JP2004503806A5 - - Google Patents
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- Publication number
- JP2004503806A5 JP2004503806A5 JP2002510282A JP2002510282A JP2004503806A5 JP 2004503806 A5 JP2004503806 A5 JP 2004503806A5 JP 2002510282 A JP2002510282 A JP 2002510282A JP 2002510282 A JP2002510282 A JP 2002510282A JP 2004503806 A5 JP2004503806 A5 JP 2004503806A5
- Authority
- JP
- Japan
- Prior art keywords
- underlayer
- top layer
- thermal imaging
- imaging element
- aqueous alkaline
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 claims description 12
- 238000001931 thermography Methods 0.000 claims description 12
- 238000004090 dissolution Methods 0.000 claims description 5
- 230000002401 inhibitory effect Effects 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 230000005660 hydrophilic surface Effects 0.000 claims description 3
- 239000002861 polymer material Substances 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 1
- 150000003868 ammonium compounds Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- -1 cyclic imides Chemical class 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 239000001003 triarylmethane dye Substances 0.000 description 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/592,895 US6534238B1 (en) | 1998-06-23 | 2000-06-13 | Thermal digital lithographic printing plate |
| PCT/US2000/033605 WO2001096119A1 (en) | 2000-06-13 | 2000-12-12 | Thermal digital lithographic printing plate |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004503806A JP2004503806A (ja) | 2004-02-05 |
| JP2004503806A5 true JP2004503806A5 (https=) | 2008-02-07 |
| JP4510375B2 JP4510375B2 (ja) | 2010-07-21 |
Family
ID=24372472
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002510282A Expired - Fee Related JP4510375B2 (ja) | 2000-06-13 | 2000-12-12 | 熱デジタルリソグラフ印刷版 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6534238B1 (https=) |
| EP (1) | EP1303399A1 (https=) |
| JP (1) | JP4510375B2 (https=) |
| BR (1) | BR0017252A (https=) |
| WO (1) | WO2001096119A1 (https=) |
Families Citing this family (49)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69836840T2 (de) | 1997-10-17 | 2007-10-11 | Fujifilm Corp. | Positiv arbeitendes photoempfindliches Aufzeichnungsmaterial für Infrarotlaser und positiv arbeitende Zusammensetzung für Infrarotlaser |
| US6609131B1 (en) * | 1999-09-27 | 2003-08-19 | Oracle International Corporation | Parallel partition-wise joins |
| US6555291B1 (en) | 2000-08-14 | 2003-04-29 | Kodak Polychrome Graphics, Llc | Thermal digital lithographic printing plate |
| US6649324B1 (en) | 2000-08-14 | 2003-11-18 | Kodak Polychrome Graphics Llc | Aqueous developer for lithographic printing plates |
| US6790588B2 (en) * | 2001-04-06 | 2004-09-14 | Kodak Polychrome Graphics Llc | Imagable articles and compositions therefor |
| BR0102218B1 (pt) * | 2001-05-31 | 2012-10-16 | produto sensìvel à radiação, e processo de impressão ou revelação de imagem utilizando o referido produto. | |
| US6593055B2 (en) * | 2001-09-05 | 2003-07-15 | Kodak Polychrome Graphics Llc | Multi-layer thermally imageable element |
| US7163777B2 (en) * | 2001-09-07 | 2007-01-16 | Eastman Kodak Company | Thermally sensitive imageable element |
