JP2004524565A5 - - Google Patents
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- Publication number
- JP2004524565A5 JP2004524565A5 JP2002568102A JP2002568102A JP2004524565A5 JP 2004524565 A5 JP2004524565 A5 JP 2004524565A5 JP 2002568102 A JP2002568102 A JP 2002568102A JP 2002568102 A JP2002568102 A JP 2002568102A JP 2004524565 A5 JP2004524565 A5 JP 2004524565A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- acid
- light
- photoresist
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US27140401P | 2001-02-25 | 2001-02-25 | |
| PCT/US2002/005627 WO2002069044A2 (en) | 2001-02-25 | 2002-02-25 | Polymers and photoresist compositions |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004524565A JP2004524565A (ja) | 2004-08-12 |
| JP2004524565A5 true JP2004524565A5 (https=) | 2005-12-22 |
Family
ID=23035399
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002568102A Pending JP2004524565A (ja) | 2001-02-25 | 2002-02-25 | 新規な共重合体及びフォトレジスト組成物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20020187420A1 (https=) |
| JP (1) | JP2004524565A (https=) |
| KR (1) | KR20040030511A (https=) |
| CN (1) | CN1310090C (https=) |
| AU (1) | AU2002255598A1 (https=) |
| TW (1) | TWI293402B (https=) |
| WO (1) | WO2002069044A2 (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3890989B2 (ja) * | 2002-01-25 | 2007-03-07 | 住友化学株式会社 | レジスト組成物 |
| US7488565B2 (en) * | 2003-10-01 | 2009-02-10 | Chevron U.S.A. Inc. | Photoresist compositions comprising diamondoid derivatives |
| US7208334B2 (en) * | 2004-03-31 | 2007-04-24 | Kabushiki Kaisha Toshiba | Method of manufacturing semiconductor device, acid etching resistance material and copolymer |
| JP4279237B2 (ja) * | 2004-05-28 | 2009-06-17 | 東京応化工業株式会社 | ポジ型レジスト組成物及びレジストパターン形成方法 |
| EP1662320A1 (en) * | 2004-11-24 | 2006-05-31 | Rohm and Haas Electronic Materials, L.L.C. | Photoresist compositions |
| JP5031310B2 (ja) * | 2006-01-13 | 2012-09-19 | 東京応化工業株式会社 | レジスト組成物およびレジストパターン形成方法 |
| JP5782283B2 (ja) * | 2010-03-31 | 2015-09-24 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ | 新規のポリマーおよびフォトレジスト組成物 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100245410B1 (ko) * | 1997-12-02 | 2000-03-02 | 윤종용 | 감광성 폴리머 및 그것을 이용한 화학증폭형 레지스트 조성물 |
| US6103445A (en) * | 1997-03-07 | 2000-08-15 | Board Of Regents, The University Of Texas System | Photoresist compositions comprising norbornene derivative polymers with acid labile groups |
| CN1190706C (zh) * | 1998-08-26 | 2005-02-23 | 住友化学工业株式会社 | 一种化学增强型正光刻胶组合物 |
| TWI263866B (en) * | 1999-01-18 | 2006-10-11 | Sumitomo Chemical Co | Chemical amplification type positive resist composition |
| JP3353292B2 (ja) * | 1999-03-29 | 2002-12-03 | 日本電気株式会社 | 化学増幅系レジスト |
| JP4061801B2 (ja) * | 2000-01-24 | 2008-03-19 | 住友化学株式会社 | 化学増幅型ポジ型レジスト組成物 |
| US6610465B2 (en) * | 2001-04-11 | 2003-08-26 | Clariant Finance (Bvi) Limited | Process for producing film forming resins for photoresist compositions |
-
2002
- 2002-02-25 TW TW091103266A patent/TWI293402B/zh active
- 2002-02-25 AU AU2002255598A patent/AU2002255598A1/en not_active Abandoned
- 2002-02-25 CN CNB028069366A patent/CN1310090C/zh not_active Expired - Fee Related
- 2002-02-25 KR KR10-2003-7011140A patent/KR20040030511A/ko not_active Ceased
- 2002-02-25 JP JP2002568102A patent/JP2004524565A/ja active Pending
- 2002-02-25 WO PCT/US2002/005627 patent/WO2002069044A2/en not_active Ceased
- 2002-02-25 US US10/082,769 patent/US20020187420A1/en not_active Abandoned
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