JP2005037060A - Ice-making device - Google Patents

Ice-making device Download PDF

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JP2005037060A
JP2005037060A JP2003274934A JP2003274934A JP2005037060A JP 2005037060 A JP2005037060 A JP 2005037060A JP 2003274934 A JP2003274934 A JP 2003274934A JP 2003274934 A JP2003274934 A JP 2003274934A JP 2005037060 A JP2005037060 A JP 2005037060A
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ice making
ice
layer
nickel
plating
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Shinya Hiramatsu
伸也 平松
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Hoshizaki Electric Co Ltd
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Hoshizaki Electric Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an ice-making device capable of improving the corrosion resistance of a plated coating of an ice-making compartment, and preventing the contamination of ice blocks caused by the excess deposit and corrosion products. <P>SOLUTION: The ice-making compartment is composed of an ice making part 14 composed of an ice making plate 16 and a partition and comprising a number of ice making cells 20 opened downward, and an evaporating pipe 22 mounted on an upper face of the ice making plate 16, and a corrosion-resisting coating 40 composed of a plurality of plated coatings is formed on its outer surface. The corrosion-resisting coating 40 is composed of a tin layer 42 positioned at a lowermost layer at a basis material side, a copper layer 44 positioned at an intermediate part, and a nickel layer 46 having an electroless nickel-phosphor plated coating 50 at least on its exposed face. Further an electric nickel plated coating 48 is formed between the copper layer 44 and the electroless nickel-phosphor plated coating 50 by an electric plating method. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

この発明は、多量の氷塊を連続的に製造する製氷機等に配設される製氷装置に関するものである。   The present invention relates to an ice making device disposed in an ice making machine or the like that continuously produces a large amount of ice blocks.

多量の氷塊を連続的に製造する自動製氷機が、喫茶店やレストラン等の施設その他の厨房において好適に使用されている。これらの自動製氷機は、下向きに開口する多数の製氷小室に製氷水を下方から供給して、所要形状の氷(氷塊)を連続的に製造する噴射タイプや、製氷面に製氷水を流下させる流下タイプ等の製氷機構を備えたものがある。   An automatic ice maker that continuously manufactures a large amount of ice blocks is suitably used in facilities such as coffee shops and restaurants and other kitchens. These automatic ice makers supply ice making water from below to a large number of ice making chambers that open downward, and spray types that continuously produce ice (ice blocks) of the required shape, or make ice making water flow down to the ice making surface. Some have a flow-down type ice making mechanism.

例えば図3に示すように、噴射式自動製氷機としては、所謂オープンセルタイプの製氷機構10を備えた製氷機がある。この製氷機構10の製氷室(製氷装置)11は、図示しない貯蔵室内に水平に配置した製氷板16の下面に仕切板18が縦横に配設されて、下方に開口する製氷小室20が碁盤目状に多数画成された製氷部14と、この製氷部14における製氷板16の上面に密着的に蛇行配置され、図示しない冷凍系に連通する蒸発管(蒸発器)22とから構成される。そして、製氷運転に際し、前記蒸発管22に冷媒を循環させて、前記製氷小室20を強制冷却するようになっている。また、ポンプモータ26で吸込んだ製氷水タンク28に貯留された製氷水を、各製氷小室20の夫々の位置と対応して下方に設けられた噴水孔24から該製氷小室20に噴射し得るよう構成されている。そして、前記製氷小室20に噴射された製氷水が、該製氷小室20の内壁面で冷却されて層状に氷結することで氷塊が得られる。   For example, as shown in FIG. 3, there is an ice making machine equipped with a so-called open cell type ice making mechanism 10 as an injection type automatic ice making machine. The ice making chamber (ice making device) 11 of the ice making mechanism 10 has a partition plate 18 arranged vertically and horizontally on the lower surface of an ice making plate 16 horizontally arranged in a storage chamber (not shown), and an ice making chamber 20 opened downward is a grid. The ice making section 14 is defined in a number of shapes, and an evaporation pipe (evaporator) 22 is arranged in close contact with the upper surface of the ice making plate 16 in the ice making section 14 and communicates with a refrigeration system (not shown). During the ice making operation, the ice making chamber 20 is forcibly cooled by circulating a refrigerant through the evaporation pipe 22. Further, the ice making water stored in the ice making water tank 28 sucked by the pump motor 26 can be sprayed into the ice making chambers 20 from the fountain holes 24 provided below corresponding to the respective positions of the ice making chambers 20. It is configured. The ice making water sprayed into the ice making chamber 20 is cooled by the inner wall surface of the ice making chamber 20 and freezes in layers to obtain ice blocks.

