JP2004359520A - Method and apparatus for manufacturing synthetic silica glass - Google Patents

Method and apparatus for manufacturing synthetic silica glass Download PDF

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Publication number
JP2004359520A
JP2004359520A JP2003162423A JP2003162423A JP2004359520A JP 2004359520 A JP2004359520 A JP 2004359520A JP 2003162423 A JP2003162423 A JP 2003162423A JP 2003162423 A JP2003162423 A JP 2003162423A JP 2004359520 A JP2004359520 A JP 2004359520A
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JP
Japan
Prior art keywords
silica glass
synthetic silica
soot
core tube
frequency induction
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JP2003162423A
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Japanese (ja)
Inventor
Masanobu Ezaki
正信 江崎
Takashi Suzuki
崇 鈴木
Fumio Tokutake
文夫 徳岳
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Coorstek KK
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Toshiba Ceramics Co Ltd
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Application filed by Toshiba Ceramics Co Ltd filed Critical Toshiba Ceramics Co Ltd
Priority to JP2003162423A priority Critical patent/JP2004359520A/en
Publication of JP2004359520A publication Critical patent/JP2004359520A/en
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing synthetic silica glass which enables reduction of energy loss. <P>SOLUTION: In the method for manufacturing the synthetic silica glass, comprising heating and melting a soot 5 coaxially arranged in a vertical furnace core pipe 1 made of quartz glass so as to make it transparent, the soot is heated and molten with a high frequency induction heating source 4 surrounding the soot in the furnace core pipe 1. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

【０００１】
【発明の属する技術分野】
本発明は、紫外線透過率に優れ、紫外線レーザー等に使用される透明な合成シリカガラスの製造方法及びその製造装置に関する。
【０００２】
【従来の技術】
従来、この種の合成シリカガラスは、ＶＡＤ（Ｖａｐｅｒ−ｐｈａｓｅ Ａｘｉａｌ Ｄｉｐｏｓｉｔｉｏｎ） 法等により四塩化珪素（ＳｉＣｌ４）、トリクロロシラン（ＳｉＨＣｌ３）、四臭化珪素（ＳｉＢｒ４）等の珪素化合物から生成される合成シリカガラス微粒子の集合体であるスート（合成シリカガラス多孔体）を母材とするものであり、図２に示すように、透明石英ガラス製の垂直な炉芯管３１内に、スート３２を回転可能で垂直方向へ移動可能な支持棒３２を介して同軸配置し、炉芯管３１内をガス導入口３４及びガス排出口３５を介して給排されるガス（例えば、四フッ化珪素：ＳｉＦ４）によって所要雰囲気に保つつ、スート３２を支持棒３３により回転させつつ下降させ、炉芯管３１の外側に同心配置したリング状の抵抗発熱体３６により形成される１４５０〜１６００℃の最高温度帯（ホットゾーン）を移動させるゾーンシンター方式で加熱溶融し、透明化することによって製造されている。
