JP2005068546A - ３次元周期性階層構造をもつ複合合金とその製造方法 - Google Patents

３次元周期性階層構造をもつ複合合金とその製造方法 Download PDF

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JP2005068546A
JP2005068546A JP2003343794A JP2003343794A JP2005068546A JP 2005068546 A JP2005068546 A JP 2005068546A JP 2003343794 A JP2003343794 A JP 2003343794A JP 2003343794 A JP2003343794 A JP 2003343794A JP 2005068546 A JP2005068546 A JP 2005068546A
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composite alloy
phase
alloy
hierarchical structure
potential
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JP2005068546A5 (enExample
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Toru Yamazaki
徹 山崎
Takayasu Mochizuki
孝晏 望月
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Priority to JP2003343794A priority Critical patent/JP2005068546A/ja
Priority to US10/924,970 priority patent/US7473328B2/en
Publication of JP2005068546A publication Critical patent/JP2005068546A/ja
Publication of JP2005068546A5 publication Critical patent/JP2005068546A5/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/03—Alloys based on nickel or cobalt based on nickel
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C49/00—Alloys containing metallic or non-metallic fibres or filaments
    • C22C49/02—Alloys containing metallic or non-metallic fibres or filaments characterised by the matrix material
    • C22C49/08—Iron group metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/003—3D structures, e.g. superposed patterned layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/006—Nanostructures, e.g. using aluminium anodic oxidation templates [AAO]
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/04—Electroplating with moving electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/619—Amorphous layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Nanotechnology (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating Methods And Accessories (AREA)
JP2003343794A 2003-08-26 2003-08-26 ３次元周期性階層構造をもつ複合合金とその製造方法 Pending JP2005068546A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003343794A JP2005068546A (ja) 2003-08-26 2003-08-26 ３次元周期性階層構造をもつ複合合金とその製造方法
US10/924,970 US7473328B2 (en) 2003-08-26 2004-08-25 Composite alloy having a three-dimensional periodic hierarchical structure and method of producing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003343794A JP2005068546A (ja) 2003-08-26 2003-08-26 ３次元周期性階層構造をもつ複合合金とその製造方法

Publications (2)

Publication Number Publication Date
JP2005068546A true JP2005068546A (ja) 2005-03-17
JP2005068546A5 JP2005068546A5 (enExample) 2005-05-26

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JP2003343794A Pending JP2005068546A (ja) 2003-08-26 2003-08-26 ３次元周期性階層構造をもつ複合合金とその製造方法

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US (1) US7473328B2 (enExample)
JP (1) JP2005068546A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1696353B (zh) * 2005-05-16 2010-05-12 山东科技大学 一种金属材料表面纳米化方法
JP2021038445A (ja) * 2019-09-04 2021-03-11 公立大学法人兵庫県立大学 多層材及びその製造方法、多層材メッキ方法

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005146405A (ja) * 2003-11-14 2005-06-09 Toru Yamazaki 電析積層合金薄板とその製造方法
BE1018130A3 (fr) * 2008-09-19 2010-05-04 Magotteaux Int Materiau composite hierarchique.
EP2754735B1 (en) * 2013-01-11 2020-07-22 Elsyca N.V. A device suitable for the electrochemical processing of an object, and a method for the electrochemical processing of an object
US9677191B2 (en) 2013-01-17 2017-06-13 Elsyca N.V. Device suitable for the electrochemical processing of an object, a holder suitable for such a device, and a method for the electrochemical processing of an object
US10465307B2 (en) * 2015-11-19 2019-11-05 Fabric8Labs, Inc. Apparatus for electrochemical additive manufacturing
CN110172655B (zh) * 2019-04-19 2021-05-04 武汉理工大学 表层粗晶内部纳米晶或超细晶的梯度金属材料及制备方法
US11512404B2 (en) 2019-08-23 2022-11-29 Fabric8Labs, Inc. Matrix-controlled printhead for an electrochemical additive manufacturing system
US10914000B1 (en) 2019-08-23 2021-02-09 Fabric8Labs, Inc. Method for manufacturing a printhead of an electrochemical additive manufacturing system
US11680330B2 (en) 2021-07-22 2023-06-20 Fabric8Labs, Inc. Electrochemical-deposition apparatuses and associated methods of electroplating a target electrode
US11795561B2 (en) 2021-08-02 2023-10-24 Fabric8Labs, Inc. Electrochemical-deposition system, apparatus, and method using optically-controlled deposition electrodes
US11920251B2 (en) 2021-09-04 2024-03-05 Fabric8Labs, Inc. Systems and methods for electrochemical additive manufacturing of parts using multi-purpose build plate
US12264405B2 (en) 2021-09-20 2025-04-01 Fabric8Labs, Inc. Methods for electrochemical additive manufacturing while modifying electrolyte solutions
US11970783B2 (en) 2021-09-23 2024-04-30 Fabric8Labs, Inc. Systems and methods for manufacturing electrical components using electrochemical deposition
US11745432B2 (en) 2021-12-13 2023-09-05 Fabric8Labs, Inc. Using target maps for current density control in electrochemical-additive manufacturing systems
US12104264B2 (en) 2021-12-17 2024-10-01 Fabric8Labs, Inc. Systems and methods for electrochemical additive manufacturing of parts using capacitive sensing
US20240218546A1 (en) 2022-12-31 2024-07-04 Fabric8Labs, Inc. Electrophoretically-deposited masks on electrode arrays
US12467153B2 (en) 2023-01-05 2025-11-11 Fabric8Labs, Inc. Electrochemical-additive manufacturing systems comprising membranes

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5641391A (en) * 1995-05-15 1997-06-24 Hunter; Ian W. Three dimensional microfabrication by localized electrodeposition and etching
US6261469B1 (en) * 1998-10-13 2001-07-17 Honeywell International Inc. Three dimensionally periodic structural assemblies on nanometer and longer scales
US6409907B1 (en) * 1999-02-11 2002-06-25 Lucent Technologies Inc. Electrochemical process for fabricating article exhibiting substantial three-dimensional order and resultant article
JP2001342591A (ja) 2000-03-27 2001-12-14 Takayasu Mochizuki 高強度合金及びその製造方法並びにその高強度合金を被覆してなる金属とその高強度合金を用いたマイクロ構造体
US20020197042A1 (en) * 2001-04-06 2002-12-26 Shigeo Kittaka Optical device, and wavelength multiplexing optical recording head
GB2390230B (en) * 2002-06-07 2005-05-25 Murata Manufacturing Co Applications of a three dimensional structure
JP4612844B2 (ja) * 2004-02-23 2011-01-12 キヤノン株式会社 ３次元周期構造及びそれを有する機能素子

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1696353B (zh) * 2005-05-16 2010-05-12 山东科技大学 一种金属材料表面纳米化方法
JP2021038445A (ja) * 2019-09-04 2021-03-11 公立大学法人兵庫県立大学 多層材及びその製造方法、多層材メッキ方法
JP7391356B2 (ja) 2019-09-04 2023-12-05 兵庫県公立大学法人 多層材及びその製造方法、多層材メッキ方法

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US7473328B2 (en) 2009-01-06

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