前記蒸発管22は、熱伝導性に優れた銅が材質として用いられ、該蒸発管22の内部を循環する冷媒との熱交換が好適に行ない得るようになっている。また、前記製氷室11を構成する製氷板16や仕切板18等の部材についても、前記蒸発管22の冷却作用を妨げないよう銅材料が用いられている。そして、前記製氷板16、仕切板18および蒸発管22等の前記製氷室11を構成する各部材の表面には、錫めっき等の被膜30を形成することで防錆処理がなされている(図4参照)。前記製氷室11に錫めっき被膜30を形成する方法としては、例えば溶融錫めっき法がある。この溶融錫めっき法は、先ず蒸発管22の開口にキャップを被せて閉塞し、このキャップを蒸発管22にろう付けした後、ろう付け部分およびその周辺を耐熱テープで覆う。そして、これらの処理をした蒸発管22を製氷板16の上面に固定した後、製氷室11を治具で保持して溶融させた錫を主成分とする錫浴中に浸して錫めっき被膜30を形成する。しかる後、前記製氷室11を所要時間冷却させて、蒸発管22から耐熱テープ、ろうおよびキャップを取り外すことでめっき処理が完了する(例えば、特許文献1参照)。
特開平10−103826号公報
The evaporating pipe 22 is made of copper having excellent thermal conductivity, and heat exchange with the refrigerant circulating in the evaporating pipe 22 can be suitably performed. In addition, a copper material is also used for members such as the ice making plate 16 and the partition plate 18 constituting the ice making chamber 11 so as not to disturb the cooling action of the evaporation pipe 22. And the antirust process is made by forming the coating 30 of tin plating etc. on the surface of each member which comprises the said ice making chambers 11, such as the said ice making plate 16, the partition plate 18, and the evaporation pipe 22 (FIG. 4). As a method for forming the tin plating film 30 in the ice making chamber 11, for example, there is a hot tin plating method. In this hot-dip tin plating method, first, a cap is put on the opening of the evaporation tube 22 to close it, and the cap is brazed to the evaporation tube 22, and then the brazed portion and its periphery are covered with heat-resistant tape. Then, after the evaporation tube 22 subjected to these treatments is fixed to the upper surface of the ice making plate 16, the ice making chamber 11 is held by a jig and immersed in a tin bath mainly composed of molten tin, and the tin plating film 30. Form. Thereafter, the ice making chamber 11 is cooled for a required time, and the plating process is completed by removing the heat-resistant tape, the wax and the cap from the evaporation tube 22 (see, for example, Patent Document 1).
JP-A-10-103826

しかし、図4に示すように、前記溶融錫めっき法で前記製氷室11の露出面に形成された錫めっき被膜30は、前記製氷小室20を構成する製氷板16と仕切板18とがなす直角コーナー部分において、表面張力によりめっき分が残留し、氷塊の成長やこの氷塊の離脱の繰り返しにより、残留した余剰めっき分が剥離してしまうことがある。また、前記錫めっき被膜30は、比較的錆難いものであるが、使用雰囲気に酸化性物質等が含まれている場合、経時的に錆等の腐食生成物が生じることがある。従って、余剰めっき分や腐食生成物が氷塊に混入して、該氷塊を汚染してしまうことが報告されている。また、前記溶融錫めっき法では、前記錫めっき被膜30の厚さの管理が難しく、該錫めっき被膜30の厚さを均一にできない欠点がある。従って、前記製氷小室20において、氷塊に対する熱伝導スピードが異なってしまい、除氷運転に時間がかかり、製氷能力を低下させてしまう問題があった。   However, as shown in FIG. 4, the tin plating film 30 formed on the exposed surface of the ice making chamber 11 by the molten tin plating method is a right angle formed by the ice making plate 16 and the partition plate 18 constituting the ice making chamber 20. In the corner portion, the plating remains due to the surface tension, and the remaining excess plating may be peeled off due to the growth of ice blocks and the repeated removal of the ice blocks. Further, the tin plating film 30 is relatively hard to rust, but when an oxidizing substance or the like is included in the use atmosphere, corrosion products such as rust may be generated over time. Accordingly, it has been reported that excessive plating and corrosion products are mixed in the ice block and contaminate the ice block. In addition, the hot-dip tin plating method has a drawback in that it is difficult to manage the thickness of the tin plating film 30 and the thickness of the tin plating film 30 cannot be made uniform. Therefore, in the ice making chamber 20, there is a problem that the heat conduction speed with respect to the ice blocks is different, it takes time for the deicing operation and the ice making capacity is lowered.

前記課題を克服し、所期の目的を達成するため、本発明に係る製氷装置は、
製氷水が供給されて所要形状の氷を生成する製氷部と、この製氷部に配設されて該製氷部を冷却する蒸発器とを備える製氷装置において、
前記製氷部および蒸発器の外表面に錫層がめっきされると共に、前記錫層の外表面に銅層がめっきされ、
更に前記銅層の外表面に、少なくとも露出面に無電解ニッケル−リンめっき被膜を有するニッケル層がめっきされていることを特徴とする。
In order to overcome the above-mentioned problems and achieve the intended purpose, an ice making device according to the present invention includes:
In an ice making device comprising an ice making unit that is supplied with ice making water to generate ice of a required shape, and an evaporator that is disposed in the ice making unit and cools the ice making unit,
A tin layer is plated on the outer surface of the ice making part and the evaporator, and a copper layer is plated on the outer surface of the tin layer,
Furthermore, a nickel layer having an electroless nickel-phosphorus plating film on at least an exposed surface is plated on the outer surface of the copper layer.

本発明に係る製氷装置によれば、該製氷装置を構成する製氷部および蒸発管の外表面を、錫めっき被膜からなる錫層および銅めっき被膜からなる銅層の下地に、少なくとも露出面に無電解ニッケル−リンめっき被膜を有するニッケル層を形成した多層めっき被膜で被覆することで、めっき被膜不良が抑制されて耐蝕性が向上し、余剰付着物や腐食生成物による氷塊の汚染を防止することができる。また、無電解ニッケル−リンめっき被膜は、めっき被膜の厚さを均一に形成できるので、熱伝導の均等化を図り、製氷および除氷に要する時間のばらつきを抑制し、製氷能力を向上させ得る。また、前記錫層および銅層の下地に電気ニッケルめっき被膜を介して、無電解ニッケル−リンめっき被膜を形成することで、コストの低減を図り得る。   According to the ice making device of the present invention, the ice making part and the outer surface of the evaporation tube constituting the ice making device are disposed on the base of the tin layer made of the tin plating film and the copper layer made of the copper plating film, at least on the exposed surface. By coating with a multilayer plating film in which a nickel layer having an electrolytic nickel-phosphorous plating film is formed, plating film defects are suppressed, corrosion resistance is improved, and contamination of ice blocks by excess deposits and corrosion products is prevented. Can do. In addition, since the electroless nickel-phosphorous plating film can form a uniform thickness of the plating film, it can achieve uniform heat conduction, suppress variations in time required for ice making and deicing, and improve ice making capacity. . In addition, the electroless nickel-phosphorous plating film can be formed on the underlayer of the tin layer and the copper layer via an electric nickel plating film, thereby reducing the cost.

