JP2005019407A - Organic el element and its manufacturing method - Google Patents

Organic el element and its manufacturing method Download PDF

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JP2005019407A
JP2005019407A JP2004187598A JP2004187598A JP2005019407A JP 2005019407 A JP2005019407 A JP 2005019407A JP 2004187598 A JP2004187598 A JP 2004187598A JP 2004187598 A JP2004187598 A JP 2004187598A JP 2005019407 A JP2005019407 A JP 2005019407A
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cathode
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JP4644757B2 (en
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Kuo Han-Ju
クオ ハン−ジュ
Jun-Wen Chung
チャン ジュン−ウェン
Han Chen-Wei
ハン チェン−ウェイ
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Kyocera Corp
Chi Mei Optoelectronics Corp
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Chi Mei Optoelectronics Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an organic EL element and a manufacturing method for it improved in the stability of a transparent negative electrode conductive layer. <P>SOLUTION: This organic EL element is formed with a positive electrode layer, an organic functional layer, and a co-evaporation layer at least. The organic functional layer is positioned on the positive electrode layer, while the co-evaporation layer is positioned on the organic functional layer. The co-evaporation layer is provided with a metal layer and an MTiO<SB>3</SB>layer (M represents a metal layer material), and the metal layer serves as a principal negative electrode layer. The MTiO<SB>3</SB>layer is formed by co-evaporation between a low work function metal and a metal oxide. In this way, adhesion between the negative electrode metal and the co-evaporation layer is improved, and the conductivity and protection of the negative electrode can be reinforced, while a light output amount of the organic EL element is increased by a high refraction index. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

本発明は有機EL(OEL)素子とその製造方法に関し、特に有機EL素子の安定性を改善することのできる陰極導電層や、有機EL素子の光取出し量(light outcoupling)を増加する技術に関する。   The present invention relates to an organic EL (OEL) element and a method for manufacturing the same, and more particularly to a cathode conductive layer capable of improving the stability of the organic EL element and a technique for increasing the light outcoupling of the organic EL element.

有機EL素子は自発光、広視野角、高応答速度、低駆動電圧、フルカラーなどの特徴を備え、現在すでに実用化されており、小型ディスプレイ・パネル、屋外スクリーン、パソコンおよびテレビのスクリーン等のようなカラー平面ディスプレイ素子に応用することができる。有機EL素子は、発光特性を備える有機層が2つの電極によって挟まれた構成をしている。2つの電極に直流電圧が印加されると、正孔が陽極から注入され、電子が陰極から注入される。印加電圧によって生じる電界によりキャリアが有機発光層の内部へと移動してキャリアの再結合が生じる。電子と正孔との再結合によって放出されるエネルギーの一部が発光分子を励起する。励起された発光分子がエネルギーを放出して基底状態に戻る時、ある一定の比率のエネルギーが光子の形となって放出される。これが有機EL素子の発光原理である。一般に知られた有機EL素子は図1に示すとおりである。   Organic EL devices have features such as self-emission, wide viewing angle, high response speed, low drive voltage, full color, and are already in practical use, such as small display panels, outdoor screens, personal computers and TV screens. It can be applied to various color flat display elements. The organic EL element has a configuration in which an organic layer having light emission characteristics is sandwiched between two electrodes. When a DC voltage is applied to the two electrodes, holes are injected from the anode and electrons are injected from the cathode. The electric field generated by the applied voltage causes the carriers to move into the organic light emitting layer and cause carrier recombination. Part of the energy released by recombination of electrons and holes excites the luminescent molecules. When the excited luminescent molecule releases energy and returns to the ground state, a certain ratio of energy is released in the form of photons. This is the light emission principle of the organic EL element. A generally known organic EL element is as shown in FIG.

