JP2004209399A - Apparatus for removing dissimilar substance in gas - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an apparatus for removing dissimilar substances in a gas, the performance of which is made high and the energy consumption and installation space of which are saved by improving the removal efficiency and the chemical reactivity and the maintenance, pressure loss and operation management of which are made unnecessary, low and easy respectively by preventing the attachment/growth of a solid. <P>SOLUTION: This apparatus is provided with a scrubbing column having a built-in static mixer the longitudinal direction of which is arranged substantially vertically and which is used for mixing liquid with the gas and transferring the dissimilar substances in the gas to the liquid, a supplying means for supplying the gas and the liquid separately in parallel from the upper part of the static mixer and another supplying means for supplying the second gas to the upper part of the scrubbing column from a gas supplying part. <P>COPYRIGHT: (C)2004,JPO&NCIPI

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a harmful gas such as HCL, CL ₂ , HF, NO _x , SO _x , NH ₃ , a semiconductor manufacturing gas such as SiCL ₄ , SiF ₄ , SiH ₂ CL ₂ and SiO ₂ , ZnO, SiN. A device for removing foreign substances in a gas that removes foreign substances by collecting, dissolving, or chemically reacting on the liquid side by gas-liquid contact between a gas and a liquid containing foreign substances such as fine dust, etc. In particular, a heterogeneous substance consisting of fine solid particles such as incinerated ash, unburned carbon, silicon dioxide, zinc oxide, aluminum oxide, silicon nitride, etc. in a gas and a liquid are brought into gas-liquid mixing contact with the heterogeneous substance in the gas, Purification or purification or recovery of foreign substances by collecting and removing gas on the liquid side, or dissolving and collecting foreign substances such as SiCL ₄ and SiF ₄ in the gas by hydrolysis reaction on the liquid side The present invention also relates to an apparatus for removing foreign substances in a gas that can be used for cleaning a gas. Further, the present invention relates to an apparatus for removing foreign substances such as SiCL ₄ , SiF ₄ , SiH ₂ CL ₂ , SiHCL ₃ , and B ₂ H ₆ contained in a raw gas by a hydrolysis reaction. The hydrolysis reaction of these gases is as follows.
SiCL ₄ + 3H ₂ O → H ₂ SiO ₃ + 4HCl
SiCL ₄ + 2H ₂ O → SiO ₂ + 4HCl
SiF ₄ + 3H ₂ O → H ₂ SiO ₃ + 4HF
SiF ₄ + 2H ₂ O → SiO ₂ + 4HF
B ₂ H ₆ + 6H ₂ O → 2H ₃ BO ₃ + 6H ₂
By these reactions, solids such as SiO ₂ , H ₂ SiO ₃ , H ₃ BO _{3 and the} like, HCL, HF and the like are generated.
[0002]
[Prior art]
Conventionally, as a device for removing foreign substances in a gas, a removal device of a packed tower type, a spray type, a venturi scrubber type and the like are known.
[0003]
[Problems to be solved by the invention]
However, in the packed tower type device, the removal efficiency of fine solid particles of 1 μ or less is low, and in the case of a gas containing water, an increase in pressure loss or clogging due to adhesion and growth of solid particles occurs inside the device. . Therefore, maintenance management costs are required. In the case of treating a gas containing SiCL ₄ , SiF _4, or the like, a solid substance is generated by a hydrolysis reaction to cause clogging, which is inappropriate for use.
[0004]
Further, in the case of the spray type, the superficial velocity of the gas in the spray tower is 0.5 to 1 m / sec. For this reason, the tower diameter increases, drift tends to occur, and the removal efficiency is low. In particular, unreacted products such as SiCL ₄ and SiF _{4 in} the hydrolysis reaction tend to be generated. Further, there is a disadvantage that the spray nozzle is easily clogged. Furthermore, there is a risk of hydrogen explosion due to unreacted products.