この発明は、従来の技術に係る製氷装置に内在する前記問題に鑑み、これらを好適に解決するべく提案されたものであって、少なくとも露出面に無電解ニッケル−リンめっき被膜を有する多層めっき被膜で製氷部および蒸発器を被覆することで、耐蝕性を向上させると共に、製氷能力を向上し得る製氷装置を提供することを目的としている。   In view of the above problems inherent in the ice making apparatus according to the prior art, the present invention has been proposed to suitably solve these problems, and is a multilayer plating film having an electroless nickel-phosphorus plating film on at least an exposed surface An object of the present invention is to provide an ice making device capable of improving corrosion resistance and covering ice making capability by covering the ice making section and the evaporator.

次に、本発明に係る製氷装置につき、好適な実施例を挙げて、添付図面を参照して以下に説明する。なお、説明の便宜上、図3に示した製氷機構の構成要素と同一の要素については、同一の符号を使用して詳細な説明は省略する。実施例1では、オープンセルタイプの製氷機構について説明するが、これに限定されず、水皿を駆動機構で製氷室に対して傾動して、製氷運転に際し、該製氷室を閉成するように構成したクローズドセルタイプ、あるいは製氷面(製氷板)に製氷水を流下する流下式等、その他各種の製氷機構であってもよい。   Next, a preferred embodiment of the ice making device according to the present invention will be described below with reference to the accompanying drawings. For convenience of explanation, the same reference numerals are used for the same elements as those of the ice making mechanism shown in FIG. 3, and detailed description thereof is omitted. In the first embodiment, an open cell type ice making mechanism will be described. However, the present invention is not limited to this, and the ice tray is tilted with respect to the ice making chamber by the drive mechanism so that the ice making chamber is closed during the ice making operation. Other various ice making mechanisms such as a closed cell type constructed or a flow-down type in which ice making water flows down on an ice making surface (ice making plate) may be used.

図1に示すように、実施例1に係る製氷機の製氷機構10は、箱状のメカニカルベース32の上部に取付けられて下向きに開口する多数の製氷小室20を備えた製氷室(製氷装置)12と、各製氷小室20に対応して穿設した噴水孔24と、この噴水孔24の下方に設けられ、所定量の製氷水が貯留されると共に、未氷結水を回収する製氷水タンク28とから構成されている。前記製氷室12における製氷部14には、図示しない冷凍系に連通する蒸発管(蒸発器)22が密着的に蛇行配置され、製氷運転時に冷媒を循環させて前記製氷小室20を強制冷却し、製氷完了後にはホットガスにより該製氷小室20を加温して氷塊の脱氷を促すようになっている。前記製氷水タンク28に貯留された製氷水を噴水孔24に向けて圧送するポンプモータ26は、該製氷水タンク28の下方に近接して配設され、該ポンプモータ26を駆動することで、吸込管を介して製氷水タンク28から吸込んだ製氷水を噴水孔24に圧送するよう構成されている。   As shown in FIG. 1, the ice making mechanism 10 of the ice making machine according to the first embodiment includes an ice making chamber (ice making device) provided with a large number of ice making chambers 20 attached to the upper part of a box-like mechanical base 32 and opening downward. 12, a fountain hole 24 formed corresponding to each ice making chamber 20, and an ice making water tank 28 provided below the fountain hole 24 for storing a predetermined amount of ice making water and collecting uniced water. It consists of and. An evaporation pipe (evaporator) 22 communicating with a refrigeration system (not shown) is closely and meanderingly arranged in the ice making section 14 in the ice making chamber 12, and the ice making chamber 20 is forcibly cooled by circulating a refrigerant during ice making operation. After the ice making is completed, the ice making chamber 20 is heated with hot gas to promote deicing of the ice block. A pump motor 26 that pumps ice-making water stored in the ice-making water tank 28 toward the fountain hole 24 is disposed close to the lower side of the ice-making water tank 28, and drives the pump motor 26, The ice making water sucked from the ice making water tank 28 via the suction pipe is configured to be pumped to the fountain hole 24.

