JP2004093445A - Waste volume decreasing method - Google Patents

Waste volume decreasing method Download PDF

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JP2004093445A
JP2004093445A JP2002256684A JP2002256684A JP2004093445A JP 2004093445 A JP2004093445 A JP 2004093445A JP 2002256684 A JP2002256684 A JP 2002256684A JP 2002256684 A JP2002256684 A JP 2002256684A JP 2004093445 A JP2004093445 A JP 2004093445A
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waste
uranium
gas
component
halide
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JP4069709B2 (en
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Hisaki Fukui
福井　寿樹
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IHI Corp
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IHI Corp
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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/30—Nuclear fission reactors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W30/00—Technologies for solid waste management
    • Y02W30/50—Reuse, recycling or recovery technologies

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  • Inorganic Compounds Of Heavy Metals (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a waste volume decreasing method capable of efficiently decreasing the volume of the waste containing the silicon dioxide component and uranium component. <P>SOLUTION: The waste 1 is cast into a reaction vessel 2, and the temperature atmosphere of its space where the waste 1 is put in is set to 400-700 K approximately. A valve 8 on a line 9 is opened, and hydrogen fluoride gas 7 is fed from a gas filled vessel 3 into the reaction vessel 2, and silicon tetrafluoride 25 in gas phase is produced. The valve 8 is closed, and a valve 10 on a line 11 is opened, and the silicon tetrafluoride 25 in gas phase is introduced to a scrubber 4, and at the same time, a valve 14 on a line 15 is opened and water 26 is sprayed into the scrubber 4, and a sludge of silicates 27 is produced. <P>COPYRIGHT: (C)2004,JPO

