Calcium-Zinc, etc. Is possible.
これらの材料は、展伸材、鋳物材、ダイキャスト材、鍛造材などいずれのものも用いられ、加工、成形方法についても展伸材からのプレス、板金、インパクト、バルジ法、鋳造からの砂型、金型、ロストワックス,プラススターモールド、スクイズキャスチング法、ダイキャストからホットチャンバー、コールドチャンバー、半溶融法、鍛造から、熱間、温間法があり、これら各種の成形法で望む形状、例えば板、管、棒、球、又は二次元もしくは三次元の繊維状、あるいはハニカム状構造などにして用いることが出来る。特に本発明の材料を脱臭用途などに用いるときには表面積の大きい繊維状又はハニカム状に加工したものを用いるのが好ましい。 These materials include wrought materials, cast materials, die-cast materials, forged materials, etc., and the processing and molding methods are also presses from wrought materials, sheet metal, impact, bulge method, sand molds from casting. , Mold, lost wax, plus star mold, squeeze casting method, die casting to hot chamber, cold chamber, semi-melting method, forging, hot and warm methods, shapes desired by these various molding methods, for example It can be used as a plate, a tube, a rod, a sphere, or a two-dimensional or three-dimensional fibrous or honeycomb structure. In particular, when the material of the present invention is used for deodorization or the like, it is preferable to use a material processed into a fibrous or honeycomb shape having a large surface area.
これらの成形材料は必要に応じて機械的又は化学的な前処理を施した後に陽極酸化することが好ましい。機械的な前処理法としては乾式もしくは湿式ホーニング法、ベルト、バフ研磨法、スクラッチ法、ヘアーライン法などが用いられる。また化学的な前処理法としてはエッチング、化学梨地、食刻法などが用いられ、これらの前処理を1つ又は2つ以上組み合わせても良い。この様な前処理は金属材料の表面を立体的に変化させるので表面積を増大させる効果を有し、光触媒担持量を増大させる効果を有する。 These molding materials are preferably anodized after mechanical or chemical pretreatment as necessary. As the mechanical pretreatment method, a dry or wet honing method, a belt, a buffing method, a scratch method, a hairline method, or the like is used. Further, as a chemical pretreatment method, etching, chemical finish, etching method or the like is used, and one or two or more of these pretreatments may be combined. Such pretreatment has the effect of increasing the surface area because the surface of the metal material is three-dimensionally changed, and the effect of increasing the amount of photocatalyst supported.
形状が、板、1又は多数本の管又は棒状構造、球状構造、二次元的、又は三次元的繊維状構造、ハニカム構造などを有する表面積の大きい金属材料に前記の機械的又は、化学的前処理と多孔質ノン火花放電型陽極酸化による皮膜の形成工程が加わると、より一層表面積が増加し、これに伴い光触媒固定化量が増加する傾向を示し、基材の単位面積当たりの触媒効率を増大する傾向を有する。 The metal or high-surface-area metal material having a shape such as a plate, one or a plurality of tubes or rods, a spherical structure, a two-dimensional or three-dimensional fibrous structure, a honeycomb structure, etc. When the coating and the film formation process by porous non-spark discharge type anodization are added, the surface area further increases, and the amount of photocatalyst immobilized tends to increase accordingly, and the catalyst efficiency per unit area of the substrate is increased. Has a tendency to increase.
この様にして得られたマグネシウム材料は表面に多量の光触媒が担持固定化されており、各種平面、筐体、枠体、複雑形状部品、1又は多数本の管又は棒状構造、球状構造、二次元的又は三次元的繊維状構造、ハニカム構造等に利用される。この材料表面は紫外線、光触媒の種類によっては可視光の照射で光触媒作用を生じるので、抗菌、黴の発生防止、防汚作用など示し、またアルデヒド、メルカプタンなど有害又は悪臭ガスと接触することによりこれらを分解する効果を有する。 The magnesium material thus obtained has a large amount of photocatalyst supported and fixed on the surface, and various planes, housings, frames, complex shaped parts, one or many pipes or rod-like structures, spherical structures, It is used for dimensional or three-dimensional fibrous structures, honeycomb structures, and the like. Depending on the type of UV or photocatalyst, the surface of this material will produce photocatalysis when irradiated with visible light, so that it exhibits antibacterial properties, prevention of wrinkles, antifouling, etc., and contact with harmful or odorous gases such as aldehyde and mercaptan Has the effect of decomposing.
本発明のマグネシウム系金属材料は前処理を含む多孔質ノン火花放電型陽極酸化処理によって形成された皮膜の微細孔中に光触媒が充填されているので衝撃があっても剥離脱落することが無く、安定している。 The magnesium-based metallic material of the present invention is not peeled off even if there is an impact because the photocatalyst is filled in the micropores of the film formed by the porous non-spark discharge type anodizing treatment including pretreatment, stable.
又、前処理により立体的構造を持たせ、単位面積あたりの担持固定化される光触媒量が従来法に比し格段に多く、このため油などによる汚染の防止効果、抗菌、防かび、有害ガス分解効果に優れており、光触媒作用を利用する小型の装置を作ることが出来る。 In addition, the amount of photocatalyst that is supported and fixed per unit area is much higher than that of the conventional method because it has a three-dimensional structure by pretreatment, and therefore, it is effective in preventing contamination by oil, antibacterial, antifungal, and harmful gases. It is excellent in decomposing effect and can make a small device using photocatalytic action.
以下、本発明の実施の形態を具体的に説明する。 Hereinafter, embodiments of the present invention will be specifically described.
