JP2004345152A - Strong adhesion vapour deposition film and packaging material using it - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a strong adhesion vapor deposition film obtained by providing a vapor deposition membrane layer comprising an inorganic oxide on a bese material film, enhanced in the adhesion of the base material film constituting the vapor deposition film with the vapor deposition membrane layer and capable of being effectively put to practical use in a packaging field for food, non-food and pharmaceuticals, especially in a packaging field requiring heating sterilization such as retort sterilization or the like, and a packaging material using it. <P>SOLUTION: In the strong adhesion vapor deposition film obtained by providing at least the vapor deposition membrane layer comprising the inorganic oxide on the base material film, a polyester film is used as the base material film and the crystallizing degree of the surface of the base material film, on which the vapor deposition membrane layer is provided, is set to 30% or below. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

【００６０】
【発明の効果】
本発明は以上のような構成であるので、基材フィルム上に密着性を向上させるための処理を施すこともなく、基材フィルムと無機酸化物からなる蒸着薄膜層間の優れた密着性を確保することができ、レトルトなどの加熱殺菌を行った場合においても、ラミ浮き、デラミネーションなどが発生しない。
また本発明の包装材料は、食品およびレトルト食品、医薬品や電子部材等の非食品等の包装分野においても実用上の効果が大いに期待できる。
【図面の簡単な説明】
【図１】本発明の強密着蒸着フィルムの概略の構成を示す断面図である。
【図２】本発明の包装材料の概略の構成を示す断面図である。
【符号の説明】
１、１１・・・基材フィルム
２、１２・・・蒸着薄膜層
３、１３・・・複合被膜層
５ ・・・包装材料構成層[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention is a vapor-deposited film and a packaging material using at least a vapor-deposited thin film layer made of an inorganic oxide on a substrate film, and particularly improves the adhesion between the substrate film and the vapor-deposited thin film layer. The present invention relates to a strongly adhered vapor-deposited film and a packaging material using the same, which can be effectively used in the field of packaging foods, non-foods, pharmaceuticals, etc., particularly in the field of packaging requiring heat sterilization such as retort sterilization.
[0002]
[Prior art]
In recent years, packaging materials used for the packaging of foods, non-food products, pharmaceuticals, etc., contain oxygen, water vapor, and other materials that pass through the packaging materials in order to suppress deterioration of the packaged contents and maintain their functions and properties. It is necessary to prevent the influence of the gas that alters the material, and it is required to have a gas barrier property that blocks these. Therefore, a packaging material using a metal foil such as aluminum which is less affected by temperature and humidity as a gas barrier layer has been generally used.
[0003]
However, packaging materials using metal foil such as aluminum have little effect of temperature and humidity and have high gas barrier properties, but the contents cannot be checked through the packaging material. In such a case, there is a problem in that it has to be treated as a noncombustible material, and a metal detector cannot be used in an inspection.
[0004]
Therefore, as a packaging material which overcomes these drawbacks, for example, silicon oxide, oxidized by a thin film forming means such as a vacuum evaporation method or a sputtering method on a polymer film as described in Patent Documents 1 and 2 and the like. 2. Description of the Related Art A vapor-deposited film having a vapor-deposited thin film layer of an inorganic oxide such as aluminum has been developed. These vapor-deposited films are known to have transparency and gas barrier properties such as oxygen and water vapor, and are considered suitable as packaging materials having transparency and gas barrier properties that cannot be obtained with metal foils and the like. .
[0005]
However, the above-mentioned conventional vapor-deposited film has a drawback that delamination is caused when heat sterilization treatment such as boil treatment or retort treatment is performed because the adhesion between the base film and the vapor-deposited thin film layer is weak.
[0006]
In order to solve this problem, attempts have been made to improve the adhesion between the base film and the vapor-deposited thin film layer by subjecting the base film to plasma treatment in advance.
[0007]
However, for example, in the case of performing in-line plasma processing in the plasma processing of the base film, an electrode for applying a voltage for plasma generation is installed on the opposite side, not on the drum side of the base film. . When such a setting is made, the base film is placed on the anode side, so that a high self-bias cannot be obtained, and as a result, there is a problem that a high processing effect cannot be exhibited.