図２において３７は炉芯管３１の上端を閉止するステンレス鋼（ＳＵＳ）製の水冷キャップ、３８は抵抗発熱体３６を覆う保温カバーである。
【０００３】
【発明が解決しようとする課題】
しかし、従来の合成シリカガラスの製造方法およびその装置では、ホットゾーンを形成する加熱源としての抵抗発熱体が炉芯管の外側に設けられているため、抵抗発熱体が保温カバーにより覆われているものの、エネルギー損失が多大となる不具合がある。
又、スートを垂直方向へ移動させるゾーンシンター方式であるため、スートが長尺の場合、装置が大がかりとなる不具合がある。
更に、ホットゾーンから上方及び下方における温度勾配が緩慢であるため、ゾーンシンター方式をとる場合、自重により製品となる透明な合成シリカガラスに変形や失透を生じる不具合もある。
【０００４】
そこで、本発明は、エネルギー損失を低減し得る合成シリカガラスの製造方法及びその製造装置の提供を主課題とする。
【０００５】
【課題を解決するための手段】
前記課題を解決するため、本発明の第１の合成シリカガラスの製造方法は、石英ガラス製の垂直な炉芯管内に同軸配置したスートを加熱溶融して透明化する合成シリカガラスの製造方法において、前記スートを炉芯管内でそれを囲む高周波誘導加熱源により加熱溶融することを特徴とする。
【０００６】
第２の合成シリカガラスの製造方法は、第１の方法において、前記高周波誘導加熱源からの輻射熱の炉芯管への放射を遮断することを特徴とする。
【０００７】
第３の合成シリカガラスの製造方法は、第１又は第２の方法において、前記高周波誘導加熱源を垂直方向へ移動することを特徴とする。
【０００８】
又、第４の合成シリカガラスの製造方法は、第１、第２又は第３の方法において、前記高周波誘導加熱源からの輻射熱の炉芯管からの放射を低減することを特徴とする。
【０００９】
一方、第１の合成シリカガラスの製造装置は、石英ガラス製の垂直な炉芯管内に同軸配置したスートを加熱溶融して透明化する合成シリカガラスの製造装置において、前記炉芯管内に収容され、スートを囲む円筒状を呈するカーボン製の高周波誘導発熱体と、高周波誘導発熱体と対向させて炉芯管の外側に同心配置した高周波コイルとを備えることを特徴とする。
【００１０】
第２の合成シリカガラスの製造装置は、第１の装置において、前記高周波誘導発熱体の外周に嵌装した円筒状を呈するカーボンフェルト製の断熱材を備えることを特徴とする。
【００１１】
第３の合成シリカガラスの製造装置は、第１又は第２の装置において、前記高周波コイルが垂直方向へ移動可能であることを特徴とする。
【００１２】
又、第４の合成シリカガラスの製造装置は、第１、第２又は第３の装置において、前記炉芯管を形成する石英ガラスが不透明であることを特徴とする。
【００１３】
【作用】
本発明の第１の合成シリカガラスの製造方法及びその製造装置においては、高周波誘導加熱源としての高周波誘導発熱体がスートと直に対向する。
【００１４】
炉芯管は、雰囲気の置換性が高く、かつ、雰囲気制御が可能であることが好ましく、このようなものとすることにより、高周波誘導発熱体の酸化防止が可能となる。
高周波誘導発熱体を形成するカーボンは、純化処理を施された高純度のものであることが好ましい。
【００１５】
第２の合成シリカガラスの製造方法及びその製造装置においては、第１の方法及び装置による作用の他、高周波誘導加熱源としての高周波誘導発熱体から放射される熱エネルギーが有効に活用される。
【００１６】
第３の合成シリカガラスの製造方法及びその製造装置においては、第１又は第２の方法及び装置による作用の他、ホットゾーンの移動が可能となり、かつ、ホットゾーンから上方及び下方における温度勾配がシャープになる。
【００１７】
又、第４の合成シリカガラスの製造方法及びその製造装置においては、第１、第２又は第３の方法及び装置による作用の他、炉芯管からの熱エネルギーの放射が低減される。
【００１８】
【発明の実施の形態】
以下、本発明の実施の形態について図面を参照して説明する。
図１は本発明に係る合成シリカガラスの製造装置の実施の形態の一例を示す概略断面図である。
【００１９】
図中１はベースプレートを兼ねる断熱材２に立設した炉芯管で、この炉芯管１は、不透明な石英ガラスからなり、上下端を気密、かつ開閉可能に閉止した垂直な円筒状を呈しており、その上端に断熱材３が載置されている。
炉芯管１内には、純化処理を施された高純度のカーボンからなり、炉芯管１とほぼ同等の長さ、その内径より適宜小外径を有し、両端を開閉可能に閉止した円筒状の高周波誘導発熱体４が同心状に収容されており、この高周波誘導発熱体４の上底には、スート５が石英ガラス製の支持棒６を介し炉芯管１の軸心と同軸をなして吊下されている一方、高周波誘導発熱体４の外周には、カーボンフェルトからなる円筒状の断熱材７が嵌装されている。
【００２０】
又、高周波誘導発熱体４内には、処理用のガス（例えば、脱泡のためのＨｅガス、ＦドープのためのＳｉＦ４ガス）を導入するための上部ガス導入管８が、上方の断熱材３、炉芯管１の上底及び高周波誘導発熱体４の上底を貫通して導入されていると共に、炉内パージ用のガス（例えば、Ｎ２ガス）を導入するための下部ガス導入管９及び処理用のガス等を排出するための排気管１０が、それぞれ下方の断熱材２、炉芯管１の下底及び高周波誘導発熱体４の下底を貫通して導入されている。
