JP2005043330A - X-ray image detector - Google Patents

X-ray image detector Download PDF

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JP2005043330A
JP2005043330A JP2003280370A JP2003280370A JP2005043330A JP 2005043330 A JP2005043330 A JP 2005043330A JP 2003280370 A JP2003280370 A JP 2003280370A JP 2003280370 A JP2003280370 A JP 2003280370A JP 2005043330 A JP2005043330 A JP 2005043330A
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layer
ray image
substrate
metal layer
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Yoshio Uejima
好雄 上島
Masaya Tatsumi
正哉 巽
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J Morita Manufaturing Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a miniaturized X-ray image detector superior in impact durability. <P>SOLUTION: The X-ray image detector 10, in which an X-ray imaging part 24 for converting an X-ray image into an electrical signal is housed in a container 14, includes a substrate 22 for supporting the X-ray imaging part. The substrate is provided with a base material layer 40, having an X-ray shield function, circuit layers 44 and 48 for transmitting the signal from the X-ray imaging part, and electrically insulating layers 42 and 46 brought into contact with and sandwiched between the X-ray base material layer and the circuit layers. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は、X線画像検出器に関し、例えば、口腔内部位などのX線像を電気信号として検出して画像表示するためのX線画像検出器に関する。本発明はまた、X線画像検出器において、X線撮像部を支持する基板の製造方法に関する。   The present invention relates to an X-ray image detector, for example, an X-ray image detector for detecting and displaying an X-ray image of an intraoral site as an electrical signal. The present invention also relates to a method of manufacturing a substrate that supports an X-ray imaging unit in an X-ray image detector.

従来、口腔内部位のX線画像を電気信号に変換して画像表示するために利用されるX線画像センサが、特開平5−130991号公報、特開平7−280944号公報で提案されている。また、特開平10−282243号公報は、基板にセラミックを用いることを開示している。
特開平5−130991号公報 特開平7−280944号公報 特開平10−282243号公報
Conventionally, an X-ray image sensor used for converting an X-ray image of an intraoral site into an electrical signal and displaying the image has been proposed in Japanese Patent Laid-Open Nos. 5-130991 and 7-280944. . Japanese Patent Application Laid-Open No. 10-282243 discloses the use of ceramic for the substrate.
Japanese Patent Laid-Open No. 5-130991 JP-A-7-280944 JP-A-10-282243

これらのX線画像センサは、一般に、密閉容器の内部に収容された基板上に、容器を透過したX線に反応して光を発する蛍光体と、蛍光体で生じた光を搬送する光搬送部材と、光搬送部材で搬送された光を受けてX線像に対応する電気信号を作成する撮像素子を積層して構成されている。また、基板は、撮像素子で得られた信号を外部機器に送信するために、電気回路層と、容器内に引き込まれたケーブルの一端を電気回路層に接続するためのコネクタを支持している。   These X-ray image sensors generally have a phosphor that emits light in response to X-rays transmitted through a container, and a light carrier that carries light generated by the phosphor on a substrate housed in a sealed container. A member and an image pickup device that receives the light transported by the light transporting member and generates an electrical signal corresponding to the X-ray image are stacked. The substrate also supports an electrical circuit layer and a connector for connecting one end of the cable drawn into the container to the electrical circuit layer in order to transmit a signal obtained by the imaging device to an external device. .

しかし、このような従来のX線画像センサでは、基板の主要部分がX線を透過するセラミックスで構成されている。そのため、基板の裏面(撮像素子等を支持する面の反対側にある面)から撮像素子に散乱X線が侵入するのを防止するために、別途X線遮蔽層を基板裏面側に配置する必要がある。また、セラミックスは衝撃耐久性が低いため、落下等の事故により破損することがある。そして、基板であるセラミックスが破損した場合、そのセラミックス基板上に形成されている回路が短絡し、そこで発熱するという問題もある。さらに、別途設けられるX線遮蔽層や、破損を防止するためにセラミックス基板の厚みをある程度以上確保しなければならない等の必要から、基板の厚みが厚くなり、さらにそのために検出器そのものが大きくなる。   However, in such a conventional X-ray image sensor, the main part of the substrate is made of ceramics that transmit X-rays. Therefore, in order to prevent scattered X-rays from entering the image sensor from the back surface of the substrate (the surface opposite to the surface supporting the image sensor, etc.), it is necessary to separately arrange an X-ray shielding layer on the substrate back surface side. There is. In addition, ceramics have low impact durability and may be damaged by accidents such as dropping. And when the ceramic which is a board | substrate is damaged, the circuit currently formed on the ceramic board | substrate short-circuits, and there also exists a problem that it heat-generates there. Furthermore, since the X-ray shielding layer provided separately and the necessity of ensuring a certain thickness of the ceramic substrate to prevent breakage are required, the thickness of the substrate increases, and the detector itself increases accordingly. .

特に、口腔内に入れてX線を検出するX線画像検出器として利用する場合は、口腔内の空間が限られているため、できるだけ薄く小型であることが要求され、一方、検出器を薄く小型にするために基板を薄くすれば上記のように衝撃耐久性が低くなるので、充分な強度を確保せねばならないという、いわば相反する要求がある。
そこで、本発明は、衝撃耐久性に優れた、薄く小型のX線画像検出器を提供することを目的とする。
In particular, when it is used as an X-ray image detector for detecting X-rays in the oral cavity, it is required to be as thin and small as possible because the space in the oral cavity is limited. If the substrate is made thinner in order to reduce the size, the impact durability is lowered as described above, so that there is a conflicting demand that a sufficient strength must be ensured.
Therefore, an object of the present invention is to provide a thin and small X-ray image detector excellent in impact durability.