図1はよく知られた有機EL素子の断面概略図である。図1に示すように、有機EL素子100は、ガラス等で形成される基板10と、陰極層18と、透明の酸化インジウムスズ(ITO)等で形成される陽極層12と、陰極層18と陽極層12の間に形成されている発光特性を備える有機機能層(EML)16等を備えている。
有機EL素子100の陰極18は、通常、カルシウム、マグネシウム、マグネシウム銀合金のような低仕事関数の活性金属や酸化インジウムスズ、酸化インジウム亜鉛(IZO)などの透明な金属酸化物で形成される。有機機能層16の屈折率nの値が約1.7であることから、陰極18の上方にさらに屈折率nの高いキャップ層22を蒸着し、界面における全反射現象を低減して光取出し量を増加させることが必要となる。
FIG. 1 is a schematic cross-sectional view of a well-known organic EL element. As shown in FIG. 1, the organic EL element 100 includes a substrate 10 formed of glass or the like, a cathode layer 18, an anode layer 12 formed of transparent indium tin oxide (ITO) or the like, and a cathode layer 18. An organic functional layer (EML) 16 having light emission characteristics formed between the anode layers 12 is provided.
The cathode 18 of the organic EL element 100 is usually formed of a low work function active metal such as calcium, magnesium, or a magnesium silver alloy, or a transparent metal oxide such as indium tin oxide or indium zinc oxide (IZO). Since the value of the refractive index n of the organic functional layer 16 is about 1.7, a cap layer 22 having a higher refractive index n is deposited above the cathode 18 to reduce the total reflection phenomenon at the interface, thereby reducing the light extraction amount. Need to be increased.

有機EL素子では、比較的安定性の高い陰極18を得るために、酸化インジウムスズの透明電極を採用することが多いが、これはスパッタ蒸着によって形成しなければならず、スパッタ蒸着の過程において有機EL素子100が損傷を受けやすいという問題がある。
従って、本発明の一つの目的は、透明陰極導電層の安定性を改善した有機EL素子と、その製造方法を提供することである。
本発明の他の一つの目的は、光取出し量を増加するとともに透明陰極導電層の安定性を改善した有機EL素子と、その製造方法を提供することである。
In order to obtain the cathode 18 having relatively high stability, the organic EL element often employs a transparent electrode of indium tin oxide, which must be formed by sputter deposition. There is a problem that the EL element 100 is easily damaged.
Accordingly, one object of the present invention is to provide an organic EL device with improved stability of the transparent cathode conductive layer and a method for producing the same.
Another object of the present invention is to provide an organic EL device that increases the light extraction amount and improves the stability of the transparent cathode conductive layer, and a method for manufacturing the same.

前記およびその他の目的に基づき、本発明が提供する有機EL素子は、少なくとも陽極層、有機機能層および同時蒸着陰極層を備える。有機機能層は陽極層上に位置し、同時蒸着陰極層は有機機能層上に位置する。同時蒸着陰極層は、金属層とMTiO層(ここでMTiOのMは金属層の材料を表す)を備える。MTiO層は、低仕事関数の金属と酸化チタンとの同時蒸着によって生成される高屈折率の透明な金属酸化物である導電性物質で形成することができる。金属層は、低仕事関数の金属材料で形成することができ、例えば元素周期表2A族の元素を採用することができる。
同時蒸着によって形成される金属のチタン酸化物は、その導電性により有機EL素子の陰極層として働くと共に、その透明で高屈折率の特性によりキャップ層として働くこともできる。
本発明はまた、新規で有用な有機EL素子の製造方法を提供する。この製造方法は、先ず基板を用意し、次いで基板上に陽極層を形成し、その後に陽極層上に有機機能層を蒸着し、次に有機機能層上に同時蒸着層を形成する。
Based on the above and other objects, the organic EL device provided by the present invention includes at least an anode layer, an organic functional layer, and a co-evaporated cathode layer. The organic functional layer is located on the anode layer, and the co-deposited cathode layer is located on the organic functional layer. The co-evaporated cathode layer includes a metal layer and an MTiO 3 layer (where M in MTiO 3 represents the material of the metal layer). The MTiO 3 layer can be formed of a conductive material which is a high refractive index transparent metal oxide produced by co-evaporation of a low work function metal and titanium oxide. The metal layer can be formed of a metal material having a low work function, and for example, an element of Group 2A of the periodic table can be adopted.
The metal titanium oxide formed by co-evaporation functions as a cathode layer of the organic EL element due to its conductivity, and can also function as a cap layer due to its transparent and high refractive index characteristics.
The present invention also provides a novel and useful method for producing an organic EL device. In this manufacturing method, a substrate is first prepared, then an anode layer is formed on the substrate, an organic functional layer is vapor-deposited on the anode layer, and then a co-evaporated layer is formed on the organic functional layer.