Description

【０００１】
【発明の属する技術分野】
本発明は廃棄物減容方法に関するものである。
【０００２】
【従来の技術】
原子炉用燃料の製造施設では、燃料製造時に生じるウランなどの様々な物質の微粉末を、排ガス処理系に設置したフィルタにより捕捉して、微粉末が製造施設の外部へ飛散しないようにしている。
【０００３】
捕捉した微粉の増加によって通気性が低下したフィルタは、新しいものに交換され、廃棄物として処理される。
【０００４】
フィルタを廃棄する際には、微粉末が付着しているフィルタメディア（ガラス繊維）を金属製のケーシングから分離し、フィルタメディアについては焼却処理を、また、ケーシングについては圧縮処理を行なって、体積を縮小させたうえ、廃棄物貯蔵施設に保管している。
【０００５】
また、フィルタメディアに付着したウランを、硝酸、または塩酸の溶液により抽出し、ウランの有効利用を図ることが提案されているが、多量の溶液を必要とするため、最終的には、当該溶液が２次廃棄物になってしまう。
【０００６】
そこで、溶液を用いずにフィルタからウランを回収する方法が提案されている。
【０００７】
この方法では、ウランが付着しているフィルタに、１００℃程度に昇温させたハロゲン化ガスを通気して、気相のハロゲン化ウランを生成し、当該ハロゲン化ウランを収集したうえ冷却して、ハロゲン化ウラン固体を形成させている（特許文献１参照）。
【０００８】
【特許文献１】
特開平１１−３３７６８８号公報（第２−３頁、図１）
【０００９】
【発明が解決しようとする課題】
しかしながら、特許文献１の発明は、ウランの回収を主たる目的としており、特に、使用済みのフィルタメディアのような二酸化ケイ素成分が大半を占め且つウラン成分を含んだ廃棄物の減容については考慮されていない。
【００１０】
本発明は上述した実情に鑑みてなしたもので、二酸化ケイ素成分とウラン成分を含んでいる廃棄物を効率よく減容できるようにすることを目的している。
【００１１】
【課題を解決するための手段】
上記目的を達成するために、本発明の請求項１に記載の廃棄物減容方法では、約４００〜７００Ｋの温度雰囲気で、二酸化ケイ素成分及びウラン成分を含んだ廃棄物にフッ化水素ガスを吹き込んで気相の四フッ化ケイ素を生成し、該四フッ化ケイ素を収集して廃棄物中から二酸化ケイ素成分を取り除く。
【００１２】
本発明の請求項２に記載の廃棄物減容方法では、収集した四フッ化ケイ素に水を噴霧して、ケイ酸塩スラッジを生成する。
【００１３】
本発明の請求項３に記載の廃棄物減容方法では、四フッ化ケイ素を収集した後の廃棄物残渣を、約４００Ｋ以上の温度雰囲気に加熱してウランを還元し、廃棄物残渣にハロゲンガスを吹き込んで、気相のハロゲン化ウランと残渣を生成し、気相のハロゲン化ウランを収集し且つ当該ハロゲン化ウランに水を噴霧してハロゲン化ウラン酸化物を生成する。
【００１４】
本発明の請求項４の記載の廃棄物減容方法では、四フッ化ケイ素を収集した後の廃棄物残渣を、約４００Ｋ以上の温度雰囲気に加熱してウランを還元し、廃棄物残渣にハロゲンガスを吹き込んで、気相のハロゲン化ウランと残渣を生成し、気相のハロゲン化ウランを収集し且つ当該ハロゲン化ウランを冷却して、ハロゲン化ウラン固体を形成させる。
【００１５】
本発明の請求項１に記載の廃棄物減容方法においては、廃棄物に対してフッ化水素ガスを吹き込むことにより、廃棄物中の二酸化ケイ素成分にフッ化水素ガスを反応させて、気相の四フッ化ケイ素を生成し、廃棄物からケイ素成分を選択的に回収する。
【００１６】
本発明の請求項２に記載の廃棄物減容方法においては、気相の四フッ化ケイ素に水を反応させて、ケイ酸塩スラッジを生成し、廃棄物からケイ素成分を選択的に回収する。