このような課題に対応して、本発明は、X線像を電気信号に変換するX線撮像部を容器に収めたX線画像検出器において、X線撮像部を支持する基板が、X線遮蔽機能を有する基材層と、X線撮像部からの信号を伝達する回路層と、基材層と回路層に接触挟持された電気絶縁層を備えていることを特徴とする。基材層は、X線遮蔽層と金属層で形成していもよいし、X線遮蔽層と、金属層と、X線遮蔽層と金属層の間に挟持された電気絶縁層で構成してもよい。基材層は、ニッケルを含んだ合金、銀、タングステン、タングステンを含んだ合金または炭素鋼のいずれかで形成することができる。または基材層がX線遮蔽層と金属層を備えている場合におけるX線遮蔽層は、ニッケルを含んだ合金、銀、タングステン、タングステンを含んだ合金、金、鉛または炭素鋼のいずれかで形成することができる。金属層は、ニッケルを含んだ合金、銀、タングステン、タングステンを含んだ合金、アルミニウム、アルミニウムを含んだ合金、マグネシウムを含んだ合金、鉄、炭素鋼、ステンレス鋼、クロム鋼、銅と亜鉛との合金のいずれかで形成することができる。X線遮蔽機能を有する金属製の基材層をグランドに接続する導電路を設けても良い。X線像を電気信号に変換するX線撮像部を容器に収めたX線画像検出器では、X線撮像部を支持する基板をX線遮蔽機能を有する金属で構成してもよい。   In response to such a problem, the present invention provides an X-ray image detector in which an X-ray imaging unit that converts an X-ray image into an electrical signal is contained in a container. It is characterized by comprising a base material layer having a shielding function, a circuit layer for transmitting a signal from the X-ray imaging unit, and an electrical insulating layer held in contact with the base material layer and the circuit layer. The base material layer may be formed of an X-ray shielding layer and a metal layer, or may be composed of an X-ray shielding layer, a metal layer, and an electric insulating layer sandwiched between the X-ray shielding layer and the metal layer. Also good. The base material layer can be formed of any of an alloy containing nickel, silver, tungsten, an alloy containing tungsten, or carbon steel. Alternatively, when the base material layer includes an X-ray shielding layer and a metal layer, the X-ray shielding layer is made of an alloy containing nickel, silver, tungsten, an alloy containing tungsten, gold, lead, or carbon steel. Can be formed. The metal layer is composed of nickel alloy, silver, tungsten, tungsten alloy, aluminum, aluminum alloy, magnesium alloy, iron, carbon steel, stainless steel, chrome steel, copper and zinc It can be formed from any of the alloys. A conductive path for connecting a metal base layer having an X-ray shielding function to the ground may be provided. In an X-ray image detector in which an X-ray imaging unit that converts an X-ray image into an electrical signal is contained in a container, the substrate that supports the X-ray imaging unit may be made of a metal having an X-ray shielding function.

本発明の他の形態の基板の製造方法は、X線像を電気信号に変換するX線撮像部を容器に収めたX線画像検出器における、X線撮像部を支持する基板の製造方法において、X線遮蔽性を有する金属の層と導電金属層の間に電気絶縁性材料を挟持して互いに固定し、導電金属層を部分的に除去して回路を形成するものである。また、他の形態の基板の製造方法は、X線遮蔽性を有する金属の層と金属層を隣接させ、X線遮蔽性を有する金属の層または金属層と導電金属層との間に電気絶縁性材料を挟持して互いに固定し、導電金属層を部分的に除去して回路を形成するものである。さらに、他の形態の基板の製造方法は、X線遮蔽性を有する金属の層と金属層との間に電気絶縁性材料を挟み、上記X線遮蔽性を有する金属の層または上記金属層と導電金属層との間に電気絶縁性材料を挟み、全て互いに固定し、上記導電金属層の部分的に除去して回路を形成するものである。   According to another aspect of the present invention, there is provided a method for manufacturing a substrate in a method for manufacturing a substrate that supports an X-ray imaging unit in an X-ray image detector in which an X-ray imaging unit that converts an X-ray image into an electrical signal is contained in a container. A circuit is formed by sandwiching and electrically fixing an electrically insulating material between a metal layer having X-ray shielding properties and a conductive metal layer, and partially removing the conductive metal layer. In another method of manufacturing a substrate, an X-ray shielding metal layer and a metal layer are adjacent to each other, and an electric insulation is provided between the X-ray shielding metal layer or the metal layer and the conductive metal layer. The conductive material is sandwiched and fixed to each other, and the conductive metal layer is partially removed to form a circuit. Furthermore, in another embodiment of the method for manufacturing a substrate, an electrically insulating material is sandwiched between a metal layer having an X-ray shielding property and the metal layer, and the metal layer having the X-ray shielding property or the metal layer An electrically insulating material is sandwiched between the conductive metal layers, all are fixed to each other, and the conductive metal layer is partially removed to form a circuit.

このように構成されたX線画像検出器及びその基板の製造方法によれば、その基板の主要部がセラミックスに比べて衝撃耐久性に優れた金属製の基材層で構成されているので、基板と検出器が薄型化及び小型化できるとともに、検出器の衝撃耐久性が向上する。   According to the X-ray image detector configured as described above and the method for manufacturing the substrate, the main part of the substrate is configured with a metal base layer that is superior in impact durability to ceramics. The substrate and the detector can be reduced in thickness and size, and the impact durability of the detector is improved.

図1A〜図1Cは、本発明の実施の形態1に係るX線画像検出器10を示す。このX線画像検出器10は、口腔内の撮影部位(例えば、歯及び歯肉)に検出面12(図1Bと図1Cに示す検出器の下面)を当て、撮影部位の反対側から放射されたX線を検出することで、撮影部位のX線像を得るものである。そのような目的から、X線検出器10の主要部を構成する容器14は、口腔内に挿入できる大きさ(例えば、横幅38.5mm、奥行25mm、高さ7.5mmである。但し、高さについては、図1Bの右上側に示される、信号ケーブルを収容するために隆起した部分は除く。)を有し、X線が透過可能な材料で形成された2つの容器部分16,18を組み合わせて構成されている。容器14の内側に収容されている、X線撮像部となるアセンブリ20は、概略、基板22と、基板22の一方の表面に支持された撮像部24と、基板22の他方の表面に支持された電気接続部26からなる。   1A to 1C show an X-ray image detector 10 according to Embodiment 1 of the present invention. The X-ray image detector 10 is irradiated from the opposite side of the imaging region by applying the detection surface 12 (the lower surface of the detector shown in FIGS. 1B and 1C) to the imaging region (for example, teeth and gingiva) in the oral cavity. By detecting X-rays, an X-ray image of the imaging region is obtained. For such a purpose, the container 14 constituting the main part of the X-ray detector 10 has a size that can be inserted into the oral cavity (for example, a width of 38.5 mm, a depth of 25 mm, and a height of 7.5 mm. However, the height is high. 2B, except for the raised portion for accommodating the signal cable shown on the upper right side of FIG. 1B.) And having two container parts 16, 18 formed of a material that is transparent to X-rays. It is configured in combination. The assembly 20, which is housed inside the container 14 and becomes an X-ray imaging unit, is roughly supported by the substrate 22, the imaging unit 24 supported on one surface of the substrate 22, and the other surface of the substrate 22. The electrical connection portion 26 is formed.