[0008]
In order to obtain a high self-bias, a DC discharge method can be used.However, if a high bias voltage is to be obtained by this method, the plasma mode changes from glow to arc. There has been a problem that processing cannot be performed.
[0009]
[Patent Document 1]
US Pat. No. 3,442,686 [Patent Document 2]
Japanese Patent Publication No. 63-28017
[Problems to be solved by the invention]
The present invention has been made in order to solve the above problems, and even if the base film is not subjected to a pretreatment such as plasma treatment, the base film and the deposited thin film layer composed of the inorganic oxide thereon. An object of the present invention is to provide a strongly adhered vapor-deposited film and a packaging material using the same, which have excellent adhesion and do not cause delamination even when subjected to heat sterilization of a retort or the like.
[0011]
[Means for Solving the Problems]
In order to achieve the above object, the invention according to claim 1 is a vapor deposition film having at least a vapor deposition thin film layer made of an inorganic oxide on a substrate film, wherein the substrate film is made of a polyester film. A strongly adhered vapor-deposited film characterized in that the surface on which the vapor-deposited thin film layer is provided has a crystallinity of 30% or less.
[0012]
According to a second aspect of the present invention, in the strong adhesion vapor-deposited film according to the first aspect, in the polyester constituting the polyester film, 60 to 90% of all ester units in the structure are ethylene terephthalate and 10 to 40%. Is ethylene isophthalate.
[0013]
According to a third aspect of the present invention, in the strong adhesion vapor-deposited film according to the first or second aspect, the surface of the base film is subjected to plasma pretreatment using reactive ion etching (RIE). It is characterized by the following.
[0014]
Further, the invention according to claim 4 is the strong adhesion vapor-deposited film according to any one of claims 1 to 3, wherein the inorganic oxide constituting the vapor-deposited thin film layer is aluminum oxide, silicon oxide, or a mixture thereof. It is one of the features.
[0015]
Furthermore, the invention according to claim 5 is the strong adhesion vapor-deposited film according to any one of claims 1 to 4, wherein a water-soluble polymer and one or more kinds of water-soluble polymers are formed on the vapor-deposited thin film layer made of the inorganic oxide. A composite film layer formed by applying and drying an aqueous solution containing a metal alkoxide or a hydrolyzate thereof or a mixed solution of water / alcohol is provided.
[0016]
Further, the invention according to claim 6 is the strong adhesion vapor-deposited film according to any one of claims 1 to 5, wherein the metal alkoxide is tetraethoxysilane or triisopropoxyaluminum, or a mixture thereof. It is characterized by the following.
[0017]
Furthermore, the invention according to claim 7 is the strong adhesion deposited film according to any one of claims 1 to 6, wherein the water-soluble polymer is polyvinyl alcohol or poly (vinyl alcohol-O-ethylene), cellulose, It is characterized by having at least one kind of starch as a component.
[0018]
Further, the invention according to claim 8 is a packaging material characterized in that a packaging material constituent layer is further laminated and provided on the strong adhesion vapor deposition film according to any one of claims 1 to 7.
[0019]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of the present invention will be described.
FIG. 1 shows a schematic cross-sectional configuration according to an embodiment of the strongly adhered vapor deposition film of the present invention. This strong adhesion vapor-deposited film has a basic structure in which at least a vapor-deposited thin film layer 2 made of an inorganic oxide is laminated on a base film 1. In the illustrated strongly adhered vapor deposition film, a composite coating layer 3 is further provided on a vapor deposition thin film layer 2 made of an inorganic oxide.
[0020]
The base film 1 constituting the strongly adhered vapor deposition film is made of a polyester film, and the surface on which the vapor deposition thin film layer 2 is provided has a crystallinity of 30% or less.