[0005]
Furthermore, in the case of the Venturi rubber type, the pressure loss is extremely high at 3 to 10 kPaG, and the power cost is high. Further, since the contact time between the gas and the liquid is short, unreacted products are generated, which causes a hydrogen explosion and air pollution.
[0006]
On the other hand, to date, the present inventor has proposed, as a processing apparatus using a static mixer, a device for removing foreign substances in a gas (Japanese Patent Laid-Open No. 182014/1988), a mass transfer device, and a method for manufacturing the same (Japanese Patent Application Laid-Open No. HEI 5 (1993) -1993). 168882), a mixing element and a method for producing the same (Japanese Patent Application Laid-Open No. 7-284842), a wet type flue gas degassing device (Japanese Patent Application Laid-Open No. 2001-187313), and the like.
[0007]
However, these disclosed techniques have problems such as a problem of removal efficiency and clogging caused by solid adhesion and growth in a gas supply part.
[0008]
SUMMARY OF THE INVENTION The present invention has been made in view of the above-described problems, and provides high performance, energy saving, space saving, low pressure loss, and maintenance by preventing adhesion and growth of solids by improving removal efficiency and chemical reaction. It is an object of the present invention to provide an apparatus for removing foreign substances in a gas, which can reduce management and facilitate operation management.
[0009]
[Means for Solving the Problems]
The apparatus for removing foreign substances in a gas according to the present invention includes a static mixer that mixes a liquid and a gas, which are arranged with their longitudinal directions substantially vertical, and moves the foreign substances in the gas into the liquid. An internal washing tower, supply means for separately supplying gas and liquid in parallel from the upper part of the stationary mixer, and supplying a second gas from the gas supply part to the upper part of the washing tower Supply means, wherein the second gas is nitrogen, helium, or dry air.
[0010]
In the present invention, the gas and the liquid containing the foreign substance descend in the stationary mixer in cocurrent, and the foreign substance contained in the gas is collected or dissolved on the liquid side, and the foreign substance is separated from the gas. Can be removed. For this reason, it is possible to discharge, purify, and recover the cleaned gas and the liquid containing a different substance, respectively.
[0011]
Further, unlike the conventional method, in the present invention, the second gas such as nitrogen or dry air is supplied to the outer periphery of the supply section of the gas (raw gas) containing the foreign substance to remove the foreign substance. The efficiency can be improved and the performance of the device can be improved. Further, it is possible to prevent the solid matter from growing at the outlet of the raw gas supply unit, thereby reducing the maintenance management cost.
[0012]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, an apparatus for removing foreign substances in a gas according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a schematic view showing an apparatus for removing foreign substances in a gas according to a first embodiment of the present invention, and FIG. 2A is a cross-sectional view showing a mixing element of a static mixer used in the present embodiment. (B) is a perspective view thereof.
[0013]
As shown in FIGS. 2A and 2B, the mixing element 2 of the static mixer 1 used in the present embodiment has a cylindrical outer tube 3 (passage tube) and an inner tube 3. , And an inner tube 6 intermittently provided to dispose the blade 4 in the outer tube 3. The blade 4 is, for example, It consists of a perforated plate. The inner tube 6 is provided to increase the mechanical strength against the torsional stress of the blade 4.
[0014]
That is, the inner tube 6 is provided only for a necessary length at the connection portion of the blade 4 and is not disposed at any other portion. One end of the blade 4 is connected to the outer peripheral surface of the inner tube 6, and the blade 4 is twisted clockwise (to the right) toward the inner surface of the outer tube 3, and the other end is connected to the inner surface of the outer tube 3. It is connected. Since the center portion of the inner tube 6 is open, the blades 4 do not exist at the axial center of the outer tube 3 and this portion is missing. Thereby, as shown in FIG. 2A and FIG. 2B, an opening 7 where no blade exists at the axial center of the inner cylindrical tube 6 is formed. Similarly, a plurality of blades 4 are connected to the outer peripheral surface of the inner cylindrical tube 6 by right-hand twist, and a fluid passage is formed. The stationary mixer 1 is assembled by arranging the mixing elements 2 continuously in one or more stages in the longitudinal direction. A spacer (not shown) or a space where no spacer is arranged may be interposed between the mixing elements 2.
