JP2004332000A - Plating method, and plating fixture - Google Patents

Plating method, and plating fixture Download PDF

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Publication number
JP2004332000A
JP2004332000A JP2003125259A JP2003125259A JP2004332000A JP 2004332000 A JP2004332000 A JP 2004332000A JP 2003125259 A JP2003125259 A JP 2003125259A JP 2003125259 A JP2003125259 A JP 2003125259A JP 2004332000 A JP2004332000 A JP 2004332000A
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plating
plated
annular portion
jig
objects
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JP2003125259A
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JP3974074B2 (en
Inventor
Yoshinobu Naitou
悦伸 内藤
Yoichi Kawamata
洋一 川又
Masao Horiuchi
政夫 堀内
Katsumi Iwasaki
克巳 岩崎
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Anritsu Corp
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Anritsu Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a plating fixture with which the circumferential flow of plating liquid is not disturbed, the opening part of a plating tank is completely covered and many parts are plated in a single plating process. <P>SOLUTION: The plating fixture 30 consists of an annular part 31 obtained by bending a wire rod such as wire and a handle part 32. Linear suspension members 33 are connected to the annular part 31, each suspension member 33 is fitted with five objects 11 to be plated, and the objects 11 to be plated are arranged closely to the inner circumferential face of a beaker 8. Without the plating fixture 30, only 10 pieces of the objects 11 to be plated can be arranged in the beaker 8 with the same size, however in this example, 20 pieces of the suspension members 33 are fitted, and about 100 pieces of the objects to 11 to be plated can be fitted thereto. The plating fixture is placed on the opening part of the beaker 8, a circular cover member 36 curved into the shape of a convex lens is placed so as to be convex downward, and the covering is securely performed to prevent the deterioration of the liquid. The circumferential flow of the plating liquid by a stirring means is not disturbed by the objects to be plated and the fixture arranged at the inner circumferential face, and the plating is uniform. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

【0001】
【発明の属する技術分野】
本発明は、被めっき物をめっき槽内に配置するために用いるめっき治具に係り、特にめっき槽内のめっき液の回転を妨害せず、多数の被めっき物を配置することができるめっき治具に関するものである。
【0002】
【従来の技術】
図8は、従来のめっき装置の断面図である。図9は前記めっき装置において使用されるめっき治具であり、被めっき物をめっき装置のめっき槽内に配置するための器具である。図10は従来のめっき装置の平面図であり、めっき槽内のめっき液の流れを示す図である。
【0003】
図8に示す従来のめっき装置は、比較的小型の部品を無電解めっき又は電解めっきするために用いる装置であり、基台を兼ねた回転駆動装置1を有している。回転駆動装置1のケーシング2の内部にはモータ等の駆動手段3によって回転する磁石4が設けられている。磁石4は略コ字形の永久磁石であり、ケーシング2の天板2aの下面中央に近接して配置されている。この回転駆動装置1のケーシング2の天板2aの上面中央には、ステンレス製の恒温槽5が配置されている。恒温槽5の内部には水が満たされ、その底部には加熱手段としてのヒータ6が配置されている。ヒータ6は制御手段7によって制御され、恒温槽5内の水は一定の温度を保持するようになっている。この恒温槽5の中央には、めっき槽としてのビーカー8が配置されている。ビーカー8の高さは恒温槽5の水面よりも高い。ビーカー8内にはめっき液9が収納され、その底の中央には棒状の永久磁石を樹脂で被覆した撹拌子10が載置されている。ビーカー8の中心には、複数の被めっき物11を取り付けためっき治具12が配置され、これによって被めっき物11はめっき液9内に浸漬されている。ビーカー8の開口部には、めっき治具12を挟むように2枚の板ガラス13,13が載置されてビーカー8の蓋を構成している。恒温槽5の水面には多数の樹脂製の浮き玉14が浮べられて恒温槽5の水(湯)の蒸発を防止している。
【0004】
図9に示すように、図8のめっき装置で使用するめっき治具12は、上端がフック部15とされた導電材料(例えば銅)からなる中心棒16と、中心棒16に複数対(本例では5対)が設けられた被めっき物11の取り付け部17からなる。各取り付け部17は中心棒16から直交して水平に延設された2本の細棒18,18からなり、この細棒18の先端はさらに水平面内で直角に曲折されている。
【0005】
この被めっき物11は、略正方形状であり、その一辺に沿って2個の取り付け孔11aが形成されている。
【0006】
そして、前述した2本の細棒18,18の各先端が、この被めっき物11に設けられた2個の取り付け孔11d,11dに挿入され、被めっき物11を固定している。図9又は図10に示すように、めっき治具12に取り付けられた状態の被めっき物11は、その表面が、中心棒16及び細棒18と平行になっている。この例では、1本のめっき治具12に10個の被めっき物11が取り付けられている。
【0007】
めっき治具12は、フック部15と細棒18の先端部を除いて耐めっき液9コーティングが施されており、無電解めっきと電解めっきの両方の用途に使用できるようになっている。電解めっきの場合は、フック部15を電極に掛けて細棒18の先端部の被めっき物11に通電されるように構成する。
【0008】
このめっき装置でめっきを行なう場合には、回転駆動装置1の駆動手段3を駆動して磁石4を回転する。図10に示すように、この磁石4の磁力によってビーカー8内の撹拌子10が連れ回りし、撹拌子10の回転に伴ってビーカー8内のめっき液9は図10中矢印Aで示す周方向に回転する。めっき液9は被めっき物11の表面に略垂直に衝突を繰り返し、被めっき物11の表面にめっき液9中の金属がめっきされていく。
【0009】
図8に示したような従来のめっき装置では、ビーカー8内に被めっき物11を配置するために前述した図9に示すような治具12を用いたが、これはこの種めっき治具の一例であって、例えば図11に示すような構造のめっきハンガー20(治具)も前記めっき装置において用いることができる。このめっきハンガー20は下記特許文献1に開示されたものであり、導電材料からなる細長い帯状の導電軸21には複数の金具24が取り付けられて導電軸21との間に複数の取り付け孔が形成されており、各取り付け孔には針金状のフック22が2本ずつX状に交差するように設けられている。このフック22の両端に被めっき物を取り付け、該ハンガー20をビーカー8中心に配置して上端の湾曲部25を要所に引っ掛け、被めっき物をめっき液9に配置し浸漬する。
