JP2005022844A - Substrate conveying device - Google Patents

Substrate conveying device Download PDF

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Publication number
JP2005022844A
JP2005022844A JP2003192056A JP2003192056A JP2005022844A JP 2005022844 A JP2005022844 A JP 2005022844A JP 2003192056 A JP2003192056 A JP 2003192056A JP 2003192056 A JP2003192056 A JP 2003192056A JP 2005022844 A JP2005022844 A JP 2005022844A
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Japan
Prior art keywords
substrate
glass substrate
unit
gas
glass
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JP2003192056A
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Japanese (ja)
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JP4311992B2 (en
Inventor
Tatsuya Nakamura
達哉 中村
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Olympus Corp
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Olympus Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate conveying device preventing the occurrence of an error by certainly sucking and retaining the substrate the end surface of which is bent and twisted. <P>SOLUTION: In the substrate conveying device, when the glass substrate 7 which is bent and twisted is sucked/retained for conveying, a blow nozzle 18 is arranged at an opposed position while clamping the end of the glass plate between suction pads 12, 13 at a receiving/giving position. At the suction by the suction pads 12, 13, a gas is delivered from the blow nozzle 18 to the bent part of the glass plate 7 to make it adhere to the suction pads 12, 13. Thus, the occurrence of conveying error is prevented. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

【0001】
【発明の属する技術分野】
本発明は、大型基板、例えば、液晶ディスプレイ(LCD)又はプラズマディスプレイパネル(PDP)等のディスプレイ用基板の搬送装置に関する。
【0002】
【従来の技術】
一般的に、従来からの表示装置であるブラウン管等に代わって、小型軽量化や省消費電力を実現するLCDやPDP等のフラットパネルディスプレイ(以下、単にディスプレイと称する)が普及しつつある。
【0003】
これらのディスプレイは、テレビジョンやパーソナルコンピュータ等の表示部に多用されており、テレビジョンにおいては、大画面化が強く望まれている。この要望に伴い、ディスプレイ基板のサイズが大型化され、製造装置においても、そのサイズに沿って大型化されている。
【0004】
ディスプレイ用の基板は主としてガラス基板が用いられており、複数の製造工程を経て、そのガラス基板上に多数の画素や駆動回路等が形成されている。これらの製造工程において、ガラス基板を空気浮上させて搬送する技術が提案されている。例えば、特許文献1においては、検査装置内において、液晶基板などの薄板の前端部を把持し、エアスライダとエアベアリングとを用いて、薄板を空気浮上させて定盤上を移送する技術が開示されている。
【0005】
【特許文献1】
特開2002−181714号公報
【0006】
【発明が解決しようとする課題】
上記特許文献1では、液晶基板等の薄板を把持して移送を行っている。一般的に液晶基板としては、ガラス基板が用いられている。前述したように、ガラス基板は大型化されると共に、厚さが薄くなっている。このため、機械的な部位により把持されているガラス基板は、その把持した箇所へ応力が集中的に掛かり、割れて破損する虞がある。