後述する本発明の好適な実施形態に述べるとおり、同時蒸着層は同時蒸着法を用いて先ず有機機能層上に金属層を蒸着し、次いで酸化チタンと同時蒸着を行うことにより、MTiO層を形成する。 As described in a preferred embodiment of the present invention, which will be described later, the co-deposited layer is formed by first depositing a metal layer on the organic functional layer using a co-evaporation method, and then co-depositing with titanium oxide to form the MTiO 3 layer. Form.

本発明は同時蒸着法を用いて形成した透明導電層を陰極層とすることから、陰極層の屈折率nの値が高く、有機機能層から発せられた光が界面において全反射する現象を低減することができる。有機層に吸収される光量を減少することができ、光の取出し量が増加する。また、陰極金属層との密着が良好であると共に、陰極金属層を保護する効果がある。   In the present invention, the transparent conductive layer formed by the co-evaporation method is used as the cathode layer, so that the cathode layer has a high refractive index n and reduces the phenomenon that the light emitted from the organic functional layer is totally reflected at the interface. can do. The amount of light absorbed by the organic layer can be reduced, and the amount of light extracted increases. In addition, the adhesion to the cathode metal layer is good and the cathode metal layer is protected.

以下、本発明を実施する好適な実施形態を、図面を参照しながら詳細に説明する。図2は、本実施形態の有機EL(OEL)素子の製造手順を示すフローチャートである。図3は、図2に示すフローチャートによって製造される有機EL素子300の断面概略図である。   DESCRIPTION OF EMBODIMENTS Hereinafter, preferred embodiments for carrying out the present invention will be described in detail with reference to the drawings. FIG. 2 is a flowchart showing a manufacturing procedure of the organic EL (OEL) element of this embodiment. FIG. 3 is a schematic cross-sectional view of the organic EL element 300 manufactured by the flowchart shown in FIG.

図2を参照されたい。先ずステップ200では基板30を用意する。基板30の材料は例えばガラスを採用することができ、または使用上適当なその他の基板材料を採用することもできる。
ステップ202では、基板30上に陽極層302を形成する。陽極層302の材料には、例えば酸化インジウムスズ(ITO)を採用することができ、または使用上適当なその他の金属を採用することもできる。
Please refer to FIG. First, in step 200, the substrate 30 is prepared. The material of the substrate 30 may be, for example, glass, or other substrate material suitable for use.
In step 202, an anode layer 302 is formed on the substrate 30. As the material of the anode layer 302, for example, indium tin oxide (ITO) can be adopted, or other metals suitable for use can be adopted.

ステップ204では、陽極層302上に有機機能層306を形成する。陽極層302上に有機機能層306を形成する工程では、陽極層302上に先ず正孔輸送層(HTL)304を形成し、陽極層302からの正孔の輸送が促されるようにする。次いで正孔輸送層304上に有機発光層310を形成し、有機発光層310上に電子輸送層(ETL)314を形成して、陰極からの電子の輸送が促されるようにする。
また、陽極層302上に正孔輸送層304を形成する前に、陽極層302上に図示しない正孔注入層(HIL)をさらに形成してもよい。それにより、印加電圧が低い時でも正孔を有機発光層310へ注入できるようになる。これに加えて、有機発光層310上に電子輸送層314を形成した後に、図示しない電子輸送層314上に電子注入層(EIL)をさらに形成してもよい。それにより、陰極からの電子の注入を促すことができる。
In step 204, an organic functional layer 306 is formed on the anode layer 302. In the step of forming the organic functional layer 306 on the anode layer 302, a hole transport layer (HTL) 304 is first formed on the anode layer 302 so that the transport of holes from the anode layer 302 is promoted. Next, an organic light emitting layer 310 is formed on the hole transport layer 304, and an electron transport layer (ETL) 314 is formed on the organic light emitting layer 310 so as to facilitate the transport of electrons from the cathode.
Further, before forming the hole transport layer 304 on the anode layer 302, a hole injection layer (HIL) (not shown) may be further formed on the anode layer 302. Accordingly, holes can be injected into the organic light emitting layer 310 even when the applied voltage is low. In addition, after the electron transport layer 314 is formed on the organic light emitting layer 310, an electron injection layer (EIL) may be further formed on the electron transport layer 314 (not shown). Thereby, the injection of electrons from the cathode can be promoted.