[0015]
While two kinds of fluids (liquid and gas) flowing in the same direction in the fluid passage of the stationary mixer 1 flow, a part of the fluid rotates helically along the blades 4 and turns rightward. A swirling flow occurs, a part of which passes through the hole 5 of the blade 4, a part of which is sheared by the blade 4, merges with the fluid passing through the hole 5, and is further divided. In this manner, rotation, passage, shearing, merging, or division are repeated, and two types of fluids flowing in the same direction in parallel flow are mixed and contacted. Further, since the blades 4 are formed of a perforated plate, the fluid passes through the holes 5, the flow in the same direction in the outer tube 3 is rectified, and comes into mixed contact with the fluid moving by the swirling flow. The fluid is uniformly dispersed throughout the mixing element 2. For this reason, the gas-liquid contact efficiency is increased, dead space is eliminated, adhesion and growth of solid particles are prevented, and maintenance and inspection are not required. Note that the blades 4 of the static mixer 1 of the present invention are not limited to right-handed twists, but may be left-handed twists.
[0016]
Further, when the aperture ratio of the perforated plate used for the blade 4 is 5 to 60%, easiness in manufacturing and processing can be achieved, production cost can be reduced, mechanical strength of the blade, gas-liquid contact efficiency. And the prevention of adhesion and growth of solid particles. Therefore, the aperture ratio of the perforated plate is preferably 5 to 60%. The aperture ratio of the perforated plate is more preferably 10 to 40%.
[0017]
Further, when the diameter of the hole 5 of the perforated plate used for the blade 4 is 5 to 30 mm, the manufacturing process is easy, the production cost can be reduced, the superiority of gas-liquid contact efficiency and the solid matter Adhesion growth can be prevented. For this reason, it is preferable that the hole 5 diameter of the perforated plate is 5 to 30 mm.
[0018]
The configuration of the mixing element 2 of the present invention is not particularly limited, and the following mixing element structure can be used. 3 and 4 are perspective views of a right-handed and left-handed 90 ° rotation type mixing element, and FIG. 5 is a side sectional view of a stationary mixer 1a using this mixing element. As shown in FIGS. 3 to 5, the mixing elements 8 and 15 are respectively provided with cylindrical passage tubes 9 and 16 and spiral blades 10, 11 and 17 provided in the passage tubes 9 and 16, respectively. 18. Fluid passages 12, 13 and fluid passages 19, 20 are formed by the blades 10, 11, 17 and 18, respectively. The blades 10, 11 and 17, 18 do not depend on the axial portions of the passage pipes 9, 16, and this portion is missing. As a result, openings 14, 21 in which the blades 10, 11, 17, 18 do not exist are formed in the axial centers of the passage tubes 9, 16 in plan view. Therefore, the fluid passages 12 and 13 and the fluid passages 19 and 20 communicate with each other through the openings 14 and 21 over the entire length of the passage pipes 9 and 16.
[0019]
When such mixing elements 8 and 15 are alternately fitted into the cylindrical casing 22 and the edges of the blades 10, 11 and 17 and 18 of the mixing elements 8 and 15 are arranged perpendicular to each other, a static mixer is provided. 1a is assembled.
[0020]
As shown in FIG. 5, while the liquid FA and the gas FB respectively flow in the same direction in the fluid passage of the static mixer 1a, a part of the liquid is helically rotated by 90 ° and a part thereof is opened. And then merges with the liquid flowing through the other fluid passage, is further divided, and then spirally rotates 90 ° in the opposite direction. Thus, rotation, shearing, merging, and division are repeated. Similarly, rotation, shearing, merging, and division are repeated for a gas. Thereby, the liquid and the gas flowing in the same direction are stirred, and the gas-liquid contact is performed. In addition, instead of using a 90 ° rotating blade, a 180 ° rotating blade may be used as the stationary mixer 1a. In addition, any of the blades can be formed of a perforated plate. Furthermore, a spacer (not shown) having the same inner diameter as the mixing elements 9 and 16 or a space where no spacer is disposed is arranged between the mixing elements 9 and 16 to assemble the stationary mixer 1a. Good.
