JP2004117876A5 - - Google Patents
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- Publication number
- JP2004117876A5 JP2004117876A5 JP2002281425A JP2002281425A JP2004117876A5 JP 2004117876 A5 JP2004117876 A5 JP 2004117876A5 JP 2002281425 A JP2002281425 A JP 2002281425A JP 2002281425 A JP2002281425 A JP 2002281425A JP 2004117876 A5 JP2004117876 A5 JP 2004117876A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- hydrogen atom
- alkyl group
- acid
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 125000000217 alkyl group Chemical group 0.000 claims 9
- 239000002253 acid Substances 0.000 claims 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 5
- 229920002120 photoresistant polymer Polymers 0.000 claims 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- 125000002252 acyl group Chemical group 0.000 claims 2
- 125000003545 alkoxy group Chemical group 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 claims 1
- 125000004442 acylamino group Chemical group 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 1
- 150000001450 anions Chemical class 0.000 claims 1
- 125000004432 carbon atom Chemical group C* 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 239000003431 cross linking reagent Substances 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 125000005647 linker group Chemical group 0.000 claims 1
- 150000007974 melamines Chemical class 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- -1 nitrogen-containing basic compound Chemical class 0.000 claims 1
- 230000000269 nucleophilic effect Effects 0.000 claims 1
- 125000004430 oxygen atom Chemical group O* 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002281425A JP2004117876A (ja) | 2002-09-26 | 2002-09-26 | ネガ型レジスト組成物 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002281425A JP2004117876A (ja) | 2002-09-26 | 2002-09-26 | ネガ型レジスト組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004117876A JP2004117876A (ja) | 2004-04-15 |
JP2004117876A5 true JP2004117876A5 (enrdf_load_stackoverflow) | 2005-09-29 |
Family
ID=32275867
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002281425A Pending JP2004117876A (ja) | 2002-09-26 | 2002-09-26 | ネガ型レジスト組成物 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2004117876A (enrdf_load_stackoverflow) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4121388B2 (ja) * | 2003-01-30 | 2008-07-23 | 富士フイルム株式会社 | ポジ型レジスト組成物、及び、活性光線の照射により酸を発生する化合物 |
JP4880523B2 (ja) * | 2006-07-24 | 2012-02-22 | 信越化学工業株式会社 | ネガ型レジスト材料及びこれを用いたパターン形成方法 |
JP4990344B2 (ja) * | 2009-12-04 | 2012-08-01 | 富士フイルム株式会社 | ネガ型レジスト組成物及びそれを用いたパターン形成方法 |
CN104080788B (zh) * | 2012-02-01 | 2016-06-22 | 株式会社Lg化学 | 新的化合物、感光组合物和含有所述感光组合物的感光剂 |
KR20240127977A (ko) * | 2021-12-28 | 2024-08-23 | 도오꾜오까고오교 가부시끼가이샤 | 레지스트 조성물 및 레지스트 패턴 형성 방법 |
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2002
- 2002-09-26 JP JP2002281425A patent/JP2004117876A/ja active Pending