【００１７】
本発明の請求項３に記載の廃棄物減容方法では、二酸化ケイ素成分を除去した後の廃棄物残渣に対してハロゲンガスを吹き込むことにより、廃棄物中のウラン成分にハロゲンガスを反応させて、気相のハロゲン化ウランを生成した後、当該気相のハロゲン化ウランに水を反応させて、ハロゲン化ウラン酸化物を生成し、廃棄物残渣からウラン成分を選択的に回収する。
【００１８】
本発明の請求項４に記載の廃棄物減容方法では、二酸化ケイ素成分を除去した後の廃棄物残渣に対してハロゲンガスを吹き込むことにより、廃棄物中のウラン成分にハロゲンガスを反応させて、気相のハロゲン化ウランを生成した後、当該気相のハロゲン化ウランを冷却して、ハロゲン化ウラン固体を形成させ、廃棄物残渣からウラン成分を選択的に回収する。
【００１９】
【発明の実施の形態】
以下、本発明の実施の形態を、図示例とともに説明する。
【００２０】
図１及び図２は本発明の廃棄物減容方法の第１の例を示すものである。
【００２１】
この廃棄物減容方法では、二酸化ケイ素成分及びウラン成分を含んだ廃棄物１を投入可能な反応容器２と、ケイ素成分回収用のガス充填容器３及びスクラバ４と、ウラン成分回収用のガス充填容器５及びスクラバ６とを備えた減容処理設備を用いる。
【００２２】
廃棄物１は、ウラン成分が付着したフィルタメディア、濾過助剤に使用した後のウラン成分を含んだ珪藻土、ウラン成分を含んだシリカ沈殿物、または二酸化ケイ素系焼却灰などのように、二酸化ケイ素成分が大半を占めているものである。
【００２３】
反応容器２は、廃棄物１が投入される空間を所定の温度雰囲気に加熱するためのヒータ（図示せず）を有している。
【００２４】
ガス充填容器３には、フッ化水素ガス（ＨＦ）７が充填されている。
【００２５】
ガス充填容器３のガス吐出口と反応容器２の内部とは、中間部分にバルブ８を有し且つガス流通方向下流端が反応容器２の底部を貫通する管路９によって連通し得るように構成されている。
【００２６】
スクラバ４は、生成ガス流入口、浄化ガス流出口、及び水供給口を有している。
【００２７】
スクラバ４の生成ガス流入口と反応容器２の内部とは、中間部分にバルブ１０を有し且つガス流通方向上流端が反応容器２の頂部を貫通する管路１１によって連通し得るように構成されている。
【００２８】
また、スクラバ４の浄化ガス流出口には、液分除去用の凝縮器１２を経て排気処理設備に連なる管路１３が接続されている。
【００２９】
更に、スクラバ４の水供給口には、バルブ１４を経て給水本管（図示せず）に連なる管路１５が接続されている。
【００３０】
ガス充填容器５には、塩素（Ｃｌ）、フッ素（Ｆ）、フッ化塩素（ＣｌＦ３）などのハロゲンガス１６が充填されている。
【００３１】
ガス充填容器５のガス吐出口と反応容器２の内部とは、中間部分にバルブ１７を有し且つガス流通方向下流端が反応容器２の底部を貫通する管路１８によって連通し得るように構成されている。
【００３２】
スクラバ６は、生成ガス流入口、浄化ガス流出口、及び水供給口を有している。
【００３３】
スクラバ６の生成ガス流入口と反応容器２の内部とは、中間部分にバルブ１９を有し且つガス流通方向上流端が反応容器２の頂部を貫通する管路２０によって連通し得るように構成されている。
【００３４】
また、スクラバ６の浄化ガス流出口には、液分除去用の凝縮器２１を経て排気処理設備に連なる管路２２が接続されている。
【００３５】
更に、スクラバ６の水供給口には、バルブ２３を経て給水本管（図示せず）に連なる管路２４が接続されている。
【００３６】
廃棄物１の減容を行なうときには、図１に示すように、反応容器２に廃棄物１を投入した後、当該反応容器２に付帯のヒータによって、廃棄物１が投入されている空間の温度雰囲気を約（１０００／２．５０）〜（１０００／１．４３）Ｋ、すなわち約４００〜７００Ｋに設定する。
【００３７】
次いで、管路９のバルブ８を開いて、ガス充填容器３から反応容器２の内部にフッ化水素ガス７を送給し、気相の四フッ化ケイ素（ＳｉＦ４）２５を生成する。
【００３８】