[0021]
The polyester film used as the base film 1 is a film made of a polymer obtained by polycondensing one or more dicarboxylic acids and one or more diols. Examples of dicarboxylic acids include aromatic dicarboxylic acids such as terephthalic acid, isophthalic acid, phthalic acid, 2,6-naphthalenedicarboxylic acid, and 2,7-naphthalenedicarboxylic acid, adipic acid, sebacic acid, and 1,4-cyclohexane. Examples include aliphatic dicarboxylic acids such as dicarboxylic acids. Examples of the diol include ethylene glycol, trimethylene glycol, tetramethylene glycol, 1,4-cyclohexanedimethanol, neopentyl glycol and the like. There is no particular limitation on these combinations, and it is sufficient that the polymer obtained by condensation polymerization has a film processing suitability.
[0022]
Among the above materials, in consideration of the strength and heat resistance when formed into a film, a polyester obtained by condensing ethylene glycol and terephthalic acid and having ethylene terephthalate units in the range of 60 to 90% is preferable. In this case, if the number of ethylene terephthalate units is less than 60, both the strength and the heat resistance are inferior. On the other hand, if it exceeds 90%, the crystallinity becomes high, and the object of improving the adhesion to the deposited thin film layer made of an inorganic oxide provided thereon cannot be fulfilled.
[0023]
When the main ester unit in the obtained polymer is the above-mentioned ethylene terephthalate, it is preferable to copolymerize 10 to 40% of an ethylene isophthalate unit obtained by condensing ethylene glycol and isophthalic acid. Since the ethylene isophthalate unit has almost the same glass transition point and thermoforming conditions as those of ethylene terephthalate, it can be easily processed into a film. However, even if it is not ethylene isophthalate, as long as it contains the above-mentioned ester unit composed of dicarboxylic acid and diol, there is no problem as a material constituting the base film 1.
[0024]
The substrate film 1 made of the polyester film as described above has a surface on which the vapor-deposited thin film layer 2 is formed, in order to strengthen the adhesion between the substrate film 1 and the vapor-deposited thin film layer 2 composed of an inorganic oxide provided thereon. It must be amorphous or have a crystallinity of 30% or less.
Polyester having a crystallinity of 30% or less and having low crystallinity or non-crystallized polyester has a remarkable structural change as compared with highly crystalline polyesters such as polyethylene terephthalate, polyethylene naphthalate and polybutylene terephthalate. The molecular chains move easily. Therefore, when vapor deposition is performed on a polyester film having the above-described characteristics on its surface, the molecular chains in the polyester film move immediately after the vapor deposition thin film layer is formed, and functional groups such as COO groups that interact with the vapor deposition thin film layer. Easily appear on the surface, so that the adhesion between the base film 1 and the deposited thin film layer 2 is further improved.
[0025]
On the other hand, when a base film made of a highly crystalline polyester is used, the functional group does not appear on the surface because the molecular structure is rigid, and when a vapor-deposited thin film layer is provided on the surface, there is a difference. Adhesion becomes weak.
Therefore, when used as the base film 1 of the strongly adhered vapor deposition film of the present invention, the degree of crystallinity on the surface of the base film 1 needs to be 30% or less, preferably 10% or less.
[0026]
The substrate film 1 may be a single layer or a multi-layer structure, and the crystallinity of the surface on which the vapor-deposited thin film layer is provided may be 30% or less. However, since a polyester film having a low crystallinity has low physical properties such as elastic modulus and heat resistance as compared with a highly crystalline polyester, post-processing becomes difficult when applied to a base film as a single-layer film. There are cases. For this reason, in the present invention, it is preferable to use a base film having a multilayer structure in which a highly crystalline polyester film is laminated on portions other than the surface on which the vapor-deposited thin film layer is provided. For example, when providing a vapor-deposited thin film layer on only one side of a substrate film, a two-layer configuration consisting of a crystalline polyester film and an amorphous polyester film, or when providing a vapor-deposited thin film layer on both sides of a substrate film May have a three-layer structure of non-crystal / crystal / non-crystal. In short, a layer other than a non-crystalline portion or a portion having a crystallinity of 30% or less may be a single layer or a multi-layer, and these layers are made of polyester unless they are separated from the non-crystalline or low-crystalline portion of the surface. The structural unit, the degree of orientation, the degree of crystallinity, and the like are not limited.
