JP2004117876A5

JP2004117876A5 -

Info

Publication number: JP2004117876A5
Application number: JP2002281425A
Authority: JP
Filing date: 2002-09-26
Publication date: 2005-09-29

Claims

(A) an alkali-soluble polymer,
(B) a crosslinking agent that crosslinks with an acid, which is at least one selected from compounds represented by general formulas (II) to (IV) and alkoxymethylated melamine compounds;
as well as,
(C) A negative resist composition comprising an acid generator represented by the following general formula (I) that generates an acid upon irradiation with an actinic ray or radiation.

In general formula (II),
R ₅ each independently represents a hydrogen atom, an alkyl group or an acyl group.
R _{6 to} R ₉ each independently represents a hydrogen atom, a hydroxyl group, an alkyl group or an alkoxyl group.
X represents a single bond, a methylene group or an oxygen atom.
In general formulas (III) and (IV),
R ₅ each independently represents a hydrogen atom, an alkyl group or an acyl group.

In general formula (I),
R _{11 to} R ₅₁ may be the same or different and each represents a hydrogen atom, a nitro group, a halogen atom, an alkyl group, an alkoxy group, an alkyloxycarbonyl group, an aryl group, or an acylamino group, and R _{11 to} R ₅₁ At least two of them may combine to form a ring structure.
R ₆₁ and R ₇₁ may be the same or different and each represents a hydrogen atom, a cyano group, an alkyl group or an aryl group.
Y ₁ and Y ₂ may be the same or different and each represents an alkyl group or an alkenyl group. However, Y ₁ and Y _2, when both are alkyl groups, at least one alkyl group of Y ₁ and Y ₂ has a hydroxyl group, an ether linkage group or a sulfide linkage group, or Y ₁ and Y ₂ of both alkyl groups is 2 or more carbon atoms.
Y ₁ or Y ₂ may be bonded to form a ring together with S ⁺ .
At least one of R _{11 to} R ₅₁ may be bonded to at least one of Y ₁ or Y ₂ to form a ring.
At least one of R _{11 to} R ₅₁ may be bonded to at least one of R ₆₁ or R ₇₁ to form a ring.
Further, it may be bonded via a linking group at any position of R _{11 to} R ₇₁ or at any position of Y ₁ or Y ₂ to have two or more structures of the formula (I).
X ⁻ represents a non-nucleophilic anion.

The negative resist composition according to claim 1, further comprising (D) a nitrogen-containing basic compound.

Furthermore, (E) The negative type | mold of Claim 1 or 2 containing the acid generator which generate | occur | produces an acid by irradiation of actinic rays or radiation other than the acid generator represented by general formula (I) Resist composition.

A pattern forming method, comprising: forming a resist film from the negative resist composition according to claim 1; and exposing and developing the resist film.