【0007】
また、製造前には平坦なガラス基板であっても、CVD等による成膜時に伴う熱やアニール処理等の熱処理が加わると、ガラス基板に大きな影響を与えて、少なからず捻れや反りを発生させている。さらには、金属膜等がガラス基板に成膜された場合には、室温であってもガラスと金属膜との熱膨張率の違いから応力が働き、ガラス基板に捻れや反りを発生させている。これは、ガラス基板が大型化されるほど、反りが発生しやすくなり、且つその反り量(反り角度)も大きくなっている。特に、ガラス基板の端部ほど反りが大きくなるため、ガラス基板の端部を確実に把持することが難しくなるばかりか、把持部がガラス基板の先端に衝突して破損する虞がある。このため、反りが生じているガラス基板を機械的な部位で把持するためには破損防止の対策が必要である。
【0008】
さらに、ガラス基板の上面には、回路素子やパターンが形成されているため、基板上面を把持することは好ましくはない。
【0009】
これに対して、本願出願人は例えば、特願2002−116581号において、ガラス基板の裏面端部を複数の吸着パッドで吸引して、ガラス基板を保持する技術を提案している。しかし、この吸着により保持する技術であっても、大きな反りが生じた場合には、隙間が吸着パッドとの間に存在するとガラス基板が吸着されず、搬送準備ができないものとして、搬送エラーとなる。
【0010】
そこで本発明は、端部に反りや捻れが発生している基板を確実に吸着して保持し搬送エラーの発生を防止する基板搬送装置を提供することを目的とする。
【0011】
【課題を解決するための手段】
本発明は上記目的を達成するために、搬送のために基板を吸引により吸着保持する基板保持部と、上記基板保持部と上記基板を挟んで対向して配置され、気体を該基板に吐出する気体吐出部とを具備し、上記基板が上記基板保持部に注着保持される際に、気体吐出部から気体を該基板に吐出して、該基板を該基板保持部へ押し付ける基板搬送装置を提供する。
【0012】
さらに、ガラス基板を搬送する基板搬送部と、外部と上記ガラス基板の受け渡しを行い、該ガラス基板を浮上状態で載置する基板ステージと、上記搬送部に設けられ、上記ガラス基板を浮上状態で載置し、且つ移動可能な移動基板ステージと、上記浮上ステージの移動と別体又は一体的に移動可能で、上記ガラス基板を吸着保持する基板保持部と、上記基板ステージ及び上記基板搬送部上に設けられ、搬送される上記ガラス基板の反り又は捻れを検出するセンサ部と、上記基板保持部と上記ガラス基板を挟んで対向し、上記受け渡しを行う位置に配置され、該基板保持部により該ガラス基板を吸着保持する際に、気体を吐出して、該基板保持部へ該ガラス基板を押し付ける気体吐出部と、を具備する基板搬送装置を提供する。
【0013】
以上のような構成の基板搬送装置は、反り又は捻れが生じている基板を搬送のために基板保持部へ吸着保持させる際に、その受け渡し位置に設けられた基板保持部に基板を挟み対向して、気体吐出部を配置して、吸着保持の際に、気体吐出部から気体を基板の反り部分に吐出して、基板保持部に吸着させて、搬送エラーの発生を回避させる。
【0014】
【発明の実施の形態】
以下、図面を参照して本発明の実施形態について詳細に説明する。
本発明による基板搬送装置を基板検査装置に搭載する一実施形態について説明する。図1は、一実施形態に係る基板検査装置の外観構成例を示す図である。以下の実施形態の説明において、ディスプレイ用のガラス基板7で、回路素子や配線パターン等が形成された面を素子形成面7a(図2では上面となる)と称し、反対にそれらが形成されていない非素子形成面を保持面7b(図2では下面となる)と称する。
【0015】
この基板検査装置は、大別して、基板搬入部1、装置本体(基板搬送部)2、検査部3、基板搬出部4及び基板搬送ロボット5,6とで構成される。
【0016】
基板搬入部1は、基板搬送ロボット5の搬送アーム8に吸着保持されているガラス基板7を基板ステージ9で受け取る。基板ステージ9の上面(基板載置面)には多数の空気孔10と、搬送アーム8が受け渡し時に入り込むための溝11が設けられている。また、基板ステージ9の搬送方向側の両端には、ガラス基板7の保持面7bを吸着して保持する基板保持部として機能する吸着パッド部12,13がそれぞれ設けられている。
【0017】
この基板搬入部1は、吸着パッド部12,13でガラス基板7の保持面7bの端部を吸着しつつ、基板ステージ9上の空気孔10から圧搾空気を吐出してガラス基板7を浮上させた状態で保持し、次の装置本体2へ搬送する。
【0018】
上記基板ステージ9の前方の両端には、装置本体の両サイドに設けられたスライダ14,15に沿って移動可能な支持部17a,17bが設けられている。また、基板搬出部4は、基板搬入部1と同様な構成であり、基板搬送ロボット6は、基板搬送ロボット5と同様な構成である。
【0019】
さらに、装置本体2の両サイドには、前述したスライダ14,15が基板搬出部4までかかるように設けられ、その内側には移動基板ステージ19を移動させるための2本のレール16が設けられる。この移動基板ステージ19は、前述した基板ステージ9と同様に、複数の空気孔10が設けられており、これらの空気孔10から圧搾空気を吐出して、ガラス基板7を浮上させた状態で保持する。さらにら、装置本体2上には、検査部3が設けられている。
