JP4784722B2 - Magnesium metal material having photocatalytic active surface and method for producing the same - Google Patents
Magnesium metal material having photocatalytic active surface and method for producing the same Download PDFInfo
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- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 title claims description 25
- 239000007769 metal material Substances 0.000 title claims description 21
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 230000001699 photocatalysis Effects 0.000 title description 7
- 239000011148 porous material Substances 0.000 claims description 47
- 238000000034 method Methods 0.000 claims description 39
- 239000011941 photocatalyst Substances 0.000 claims description 30
- 238000005470 impregnation Methods 0.000 claims description 14
- 239000011777 magnesium Substances 0.000 claims description 14
- 229910052749 magnesium Inorganic materials 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 10
- 239000010407 anodic oxide Substances 0.000 claims description 9
- 230000004888 barrier function Effects 0.000 claims description 9
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 9
- 238000007654 immersion Methods 0.000 claims description 8
- 230000003647 oxidation Effects 0.000 claims description 8
- 238000007254 oxidation reaction Methods 0.000 claims description 8
- 229910000861 Mg alloy Inorganic materials 0.000 claims description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 7
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 7
- 150000004760 silicates Chemical class 0.000 claims description 6
- 150000002894 organic compounds Chemical class 0.000 claims description 5
- 239000000654 additive Substances 0.000 claims description 4
- 230000000996 additive effect Effects 0.000 claims description 4
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 150000004673 fluoride salts Chemical class 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 4
- 239000003513 alkali Substances 0.000 claims description 3
- 239000002585 base Substances 0.000 claims description 3
- 150000004679 hydroxides Chemical class 0.000 claims description 3
- 150000002484 inorganic compounds Chemical class 0.000 claims description 3
- 229910010272 inorganic material Inorganic materials 0.000 claims description 3
- 125000001174 sulfone group Chemical group 0.000 claims description 3
- 229910019142 PO4 Inorganic materials 0.000 claims description 2
- 125000003158 alcohol group Chemical group 0.000 claims description 2
- 238000002048 anodisation reaction Methods 0.000 claims description 2
- 125000004122 cyclic group Chemical group 0.000 claims description 2
- 238000001962 electrophoresis Methods 0.000 claims description 2
- 239000010419 fine particle Substances 0.000 claims description 2
- 239000000395 magnesium oxide Substances 0.000 claims description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 2
- 235000021317 phosphate Nutrition 0.000 claims description 2
- 238000003980 solgel method Methods 0.000 claims description 2
- 239000011029 spinel Substances 0.000 claims description 2
- 229910052596 spinel Inorganic materials 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims 2
- 229910002651 NO3 Inorganic materials 0.000 claims 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 claims 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical class OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims 1
- 150000001342 alkaline earth metals Chemical class 0.000 claims 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 claims 1
- 239000000463 material Substances 0.000 description 23
- 239000011734 sodium Substances 0.000 description 15
- 239000010410 layer Substances 0.000 description 11
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- -1 KF and NH 4 F Chemical class 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 6
- 230000009931 harmful effect Effects 0.000 description 6
- 239000011230 binding agent Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 238000000354 decomposition reaction Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000002253 acid Substances 0.000 description 3
- 238000007743 anodising Methods 0.000 description 3
- 230000000844 anti-bacterial effect Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
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- 239000003921 oil Substances 0.000 description 3
- 238000002203 pretreatment Methods 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 2
- 229910004283 SiO 4 Inorganic materials 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 2
- 229910000318 alkali metal phosphate Inorganic materials 0.000 description 2
- 229910000316 alkaline earth metal phosphate Inorganic materials 0.000 description 2
- 230000003373 anti-fouling effect Effects 0.000 description 2
- 230000000843 anti-fungal effect Effects 0.000 description 2
- 229940121375 antifungal agent Drugs 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 238000004332 deodorization Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000003100 immobilizing effect Effects 0.000 description 2