| US7316891B2 (en) * | 2002-03-06 | 2008-01-08 | Agfa Graphics Nv | Method of developing a heat-sensitive lithographic printing plate precursor with a gum solution |
| US6887642B2 (en) | 2002-04-05 | 2005-05-03 | Kodak Polychrome Graphies Llc | Multi-layer negative working imageable element |
| US6858359B2 (en) * | 2002-10-04 | 2005-02-22 | Kodak Polychrome Graphics, Llp | Thermally sensitive, multilayer imageable element |
| US7229744B2 (en) | 2003-03-21 | 2007-06-12 | Eastman Kodak Company | Method for preparing lithographic printing plates |
| US6939663B2 (en) * | 2003-07-08 | 2005-09-06 | Kodak Polychrome Graphics Llc | Sulfated phenolic resins and printing plate precursors comprising sulfated phenolic resins |
| WO2005018934A1 (en) * | 2003-08-14 | 2005-03-03 | Kodak Polychrome Graphics Llc | Multilayer imageable elements |
| US7049045B2 (en) * | 2003-08-14 | 2006-05-23 | Kodak Polychrome Graphics Llc | Multilayer imageable elements |
| ATE397529T1 (de) * | 2004-03-26 | 2008-06-15 | Presstek Inc | Druckglieder mit löslichkeitsübergangsschichten und verwandte verfahren |
| US7060416B2 (en) * | 2004-04-08 | 2006-06-13 | Eastman Kodak Company | Positive-working, thermally sensitive imageable element |
| WO2005111727A1 (en) | 2004-05-19 | 2005-11-24 | Agfa-Gevaert | Method of making a photopolymer printing plate |
| US7014983B1 (en) | 2004-10-05 | 2006-03-21 | Eastman Kodak Company | Multilayer imageable element |
| JP4485922B2 (ja) * | 2004-11-18 | 2010-06-23 | 東京応化工業株式会社 | ネガ型レジスト組成物 |
| JP4474296B2 (ja) | 2005-02-09 | 2010-06-02 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP4404792B2 (ja) | 2005-03-22 | 2010-01-27 | 富士フイルム株式会社 | 平版印刷版原版 |
| US7678533B2 (en) | 2005-06-30 | 2010-03-16 | Agfa Graphics, N.V. | Heat-sensitive lithographic printing plate precursor |
| EP1738902A1 (en) | 2005-06-30 | 2007-01-03 | Agfa-Gevaert | Method for preparing a lithographic printing plate precursor |
| US7987786B2 (en) * | 2005-09-09 | 2011-08-02 | Presstek, Inc. | Printing members having permeability-transition layers and related methods |
| US7144661B1 (en) * | 2005-11-01 | 2006-12-05 | Eastman Kodak Company | Multilayer imageable element with improved chemical resistance |
| ES2365930T3 (es) | 2006-02-28 | 2011-10-13 | Agfa Graphics N.V. | Un precursor de plancha de impresión litográfica que funciona como positivo sensible al calor. |
| WO2007099053A1 (en) | 2006-02-28 | 2007-09-07 | Agfa Graphics Nv | Method for making a lithographic printing plate |
| ATE517758T1 (de) | 2006-03-17 | 2011-08-15 | Agfa Graphics Nv | Verfahren zur herstellung einer lithografiedruckform |
| JP4611234B2 (ja) * | 2006-03-31 | 2011-01-12 | 富士フイルム株式会社 | 重合性ネガ型平版印刷版原版、平版印刷版原版の積層体および重合性ネガ型平版印刷版原版の製造方法 |
| US7169518B1 (en) * | 2006-04-17 | 2007-01-30 | Eastman Kodak Company | Multilayer imageable element with improved chemical resistance |
| US7563556B2 (en) * | 2006-11-17 | 2009-07-21 | Kodak Graphic Communications Gmbh | Multilayer element with low pH developer solubility |
| US20080227023A1 (en) * | 2007-03-16 | 2008-09-18 | Celin Savariar-Hauck | PROCESSING POSITIVE-WORKING IMAGEABLE ELEMENTS WITH HIGH pH DEVELOPERS |
| ATE516953T1 (de) | 2007-04-27 | 2011-08-15 | Agfa Graphics Nv | Lithographiedruckplattenvorläufer |
| US8283101B2 (en) * | 2007-08-30 | 2012-10-09 | Eastman Kodak Company | Imageable elements with improved abrasion resistance |