[0021]
Still further, the rotation angle of the blade body is not limited to the one described above, and the stationary mixer may be a 15 °, 30 °, 45 °, 60 °, 135 °, 270 ° or 360 ° rotating type blade body. 1a may be configured. Note that the static mixer is not limited to the above-described mixing element, and various static mixers can be appropriately used.
[0022]
Next, examples of the apparatus for removing foreign substances in a gas according to the present invention will be described.
[0023]
FIG. 1 shows a case where the present invention is applied to an apparatus for removing foreign substances in a raw gas containing harmful gases such as HCL, CL ₂ , HF, NH ₃ and H ₂ S and dusts such as SiO ₂ and ZnO. It is a schematic diagram which shows Example 1. The raw gas is supplied into a washing tower 23 in which the static mixer 1 is disposed, together with a nitrogen gas as a second gas from a gas supply unit 24 disposed on the upper part thereof, and the HCL, Dissimilar substances such as CL ₂ and SiO ₂ are moved from the gas side to the liquid side by mixed contact of gas and liquid. The removing device 25 is connected to a tank 26 disposed below the removing device 25. In the tank 26, gas and liquid are separated. The purified raw gas is released or collected into the atmosphere via an exhaust fan 27. The aqueous solution in the tank 26 is discharged to a wastewater treatment step or the like by opening a valve 28 as appropriate, and a new liquid is supplied to the tank 26 as appropriate. In the washing tower 23, a spray nozzle 29 is disposed above the static mixer 1, and the liquid in the tank 26 is supplied to the nozzle 29 by the pump 30. Therefore, this liquid is injected into the washing tower 23 by the nozzle 29, then collected in the tank 26, and then supplied to the nozzle 29 by the pump 30 for circulation. As the liquid, water or an aqueous solution such as an acidic or alkaline solution is appropriately selected and used depending on different substances in the raw gas.
[0024]
In the apparatus 25 for removing foreign substances in a gas according to the present embodiment, the above-described static mixer 1 is arranged in a cylindrical washing tower 23 with its longitudinal direction being vertical, as shown in FIG. In this case, the upper end and the lower end of the washing tower 23 have, for example, a circular cross section. A first supply unit for supplying a gas containing a different substance into the static mixer 1 is disposed above the washing tower 23, and a second supply unit for supplying a gas such as nitrogen or dry air to the outer periphery of the supply unit. Are provided. In addition, a third supply unit that supplies a liquid used for removing or recovering foreign substances into the static mixer 1 is disposed above the washing tower 23.
[0025]
Next, the operation of the apparatus 25 for removing foreign substances in a gas shown in FIG. 1 will be described. First, a gas (raw gas) containing a heterogeneous substance to be removed and a nitrogen gas for preventing adhesion are supplied to the upper portion of the static mixer 1 in parallel at a predetermined ratio by first and second supply means. . Further, a liquid used for removing the foreign substance is supplied from above the stationary mixer 1 by the third supply means. The raw gas, the nitrogen gas and the liquid descend in the static mixer 1 so that the gas and the liquid are mixed and the gas is in sufficient contact. Then, in the static mixer 1, gas-liquid contact dissolves foreign substances in the gas, collects fine dust in the liquid, or allows the chemical reaction to proceed, and causes The gas is washed or purified by transferring the foreign substance to the gas.