【0020】
また、基板搬送ロボット5から基板ステージ9へガラス基板7を受け渡す際に支持部17aが配置される受け渡し位置Aと、基板ステージ9から移動基板ステージ19へガラス基板7を受け渡す際に支持部17bが配置される受け渡し位置Bとには、それぞれ後述する気体吐出部として機能するブローノズル18が設けられている。
【0021】
図2は、基板搬送装置における基板7を保持する保持機構の外観構成を示す図であり、図3は、保持機構のブロック構成を示す図である。
【0022】
図2に示すように、吸着パッド部13(12)は、ガラス基板7の保持面7bを吸着する複数の吸着パッド13a、13b、13c(12a、12b、12c)が支持部17a,17b上に配列されて構成される。これらの吸着パッドは、基板ステージ9の両側に1つ以上設けられればよく、特にその数量は限定されるものではない。本実施形態では、それぞれ3個の吸着パッドを設けた例である。
【0023】
これらの吸着パッド部12、13の全吸着パッドは、バルブ22を介して、排気ポンプ等からなる吸引源24に接続される。また、ブローノズル18は、基板7の素子形成面7aの上方で吸着パッド13b(13a)とほぼ対向する位置に設けられる。このブローノズル18は、バルブ21を介してコンプレッサ20に接続されている。このコンプレッサ20は、気体例えば、圧搾された空気をブローノズル18に供給する。この実施形態では、ガラス基板に吹き付ける気体として空気を用いた例で説明するが、これに限定されるものではなく、例えば、不活性ガスである窒素ガス、アルゴンガス等を用いてもよい。
【0024】
また吸着パッド部12、13の近傍には、搬送されるガラス基板7の反りや捻れを検出するセンサ25が設けられている。このセンサ25は、例えば、ガラス基板7との距離をレーザ光等で検出し、その距離によりガラス基板7の反りの有無を検出する。尚、このセンサ25を吸着パッド13aよりも搬送方向で手前に設けて、搬送アーム8により基板ステージ9に近接させつつ移動するガラス基板7を連続的に検出すれば、反りの状態(反り具合や反り量)を検出することもできる。この場合には、ガラス基板7が基板ステージ9と接触しないように、空気孔10から圧搾空気を吐出する。また全ガラス基板対して、後述する吸着のための押し付け処理を行うのであれば、センサ25を設けなくてもよい。
これらのセンサ25、コンプレッサ20及びバルブ21,22は、制御部23によりそれぞれ制御されている。
【0025】
このように構成された保持機構の作用について説明する。
まず、基板搬送ロボット5に載置されたガラス基板7は、搬送アーム8によって、基板搬入部1の基板ステージ9へ受け渡される。この際に、空気孔10から圧搾空気を吐出して、基板ステージ9へガラス基板7に接触しないようにガラス基板7を浮上させた状態で受け取ってもよい。また、支持部17a,17bは、受け渡し位置Aに移動させ、移動基板ステージ19は、基板搬入部1の基板ステージ9に当接させておく。
【0026】
その後、センサ25によりガラス基板7に反りの有無を検出する。反りが生じていたと制御部23が判断した場合には、制御部23は、バルブ21とバルブ22を開けて、ブローノズル18による空気の吹きつ付け(吐出)と、吸着パッド部12,13による吸引をそれぞれ行う。
【0027】
この空気の吹き付けにより、ガラス基板7の反り部分は、吸着パッド部12,13により近づくように押し付けられる。ガラス基板7は、押し付けにより反り部分が戻され、吸着パッド部12,13に吸着される。この吸着は、吸着パッド部12,13とバルブ22との間に図示しない圧力センサを設けて検出する。ここでは、圧力センサで検出される圧力が下がれば吸着したものと判定している。
【0028】
また、センサ25を設けていない場合には、反りの有無が判定できないため、基板ステージ9の載置面へガラス基板7が載置される度に、ブローノズル18による空気の吹きつ付けを行いつつ、吸着パッド部12,13による吸引を行う。
【0029】
そしてガラス基板7が吸着パッド部12,13に吸着された後、支持部17aを移動基板ステージ19への受け渡し位置Bまで移動させる。この移動に伴い、吸着パッド部12,13に吸着されるガラス基板7が移動基板ステージ19上へ搬送される。
【0030】
この受け渡し位置Bにおいて、支持部17aは吸着を解除して、受け渡し位置Aに戻り、次のガラス基板7の搬入に待機する。支持部17bは受け渡し位置Bまで移動して、ブローノズル18による空気の吹きつ付けを行いつつ、吸着パッド部12,13による吸引を行う。吸着が完了すると、支持部17aと移動基板ステージ19は、一体的に移動して検査部3へ移動する。
【0031】
以上のように本実施形態は、反りや捻れが生じているガラス基板であっても搬送装置に保持される際に、気体(空気)を吹き付けて、反りや捻れ部分を吸着パッド部に押し付けることにより、吸着を短時間で確実に吸着させて、搬送エラーを回避することができる。
【0032】
また、センサにより反り状態を検出して、その反り状態に好適するように吹き付ける吐出圧や吐出量を調整することにより、さらに確実に且つ適正に吸着させることができる。これを実現する場合には、バルブ21をガス流量が調整可能な可変バルブを用いればよい。
【0033】