板厚1mm、70×150mmのマグネシウム合金AZ31B圧延材を用いて、脱脂、酸処理後、水酸化カリウム2±0.05モル/リットル、皮膜成形安定剤としてメタケイ酸ナトリウム0.05±0.005モル/リットルと、ジエチレングリコール0.1±0.05モル/リットルを添加した電解液で液温69±2℃、電流密度2±0.5A/平方デシメートル、電圧4〜8Vで直流波形にて、30分陽極酸化処理を行った。この皮膜の表面をレーザー顕微鏡にて観察すると平均孔径200〜600nmの微細孔が確認でき、断面を光学顕微鏡で観察すると、約10μmの皮膜厚さが確認出来た。処理後、STS‐21酸化チタン分散液(石原産業(株)製、平均粒子径20nm)に15分浸漬後乾燥して表面に酸化チタンを固定化したマグネシウム金属材料を得た。
Using magnesium alloy AZ31B rolled material having a plate thickness of 1 mm and 70 × 150 mm, after degreasing and acid treatment,
実施例1と同じ圧延材を用い、前処理として機械的処理の乾式ホーニング(鉄粉#100、圧力0.25MPa、作業時間1分)を行った後、同様にして脱脂、酸処理し、同一電解条件で陽極酸化を行い、得られた材料に光触媒を実施例1と同様の方法で担持固定化した。
The same rolled material as in Example 1 was used, and mechanical treatment dry honing (
前処理として、機械的処理の湿式ホーニング(ガラスビーズ、#100、圧力0.25MPa、作業時間1分)を行い、次に実施例2と同様に光触媒を固定化した。
As pretreatment, wet honing (glass beads, # 100, pressure 0.25 MPa, working
使用材料及び陽極酸化皮膜処理を実施例1と同様にし、光触媒を担持固定化する方法は製品をSUSの真空容器にいれ、4mmHgに減圧し、20分保持し、保持後STS‐21酸化チタン分散液(石原産業(株)製、平均粒子径20nm)を、容器内の製品が完全に浸漬されるまで注入し、15分保持後取出し乾燥した。 The material used and the anodic oxide film treatment were the same as in Example 1, and the photocatalyst was supported and immobilized by placing the product in a SUS vacuum container, reducing the pressure to 4 mmHg, holding for 20 minutes, and holding the STS-21 titanium oxide dispersed The liquid (Ishihara Sangyo Co., Ltd., average particle size 20 nm) was poured in until the product in the container was completely immersed, held for 15 minutes, taken out and dried.
実施例4において、光触媒の担持固定化の際に、容器内の製品が酸化チタン分散液に浸漬された状態で、更に25Hzの超音波で15分処理を施した後取り出し乾燥した。 In Example 4, at the time of supporting and fixing the photocatalyst, the product in the container was immersed in the titanium oxide dispersion, further treated with ultrasonic waves of 25 Hz for 15 minutes, and then taken out and dried.
実施例5において、陽極酸化処理、実施例5の光触媒担持固定化処理後、
0.4MPaにて加圧15分後取り出した。
In Example 5, after the anodizing treatment, the photocatalyst carrying and fixing treatment of Example 5,
It was taken out after 15 minutes under pressure at 0.4 MPa.
比較例として既存の同一試験片を脱脂、酸処理後STS‐21の浴中に15分浸漬後乾燥した。 As a comparative example, the same existing test piece was degreased, acid-treated, immersed in an STS-21 bath for 15 minutes, and then dried.
これらの実施例1〜6と比較例の評価は次の方法で行った。各々の実施例で得た製品を容積2.8Lの閉鎖箱に入れ、初期流量150ml/分でアセトアルデヒドを3分流した。次にブラックライトで0.5mw/平方センチメートルの光照射をした。この段階でのアセトアルデヒドの流量は100ml/分とした。他の実施例についても同様に行った。経過時間毎にアセトアルデヒドの含有量をガスクロマトグラフィーで分析した。結果を図1に示した。従来の光触媒担持固定化法より優れていることが明らかである。 These Examples 1 to 6 and Comparative Example were evaluated by the following method. The product obtained in each example was placed in a closed box having a volume of 2.8 L, and acetaldehyde was allowed to flow for 3 minutes at an initial flow rate of 150 ml / min. Next, light irradiation of 0.5 mw / square centimeter was performed with a black light. The flow rate of acetaldehyde at this stage was 100 ml / min. It carried out similarly about the other Example. The content of acetaldehyde was analyzed by gas chromatography at each elapsed time. The results are shown in FIG. It is clear that the method is superior to the conventional photocatalyst-supported immobilization method.
本発明のマグネシウム材料は抗菌、防黴、防汚材料として、又は有害もしくは悪臭ガス等の分解材、脱臭材などに使用できる。 The magnesium material of the present invention can be used as an antibacterial, antifungal or antifouling material, or as a decomposition or deodorizing material such as harmful or offensive odor gas.
1:比較例 2:実施例1 3:実施例4 4:実施例5
5:実施例6 6:実施例3 7:実施例2
1: Comparative Example 2: Example 1 3: Example 4 4: Example 5
5: Example 6 6: Example 3 7: Example 2
Claims (13)
The method for supporting and fixing the photocatalyst inside and on the surface of the micropores is the immersion impregnation method, immersion ultrasonic impregnation method, vacuum (decompression-pressurization) impregnation method, and post-immersion vacuum (decompression-pressurization) impregnation method. The method according to claim 1, comprising filling and adhering by one or a combination of two or more of sol-gel method, electrophoresis method, or immersion method.
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