ステップ206では、同時蒸着法によって、電子輸送層314上に同時蒸着層312を形成する。この同時蒸着工程では、先ず薄い金属層313aを電子輸送層314上に蒸着して形成し、次いでこの金属と酸化チタン(TiO)との同時蒸着を行い、金属層313a上に金属酸化物を蒸着する。それにより、金属層313aとの界面結合が良好なMTiO層313bを形成することができる。ここでMTiOのMは金属層313aを形成している金属材料を表す。金属層313aとMTiO層313bにより、透明であり導電性を備える同時蒸着層312が構成される。この同時蒸着工程では、チャンバー圧力を10−4〜10−5Torrの範囲内に制御するとよい。前述の正孔輸送層304、有機発光層310、正孔注入層、電子輸送層314、電子注入層等の各層は、いずれも熱蒸着によって形成することができることから、同時蒸着層312を形成する同時蒸着工程は、他の層の製造工程との互換性がよく、例えば同じ蒸着装置を共用することも可能である。有機EL素子を損傷させやすいスパッタ蒸着法を用いずに、有機EL素子の陰極層を形成することができる。 In step 206, a co-evaporation layer 312 is formed on the electron transport layer 314 by co-evaporation. In this co-evaporation step, a thin metal layer 313a is first formed by vapor deposition on the electron transport layer 314, and then the metal and titanium oxide (TiO) are co-evaporated to deposit a metal oxide on the metal layer 313a. To do. Thereby, the MTiO 3 layer 313b having good interface bonding with the metal layer 313a can be formed. Here, M in MTiO 3 represents a metal material forming the metal layer 313a. The metal layer 313a and the MTiO 3 layer 313b constitute a co-evaporation layer 312 that is transparent and has conductivity. In this simultaneous vapor deposition step, the chamber pressure may be controlled within the range of 10 −4 to 10 −5 Torr. Each of the above-described layers such as the hole transport layer 304, the organic light emitting layer 310, the hole injection layer, the electron transport layer 314, and the electron injection layer can be formed by thermal evaporation. The simultaneous vapor deposition process has good compatibility with the manufacturing process of other layers, and for example, it is possible to share the same vapor deposition apparatus. The cathode layer of the organic EL element can be formed without using a sputter deposition method that easily damages the organic EL element.

図3は本発明の好適な実施形態による有機EL素子の断面概略図である。図3を参照されたい。本実施形態の有機EL素子300は、基板30と、陽極層302と、有機機能層306と、同時蒸着層312等を備えている。有機EL素子300における各層の配置は、陽極302は基板30上に位置し、有機機能層306は陽極層302上に位置し、同時蒸着層312は有機機能層306上に位置する。このうち、有機機能層306は少なくとも有機発光層310を含み、また有機発光層310と陽極層302との間にはさらに正孔輸送層304を配置してもよく、有機発光層310と同時蒸着層312との間にはさらに電子輸送層314を配置してもよい。また、有機機能層306の中には、さらに正孔注入層(図示せず)を陽極層302と正孔輸送層304との間に配置することもできる。それにより、印加電圧が低い時でも正孔を有機発光層310へと移動させることができる。この他、有機機能層306の中には、さらに電子注入層(図示せず)を電子輸送層314と同時蒸着層312との間に配置してもよい。それにより、電子が有機発光層310へより移動しやすくなる。   FIG. 3 is a schematic cross-sectional view of an organic EL device according to a preferred embodiment of the present invention. Please refer to FIG. The organic EL element 300 of the present embodiment includes a substrate 30, an anode layer 302, an organic functional layer 306, a co-evaporation layer 312 and the like. As for the arrangement of each layer in the organic EL element 300, the anode 302 is located on the substrate 30, the organic functional layer 306 is located on the anode layer 302, and the co-evaporated layer 312 is located on the organic functional layer 306. Among these, the organic functional layer 306 includes at least the organic light emitting layer 310, and a hole transport layer 304 may be further disposed between the organic light emitting layer 310 and the anode layer 302. An electron transport layer 314 may be further disposed between the layer 312 and the layer 312. In the organic functional layer 306, a hole injection layer (not shown) can be further disposed between the anode layer 302 and the hole transport layer 304. Thereby, holes can be moved to the organic light emitting layer 310 even when the applied voltage is low. In addition, an electron injection layer (not shown) may be further disposed between the electron transport layer 314 and the co-evaporation layer 312 in the organic functional layer 306. Thereby, electrons are more easily moved to the organic light emitting layer 310.

