JP2005064324A - 微細形状の加工方法及び光学素子 - Google Patents
微細形状の加工方法及び光学素子 Download PDFInfo
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- JP2005064324A JP2005064324A JP2003294366A JP2003294366A JP2005064324A JP 2005064324 A JP2005064324 A JP 2005064324A JP 2003294366 A JP2003294366 A JP 2003294366A JP 2003294366 A JP2003294366 A JP 2003294366A JP 2005064324 A JP2005064324 A JP 2005064324A
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003294366A JP2005064324A (ja) | 2003-08-18 | 2003-08-18 | 微細形状の加工方法及び光学素子 |
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| Application Number | Priority Date | Filing Date | Title |
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| JP2003294366A JP2005064324A (ja) | 2003-08-18 | 2003-08-18 | 微細形状の加工方法及び光学素子 |
Publications (2)
| Publication Number | Publication Date |
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| JP2005064324A true JP2005064324A (ja) | 2005-03-10 |
| JP2005064324A5 JP2005064324A5 (enExample) | 2006-08-24 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2003294366A Pending JP2005064324A (ja) | 2003-08-18 | 2003-08-18 | 微細形状の加工方法及び光学素子 |
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Cited By (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007125799A (ja) * | 2005-11-04 | 2007-05-24 | Konica Minolta Holdings Inc | 微細構造転写方法、微細構造転写装置、光学素子製造方法及びモールド |
| WO2007139209A1 (en) * | 2006-05-31 | 2007-12-06 | Semiconductor Energy Laboratory Co., Ltd. | Display device and electronic device |
| JP2009151062A (ja) * | 2007-12-20 | 2009-07-09 | Asti Corp | プラスチック製微細構造体製造方法とプラスチック製微細構造体 |
| US7659669B2 (en) * | 2006-12-05 | 2010-02-09 | Semiconductor Energy Laboratory Co., Ltd. | Plasma display panel and field emission display |
| JP2010029976A (ja) * | 2008-07-29 | 2010-02-12 | Dainippon Printing Co Ltd | 微細構造体形成方法 |
| US7839061B2 (en) | 2006-12-05 | 2010-11-23 | Semiconductor Energy Laboratory Co., Ltd. | Plasma display panel and field emission display |
| US7859627B2 (en) * | 2006-12-05 | 2010-12-28 | Semiconductor Energy Laboratory Co., Ltd. | Antireflective film including pyramidal projections and display device including antireflective film comprising pyramidal projections |
| US8053987B2 (en) | 2006-12-05 | 2011-11-08 | Semiconductor Energy Laboratory Co., Ltd. | Plasma display panel and field emission display |
| US8102494B2 (en) | 2006-12-05 | 2012-01-24 | Semiconductor Energy Laboratory Co., Ltd. | Anti-reflection film and display device |
| US8164726B2 (en) | 2006-12-05 | 2012-04-24 | Semiconductor Energy Laboratory Co., Ltd. | Antireflection film and display device |
| US8164245B2 (en) | 2006-12-05 | 2012-04-24 | Semiconductor Energy Laboratory Co., Ltd. | Plasma display panel and field emission display having anti-reflection layer comprising pyramidal projections and a protective layer |
| US8723768B2 (en) | 2006-05-31 | 2014-05-13 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
| CN103913789A (zh) * | 2014-04-03 | 2014-07-09 | 大连理工大学 | 金属基底上制备高深宽比金属微光栅的方法 |
| KR101876047B1 (ko) * | 2015-09-01 | 2018-07-06 | 아즈빌주식회사 | 미세 기계 장치 및 그 제조 방법 |
| CN109427607A (zh) * | 2017-08-25 | 2019-03-05 | 东京毅力科创株式会社 | 处理被处理体的方法 |