| JP2009132974A (ja) | 2007-11-30 | 2009-06-18 | Fujifilm Corp | 微細構造体 |
| ATE552111T1 (de) | 2008-09-02 | 2012-04-15 | Agfa Graphics Nv | Wärmeempfindlicher, positiv arbeitender lithographiedruckformvorläufer |
| EP2213690B1 (en) | 2009-01-30 | 2015-11-11 | Agfa Graphics N.V. | A new alkali soluble resin |
| ES2556055T3 (es) | 2011-09-08 | 2016-01-12 | Agfa Graphics Nv | Método de fabricación de una plancha de impresión litográfica |
| WO2014106554A1 (en) | 2013-01-01 | 2014-07-10 | Agfa Graphics Nv | (ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
| EP2933278B1 (en) | 2014-04-17 | 2018-08-22 | Agfa Nv | (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
| EP2944657B1 (en) | 2014-05-15 | 2017-01-11 | Agfa Graphics Nv | (Ethylene, Vinyl Acetal) Copolymers and Their Use In Lithographic Printing Plate Precursors |
| ES2660063T3 (es) | 2014-06-13 | 2018-03-20 | Agfa Nv | Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica |
| EP2963496B1 (en) | 2014-06-30 | 2017-04-05 | Agfa Graphics NV | A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers |
| ES2655798T3 (es) | 2014-12-08 | 2018-02-21 | Agfa Nv | Sistema para reducir los residuos de ablación |
| EP3130465B1 (en) | 2015-08-12 | 2020-05-13 | Agfa Nv | Heat-sensitive lithographic printing plate precursor |
| EP3170662B1 (en) | 2015-11-20 | 2019-08-14 | Agfa Nv | A lithographic printing plate precursor |
| EP3430474A1 (en) | 2016-03-16 | 2019-01-23 | Agfa Nv | Method and apparatus for processing a lithographic printing plate |
| EP3778253A1 (en) | 2019-08-13 | 2021-02-17 | Agfa Nv | Method for processing a lithographic printing plate |
Family Cites Families (58)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1245924A (en) | 1967-09-27 | 1971-09-15 | Agfa Gevaert | Improvements relating to thermo-recording |
| GB1260662A (en) | 1968-03-27 | 1972-01-19 | Agfa Gevaert | Improvements relating to the sub-titling of processed photographic materials |
| CA1085212A (en) | 1975-05-27 | 1980-09-09 | Ronald H. Engebrecht | Use of volatile carboxylic acids in improved photoresists containing quinone diazides |
| US4158730A (en) | 1975-06-18 | 1979-06-19 | Ciba-Geigy Corporation | Crosslinkage polymeric compounds |
| US4308368A (en) | 1979-03-16 | 1981-12-29 | Daicel Chemical Industries Ltd. | Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide |
| JPS5953836A (ja) | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| US4665124A (en) | 1985-08-02 | 1987-05-12 | American Hoechst Corporation | Resin |
| JPH0769605B2 (ja) | 1988-02-25 | 1995-07-31 | 富士写真フイルム株式会社 | 感光性組成物 |
| EP0368327B1 (en) | 1988-11-11 | 1995-02-15 | Fuji Photo Film Co., Ltd. | Light-sensitive composition |
| US5112743A (en) | 1989-05-24 | 1992-05-12 | Fuji Photo Film Co., Ltd. | Light-sensitive composition and presensitized plate for use in making lithographic printing plates |
| US5145763A (en) | 1990-06-29 | 1992-09-08 | Ocg Microelectronic Materials, Inc. | Positive photoresist composition |
| US5609993A (en) | 1991-04-17 | 1997-03-11 | Nippon Paint Co., Ltd. | Process for producing lithographic printing plate, photosensitive plate and aqueous ink composition therefor |
