JP2001066779A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2001066779A5 JP2001066779A5 JP1999243346A JP24334699A JP2001066779A5 JP 2001066779 A5 JP2001066779 A5 JP 2001066779A5 JP 1999243346 A JP1999243346 A JP 1999243346A JP 24334699 A JP24334699 A JP 24334699A JP 2001066779 A5 JP2001066779 A5 JP 2001066779A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- acid
- branched
- linear
- photosensitive composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002253 acid Substances 0.000 claims 10
- 125000006165 cyclic alkyl group Chemical group 0.000 claims 8
- 125000003545 alkoxy group Chemical group 0.000 claims 5
- 150000001875 compounds Chemical class 0.000 claims 5
- 239000011347 resin Substances 0.000 claims 5
- 229920005989 resin Polymers 0.000 claims 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 4
- 125000003710 aryl alkyl group Chemical group 0.000 claims 3
- 125000004432 carbon atom Chemical group C* 0.000 claims 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 3
- 150000001450 anions Chemical class 0.000 claims 2
- ILFFFKFZHRGICY-UHFFFAOYSA-N anthracene-1-sulfonic acid Chemical compound C1=CC=C2C=C3C(S(=O)(=O)O)=CC=CC3=CC2=C1 ILFFFKFZHRGICY-UHFFFAOYSA-N 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 238000004090 dissolution Methods 0.000 claims 2
- 230000002401 inhibitory effect Effects 0.000 claims 2
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 claims 2
- -1 nitrogen-containing compound Chemical class 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 claims 1
- 229940092714 benzenesulfonic acid Drugs 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 125000004185 ester group Chemical group 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 125000000547 substituted alkyl group Chemical group 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24334699A JP3982958B2 (ja) | 1999-08-30 | 1999-08-30 | ポジ型感光性組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24334699A JP3982958B2 (ja) | 1999-08-30 | 1999-08-30 | ポジ型感光性組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001066779A JP2001066779A (ja) | 2001-03-16 |
| JP2001066779A5 true JP2001066779A5 (enrdf_load_stackoverflow) | 2005-07-07 |
| JP3982958B2 JP3982958B2 (ja) | 2007-09-26 |
Family
ID=17102473
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24334699A Expired - Fee Related JP3982958B2 (ja) | 1999-08-30 | 1999-08-30 | ポジ型感光性組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3982958B2 (enrdf_load_stackoverflow) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4092083B2 (ja) * | 2001-03-21 | 2008-05-28 | 富士フイルム株式会社 | 電子線又はｘ線用ネガ型レジスト組成物 |
| US7192681B2 (en) * | 2001-07-05 | 2007-03-20 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
| US6773474B2 (en) * | 2002-04-19 | 2004-08-10 | 3M Innovative Properties Company | Coated abrasive article |
| KR101036501B1 (ko) | 2002-11-22 | 2011-05-24 | 후지필름 가부시키가이샤 | 포지티브형 레지스트 조성물 및 그것을 사용한 패턴형성방법 |
| JP4414721B2 (ja) * | 2002-11-22 | 2010-02-10 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP4115309B2 (ja) | 2003-03-24 | 2008-07-09 | 富士フイルム株式会社 | ポジ型レジスト組成物 |
| US7449573B2 (en) | 2004-02-16 | 2008-11-11 | Fujifilm Corporation | Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition |
| JP4491335B2 (ja) * | 2004-02-16 | 2010-06-30 | 富士フイルム株式会社 | 感光性組成物、該感光性組成物に用いる化合物及び該感光性組成物を用いたパターン形成方法 |
| JP2011095623A (ja) * | 2009-10-30 | 2011-05-12 | Jsr Corp | 液浸露光用感放射線性樹脂組成物及びパターン形成方法 |
| JP5504080B2 (ja) * | 2010-07-13 | 2014-05-28 | 富士フイルム株式会社 | ビニルエーテル化合物の製造方法 |
-
1999
- 1999-08-30 JP JP24334699A patent/JP3982958B2/ja not_active Expired - Fee Related