引き続き図3を参照されたい。本実施形態の同時蒸着層312は、同時蒸着法によって形成された層であり、金属層313aとMTiO層313bから構成されている。同時蒸着層312は高屈折率nの透明導電層であり、例えば屈折率nの値は約1.7よりも大きい。同時蒸着層312において、金属層313aは主に陰極として働く。また、MTiO層313bは補助的に陰極として働くと共に、キャップ層としても働く。MTiO層313bのMは金属元素を示しており、金属層313aと同一の材料とすることができる。例を挙げれば、金属層313aには、カルシウム、バリウム、ストロンチウム、マグネシウム等の低仕事関数の金属が好ましく、主として元素周期表2A族の元素を採用することができる。その金属層313aと同一の材料を用いて同時蒸着を行うことにより、MTiO層313bの材料にはチタン酸カルシウムCaTiO、チタン酸バリウムBaTiO、チタン酸ストロンチウムSrTiO、チタン酸マグネシウムMgTiO等を採用することができる。例えばチタン酸カルシウムやチタン酸マグネシウム等のMTiO層313bは屈折率nが約2.3〜2.4となり、界面全反射を低減するのに有利であって、光取出し量を増加することができる。本実施形態においては、金属層313aの材料がカルシウムである場合を例にとるが、カルシウムとチタン酸カルシウムとの界面結合は良好であり、密着性が高く、しかもチタン酸カルシウムはカルシウムの金属層313aを保護する効果を奏する。また、MTiOは導電特性を備えているので、有機EL素子300の駆動電圧を低減することもできる。 Still referring to FIG. The co-evaporation layer 312 of this embodiment is a layer formed by a co-evaporation method, and includes a metal layer 313a and an MTiO 3 layer 313b. The co-evaporated layer 312 is a transparent conductive layer having a high refractive index n. For example, the value of the refractive index n is greater than about 1.7. In the co-evaporated layer 312, the metal layer 313a mainly functions as a cathode. In addition, the MTiO 3 layer 313b serves as a supplementary cathode and also serves as a cap layer. M in the MTiO 3 layer 313b represents a metal element and can be made of the same material as that of the metal layer 313a. For example, the metal layer 313a is preferably a metal having a low work function such as calcium, barium, strontium, magnesium, etc., and elements of group 2A of the periodic table can be mainly used. By performing simultaneous vapor deposition using the same material as the metal layer 313a, the material of the MTiO 3 layer 313b is calcium titanate CaTiO 3 , barium titanate BaTiO 3 , strontium titanate SrTiO 3 , magnesium titanate MgTiO 3, etc. Can be adopted. For example, the MTiO 3 layer 313b such as calcium titanate or magnesium titanate has a refractive index n of about 2.3 to 2.4, which is advantageous for reducing the total reflection at the interface, and can increase the light extraction amount. it can. In this embodiment, although the case where the material of the metal layer 313a is calcium is taken as an example, the interface bond between calcium and calcium titanate is good, the adhesiveness is high, and the calcium titanate is a metal layer of calcium. There exists an effect which protects 313a. In addition, since MTiO 3 has conductive characteristics, the driving voltage of the organic EL element 300 can be reduced.

