JP2005079130A - 薄膜配線層 - Google Patents

薄膜配線層 Download PDF

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Publication number
JP2005079130A
JP2005079130A JP2003304255A JP2003304255A JP2005079130A JP 2005079130 A JP2005079130 A JP 2005079130A JP 2003304255 A JP2003304255 A JP 2003304255A JP 2003304255 A JP2003304255 A JP 2003304255A JP 2005079130 A JP2005079130 A JP 2005079130A
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JP
Japan
Prior art keywords
wiring layer
layer
thin film
atomic
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2003304255A
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English (en)
Japanese (ja)
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JP2005079130A5 (https=
Inventor
Hideo Murata
英夫 村田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Hitachi Metals Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Hitachi Metals Ltd filed Critical Hitachi Metals Ltd
Priority to JP2003304255A priority Critical patent/JP2005079130A/ja
Publication of JP2005079130A publication Critical patent/JP2005079130A/ja
Publication of JP2005079130A5 publication Critical patent/JP2005079130A5/ja
Withdrawn legal-status Critical Current

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  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Thin Film Transistor (AREA)
  • Liquid Crystal (AREA)
  • Electroluminescent Light Sources (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
JP2003304255A 2003-08-28 2003-08-28 薄膜配線層 Withdrawn JP2005079130A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003304255A JP2005079130A (ja) 2003-08-28 2003-08-28 薄膜配線層

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003304255A JP2005079130A (ja) 2003-08-28 2003-08-28 薄膜配線層

Publications (2)

Publication Number Publication Date
JP2005079130A true JP2005079130A (ja) 2005-03-24
JP2005079130A5 JP2005079130A5 (https=) 2006-08-24

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ID=34407993

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JP2003304255A Withdrawn JP2005079130A (ja) 2003-08-28 2003-08-28 薄膜配線層

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JP (1) JP2005079130A (https=)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006310814A (ja) * 2005-03-29 2006-11-09 Hitachi Metals Ltd 薄膜配線層
KR100754339B1 (ko) 2005-07-29 2007-08-31 쿄세라 코포레이션 유기 ｅｌ 소자 및 그 제조방법
KR101358529B1 (ko) 2011-08-19 2014-02-05 히타치 긴조쿠 가부시키가이샤 전자부품용 적층 배선막 및 피복층 형성용 스퍼터링 타겟재
JP5591411B1 (ja) * 2013-07-03 2014-09-17 パイオニア株式会社 有機ｅｌ装置
CN104064549A (zh) * 2013-03-22 2014-09-24 日立金属株式会社 电子部件用层叠布线膜和覆盖层形成用溅射靶材
CN104425416A (zh) * 2013-09-10 2015-03-18 日立金属株式会社 层叠布线膜和其制造方法以及Ni合金溅射靶材
JP2016157925A (ja) * 2015-02-25 2016-09-01 日立金属株式会社 電子部品用積層配線膜および被覆層形成用スパッタリングターゲット材

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006310814A (ja) * 2005-03-29 2006-11-09 Hitachi Metals Ltd 薄膜配線層
KR100754339B1 (ko) 2005-07-29 2007-08-31 쿄세라 코포레이션 유기 ｅｌ 소자 및 그 제조방법
KR101358529B1 (ko) 2011-08-19 2014-02-05 히타치 긴조쿠 가부시키가이샤 전자부품용 적층 배선막 및 피복층 형성용 스퍼터링 타겟재
CN104064549A (zh) * 2013-03-22 2014-09-24 日立金属株式会社 电子部件用层叠布线膜和覆盖层形成用溅射靶材
KR101553472B1 (ko) 2013-03-22 2015-09-15 히타치 긴조쿠 가부시키가이샤 전자 부품용 적층 배선막 및 피복층 형성용 스퍼터링 타깃재
CN104064549B (zh) * 2013-03-22 2016-08-31 日立金属株式会社 电子部件用层叠布线膜和覆盖层形成用溅射靶材
JP5591411B1 (ja) * 2013-07-03 2014-09-17 パイオニア株式会社 有機ｅｌ装置
CN104425416A (zh) * 2013-09-10 2015-03-18 日立金属株式会社 层叠布线膜和其制造方法以及Ni合金溅射靶材
JP2016157925A (ja) * 2015-02-25 2016-09-01 日立金属株式会社 電子部品用積層配線膜および被覆層形成用スパッタリングターゲット材

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