そして、炉芯管１の外側には、その長さより適宜に短い長さの高周波コイル１１が高周波誘導発熱体４と対向させて同心配置されており、この高周波コイル１１は、垂直方向へ移動可能に設けられている。
【００２１】
上述した合成シリカガラスの製造装置を用いてスート５を加熱溶融し、透明な合成シリカガラスを製造するには、先ず、スート５を図１に示すようにセットし、かつ、高周波コイル１１をスート５の下端部と対向させてセットした後、高周波コイル１１に高周波電流を流して高周波誘導加熱源としての高周波誘導発熱体４を発熱させ、炉芯管１内が所定の温度（例えば、７００℃以下）になったら下部ガス導入管９から炉内パージ用のガスを導入し、更に炉芯管１内の温度がより高い所定の温度（例えば、１０００℃以上）になったら炉内パージ用のガスの導入を停止して上部ガス導入管８から処理用のガスを導入する。
なお、導入されたガスは、順次排気管１０から排出される。
次に、スート５の下端部が加熱溶融されて透明化されたら高周波コイル１１を次第に上昇させて高周波誘導加熱源としての高周波誘導発熱体４によるホットゾーンを上昇させ、スート５をその上端に向けて逐次透明化させる。
そして、スート５の透明化が完了したら処理用のガスに代えて炉内パージ用のガスを導入しながら、高周波コイル１１への高周波電流を漸次小さくして炉芯管１内の温度を低下させ、炉芯管１内が室温になったら上方の断熱材２、炉芯管１の上底を取り外し、透明な合成シリカガラスを高周波誘導発熱体４の上底と一緒にホイストやクレーン等を用いて取り出す。
【００２２】
ここで、直径２６０ｍｍ、長さ１０００ｍｍ程度のスートを処理するのに、本発明の装置では、４４０ｋＷの電力を使用した。
又、ホットゾーン（最高温度帯）から上方及び下方における温度勾配は、本発明の装置では、炉芯管内径３００ｍｍ、スート径２６０ｍｍ、高周波コイル径５００ｍｍ、高周波コイル長さ（均熱長）５００ｍｍ、高周波コイル出力４４０ｋＷとした場合、１０℃／ｍｍであり、かつ、得られる合成シリカガラスに自重による変形、失透が殆んどなかったのに対し、従来の装置では、炉芯管径及びスート径を同等とし、抵抗発熱体径３００〜４００ｍｍ、抵抗発熱体長さ（均熱長）３００ｍｍとした場合、０．１〜１．０℃／ｍｍであり、かつ、得られる合成シリカガラスに自重による変形、失透があった。
更に、長さ１０００ｍｍ程度のスートを処理する場合、本発明の装置は、高さが、３８００ｍｍ程度であるのに対し、従来の装置は、全長で５０００ｍｍ以上の炉芯管が必要で、更に、上部に支持棒を上下させる機構が３０００ｍｍ以上と、合計で１０ｍ以上の高さが必要であった。
【００２３】
なお、上述した実施の形態においては、高周波コイル長さをスート長さより短くし、高周波コイルを垂直方向へ移動するゾーンシンター方式をとる場合について説明したが、これに限定されるものではなく、高周波コイル長さをスート長さと同等し、高周波コイルをスートと対向させて固定するバッチ方式としてもよい。
【００２４】
【発明の効果】
以上説明したように、本発明の第１の合成シリカガラスの製造方法及びその製造装置によれば、高周波誘導加熱源としての高周波誘導発熱体がスートと直に対向するので、エネルギー損失を従来に比べて低減することができる。
【００２５】
第２の合成シリカガラスの製造方法及びその製造装置によれば、第１の方法及び装置による作用効果の他、高周波誘導加熱源としての高周波誘導発熱体から放射される熱エネルギーが有効に活用されるので、エネルギー損失を一層低減することができる。
【００２６】
第３の合成シリカガラスの製造方法及びその製造装置によれば、第１又は第２の方法及び装置による作用効果の他、ホットゾーンの移動が可能となるので、装置の規模を従来に比べて格段に小さくすることができる。
又、ホットゾーンから上方及び下方における温度勾配がシャープになるので、ゾーンシンター方式をとる場合、製品である透明な合成シリカガラスに変形や失透を生じることがない。
【００２７】
又、第４の合成シリカガラスの製造方法及びその製造装置によれば、第１、第２又は第３の方法及び装置による作用効果の他、炉芯管からの熱エネルギーの放散が低減されるので、エネルギー損失をより一層低減することができる。
【図面の簡単な説明】
【図１】本発明に係る合成シリカガラスの製造装置の実施の形態の一例を示す概略断面図である。
【図２】従来の合成シリカガラスの製造装置の概略断面図である。
【符号の説明】
１ 炉芯管
４ 高周波誘導発熱体（高周波誘導加熱源）
５ スート
７ 断熱材
１１ 高周波コイル[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a method and apparatus for producing a transparent synthetic silica glass having excellent ultraviolet transmittance and used for an ultraviolet laser or the like.