前記製氷室12は、前記メカニカルベース32の上部に水平に配置した製氷板16および該製氷板16の下面に縦横に配設された仕切板18で形成される製氷部14と、該製氷板16の上面に蛇行状に配設された蒸発管22とから構成されている。前記製氷部14における製氷板16の下方には、前記仕切板18により下方に開口する製氷小室20が碁盤目状に多数画成され、該製氷板16の上面に配設された蒸発管22を循環する冷媒との熱交換により、該製氷板16および仕切板18の熱を奪って冷却することで、該製氷小室20の内壁面に噴射供給された製氷水を氷結するようになっている。前記蒸発管22は、内部を循環する冷媒との熱交換を有効に行ない得るように熱伝導性に優れた銅を材質としたパイプが用いられている。また、前記製氷室12を構成する製氷板16や仕切板18等の部材も、上面に配設された前記蒸発管22の冷却作用を妨げないよう銅材料が用いられ、前記製氷小室20における熱交換を好適に行ない得るよう設定されている。   The ice making chamber 12 includes an ice making part 14 formed by an ice making plate 16 disposed horizontally above the mechanical base 32 and a partition plate 18 disposed vertically and horizontally on the lower surface of the ice making plate 16, and the ice making plate 16. And an evaporation tube 22 arranged in a meandering manner on the upper surface of the tube. Below the ice making plate 16 in the ice making section 14, a large number of ice making chambers 20 opened downward by the partition plate 18 are defined in a grid pattern, and an evaporation pipe 22 disposed on the upper surface of the ice making plate 16 is provided. By removing heat from the ice making plate 16 and the partition plate 18 through heat exchange with the circulating refrigerant, the ice making water sprayed and supplied to the inner wall surface of the ice making chamber 20 is frozen. The evaporation pipe 22 is a pipe made of copper having excellent thermal conductivity so that heat exchange with the refrigerant circulating inside can be effectively performed. In addition, the members such as the ice making plate 16 and the partition plate 18 constituting the ice making chamber 12 are also made of a copper material so as not to disturb the cooling action of the evaporation pipe 22 disposed on the upper surface, and the heat in the ice making chamber 20 is It is set so that the exchange can be suitably performed.

図2に示すように、前記製氷室12を構成する製氷部14および蒸発管22の外表面には、多層めっきにより形成した複数のめっき被膜で構成される耐蝕被膜40で被覆されている。ここで、前記耐蝕被膜40が形成される製氷室12の外表面とは、該製氷室12を構成する各部材16,18,22を組付け後に多層めっき処理を行なう場合には、各部材16,18,22の接合部分を除く外表面全体を指し、各部材16,18,22に夫々多層めっき処理を行なう場合は、各部材16,18,22の外表面を指す。前記製氷室12の外表面に多層めっき処理することで形成される耐蝕被膜40は、該外表面側(素地側)である最下層に位置する錫層42と、中間に位置する銅層44と、外方に臨む面に位置し、少なくとも露出面に無電解ニッケル−リンめっき被膜50を有するニッケル層46とからなる複数のめっき被膜から構成され、各層42,44,46は使用環境等に合わせて所要の厚さに設定されている。   As shown in FIG. 2, the outer surfaces of the ice making section 14 and the evaporation tube 22 constituting the ice making chamber 12 are covered with a corrosion-resistant coating 40 composed of a plurality of plating coatings formed by multilayer plating. Here, the outer surface of the ice making chamber 12 on which the corrosion-resistant coating 40 is formed is defined as each member 16 when multilayer plating is performed after the members 16, 18, and 22 constituting the ice making chamber 12 are assembled. , 18, 22 indicates the entire outer surface excluding the joined portion, and when performing multilayer plating on each member 16, 18, 22, it indicates the outer surface of each member 16, 18, 22. The corrosion-resistant coating 40 formed by multilayer plating on the outer surface of the ice making chamber 12 includes a tin layer 42 located at the lowermost layer on the outer surface side (base side), and a copper layer 44 located in the middle. , Which is composed of a plurality of plating films which are located on the surface facing the outside and which have at least an exposed surface and the nickel layer 46 having the electroless nickel-phosphorous plating film 50. The required thickness is set.

前記錫層42は、硫酸浴を用いた電気めっき法で前記製氷室12を構成する製氷部14および蒸発管22の外表面に直接形成される錫めっき被膜である。前記錫めっき被膜は、比較的柔らかく、展延性に富む材質であって、素地(製氷室12)の材質である銅に対して、犠牲アノードとして働いて前記製氷室12の耐蝕性を向上させる。ところで、前記錫めっき被膜を形成する硫酸浴には、光沢浴と無光沢浴とがあるが、前記錫層42は下地として用いられるため、実施例1では無光沢浴が採用されている。また、前記錫層42を構成する錫めっき被膜をめっきする方法としては、錫酸カリウム等を用いたアルカリ浴や、中性浴等の電気めっき法も採用することができ、更に無電解錫めっき法であってもよい。   The tin layer 42 is a tin plating film directly formed on the outer surface of the ice making section 14 and the evaporation tube 22 constituting the ice making chamber 12 by electroplating using a sulfuric acid bath. The tin plating film is a material that is relatively soft and has a good spreadability, and works as a sacrificial anode for copper, which is a material of the base (ice-making chamber 12), to improve the corrosion resistance of the ice-making chamber 12. By the way, the sulfuric acid bath for forming the tin plating film includes a glossy bath and a matte bath. However, since the tin layer 42 is used as a base, the matte bath is employed in the first embodiment. In addition, as a method for plating the tin plating film constituting the tin layer 42, an electroplating method such as an alkaline bath using potassium stannate or the like, a neutral bath, or the like can be employed. It may be a law.