[0027]
The lamination method for producing the multilayer film as described above is not particularly limited. For example, a method in which each polyester is co-extruded with a separate extruder, a method in which a crystalline polyester film is stretch-coated with an amorphous polyester by extrusion coating, and a crystallized oriented film and an amorphous polyester film are separated. And bonding at a temperature equal to or higher than the softening point.
[0028]
In addition, by performing plasma pretreatment using reactive ion etching (RIE) on the surface of the base film as described above, it is possible to further improve the adhesion between the base film and the deposited thin film layer. is there. By performing this RIE plasma pretreatment, chemical effects such as the use of generated radicals and ions to impart functional groups to the surface of the base film, and ion etching of the surface to remove impurities and smoothen It is possible to simultaneously obtain two physical effects such as performing a physical effect.
[0029]
The thickness of the base film 1 is not particularly limited, but the workability when a primer layer, a vapor-deposited thin film layer made of an inorganic oxide, a gas barrier coating layer, and the like generally provided as a packaging material are formed. In consideration of the above, the range is practically preferably 3 to 200 μm, and particularly preferably 6 to 30 μm.
[0030]
Next, the deposited thin film layer 2 made of an inorganic oxide will be described in detail.
The deposited thin film layer 2 made of an inorganic oxide is made of a deposited thin film of an inorganic oxide such as aluminum oxide, silicon oxide, tin oxide, magnesium oxide, or a mixture thereof. Any layer having gas barrier properties may be used. In consideration of imparting various sterilization resistances, aluminum oxide and silicon oxide are particularly preferable among these. However, the constituent material of the vapor-deposited thin film layer 2 is not limited to the above-described inorganic oxide, and any other material can be used as appropriate as long as it meets the above conditions.
[0031]
The optimum conditions for the thickness of the vapor-deposited thin film layer 2 vary depending on the type and configuration of the inorganic oxide used, but generally the thickness is preferably in the range of 5 to 300 nm, and the value can be appropriately selected. However, if the film thickness is less than 5 nm, a uniform film may not be obtained, or the film thickness may not be sufficient, and the function as a gas barrier layer may not be sufficiently achieved. On the other hand, if the thickness exceeds 300 nm, flexibility cannot be maintained in the thin film, and there is a problem that the thin film may be cracked by an external force such as bending or pulling after the film is formed. More preferably, it is within the range of 10 to 150 nm.
[0032]
There are various methods for forming the vapor-deposited thin film layer 2 made of such an inorganic oxide on the base film 1, such as a vacuum vapor deposition method, other thin film forming methods such as a sputtering method, an ion plating method, and a plasma vapor phase method. It is possible to use a growth method (CVD) or the like. However, in consideration of productivity, the vacuum deposition method is currently the most excellent. As the heating means of the vacuum evaporation method, it is preferable to use any one of an electron beam heating method, a resistance heating method, and an induction heating method, but in consideration of a wide range of selectivity of a deposition material, an electron beam heating method is used. Is more preferred. In addition, in order to further improve the adhesion between the deposited thin film layer and the base film and the denseness of the deposited thin film layer, deposition can be performed using a plasma assist method or an ion beam assist method. Further, in order to increase the transparency of the deposited thin film layer, reactive deposition in which various gases such as oxygen are blown during deposition may be used.
[0033]
Subsequently, the composite coating layer 3 will be described. The composite coating layer 3 is a coating having gas barrier properties, and is formed using a coating agent mainly composed of an aqueous solution containing a water-soluble polymer and one or more metal alkoxides or a hydrolyzate thereof or a mixed solution of water / alcohol. Is done. As the coating agent, for example, a solution obtained by dissolving a water-soluble polymer in an aqueous (water or water / alcohol mixture) solvent and mixing the metal alkoxide directly or in advance by a treatment such as hydrolysis is used. I do. The composite coating layer 3 is formed by coating this solution on the vapor-deposited thin film layer 2 made of an inorganic oxide and then drying by heating. Hereinafter, each component contained in the coating agent will be described in more detail.