[0026]
In this embodiment, it is possible to continuously remove a gas (raw gas) containing a heterogeneous substance such as fine solid particles such as silicon dioxide, aluminum oxide, and zinc oxide in the gas. For example, a gas (raw gas) containing fine solid particles is supplied into the static mixer 1 from the upper end side, and at the same time, a nitrogen gas is supplied from the outer circumference of the raw gas supply / discharge port. Is supplied from the upper end side into the static mixer 1 through the spray nozzle, and the cleaning liquid and the raw gas are lowered in the static mixer 1 so as to have a flow rate of 0.1 to 8 m / sec. The different substances in the raw gas and the cleaning liquid are continuously mixed and brought into contact with each other in a co-current manner to remove the different substances from the raw gas to purify the raw gas, and the exhaust gas is exhausted or recovered as a processing gas from an exhaust line. Further, the cleaning liquid containing the foreign substance is discharged and stored in a tank arranged below the static mixer. The stored cleaning liquid is used in circulation. The supply of a new liquid to the tank and the discharge of the stored liquid from the tank are performed as appropriate. The range of the descending speed of the raw gas can be appropriately selected depending on the liquid-gas ratio.
[0027]
Conventionally, there has been a problem that maintenance and management costs are required due to the adhesion growth (scaling) of the solid matter in the apparatus, but in this embodiment, the outlet of the raw gas supply unit is a film made of nitrogen gas. The formation of a nitrogen-like curtain cuts off moisture such as moisture, thereby preventing powder adhesion and the generation of unreacted products. Since there is no scaling due to solid matter, maintenance and management costs are not required, and maintenance and maintenance are not required. In addition, the spray direction of the spray nozzle can be appropriately selected and used either upward or downward.
[0028]
Next, an embodiment of the washing tower according to the present invention will be described in detail with reference to FIG. As shown in FIGS. 3 and 4, a stationary mixer 1 having mixing elements 8 and 15 disposed therein is disposed in the cylindrical cleaning tower 35, and a cleaning liquid is provided above the stationary mixer 1. A spray nozzle 31 for injecting and supplying (circulating liquid) is provided. In addition, a gas supply unit 32 that supplies a raw gas and a second gas, that is, a nitrogen gas, is provided above the washing tower 23. The gas supply section 32 has a raw gas supply pipe 33 at the center and a nitrogen gas supply pipe 34 around the raw gas supply pipe 33. The raw gas supply pipe 33 and the nitrogen gas supply pipe 34 have a double structure. By supplying the nitrogen gas as the second gas into the cleaning tower 35, the rise of water vapor (moisture) around the raw gas outlet 36 of the raw gas supply pipe 33 is prevented, and the SiCL ₄ and SiF ₄ gases are also prevented. It is possible to prevent the hydrolysis reaction between water and water vapor, and to prevent clogging due to the adhesion and growth of solids around the raw gas outlet 36 of the raw gas supply pipe 33.
[0029]
In the gas supply unit 32 configured as described above, the raw gas containing HCL, CL ₂ , SiO ₂ , SiCL ₄ , SiF ₄ , etc. is supplied from the raw gas supply pipe 33 into the cleaning tower 35, and the raw gas is supplied to the cleaning tower 35. Nitrogen gas is supplied from the nitrogen gas supply pipe 33 around the gas. In this case, the range of the gas velocity in the nitrogen gas supply pipe 34 is 0.5 to 20 m / sec. A more preferred range is 3 to 12 m / sec. The preferable range of the amount of the washing liquid in the washing tower is 150 to 500 m ³ / m ² · Hr. The ranges of the gas velocity and the amount of the cleaning liquid are appropriately selected and used depending on the composition, concentration, flow rate and the like of the raw gas.
[0030]
Further, a second embodiment of the washing tower according to the present invention will be described with reference to FIG. The basic structure of the washing tower 37 is the same as that of the washing tower 35 shown in FIG. 6, except that nitrogen gas is supplied to the washing tower 37 via nitrogen gas supply lines 39 and 40 in addition to the nitrogen gas supply pipe 38. To the top inside. The supply of the nitrogen gas to the top prevents adhesion of solid matter.