前記銅層44は、前記錫層42の外表面に被覆され、ピロリン酸銅めっき浴を用いた電気めっき法で形成される銅めっき被膜である。ここで、前記錫めっき被膜からなる錫層42の外表面には、後述するニッケル層46はめっき処理で直接形成することができない。また、電位差が大きく異なる錫とニッケルとを接触させて被膜を形成しても、有効な耐蝕性を示さない。従って、前記錫層42の外表面に銅めっき被膜による銅層44を形成することで、ニッケル層46の形成を許容するものである。前記ピロリン酸銅めっき浴による銅めっき被膜は、均一電着性がよく、またピンホールが少なく、素地である前記錫めっき被膜への侵食が少ない等の利点がある。なお、前記銅めっき被膜の形成に際して、シアン化銅めっき浴による電気めっきも採用し得るが、めっき液の処理に難点がある。このように、前記錫層42を構成する錫めっき被膜および前記銅層44を構成する銅めっき被膜は、後述するニッケル層46の下地として作用し、特に前記製氷室12の外表面に直接形成できない無電解ニッケル−リンめっき被膜50の形成を助けている。   The copper layer 44 is a copper plating film that is coated on the outer surface of the tin layer 42 and formed by electroplating using a copper pyrophosphate plating bath. Here, the nickel layer 46 described later cannot be directly formed on the outer surface of the tin layer 42 made of the tin plating film by plating. Moreover, even if tin and nickel having different potential differences are brought into contact with each other to form a film, effective corrosion resistance is not exhibited. Therefore, the formation of the nickel layer 46 is allowed by forming the copper layer 44 by the copper plating film on the outer surface of the tin layer 42. The copper plating film by the copper pyrophosphate plating bath has advantages such as good throwing power, few pinholes, and less erosion to the tin plating film as a base. In forming the copper plating film, electroplating using a copper cyanide plating bath may be employed, but there is a difficulty in treating the plating solution. Thus, the tin plating film that constitutes the tin layer 42 and the copper plating film that constitutes the copper layer 44 act as a base for the nickel layer 46 described later, and cannot be formed directly on the outer surface of the ice making chamber 12 in particular. It helps to form the electroless nickel-phosphorous plating film 50.

前記ニッケル層46は、前記製氷室12に形成した耐蝕被膜40おける露出面に形成した無電解ニッケル−リンめっき被膜50と、前記銅層44側に形成した電気ニッケルめっき被膜48とから構成されている。前記電気ニッケルめっき被膜48は、ワット浴等を用いた電気めっき法で形成され、これに対し、前記無電解ニッケル−リンめっき被膜50は、無電解ニッケル−リンめっき浴を用いた無電解ニッケル−リンめっき法で形成されている。   The nickel layer 46 is composed of an electroless nickel-phosphorous plating film 50 formed on the exposed surface of the corrosion-resistant film 40 formed in the ice making chamber 12 and an electric nickel plating film 48 formed on the copper layer 44 side. Yes. The electro nickel plating film 48 is formed by an electroplating method using a watt bath or the like, whereas the electroless nickel-phosphorous plating film 50 is an electroless nickel-phosphorous plating bath using an electroless nickel-phosphorous plating bath. It is formed by a phosphor plating method.

次に、実施例1に係る製氷室12の多層めっき処理工程について簡単に説明する。多層めっきが形成される前記製氷室12は、製氷板16と仕切板18とからなる製氷部14および蒸発管22を組付けた状態で多層めっき処理を実施する態様や、各部材16,18,22の夫々について多層めっき処理を施した後、各部材16,18,22を組付けて製氷室12を構成する態様の双方を採用し得るが、実施例1では、予め各部材16,18,22を組付けた状態で多層めっき処理をする態様を採用している。前記製氷室12のめっき処理工程は、前記製氷室12の銅素地表面(製氷部14および蒸発管22の外表面)に研磨等の所要の処理を行なう前処理工程と、各めっき層を形成するめっき形成工程と、めっき後の仕上げを行なう後処理工程に大別される。めっき処理は、素材表面の平滑性や油脂等の汚れの付着などによりめっきの良否が左右されるので、先ず前処理工程において、素地表面の平滑性を向上させる研磨処理や、素地表面に付着している油脂等の汚れを落とすための脱脂処理や、素地表面に形成された酸化被膜を除去する酸洗い処理等が実施される。なお、前処理工程の各処理は、全て必須の処理ではなく、素地表面の状態等を鑑みて適宜実施される。   Next, the multilayer plating process of the ice making chamber 12 according to Example 1 will be briefly described. The ice making chamber 12 in which the multi-layer plating is formed includes a mode in which the multi-layer plating process is performed in a state where the ice making unit 14 and the evaporation pipe 22 including the ice making plate 16 and the partition plate 18 are assembled, and the members 16, 18, Both of the aspects in which the members 16, 18, and 22 are assembled to form the ice making chamber 12 after the multilayer plating process is applied to each of the members 22, but in the first embodiment, each member 16, 18, The mode which carries out multilayer plating processing in the state where 22 was assembled is adopted. The plating process of the ice making chamber 12 includes a pretreatment process for performing a necessary process such as polishing on the surface of the copper base of the ice making chamber 12 (the outer surface of the ice making section 14 and the evaporation tube 22), and each plating layer. It is roughly divided into a plating forming process and a post-processing process for finishing after plating. The plating process depends on the smoothness of the surface of the material and the adhesion of dirt such as oil and fat, so the quality of the plating is affected by the polishing process that improves the smoothness of the substrate surface and the substrate surface. Degreasing treatment for removing dirt such as oil and fat, pickling treatment for removing an oxide film formed on the substrate surface, and the like are performed. In addition, each process of a pre-processing process is not an indispensable process, but is suitably implemented in view of the state of the substrate surface, etc.