【0010】
【特許文献1】
実開昭48−65816号公報
【0011】
【発明が解決しようとする課題】
前記従来のめっき装置によれば、次のような問題があった。
▲1▼めっき治具自体がめっき液の回転 (流れ)を妨害してしまうため、総ての被めっき物に均一にめっき液が当たらずめっきが部品ごとに均一にならないという問題があった。すなわち、図10に示すように、めっき液9の周方向の流れが被めっき物11の面に略垂直に衝突するのでめっき液9の勢いが減衰し、まためっき液9の回転の中心に配置されためっき治具12の中心棒16がめっき液9の流れを大きく妨害するとともに、中心棒16から張り出した多数の細棒18もめっき液9の流れの妨害となる。このため、撹拌子10が存在しめっき治具12がないビーカー8の底部ではめっき液9の周方向の速度は十分であるが、それより上のめっき治具12が存在する領域ではめっき液9の流速は不十分となってしまう。このため、めっき液9の流れが均一にならず、各所にうずが生じてしまう。そして、被めっき物11に対するめっき液9の当たり方が不均一になり、被めっき物11のめっきの厚さに許容できないばらつきが生じてしまうという問題が生じるのである。特に、この例では磁力で遠隔的に撹拌子10を回転駆動してめっき液9を撹拌しているが、この方法では、元々めっき液9に大きな流速を与えることが困難なので、上述した問題点はさらに解決が困難となる。
【0012】
▲2▼前記従来のめっき治具12は、ビーカー8の中心に上側から差し込まれる配置となっており、しかも該治具12の中心棒16が太いためにビーカー8の開口部に完全な蓋をすることができない。これによって、隙間からめっき液9が蒸発したり、液温が低下し、めっき条件が変動してしまうため、得られるめっきの特性に許容できないばらつきが生じてしまうという問題があった。特に、光カロリーメータ受光器の受光素子や光学シャッターなどに設ける黒体被膜をめっきで形成する場合等には、その被膜の形成にはめっき液9の温度、撹拌速度、めっき液9の組成等のめっき条件が大きく影響するので、上述した問題点はさらに重要と成る。
【0013】
▲3▼前記従来のめっき治具12は、中心棒16から張り出した細棒18の端部に被めっき物11を取り付ける構成なので、多くの被めっき物11を一度に取り付けることは困難であり、上述したように10個程度が限度であって、一回のめっき工程で多くの部品をめっきしたいという要望に応えることができなかった。
なお、以上説明した課題は、図11に示した特許文献1記載のめっき治具を用いた場合にも同様に生じるものであり、解決しなければならないものであることは言うまでもない。
【0014】
本発明は上記の課題を解決するためになされたものであって、めっき槽内のめっき液の周方向の流れを妨害することがなく、めっき槽の開口部に完全な蓋をすることができ、さらに一回のめっき工程で多くの部品をめっきできるめっき治具を提供することを目的としている。
【0015】
【課題を解決するための手段】
請求項1に記載されためっき方法は、円筒状のめっき槽8内にめっき液9を収納し、複数の被めっき物11を前記めっき液9に浸漬して前記めっき槽8の内周面に沿って配置し、前記めっき液9を前記めっき槽8の円周方向に回転させることを特徴としている。
【0016】
請求項2に記載されためっき治具30,40,50は、開口部8aを有しめっき液9を収納する円筒状のめっき槽8の内周面に沿って複数の被めっき物11を配置するためのめっき治具であって、
前記めっき槽8の円形の開口部8aに設置される環状部31,41,43と、前記環状部31,41,43から下方に延設され前記めっき槽8の内周面に沿って被めっき物11を配置する被めっき物配置手段33,51と、
を具備することを特徴としている。
【0017】
請求項3に記載されためっき治具30は、請求項2記載のめっき治具において、前記被めっき物配置手段が前記環状部31に着脱可能に取り付けられる吊り部材33であり、前記環状部31に取り付けられた該吊り部材33が周方向に移動しないようにするための係止構造34を前記環状部31に設けたことを特徴としている。
【0018】
請求項4に記載されためっき治具40は、請求項2記載のめっき治具において、前記環状部43が同一中心で配置された上環状部41及び下環状部42からなり、前記被めっき物配置手段が前記上環状部41に着脱可能に取り付けられる吊り部材33であり、前記上環状部41に着脱可能に取り付けられた前記吊り部材33が周方向に移動しないようにするための係止構造45,46を前記下環状部42に設けたことを特徴としている。
【0019】
請求項5に記載されためっき治具50は、請求項2記載のめっき治具において、前記被めっき物配置手段が前記環状部31に固設された棒状のアーム51であり、前記アーム51の下端には被めっき物11を保持する係止部52が水平方向に突設されていることを特徴としている。
【0020】
請求項6に記載されためっき治具30,40,50は、請求項2〜5に記載のめっき治具において、前記環状部31,41,43の直径を調節する直径調整手段32を備えたことを特徴としている。
【0021】
【発明の実施の形態】
本発明の実施の形態を説明する。本発明の実施の形態のめっき治具は、図8を参照して説明した従来のめっき装置において、従来のめっき治具に替えて使用されるものである。従って、回転駆動装置1、恒温槽5、撹拌子10等は従来の技術で説明したものをそのまま使用することができる。
【0022】
本発明の実施の形態のめっき治具30は、円筒形のめっき槽であるビーカー8の中心部にはめっき液9の回転を妨害する部分 (部材)がなく、ビーカー8の内周面に沿って多数の被めっき物11を配置できる点に特徴を有している。また、本発明の実施の形態のめっき治具30がビーカー8内に保持する被めっき物11は、従来の技術で例示したものと同じ形状であって黒体被膜をめっきで形成する光カロリーメータ受光器の受光素子や光学シャッターであるものとする。もちろん、これは一例にすぎず、本発明の対象を限定するものではないが、説明を具体的とするために例示したものである。
【0023】
本発明の実施の形態の第1の例を図1〜図3を参照して説明する。
図1に示すように、このめっき治具30は、可塑性を有する針金等の1本の線材からなるものであり、該線材を曲げて加工した環状部31と、線材の両端部を環状部31の外側に直線状に突出させて揃えた取手部32とからなる。
【0024】
取手部32の2本の両端部の間隔を調整することにより、環状部31の直径をある程度調整することができる。すなわち、2本の両端部32a,32aからなる取手部32は、取り扱う際に手で掴む部分となる他、環状部31の直径を調節する直径調整手段としての機能をも有する。
【0025】
環状部31には、被めっき物配置手段として線状の吊り部材33が着脱可能に結び付けられている。吊り部材33は下方に延設されてビーカー8の内周面に沿って被めっき物11を配置するための部材であり、例えば針金や銅線のようなある程度の剛性を有する長体である。軟らかい糸のような部材ではめっき液9の流れによって被めっき物11が揺れ動いてしまうので不適当である。
【0026】
本例では、環状部31には細線34が螺旋状に全周にわたって巻きつけてあり、環状部31に取り付けられた吊り部材33の環状部31に対する係止構造を構成しており、吊り部材33がめっき液9の流れに押されて環状部31に沿って周方向に移動してしまうのを防止している。
【0027】
図1に示すように、めっき槽としてのビーカー8は円形の開口部8aを有している。開口部8aは本体の円筒部分8bに比べてやや拡径している。本例のめっき治具30の環状部31は、この開口部8aよりも小さく、本体の円筒部分8bよりもやや大きい外径に調整されており、該開口部8a内に載置される。取手部32は、ビーカー8の注ぎ口8cに配置され、やや下方を向く。
【0028】
吊り部材33には、1本につき5個の被めっき物11が取り付けられる。本例の被めっき物11は従来の技術で説明したものと同一形状であり、図3に示すように取り付け部の2個の取り付け孔11dに吊り部材33を通すことにより、5個の被めっき物11を吊り部材33で串刺しにして並べている。環状部31から吊下げられた吊り部材33に設けられた被めっき物11は、ビーカー8の内周面に近接して配置される。ビーカー8内を回転するめっき液9に対する板状の被めっき物11の姿勢は、吊り部材33に取り付けた状態の被めっき物11を摘んで該吊り部材33を軽く捻ることで適宜設定することができる。本例では、詳細は図示しないが、めっき液9の流れに対して被めっき物11の表面が鈍角の迎え角となるようにしている。
【0029】
図1では図示上の煩雑さを回避するために1本の吊り部材33とこれに取り付けられた5個の被めっき物11だけを図示したが、従来と同一のサイズのビーカー8(内容量2リットル)について使用される本例のめっき治具30によれば、環状部31には少なくとも20本の吊り部材33を周方向について十分な間隔で取り付けられる。従って、従来はビーカー8の中程の位置に10個しか配置できなかった被めっき物11(円板部の直径16ミリ)が、本例では少なくとも100個もビーカー8の内周面に沿って配置することができることとなる。
【0030】