[0031]
Next, a second embodiment of the present invention will be described. FIG. 8 is a schematic diagram showing the removing apparatus of the present embodiment. In the second embodiment shown in FIG. 8, the same components as those in the first embodiment shown in FIG. 1 are denoted by the same reference numerals, and detailed description thereof will be omitted. In the present embodiment, the liquid and the gas discharged from the lower part of the washing tower are separated, and the liquid and a part of the gas are supplied into the washing liquid circulation line 41 in the tank. The purified gas is exhausted from the exhaust line 42 via the exhaust fan 27. The static mixer 1 may be provided on the cleaning liquid circulation line 41. As a result, the generation of unreacted products due to the hydrolysis reaction due to the inflow of a part of the raw gas can be prevented, and accidents such as explosion of hydrogen generated by the following hydrolysis reaction formulas 1 and 2 can be prevented.
SiH ₂ CL ₂ + 2H ₂ O → SiO ₂ + 2HCL + H ₂ (1)
SiHCL ₃ + 2H ₂ O → SiO ₂ + 3HCL + H ₂ (2)
[0032]
Next, a third embodiment of the present invention will be described. FIG. 9 is a schematic diagram illustrating the removing apparatus of the present embodiment. In the third embodiment shown in FIG. 9, the same components as those in the first embodiment shown in FIG. 1 are denoted by the same reference numerals, and detailed description thereof will be omitted. In this embodiment, the removal efficiency can be further improved.
[0033]
As shown in FIG. 9, the removing device 41 is provided with a second washing tower 43 and a pump 44. The static mixer 1 is provided inside the washing tower 43. The lower part of the washing tower 43 communicates with the tank 26. A spray nozzle 45 for injecting a cleaning liquid through a pump 44 is provided below the stationary mixer 1 so as to face upward. In addition, a spray nozzle (not shown) may be provided not only at the lower end side of the static mixer 1 but also at the upper end side. In this case, by supplying the new liquid to the spray nozzle on the upper end side, the new liquid and the gas are mixed and contacted in countercurrent, and the removal efficiency is further improved. In particular, the removal efficiency of harmful gases such as HCL and HF by physical absorption is further improved.
[0034]
In the second washing tower configured as described above, the untreated raw gas in the first washing tower 23 is stopped together with the washing liquid from the lower part of the washing tower 43 through the space through which the gas in the tank 26 flows. It is supplied to the lower end of the mold mixer 1. The gas and the liquid are mixed and contacted by the static mixer 1, and the removal efficiency is further improved. After the liquid is mixed and contacted with the gas in the static mixer 1, the liquid naturally falls by gravity and returns to the tank 26. Thereby, double contact time is obtained by reciprocating in the upward and downward directions. The gas velocity in the washing tower 43 is preferably in the range of 1 to 10 m / sec. A more preferred range is 2 to 6 m / sec. The preferred liquid / gas ratio in this case is in the range of 0.1 to ³⁰ L / m3. In addition, it is not limited to these numerical values, and is appropriately selected and used depending on the composition, concentration, flow rate and the like of the gas.
[0035]
Next, a fourth embodiment of the present invention will be described. FIG. 10 is a schematic diagram illustrating the removing apparatus of the present embodiment. In the fourth embodiment shown in FIG. 10, the same components as those in the first, second, and third embodiments shown in FIGS. 1, 8, and 9 are denoted by the same reference numerals, and detailed description thereof will be made. Is omitted. In this embodiment, the removal efficiency can be further improved.
[0036]
As shown in FIG. 10, in the removing device 46, a first washing tower 23, a second washing tower 47, and a third washing tower 43 are respectively connected in series. The fluid in the static mixer 1 is brought into gas-liquid contact with the first washing tower 23 and the second washing tower 47 in cocurrent, and the fluid in the third washing tower 43 is countercurrent.
[0037]
In the fourth embodiment configured as described above, the removal efficiency is further improved by increasing the mixing contact time between the gas and the liquid, and the adhesion and growth of solids can be prevented, so that the maintenance cost can be significantly reduced.
