JP2004227879A5 - - Google Patents
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- Publication number
- JP2004227879A5 JP2004227879A5 JP2003013127A JP2003013127A JP2004227879A5 JP 2004227879 A5 JP2004227879 A5 JP 2004227879A5 JP 2003013127 A JP2003013127 A JP 2003013127A JP 2003013127 A JP2003013127 A JP 2003013127A JP 2004227879 A5 JP2004227879 A5 JP 2004227879A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003013127A JP2004227879A (ja) | 2003-01-22 | 2003-01-22 | パターン検査方法及びパターン検査装置 |
US10/620,702 US6952105B2 (en) | 2003-01-22 | 2003-07-17 | Inspection method and apparatus for circuit pattern of resist material |
US11/218,762 US7218126B2 (en) | 2003-01-22 | 2005-09-06 | Inspection method and apparatus for circuit pattern |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003013127A JP2004227879A (ja) | 2003-01-22 | 2003-01-22 | パターン検査方法及びパターン検査装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004227879A JP2004227879A (ja) | 2004-08-12 |
JP2004227879A5 true JP2004227879A5 (US07576130-20090818-C00114.png) | 2006-01-05 |
Family
ID=32901538
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003013127A Pending JP2004227879A (ja) | 2003-01-22 | 2003-01-22 | パターン検査方法及びパターン検査装置 |
Country Status (2)
Country | Link |
---|---|
US (2) | US6952105B2 (US07576130-20090818-C00114.png) |
JP (1) | JP2004227879A (US07576130-20090818-C00114.png) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IL156419A0 (en) * | 2001-08-29 | 2004-01-04 | Hitachi Ltd | Sample dimension measuring method and scanning electron microscope |
JP4842533B2 (ja) * | 2004-10-27 | 2011-12-21 | 株式会社日立ハイテクノロジーズ | 不良検査装置 |
JP2007012516A (ja) * | 2005-07-01 | 2007-01-18 | Jeol Ltd | 荷電粒子ビーム装置及び荷電粒子ビームを用いた試料情報検出方法 |
WO2007021162A1 (en) * | 2005-08-18 | 2007-02-22 | Cebt Co. Ltd. | Method for changing energy of electron beam in electron column |
JP5164317B2 (ja) * | 2005-08-19 | 2013-03-21 | 株式会社日立ハイテクノロジーズ | 電子線による検査・計測方法および検査・計測装置 |
JP2007212288A (ja) * | 2006-02-09 | 2007-08-23 | Toshiba Corp | パターン検査方法、パターン検査装置およびプログラム |
JP2007265931A (ja) * | 2006-03-30 | 2007-10-11 | Hitachi High-Technologies Corp | 検査装置及び検査方法 |
US7791022B2 (en) * | 2007-03-13 | 2010-09-07 | Advantest Corp. | Scanning electron microscope with length measurement function and dimension length measurement method |
US11631602B2 (en) * | 2020-06-26 | 2023-04-18 | Kla Corporation | Enabling scanning electron microscope imaging while preventing sample damage on sensitive layers used in semiconductor manufacturing processes |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5330865A (en) * | 1976-09-03 | 1978-03-23 | Hitachi Ltd | Electron microscope provided with sample irradiating electron beam quantity measuring unit |
JPH09320505A (ja) * | 1996-03-29 | 1997-12-12 | Hitachi Ltd | 電子線式検査方法及びその装置並びに半導体の製造方法及びその製造ライン |
US5798529A (en) * | 1996-05-28 | 1998-08-25 | International Business Machines Corporation | Focused ion beam metrology |
US6184526B1 (en) * | 1997-01-08 | 2001-02-06 | Nikon Corporation | Apparatus and method for inspecting predetermined region on surface of specimen using electron beam |
JP3665194B2 (ja) | 1997-11-27 | 2005-06-29 | 株式会社日立製作所 | 回路パターンの検査方法及び検査装置 |
JP4093662B2 (ja) | 1999-01-04 | 2008-06-04 | 株式会社日立製作所 | 走査形電子顕微鏡 |
JP4163344B2 (ja) * | 1999-03-05 | 2008-10-08 | 株式会社東芝 | 基板検査方法および基板検査システム |
JP2001174977A (ja) * | 1999-12-20 | 2001-06-29 | Nec Corp | 露光パターン及び露光原版の検査方法 |
JP2002014062A (ja) | 2000-06-30 | 2002-01-18 | Hitachi Ltd | パターン検査方法およびその装置 |
DE10057139A1 (de) | 2000-11-17 | 2002-05-23 | Hilti Ag | Elektrohandwerkzeug mit Sicherheitskupplung |
TW573227B (en) * | 2001-02-19 | 2004-01-21 | Sumitomo Chemical Co | Chemical amplifying type positive resist compositions |
IL156419A0 (en) * | 2001-08-29 | 2004-01-04 | Hitachi Ltd | Sample dimension measuring method and scanning electron microscope |
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2003
- 2003-01-22 JP JP2003013127A patent/JP2004227879A/ja active Pending
- 2003-07-17 US US10/620,702 patent/US6952105B2/en not_active Expired - Fee Related
-
2005
- 2005-09-06 US US11/218,762 patent/US7218126B2/en not_active Expired - Fee Related