また、本実施形態では、両側に1個ずつのブローノズル18を配置したが、これに限定されるものではなく、例えば、2個ずつを吸着パッド部の配列に従って配置して用いてもよい。
【0034】
【発明の効果】
以上詳述したように本発明によれば、端部に反りや捻れが発生している基板を確実に吸着して保持し搬送エラーの発生を防止する基板搬送装置を提供することができる。
【図面の簡単な説明】
【図1】本発明の一実施形態に係る基板検査装置の外観構成例を示す図である。
【図2】基板搬送装置における基板を保持する保持機構の外観構成を示す図である。
【図3】保持機構のブロック構成を示す図である。
【符号の説明】
1…基板搬入部、2…装置本体(基板搬送部)、3…検査部、4…基板搬出部、5,6…基板搬送ロボット、7…ガラス基板、8…搬送アーム、9…基板ステージ、10…空気孔、11…溝、12,13…吸着パッド、14,15…スライダ、16…レール、17a,17b…支持部、18…ブローノズル、19…移動基板ステージ、20…プロセッサ、21,22…バルブ、23…制御部、24…吸引源、25…センサ。
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a transfer device for a substrate for a display such as a large substrate, for example, a liquid crystal display (LCD) or a plasma display panel (PDP).
[0002]
[Prior art]
In general, flat panel displays (hereinafter simply referred to as displays) such as LCDs and PDPs, which achieve a reduction in size and weight and power consumption, are becoming popular in place of conventional display devices such as cathode ray tubes.
[0003]
These displays are often used in display units of televisions, personal computers, and the like, and there is a strong demand for large screens in televisions. With this demand, the size of the display substrate is increased, and the size of the display apparatus is also increased in the manufacturing apparatus.
[0004]
A glass substrate is mainly used as a display substrate, and a plurality of pixels, drive circuits, and the like are formed on the glass substrate through a plurality of manufacturing steps. In these manufacturing processes, a technique has been proposed in which a glass substrate is transported by air levitation. For example, Patent Document 1 discloses a technique in which a front end of a thin plate such as a liquid crystal substrate is gripped in an inspection apparatus, and the thin plate is floated on the surface plate using an air slider and an air bearing. Has been.
[0005]
[Patent Document 1]
Japanese Patent Laid-Open No. 2002-181714
[Problems to be solved by the invention]
In Patent Document 1, a thin plate such as a liquid crystal substrate is held and transferred. In general, a glass substrate is used as the liquid crystal substrate. As described above, the glass substrate is increased in size and reduced in thickness. For this reason, the glass substrate gripped by the mechanical part is subject to stress concentrated on the gripped part and may be broken and broken.