また、本例のめっき治具30は中央が空間として開いている環状部31を主体としているので、図2に示すように、本めっき治具30が設けられたビーカー8の開口部には凸レンズ状に湾曲した円形の蓋部材36(具体的には時計皿を使用する)を下方に向けて凸となるように載置することができ、これによってビーカー8からのめっき液9の蒸発やめっき液9の温度低下を防ぐことができる。すなわち、めっき液9から蒸発した水分は外に逃げることなく蓋部材36の内面 (下面)に付着して水となり、蓋部材36の下方に突出した下面中央に溜まって落下し、ビーカー8内のめっき液9に戻ることができる。めっき液9の濃度等が変化することはない。
【0031】
また、本例のめっき治具30の取手部32は、図2に示すように端部が下方に傾いているので、この取手部32に水が付着しても、この水が取手部32を伝ってビーカー8内のめっき液9に入り込むことはなく、外側に流れ落ちる。めっき液9の濃度・温度等が変化することはない。
【0032】
めっきを行なう場合には、回転駆動装置1の駆動手段3を駆動して磁石4を回転する。図1に示すように、この磁石4の磁力によってビーカー8内の撹拌子10が連れ回りし、撹拌子10の回転に伴ってビーカー8内のめっき液9は図1中矢印Bで示す周方向に回転する。めっき液9はビーカー8の内周面に沿って並んだ多数の被めっき物11の表面に接触し、被めっき物11の表面にめっき液9中の金属がめっきされていく。
【0033】
本例では、吊り部材33がめっき液9の流れに押されて環状部31に沿って周方向に移動するのを防止するため、吊り部材33の環状部31に対する係止構造として、環状部31に細線34を螺旋状に巻きつけた。しかし、かかる係止構造としては、環状部31を構成する針金自体を凹凸のある針金で構成する構造でもよいし、環状部31に適宜の間隔で吊り部材33の引っ掛かりとなる切り込みや凸部を設ける構造でもよい。さらに、環状部31に軟らかいチューブを被覆して蛇腹状にしてもよい。
【0034】
本発明の実施の形態の第2の例を図4及び図5を参照して説明する。
本例のめっき治具40は、同一中心で配置された上環状部41と下環状部42の2つの環状部43を有する。両環状部41,42は、周方向について等間隔に配置された4本の棒状の連結材44で上下に連結されている。下環状部42の外径は、ビーカー8の円筒部分8bの内径よりもやや小さい外径に調整されており、ビーカー8内に入る。上環状部41の外径は、ビーカー8の開口部8aの最大内径よりも小さく、本体の円筒部分8bの内径よりもやや大きい外径に調整されており、該開口部8a内に載置される。
【0035】
本例の被めっき物配置手段も、第1の例と同様に線状の吊り部材33であり、上環状部41に着脱可能に結び付けられる。吊り部材33は、めっき液9の流れに押されて上環状部41に沿って周方向に移動しないように、図4(a)に示すように、下環状部42に適宜間隔で設けられた保持孔45を挿通している。保持孔45の数は吊り部材33の数に対応する。本例では、20個とした。1本の吊り部材33に5個の被めっき物11を取り付ければ、全部で100個の被めっき物11をめっき処理することができる。これらの数は任意に設定できるが、いずれにしても、従来例に比べて大量の被めっき物11を一時に処理することができる。
【0036】
下環状部42に保持孔45を形成する代わりに、図4(b)に示すように下環状部42の内周面に波型に成形した保持用ワイヤー46を波の谷ごとに溶接し、下環状部42と保持用ワイヤー46の隙間に吊り部材33を挿通してもよい。
【0037】
図5は第2の例の変形例であるめっき治具40’の概略図である。本変形例では、環状部43の直径を調整できるように、上環状部41に第1の例と同様の取手部32を設け、これに連結された下環状部42は上環状部41の取手部32に対応する位置で環が途切れた間隙部47を有するC字形とした。かかる構成によれば、上環状部41の直径を取手部32の操作で調整すれば、これと連結材44で連結された下環状部42も同様の力を受けて間隙部47の寸法が変化して径が調整できる。
【0038】
本例によれば、被めっき物11の配置に第1の例と同様に線状の吊り部材33を用いているが、第1の例が吊り部材33の根元で環状部31に係止させているだけであるのに対し、本例では吊り部材33の根元を上環状部41に結びつけるとともに、吊り部材33の自由端側を下環状部42で保持しているので、吊り部材33がめっき液9の流れの勢いで移動しにくく、被めっき物11に対するめっき液9の接触状況が一定でより変化しにくいという利点がある。すなわち、吊り部材33の上環状部41に対する固定がより確実であり、めっき液9の流れによって吊り部材33が傾斜することがなく、被めっき物11に対するめっき液9の当たり方が均一に保たれ易いという効果がある。
【0039】
本発明の実施の形態の第3の例を図6及び図7を参照して説明する。
本例のめっき治具50は、取手部32を含めた環状部31の構成は第1の例と略同一であるが、被めっき物配置手段が、第1及び第2の例の吊り部材33のような針金や銅線ではなく、環状部31に固設された棒状のアーム51である点が相違する。このアーム51は、環状部31の面に対して垂直下方に延設されており、環状部31と同等の剛性を有する棒状の部材である。このアーム51の下端及び略中間位置には、被めっき物11を保持する2本の棒体からなる係止部52が水平方向に突設されている。係止部52に対して被めっき物11は面が垂直となるように取り付けられる。
【0040】
図7(a)に示すように、アーム51に対する水平面内での係止部52の突出方向を、めっき槽内でのめっき液9の流れ方向Bに関し、環状部31の接線に対する角度が鋭角となるように設定する。このようにすれば、係止部52の先端に取り付けられた被めっき物11の所望の面に対してめっき液9が鈍角で当たり、めっき液9の流れを妨害することなく、被めっき物11にめっき液9を十分に接触させることができる。
【0041】
また、図7(b)に示すように、アーム51に対する水平面内での係止部52の突出方向が、環状部31の接線に対して直角となるように設定する。このようにすれば、係止部52の先端に取り付けられた被めっき物11はめっき液9の流れに対して平行となり、めっき液9の流れを妨害することなく、被めっき物11にめっき液9を十分に接触させることができる。
【0042】
本例のめっき治具50によれば、環状部31とアーム51が一体で高い剛性を備えているので、アーム51に取り付けた多数の被めっき物11はビーカー8の内周面に近接した所定位置に確実に配置され、めっき液9の流れによっても移動することがなく、被めっき物11はめっき液9と所定の条件で適切に接触して確実に所期のめっき処理を施される。
【0043】
本例では図6に示すように10本のアーム51が設けられており、各アーム51に設けられた係止部52は2組ずつである。従って、この図示の例では20個の被めっき物11を一つのめっき槽の内周面に沿って配置し、一回でめっき処理できる。しかし、これらの数は任意であり、アーム51を20本とし、各アーム51の係止部を5組ずつとすれば、100個の被めっき物11を一つのめっき槽の内周面に沿って配置し、一回でめっき処理できる。いずれにしても、従来例に比べて大量の被めっき物11を一時に処理することができる。
【0044】
以上説明した本発明の各実施の形態では、めっき槽としてビーカーを例示したが、これは比較的小規模なめっき工程のために使用する場合の一例であって、これには限らず、円筒形であれば規模の大小・容積・高さ等の寸法を問わずめっき槽として好適に使用し得るものである。
但し、円筒形のめっき槽だけではなく、水平切断面で楕円形状を呈する筒体や、水平切断面で角にアールが施された(角が曲線状とされた)4角形以上の多角形状を呈する筒体に対しても、本発明のめっき治具を用いて相応の効果を得ることができる。
【0045】
また、以上説明した本発明の各実施の形態では、被めっき物として黒体被膜が形成される光学部品のように、無電解めっきを例示した。この場合には電気を使用しないので電気的な条件の影響が無く、専らめっき液の温度・組成等の条件がめっきの結果に大きな影響を及ぼす。従って、めっき槽の開口部を蓋部材で確実に閉止してめっき液の変質等を防止できる本発明が特に有利である。
【0046】
具体的には、黒体は、例えばニッケル・リン合金被膜を無電解めっきで形成し、これを酸化して得る。無電解めっき工程で被膜の表面に化学的に溶解し易い部分と溶解しにくい部分を均一に形成し、後の工程でこれを酸化すれば該表面には凹凸が均一に形成され、これによって表面全体の反射能が低くなり、黒体としての性能が得られる。従って、無電解めっき工程では表面での化学反応が一定でないと最終的に得られる黒体としての機能がばらついてしまう。このように、黒体被膜の形成における無電解めっきでは、めっき液の温度・組成等の条件がめっきの結果に大きな影響を及ぼすのである。
【0047】
しかし、めっき液の温度・組成等の条件がめっきの結果に相対的にさほど大きな影響を及ぼさないような電解めっき工程に対しても本発明が適用できることは言うまでもない。その場合にも、前記各例の場合と同様に、めっき槽内のめっき液の周方向の流れが円滑で一回のめっき工程で多くの部品をめっきできる効果が得られることはもちろんである。
【0048】
【発明の効果】
請求項1記載のめっき方法の発明によれば、めっき槽の内周面に沿って多数の被めっき物を配置するので、一回のめっき工程で多くの部品をめっきでき、めっき槽の円周方向に沿っためっき液の回転を被めっき物が妨害することがなく、めっき槽の開口部を完全に塞ぐ蓋を用いることができるのでめっき液の蒸発等を防止してめっき条件の均一性を保持することができるという効果がある。