[0034]
Examples of the water-soluble polymer used in the coating agent include polyvinyl alcohol, polyvinylpyrrolidone, starch, methylcellulose, carboxymethylcellulose, and sodium alginate. In particular, it is preferable to use polyvinyl alcohol (hereinafter abbreviated as PVA) as the coating agent because the gas barrier property is most excellent. The PVA referred to here is generally obtained by saponifying polyvinyl acetate. As the PVA, for example, a complete PVA in which only a few percent of acetate groups remain from so-called partially saponified PVA in which tens of percent of acetate groups remain, but other materials may be used. Absent.
[0035]
The metal alkoxide is a compound represented by the general formula, M (OR) _n [M: metal such as Si, Ti, Al, Zr, R: alkyl group such as CH ₃ , C ₂ H ₅ ]. Specific examples include tetraethoxysilane [Si (OC ₂ H ₅ ) ₄ ] and triisopropoxy aluminum [Al (O-2′-C ₃ H ₇ ) ₃ ], among which tetraethoxysilane and triisopropoxy Aluminum is preferable since it is relatively stable in an aqueous solvent after hydrolysis.
[0036]
In addition, a known additive such as an isocyanate compound, a silane coupling agent, or a dispersant, a stabilizer, a viscosity modifier, and a coloring agent may be added to the coating agent, as long as the gas barrier property is not impaired. Is also possible.
[0037]
As a method of applying the coating agent, a conventionally known method such as a commonly used dipping method, roll coating method, screen printing method, spray method, gravure printing method, or the like can be used.
[0038]
The optimum conditions for the thickness of the composite coating layer 3 formed by these coating methods vary depending on the type of the coating agent, the processing machine, and the processing conditions, and are not particularly limited. However, when the thickness after drying is 0.01 μm or less, it is not preferable because a uniform coating film cannot be obtained and a sufficient gas barrier property cannot be obtained. On the other hand, if the thickness exceeds 50 μm, cracks may easily occur in the film, which may cause a problem. It is preferably in the range of 0.01 to 50 μm, and more preferably in the range of 0.1 to 10 μm.
[0039]
As described above, the strongly adhered deposition film of the present invention has been described. Next, the packaging material of the present invention will be described.
FIG. 2 shows a sectional configuration of an embodiment of the packaging material according to the present invention. In this packaging material, at least a vapor-deposited thin film layer 12 made of an inorganic oxide is provided on a base film 11, the base film 11 is made of polyester, and the surface on which the vapor-deposited thin film layer 12 is provided is crystallized. The structure is the same as that of the above-described strongly adhered vapor-deposited film in that a composite film layer 13 is provided on a vapor-deposited thin film layer 12 made of an inorganic oxide. The difference is that the packaging material constituting layer 5 is further laminated on the layer 13.
[0040]
This packaging material constituting layer 5 is a layer provided for imparting aptitude as a packaging material to a strongly adhered vapor deposition film having excellent adhesion between a base film and a vapor deposited thin film composed of an inorganic oxide. Printing layers, intervening film layers, sealant layers, and the like.
[0041]
The intervening film layer is provided to increase the breaking strength or piercing strength to a predetermined strength when used as a packaging material for bag making, and is generally a biaxially stretched nylon in terms of mechanical strength and thermal stability. It may be provided by a film, a biaxially oriented polyethylene terephthalate film, a biaxially oriented polypropylene film, or the like. The thickness of this layer is determined according to the material and required quality, but is generally in the range of 10 to 30 μm.
[0042]
Further, the sealant layer is provided for forming an adhesive layer when forming a bag-like package, for example, polyethylene, polypropylene, ethylene-vinyl acetate copolymer, ethylene-methacrylic acid copolymer, ethylene-methacrylic. It is formed of a resin such as an acid ester copolymer, an ethylene-acrylic acid copolymer, an ethylene-acrylic acid ester copolymer, and a metal crosslinked product thereof. The thickness of this layer is appropriately determined according to the purpose, but is generally in the range of 15 to 200 μm.