[0038]
【The invention's effect】
As described above in detail, according to the present invention, the gas containing the different substance and the second gas are supplied from above the static mixer, and the liquid is co-flowed into the static mixer from below these gases. And gas and liquid mixed contact inside the static mixer, and the foreign substance contained in the gas is collected or dissolved or chemically reacted on the liquid side to remove the foreign substance from the gas or remove the gas. Can be purified. For this reason, it is possible to discharge or collect the purified gas and the liquid containing the foreign substance, respectively.
[0039]
Also, unlike conventional washing methods for packed towers, spray towers, venturi scrubbers, etc., fluid flows through a static mixer composed of one or more mixing elements provided with a plurality of spiral blades. Since the gas flows, the pressure loss can be reduced, and the power supply and maintenance costs can be reduced by making the raw gas supply unit a double pipe system, and the gas and liquid flow in parallel. , The efficiency of gas-liquid mixing and contact increases, the efficiency of removing foreign substances improves, and the performance of the apparatus can be improved. Further, with the increase in the efficiency of gas-liquid mixing contact, a chemical reaction such as a hydrolysis reaction can be instantaneously terminated. Thereby, danger such as generation of unreacted products and hydrogen explosion can be prevented.
[0040]
Further, since the pressure loss is low, the superficial velocity of the gas in the apparatus can be increased, and the apparatus can be downsized. Furthermore, since the gas-liquid contacting efficiency is high, even when the ratio between the liquid and the gas is largely changed, the foreign substance can be removed from the gas or the gas can be purified, so that the operation management of the apparatus becomes easy. In addition, since the gas-liquid contact efficiency is high, dead space is eliminated, solid adhesion is prevented from growing, and maintenance and inspection can be made unnecessary.
[Brief description of the drawings]
FIG. 1 is a schematic view showing an apparatus for removing foreign substances in a gas according to a first embodiment of the present invention.
FIG. 2A is a cross-sectional view showing a mixing element of a static mixer used in the present embodiment, and FIG. 2B is a perspective view thereof.
FIG. 3 is a perspective view of a 90 ° right-rotating mixing element.
FIG. 4 is a perspective view of a 90 ° counterclockwise rotation type mixing element.
FIG. 5 is a side sectional view of a static mixer using the mixing element.
FIG. 6 is a schematic view showing a washing tower according to the present invention.
FIG. 7 is a schematic view showing a second washing tower according to the present invention.
FIG. 8 is a schematic view showing an apparatus for removing foreign substances in a gas according to a second embodiment of the present invention.
FIG. 9 is a schematic view showing an apparatus for removing foreign substances in a gas according to a third embodiment of the present invention.
FIG. 10 is a schematic view showing an apparatus for removing foreign substances in a gas according to a fourth embodiment of the present invention.
[Explanation of symbols]
1, 1a: Static mixer 2, 8, 15: Mixing element 3: Outer tube 4, 10, 11, 17, 18: Blade 5: Hole 6: Inner tube 7, 14, 21: Opening 9, 16: passage pipes 12, 13, 19, 20: fluid passage 22: casings 23, 35, 37, 43, 47: washing towers 24, 32: gas supply units 25, 41, 46: removing device 26: tank 27: discharging wind machine 28: valve 29,31,45: spray nozzles 30, 44: pump 33: raw gas supply pipe 34,38,39,40: N ₂ gas feed pipe 36: raw gas outlet

Claims (2)

A washing tower in which a static mixer for mixing a liquid and a gas arranged with the longitudinal direction substantially vertical and moving a different substance in the gas into the liquid is provided; and It is characterized by having supply means for separately supplying gas and liquid in parallel from the upper part, and supply means for supplying the second gas from the gas supply part to the upper part of the washing tower. A device for removing foreign substances in gas. The apparatus according to claim 1, wherein the second gas is one of nitrogen, helium, and dry air or a mixed gas.

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