撮像部24は、検出面12から基板22に向かって順番に積層された3つの部材、すなわち、蛍光体(シンチレータ)28、光伝播素子30、電荷結合素子(CCD)32を有する。これらのうち、蛍光体28は、検出面12を透過したX線を受けて可視光を発するもので、例えば希土類元素化合物からなる。光伝播素子30は、蛍光体28と電荷結合素子32との間を光学的に接続するもので、多数の光ファイバを蛍光体28と電荷結合素子32との対向方向(図面の上下方向)に配置して構成されている。電荷結合素子32は、各光伝播素子30で搬送される光を受けてそれを電気信号に変換するもので、蛍光体28から放射される蛍光の2次元分布に対応した電気画像信号を作成する。
なお、本実施例ではCCDを撮像部24に用いているが、MОSセンサその他の撮像素子を適宜用いてよい。
The imaging unit 24 includes three members stacked in order from the detection surface 12 toward the substrate 22, that is, a phosphor (scintillator) 28, a light propagation element 30, and a charge coupled device (CCD) 32. Among these, the phosphor 28 emits visible light upon receiving X-rays transmitted through the detection surface 12, and is made of, for example, a rare earth element compound. The light propagating element 30 optically connects the phosphor 28 and the charge coupled device 32, and a large number of optical fibers are arranged in the opposing direction of the phosphor 28 and the charge coupled device 32 (vertical direction in the drawing). It is arranged and configured. The charge coupled device 32 receives light carried by each light propagation device 30 and converts it into an electrical signal, and creates an electrical image signal corresponding to the two-dimensional distribution of fluorescence emitted from the phosphor 28. .
In this embodiment, a CCD is used for the image pickup unit 24, but a MOS sensor or other image pickup element may be used as appropriate.

電気接続部26は、容器14の外部から内部に導入された信号ケーブル34の一端と基板22に設置されている回路部品36とを電気的に接続するコネクタ38を備えている。なお、本実施の形態では、X線画像検出器10を小型化するために、基板22を挟んで撮像部24の反対側に信号ケーブル34やコネクタ38等を配置しているが、基板22の片側に撮像部24と電気接続部26を配置してもよい。   The electrical connection portion 26 includes a connector 38 that electrically connects one end of the signal cable 34 introduced from the outside to the inside of the container 14 and the circuit component 36 installed on the substrate 22. In the present embodiment, in order to reduce the size of the X-ray image detector 10, the signal cable 34, the connector 38, and the like are arranged on the opposite side of the imaging unit 24 across the substrate 22. The imaging unit 24 and the electrical connection unit 26 may be arranged on one side.

基板22は、全体の厚さが約0.5mmであり、例えば、図1A〜1Cの一部を拡大した図1Dに示すように、金属製の基材層である金属基材層40を中心として、この金属基材層40の一方の面(図の上面)上に第1の電気絶縁層42と第1の回路層44を支持し、他方の面(図の下面)上に第2の電気絶縁層46と第2の回路層48を支持しており、図の上方にある第1の回路層44に図1Aと図1Bに示す回路部品36が電気的に接続され、図の下方にある第2の回路層48に電荷結合素子32が電気的に接続されている。   The substrate 22 has an overall thickness of about 0.5 mm. For example, as shown in FIG. 1D in which a part of FIGS. 1A to 1C is enlarged, the substrate 22 is centered on a metal base layer 40 that is a metal base layer. As described above, the first electric insulating layer 42 and the first circuit layer 44 are supported on one surface (upper surface in the figure) of the metal base layer 40, and the second surface (lower surface in the diagram) is supported on the second surface. The circuit component 36 shown in FIGS. 1A and 1B is electrically connected to the first circuit layer 44 at the upper side of the figure, and supports the electrical insulating layer 46 and the second circuit layer 48. The charge coupled device 32 is electrically connected to a certain second circuit layer 48.

なお、図1Dに示す基板22に対し、この基板22が完成した後、矢印24aで示す箇所(最下層の回路層48に隣接する場所)に撮像部24が固定される。そして、X線は矢印24aで示す方向から、撮像部に入射する。このようなX線の進行方向は、撮像部と矢印を図面から省略している図3A〜H,図4、図5、図6Aについても同様である。   1D is completed, after the substrate 22 is completed, the imaging unit 24 is fixed at a position indicated by an arrow 24a (a position adjacent to the lowermost circuit layer 48). Then, the X-ray enters the imaging unit from the direction indicated by the arrow 24a. The X-ray traveling direction is the same for FIGS. 3A to H, FIGS. 4, 5, and 6A in which the imaging unit and the arrow are omitted from the drawing.

金属基材層40は、ニッケルを含んだ合金、例えば、ニッケルを42%を含有すると共に残余成分として鉄を含む合金(商品名42アロイ)が好ましく利用できる。他に、銀、タングステン、銅タングステン等のタングステンを含んだ合金、炭素鋼等のX線遮蔽性を有する金属が利用できる。第1と第2の電気絶縁層42,46は、例えばエポキシ樹脂で形成される。第1と第2の回路層44,48は導電性金属(例えば、銅)の薄層からなり、エッチングなどの処理によって部分的に除去して必要な回路が形成されている。   The metal substrate layer 40 is preferably made of an alloy containing nickel, for example, an alloy containing 42% nickel and iron as the remaining component (trade name 42 alloy). In addition, an alloy containing tungsten such as silver, tungsten, and copper tungsten, and a metal having X-ray shielding properties such as carbon steel can be used. The first and second electrically insulating layers 42 and 46 are made of, for example, an epoxy resin. The first and second circuit layers 44 and 48 are formed of a thin layer of conductive metal (for example, copper), and a necessary circuit is formed by partial removal by a process such as etching.