| CN109437085A (zh) * | 2018-10-25 | 2019-03-08 | 西南交通大学 | 一种无损伤摩擦诱导纳米加工方法 |
| CN111158073A (zh) * | 2019-12-05 | 2020-05-15 | 深圳珑璟光电技术有限公司 | 利用电子束光刻技术进行光栅纳米压印模板制作方法 |
| WO2025204358A1 (ja) * | 2024-03-27 | 2025-10-02 | 東京エレクトロン株式会社 | 成膜方法及び成膜装置 |
-
2003
- 2003-08-18 JP JP2003294366A patent/JP2005064324A/ja active Pending
Cited By (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007125799A (ja) * | 2005-11-04 | 2007-05-24 | Konica Minolta Holdings Inc | 微細構造転写方法、微細構造転写装置、光学素子製造方法及びモールド |
| WO2007139209A1 (en) * | 2006-05-31 | 2007-12-06 | Semiconductor Energy Laboratory Co., Ltd. | Display device and electronic device |
| US8723768B2 (en) | 2006-05-31 | 2014-05-13 | Semiconductor Energy Laboratory Co., Ltd. | Display device |
| US8593603B2 (en) | 2006-05-31 | 2013-11-26 | Semiconductor Energy Laboratory Co., Ltd. | Display device and electronic device |
| US8164245B2 (en) | 2006-12-05 | 2012-04-24 | Semiconductor Energy Laboratory Co., Ltd. | Plasma display panel and field emission display having anti-reflection layer comprising pyramidal projections and a protective layer |
| US7659669B2 (en) * | 2006-12-05 | 2010-02-09 | Semiconductor Energy Laboratory Co., Ltd. | Plasma display panel and field emission display |
| US7859627B2 (en) * | 2006-12-05 | 2010-12-28 | Semiconductor Energy Laboratory Co., Ltd. | Antireflective film including pyramidal projections and display device including antireflective film comprising pyramidal projections |
| US8053987B2 (en) | 2006-12-05 | 2011-11-08 | Semiconductor Energy Laboratory Co., Ltd. | Plasma display panel and field emission display |
| US8102494B2 (en) | 2006-12-05 | 2012-01-24 | Semiconductor Energy Laboratory Co., Ltd. | Anti-reflection film and display device |
| US8164726B2 (en) | 2006-12-05 | 2012-04-24 | Semiconductor Energy Laboratory Co., Ltd. | Antireflection film and display device |
| US7839061B2 (en) | 2006-12-05 | 2010-11-23 | Semiconductor Energy Laboratory Co., Ltd. | Plasma display panel and field emission display |
| US8237346B2 (en) | 2006-12-05 | 2012-08-07 | Semiconductor Energy Laboratory Co., Ltd. | Field emission display with antireflective layer |
| US8237349B2 (en) | 2006-12-05 | 2012-08-07 | Semiconductor Energy Laboratory Co., Ltd. | Light-emitting device with antireflective film |
| JP2009151062A (ja) * | 2007-12-20 | 2009-07-09 | Asti Corp | プラスチック製微細構造体製造方法とプラスチック製微細構造体 |
| JP2010029976A (ja) * | 2008-07-29 | 2010-02-12 | Dainippon Printing Co Ltd | 微細構造体形成方法 |
| CN103913789A (zh) * | 2014-04-03 | 2014-07-09 | 大连理工大学 | 金属基底上制备高深宽比金属微光栅的方法 |
| KR101876047B1 (ko) * | 2015-09-01 | 2018-07-06 | 아즈빌주식회사 | 미세 기계 장치 및 그 제조 방법 |
| CN109427607A (zh) * | 2017-08-25 | 2019-03-05 | 东京毅力科创株式会社 | 处理被处理体的方法 |
| CN109427607B (zh) * | 2017-08-25 | 2022-12-23 | 东京毅力科创株式会社 | 处理被处理体的方法 |
| CN109437085A (zh) * | 2018-10-25 | 2019-03-08 | 西南交通大学 | 一种无损伤摩擦诱导纳米加工方法 |
| CN111158073A (zh) * | 2019-12-05 | 2020-05-15 | 深圳珑璟光电技术有限公司 | 利用电子束光刻技术进行光栅纳米压印模板制作方法 |
| WO2025204358A1 (ja) * | 2024-03-27 | 2025-10-02 | 東京エレクトロン株式会社 | 成膜方法及び成膜装置 |
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