[0007]
In addition, even if the glass substrate is flat before manufacturing, heat treatment such as CVD during film formation or heat treatment such as annealing treatment will have a significant effect on the glass substrate, causing a considerable amount of twisting and warping. ing. Furthermore, when a metal film or the like is formed on a glass substrate, stress acts due to the difference in thermal expansion coefficient between the glass and the metal film even at room temperature, causing the glass substrate to be twisted or warped. . As the glass substrate becomes larger, warpage is more likely to occur, and the warpage amount (warpage angle) becomes larger. In particular, since the warpage increases toward the end of the glass substrate, it is difficult to reliably grip the end of the glass substrate, and the gripping portion may collide with the tip of the glass substrate and be damaged. For this reason, in order to hold | grip the glass substrate which has generate | occur | produced the curvature with a mechanical site | part, the countermeasure of damage prevention is required.
[0008]
Further, since circuit elements and patterns are formed on the upper surface of the glass substrate, it is not preferable to hold the upper surface of the substrate.
[0009]
On the other hand, for example, in Japanese Patent Application No. 2002-116581, the applicant of the present application proposes a technique for holding the glass substrate by sucking the back end portion of the glass substrate with a plurality of suction pads. However, even with this holding technique, if a large warp occurs, if there is a gap between the suction pad and the suction pad, the glass substrate will not be sucked and it will not be ready for transport, resulting in a transport error. .
[0010]
SUMMARY OF THE INVENTION An object of the present invention is to provide a substrate transport apparatus that reliably attracts and holds a substrate having warped or twisted edges and prevents a transport error.
[0011]
[Means for Solving the Problems]
In order to achieve the above-mentioned object, the present invention is arranged so that a substrate is sucked and held by suction for conveyance, and the substrate holding part and the substrate are opposed to each other, and gas is discharged onto the substrate. A substrate transfer device that includes a gas discharge unit, and discharges gas from the gas discharge unit to the substrate when the substrate is poured and held on the substrate holding unit, and presses the substrate against the substrate holding unit. provide.
[0012]
Furthermore, a substrate transport unit that transports the glass substrate, a substrate stage that transfers the glass substrate to the outside and places the glass substrate in a floating state, and a transport unit that is provided in the transport unit, the glass substrate in a floating state A movable substrate stage that can be placed and moved, a substrate holding unit that can be moved separately from or integrally with the floating stage, and that holds the glass substrate by suction, and the substrate stage and the substrate transport unit A sensor unit that detects warpage or twist of the glass substrate that is conveyed and is opposed to the substrate holding unit with the glass substrate interposed therebetween, and is disposed at a position where the delivery is performed, and the substrate holding unit Provided is a substrate transport apparatus comprising: a gas discharge unit that discharges gas when pressing and holding a glass substrate and presses the glass substrate against the substrate holding unit.
[0013]
The substrate transport apparatus having the above-described configuration is configured such that when a substrate with warping or twisting is sucked and held on the substrate holding portion for transport, the substrate is sandwiched and opposed to the substrate holding portion provided at the transfer position. Then, the gas discharge unit is arranged, and at the time of suction holding, the gas is discharged from the gas discharge unit onto the warped portion of the substrate and is sucked to the substrate holding unit, thereby avoiding the occurrence of a transport error.
[0014]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
An embodiment in which a substrate transfer apparatus according to the present invention is mounted on a substrate inspection apparatus will be described. FIG. 1 is a diagram illustrating an external configuration example of a substrate inspection apparatus according to an embodiment. In the following description of the embodiment, the surface of the glass substrate 7 for display on which circuit elements, wiring patterns, and the like are formed is referred to as an element forming surface 7a (which is the upper surface in FIG. 2). The non-element-forming surface that does not exist is referred to as a holding surface 7b (becomes the lower surface in FIG. 2).
[0015]
This substrate inspection apparatus is roughly divided into a substrate carry-in unit 1, an apparatus main body (substrate transfer unit) 2, an inspection unit 3, a substrate carry-out unit 4, and substrate transfer robots 5 and 6.