このとき、フッ化水素ガス７の流入によって、反応容器２の内部の廃棄物１が流動し、四フッ化ケイ素２５の生成が促進される。
【００３９】
また、反応容器２ではフッ素成分とウラン成分とが反応して、四フッ化ウラン（ＵＦ４　）成分を生成するが、図５に示すように、四フッ化ケイ素成分のほうが四フッ化ウラン成分よりも高い蒸気圧Ｐを呈するので、四フッ化ウラン成分の揮発を抑止しつつ、廃棄物１から二酸化ケイ素成分を選択的に収集することができる。
【００４０】
更に、バルブ８を閉じたうえ、管路１１のバルブ１０を開き、気相の四フッ化ケイ素２５をスクラバ４へ導入させ、同時に、管路１５のバルブ１４を開いて、スクラバ４内へ水２６を噴霧し、ケイ酸塩スラッジ２７を生成する。
【００４１】
スクラバ４から送出されるガス２８は、凝縮器１２で液分を除去されたうえ、管路１３から排気処理設備へ流入する。
【００４２】
このように、廃棄物１が含んでいたケイ素成分を、クリアランス廃棄物であるケイ酸塩スラッジ２７として回収するので、廃棄物１の減容を図ることができる。
【００４３】
上述した気相の四フッ化ケイ素２５の生成時、並びにケイ酸塩スラッジ２７の生成時には、管路１８，２０，２４のバルブ１７，１９，２３を閉じておく。
【００４４】
この後に、バルブ８，１０，１４を閉じて、図２に示すように、ウラン成分を含んだ廃棄物残渣２９が残留している反応容器２内の空間の温度雰囲気を、反応容器２に付帯のヒータによって約（１０００／１．４３）Ｋ、すなわち約７００Ｋ以上に設定し、ウラン成分を還元する。
【００４５】
また、先に述べた四フッ化ケイ素２５（図１参照）の生成と同時に生成されて廃棄物残渣２９中に含まれていた四フッ化ウラン成分が揮発する。
【００４６】
次いで、管路１８のバルブ１７を開き、ガス充填容器５から反応容器２の内部にハロゲンガス１６を送給し、廃棄物残渣２９から気相のハロゲン化ウラン３１と残渣３２を生成する。
【００４７】
ハロゲン化ウラン３１は、ハロゲンガス１６の組成に応じて生成されるので、ハロゲンガス１６が塩素系であると、塩化ウランが生成され、ハロゲンガス１６がフッ素系であると、フッ化ウランが生成される。
【００４８】
このとき、ハロゲンガス１６の流入によって、反応容器２の内部の廃棄物残渣２９が流動し、ハロゲン化ウラン３１の生成が促進される。
【００４９】
更にまた、バルブ１７を閉じたうえ、管路２０のバルブ１９を開いて、気相のハロゲン化ウラン３１をスクラバ６へ導入させ、同時に、管路２４のバルブ２３を開いて、スクラバ６内へ水２６を噴霧し、ハロゲン化ウラン酸化物３３を生成する。
【００５０】
スクラバ６から送出されるガス３４は、凝縮器２１で液分を除去されたうえ、管路２２から排気処理設備へ流入する。
【００５１】
このように、廃棄物１（図１参照）から二酸化ケイ素成分を選択的に除去した後の廃棄物残渣２９が含んでいたウラン成分を、再利用可能なハロゲン化ウラン酸化物３３として回収するので、廃棄物１の減容を図ることができる。
【００５２】
これに加えて、ウラン成分を回収するときには、バルブ１０を閉止状態にするので、スクラバ４や凝縮器１２を組み込んでいる管路１３にウラン成分を含んだ粒子が入り込まず、これらの内部の放射線量が高くなることを抑止できる。
【００５３】
図３及び図４は本発明の廃棄物減容方法の第２の例を示すものであり、図中、図１及び図２と同一の符号を付した部分は同一物を表わしている。
【００５４】
この廃棄物減容方法では、二酸化ケイ素成分及びウラン成分を含んだ廃棄物１を投入可能な反応容器２と、ケイ素成分回収用のガス充填容器３及びスクラバ４と、ウラン成分回収用の冷却器３５とを備えた減容処理設備を用いる。
【００５５】
冷却器３５は、生成ガス流入口を有し、当該流入口から内部へ流れ込むガスを冷却するものである。
【００５６】
冷却器３５の生成ガス流入口と反応容器２の内部とは、中間部分にバルブ３６を有し且つガス流通方向上流端が反応容器２の頂部を貫通する管路３７によって連通し得るように構成されている。
【００５７】
廃棄物１の減容を行なうときには、図３に示すように、反応容器２に廃棄物１を投入した後、当該反応容器２に付帯のヒータによって、廃棄物１が投入されている反応容器２内の空間の温度雰囲気を約（１０００／２．５０）〜（１０００／１．４３）Ｋ、すなわち約４００〜７００Ｋに設定する。