図2、図3A〜図3Hを参照して基板22の製造方法を説明する。まず図2に示すように、X線遮蔽性を有する金属の層である金属基材層40となる薄い金属板からなるリードフレーム50を用意する。図に示すように、リードフレーム50には、例えば、金属基材層40の輪郭を形成する溝(スロット)52、導電金属層である第1と第2の回路層44,48を電気的に接続するための回路を形成するための孔54が予め形成されている。次に、図3Aに示すように、電気絶縁材料からなる第1と第2の電気絶縁層42,46となる絶縁材層(プリプレグ)56,58と、第1と第2の回路層44,48となる導電金属層60,62を金属基材層40の上面と裏面に配置し、上下から圧力を加えてプレスし、リードフレーム50に絶縁材層56,58と導電金属層60,62を一体化して積層体64とする。このとき加えられる圧力により、図3Bに示すように金属基材層40に孔54が形成されている場合、その孔54に電気絶縁性材料が入る。次に、図3Cに示すように、積層体64が孔54を有する場合、その孔54に対応する箇所をドリル(図示せず)で削り、スルーホール66を形成する。次に、図3Dに示すように、積層体64の表面の必要な箇所を銅めっき68する。このとき、スルーホール66の内面に銅めっき68が施され、回路層44,48が電気的に接続される。次に、表面と裏面の回路層44,48をエッチングしてパターン溝70を形成する。次に、図3Fに示すように、回路層44,48及びパターン溝70の所定領域を絶縁性のレジスト72で被覆する。次に、図3Gに示すように、レジスト72に被覆されることなく露出している回路層部分(回路パターン74)を金めっき76し、第1と第2の回路層44,48を完成する。最後に、図3Hに示すように、積層体64の外周縁部を切除して基板22が完成する。   A method for manufacturing the substrate 22 will be described with reference to FIGS. 2 and 3A to 3H. First, as shown in FIG. 2, a lead frame 50 made of a thin metal plate to be a metal base layer 40 which is a metal layer having X-ray shielding properties is prepared. As shown in the drawing, in the lead frame 50, for example, a groove (slot) 52 that forms the contour of the metal base layer 40, and first and second circuit layers 44 and 48 that are conductive metal layers are electrically connected. A hole 54 for forming a circuit for connection is formed in advance. Next, as shown in FIG. 3A, insulating material layers (prepregs) 56, 58 to be first and second electric insulating layers 42, 46 made of an electric insulating material, and first and second circuit layers 44, The conductive metal layers 60 and 62 to be 48 are arranged on the upper surface and the back surface of the metal base layer 40 and pressed by applying pressure from above and below, and the insulating material layers 56 and 58 and the conductive metal layers 60 and 62 are formed on the lead frame 50. The laminate 64 is integrated. When the hole 54 is formed in the metal base material layer 40 as shown in FIG. 3B due to the pressure applied at this time, the electrically insulating material enters the hole 54. Next, as shown in FIG. 3C, when the stacked body 64 has a hole 54, a portion corresponding to the hole 54 is shaved with a drill (not shown) to form a through hole 66. Next, as shown in FIG. 3D, copper plating 68 is performed on a necessary portion of the surface of the laminate 64. At this time, copper plating 68 is applied to the inner surface of the through hole 66, and the circuit layers 44 and 48 are electrically connected. Next, the pattern grooves 70 are formed by etching the circuit layers 44 and 48 on the front and back surfaces. Next, as shown in FIG. 3F, predetermined regions of the circuit layers 44 and 48 and the pattern groove 70 are covered with an insulating resist 72. Next, as shown in FIG. 3G, the circuit layer portion (circuit pattern 74) exposed without being covered with the resist 72 is gold-plated 76 to complete the first and second circuit layers 44 and 48. . Finally, as shown in FIG. 3H, the outer peripheral edge of the laminate 64 is cut away to complete the substrate 22.

このようにして形成された基板22に対し、図1A〜図1Cに示すように、一方の表面の回路層(図1Dに示す回路層48)には撮像部24が積層されて接着剤等により固定される。また、回路層48の金めっき76(図3H参照)と電荷結合素子32の電極が適当な配線(例えば、ワイヤボンディング)によって電気的に接続される。さらに、基板22の他方の表面ではそこに設けた金めっき76(図3H参照)に回路部品36が接続され、これにより電荷結合素子32とケーブル34がコネクタ38を介して電気的に接続される。以上のようにして組み合わされたアセンブリ20は、容器14に収容される。   As shown in FIGS. 1A to 1C, the imaging unit 24 is laminated on the circuit layer (the circuit layer 48 shown in FIG. 1D) on one surface of the substrate 22 formed in this manner, and an adhesive or the like is used. Fixed. Further, the gold plating 76 of the circuit layer 48 (see FIG. 3H) and the electrode of the charge coupled device 32 are electrically connected by appropriate wiring (for example, wire bonding). Further, the circuit component 36 is connected to the gold plating 76 (see FIG. 3H) provided on the other surface of the substrate 22, whereby the charge coupled device 32 and the cable 34 are electrically connected via the connector 38. . The assembly 20 combined as described above is accommodated in the container 14.

このように、上述したX線画像検出器10によれば、基板22の主要部が金属基材層40で構成されている。そして、金属基材層40はセラミックスよりも衝撃性に優れている。そのため、多少の衝撃が作用しても損傷したり、故障したりすることがない。また、セラミックで基材層が形成された従来のX線画像検出器に比べて、基板22及びX線画像検出器10を一段と薄く形成できる。例えば、図8A、8Bに示すように、撮像部24に隣接してX線遮蔽層100と基板102を積層し、基板102をセラミックス層104とその両側に配置された回路層(パターン層)106,108からなる積層体で形成した従来のX線画像検出器に比べて、図7A、7Bに示す構成の本発明のX線画像検出器では、基板22の厚さが格段に減少する。   Thus, according to the X-ray image detector 10 described above, the main part of the substrate 22 is constituted by the metal base layer 40. And the metal base material layer 40 is more excellent in impact than ceramics. Therefore, even if some impact is applied, it will not be damaged or broken. Further, the substrate 22 and the X-ray image detector 10 can be formed thinner than the conventional X-ray image detector in which the base material layer is formed of ceramic. For example, as shown in FIGS. 8A and 8B, the X-ray shielding layer 100 and the substrate 102 are stacked adjacent to the imaging unit 24, and the substrate 102 is a ceramic layer 104 and a circuit layer (pattern layer) 106 disposed on both sides thereof. , 108 in the X-ray image detector of the present invention configured as shown in FIGS. 7A and 7B, the thickness of the substrate 22 is significantly reduced.