[0016]
The substrate carry-in unit 1 receives the glass substrate 7 sucked and held by the transfer arm 8 of the substrate transfer robot 5 at the substrate stage 9. The upper surface (substrate mounting surface) of the substrate stage 9 is provided with a large number of air holes 10 and grooves 11 through which the transfer arm 8 enters during delivery. Further, suction pad portions 12 and 13 functioning as substrate holding portions for sucking and holding the holding surface 7b of the glass substrate 7 are provided at both ends of the substrate stage 9 on the conveyance direction side.
[0017]
The substrate carrying-in unit 1 is in a state where the glass substrate 7 is floated by discharging compressed air from the air holes 10 on the substrate stage 9 while adsorbing the end portions of the holding surface 7b of the glass substrate 7 with the suction pad portions 12 and 13. And is transported to the next apparatus main body 2.
[0018]
At both front ends of the substrate stage 9, support portions 17a and 17b are provided which are movable along sliders 14 and 15 provided on both sides of the apparatus main body. The substrate carry-out unit 4 has the same configuration as the substrate carry-in unit 1, and the substrate transfer robot 6 has the same configuration as the substrate transfer robot 5.
[0019]
Furthermore, the sliders 14 and 15 described above are provided on both sides of the apparatus main body 2 so as to reach the substrate carry-out section 4, and two rails 16 for moving the movable substrate stage 19 are provided on the inside thereof. . Similar to the substrate stage 9 described above, the movable substrate stage 19 is provided with a plurality of air holes 10, and compressed air is discharged from these air holes 10 to hold the glass substrate 7 in a floating state. To do. Furthermore, an inspection unit 3 is provided on the apparatus main body 2.
[0020]
Further, a delivery position A where the support portion 17 a is disposed when the glass substrate 7 is delivered from the substrate transfer robot 5 to the substrate stage 9, and a support portion when the glass substrate 7 is delivered from the substrate stage 9 to the moving substrate stage 19. Blow nozzles 18 each functioning as a gas discharge portion described later are provided at the transfer position B where 17b is disposed.
[0021]
FIG. 2 is a diagram illustrating an external configuration of a holding mechanism that holds the substrate 7 in the substrate transport apparatus, and FIG. 3 is a block diagram illustrating the holding mechanism.
[0022]
As shown in FIG. 2, the suction pad portion 13 (12) has a plurality of suction pads 13a, 13b, 13c (12a, 12b, 12c) that suck the holding surface 7b of the glass substrate 7 on the support portions 17a, 17b. Arranged and configured. One or more of these suction pads may be provided on both sides of the substrate stage 9, and the number thereof is not particularly limited. In the present embodiment, three suction pads are provided.
[0023]
All of the suction pads 12 and 13 are connected via a valve 22 to a suction source 24 such as an exhaust pump. The blow nozzle 18 is provided above the element formation surface 7a of the substrate 7 at a position substantially opposite to the suction pad 13b (13a). The blow nozzle 18 is connected to the compressor 20 via a valve 21. The compressor 20 supplies gas, for example, compressed air, to the blow nozzle 18. In this embodiment, an example in which air is used as a gas to be blown onto the glass substrate will be described. However, the present invention is not limited to this. For example, an inert gas such as nitrogen gas or argon gas may be used.
[0024]
Further, in the vicinity of the suction pad portions 12 and 13, a sensor 25 that detects warpage and twist of the glass substrate 7 to be conveyed is provided. For example, the sensor 25 detects the distance to the glass substrate 7 with a laser beam or the like, and detects the presence or absence of warpage of the glass substrate 7 based on the distance. If the sensor 25 is provided in front of the suction pad 13a in the transport direction, and the glass substrate 7 that moves while being brought close to the substrate stage 9 is continuously detected by the transport arm 8, the state of warping (warping condition and It is also possible to detect the amount of warping. In this case, the compressed air is discharged from the air holes 10 so that the glass substrate 7 does not contact the substrate stage 9. In addition, the sensor 25 may not be provided as long as a pressing process for suction described later is performed on all glass substrates.
The sensor 25, the compressor 20, and the valves 21 and 22 are controlled by the control unit 23, respectively.
[0025]
The operation of the holding mechanism configured as described above will be described.