前処理工程で所要の処理が実施された前記製氷室12は、めっき形成工程において、錫層42、銅層44およびニッケル層46の各めっき被膜が形成される。最初に、前記製氷室12を構成する製氷部14および該製氷部14に配設された蒸発管22の外表面に、硫酸浴を用いた電気めっき法により錫めっき被膜からなる錫層42を形成する。すなわち、硫酸第1錫や硫酸等を所要の組成になるよう調整して建浴した硫酸浴中に、錫片を陽極とすると共に、製氷室12が陰極になるよう接続して浸漬した状態で、電圧をかけることで、該製氷室12の露出面に錫めっき被膜が形成される。次いで、前記製氷室12に形成された錫層42の外表面に、ピロリン酸銅めっき浴を用いた電気めっき法により銅めっき被膜からなる銅層44を形成する。すなわち、ピロリン酸銅やピロリン酸カリウム等を所要の組成になるよう調整して建浴したピロリン酸銅めっき浴中に、銅片を陽極とすると共に、前記製氷室12が陰極になるよう接続して浸漬した状態で、電圧をかけることで、製氷室に形成された錫層42の外表面に銅めっき被膜が形成される。なお、電気めっき法を用いて錫層42および銅層44を形成する際に、前記製氷室12は製氷板16と仕切板18とを組付けた複雑な形状をしているため、補助陽極を用いることで、均一なめっき被膜を形成することができる。   In the ice making chamber 12 that has undergone the required treatment in the pretreatment process, the plating layers of the tin layer 42, the copper layer 44, and the nickel layer 46 are formed in the plating formation process. First, a tin layer 42 made of a tin plating film is formed on the ice making unit 14 constituting the ice making chamber 12 and the outer surface of the evaporation tube 22 disposed in the ice making unit 14 by electroplating using a sulfuric acid bath. To do. That is, in a sulfuric acid bath prepared by adjusting stannous sulfate or sulfuric acid so as to have a required composition, a tin piece is used as an anode, and the ice making chamber 12 is connected and immersed so as to serve as a cathode. By applying a voltage, a tin plating film is formed on the exposed surface of the ice making chamber 12. Next, a copper layer 44 made of a copper plating film is formed on the outer surface of the tin layer 42 formed in the ice making chamber 12 by electroplating using a copper pyrophosphate plating bath. In other words, in a copper pyrophosphate plating bath prepared by adjusting copper pyrophosphate or potassium pyrophosphate so as to have a required composition, a copper piece was used as an anode, and the ice making chamber 12 was connected as a cathode. By applying a voltage in the immersed state, a copper plating film is formed on the outer surface of the tin layer 42 formed in the ice making chamber. In addition, when forming the tin layer 42 and the copper layer 44 using the electroplating method, the ice making chamber 12 has a complicated shape in which the ice making plate 16 and the partition plate 18 are assembled. By using it, a uniform plating film can be formed.

そして、前記製氷室12に形成された銅層44の外表面に、ニッケル層46を形成する。先ず前記銅層44の外表面に、ワット浴を用いた電気めっき法により電気ニッケルめっき被膜48を形成する。すなわち、硫酸ニッケルや塩化ニッケル等を所要の組成になるよう調整して建浴したワット浴中に、ニッケル片を陽極とすると共に、前記製氷室12を陰極になるように接続して浸漬した状態で、電圧をかけることで、製氷室12に形成された銅層44の外表面に電気ニッケルめっき被膜48が形成される。なお、前記電気ニッケルめっき被膜48の形成に際して、電気めっき法を用いているので、補助陽極を用いることで、均一な電気ニッケルめっき被膜48を形成することができる。   Then, a nickel layer 46 is formed on the outer surface of the copper layer 44 formed in the ice making chamber 12. First, the nickel electroplating film 48 is formed on the outer surface of the copper layer 44 by electroplating using a watt bath. That is, a state in which nickel sulfate is used as an anode and the ice making chamber 12 is connected and immersed so as to serve as a cathode in a watt bath prepared by adjusting nickel sulfate or nickel chloride to have a required composition. Thus, an electric nickel plating film 48 is formed on the outer surface of the copper layer 44 formed in the ice making chamber 12 by applying a voltage. In addition, since the electroplating method is used when forming the said electronickel plating film 48, the uniform electronickel plating film 48 can be formed by using an auxiliary anode.

次に、無電解ニッケル−リンめっき浴を用いた無電解ニッケル−リンめっき法で、前記製氷室12における耐蝕被膜40の露出面となる無電解ニッケル−リンめっき被膜50を形成する。すなわち、次亜リン酸ナトリウムや硫酸ニッケル等を所要の組成になるよう調整して建浴しためっき浴中に、被めっき物である製氷室12を浸漬することで、該製氷室12自体が触媒となって還元反応が進行し、めっき浴中のニッケル陽イオンを還元して、前記電気ニッケルめっき被膜48の外表面にニッケル合金からなる無電解ニッケル−リンめっき被膜50が形成される。最後に後処理工程において、前記製氷室12の外表面に形成した多層めっき被膜からなる耐蝕被膜40の仕上げを行なう。後処理工程では、前記製氷室12に付着しためっき液を水、溶剤、活性剤等で完全に除去する洗浄処理と、洗浄処理により製氷室に残留している水分を熱風や遠心分離等の手段で除去する乾燥処理が実施される。なお、めっき形成工程における各めっき処理が完了した際にも洗浄および乾燥等の処理が行なわれ、めっき液等の次工程への持ち込みを防止している。   Next, an electroless nickel-phosphorous plating film 50 that forms an exposed surface of the corrosion-resistant coating 40 in the ice making chamber 12 is formed by an electroless nickel-phosphorous plating method using an electroless nickel-phosphorous plating bath. That is, the ice making chamber 12 itself is a catalyst by immersing the ice making chamber 12 which is an object to be plated in a plating bath in which sodium hypophosphite, nickel sulfate or the like is adjusted to have a required composition. Then, the reduction reaction proceeds and the nickel cation in the plating bath is reduced to form an electroless nickel-phosphorous plating film 50 made of a nickel alloy on the outer surface of the electric nickel plating film 48. Finally, in the post-processing step, the corrosion-resistant coating 40 made of a multilayer plating coating formed on the outer surface of the ice making chamber 12 is finished. In the post-treatment process, a cleaning process for completely removing the plating solution adhering to the ice making chamber 12 with water, a solvent, an activator, and the like, and water remaining in the ice making chamber by the cleaning process, such as hot air and centrifugation The drying process which removes by is implemented. In addition, when each plating process in the plating forming process is completed, processes such as washing and drying are performed to prevent the plating solution from being brought into the next process.