【0049】
請求項2記載のめっき治具の発明によれば、環状部から下方に被めっき物配置手段を延設して被めっき物をめっき槽の内周面に沿って配置できるので、一回のめっき工程で多くの部品をめっきでき、めっき槽の円周方向に沿っためっき液の回転を被めっき物が妨害することがなく、めっき槽の開口部を完全に塞ぐ蓋を用いることができるのでめっき液の蒸発等を防止してめっき条件の均一性を保持することができるという効果がある。
【0050】
請求項3記載のめっき治具の発明によれば、長体状の被めっき物配置手段を環状部に係止構造を介して着脱可能に取り付けたので、吊り部材がめっき液の流れに押されて環状部に沿って周方向に移動してしまうのが防止され、被めっき物がめっき槽内の特定箇所に集まってしまうことがなく、多数の被めっき物に対して所定のめっき条件を維持した処理を安定して行なうことができる。
【0051】
請求項4記載のめっき治具の発明によれば、環状部を同一中心で配置した上環状部と下環状部で構成し、長体状の被めっき物配置手段を上環状部に取り付け、下環状部の係止構造で係止する構造なので、長体状の被めっき物配置手段を用いていても、その根元を上環状部に結びつけるとともに、自由端側を下環状部で保持できる。このため、長体状の被めっき物配置手段はめっき液の流れの勢いによっても移動乃至変形しにくく、被めっき物に対するめっき液の接触状況が一定でより変化しにくいという利点がある。
【0052】
請求項5記載のめっき治具の発明によれば、環状部に被めっき物配置手段として棒状のアームを固設した剛性の高いフレーム構造で被めっき物をめっき槽の内周面に沿って配置するので、アームに取り付けた多数の被めっき物はビーカー内周面に近接した所定位置に確実に配置されてめっき液の流れによっても移動することがなく、被めっき物はめっき液と所望の条件で適切に接触して確実に所期のめっき処理を施される。
【0053】
請求項6記載のめっき治具の発明によれば、請求項2〜5に記載のめっき治具において直径調整手段を設けたので、このめっき治具をセットするめっき槽の径に合わせて環状部の直径を調節することができ、安定した状態でめっき治具をめっき槽に取り付けることができる。
【図面の簡単な説明】
【図1】本発明の実施の形態の第1の例を示す斜視図である。
【図2】本発明の実施の形態の第1の例を示す縦断面図である。
【図3】本発明の実施の形態の第1の例における被めっき物配置手段に対する被めっき物11の取り付け状態を示す正面図である。
【図4】(a)は本発明の実施の形態の第2の例を示す斜視図、(b)は係止構造の変形例を示す部分拡大斜視図である。
【図5】本発明の実施の形態の第2の例の変形例を示す斜視図である。
【図6】本発明の実施の形態の第3の例を示す斜視図である。
【図7】(a)は本発明の実施の形態の第3の例における被めっき物配置手段と被めっき物11に対するめっき液の流れ方向の関係を示す平面図であり、(b)は同第3の例の変形例における被めっき物配置手段と被めっき物に対するめっき液の流れ方向の関係を示す平面図である。
【図8】従来のめっき装置の全体構成を示す縦断面図である。
【図9】従来のめっき装置において使用される被めっき物をめっき槽内に配置するためのめっき治具と該めっき治具に取り付けられた被めっき物を示す斜視図である。
【図10】従来のめっき装置におけるめっき槽の平面図であって、めっき治具に取り付けられた被めっき物とめっき液の流れとの関係を示す図である。
【図11】従来のめっき装置において用いることができる従来のめっきハンガー(治具)の正面図である。
【符号の説明】
8…めっき槽としてのビーカー、9…めっき液、11…被めっき物、
30…めっき治具、31…環状部、32…環状部の直径調節手段としての取手部、33…被めっき物配置手段としての長体である吊り部材、34…係止構造としての細線、
40…めっき治具、41…上環状部、42…下環状部、43…環状部、45…係止構造としての保持孔、46…係止構造としての保持用ワイヤー、
50…めっき治具、51…被めっき物配置手段としてのアーム、52…係止部。
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a plating jig used for arranging an object to be plated in a plating tank, and particularly to a plating jig capable of arranging a large number of objects to be plated without obstructing rotation of a plating solution in the plating tank. It is about tools.
[0002]
[Prior art]
FIG. 8 is a sectional view of a conventional plating apparatus. FIG. 9 shows a plating jig used in the plating apparatus, which is an instrument for placing an object to be plated in a plating tank of the plating apparatus. FIG. 10 is a plan view of a conventional plating apparatus, showing a flow of a plating solution in a plating tank.
[0003]
The conventional plating apparatus shown in FIG. 8 is an apparatus used for electroless plating or electrolytic plating of a relatively small component, and has a rotary drive device 1 also serving as a base. A magnet 4 that is rotated by a driving unit 3 such as a motor is provided inside a casing 2 of the rotary driving device 1. The magnet 4 is a substantially U-shaped permanent magnet, and is disposed near the center of the lower surface of the top plate 2 a of the casing 2. In the center of the upper surface of the top plate 2a of the casing 2 of the rotary drive device 1, a stainless steel thermostat 5 is arranged. The inside of the thermostat 5 is filled with water, and a heater 6 as a heating means is disposed at the bottom thereof. The heater 6 is controlled by the control means 7 so that the water in the thermostat 5 keeps a constant temperature. In the center of the constant temperature bath 5, a beaker 8 as a plating bath is arranged. The height of the beaker 8 is higher than the water surface of the thermostat 5. A plating solution 9 is stored in the beaker 8, and a stirrer 10 in which a rod-shaped permanent magnet is covered with a resin is placed in the center of the bottom. At the center of the beaker 8, a plating jig 12 to which a plurality of objects to be plated 11 are attached is arranged, whereby the objects to be plated 11 are immersed in the plating solution 9. In the opening of the beaker 8, two plate glasses 13, 13 are placed so as to sandwich the plating jig 12, thereby forming a lid of the beaker 8. A large number of resin floating balls 14 float on the water surface of the constant temperature bath 5 to prevent evaporation of water (hot water) in the constant temperature bath 5.