また、上述の実施の形態1で示した基板22は、図1Dに示すように、基板22を支える骨格機能、すなわち、アセンブリ20を支持する作用を持つ骨格機能とX線遮蔽機能の両機能を備えた一つの金属基材層40と、この金属基材層40の一方の面に支持された第1の電気絶縁層42と第1の回路層44と、金属基材層40の他方の面に支持された第2の電気絶縁層46と第2の回路層48で構成されている。しかし、本発明はこのような層構造を有するものに限るものでなく、例えば、図4に示す実施の形態2の基板22のように、上述した実施の形態1における金属基材層40に対応する基材層74を、電気絶縁性材料からなる絶縁樹脂層76と、この絶縁樹脂層76の一方の面に接して配置されたX線遮蔽性を有する金属からなる層であるX線遮蔽層80と、絶縁樹脂層76の他方の面に接して配置された金属層78とで構成し、X線遮蔽層80を銀で形成するとともに金属層78を炭素鋼で形成し、これにより前者のX線遮蔽層80にX線遮蔽機能を持たせ、後者の金属層78に骨格機能を持たせてもよい。このように機能分離された基材層を用いた場合、X線遮蔽層80と金属層78を構成するリードフレームにはそれぞれ適当な溝や穴82,84が形成され、これらを重ね合わせたときに対応する溝や穴82,84が重なるようにしてある。   Further, as shown in FIG. 1D, the substrate 22 shown in the first embodiment has a skeletal function for supporting the substrate 22, that is, both a skeleton function having an effect of supporting the assembly 20 and an X-ray shielding function. One metal substrate layer 40 provided, a first electrical insulating layer 42 and a first circuit layer 44 supported on one surface of the metal substrate layer 40, and the other surface of the metal substrate layer 40 The second electrical insulating layer 46 and the second circuit layer 48 are supported by each other. However, the present invention is not limited to the one having such a layer structure, and corresponds to the metal base layer 40 in the first embodiment described above, for example, the substrate 22 in the second embodiment shown in FIG. An insulating resin layer 76 made of an electrically insulating material, and an X-ray shielding layer which is a layer made of a metal having X-ray shielding properties arranged in contact with one surface of the insulating resin layer 76. 80 and a metal layer 78 disposed in contact with the other surface of the insulating resin layer 76, the X-ray shielding layer 80 is formed of silver, and the metal layer 78 is formed of carbon steel, whereby the former The X-ray shielding layer 80 may have an X-ray shielding function, and the latter metal layer 78 may have a skeleton function. When the base material layer thus separated is used, appropriate grooves and holes 82 and 84 are formed in the lead frames constituting the X-ray shielding layer 80 and the metal layer 78, respectively, and these are overlapped. Grooves and holes 82 and 84 corresponding to are overlapped.

図4に示す実施の形態2において、金属層78は、炭素鋼以外に、上記の商品名42アロイ等のニッケルを含んだ合金、銀、タングステン、銅タングステン等のタングステンを含んだ合金、アルミニウム、アルミニウムと銅やマグネシウムとの合金等のアルミニウムを含んだ合金、マグネシウムと亜鉛やアルミニウムとの合金等のマグネシウムを含んだ合金、鉄、ステンレス鋼、クロム鋼、銅と亜鉛との合金等の強度を持つ金属を利用できる。なお、銅と亜鉛との合金には、加工性、耐磨耗性、耐久性、無害性の点で優れた銅・亜鉛・珪素の合金(例えば、商品名:エコブラス)が好適に利用できる。実施の形態2においては、X線遮蔽層80に、上記の商品名42アロイ等のニッケルを含んだ合金、タングステン、銅タングステン等のタングステンを含んだ合金、炭素鋼、金、鉛等のX線遮蔽性を有する金属が利用できる。また、実施の形態2では、X線遮蔽層80と金属層78との間で絶縁をすることは必要でなく、両者の間に介在する電気絶縁層76は除くことができる。この場合、X線遮蔽層80と金属層78が、第1の電気絶縁層42と第2の電気絶縁層46により、第1の回路層44と第2の回路層48から絶縁されていればよい。   In Embodiment 2 shown in FIG. 4, the metal layer 78 is made of an alloy containing nickel such as the above-mentioned trade name 42 alloy other than carbon steel, an alloy containing tungsten such as silver, tungsten, copper tungsten, aluminum, Strength of alloys containing aluminum such as alloys of aluminum and copper and magnesium, alloys containing magnesium such as alloys of magnesium and zinc and aluminum, iron, stainless steel, chromium steel, alloys of copper and zinc, etc. You can use the metal you have. As an alloy of copper and zinc, an alloy of copper, zinc, and silicon (for example, trade name: Eco Brass) excellent in terms of workability, wear resistance, durability, and harmlessness can be suitably used. In the second embodiment, the X-ray shielding layer 80 is made of an alloy containing nickel such as the above-mentioned trade name 42 alloy, an alloy containing tungsten such as tungsten or copper tungsten, or an X-ray such as carbon steel, gold or lead. A metal having a shielding property can be used. Further, in the second embodiment, it is not necessary to insulate between the X-ray shielding layer 80 and the metal layer 78, and the electric insulating layer 76 interposed therebetween can be removed. In this case, if the X-ray shielding layer 80 and the metal layer 78 are insulated from the first circuit layer 44 and the second circuit layer 48 by the first electrical insulation layer 42 and the second electrical insulation layer 46. Good.