次に、実施例1に係る製氷装置の作用について説明する。無電解ニッケル−リンめっき法により形成された無電解ニッケル−リンめっき被膜50は、電気めっき法で形成された電気ニッケルめっき被膜48より遙かに剥離し難く、ピリが発生することがない。また、無電解ニッケル−リンめっき被膜50は、合金であるため、大抵の有機溶剤には全く侵されず、有機酸、塩類、アルカリ等に対しても良好な耐蝕性を示し、非常に錆びにくいといった利点がある。ところで、銅製の製氷板16、仕切板18および蒸発管22で構成される製氷室12に、無電解ニッケル−リンめっき被膜50を直接形成すると、使用環境により有効な耐蝕性を示さないことがある。従って実施例1の如く、下地として予め前記製氷室12の外表面に錫めっき被膜からなる錫層42および銅めっき被膜からなる銅層44を予め下地として形成し、その外表面に無電解ニッケル−リンめっきを施すことで、無電解ニッケル−リンめっき被膜50は好適な耐蝕性を発揮し、孔蝕も有効に防止し得る。従って、前記製氷小室20において、経時的に錆等の腐食生成物が生じることはなく、腐食生成物が氷塊に混入して、該氷塊を汚染してしまう虞れはなくなると共に、前記蒸発管22の腐食によるピンホール等も防止できるので、冷媒漏れによるクレームを低減することができる。   Next, the operation of the ice making device according to the first embodiment will be described. The electroless nickel-phosphorous plating film 50 formed by the electroless nickel-phosphorous plating method is far more difficult to peel off than the electric nickel plating film 48 formed by the electroplating method, and no pi is generated. In addition, since the electroless nickel-phosphorous plating film 50 is an alloy, it is not affected by most organic solvents, exhibits good corrosion resistance against organic acids, salts, alkalis, and the like, and is extremely resistant to rust. There are advantages such as. By the way, when the electroless nickel-phosphorous plating film 50 is directly formed in the ice making chamber 12 composed of the copper ice making plate 16, the partition plate 18 and the evaporation tube 22, the effective corrosion resistance may not be exhibited depending on the use environment. . Therefore, as in Example 1, a tin layer 42 made of a tin plating film and a copper layer 44 made of a copper plating film were previously formed on the outer surface of the ice making chamber 12 as a base, and the electroless nickel- By applying phosphorous plating, the electroless nickel-phosphorous plating film 50 exhibits suitable corrosion resistance and can effectively prevent pitting corrosion. Accordingly, corrosion products such as rust are not generated with time in the ice making chamber 20, and there is no possibility that the corrosion products are mixed into the ice blocks and contaminate the ice blocks, and the evaporator tube 22 is not contaminated. Since pinholes and the like due to corrosion can be prevented, complaints due to refrigerant leakage can be reduced.

無電解ニッケル−リンめっき法は、めっき浴に所要の下地めっき被膜(錫層42および銅層44)を形成した製氷室12を浸漬すると、めっき液に浸かった表面だけめっき反応が継続して起こる。従って、めっき液が接触している表面は、形状に関係なく無電解ニッケル−リンめっきが均一に施される。従って、前記製氷板16と仕切板18とがなす直角コーナー部分において、表面張力によりめっきの余剰分が残留することなく、氷塊の成長やこの氷塊の離脱の繰り返しにより、残留した余剰分が剥離してしまうことがない。また、無電解ニッケル−リンめっき被膜50の厚さが均一に形成されるので、前記製氷小室20の全ての部位において、均一な熱伝導が行なわれ、製氷および除氷運転の際に、ばらつきがなくなる。従って効率よく運転でき、製氷能力を向上させることができる。   In the electroless nickel-phosphorous plating method, when the ice making chamber 12 in which a required base plating film (tin layer 42 and copper layer 44) is formed in a plating bath is immersed, only the surface immersed in the plating solution causes the plating reaction to continue. . Therefore, the electroless nickel-phosphorous plating is uniformly applied to the surface in contact with the plating solution regardless of the shape. Therefore, at the right-angled corner portion formed by the ice making plate 16 and the partition plate 18, the surplus of plating is not peeled off due to surface tension, but the remaining surplus is peeled off by repeated growth of the ice lump or separation of the ice lump. There is no end. Further, since the thickness of the electroless nickel-phosphorous plating film 50 is uniformly formed, uniform heat conduction is performed in all parts of the ice making chamber 20, and there is variation during ice making and deicing operations. Disappear. Therefore, it can drive | operate efficiently and can improve ice making capacity.

前記無電解ニッケル−リンめっき被膜50を形成するに先立って、電気めっき法により電気ニッケルめっき被膜48を形成しておくことで、被膜形成速度の遅い前記無電解ニッケル−リンめっき法を補完し、製造スピードを向上させることができる。すなわち、無電解ニッケル−リンめっき被膜50の膜厚を薄くして、めっき時間を短縮することができる。また、比較的高価な無電解ニッケル−リンめっき液の寿命を向上させると共に、不純物の析出を防ぎ、コストを低減し得る。   Prior to the formation of the electroless nickel-phosphorus plating film 50, the electroless nickel plating film 48 is formed by electroplating, thereby complementing the electroless nickel-phosphorous plating method having a slow film formation speed, Manufacturing speed can be improved. That is, the electroless nickel-phosphorous plating film 50 can be thinned to shorten the plating time. In addition, the lifetime of the relatively expensive electroless nickel-phosphorous plating solution can be improved, the precipitation of impurities can be prevented, and the cost can be reduced.