| US5346975A (en) | 1991-09-20 | 1994-09-13 | Fuji Photo Film Co., Ltd. | Light-sensitive composition |
| DE69411242T2 (de) | 1993-04-20 | 1999-03-25 | Asahi Kasei Kogyo K.K., Osaka | Lithographische druckplatte sowie verfahren zu ihrer herstellung |
| US5340699A (en) | 1993-05-19 | 1994-08-23 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates |
| DE69401114D1 (de) | 1993-10-25 | 1997-01-23 | Agfa Gevaert Nv | Wärmeempfindliches Aufzeichnungsmaterial und Bildaufzeichnungsverfahren, das dieses Material verwendet |
| US5493971A (en) | 1994-04-13 | 1996-02-27 | Presstek, Inc. | Laser-imageable printing members and methods for wet lithographic printing |
| CA2171472C (en) | 1994-07-11 | 2002-02-26 | Konica Corporation | Presensitized lithographic printing plate and method for preparing lithographic printing plate |
| US5731127A (en) | 1995-04-11 | 1998-03-24 | Dainippon Ink And Chemicals, Inc. | Photosensitive composition and photosensitive planographic printing plate having a resin with urea bonds in the side chain |
| US5529891A (en) | 1995-05-12 | 1996-06-25 | Eastman Kodak Company | Photographic element having improved scratch resistance |
| DE19524851C2 (de) | 1995-07-07 | 1998-05-07 | Sun Chemical Corp | Acetalpolymere und Verwendung derselben in lichtempfindlichen Zusammensetzungen und für lithographische Druckplatten |
| JPH0934110A (ja) | 1995-07-17 | 1997-02-07 | Konica Corp | 光重合性組成物、ラジカル発生方法、平版印刷版作成用感光材料及びそれを用いた平版印刷版の作成方法 |
| GB9516723D0 (en) | 1995-08-15 | 1995-10-18 | Horsell Plc | Water-less lithographic plates |
| US6066434A (en) | 1995-08-21 | 2000-05-23 | E. I. Du Pont De Nemours And Company | Waterless printing plates |
| US5641608A (en) | 1995-10-23 | 1997-06-24 | Macdermid, Incorporated | Direct imaging process for forming resist pattern on a surface and use thereof in fabricating printing plates |
| US6030750A (en) | 1995-10-24 | 2000-02-29 | Agfa-Gevaert. N.V. | Method for making a lithographic printing plate involving on press development |
| US5814431A (en) | 1996-01-10 | 1998-09-29 | Mitsubishi Chemical Corporation | Photosensitive composition and lithographic printing plate |
| JP3147908B2 (ja) | 1996-04-23 | 2001-03-19 | コダック ポリクローム グラフィックス カンパニー リミテッド | 感熱性組成物および該組成物を使用したリソグラフィックプリンティングフォームの作製方法 |
| JP3814961B2 (ja) | 1996-08-06 | 2006-08-30 | 三菱化学株式会社 | ポジ型感光性印刷版 |
| US5858626A (en) | 1996-09-30 | 1999-01-12 | Kodak Polychrome Graphics | Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition |
| US5705322A (en) | 1996-09-30 | 1998-01-06 | Eastman Kodak Company | Method of providing an image using a negative-working infrared photosensitive element |
| US5705308A (en) | 1996-09-30 | 1998-01-06 | Eastman Kodak Company | Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element |
| US6060222A (en) | 1996-11-19 | 2000-05-09 | Kodak Polcyhrome Graphics Llc | 1Postitve-working imaging composition and element and method of forming positive image with a laser |
| DE69833046T2 (de) | 1997-03-11 | 2006-08-03 | Agfa-Gevaert | Verfahren zur Herstellung einer lithographischen Druckplatte |
| EP0864419B1 (en) | 1997-03-11 | 2002-08-07 | Agfa-Gevaert | Method for making positive working lithographic printing plates |
| US6022667A (en) | 1997-05-27 | 2000-02-08 | Agfa-Gevaert, N.V. | Heat sensitive imaging element and a method for producing lithographic plates therewith |