また、X線遮蔽層80をX線撮像部側(図4の下側)に配置し、金属層78をX線撮像部の反対側に配置しているが、逆に、金属層78をX線撮像部寄りに配置し、X線遮蔽層を遠くに配置してもよい。   In addition, the X-ray shielding layer 80 is disposed on the X-ray imaging unit side (the lower side in FIG. 4), and the metal layer 78 is disposed on the opposite side of the X-ray imaging unit. The X-ray shielding layer may be disposed far away from the line imaging unit.

なお、上述した実施の形態1実施の形態2ともに、撮像部24に接する基板22の表面に第2の回路層48を形成しているが、この第2の回路層48において撮像部24に接する領域は、そこに配線を形成せず、単なる接地層として利用してもよい。逆に、第1の回路層44に配線を形成せず、第2の回路層48に配線を形成してもよい。また、基盤22の表裏に回路層44、48両方を形成する必要はなく、いずれか一方のみでもよい。   In both of the first embodiment and the second embodiment described above, the second circuit layer 48 is formed on the surface of the substrate 22 in contact with the imaging unit 24. The second circuit layer 48 contacts the imaging unit 24. The region may be used as a simple ground layer without forming a wiring there. Conversely, wiring may be formed on the second circuit layer 48 without forming wiring on the first circuit layer 44. Moreover, it is not necessary to form both the circuit layers 44 and 48 on the front and back of the substrate 22, and only one of them may be used.

さらに、上述した実施の形態1,2において、金属基材層40、X線遮蔽層78は、X線を遮蔽することができる任意の材料を用いることができ、例えば、42アロイ(商品名)や炭素鋼の他に、銀、銅タングステンなども利用可能である。   Furthermore, in Embodiment 1 and 2 mentioned above, the metal base material layer 40 and the X-ray shielding layer 78 can use arbitrary materials which can shield X-rays, for example, 42 alloy (trade name). Besides silver and carbon steel, silver, copper tungsten, etc. can also be used.

さらにまた、図5に示す実施の形態3のように、基板22の表面(例えば、図示する例では下面)に導電路84を構成する導電金属層を形成し、金属基材層40と通常グランドと称される電位基準点86との間を、スルーホール66内の銅めっき68、導電路84、さらにはケーブル34(図1A、1B参照)を介して、電位基準点86に接続してもよい。この場合、金属基材層40を電磁波遮蔽層や電磁波障害低減層として機能させ、有害な電磁波が回路部品36等に侵入するのを防止するとともに、回路部品36や電荷結合素子32等から発生する電磁波が他の部品や外部の電気機器等に悪影響を及ぼさないようにすることができる。   Furthermore, as in the third embodiment shown in FIG. 5, a conductive metal layer constituting the conductive path 84 is formed on the surface of the substrate 22 (for example, the lower surface in the illustrated example), and the metal base layer 40 and the normal ground are formed. A potential reference point 86, which is referred to as “a”, may be connected to the potential reference point 86 via the copper plating 68 in the through hole 66, the conductive path 84, and the cable 34 (see FIGS. 1A and 1B). Good. In this case, the metal base layer 40 functions as an electromagnetic wave shielding layer or an electromagnetic wave interference reducing layer to prevent harmful electromagnetic waves from entering the circuit component 36 and the like, and is generated from the circuit component 36 and the charge coupled device 32 and the like. Electromagnetic waves can be prevented from adversely affecting other parts, external electric devices, and the like.

そして、図6Aと図6Bに示す実施の形態4のように、基板22をX線遮蔽機能を備えた金属層(金属板)40だけで形成してもよい。この場合、金属特有の性質が基板22に付与され、衝撃耐久性に優れたX線画像検出器が得られる。また、必要な電気回路86は電荷結合素子32の背後に配置される必要はなく、また、基板22以外の部品に支持させてもよい。この場合さらに、電気回路86と基板22(金属層40)との間を電気的に絶縁する必要もない。   And like Embodiment 4 shown to FIG. 6A and FIG. 6B, you may form the board | substrate 22 only with the metal layer (metal plate) 40 provided with the X-ray shielding function. In this case, a characteristic peculiar to metal is imparted to the substrate 22, and an X-ray image detector excellent in impact durability can be obtained. Further, the necessary electric circuit 86 does not need to be arranged behind the charge coupled device 32 and may be supported by a component other than the substrate 22. In this case, furthermore, there is no need to electrically insulate between the electric circuit 86 and the substrate 22 (metal layer 40).

以上のように、本発明によるX線画像検出器は、薄く、小型であり、かつ衝撃耐久性を持たねばならないといういわば相反する要求を満たすものである。 As described above, the X-ray image detector according to the present invention satisfies the contradicting demands that it must be thin, small, and have impact durability.