本実施形態の有機EL素子の特徴は、同時蒸着法により透明導電層を形成することである。この透明導電層は高屈折率(n)の特性を備えることから、有機EL素子のキャップ層としても働く。この透明導電層は導電性を有することから、低仕事関数の金属による陰極に対しその補助電極として働く。この透明導電層は安定した透明金属酸化物であることから、有機EL素子や、特にその陰極を水、酸素の浸食から保護する働きをする。   The feature of the organic EL element of this embodiment is that a transparent conductive layer is formed by a co-evaporation method. Since this transparent conductive layer has a high refractive index (n) characteristic, it also functions as a cap layer for the organic EL element. Since this transparent conductive layer has conductivity, it functions as an auxiliary electrode for a cathode made of a metal having a low work function. Since this transparent conductive layer is a stable transparent metal oxide, it functions to protect the organic EL element and particularly its cathode from erosion of water and oxygen.

以上、本発明の具体例を詳細に説明したが、これらは例示にすぎず、特許請求の範囲を限定するものではない。特許請求の範囲に記載の技術には、以上に例示した具体例を様々に変形、変更したものが含まれる。
本明細書または図面に説明した技術要素は、単独であるいは各種の組み合わせによって技術的有用性を発揮するものであり、出願時請求項記載の組み合わせに限定されるものではない。また、本明細書または図面に例示した技術は複数目的を同時に達成するものであり、そのうちの一つの目的を達成すること自体で技術的有用性を持つものである。
Specific examples of the present invention have been described in detail above, but these are merely examples and do not limit the scope of the claims. The technology described in the claims includes various modifications and changes of the specific examples illustrated above.
The technical elements described in this specification or the drawings exhibit technical usefulness alone or in various combinations, and are not limited to the combinations described in the claims at the time of filing. In addition, the technology illustrated in the present specification or the drawings achieves a plurality of objects at the same time, and has technical utility by achieving one of the objects.

一般に知られた有機EL素子の断面概略図である。1 is a schematic cross-sectional view of a generally known organic EL element. 実施形態の有機EL素子の製造手順を示すフローチャートである。It is a flowchart which shows the manufacture procedure of the organic EL element of embodiment. 実施形態の有機EL素子の断面概略図である。It is a section schematic diagram of an organic EL element of an embodiment.

符号の説明Explanation of symbols

10、30・・基板
12、302・・陽極層
310・・有機発光層
18・・陰極層
22・・キャップ層
100・・一般に知られた有機EL素子
300・・実施形態の有機EL素子
304・・正孔輸送層
16、306・・有機機能層
312・・同時蒸着層
313a・・金属層
313b・・MTiO
314・・電子輸送層
10, 30... Substrate 12, 302.. Anode layer 310. Organic light emitting layer 18 cathode layer 22 cap layer 100 publicly known organic EL element 300 .. organic EL element 304 of the embodiment - a hole transport layer 16,306 ... organic functional layers 312 ... codeposition layer 313a ... metal layer 313b ... MTiO 3 layers 314 ... electron transport layer

Claims (28)