| EP0953166B1 (en) | 1997-07-05 | 2001-08-16 | Kodak Polychrome Graphics LLC | Pattern-forming methods |
| JP3779444B2 (ja) | 1997-07-28 | 2006-05-31 | 富士写真フイルム株式会社 | 赤外線レーザ用ポジ型感光性組成物 |
| GB9722861D0 (en) | 1997-10-29 | 1997-12-24 | Horsell Graphic Ind Ltd | Improvements in relation to the manufacture of lithographic printing forms |
| US6060217A (en) | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
| EP0901902A3 (en) | 1997-09-12 | 1999-03-24 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition for use with an infrared laser |
| US6083663A (en) | 1997-10-08 | 2000-07-04 | Agfa-Gevaert, N.V. | Method for making positive working printing plates from a heat mode sensitive image element |
| US6004728A (en) | 1997-10-08 | 1999-12-21 | Agfa-Gevaert, N.V. | Method for making positive working printing plates from a heat mode sensitive image element |
| DE69836840T2 (de) | 1997-10-17 | 2007-10-11 | Fujifilm Corp. | Positiv arbeitendes photoempfindliches Aufzeichnungsmaterial für Infrarotlaser und positiv arbeitende Zusammensetzung für Infrarotlaser |
| JP3810538B2 (ja) * | 1997-11-28 | 2006-08-16 | 富士写真フイルム株式会社 | ポジ型画像形成材料 |
| EP0940266B1 (en) | 1998-03-06 | 2002-06-26 | Agfa-Gevaert | A heat mode sensitive imaging element for making positive working printing plates. |
| DE69901916T2 (de) * | 1998-03-06 | 2003-01-16 | Agfa-Gevaert, Mortsel | Wärmeempfindliches Aufzeichnungselement zur Herstellung von positiv arbeitenden Flachdruckformen |
| EP0943451B3 (en) | 1998-03-14 | 2018-12-12 | Agfa Graphics NV | A heat mode imaging element and a method for making positive working printing plates from said heat mode imaging element |
| US6358669B1 (en) * | 1998-06-23 | 2002-03-19 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| US6352811B1 (en) * | 1998-06-23 | 2002-03-05 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| US6352812B1 (en) * | 1998-06-23 | 2002-03-05 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| JP3635203B2 (ja) | 1998-10-06 | 2005-04-06 | 富士写真フイルム株式会社 | 平版印刷版用原版 |
| US6251559B1 (en) * | 1999-08-03 | 2001-06-26 | Kodak Polychrome Graphics Llc | Heat treatment method for obtaining imagable coatings and imagable coatings |
| WO2001043618A1 (en) | 1999-12-15 | 2001-06-21 | New Knight Inc. | Cleaning brush with disposable head |
| US6528228B2 (en) | 1999-12-22 | 2003-03-04 | Kodak Polychrome Graphics, Llc | Chemical resistant underlayer for positive-working printing plates |
| US6294311B1 (en) * | 1999-12-22 | 2001-09-25 | Kodak Polychrome Graphics Llc | Lithographic printing plate having high chemical resistance |
| JP2001337460A (ja) * | 2000-03-21 | 2001-12-07 | Fuji Photo Film Co Ltd | 平版印刷版用原版 |
| JP2001305722A (ja) | 2000-04-18 | 2001-11-02 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
-
2000
- 2000-06-13 US US09/592,895 patent/US6534238B1/en not_active Expired - Lifetime
- 2000-12-12 JP JP2002510282A patent/JP4510375B2/ja not_active Expired - Fee Related
- 2000-12-12 WO PCT/US2000/033605 patent/WO2001096119A1/en not_active Ceased
- 2000-12-12 EP EP00986322A patent/EP1303399A1/en not_active Withdrawn
- 2000-12-12 BR BR0017252-9A patent/BR0017252A/pt not_active Application Discontinuation
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