[0043]
In the packaging material shown in FIG. 2, the packaging material constituting layer 5 is provided on one surface of the strongly adhered vapor-deposited film, but the packaging material of the present invention is not limited to such a configuration. If necessary, it may be provided on the other surface of the adhesion vapor deposition film.
[0044]
【Example】
Hereinafter, examples of the present invention will be described. Note that the present invention is not limited to these examples.
[0045]
[Example 1]
First, a biaxially stretched base film (having a thickness of 12 μm) having a two-layer structure of a polyethylene terephthalate layer / (a copolymer layer of 80% terephthalic acid / 20% isophthalic acid) was prepared. The thickness of the copolymer layer of the base film having the two-layer structure was 1 μm.
[0046]
Next, a vapor deposition thin film layer made of aluminum oxide was formed to a thickness of 20 nm on the copolymer layer of the obtained base film by reactive vapor deposition using an electron beam heating method. A strong adhesion deposited film was prepared.
[0047]
[Example 2]
The base film used in Example 1 was subjected to plasma pretreatment using reactive ion etching (RIE) under the following conditions. At this time, a high frequency power supply having a frequency of 13.56 MHz was used for the electrodes.
[0048]
(Plasma processing conditions)
Applied power: 100W
Processing time 0.1 sec
Processing gas: Argon processing unit pressure: 2.0 Pa
[0049]
Subsequently, a vapor-deposited thin film layer made of aluminum oxide was formed to a thickness of 20 nm on one surface of the base film that had been subjected to the plasma pretreatment in the above process by reactive vapor deposition using an electron beam heating method. The strongly adhered deposition film according to No. 2 was produced.
[0050]
[Example 3]
As the base film, a biaxially stretched base film having a two-layer structure of a polyethylene terephthalate layer / (a terephthalic acid 90% / isophthalic acid 10% copolymer layer) (total thickness: 12 μm, thickness of the copolymer layer: 1 μm) ) Was used in the same manner as in Example 2 to produce a strongly adhered vapor-deposited film according to Example 3.
[0051]
[Comparative Example 1]
Using a biaxially stretched base film of polyethylene terephthalate alone (having a thickness of 12 μm), a vapor-deposited thin film layer of aluminum oxide is formed on one surface of the film by a reactive vapor deposition using an electron beam heating method to a thickness of 20 nm. A vapor deposition film according to Comparative Example 1 was produced.
[0052]
[Comparative Example 2]
Using a biaxially stretched base film of polybutylene terephthalate alone (having a thickness of 12 μm), a vapor-deposited thin film layer made of aluminum oxide was formed to a thickness of 20 nm on one surface by reactive vapor deposition using an electron beam heating method. Then, a vapor deposition film according to Comparative Example 2 was produced.
[0053]
<Examples 4 to 6, Comparative Examples 3 and 4>
Then, for each of the vapor-deposited films according to Examples 1 to 3 and Comparative Examples 1 and 2, on these vapor-deposited thin film layers, a composite coating layer and a stretched nylon layer (packaging material constituent layer) are as follows. Then, an unstretched polypropylene layer (packing material constituting layer) is sequentially formed and laminated, and the packaging material according to Example 4 based on the strong adhesion vapor-deposited film of Example 1, and the strong adhesion vapor-deposited film of Example 2 as a base. The packaging material according to Example 5, the packaging material according to Example 6 based on the strong adhesion vapor-deposited film according to Example 3, the packaging material according to Comparative Example 3 based on the vapor-deposited film according to Comparative Example 1, and Comparative Example 2 The packaging material according to the comparative example 4 based on the vapor-deposited film was produced.
[0054]
<Formation of composite coating layer>
First, a coating agent obtained by mixing the following liquid A and liquid B at a mixing ratio (wt%) of 6/4 is applied on a vapor-deposited thin film layer by a gravure coating method, and then dried to a thickness of 0.4 μm. , Respectively.