- 239000005416 organic matter Substances 0.000 description 2
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical compound [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 2
- 238000007146 photocatalysis Methods 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 229910052761 rare earth metal Inorganic materials 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- LLQHSBBZNDXTIV-UHFFFAOYSA-N 6-[5-[[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]methyl]-4,5-dihydro-1,2-oxazol-3-yl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC1CC(=NO1)C1=CC2=C(NC(O2)=O)C=C1 LLQHSBBZNDXTIV-UHFFFAOYSA-N 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 1
- 229910017855 NH 4 F Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- PGTXKIZLOWULDJ-UHFFFAOYSA-N [Mg].[Zn] Chemical compound [Mg].[Zn] PGTXKIZLOWULDJ-UHFFFAOYSA-N 0.000 description 1
- UQCVYEFSQYEJOJ-UHFFFAOYSA-N [Mg].[Zn].[Zr] Chemical compound [Mg].[Zn].[Zr] UQCVYEFSQYEJOJ-UHFFFAOYSA-N 0.000 description 1
- XVYHFPMIBWTTLH-UHFFFAOYSA-N [Zn].[Mg].[Ca] Chemical compound [Zn].[Mg].[Ca] XVYHFPMIBWTTLH-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- SNAAJJQQZSMGQD-UHFFFAOYSA-N aluminum magnesium Chemical compound [Mg].[Al] SNAAJJQQZSMGQD-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- MVYYDFCVPLFOKV-UHFFFAOYSA-M barium monohydroxide Chemical compound [Ba]O MVYYDFCVPLFOKV-UHFFFAOYSA-M 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000001877 deodorizing effect Effects 0.000 description 1
- 238000004512 die casting Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 229940104869 fluorosilicate Drugs 0.000 description 1
- 238000005242 forging Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000009996 mechanical pre-treatment Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 230000033116 oxidation-reduction process Effects 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 230000001443 photoexcitation Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
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- 238000012545 processing Methods 0.000 description 1
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- 238000006479 redox reaction Methods 0.000 description 1
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- 239000004576 sand Substances 0.000 description 1
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- 239000004065 semiconductor Substances 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- HELHAJAZNSDZJO-OLXYHTOASA-L sodium L-tartrate Chemical compound [Na+].[Na+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O HELHAJAZNSDZJO-OLXYHTOASA-L 0.000 description 1
- 239000001433 sodium tartrate Substances 0.000 description 1
- 229960002167 sodium tartrate Drugs 0.000 description 1
- 235000011004 sodium tartrates Nutrition 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000009716 squeeze casting Methods 0.000 description 1
- 230000001954 sterilising effect Effects 0.000 description 1
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- 239000010457 zeolite Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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Description
本発明は、浄水、脱臭、殺菌、油汚れ防止、有害ガスの分解等、広範囲な用途に用いられる、光触媒活性表面を有するマグネシウム系金属材料及びその製造法に関するものである。 The present invention relates to a magnesium-based metal material having a photocatalytically active surface and a method for producing the same, which are used in a wide range of applications such as water purification, deodorization, sterilization, oil stain prevention, and decomposition of harmful gases.
半導体にそのバンドギャップ以上のエネルギーを有する波長の光を照射すると光励起により価電子帯での正孔生成と伝導体への電子移動によってこれらに接触する有機物等を酸化還元反応で分解してしまういわゆる光触媒については良く知られている。 When a semiconductor is irradiated with light having a wavelength greater than its band gap, the organic matter that contacts these is decomposed by redox reaction due to the generation of holes in the valence band and the transfer of electrons to the conductor by photoexcitation. Photocatalysts are well known.
しかしながら、光触媒を基材表面に固定化することが困難であるため光触媒活性表面を持つ各種材料の開発が遅れている。これは光触媒が励起されたときに生ずる酸化還元能力は大変強力で殆どの有機物を分解するので光触媒を基材表面に固定化するためのバインダーとして有機物を用いることが出来ないためである。また前述の光触媒効果を生じさせるためには紫外光などが触媒体に照射されることと、被処理物質と触媒体との直接接触が必要であることからバインダーは透明で且つ多孔質である事が必要である。このため光触媒の基材への固定化には主にシリケート類などの無機バインダーが用いられてきた。 However, since it is difficult to fix the photocatalyst to the substrate surface, development of various materials having a photocatalytic active surface is delayed. This is because the redox ability generated when the photocatalyst is excited is very strong and decomposes most organic substances, so that the organic substances cannot be used as a binder for fixing the photocatalyst to the substrate surface. In order to produce the above-mentioned photocatalytic effect, the binder must be transparent and porous because it is necessary to irradiate the catalyst body with ultraviolet light or the like and to make direct contact between the material to be treated and the catalyst body. is required. For this reason, inorganic binders such as silicates have been mainly used for immobilizing photocatalysts on substrates.