[0004]
As shown in FIG. 9, the plating jig 12 used in the plating apparatus of FIG. 8 includes a center rod 16 made of a conductive material (for example, copper) having a hook 15 at an upper end, and a plurality of pairs of (5 pairs in the example). Each mounting portion 17 is composed of two thin rods 18 extending horizontally from the center rod 16 at right angles, and the tips of the thin rods 18 are further bent at right angles in a horizontal plane.
[0005]
The object to be plated 11 has a substantially square shape, and two mounting holes 11a are formed along one side thereof.
[0006]
The tips of the two thin rods 18 are inserted into the two mounting holes 11d provided in the object 11 to fix the object 11 to be plated. As shown in FIG. 9 or FIG. 10, the surface of the object to be plated 11 attached to the plating jig 12 is parallel to the center rod 16 and the thin rod 18. In this example, ten plating objects 11 are attached to one plating jig 12.
[0007]
The plating jig 12 is coated with a plating-resistant solution 9 except for the hook portion 15 and the tip of the fine rod 18, and can be used for both electroless plating and electrolytic plating. In the case of the electrolytic plating, the hook portion 15 is hung on the electrode so that the object to be plated 11 at the tip of the thin rod 18 is energized.
[0008]
When plating is performed by this plating apparatus, the driving means 3 of the rotary driving device 1 is driven to rotate the magnet 4. As shown in FIG. 10, the magnetic force of the magnet 4 causes the stirrer 10 in the beaker 8 to rotate, and with the rotation of the stirrer 10, the plating solution 9 in the beaker 8 moves in the circumferential direction indicated by an arrow A in FIG. To rotate. The plating solution 9 repeatedly collides with the surface of the plating object 11 substantially perpendicularly, and the metal in the plating solution 9 is plated on the surface of the plating object 11.
[0009]
In the conventional plating apparatus as shown in FIG. 8, a jig 12 as shown in FIG. 9 described above was used for disposing the object to be plated 11 in the beaker 8, but this is a kind of plating jig of this kind. For example, a plating hanger 20 (jig) having a structure as shown in FIG. 11 can be used in the plating apparatus. The plating hanger 20 is disclosed in Patent Literature 1 below. A plurality of metal fittings 24 are attached to an elongated strip-shaped conductive shaft 21 made of a conductive material to form a plurality of mounting holes with the conductive shaft 21. In each of the mounting holes, two wire-shaped hooks 22 are provided so as to cross each other in an X-shape. An object to be plated is attached to both ends of the hook 22, the hanger 20 is arranged at the center of the beaker 8, the curved portion 25 at the upper end is hooked at a point, and the object to be plated is arranged and immersed in the plating solution 9.
[0010]
[Patent Document 1]
JP-A-48-65816
[0011]
[Problems to be solved by the invention]
The conventional plating apparatus has the following problems.
{Circle around (1)} Since the plating jig itself obstructs the rotation (flow) of the plating solution, there is a problem that the plating solution does not uniformly contact all the objects to be plated, and the plating is not uniform for each component. That is, as shown in FIG. 10, the flow of the plating solution 9 in the circumferential direction collides substantially perpendicularly with the surface of the plating object 11, so that the momentum of the plating solution 9 is attenuated, and the plating solution 9 is disposed at the center of rotation. The center rod 16 of the plating jig 12 greatly obstructs the flow of the plating solution 9, and the large number of thin rods 18 projecting from the center bar 16 also obstruct the flow of the plating solution 9. For this reason, the peripheral speed of the plating solution 9 is sufficient at the bottom of the beaker 8 where the stirrer 10 is present and the plating jig 12 is not provided, but the plating solution 9 is located above the region where the plating jig 12 exists. The flow rate of the air becomes insufficient. For this reason, the flow of the plating solution 9 is not uniform, and eddies are generated at various places. Then, the contact of the plating solution 9 with the plating object 11 becomes non-uniform, which causes a problem that an unacceptable variation occurs in the plating thickness of the plating object 11. In particular, in this example, the plating solution 9 is stirred by rotating the stirrer 10 remotely by magnetic force. However, in this method, it is originally difficult to give a large flow rate to the plating solution 9, and thus the above-described problem is caused. Is even more difficult to solve.
[0012]
{Circle around (2)} The conventional plating jig 12 is arranged to be inserted into the center of the beaker 8 from above, and since the center rod 16 of the jig 12 is thick, a complete lid is placed at the opening of the beaker 8. Can not do it. As a result, the plating solution 9 evaporates from the gap or the temperature of the plating solution drops, and the plating conditions fluctuate. Therefore, there is a problem that the characteristics of the obtained plating are unacceptably varied. In particular, when a black body film provided on a light receiving element of an optical calorimeter light receiver or an optical shutter is formed by plating, for example, the temperature of the plating solution 9, the stirring speed, the composition of the plating solution 9, etc. The above-mentioned problems become even more important because the plating conditions greatly affect the plating conditions.
[0013]
{Circle around (3)} Since the conventional plating jig 12 is configured to attach the plated objects 11 to the ends of the thin rods 18 protruding from the center rod 16, it is difficult to attach many plated objects 11 at once. As described above, the number is limited to about ten, and it has not been possible to meet a demand for plating many components in one plating step.
It should be noted that the above-described problem also arises similarly when the plating jig described in Patent Document 1 shown in FIG. 11 is used, and it is needless to say that the problem must be solved.
[0014]
The present invention has been made in order to solve the above-mentioned problem, and can completely cover an opening of a plating tank without obstructing a circumferential flow of a plating solution in a plating tank. It is another object of the present invention to provide a plating jig capable of plating many components in a single plating step.
[0015]
[Means for Solving the Problems]
The plating method according to claim 1 stores a plating solution 9 in a cylindrical plating tank 8, and immerses a plurality of objects to be plated 11 in the plating solution 9 to form an inner peripheral surface of the plating tank 8. And the plating solution 9 is rotated in the circumferential direction of the plating tank 8.
[0016]
In the plating jigs 30, 40, 50 according to the second aspect, a plurality of plated objects 11 are arranged along the inner peripheral surface of a cylindrical plating tank 8 having an opening 8 a and containing a plating solution 9. A plating jig for performing
Annular portions 31, 41, 43 installed in the circular openings 8 a of the plating tank 8, and plated portions extending downward from the annular portions 31, 41, 43 along the inner peripheral surface of the plating tank 8. Object to be plated arrangement means 33, 51 for arranging the object 11,
It is characterized by having.
[0017]
The plating jig 30 according to a third aspect is the plating jig according to the second aspect, wherein the object to be plated is a suspension member 33 that is detachably attached to the annular portion 31. A locking structure 34 is provided on the annular portion 31 to prevent the hanging member 33 attached to the annular member 31 from moving in the circumferential direction.
[0018]
According to a fourth aspect of the present invention, there is provided a plating jig according to the second aspect, wherein the annular portion includes an upper annular portion and a lower annular portion in which the annular portion is arranged at the same center. An arrangement means is a suspending member 33 detachably attached to the upper annular portion 41, and a locking structure for preventing the suspending member 33 detachably attached to the upper annular portion 41 from moving in the circumferential direction. 45 and 46 are provided on the lower annular portion 42.
[0019]
The plating jig 50 according to a fifth aspect is the plating jig according to the second aspect, wherein the object to be plated is a rod-shaped arm 51 fixed to the annular portion 31. At the lower end, a locking portion 52 for holding the object to be plated 11 is provided so as to protrude in the horizontal direction.