[0002]
[Prior art]
Conventionally, this type of synthetic silica glass is produced from a silicon compound such as silicon tetrachloride (SiCl 4 ), trichlorosilane (SiHCl 3 ), or silicon tetrabromide (SiBr 4 ) by a VAD (Vapor-Phase Axial Position) method or the like. The soot (synthetic silica glass porous body), which is an aggregate of synthetic silica glass fine particles, is used as a base material, and as shown in FIG. 2, the soot is placed in a vertical furnace core tube 31 made of transparent quartz glass. 32 is coaxially arranged via a rotatable and vertically movable support rod 32, and a gas (for example, tetrafluoride) supplied and exhausted through the furnace core tube 31 through a gas inlet 34 and a gas outlet 35. silicon: One kept to a required atmosphere by SiF 4), the soot 32 is lowered while being rotated by the support rod 33, a ring shape with concentric arrangement on the outside of the furnace core tube 31 The maximum temperature range of 1,450 to 1,600 ° C. formed by resistance heating element 36 (hot zone) heated and melted in the zone sintering method of moving, are produced by transparent.
In FIG. 2, reference numeral 37 denotes a water-cooled cap made of stainless steel (SUS) for closing the upper end of the furnace core tube 31, and reference numeral 38 denotes a heat retaining cover that covers the resistance heating element 36.
[0003]
[Problems to be solved by the invention]
However, in the conventional synthetic silica glass manufacturing method and apparatus, since a resistance heating element as a heating source for forming a hot zone is provided outside the furnace core tube, the resistance heating element is covered with a heat insulating cover. However, there is a problem that energy loss is large.
In addition, since the soot is a zone sintering method in which the soot is moved in the vertical direction, there is a problem in that the device becomes large when the soot is long.
Furthermore, since the temperature gradients above and below the hot zone are slow, when using the zone sintering method, there is a problem that the transparent synthetic silica glass as a product is deformed or devitrified by its own weight.
[0004]
Therefore, an object of the present invention is to provide a method for producing a synthetic silica glass capable of reducing energy loss and a production apparatus thereof.
[0005]
[Means for Solving the Problems]
In order to solve the above-mentioned problems, a first method for producing synthetic silica glass of the present invention is directed to a method for producing synthetic silica glass in which a soot coaxially arranged in a vertical furnace core tube made of quartz glass is heated and melted for transparency. The soot is heated and melted by a high frequency induction heating source surrounding the soot in the furnace core tube.
[0006]
A second method for producing synthetic silica glass is characterized in that, in the first method, radiation of radiant heat from the high-frequency induction heating source to the furnace core tube is cut off.
[0007]
A third method for producing synthetic silica glass is characterized in that in the first or second method, the high-frequency induction heating source is moved in a vertical direction.
[0008]
A fourth method for producing synthetic silica glass is characterized in that, in the first, second, or third method, radiation of radiant heat from the high-frequency induction heating source from a furnace core tube is reduced.
[0009]
On the other hand, a first synthetic silica glass manufacturing apparatus is a synthetic silica glass manufacturing apparatus that heats and melts soot coaxially arranged in a vertical quartz core tube made of quartz glass to make the soot transparent, and is accommodated in the furnace core tube. A high-frequency induction heating element made of carbon and having a cylindrical shape surrounding the soot; and a high-frequency coil concentrically arranged outside the furnace core tube so as to face the high-frequency induction heating element.
[0010]
A second apparatus for producing synthetic silica glass is characterized in that, in the first apparatus, a heat insulating material made of carbon felt having a cylindrical shape fitted on the outer periphery of the high-frequency induction heating element is provided.
[0011]
A third apparatus for producing synthetic silica glass is characterized in that, in the first or second apparatus, the high-frequency coil is movable in a vertical direction.