例えば特許文献1に基材表面への光触媒固定化法が提案されているが、この時用いられているバインダーはシリケート類である。しかしながら、シリケートバインダーは厚膜化するとひび割れが生じるので衝撃を受けると基材から剥離してしまう欠点があり、厚膜化によって光触媒付与量を多くすることが困難である。光触媒はこれと接触した有機物のみを酸化還元分解するのでその付与量が少ない場合は必然的に油汚れや有害ガスの分解能力も小さいために、実用上の点から表面積の大きい、適度に荒れた立体的構造を持つ粗面化された基材に光触媒を多量に表面に付着させる方法の開発が望まれていた。
又、従来の光触媒の場合、複雑形状については、例えばゼオライトを原料とした時、粉末にして型で固形化するか、粉末の状態で表面に付着させるか又は粉末を閉鎖領域に閉じ込めるかの方法であり、前者では多量の原料を使用した割には触媒効果が小さく、また表面付着では不十分な量しか固定化できなかった。 In the case of conventional photocatalysts, for complex shapes, for example, when zeolite is used as a raw material, the powder is solidified in a mold, adhered to the surface in the form of a powder, or the powder is confined in a closed region In the former, the catalytic effect was small even when a large amount of raw material was used, and only an insufficient amount could be fixed by surface adhesion.
本発明は従来技術では光触媒の基材表面への固定化付着量が少ない欠点を解決するために提案されたものであって、有害物質の分解性能が大きい光触媒体の提供を目的とする。 The present invention has been proposed in order to solve the disadvantage that the photocatalyst is immobilized on the substrate surface in a small amount in the prior art, and an object of the present invention is to provide a photocatalyst having a high ability to decompose harmful substances.
本発明は、マグネシウムまたはマグネシウム合金の表面に、平均孔径が50nm〜50μmの微細孔を多数有する多孔質陽極酸化皮膜を形成し、該多孔質陽極酸化皮膜は火花放電を伴う火花放電型陽極酸化法によって形成された、孔、壁、バリヤー層よりなる皮膜であって、孔については表面側の大きい細孔層と、その下により小さい細孔層を有する2層構造を持ち、且つ、孔とマグネシウム素地の間にバリヤー層が存在する、4層構造より成り立っている皮膜であり、該多孔質皮膜の微細孔内部及び皮膜表面に光触媒を担持固定化することを特徴とする光触媒活性表面を有するマグネシウム金属材料の製造法である。The present invention forms a porous anodic oxide film having a large number of fine pores having an average pore diameter of 50 nm to 50 μm on the surface of magnesium or a magnesium alloy, and the porous anodic oxide film is a spark discharge type anodic oxidation method accompanied by a spark discharge. Is a film composed of pores, walls, and a barrier layer, and has a two-layer structure with a large pore layer on the surface side and a smaller pore layer below the pore, and the pores and magnesium. Magnesium having a photocatalytically active surface, comprising a four-layer structure in which a barrier layer is present between the substrates, wherein the photocatalyst is supported and fixed inside the micropores and on the surface of the porous film It is a manufacturing method of a metal material.
本発明のマグネシウム金属材料の表面には火花放電を伴う陽極酸化によって平均孔径が50nm〜50μmの微細孔が多数存在する多孔質陽極酸化皮膜が存在する。この様に表面に不規則で不連続な、そして時には非常に大きな細孔を多数有するマグネシウム金属材料は外観、光沢などの点から従来は欠点とされていたものであるが、本発明ではこの欠点を光触媒活性の発現に積極的に利用したものである。 On the surface of the magnesium metal material of the present invention, there is a porous anodic oxide film having a large number of fine pores having an average pore diameter of 50 nm to 50 μm due to anodic oxidation accompanied by spark discharge. Thus, the magnesium metal material having irregular, discontinuous, and sometimes very large pores on the surface has been conventionally regarded as a defect from the viewpoint of appearance, gloss, etc. Is actively used to develop photocatalytic activity.
この様な細孔は火花放電を伴う条件下で陽極酸化を施すことによって表面に多数形成させることが出来る。この多孔質皮膜の厚さは1〜100μmの範囲でかなり自由に設定することが可能で、従って細孔部分に充填する光触媒の量も必要に応じてかなりの自由度をもって変えることができる。皮膜中の微細孔分布を厚さ方向捉えると、平均孔径の大きな細孔が表面より素材に向かって、皮膜厚さ方向に60%以上を占め、残り40以下を、小さな微細孔層とバリヤー層が占め、全体としては表面より大きめの細孔、小さな細孔、バリヤー層、素材という構造となっている。又、ここで言う「平均孔径の大きな細孔」とは、平均孔径が5μm以上の孔径が70%以上占めていること。一方「小さな細孔」とは、50nm〜5μm未満の孔径が70%以上占めていることをいう。 Many such pores can be formed on the surface by anodizing under conditions involving spark discharge. The thickness of the porous film can be set fairly freely in the range of 1 to 100 μm. Therefore, the amount of the photocatalyst filled in the pores can be changed with a considerable degree of freedom as required. When the micropore distribution in the film is captured in the thickness direction, pores with a large average pore diameter occupy 60% or more in the film thickness direction from the surface toward the material, and the remaining 40 or less is composed of a small microporous layer and a barrier layer. As a whole, the structure is composed of pores larger than the surface, small pores, barrier layers, and materials. The term “pores with a large average pore diameter” as used herein means that 70% or more of the pore diameters have an average pore diameter of 5 μm or more. On the other hand, “small pore” means that the pore diameter of 50 nm to less than 5 μm occupies 70% or more.