First, the glass substrate 7 placed on the substrate transport robot 5 is transferred to the substrate stage 9 of the substrate carry-in unit 1 by the transport arm 8. At this time, the compressed air may be discharged from the air holes 10 to receive the glass substrate 7 in a floating state so as not to contact the glass substrate 7 to the substrate stage 9. Further, the support portions 17 a and 17 b are moved to the delivery position A, and the movable substrate stage 19 is brought into contact with the substrate stage 9 of the substrate carry-in portion 1.
[0026]
Thereafter, the sensor 25 detects whether the glass substrate 7 is warped. When the control unit 23 determines that the warp has occurred, the control unit 23 opens the valve 21 and the valve 22, blows air (discharge) by the blow nozzle 18, and uses the suction pad units 12 and 13. Aspirate each.
[0027]
By this air blowing, the warped portion of the glass substrate 7 is pressed closer to the suction pad portions 12 and 13. The warped portion of the glass substrate 7 is returned by pressing and is sucked to the suction pad portions 12 and 13. This suction is detected by providing a pressure sensor (not shown) between the suction pad portions 12 and 13 and the valve 22. Here, if the pressure detected by the pressure sensor decreases, it is determined that the adsorption has occurred.
[0028]
Further, when the sensor 25 is not provided, the presence or absence of warpage cannot be determined. Therefore, each time the glass substrate 7 is placed on the placement surface of the substrate stage 9, air is blown by the blow nozzle 18. While performing suction by the suction pad portions 12 and 13.
[0029]
Then, after the glass substrate 7 is sucked by the suction pad portions 12 and 13, the support portion 17 a is moved to the delivery position B to the moving substrate stage 19. Along with this movement, the glass substrate 7 sucked by the suction pad portions 12 and 13 is transferred onto the moving substrate stage 19.
[0030]
At the delivery position B, the support portion 17a releases the suction, returns to the delivery position A, and waits for the next glass substrate 7 to be carried. The support portion 17b moves to the delivery position B and performs suction by the suction pad portions 12 and 13 while blowing air by the blow nozzle 18. When the suction is completed, the support portion 17a and the movable substrate stage 19 move integrally and move to the inspection portion 3.
[0031]
As described above, in the present embodiment, even when a glass substrate is warped or twisted, when held by the transfer device, the gas (air) is blown to press the warped or twisted portion against the suction pad portion. Thus, the suction can be reliably suctioned in a short time, and a conveyance error can be avoided.
[0032]
Further, by detecting the warped state by the sensor and adjusting the discharge pressure and the discharge amount to be sprayed so as to be suitable for the warped state, it is possible to more reliably and appropriately adsorb. In order to realize this, the valve 21 may be a variable valve whose gas flow rate can be adjusted.
[0033]
In the present embodiment, one blow nozzle 18 is arranged on each side, but the present invention is not limited to this. For example, two blow nozzles 18 may be arranged and used according to the arrangement of the suction pad portions.
[0034]
【The invention's effect】
As described above in detail, according to the present invention, it is possible to provide a substrate transport apparatus that reliably attracts and holds a substrate having warped or twisted ends and prevents a transport error.
[Brief description of the drawings]
FIG. 1 is a diagram illustrating an external configuration example of a substrate inspection apparatus according to an embodiment of the present invention.
FIG. 2 is a diagram showing an external configuration of a holding mechanism that holds a substrate in the substrate transfer apparatus.
FIG. 3 is a diagram showing a block configuration of a holding mechanism.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 ... Substrate carrying-in part, 2 ... Apparatus main body (substrate conveyance part), 3 ... Inspection part, 4 ... Substrate carrying-out part, 5, 6 ... Substrate conveyance robot, 7 ... Glass substrate, 8 ... Conveyance arm, 9 ... Substrate stage, DESCRIPTION OF SYMBOLS 10 ... Air hole, 11 ... Groove, 12, 13 ... Suction pad, 14, 15 ... Slider, 16 ... Rail, 17a, 17b ... Supporting part, 18 ... Blow nozzle, 19 ... Moving substrate stage, 20 ... Processor, 21, 22 ... valve, 23 ... control unit, 24 ... suction source, 25 ... sensor.