陽極層と、
前記陽極層上に位置する有機機能層と、
前記有機機能層上に位置しており、MTiO層を含む同時蒸着陰極層と、
を少なくとも備えており、
前記Mが金属元素から選択されていることを特徴とする有機EL素子。
An anode layer;
An organic functional layer located on the anode layer;
A co-deposited cathode layer located on the organic functional layer and comprising an MTiO 3 layer;
At least,
The organic EL element, wherein M is selected from metal elements.
前記同時蒸着陰極層が、前記MTiO層のMと同種の金属層を備えることを特徴とする請求項1に記載の有機EL素子。 2. The organic EL device according to claim 1, wherein the co-evaporated cathode layer includes a metal layer of the same kind as M of the MTiO 3 layer. 前記金属層が、元素周期表2A族の元素を含むことを特徴とする請求項2に記載の有機EL素子。   The organic EL device according to claim 2, wherein the metal layer includes an element of Group 2A of the periodic table. 前記金属層が、カルシウム、マグネシウム、バリウム、およびストロンチウムの少なくとも一種を含むことを特徴とする請求項3に記載の有機EL素子。   The organic EL element according to claim 3, wherein the metal layer contains at least one of calcium, magnesium, barium, and strontium. 前記MTiO層が、CaTiO、BaTiO、SrTiO、MgTiOの少なくとも一種を含むことを特徴とする請求項1に記載の有機EL素子。 The MTiO 3 layers, CaTiO 3, BaTiO 3, SrTiO 3, the organic EL device according to claim 1, characterized in that it comprises at least one of MgTiO 3. 前記同時蒸着陰極層の屈折率nの値が、1.7よりも大きいことを特徴とする請求項1に記載の有機EL素子。   2. The organic EL device according to claim 1, wherein the value of the refractive index n of the co-evaporated cathode layer is larger than 1.7. 前記有機機能層が、少なくとも有機発光層を含むことを特徴とする請求項1に記載の有機EL素子。   The organic EL element according to claim 1, wherein the organic functional layer includes at least an organic light emitting layer. 前記有機機能層が、
前記有機発光層と前記同時蒸着陰極層との間に位置する電子輸送層と、
前記有機発光層と前記陽極層との間に位置する正孔輸送層と、
をさらに備えていることを特徴とする請求項7に記載の有機EL素子。
The organic functional layer is
An electron transport layer located between the organic light emitting layer and the co-deposited cathode layer;
A hole transport layer located between the organic light emitting layer and the anode layer;
The organic EL device according to claim 7, further comprising:
前記有機機能層が、前記同時蒸着陰極層と前記電子輸送層との間に位置する電子注入層をさらに備えていることを特徴とする請求項8に記載の有機EL素子。   The organic EL device according to claim 8, wherein the organic functional layer further includes an electron injection layer positioned between the co-evaporated cathode layer and the electron transport layer. 前記有機機能層が、前記正孔輸送層と前記陽極層との間に位置する正孔注入層をさらに備えていることを特徴とする請求項8に記載の有機EL素子。   9. The organic EL device according to claim 8, wherein the organic functional layer further includes a hole injection layer located between the hole transport layer and the anode layer. 有機EL素子の製造方法であって、
基板を用意する工程と、
前記基板上に陽極層を形成する工程と、
前記陽極層上に有機機能層を形成する工程と、
同時蒸着法を用いて前記有機機能層上に同時蒸着陰極層を形成する工程と、
を備える有機EL素子の製造方法。
A method for manufacturing an organic EL element,
Preparing a substrate;
Forming an anode layer on the substrate;
Forming an organic functional layer on the anode layer;
Forming a co-deposited cathode layer on the organic functional layer using a co-evaporation method;
The manufacturing method of an organic EL element provided with.
前記同時蒸着陰極層を形成する工程が、
前記有機機能層上に金属層を蒸着する工程と、
前記金属層の金属と酸化チタンとによる同時蒸着を実施してMTiO層を形成する工程と、
を備えることを特徴とする請求項11に記載の有機EL素子の製造方法。
Forming the co-deposited cathode layer comprises:
Depositing a metal layer on the organic functional layer;
Performing co-evaporation of the metal layer with metal and titanium oxide to form an MTiO 3 layer;
The manufacturing method of the organic EL element of Claim 11 characterized by the above-mentioned.