本発明の金属材料表面に形成される皮膜は、主に2水準の孔、壁、バリヤー層の4層構造で、皮膜の組成が酸化マグネシウムとスピネル又はこれに近い構造より成り立っている。これら細孔は、表面に開口部を有し、平均孔径が50nm〜50μmの大きさを有しているため、光触媒として10乃至500nm程度の粒径を持つ例えば酸化チタンを使用した場合にこの微細孔内部及び表面に充填又は付着させることは容易である。この様な粒径の酸化チタンとして石原産業(株)などから市販されているSTシリーズの粉体あるいはSTSシリーズの分散体などがある。金属材料表面に形成されている細孔の数は1平方ミリメートルあたり少なくとも10個以上、通常100個以上存在しているので基材表面全体に均一に光触媒を担持固定化することが出来る。 The film formed on the surface of the metal material of the present invention mainly has a four-layer structure of two levels of pores, walls, and barrier layers, and the composition of the film is composed of magnesium oxide and spinel or a structure close thereto. Since these pores have openings on the surface and an average pore diameter of 50 nm to 50 μm, this fineness is obtained when, for example, titanium oxide having a particle diameter of about 10 to 500 nm is used as a photocatalyst. It is easy to fill or adhere to the inside and surface of the hole. Examples of titanium oxide having such a particle size include ST series powders and STS series dispersions commercially available from Ishihara Sangyo Co., Ltd. Since the number of pores formed on the surface of the metal material is at least 10 per square millimeter, usually 100 or more, the photocatalyst can be uniformly supported and immobilized on the entire surface of the substrate.
本発明においてマグネシウム金属材料表面に特定の微細孔を有する皮膜を形成するには、該金属材料をアルカリまたはアルカリ土類金属のリン酸塩、ホウ酸塩、水酸化物、ケイ酸塩もしくはケイフッ化塩の1種以上を0.2〜7モル/リットル、皮膜添加剤を0.01〜5モル/リットルの割合で含む水溶液中で電流密度0.5〜5A/デシ平方メート、電圧25V以上で火花放電を生じさせながら陽極酸化処理することによって達成される。 In the present invention, in order to form a film having specific fine pores on the surface of a magnesium metal material, the metal material is made of an alkali or alkaline earth metal phosphate, borate, hydroxide, silicate or fluorosilicate. In an aqueous solution containing one or more salts at a rate of 0.2 to 7 mol / liter and a film additive at a rate of 0.01 to 5 mol / liter, a current density of 0.5 to 5 A / decimeter square and a voltage of 25 V or more. This is achieved by anodizing while producing a spark discharge.
本発明で用いられるアルカリ又はアルカリ土類金属のリン酸塩、ホウ酸塩、ケイ酸塩、もしくは水酸化物で、具体例としては、H3PO4, Na3PO4、Na2HPO4、NaH2PO4、Na4P2O6、Na2H2P2O6Na4P2O7、Na2H2P2O7、Na5P3O10、K3PO4、K2HPO4、KH2PO4、K4P2O7、K6(PO3)6のリン酸塩、NaBO2,Na2B4O7、NaBo3、KBO2K2B4O7のホウ酸塩、Na2SiO3、Na4SiO4、K2SiO3、K2SiO7、K2Si4O9のケイ酸塩及び、NaOH,KOH,BaOHの水酸化物があげられる。 Examples of alkali or alkaline earth metal phosphates, borates, silicates, or hydroxides used in the present invention include H 3 PO 4 , Na 3 PO 4 , Na 2 HPO 4 , NaH 2 PO 4, Na 4 P 2 O 6, Na 2 H 2 P 2 O 6 Na 4 P 2 O 7, Na 2 H 2 P 2 O 7, Na 5 P 3 O 10, K 3 PO 4, K 2 HPO 4 , KH 2 PO 4 , K 4 P 2 O 7 , phosphate of K 6 (PO 3 ) 6 , NaBO 2 , Na 2 B 4 O 7 , NaBo 3 , KBO 2 K 2 B 4 O 7 Examples thereof include silicates such as acid salts, Na 2 SiO 3 , Na 4 SiO 4 , K 2 SiO 3 , K 2 SiO 7, and K 2 Si 4 O 9 , and hydroxides such as NaOH, KOH, and BaOH.