[0012]
Further, a fourth synthetic silica glass manufacturing apparatus is characterized in that, in the first, second or third apparatus, quartz glass forming the furnace core tube is opaque.
[0013]
[Action]
In the first method and apparatus for producing synthetic silica glass of the present invention, the high-frequency induction heating element as the high-frequency induction heating source is directly opposed to the soot.
[0014]
It is preferable that the furnace core tube has a high atmosphere substitution property and that the atmosphere can be controlled. By adopting such a structure, the high-frequency induction heating element can be prevented from being oxidized.
The carbon forming the high-frequency induction heating element is preferably a high-purity carbon that has been subjected to a purification treatment.
[0015]
In the second method for producing synthetic silica glass and the apparatus for producing the same, the heat energy radiated from the high-frequency induction heating element as the high-frequency induction heating source is effectively utilized, in addition to the effects of the first method and apparatus.
[0016]
In the third method for producing synthetic silica glass and the apparatus for producing the same, in addition to the operation of the first or second method and apparatus, the hot zone can be moved, and the temperature gradients above and below the hot zone are reduced. Be sharp.
[0017]
In the fourth method for producing synthetic silica glass and the apparatus for producing the same, in addition to the operation of the first, second or third method and apparatus, radiation of heat energy from the furnace tube is reduced.
[0018]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a schematic sectional view showing an example of an embodiment of the apparatus for producing synthetic silica glass according to the present invention.
[0019]
In the figure, reference numeral 1 denotes a furnace core tube erected on a heat insulating material 2 also serving as a base plate. The furnace core tube 1 is made of opaque quartz glass, and has a vertical cylindrical shape with upper and lower ends hermetically closed and openably and closably closed. The heat insulating material 3 is placed on the upper end.
The furnace core tube 1 is made of purified high-purity carbon, has a length substantially equal to that of the furnace core tube 1, has an outer diameter appropriately smaller than the inner diameter, and both ends are openably closed. A cylindrical high-frequency induction heating element 4 is accommodated concentrically, and a soot 5 is coaxial with the axis of the furnace core tube 1 via a support rod 6 made of quartz glass on the upper bottom of the high-frequency induction heating element 4. On the other hand, a cylindrical heat insulating material 7 made of carbon felt is fitted around the high-frequency induction heating element 4.
[0020]
An upper gas introduction pipe 8 for introducing a processing gas (for example, He gas for defoaming, SiF 4 gas for F doping) is provided in the high-frequency induction heating element 4. The lower gas is introduced through the material 3, the upper bottom of the furnace core tube 1 and the upper bottom of the high-frequency induction heating element 4, and also for introducing a gas for purging in the furnace (for example, N 2 gas). A pipe 9 and an exhaust pipe 10 for discharging a processing gas or the like are introduced through the lower heat insulating material 2, the lower bottom of the furnace core tube 1, and the lower bottom of the high-frequency induction heating element 4, respectively.
On the outside of the furnace core tube 1, a high-frequency coil 11 having a length appropriately shorter than the length thereof is concentrically arranged so as to face the high-frequency induction heating element 4, and the high-frequency coil 11 is movable in a vertical direction. It is provided in.
[0021]
In order to heat and melt the soot 5 using the above-described synthetic silica glass manufacturing apparatus to manufacture a transparent synthetic silica glass, first, the soot 5 is set as shown in FIG. 5 is set so as to face the lower end portion, and a high-frequency current is supplied to the high-frequency coil 11 to cause the high-frequency induction heating element 4 as a high-frequency induction heating source to generate heat, so that the inside of the furnace core tube 1 has a predetermined temperature (for example, 700 ° C.). When the temperature in the furnace becomes lower than a predetermined temperature (for example, 1000 ° C. or higher), a gas for purging in the furnace is introduced from the lower gas introducing pipe 9. The introduction of the gas is stopped, and the gas for processing is introduced from the upper gas introduction pipe 8.
Note that the introduced gas is sequentially discharged from the exhaust pipe 10.
Next, when the lower end of the soot 5 is heated and melted and becomes transparent, the high frequency coil 11 is gradually raised to raise the hot zone by the high frequency induction heating element 4 as a high frequency induction heating source, and the soot 5 is directed toward the upper end. To make it transparent.