[0020]
The plating jigs 30, 40, and 50 according to claim 6 are the plating jigs according to claims 2 to 5, and further include a diameter adjusting unit 32 that adjusts the diameter of the annular portions 31, 41, and 43. It is characterized by:
[0021]
BEST MODE FOR CARRYING OUT THE INVENTION
An embodiment of the present invention will be described. The plating jig according to the embodiment of the present invention is used in the conventional plating apparatus described with reference to FIG. 8 in place of the conventional plating jig. Therefore, the rotary drive 1, the thermostat 5, the stirrer 10, and the like can be the same as those described in the related art.
[0022]
In the plating jig 30 according to the embodiment of the present invention, there is no portion (member) that obstructs rotation of the plating solution 9 in the center of the beaker 8, which is a cylindrical plating tank, and extends along the inner peripheral surface of the beaker 8. It is characterized in that a large number of objects to be plated 11 can be arranged. The object 11 to be plated held in the beaker 8 by the plating jig 30 according to the embodiment of the present invention has the same shape as that exemplified in the related art, and is an optical calorimeter that forms a black body film by plating. It is assumed to be a light receiving element of a light receiver or an optical shutter. Of course, this is only an example and does not limit the subject of the present invention, but is illustrated for the sake of specific description.
[0023]
A first example of an embodiment of the present invention will be described with reference to FIGS.
As shown in FIG. 1, the plating jig 30 is made of a single wire such as a wire having plasticity, and has an annular portion 31 formed by bending the wire and both ends of the wire are annular portions 31. And a handle portion 32 linearly protruding outwardly from the handle.
[0024]
By adjusting the distance between the two ends of the handle portion 32, the diameter of the annular portion 31 can be adjusted to some extent. That is, the handle portion 32 composed of the two end portions 32a serves as a portion to be gripped by hand when handling, and also has a function as a diameter adjusting means for adjusting the diameter of the annular portion 31.
[0025]
A linear suspending member 33 is detachably connected to the annular portion 31 as an object to be plated arrangement means. The suspending member 33 is a member extending downward and for arranging the plating object 11 along the inner peripheral surface of the beaker 8, and is a long body having a certain degree of rigidity such as a wire or a copper wire. A member such as a soft thread is not suitable because the object to be plated 11 fluctuates due to the flow of the plating solution 9.
[0026]
In this example, a thin wire 34 is spirally wound around the annular portion 31 over the entire circumference, and a locking structure for the annular portion 31 of the suspending member 33 attached to the annular portion 31 is configured. Is prevented from being moved in the circumferential direction along the annular portion 31 by being pushed by the flow of the plating solution 9.
[0027]
As shown in FIG. 1, a beaker 8 as a plating tank has a circular opening 8a. The opening 8a is slightly larger in diameter than the cylindrical portion 8b of the main body. The annular portion 31 of the plating jig 30 of this example is adjusted to have an outer diameter smaller than the opening 8a and slightly larger than the cylindrical portion 8b of the main body, and is placed in the opening 8a. The handle part 32 is arranged at the spout 8 c of the beaker 8 and faces slightly downward.
[0028]
Five objects to be plated 11 are attached to each of the suspension members 33. The object 11 to be plated in this example has the same shape as that described in the related art, and as shown in FIG. 3, five suspension members 33 are passed through the two mounting holes 11d of the mounting portion. The objects 11 are skewered by the hanging members 33 and arranged. The plated object 11 provided on the suspension member 33 suspended from the annular portion 31 is arranged close to the inner peripheral surface of the beaker 8. The attitude of the plate-shaped object to be plated 11 with respect to the plating solution 9 rotating in the beaker 8 can be appropriately set by picking the object to be plated 11 attached to the suspension member 33 and twisting the suspension member 33 lightly. it can. In this example, although not shown in detail, the surface of the object to be plated 11 has an obtuse angle of attack with respect to the flow of the plating solution 9.
[0029]
In FIG. 1, only one hanging member 33 and five plated objects 11 attached thereto are shown in order to avoid complication in the illustration, but a beaker 8 (with a capacity of 2 According to the plating jig 30 of the present example used for (liter), at least 20 suspension members 33 are attached to the annular portion 31 at a sufficient interval in the circumferential direction. Accordingly, in the present example, at least 100 plated objects 11 (disc diameter of 16 mm), which could be arranged only in the middle of the beaker 8 in the middle of the beaker 8, are arranged along the inner peripheral surface of the beaker 8. It can be arranged.
[0030]
Further, since the plating jig 30 of the present example mainly includes the annular portion 31 whose center is open as a space, as shown in FIG. 2, a convex lens is provided at the opening of the beaker 8 provided with the plating jig 30. The cover member 36 (specifically, a watch glass is used) can be placed so as to be convex downward, thereby evaporating the plating solution 9 from the beaker 8 and plating. The temperature of the liquid 9 can be prevented from lowering. That is, the moisture evaporated from the plating solution 9 adheres to the inner surface (lower surface) of the lid member 36 without escaping to the outside and becomes water, collects at the center of the lower surface protruding below the lid member 36, and falls, and falls inside the beaker 8. It is possible to return to the plating solution 9. The concentration of the plating solution 9 does not change.
[0031]
Further, since the handle 32 of the plating jig 30 of the present example has an end inclined downward as shown in FIG. 2, even if water adheres to the handle 32, the water causes the handle 32 to move. It does not penetrate into the plating solution 9 in the beaker 8 but flows down to the outside. The concentration and temperature of the plating solution 9 do not change.
[0032]
When plating is performed, the driving means 3 of the rotary driving device 1 is driven to rotate the magnet 4. As shown in FIG. 1, the magnetic force of the magnet 4 causes the stirrer 10 in the beaker 8 to rotate, and with the rotation of the stirrer 10, the plating solution 9 in the beaker 8 moves in the circumferential direction indicated by an arrow B in FIG. To rotate. The plating solution 9 comes into contact with the surfaces of a large number of the objects to be plated 11 arranged along the inner peripheral surface of the beaker 8, and the metal in the plating solution 9 is plated on the surfaces of the objects to be plated 11.
[0033]
In this example, in order to prevent the suspending member 33 from being moved by the flow of the plating solution 9 in the circumferential direction along the annular portion 31, the annular member 31 is used as a locking structure for the annular member 31 of the suspending member 33. A thin wire 34 was spirally wound. However, as such a locking structure, the wire itself forming the annular portion 31 may be configured by a wire having irregularities, or a notch or a convex portion which becomes a hook of the hanging member 33 at an appropriate interval may be formed in the annular portion 31. The structure provided may be sufficient. Further, the annular portion 31 may be covered with a soft tube to form a bellows shape.
[0034]
A second example of the embodiment of the present invention will be described with reference to FIGS.
The plating jig 40 of this example has two annular portions 43 of an upper annular portion 41 and a lower annular portion 42 arranged at the same center. The two annular portions 41 and 42 are vertically connected by four rod-shaped connecting members 44 arranged at equal intervals in the circumferential direction. The outer diameter of the lower annular portion 42 is adjusted to be slightly smaller than the inner diameter of the cylindrical portion 8b of the beaker 8, and enters the beaker 8. The outer diameter of the upper annular portion 41 is smaller than the maximum inner diameter of the opening 8a of the beaker 8, is adjusted to be slightly larger than the inner diameter of the cylindrical portion 8b of the main body, and is placed in the opening 8a. You.
[0035]
The object to be plated arrangement means of this example is also a linear suspension member 33 similarly to the first example, and is detachably connected to the upper annular portion 41. As shown in FIG. 4A, the suspending members 33 are provided at appropriate intervals on the lower annular portion 42 so as not to be pushed by the flow of the plating solution 9 and move in the circumferential direction along the upper annular portion 41. The holding hole 45 is inserted. The number of the holding holes 45 corresponds to the number of the hanging members 33. In this example, the number is set to 20. If five pieces 11 to be plated are attached to one suspension member 33, a total of 100 pieces 11 to be plated can be plated. These numbers can be set arbitrarily, but in any case, a larger number of objects to be plated 11 can be processed at one time as compared with the conventional example.