実施の形態1に係るX線画像検出器の一部を切除した平面図。FIG. 3 is a plan view of a part of the X-ray image detector according to the first embodiment. 図1に示すX線画像検出器のB−B断面図。FIG. 2 is a cross-sectional view of the X-ray image detector shown in FIG. 図1に示すX線画像検出器のC−C断面図。CC sectional drawing of the X-ray image detector shown in FIG. 図1に示すX線画像検出器の基板の拡大断面図。The expanded sectional view of the board | substrate of the X-ray image detector shown in FIG. 基板を構成する金属リードフレームの部分拡大斜視図。The partial expansion perspective view of the metal lead frame which comprises a board | substrate. 図1に示すX線画像検出器の基板を製造する手順を示す図で、基板を構成する各層をプレスする前の拡大断面図。FIG. 2 is an enlarged cross-sectional view showing a procedure for manufacturing the substrate of the X-ray image detector shown in FIG. 1 and before each layer constituting the substrate is pressed. 図3Aと共にX線画像検出器の基板を製造する手順を示す図で、基板を構成する各層をプレスした後の拡大断面図。It is a figure which shows the procedure which manufactures the board | substrate of an X-ray image detector with FIG. 3A, and is an expanded sectional view after pressing each layer which comprises a board | substrate. 図3A及び図3Bと共にX線画像検出器の基板を製造する手順を示す図で、基板にする-ホールを形成する工程を示す拡大断面図。FIG. 4 is an enlarged cross-sectional view showing a step of manufacturing a substrate of an X-ray image detector together with FIG. 3A and FIG. 図3A〜図3Cと共にX線画像検出器の基板を製造する手順を示す図で、表面を金めっきで被覆した状態の拡大断面図。It is a figure which shows the procedure which manufactures the board | substrate of an X-ray image detector with FIG. 3A-FIG. 3C, and is an expanded sectional view of the state which coat | covered the surface with gold plating. 図3A〜図3Dと共にX線画像検出器の基板を製造する手順を示す図で、回路層に回路パターン溝を形成した後の拡大断面図。It is a figure which shows the procedure which manufactures the board | substrate of an X-ray image detector with FIG. 3A-FIG. 3D, and is an expanded sectional view after forming the circuit pattern groove | channel in a circuit layer. 図3A〜図3Eと共にX線画像検出器の基板を製造する手順を示す図で、表面のレジストを部分的に削除した後の拡大断面図。It is a figure which shows the procedure which manufactures the board | substrate of an X-ray image detector with FIG. 3A-FIG. 3E, and is an expanded sectional view after removing the resist of the surface partially. 図3A〜図3Fと共にX線画像検出器の基板を製造する手順を示す図で、レジストを削除した箇所を金めっきで被覆した後の拡大断面図。It is a figure which shows the procedure which manufactures the board | substrate of an X-ray image detector with FIG. 3A-FIG. 3F, and is an expanded sectional view after coat | covering the location which deleted the resist with gold plating. 図3A〜図3Gと共にX線画像検出器の基板を製造する手順を示す図で、基板の周囲を切除した後拡大断面図。It is a figure which shows the procedure which manufactures the board | substrate of an X-ray image detector with FIG. 3A-FIG. 3G, and is an expanded sectional view after excising the circumference | surroundings of a board | substrate. 実施の形態2に係るX線画像検出器に用いられる基板の拡大断面図。FIG. 4 is an enlarged cross-sectional view of a substrate used in the X-ray image detector according to the second embodiment. 実施の形態3に係るX線画像検出器に用いられる基板の拡大断面図。FIG. 6 is an enlarged cross-sectional view of a substrate used in the X-ray image detector according to the third embodiment. 実施の形態4に係るX線画像検出器に用いられる基板の拡大断面図。FIG. 6 is an enlarged cross-sectional view of a substrate used in the X-ray image detector according to the fourth embodiment. 図6Aの基板を備えたX線画像検出器の断面図。FIG. 6B is a cross-sectional view of an X-ray image detector provided with the substrate of FIG. 6A. 本発明に係るX線画像検出器の断面図。1 is a cross-sectional view of an X-ray image detector according to the present invention. 図7AのX線画像検出器における基板の拡大断面図。The expanded sectional view of the board | substrate in the X-ray image detector of FIG. 7A. 従来のX線画像検出器の断面図。Sectional drawing of the conventional X-ray image detector. 図8AのX線画像検出器における基板の拡大断面図。The expanded sectional view of the board | substrate in the X-ray image detector of FIG. 8A.

符号の説明Explanation of symbols

10:X線画像検出器
12:検出面
14:容器
16.18:容器部分
20:アセンブリ
22:基板
24:撮像部
26:電気接続部
28:蛍光体
30:光伝播素子
32:電荷結合素子
34:ケーブル
36:回路部品
38:コネクタ
40:金属基材層
42:第1の電気絶縁層
44:第1の回路層
46:第2の電気絶縁層
48:第2の回路層
50:リードフレーム
52:溝
54:孔
56、58:絶縁材層(プリプレグ)
60,62:導電金属層
64:積層体
66:スルーホール
68:銅めっき
70:パターン溝
72:レジスト
74:回路パターン
76:金めっき
78:金属層
80:X線遮蔽層
82:孔
10: X-ray image detector 12: Detection surface 14: Container 16.18: Container part 20: Assembly 22: Substrate 24: Imaging unit 26: Electrical connection unit 28: Phosphor 30: Light propagation element 32: Charge coupled element 34 : Cable 36: circuit component 38: connector 40: metal base layer 42: first electrical insulation layer 44: first circuit layer 46: second electrical insulation layer 48: second circuit layer 50: lead frame 52 : Groove 54: Hole 56, 58: Insulating material layer (prepreg)
60, 62: conductive metal layer 64: laminate 66: through hole 68: copper plating 70: pattern groove 72: resist 74: circuit pattern 76: gold plating 78: metal layer 80: X-ray shielding layer 82: hole

Claims (11)