When the soot 5 is made transparent, the high-frequency current to the high-frequency coil 11 is gradually reduced while introducing a gas for purging the furnace instead of the processing gas, thereby lowering the temperature inside the furnace core tube 1. When the inside of the furnace core tube 1 reaches room temperature, the upper heat insulating material 2 and the upper bottom of the furnace core tube 1 are removed, and a transparent synthetic silica glass is used together with the upper bottom of the high-frequency induction heating element 4 using a hoist or a crane. And take it out.
[0022]
Here, in order to process soot having a diameter of 260 mm and a length of about 1000 mm, the apparatus of the present invention used 440 kW of power.
In the apparatus of the present invention, the temperature gradients above and below the hot zone (maximum temperature zone) are as follows: furnace core tube inner diameter 300 mm, soot diameter 260 mm, high-frequency coil diameter 500 mm, high-frequency coil length (soaking length) 500 mm, When the output of the high-frequency coil was 440 kW, the temperature was 10 ° C./mm, and the resulting synthetic silica glass was hardly deformed or devitrified by its own weight. When the diameter is equal, the resistance heating element diameter is 300 to 400 mm, and the resistance heating element length (soaking length) is 300 mm, it is 0.1 to 1.0 ° C./mm, and the weight of the obtained synthetic silica glass depends on its own weight. There was deformation and devitrification.
Further, when processing soot having a length of about 1000 mm, the apparatus of the present invention has a height of about 3800 mm, whereas the conventional apparatus requires a furnace core tube having a total length of 5000 mm or more. The mechanism for moving the support bar up and down at the top required 3000 mm or more and a total height of 10 m or more.
[0023]
Note that, in the above-described embodiment, the case where the length of the high-frequency coil is shorter than the soot length and the zone sintering method in which the high-frequency coil is moved in the vertical direction is described, but the invention is not limited thereto. A batch method may be used in which the coil length is equal to the soot length, and the high-frequency coil is fixed to face the soot.
[0024]
【The invention's effect】
As described above, according to the first method for producing synthetic silica glass and the apparatus for producing the same according to the present invention, the high-frequency induction heating element as the high-frequency induction heating source directly faces the soot. It can be reduced in comparison.
[0025]
According to the second method and apparatus for producing synthetic silica glass, in addition to the functions and effects of the first method and apparatus, heat energy radiated from a high-frequency induction heating element as a high-frequency induction heating source is effectively utilized. Therefore, energy loss can be further reduced.
[0026]
According to the third method for producing synthetic silica glass and the apparatus for producing the same, in addition to the effects of the first or second method and apparatus, the hot zone can be moved. It can be much smaller.
Further, since the temperature gradients above and below the hot zone are sharp, when the zone sintering method is used, the product, the transparent synthetic silica glass, does not deform or devitrify.
[0027]
Further, according to the fourth method for producing synthetic silica glass and the apparatus for producing the same, in addition to the functions and effects of the first, second or third method and apparatus, the dissipation of heat energy from the furnace tube is reduced. Therefore, energy loss can be further reduced.
[Brief description of the drawings]
FIG. 1 is a schematic cross-sectional view showing an example of an embodiment of an apparatus for producing a synthetic silica glass according to the present invention.
FIG. 2 is a schematic sectional view of a conventional synthetic silica glass manufacturing apparatus.