電解液には液の寿命、皮膜の均一性、安定性、性能向上を目的として皮膜添加剤を加える。添加剤には、フッ化物塩、重フッ化物塩、ケイフッ化物塩、鉱酸塩などの無機化合物、又はアルコール基、カルボキシル基、スルホン基を含む環状又は鎖状の有機化合物が用いられ、具体的にはKF、NH4Fなどのフッ化物、NH4FHF、NaFHF、KFHFなどの重フッ化物、Na2SiO3、Na4SiO4、K2SiO2などのケイ酸化合物、Na2SiF6、MgSiF6、(NH4)2SiF6などのケイフッ化物、有機化合物としては(CH2OH)2、(CH2CH2OH)O、(CH2OH)2CHOHなどのアルコール類、(COOH)2、(CH2CH2COOH)2、〔CH(OH)COOH〕2、C6H4(OHCOOH)、C6H5COOH、C6H4(COOH)2どのカルボン酸、C6H4(SO3H・COOH)、C6H3(COOH・OH・SO3H)などのスルホン基を有する有機化合物が用いられる。 A coating additive is added to the electrolytic solution for the purpose of improving the life of the solution, uniformity of the coating, stability, and performance. As the additive, inorganic compounds such as fluoride salts, bifluoride salts, silicofluoride salts, and mineral acid salts, or cyclic or chain organic compounds containing alcohol groups, carboxyl groups, and sulfone groups are used. Includes fluorides such as KF and NH 4 F, dehydrofluorides such as NH 4 FHF, NaFHF and KFHF, silicate compounds such as Na 2 SiO 3 , Na 4 SiO 4 and K 2 SiO 2 , Na 2 SiF 6 , Silicides such as MgSiF 6 and (NH 4 ) 2 SiF 6 , organic compounds such as (CH 2 OH) 2 , (CH 2 CH 2 OH) O, alcohols such as (CH 2 OH) 2 CHOH, (COOH) 2 , (CH 2 CH 2 COOH) 2 , [CH (OH) COOH] 2 , C 6 H 4 (OHCOOH), C 6 H 5 COOH, C 6 H 4 (COOH ) 2 which carboxylic acids, C 6 H 4 (SO 3 H · COOH), an organic compound having a C 6 H 3 (COOH · OH · SO 3 H) sulfone group, such as is used.
これらの皮膜形成安定剤は単独でも混合して用いても良い。特に無機化合物と有機化合物を組み合わせて使用するときは液管理が容易となり好ましい。この安定剤の添加量は電解液中、0.01〜5モル/リットルの範囲が好ましい。 These film formation stabilizers may be used alone or in combination. In particular, when an inorganic compound and an organic compound are used in combination, liquid management becomes easy, which is preferable. The amount of the stabilizer added is preferably in the range of 0.01 to 5 mol / liter in the electrolytic solution.
この様に調整された電解液中でのマグネシウム合金の陽極酸化処理は、浴温を10〜60℃でpH9以上の弱〜強アルカリ性の範囲で行うのが特に好ましい。 It is particularly preferable that the anodic oxidation treatment of the magnesium alloy in the electrolytic solution thus adjusted is performed in a weak to strong alkaline range of pH 9 or higher at a bath temperature of 10 to 60 ° C.
マグネシウム系の金属材料表面に多孔質火花放電型陽極酸化皮膜を形成し、その細孔中に光触媒微粒子を担持固定化する方法には常圧含浸法、減圧含浸法、加圧含浸法、ゾルゲル法、電気泳動法、浸漬超音波含浸法などがあり、特に減圧加圧を併用する含浸法、浸漬超音波含浸法が好ましい。具体的な含浸法としては適当な真空容器中に陽極酸化皮膜を形成したマグネシウム合金材料を置き、内部を減圧にしてから前記STSシリーズなどの酸化チタン懸濁液を導入することによって表面細孔内に酸化チタンを密に充填することが出来る。また懸濁液を導入してから容器を加圧にしてより多くの触媒を充填することもできる。この様な固定化はマグネシウム金属材料の成形後のメッキ、アルマイト処理、塗装などの後工程と同様に従来の一連の製造工程中で行うことが出来るという特徴を有している。 The method of forming a porous spark discharge type anodic oxide film on the surface of magnesium-based metal material and supporting and fixing the photocatalyst fine particles in the pores is the normal pressure impregnation method, the vacuum impregnation method, the pressure impregnation method, the sol-gel method. Electrophoretic method, immersion ultrasonic impregnation method, and the like, and impregnation method using immersion under reduced pressure and immersion ultrasonic impregnation method are particularly preferable. As a specific impregnation method, a magnesium alloy material having an anodized film formed thereon is placed in a suitable vacuum vessel, and the inside of the surface pores is introduced by introducing a titanium oxide suspension such as the STS series after reducing the pressure inside. Titanium oxide can be densely filled. It is also possible to fill the catalyst by pressurizing the container after introducing the suspension. Such immobilization is characterized in that it can be carried out in a series of conventional manufacturing processes as in the post-process such as plating, alumite treatment, and painting after forming the magnesium metal material.