前記MTiO層のMが、前記金属層と同種の金属であることを特徴とする請求項12に記載の有機EL素子の製造方法。 13. The method of manufacturing an organic EL element according to claim 12, wherein M of the MTiO 3 layer is the same kind of metal as the metal layer. 前記金属層が、元素周期表2A族の元素を含むことを特徴とする請求項12に記載の有機EL素子の製造方法。   The method for producing an organic EL element according to claim 12, wherein the metal layer contains an element of Group 2A of the periodic table. 前記金属層が、カルシウム、マグネシウム、バリウム、およびストロンチウムの少なくとも一種を含むことを特徴とする請求項14に記載の有機EL素子の製造方法。   The method for producing an organic EL element according to claim 14, wherein the metal layer contains at least one of calcium, magnesium, barium, and strontium. 前記MTiO層が、CaTiO、BaTiO、SrTiO、MgTiOの少なくとも一種を含むことを特徴とする請求項12に記載の有機EL素子の製造方法。 The MTiO 3 layers, CaTiO 3, BaTiO 3, SrTiO 3, the method of manufacturing the organic EL device according to claim 12, characterized in that it comprises at least one of MgTiO 3. 前記同時蒸着陰極層の屈折率nの値が、1.7よりも大きいことを特徴とする請求項11に記載の有機EL素子の製造方法。   The method for producing an organic EL element according to claim 11, wherein the value of the refractive index n of the co-evaporated cathode layer is larger than 1.7. 前記有機機能層を形成する工程が、前記陽極層上に有機発光層を形成する工程を備えることを特徴とする請求項11に記載の有機EL素子の製造方法。   12. The method of manufacturing an organic EL element according to claim 11, wherein the step of forming the organic functional layer includes a step of forming an organic light emitting layer on the anode layer. 前記有機機能層を形成する工程が、
前記有機発光層を形成する工程以前に実施する前記陽極層上に正孔輸送層を形成する工程と、
前記有機発光層を形成する工程以降に実施する前記有機発光層上に電子輸送層を形成する工程と、
をさらに備えることを特徴とする請求項18に記載の有機EL素子の製造方法。
Forming the organic functional layer comprises:
Forming a hole transport layer on the anode layer performed before the step of forming the organic light emitting layer;
Forming an electron transport layer on the organic light emitting layer, which is performed after the step of forming the organic light emitting layer, and
The method of manufacturing an organic EL element according to claim 18, further comprising:
前記正孔輸送層を形成する工程以前に実施する前記陽極層上に正孔注入層を形成する工程をさらに備えることを特徴とする請求項19に記載の有機EL素子の製造方法。   The method of manufacturing an organic EL element according to claim 19, further comprising a step of forming a hole injection layer on the anode layer, which is performed before the step of forming the hole transport layer. 前記電子輸送層を形成する工程以降に実施する前記電子輸送層上に電子注入層を形成する工程をさらに備えることを特徴とする請求項19に記載の有機EL素子の製造方法。   The method for manufacturing an organic EL element according to claim 19, further comprising a step of forming an electron injection layer on the electron transport layer, which is performed after the step of forming the electron transport layer. 有機EL素子中に配置するのに適した陰極構造であって、MTiO層を備えており、前記Mが金属元素から選択されていることを特徴とする陰極構造。 A cathode structure suitable for being disposed in an organic EL element, comprising a MTiO 3 layer, wherein M is selected from metal elements. さらに金属層を備えることを特徴とする請求項22に記載の陰極構造。   The cathode structure according to claim 22, further comprising a metal layer. 前記金属層が、元素周期表2A族の元素を含むことを特徴とする請求項23に記載の陰極構造。   24. The cathode structure according to claim 23, wherein the metal layer includes an element of Group 2A of the periodic table. 前記金属層が、カルシウム、マグネシウム、バリウム、およびストロンチウムの少なくとも一種を含むことを特徴とする請求項24に記載の陰極構造。   The cathode structure according to claim 24, wherein the metal layer includes at least one of calcium, magnesium, barium, and strontium. 前記MTiO層のMが、前記金属層と同種の金属であることを特徴とする請求項23に記載の陰極構造。 The cathode structure according to claim 23, wherein M of the MTiO 3 layer is the same kind of metal as the metal layer. 前記MTiO層が、CaTiO、BaTiO、SrTiO、MgTiOの少なくとも一種を含むことを特徴とする請求項23に記載の陰極構造。 Cathode structure according to claim 23 wherein the MTiO 3 layers, characterized in that it comprises at least one CaTiO 3, BaTiO 3, SrTiO 3 , MgTiO 3. 前記陰極構造の屈折率nの値が、1.7よりも大きいことを特徴とする請求項23に記載の陰極構造。   24. The cathode structure according to claim 23, wherein the value of the refractive index n of the cathode structure is greater than 1.7.
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