X線像を電気信号に変換するX線撮像部を容器に収めたX線画像検出器において、
上記X線撮像部を支持する基板が、
X線遮蔽機能を有する金属製の基材層と、
上記X線撮像部からの信号を伝達する回路層と、
上記基材層と回路層に接触挟持された電気絶縁層を備えていることを特徴とするX線画像検出器。
In an X-ray image detector in which an X-ray imaging unit for converting an X-ray image into an electrical signal is contained in a container,
A substrate that supports the X-ray imaging unit,
A metal base layer having an X-ray shielding function;
A circuit layer for transmitting a signal from the X-ray imaging unit;
An X-ray image detector comprising an electrical insulating layer held in contact with the base material layer and the circuit layer.
上記基材層が、ニッケルを含んだ合金、銀、タングステン、タングステンを含んだ合金または炭素鋼のいずれかで形成されていることを特徴とする請求項1のいずれかに記載のX線画像検出器。   2. The X-ray image detection according to claim 1, wherein the base material layer is formed of any one of an alloy containing nickel, silver, tungsten, an alloy containing tungsten, or carbon steel. vessel. 上記基材層が、金属製のX線遮蔽層と、金属層からなることを特徴とする請求項1に記載のX線画像検出器。   The X-ray image detector according to claim 1, wherein the base material layer includes a metal X-ray shielding layer and a metal layer. 上記基材層が、金属製のX線遮蔽層と、金属層と、上記X線遮蔽層と金属層の間に挟持された電気絶縁層とからなることを特徴とする請求項1〜3のいずれかに記載のX線画像検出器。   The said base material layer consists of a metal X-ray shielding layer, a metal layer, and the electrical-insulation layer pinched | interposed between the said X-ray shielding layer and a metal layer of Claims 1-3 characterized by the above-mentioned. The X-ray image detector in any one. 上記X線遮蔽層が、ニッケルを含んだ合金、銀、タングステン、タングステンを含んだ合金、金、鉛または炭素鋼のいずれかで形成されていることを特徴とする請求項3〜4のいずれかに記載のX線画像検出器。   The X-ray shielding layer is formed of any one of an alloy containing nickel, silver, tungsten, an alloy containing tungsten, gold, lead, or carbon steel. X-ray image detector described in 1. 上記金属層が、ニッケルを含んだ合金、銀、タングステン、タングステンを含んだ合金、アルミニウム、アルミニウムを含んだ合金、マグネシウムを含んだ合金、鉄、炭素鋼、ステンレス鋼、クロム鋼、銅と亜鉛との合金のいずれかで形成されていることを特徴とする請求項2〜4のいずれかに記載のX線画像検出器。   The metal layer is an alloy containing nickel, silver, tungsten, an alloy containing tungsten, aluminum, an alloy containing aluminum, an alloy containing magnesium, iron, carbon steel, stainless steel, chromium steel, copper and zinc The X-ray image detector according to claim 2, wherein the X-ray image detector is formed of any one of the alloys. 上記X線遮蔽機能を有する金属製の基材層を電位基準点に接続する導電路を備えていることを特徴とする請求項1から5のいずれかに記載のX線画像検出器。   6. The X-ray image detector according to claim 1, further comprising a conductive path connecting the metal base layer having the X-ray shielding function to a potential reference point. X線像を電気信号に変換するX線撮像部を容器に収めたX線画像検出器において、上記X線撮像部を支持する基板をX線遮蔽機能を有する金属で構成したX線画像検出器。   An X-ray image detector in which an X-ray imaging unit for converting an X-ray image into an electric signal is housed in a container, wherein the substrate supporting the X-ray imaging unit is made of a metal having an X-ray shielding function. . X線像を電気信号に変換するX線撮像部を容器に収めたX線画像検出器における、上記X線撮像部を支持する基板の製造方法において、
X線遮蔽性を有する金属の層と導電金属層の間に電気絶縁性材料を挟持して互いに挟持し、上記導電金属層を部分的に除去して回路を形成する基板の製造方法。
In a method of manufacturing a substrate that supports the X-ray imaging unit in an X-ray image detector that houses an X-ray imaging unit that converts an X-ray image into an electrical signal in a container,
A method of manufacturing a substrate, wherein an electrically insulating material is sandwiched between a metal layer having X-ray shielding properties and a conductive metal layer to sandwich each other, and the conductive metal layer is partially removed to form a circuit.
X線像を電気信号に変換するX線撮像部を容器に収めたX線画像検出器における、上記X線撮像部を支持する基板の製造方法において、
X線遮蔽性を有する金属の層と金属層を隣接させ、上記X線遮蔽性を有する金属の層または金属層と導電金属層との間に電気絶縁性材料を挟持して互いに固定し、上記導電金属層を部分的に除去して回路を形成する基板の製造方法。
In a method of manufacturing a substrate that supports the X-ray imaging unit in an X-ray image detector that houses an X-ray imaging unit that converts an X-ray image into an electrical signal in a container,
An X-ray shielding metal layer and a metal layer are adjacent to each other, and an X-ray shielding metal layer or an electrically insulating material is sandwiched between the metal layer and the conductive metal layer and fixed to each other. A substrate manufacturing method in which a conductive metal layer is partially removed to form a circuit.
X線像を電気信号に変換するX線撮像部を容器に収めたX線画像検出器における、上記X線撮像部を支持する基板の製造方法において、
X線遮蔽性を有する金属の層と金属層との間に電気絶縁性材料を挟み、上記X線遮蔽性を有する金属の層または上記金属層と導電性金属との間に電気絶縁性材料を挟み、全て互いに固定し、上記導電金属層の部分的に除去して回路を形成する基板の製造方法。
In a method of manufacturing a substrate that supports the X-ray imaging unit in an X-ray image detector that houses an X-ray imaging unit that converts an X-ray image into an electrical signal in a container,
An electrically insulating material is sandwiched between a metal layer having an X-ray shielding property and the metal layer having an X-ray shielding property, or an electrically insulating material is disposed between the metal layer having an X-ray shielding property or the metal layer and a conductive metal. A method for manufacturing a substrate in which a circuit is formed by sandwiching and fixing them all together and partially removing the conductive metal layer.
JP2003280370A 2003-07-25 2003-07-25 X-ray image detector Pending JP2005043330A (en)

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009076726A (en) * 2007-09-21 2009-04-09 Kyocera Corp Wiring board for mounting x-ray detecting element, and x-ray detecting device
JP2009074964A (en) * 2007-09-21 2009-04-09 Kyocera Corp Wiring board for mounting x-ray detecting element and x-ray detector
JP2011058999A (en) * 2009-09-11 2011-03-24 Fujifilm Corp Radiation image photographing device
JP2012093208A (en) * 2010-10-27 2012-05-17 Rf:Kk Radiation imaging apparatus
JP2012103268A (en) * 2012-01-30 2012-05-31 Fujifilm Corp Radiation image photographing apparatus
JP2015062012A (en) * 2013-08-22 2015-04-02 コニカミノルタ株式会社 Radiation image imaging apparatus
US10539690B2 (en) 2017-06-13 2020-01-21 Samsung Electronics Co., Ltd. X-ray detector, X-ray photographing apparatus including the same, and method of manufacturing the same

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009076726A (en) * 2007-09-21 2009-04-09 Kyocera Corp Wiring board for mounting x-ray detecting element, and x-ray detecting device
JP2009074964A (en) * 2007-09-21 2009-04-09 Kyocera Corp Wiring board for mounting x-ray detecting element and x-ray detector
JP2011058999A (en) * 2009-09-11 2011-03-24 Fujifilm Corp Radiation image photographing device
JP2012093208A (en) * 2010-10-27 2012-05-17 Rf:Kk Radiation imaging apparatus
JP2012103268A (en) * 2012-01-30 2012-05-31 Fujifilm Corp Radiation image photographing apparatus
JP2015062012A (en) * 2013-08-22 2015-04-02 コニカミノルタ株式会社 Radiation image imaging apparatus
US10539690B2 (en) 2017-06-13 2020-01-21 Samsung Electronics Co., Ltd. X-ray detector, X-ray photographing apparatus including the same, and method of manufacturing the same

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