[Explanation of symbols]
1 furnace core tube 4 high frequency induction heating element (high frequency induction heating source)
5 soot 7 heat insulating material 11 high frequency coil

Claims (8)

石英ガラス製の垂直な炉芯管内に同軸配置したスートを加熱溶融して透明化する合成シリカガラスの製造方法において、前記スートを炉芯管内でそれを囲む高周波誘導加熱源により加熱溶融することを特徴とする合成シリカガラスの製造方法。In a method for producing a synthetic silica glass in which soot coaxially arranged in a vertical furnace core tube made of quartz glass is heated and melted to make the soot transparent, the soot is heated and melted by a high frequency induction heating source surrounding the soot inside the furnace core tube. A method for producing a synthetic silica glass. 前記高周波誘導加熱源からの輻射熱の炉芯管への放射を遮断することを特徴とする請求項１記載の合成シリカガラスの製造方法。The method for producing synthetic silica glass according to claim 1, wherein radiation of radiant heat from the high-frequency induction heating source to the furnace core tube is blocked. 前記高周波誘導加熱源を垂直方向へ移動することを特徴とする請求項１又は２記載の合成シリカガラスの製造方法。The method for producing a synthetic silica glass according to claim 1 or 2, wherein the high-frequency induction heating source is moved in a vertical direction. 前記高周波誘導加熱源からの輻射熱の炉芯管からの放射を低減することを特徴とする請求項１、２又は３記載の合成シリカガラスの製造方法。4. The method for producing synthetic silica glass according to claim 1, wherein radiation of radiant heat from the high-frequency induction heating source from the furnace core tube is reduced. 石英ガラス製の垂直な炉芯管内に同軸配置したスートを加熱溶融して透明化する合成シリカガラスの製造装置において、前記炉芯管内に収容され、スートを囲む円筒状を呈するカーボン製の高周波誘導発熱体と、高周波誘導発熱体と対向させて炉芯管の外側に同心配置した高周波コイルとを備えることを特徴とする合成シリカガラスの製造装置。In a synthetic silica glass manufacturing apparatus that heats and melts soot coaxially arranged in a vertical quartz core tube and makes the soot transparent, a high frequency induction made of carbon having a cylindrical shape and housed in the furnace core tube and surrounding the soot. An apparatus for producing synthetic silica glass, comprising: a heating element; and a high-frequency coil concentrically arranged outside the furnace core tube so as to face the high-frequency induction heating element. 前記高周波誘導発熱体の外周に嵌装した円筒状を呈するカーボンフェルト製の断熱材を備えることを特徴とする請求項５記載の合成シリカガラスの製造装置。6. The synthetic silica glass manufacturing apparatus according to claim 5, further comprising a cylindrical carbon felt heat insulating material fitted around the outer periphery of the high frequency induction heating element. 前記高周波コイルが垂直方向へ移動可能であることを特徴とする請求項５又は６記載の合成シリカガラスの製造装置。The apparatus according to claim 5, wherein the high-frequency coil is movable in a vertical direction. 前記炉芯管を形成する石英ガラスが不透明であることを特徴とする請求項５、６又は７記載の合成シリカガラスの製造装置。The apparatus for producing synthetic silica glass according to claim 5, 6 or 7, wherein the quartz glass forming the furnace core tube is opaque.
JP2003162423A 2003-06-06 2003-06-06 Method and apparatus for manufacturing synthetic silica glass Pending JP2004359520A (en)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008105903A (en) * 2006-10-26 2008-05-08 Covalent Materials Corp Method for manufacturing titania-silica glass
JP2010500166A (en) * 2006-08-10 2010-01-07 コーニング インコーポレイテッド Particle synthesis equipment
JP2014160237A (en) * 2013-01-22 2014-09-04 Shin Etsu Chem Co Ltd Member for euv lithography, method for producing the same and titania-doped quartz glass

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59184736A (en) * 1983-04-06 1984-10-20 Furukawa Electric Co Ltd:The Transparent vitrification of optical porous glass
JPS62187130A (en) * 1986-01-30 1987-08-15 コーニング　インコーポレイテッド Heating furnace for treating glass material
JPH11513011A (en) * 1996-06-24 1999-11-09 コーニング インコーポレイテッド Helium recirculation in optical fiber manufacturing.
JP2000233935A (en) * 1999-02-16 2000-08-29 Fuji Electric Co Ltd Device for heat-treating glass material

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59184736A (en) * 1983-04-06 1984-10-20 Furukawa Electric Co Ltd:The Transparent vitrification of optical porous glass
JPS62187130A (en) * 1986-01-30 1987-08-15 コーニング　インコーポレイテッド Heating furnace for treating glass material
JPH11513011A (en) * 1996-06-24 1999-11-09 コーニング インコーポレイテッド Helium recirculation in optical fiber manufacturing.
JP2000233935A (en) * 1999-02-16 2000-08-29 Fuji Electric Co Ltd Device for heat-treating glass material

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010500166A (en) * 2006-08-10 2010-01-07 コーニング インコーポレイテッド Particle synthesis equipment
JP2008105903A (en) * 2006-10-26 2008-05-08 Covalent Materials Corp Method for manufacturing titania-silica glass
JP2014160237A (en) * 2013-01-22 2014-09-04 Shin Etsu Chem Co Ltd Member for euv lithography, method for producing the same and titania-doped quartz glass

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