[0036]
Instead of forming the holding hole 45 in the lower annular portion 42, as shown in FIG. 4B, a holding wire 46 formed into a corrugated shape is welded to the inner peripheral surface of the lower annular portion 42 at every wave trough. The suspension member 33 may be inserted into a gap between the lower annular portion 42 and the holding wire 46.
[0037]
FIG. 5 is a schematic diagram of a plating jig 40 'which is a modification of the second example. In this modification, a handle portion 32 similar to that of the first example is provided on the upper annular portion 41 so that the diameter of the annular portion 43 can be adjusted, and the lower annular portion 42 connected thereto is a handle of the upper annular portion 41. At a position corresponding to the portion 32, a C-shape having a gap 47 in which the ring was interrupted was used. According to this configuration, if the diameter of the upper annular portion 41 is adjusted by the operation of the handle portion 32, the lower annular portion 42 connected to the upper annular portion 41 by the connecting member 44 receives the same force, and the dimension of the gap portion 47 changes. To adjust the diameter.
[0038]
According to the present example, the linear hanging member 33 is used for disposing the object to be plated 11 as in the first example, but the first example is such that the annular member 31 is locked at the base of the hanging member 33. In this example, the base of the suspension member 33 is tied to the upper annular portion 41, and the free end side of the suspension member 33 is held by the lower annular portion 42. There is an advantage that the plating solution 9 is hard to move due to the flow of the solution 9 and the contact state of the plating solution 9 with the plating object 11 is constant and more difficult to change. That is, the suspension member 33 is more reliably fixed to the upper annular portion 41, the suspension member 33 does not tilt due to the flow of the plating solution 9, and the plating solution 9 hits the plating object 11 uniformly. There is an effect that it is easy.
[0039]
A third example of the embodiment of the present invention will be described with reference to FIGS.
In the plating jig 50 of this example, the configuration of the annular portion 31 including the handle portion 32 is substantially the same as that of the first example, but the plating object arranging means is the suspension member 33 of the first and second examples. The difference is that a rod-shaped arm 51 fixed to the annular portion 31 is used instead of a wire or a copper wire as described above. The arm 51 extends vertically downward with respect to the surface of the annular portion 31 and is a rod-shaped member having the same rigidity as the annular portion 31. At a lower end and a substantially middle position of the arm 51, a locking portion 52 composed of two rods for holding the object to be plated 11 is horizontally projected. The object to be plated 11 is attached to the locking portion 52 such that the surface is perpendicular.
[0040]
As shown in FIG. 7A, the direction in which the locking portion 52 protrudes in the horizontal plane with respect to the arm 51 with respect to the flow direction B of the plating solution 9 in the plating bath is such that the angle with respect to the tangent of the annular portion 31 is an acute angle. Set to be. By doing so, the plating solution 9 hits the desired surface of the plating object 11 attached to the tip of the locking portion 52 at an obtuse angle, and does not obstruct the flow of the plating solution 9 without obstructing the flow of the plating solution 9. To the plating solution 9.
[0041]
Further, as shown in FIG. 7B, the projecting direction of the locking portion 52 in the horizontal plane with respect to the arm 51 is set so as to be perpendicular to the tangent to the annular portion 31. In this way, the plating object 11 attached to the tip of the locking portion 52 becomes parallel to the flow of the plating solution 9, and does not obstruct the flow of the plating solution 9, and 9 can be brought into sufficient contact.
[0042]
According to the plating jig 50 of the present example, since the annular portion 31 and the arm 51 are integrally provided with high rigidity, a large number of the plated objects 11 attached to the arm 51 are located close to the inner peripheral surface of the beaker 8. The plating object 9 is securely placed at the position, does not move even by the flow of the plating solution 9, and is appropriately brought into contact with the plating solution 9 under predetermined conditions, so that the intended plating treatment is reliably performed.
[0043]
In this example, as shown in FIG. 6, ten arms 51 are provided, and each arm 51 has two sets of locking portions 52. Accordingly, in the illustrated example, twenty plating objects 11 are arranged along the inner peripheral surface of one plating tank, and plating can be performed at one time. However, these numbers are arbitrary, and if the number of the arms 51 is 20 and the number of the locking portions of each arm 51 is 5, each 100 objects to be plated 11 are arranged along the inner peripheral surface of one plating tank. And can be plated at one time. In any case, a larger amount of the object to be plated 11 can be processed at one time than in the conventional example.
[0044]
In each embodiment of the present invention described above, a beaker is illustrated as a plating tank, but this is an example of a case where the plating tank is used for a relatively small-scale plating process, and is not limited thereto. If so, it can be suitably used as a plating tank regardless of the size, size, volume, height, etc. of the scale.
However, not only a cylindrical plating tank, but also a cylindrical body having an elliptical shape on a horizontal cut surface, or a polygonal shape of a quadrangle or more with rounded corners (curved corners) on a horizontal cut surface A corresponding effect can be obtained for the presenting cylinder by using the plating jig of the present invention.
[0045]
Further, in each of the embodiments of the present invention described above, electroless plating is exemplified as in the case of an optical component in which a black body film is formed as an object to be plated. In this case, since electricity is not used, there is no influence of the electric conditions, and the conditions such as the temperature and composition of the plating solution have a great influence on the plating result. Therefore, the present invention is particularly advantageous in that the opening of the plating tank can be securely closed with the lid member to prevent the deterioration of the plating solution.
[0046]
Specifically, the black body is obtained by, for example, forming a nickel-phosphorus alloy film by electroless plating and oxidizing the same. In the electroless plating process, a chemically easily dissolvable portion and a hardly dissolvable portion are uniformly formed on the surface of the coating, and when this is oxidized in a later process, the surface is uniformly formed with irregularities. The overall reflectivity is reduced, and the performance as a black body is obtained. Therefore, in the electroless plating step, the function as a finally obtained black body varies unless the chemical reaction on the surface is constant. As described above, in the electroless plating in the formation of the black body film, the conditions such as the temperature and composition of the plating solution have a great influence on the plating result.
[0047]
However, it goes without saying that the present invention can also be applied to an electrolytic plating process in which conditions such as the temperature and composition of the plating solution do not relatively significantly affect the results of plating. Also in this case, as in the above-described examples, it is needless to say that the flow of the plating solution in the plating tank in the circumferential direction is smooth, and the effect of plating many components in one plating step can be obtained.
[0048]
【The invention's effect】
According to the invention of the plating method according to the first aspect, since a large number of objects to be plated are arranged along the inner peripheral surface of the plating tank, many parts can be plated in one plating step, and the circumference of the plating tank is reduced. The plating object does not obstruct the rotation of the plating solution along the direction, and a lid that completely closes the opening of the plating tank can be used. There is an effect that it can be held.
[0049]
According to the invention of the plating jig according to the second aspect, the object to be plated is extended downward from the annular portion and the object to be plated can be arranged along the inner peripheral surface of the plating tank. Many parts can be plated in the process, and the plating object does not obstruct the rotation of the plating solution along the circumference of the plating tank, and a lid can be used to completely close the opening of the plating tank. There is an effect that the evaporation of the solution can be prevented and the uniformity of the plating conditions can be maintained.
[0050]
According to the invention of the plating jig according to the third aspect, since the elongated plating object arranging means is detachably attached to the annular portion via the locking structure, the suspension member is pushed by the flow of the plating solution. Prevents the plating object from moving in the circumferential direction along the annular part, and the plating object does not collect at a specific location in the plating tank, and the predetermined plating conditions are maintained for many plating objects Can be performed stably.