本発明で使用するマグネシウム金属材料は広範囲に応用可能で、純マグネシウム系、マグネシウム‐アルミニウム系、マグネシウム‐アルミニウム‐亜鉛系、マグネシウム‐アルミニウム‐ケイ素系、マグネシウム‐ジルコニウム‐希土類‐銀系、マグネシウム‐亜鉛‐ジルコニウム系、マグネシウム‐亜鉛系、マグネシウム‐希土類‐ジルコニウム系、マグネシウム‐アルミニウム‐希土類系、マグネシウム‐イットリウム‐希土類系、マグネシウム‐カルシウム‐亜鉛系など陽極酸化皮膜の形成が可能である材料ならば全て利用可能である。 The magnesium metal material used in the present invention is widely applicable, pure magnesium system, magnesium-aluminum system, magnesium-aluminum-zinc system, magnesium-aluminum-silicon system, magnesium-zirconium-rare earth-silver system, magnesium-zinc -Zirconium, Magnesium-Zinc, Magnesium-Rare Earth-Zirconium, Magnesium-Aluminum-Rare Earth, Magnesium-Yttrium-Rare Earth, Magnesium-Calcium-Zinc, etc. Is available.
これらの材料は、展伸材、鋳物材、ダイキャスト材、鍛造材などいずれのものも用いられ、加工、成形方法についても展伸材からのプレス、板金、インパクト、バルジ法、鋳造からの砂型、金型、ロストワックス,プラススターモールド、スクイズキャスチング法、ダイキャストからホットチャンバー、コールドチャンバー、半溶融法、鍛造から、熱間、温間法があり、これら各種の成形法で望む形状、例えば板、管、棒、球、又は二次元もしくは三次元の繊維状、あるいはハニカム状構造などにして用いることが出来る。特に本発明の材料を脱臭用途などに用いるときには表面積の大きい繊維状又はハニカム状に加工したものを用いるのが好ましい。 These materials include wrought materials, cast materials, die-cast materials, forged materials, etc., and the processing and molding methods are also presses from wrought materials, sheet metal, impact, bulge method, sand molds from casting. , Mold, lost wax, plus star mold, squeeze casting method, die casting to hot chamber, cold chamber, semi-melting method, forging, hot, warm method, desired shape by these various molding methods, for example It can be used as a plate, a tube, a rod, a sphere, or a two-dimensional or three-dimensional fibrous or honeycomb structure. In particular, when the material of the present invention is used for deodorization or the like, it is preferable to use a material processed into a fibrous or honeycomb shape having a large surface area.
これらの成形材料は必要に応じて機械的又は化学的な前処理を施した後に陽極酸化することが好ましい。機械的な前処理法としては乾式もしくは湿式ホーニング法、ベルト、バフ研磨法、スクラッチ法、ヘアーライン法などが用いられる。また化学的な前処理法としてはエッチング、化学梨地、食刻法などが用いられ、これらの前処理を1つ又は2つ以上組み合わせても良い。この様な前処理は金属材料の表面を立体的に変化させるので表面積を増大させる効果を有する。 These molding materials are preferably anodized after mechanical or chemical pretreatment as necessary. As the mechanical pretreatment method, a dry or wet honing method, a belt, a buffing method, a scratch method, a hairline method, or the like is used. Further, as a chemical pretreatment method, etching, chemical finish, etching method or the like is used, and one or two or more of these pretreatments may be combined. Such pretreatment has the effect of increasing the surface area because the surface of the metal material is three-dimensionally changed.
形状が、板、1又は多数本の管又は棒状構造、球状構造、二次元又は三次元繊維状構造、ハニカム構造などを有する表面積の大きい金属材料に前記の機械的又は、化学的前処理と多孔質火花放電型陽極酸化による皮膜の形成工程が加わると、相乗的に表面積が増加し、これに伴い光触媒固定化量が増加し、基材の単位面積当たりの触媒効率が増大する。 The above-mentioned mechanical or chemical pretreatment and porosity are applied to a metal material having a large surface area, such as a plate, one or many tubes or rod-like structures, spherical structures, two-dimensional or three-dimensional fibrous structures, honeycomb structures, etc. When a film formation process by quality spark discharge type anodic oxidation is added, the surface area increases synergistically, and the amount of photocatalyst immobilized increases accordingly, and the catalyst efficiency per unit area of the substrate increases.