実施例1では、前記ニッケル層46を電気めっき被膜48と、無電解ニッケル−リンめっき被膜50との2層で構成したが、これに限定されず、無電解ニッケル−リンめっき被膜のみで形成するものであってもよい。すなわち、製氷室の外表面に形成される耐蝕被膜は、該外表面(素地側)に形成された錫めっき被膜からなる錫層と、この錫層の外表面に形成された中間に位置する銅めっき被膜から形成される銅層と、この銅層の外表面に形成され、製氷室の露出面となる無電解ニッケル−リンめっき被膜からなるニッケル層とから構成される。   In Example 1, the nickel layer 46 is composed of two layers of the electroplating film 48 and the electroless nickel-phosphorous plating film 50. However, the present invention is not limited to this, and only the electroless nickel-phosphorous plating film is formed. It may be a thing. That is, the corrosion-resistant film formed on the outer surface of the ice making chamber is composed of a tin layer formed of a tin-plated film formed on the outer surface (base side) and an intermediate copper formed on the outer surface of the tin layer. A copper layer formed from a plating film and a nickel layer formed from an electroless nickel-phosphorous plating film formed on the outer surface of the copper layer and serving as an exposed surface of the ice making chamber.

本発明の好適な実施例に係る製氷室を備えた製氷機構を一部破断して示す概略斜視図である。1 is a schematic perspective view showing a partially broken ice making mechanism including an ice making chamber according to a preferred embodiment of the present invention. 図1のX部拡大図である。It is the X section enlarged view of FIG. 従来の技術に係る製氷室を備えた製氷機構を示す縦断正面図である。It is a vertical front view which shows the ice making mechanism provided with the ice making chamber based on the prior art. 図3のY部を示す拡大図である。It is an enlarged view which shows the Y section of FIG.

符号の説明Explanation of symbols

14 製氷部,22 蒸発器,42 錫層,44 銅層,46 ニッケル層
48 電気ニッケルめっき被膜,50 無電解ニッケル−リンめっき被膜
14 Ice making part, 22 Evaporator, 42 Tin layer, 44 Copper layer, 46 Nickel layer 48 Electro nickel plating film, 50 Electroless nickel-phosphorus plating film

Claims (4)

製氷水が供給されて所要形状の氷を生成する製氷部(14)と、この製氷部(14)に配設されて該製氷部(14)を冷却する蒸発器(22)とを備える製氷装置において、
前記製氷部(14)および蒸発器(22)の外表面に錫層(42)がめっきされると共に、前記錫層(42)の外表面に銅層(44)がめっきされ、
更に前記銅層(44)の外表面に、少なくとも露出面に無電解ニッケル−リンめっき被膜(50)を有するニッケル層(46)がめっきされている
ことを特徴とする製氷装置。
An ice making device comprising an ice making unit (14) that is supplied with ice making water to generate ice of a desired shape, and an evaporator (22) that is disposed in the ice making unit (14) and cools the ice making unit (14) In
The tin layer (42) is plated on the outer surface of the ice making part (14) and the evaporator (22), and the copper layer (44) is plated on the outer surface of the tin layer (42),
Furthermore, the nickel layer (46) having an electroless nickel-phosphorus plating film (50) on at least the exposed surface is plated on the outer surface of the copper layer (44).
前記ニッケル層(46)は、露出面に形成した無電解ニッケル−リンめっき被膜(50)と、前記銅層(44)側に形成した電気ニッケルめっき被膜(48)とからなる請求項1記載の製氷装置。   The said nickel layer (46) consists of an electroless nickel-phosphorus plating film (50) formed in the exposed surface, and an electro nickel plating film (48) formed in the said copper layer (44) side. Ice making equipment. 前記ニッケル層(46)は、無電解ニッケル−リンめっき被膜(50)のみで形成される請求項1記載の製氷装置。   The ice making device according to claim 1, wherein the nickel layer (46) is formed only of an electroless nickel-phosphorus plating film (50). 前記銅層(44)は、ピロリン酸銅めっき浴による電気めっき法により形成される請求項1〜3の何れかに記載の製氷装置。
The ice making device according to any one of claims 1 to 3, wherein the copper layer (44) is formed by an electroplating method using a copper pyrophosphate plating bath.
JP2003274934A 2003-07-15 2003-07-15 Ice-making device Pending JP2005037060A (en)

Priority Applications (1)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101381163B1 (en) * 2012-06-19 2014-04-04 (주) 유앤아이 Harm the human body with enhanced corrosion resistance and auger-type icemachine
WO2016181702A1 (en) * 2015-05-14 2016-11-17 ホシザキ株式会社 Automatic ice maker

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101381163B1 (en) * 2012-06-19 2014-04-04 (주) 유앤아이 Harm the human body with enhanced corrosion resistance and auger-type icemachine
WO2016181702A1 (en) * 2015-05-14 2016-11-17 ホシザキ株式会社 Automatic ice maker
CN107429962A (en) * 2015-05-14 2017-12-01 星崎株式会社 Automatic Ice Maker
US20180023874A1 (en) * 2015-05-14 2018-01-25 Hoshizaki Corporation Automatic ice maker
EP3242097A4 (en) * 2015-05-14 2018-12-05 Hoshizaki Corporation Automatic ice maker
US10274239B2 (en) 2015-05-14 2019-04-30 Hoshizaki Corporation Automatic ice maker
AU2016261527B2 (en) * 2015-05-14 2021-07-22 Hoshizaki Corporation Automatic ice maker

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