JP2004512396A5 - - Google Patents
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- Publication number
- JP2004512396A5 JP2004512396A5 JP2002536611A JP2002536611A JP2004512396A5 JP 2004512396 A5 JP2004512396 A5 JP 2004512396A5 JP 2002536611 A JP2002536611 A JP 2002536611A JP 2002536611 A JP2002536611 A JP 2002536611A JP 2004512396 A5 JP2004512396 A5 JP 2004512396A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US69128000A | 2000-10-18 | 2000-10-18 | |
| PCT/US2001/042743 WO2002033489A2 (en) | 2000-10-18 | 2001-10-16 | Compositions for microlithography |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2004512396A JP2004512396A (ja) | 2004-04-22 |
| JP2004512396A5 true JP2004512396A5 (enExample) | 2005-12-22 |
Family
ID=24775897
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002536611A Pending JP2004512396A (ja) | 2000-10-18 | 2001-10-16 | マイクロリソグラフィー用組成物 |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP1326903A2 (enExample) |
| JP (1) | JP2004512396A (enExample) |
| KR (1) | KR20040004403A (enExample) |
| CN (1) | CN1214054C (enExample) |
| AU (1) | AU2002232383A1 (enExample) |
| TW (1) | TW569079B (enExample) |
| WO (1) | WO2002033489A2 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030130452A1 (en) * | 2001-10-12 | 2003-07-10 | Johnson Lynda Kaye | Copolymers of ethylene with various norbornene derivatives |
| AU2003213568A1 (en) | 2002-03-01 | 2003-09-16 | E.I. Du Pont De Nemours And Company | Fluorinated copolymers for microlithography |
| TWI307819B (en) | 2002-05-28 | 2009-03-21 | Arch Spec Chem Inc | Acetal protected polymers and photoresist compositions thereof |
| AU2003259727A1 (en) * | 2002-08-09 | 2004-02-25 | E. I. Du Pont De Nemours And Company | Photoresists, fluorinated polymers and processes for 157 nm microlithography |
| JP2007525543A (ja) | 2003-02-20 | 2007-09-06 | プロメラス， エルエルシー | フォトレジスト組成物のための溶解速度調整剤 |
| JP4377174B2 (ja) | 2003-07-25 | 2009-12-02 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| US9920140B2 (en) | 2013-12-20 | 2018-03-20 | Basf Coatings Gmbh | Aqueous primary dispersions, process of their production and use thereof |
| CN106444281A (zh) * | 2016-09-22 | 2017-02-22 | 京东方科技集团股份有限公司 | 一种光刻胶及刻蚀方法 |
| JP6986986B2 (ja) * | 2018-01-30 | 2021-12-22 | 三井化学株式会社 | フッ素含有環状オレフィン系共重合体および成形体 |
| JP2024128554A (ja) * | 2023-03-10 | 2024-09-24 | ポリプラスチックス株式会社 | フッ素含有環状オレフィン（共）重合体及びその製造方法 |
| CN117756987B (zh) * | 2023-12-27 | 2025-01-24 | 福建泓光半导体材料有限公司 | 一种丙烯酸酯光刻胶成膜树脂和ArF光刻胶及其制备方法与应用 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000017712A1 (en) * | 1998-09-23 | 2000-03-30 | E.I. Du Pont De Nemours And Company | Photoresists, polymers and processes for microlithography |
-
2001
- 2001-10-16 KR KR10-2003-7005196A patent/KR20040004403A/ko not_active Withdrawn
- 2001-10-16 WO PCT/US2001/042743 patent/WO2002033489A2/en not_active Ceased
- 2001-10-16 CN CNB01817583XA patent/CN1214054C/zh not_active Expired - Fee Related
- 2001-10-16 EP EP01987900A patent/EP1326903A2/en not_active Withdrawn
- 2001-10-16 JP JP2002536611A patent/JP2004512396A/ja active Pending
- 2001-10-16 AU AU2002232383A patent/AU2002232383A1/en not_active Abandoned
- 2001-10-17 TW TW090125691A patent/TW569079B/zh not_active IP Right Cessation