この様にして得られたマグネシウム材料は表面に多量の光触媒が担持固定化されており、各種平面、筐体、枠体、複雑形状部品、1又は多数本の管又は棒状構造、球状構造、二次元又は3次元繊維状構造、ハニカム構造等に利用される。この材料表面は紫外線、光触媒の種類によっては可視光の照射で光触媒作用を生じるので、抗菌、黴の発生防止、防汚作用など示し、またアルデヒド、メルカプタンなど有害又は悪臭ガスと接触することによりこれらを分解する効果を有する。 The magnesium material thus obtained has a large amount of photocatalyst supported and fixed on the surface, and various planes, housings, frames, complex shaped parts, one or many pipes or rod-like structures, spherical structures, It is used for three-dimensional or three-dimensional fibrous structures, honeycomb structures, and the like. Depending on the type of UV or photocatalyst, the surface of this material will produce photocatalysis when irradiated with visible light, so that it exhibits antibacterial properties, prevention of wrinkles, antifouling, etc., and contact with harmful or odorous gases such as aldehydes and mercaptans. Has the effect of decomposing.
本発明のマグネシウム系金属材料は前処理を含む火花放電型陽極酸化処理によって形成された多孔質皮膜の微細孔中に光触媒が充填されているので衝撃があっても剥離脱落することが無く、安定している。更に長期間の使用により無機物の付着などにより触媒表面の活性が劣化した時には、立体的に固定化されているので表面層を清掃又は削ることにより新規の表層を出す事が可能で、初期性能を簡単に回復できる利点を有する。 The magnesium-based metallic material of the present invention is stable because it does not fall off even if there is an impact because the photocatalyst is filled in the fine pores of the porous film formed by spark discharge type anodizing treatment including pretreatment. is doing. Furthermore, when the activity of the catalyst surface deteriorates due to adhesion of inorganic substances due to long-term use, it is fixed in three dimensions, so it is possible to put out a new surface layer by cleaning or scraping the surface layer, and improving the initial performance. Has the advantage of easy recovery.
又、前処理により三次元的構造を持たせ、単位面積あたりの担持固定化される光触媒量が従来法に比し格段に多く、このため油などによる汚染の防止効果、抗菌、防かび、有害ガス分解効果に優れており、光触媒作用を利用する小型の装置を作ることが出来る。 In addition, it has a three-dimensional structure by pre-treatment, and the amount of photocatalyst supported and immobilized per unit area is much larger than that of the conventional method. Therefore, the effect of preventing contamination by oil, antibacterial, antifungal, harmful The gas decomposition effect is excellent, and a small device using photocatalysis can be made.
以下、本発明の実施の形態を具体的に説明する。 Hereinafter, embodiments of the present invention will be specifically described.
板厚1mm、70×150mmのマグネシウム合金AZ31B圧延材を用いて、脱脂、酸処理後、NaOH;3±0.05モル/リットル、Na2HPO4;0.3±0.01モル/リットル皮膜成形安定剤としてNa2SiO3 ;0.05±0.005モル/リットルと、酒石酸ナトリウム;0.1±0.05モル/リットル、KF;0.2±0.01モル/リットルを添加した電解液で液温28±2℃、電流密度2±0.5A/平方デシメートル、火花放電開始電圧約50Vで60分火花放電型陽極酸化処理を行った。この皮膜の断面を電子顕微鏡で観察すると、約20μmの皮膜厚さの中、表面側より約16μmまでは、10〜20μmの細孔が、素地側の皮膜厚さ約4μmに、3μm以下の微細孔が確認出来た。処理後、STS‐21酸化チタン分散液(石原産業(株)製、平均粒子径20nm)に15分浸漬後乾燥して表面に酸化チタンを固定化したマグネシウム金属材料を得た。 Using magnesium alloy AZ31B rolled material with a plate thickness of 1 mm and 70 × 150 mm, after degreasing and acid treatment, NaOH: 3 ± 0.05 mol / liter, Na 2 HPO 4 ; 0.3 ± 0.01 mol / liter coating As molding stabilizers, Na 2 SiO 3 ; 0.05 ± 0.005 mol / liter and sodium tartrate; 0.1 ± 0.05 mol / liter, KF; 0.2 ± 0.01 mol / liter were added. Spark discharge type anodic oxidation treatment was performed with the electrolyte at a liquid temperature of 28 ± 2 ° C., a current density of 2 ± 0.5 A / square decimeter, and a spark discharge starting voltage of about 50 V. When the cross section of this film is observed with an electron microscope, pores of 10 to 20 μm have a fine film thickness of about 3 μm or less to a film thickness of about 4 μm on the substrate side up to about 16 μm from the surface side in the film thickness of about 20 μm. A hole was confirmed. After the treatment, it was immersed in an STS-21 titanium oxide dispersion (Ishihara Sangyo Co., Ltd., average particle size 20 nm) for 15 minutes and then dried to obtain a magnesium metal material having titanium oxide immobilized on the surface.