[0051]
According to the invention of the plating jig according to the fourth aspect, the annular portion is constituted by the upper annular portion and the lower annular portion arranged at the same center, and the elongated object to be plated is attached to the upper annular portion. Since the structure is such that the ring-shaped portion is locked by the locking structure, even if the elongated object-to-be-plated arrangement means is used, the base can be tied to the upper ring-shaped portion and the free end side can be held by the lower ring-shaped portion. For this reason, there is an advantage that the elongated object to be plated is hardly moved or deformed even by the force of the flow of the plating solution, and the contact state of the plating solution with the object to be plated is constant and more difficult to change.
[0052]
According to the invention of the plating jig according to the fifth aspect, the object to be plated is arranged along the inner peripheral surface of the plating tank in a highly rigid frame structure in which a rod-shaped arm is fixed to the annular portion as means for arranging the object to be plated. Therefore, a large number of objects to be plated attached to the arm are securely arranged at predetermined positions close to the inner peripheral surface of the beaker and do not move even by the flow of the plating solution. , And the desired plating treatment is reliably performed.
[0053]
According to the invention of the plating jig according to claim 6, since the diameter adjusting means is provided in the plating jig according to claims 2 to 5, the annular portion is adjusted according to the diameter of the plating tank in which the plating jig is set. Can be adjusted, and the plating jig can be attached to the plating tank in a stable state.
[Brief description of the drawings]
FIG. 1 is a perspective view showing a first example of an embodiment of the present invention.
FIG. 2 is a longitudinal sectional view showing a first example of an embodiment of the present invention.
FIG. 3 is a front view showing a state of attachment of the object to be plated 11 to the object to be plated arrangement means in the first example of the embodiment of the present invention.
FIG. 4A is a perspective view showing a second example of the embodiment of the present invention, and FIG. 4B is a partially enlarged perspective view showing a modification of the locking structure.
FIG. 5 is a perspective view showing a modification of the second example of the embodiment of the present invention.
FIG. 6 is a perspective view showing a third example of the embodiment of the present invention.
FIG. 7A is a plan view showing a relationship between a plating object locating means and a flow direction of a plating solution with respect to a plating object 11 in a third example of an embodiment of the present invention, and FIG. It is a top view which shows the relationship between the to-be-plated object arrangement | positioning means in the modification of 3rd Example, and the flow direction of the plating solution with respect to a to-be-plated object.
FIG. 8 is a longitudinal sectional view showing the entire configuration of a conventional plating apparatus.
FIG. 9 is a perspective view showing a plating jig for arranging a plating object used in a conventional plating apparatus in a plating tank and a plating object attached to the plating jig.
FIG. 10 is a plan view of a plating tank in a conventional plating apparatus, showing a relationship between an object to be plated attached to a plating jig and a flow of a plating solution.
FIG. 11 is a front view of a conventional plating hanger (jig) that can be used in a conventional plating apparatus.
[Explanation of symbols]
8: beaker as plating tank, 9: plating solution, 11: plating object,
Reference numeral 30 denotes a plating jig, 31 denotes an annular portion, 32 denotes a handle as a means for adjusting the diameter of the annular portion, 33 denotes a long hanging member as a means for arranging an object to be plated, 34 denotes a thin wire as a locking structure,
Reference numeral 40: plating jig, 41: upper annular portion, 42: lower annular portion, 43: annular portion, 45: holding hole as a locking structure, 46: holding wire as a locking structure,
Reference numeral 50 denotes a plating jig, 51 denotes an arm as means for arranging an object to be plated, and 52 denotes a locking portion.

Claims (6)

円筒状のめっき槽(8)内にめっき液(9)を収納し、複数の被めっき物(11)を前記めっき液に浸漬して前記めっき槽の内周面に沿って配置し、前記めっき液を前記めっき槽の円周方向に回転させることを特徴とするめっき方法。A plating solution (9) is accommodated in a cylindrical plating tank (8), and a plurality of objects to be plated (11) are immersed in the plating solution and arranged along the inner peripheral surface of the plating tank. A plating method, comprising rotating a solution in a circumferential direction of the plating tank. 開口部(8a)を有しめっき液を収納する円筒状のめっき槽(8)の内周面に沿って複数の被めっき物(11)を配置するためのめっき治具であって、
前記めっき槽の円形の開口部(8a)に設置される環状部(31,41,43)と、
前記環状部から下方に延設され前記めっき槽の内周面に沿って前記被めっき物を配置する被めっき物配置手段(33,51)と、
を具備することを特徴とするめっき治具(30,40,50)。
A plating jig for arranging a plurality of objects to be plated (11) along an inner peripheral surface of a cylindrical plating tank (8) having an opening (8a) and containing a plating solution,
An annular portion (31, 41, 43) installed in a circular opening (8a) of the plating tank;
A plating object disposing means (33, 51) extending downward from the annular portion and disposing the plating object along an inner peripheral surface of the plating tank;
A plating jig (30, 40, 50) comprising:
前記被めっき物配置手段が前記環状部(31)に着脱可能に取り付けられる吊り部材(33)であり、前記環状部に取り付けられた該吊り部材が周方向に移動しないようにするための係止構造(34)を前記環状部に設けたことを特徴とする請求項2記載のめっき治具(30)。The object-to-be-plated means is a suspending member (33) detachably attached to the annular portion (31), and locking for preventing the suspending member attached to the annular portion from moving in the circumferential direction. The plating jig (30) according to claim 2, wherein a structure (34) is provided on the annular portion. 前記環状部(43)が同一中心で配置された上環状部(41)及び下環状部(42)からなり、前記被めっき物配置手段が前記上環状部に着脱可能に取り付けられる吊り部材(33)であり、前記上環状部に着脱可能に取り付けられた前記吊り部材が周方向に移動しないようにするための係止構造(45,46)を前記下環状部に設けたことを特徴とする請求項2記載のめっき治具(40)。The annular member (43) comprises an upper annular portion (41) and a lower annular portion (42) arranged at the same center, and the hanging member (33) to which the object to be plated is detachably attached to the upper annular portion. ), Wherein a locking structure (45, 46) is provided on the lower annular portion to prevent the hanging member detachably attached to the upper annular portion from moving in the circumferential direction. The plating jig (40) according to claim 2. 前記被めっき物配置手段が前記環状部(31)に固設された棒状のアーム(51)であり、前記アームの下端には前記被めっき物(11)を保持する係止部(52)が水平方向に突設されていることを特徴とする請求項2記載のめっき治具(50)。The plating object arranging means is a rod-shaped arm (51) fixed to the annular portion (31), and a locking portion (52) for holding the plating object (11) is provided at a lower end of the arm. The plating jig (50) according to claim 2, wherein the plating jig (30) is provided so as to protrude in a horizontal direction. 前記環状部(31,41,43)の直径を調節する直径調整手段を備えた請求項2〜5に記載のめっき治具(30,40,50)。The plating jig (30, 40, 50) according to any one of claims 2 to 5, further comprising a diameter adjusting means for adjusting a diameter of the annular portion (31, 41, 43).
JP2003125259A 2003-04-30 2003-04-30 Plating method, plating jig and plating apparatus Expired - Fee Related JP3974074B2 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106978616A (en) * 2017-03-23 2017-07-25 无锡市明骥智能机械有限公司 The rotary rack electroplated suitable for annular workpiece
CN115976613A (en) * 2023-03-17 2023-04-18 江苏润硕管业有限公司 Pipe fitting electroplating device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106978616A (en) * 2017-03-23 2017-07-25 无锡市明骥智能机械有限公司 The rotary rack electroplated suitable for annular workpiece
CN115976613A (en) * 2023-03-17 2023-04-18 江苏润硕管业有限公司 Pipe fitting electroplating device

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