[0055]
(A liquid)
A hydrolyzed solution having a solid content of 3 wt% (in terms of SiO ₂ ) obtained by adding 89.6 g of hydrochloric acid (0.1N) to 10.4 g of tetraethoxysilane and stirring for 30 minutes to hydrolyze.
(B liquid)
3 wt% water / isopropyl alcohol solution of polyvinyl alcohol (90:10 by weight of water: isopropyl alcohol).
[0056]
<Formation of stretched nylon layer and unstretched polypropylene layer>
Next, on the composite coating layer provided in the above step, using a two-component curable polyurethane-based adhesive, dry laminating is performed, and each packaging material of the stretched nylon layer (thickness 15 μm) and the unstretched polypropylene layer (thickness 70 μm) is formed. Constituent layers were sequentially formed and laminated, and retort packaging materials according to Examples 4 to 6 and Comparative Examples 3 to 4 were produced.
[0057]
<Evaluation 1>
The lamination strength between the composite coating layer and the stretched nylon layer (packaging material constituting layer) of each retort packaging material was measured using a Tensilon universal tester RTC-1250 manufactured by Orientec (JIS Z1707 compliant). However, the measurement was performed while the measurement site was moistened with water. Table 1 shows the results.
[0058]
<Evaluation 2>
In addition, a pouch having four sides as seal portions was prepared using each of the above-mentioned retort packaging materials, and water was filled as contents. Thereafter, the pouch was subjected to retort sterilization at 121 ° C. for 30 minutes, and the packaging state after the retort was visually observed. Table 1 shows the results.
[0059]
[Table 1]

[0060]
【The invention's effect】
Since the present invention is configured as described above, it ensures excellent adhesion between the base film and the deposited thin film layer composed of the inorganic oxide without performing a treatment for improving the adhesion on the base film. Even when heat sterilization of a retort or the like is performed, lamination does not occur and delamination does not occur.
In addition, the packaging material of the present invention can be expected to have a great practical effect also in the field of packaging foods and non-foods such as retort foods, pharmaceuticals and electronic members.
[Brief description of the drawings]
FIG. 1 is a cross-sectional view showing a schematic configuration of a strongly adhered vapor deposition film of the present invention.
FIG. 2 is a sectional view showing a schematic configuration of a packaging material of the present invention.
[Explanation of symbols]
1, 11: base film 2, 12: deposited thin film layer 3, 13: composite coating layer 5: packaging material constituent layer

Claims (8)

A vapor-deposited film comprising at least a vapor-deposited thin film layer made of an inorganic oxide on a substrate film, wherein the substrate film is made of a polyester film, and the surface on which the vapor-deposited thin film layer is provided has a crystallinity of 30% or less A strongly adhered vapor-deposited film, characterized in that: 2. The strongly adhered vapor-deposited film according to claim 1, wherein the polyester constituting the polyester film comprises 60 to 90% of ethylene terephthalate and 10 to 40% of ethylene isophthalate in all the ester units in the structure. The strongly adhered vapor deposition film according to claim 1, wherein a plasma pretreatment using reactive ion etching (RIE) is performed on a surface of the base film. The strongly adhered vapor-deposited film according to any one of claims 1 to 3, wherein the inorganic oxide constituting the vapor-deposited thin film layer is any one of aluminum oxide, silicon oxide, and a mixture thereof. A composite film layer formed by applying and drying an aqueous solution containing a water-soluble polymer and at least one metal alkoxide or a hydrolyzate thereof or a mixed solution of water / alcohol is provided on the vapor-deposited thin film layer composed of the inorganic oxide. The strongly adhered vapor-deposited film according to claim 1, wherein: The strong adhesion vapor-deposited film according to any one of claims 1 to 5, wherein the metal alkoxide is tetraethoxysilane, triisopropoxyaluminum, or a mixture thereof. The strong adhesion according to any one of claims 1 to 6, wherein the water-soluble polymer has at least one of polyvinyl alcohol or poly (vinyl alcohol-O-ethylene), cellulose, and starch as components. Evaporated film. A packaging material obtained by further laminating a packaging material constituent layer on the strongly adhered vapor deposition film according to claim 1.

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