Claims (4)

搬送のために基板を吸引により吸着保持する基板保持部と、
上記基板保持部と上記基板を挟んで対向して配置され、気体を該基板に吐出する気体吐出部と、を具備し、
上記基板が上記基板保持部に吸着保持される際に、気体吐出部から気体を該基板に吐出して、該基板を該基板保持部へ押し付けることを特徴とする基板搬送装置。
A substrate holding unit that holds the substrate by suction for conveyance;
A gas discharge part that is disposed opposite to the substrate holding part and sandwiches the substrate, and discharges gas to the substrate;
A substrate transfer apparatus, wherein when the substrate is sucked and held by the substrate holding portion, gas is discharged from the gas discharge portion onto the substrate and the substrate is pressed against the substrate holding portion.
ガラス基板を浮上状態で載置する浮上ステージと、
上記浮上ステージ上の上記ガラス基板を吸着保持する基板保持部と、
上記基板保持部と上記ガラス基板を挟んで対向して配置され、該基板保持部により該ガラス基板を吸着保持する際に、気体を吐出して、該基板保持部へ該ガラス基板を押し付ける気体吐出部と、
上記基板保持部を搬送方向に移動させて上記ガラス基板を搬送する基板搬送部と、
を具備することを特徴とする基板搬送装置。
A levitation stage for placing the glass substrate in a levitation state;
A substrate holding part for sucking and holding the glass substrate on the floating stage;
Gas discharge, which is arranged to face the substrate holding part with the glass substrate interposed therebetween, discharges gas when pressing and holding the glass substrate by the substrate holding part, and presses the glass substrate against the substrate holding part And
A substrate transport unit that transports the glass substrate by moving the substrate holding unit in the transport direction;
A substrate transfer apparatus comprising:
上記基板搬送装置において、さらに、
上記基板保持部に設けられ、搬送される上記ガラス基板の反り量を検出するセンサ部を具備し、
上記ガラス基板の反り量に応じて上記気体吐出部の気体の流量を調整することを特徴とする請求項2に記載の基板搬送装置。
In the substrate transfer apparatus, further
Provided in the substrate holding unit, comprising a sensor unit for detecting the amount of warp of the glass substrate being conveyed,
The substrate transfer apparatus according to claim 2, wherein a gas flow rate of the gas discharge unit is adjusted according to a warp amount of the glass substrate.
上記センサ部は、上記ガラス基板の反り方向を検出し、反り方向が上向きと判断されたときには、上記気体吐出部より上記ガラス基板に気体を吐出し、上記反り方向が下向きと判断されたときには、上記気体吐出部からの気体の吐出を停止させることを特徴とする請求項3に記載の基板搬送装置。The sensor unit detects the warping direction of the glass substrate, and when the warping direction is determined to be upward, the gas is discharged from the gas discharge unit to the glass substrate, and when the warping direction is determined to be downward, The substrate transfer apparatus according to claim 3, wherein gas discharge from the gas discharge unit is stopped.
JP2003192056A 2003-07-04 2003-07-04 Substrate transfer device Expired - Fee Related JP4311992B2 (en)

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JP2009018917A (en) * 2007-07-12 2009-01-29 Tokyo Ohka Kogyo Co Ltd Application device, substrate delivery method and application method
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JP2006269867A (en) * 2005-03-25 2006-10-05 Canon Inc Exposure apparatus
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JP2009018917A (en) * 2007-07-12 2009-01-29 Tokyo Ohka Kogyo Co Ltd Application device, substrate delivery method and application method
JP2012134419A (en) * 2010-12-24 2012-07-12 Tokyo Ohka Kogyo Co Ltd Coating applicator and coating method
WO2015170208A1 (en) * 2014-05-03 2015-11-12 Semiconductor Energy Laboratory Co., Ltd. Film-like member support apparatus
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US10040175B2 (en) 2014-05-03 2018-08-07 Semiconductor Energy Laboratory Co., Ltd. Film-like member support apparatus
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JP2018152447A (en) * 2017-03-13 2018-09-27 東レエンジニアリング株式会社 Substrate Levitation Transport Device

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