実施例1と同じ圧延材を用い、前処理として機械的処理の乾式ホーニング(鉄粉#100、圧力0.25MPa、作業時間1分)を行った後、同様にして脱脂、酸処理し、同一電解条件で陽極酸化を行い、得られた材料に光触媒を実施例1と同様の方法で担持固定化した。
The same rolled material as in Example 1 was used, and mechanical treatment dry honing (
前処理として、機械的処理の湿式ホーニング(ガラスビーズ、#100、圧力0.25MPa、作業時間1分)を行い、後は実施例2と同様にして光触媒を固定化した。 As the pretreatment, wet honing (glass beads, # 100, pressure 0.25 MPa, working time 1 minute) of mechanical treatment was performed, and thereafter the photocatalyst was immobilized in the same manner as in Example 2.
使用材料及び陽極酸化皮膜処理を実施例1と同様にし、光触媒を担持固定化する方法は製品をSUSの真空容器にいれ、4mmHgに減圧し、20分保持し、保持後STS‐21酸化チタン分散液(石原産業(株)製、平均粒子径20nm)を、容器内の製品が完全に浸漬されるまで注入し、15分保持後取出し乾燥した。 The material used and the anodic oxide film treatment were the same as in Example 1, and the photocatalyst was supported and immobilized by placing the product in a SUS vacuum container, reducing the pressure to 4 mmHg, holding for 20 minutes, and holding the STS-21 titanium oxide dispersed The liquid (Ishihara Sangyo Co., Ltd., average particle size 20 nm) was poured in until the product in the container was completely immersed, held for 15 minutes, taken out and dried.
(実施例5)実施例4において、光触媒の担持固定化の際に、容器内の製品が酸化チタン分散液に浸漬された状態で、更に25KHzの超音波で15分処理を施した後、取り出し乾燥した。
(Example 5) In Example 4, when the photocatalyst was supported and fixed, the product in the container was immersed in the titanium oxide dispersion, and further subjected to treatment with ultrasonic waves of 25 KHz for 15 minutes. Removed and dried.
実施例5において、陽極酸化処理、実施例5の光触媒担持固定化処理後、0.4MPaにて加圧15分後取り出した。
触媒の担持固定化処理を行なった。
In Example 5, after anodic oxidation treatment and photocatalyst carrying and fixing treatment in Example 5, the sample was taken out after pressurizing at 0.4 MPa for 15 minutes.
The catalyst was immobilized and fixed.
比較例として既存の同一試験片を脱脂、酸処理後STS‐21の浴中に15分浸漬後乾燥した。 As a comparative example, the same existing test piece was degreased, acid-treated, immersed in an STS-21 bath for 15 minutes, and then dried.
これらの実施例1〜6と比較例の評価は次の方法で行った。各々の実施例で得た製品を容積2.8Lの閉鎖箱に入れ、初期流量150ml/分でアセトアルデヒドを3分流した。次にブラックライトで0.5mw/平方センチメートルの光照射をした。この段階でのアセトアルデヒドの流量は100ml/分とした。他の実施例についても同様に行った。経過時間毎にアセトアルデヒドの含有量をガスクロマトグラフィーで分析した。結果を図1に示した。従来の光触媒担持固定化法より優れていることが明らかである。 These Examples 1 to 6 and Comparative Example were evaluated by the following method. The product obtained in each example was placed in a closed box having a volume of 2.8 L, and acetaldehyde was allowed to flow for 3 minutes at an initial flow rate of 150 ml / min. Next, light irradiation of 0.5 mw / square centimeter was performed with a black light. The flow rate of acetaldehyde at this stage was 100 ml / min. It carried out similarly about the other Example. The content of acetaldehyde was analyzed by gas chromatography at each elapsed time. The results are shown in FIG. It is clear that the method is superior to the conventional photocatalyst-supported immobilization method.
本発明のマグネシウム材料は抗菌、防黴、防汚材料として、又は有害もしくは悪臭ガス等の分解材、脱臭材などに使用できる。 The magnesium material of the present invention can be used as an antibacterial, antifungal or antifouling material, or as a decomposition or deodorizing material such as harmful or offensive odor gas.
1:比較例 2:実施例1 3:実施例3 4:実施例4
5:実施例5 6:実施例2 7:実施例6
1: Comparative Example 2: Example 1 3: Example 3 4: Example 4
5: Example 5 6: Example 2 7: Example 6
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