【００５８】
次いで、図１及び図２によって説明した廃棄物減容方法と同様に、バルブ８，１０，１４を開き、ガス充填容器３から反応容器２の内部にフッ化水素ガス７を送給することにより、気相の四フッ化ケイ素（ＳｉＦ４）２５を生成し、当該四フッ化ケイ素２５をスクラバ４へ導入させて、水２６をスクラバ４内に噴霧し、ケイ酸塩スラッジ２７を生成する。
【００５９】
このように、廃棄物１が含んでいたケイ素成分を、クリアランス廃棄物であるケイ酸塩スラッジ２７として回収するので、廃棄物１の減容を図ることができる。
【００６０】
上述した気相の四フッ化ケイ素２５の生成時、並びにケイ酸塩スラッジ２７の生成時には、管路１８，３７のバルブ１７，３６を閉じておく。
【００６１】
この後に、バルブ８，１０，１４を閉じて、図４に示すように、ウラン成分を含んだ廃棄物残渣２９が残留している反応容器２内の空間の温度雰囲気を反応容器２に付帯のヒータによって、約（１０００／１．４３）Ｋ、すなわち約７００Ｋ以上に設定し、ウラン成分を還元する。
【００６２】
また、先に述べた四フッ化ケイ素２５（図３参照）の生成と同時に生成されて廃棄物残渣２９中に含まれていた四フッ化ウラン成分が揮発する。
【００６３】
次いで、管路１８のバルブ１７を開き、ガス充填容器５から反応容器２の内部にハロゲンガス１６を送給し、気相のハロゲン化ウラン３１と残渣３２を生成する。
【００６４】
更にまた、バルブ１７を閉じたうえ、管路３７のバルブ３６を開いて、気相のハロゲン化ウラン３１を冷却器３５へ導入させて冷却し、ハロゲン化ウラン固体３８を形成させる。
【００６５】
このように、廃棄物１（図３参照）から二酸化ケイ素成分を選択的に除去した後の廃棄物残渣２９が含んでいたウラン成分を、再利用可能なハロゲン化ウラン固体３８として回収するので、廃棄物１の減容を図ることができる。
【００６６】
なお、本発明の廃棄物減容方法は、上述した実施の形態のみに限定されるものではなく、本発明の要旨を逸脱しない範囲内において変更を加え得ることは勿論である。
【００６７】
【発明の効果】
以上述べたように、本発明の廃棄物減容方法によれば下記のような優れた効果を奏し得る。
【００６８】
（１）本発明の請求項１に記載の廃棄物減容方法においては、フッ化水素ガスを廃棄物に対して吹き込み、廃棄物が含んでいる二酸化ケイ素成分にフッ化水素ガスを反応させて、気相の四フッ化ケイ素を生成し、廃棄物中からケイ素成分を選択的に回収するので、廃棄物を効率よく減容できる。
【００６９】
（２）本発明の請求項２に記載の廃棄物減容方法においては、気相の四フッ化ケイ素に水を反応させて、ケイ酸塩スラッジを生成し、廃棄物からケイ素成分を選択的に回収するので、廃棄物を効率よく減容できる。
【００７０】
（３）本発明の請求項３に記載の廃棄物減容方法では、ハロゲンガスを二酸化ケイ素成分が除去された後の廃棄物残渣に対して吹き込み、廃棄物が含んでいるウラン成分にハロゲンガスを反応させて、気相のハロゲン化ウランを生成した後に、当該ハロゲン化ウランに水を反応させて、ハロゲン化ウラン酸化物を生成し、廃棄物残渣からウラン成分を回収するので、廃棄物を更に効率よく減容でき、また、ウランの再利用を図ることが可能になる。
【００７１】
（４）本発明の請求項４に記載の廃棄物減容方法では、ハロゲンガスを二酸化ケイ素成分が除去された後の廃棄物残渣に対して吹き込み、廃棄物が含んでいるウラン成分にハロゲンガスを反応させて、気相のハロゲン化ウランを生成した後に、当該ハロゲン化ウランを冷却して、ハロゲン化ウラン固体を形成させ、廃棄物残渣からウラン成分を回収するので、廃棄物を更に効率よく減容でき、また、ウランの再利用を図ることが可能になる。
【図面の簡単な説明】
【図１】本発明の廃棄物減容方法の第１の例においてケイ素成分を回収している状態を示す概念図である。
【図２】本発明の廃棄物減容方法の第１の例においてウラン成分を回収している状態を示す概念図である。
【図３】本発明の廃棄物減容方法の第２の例においてケイ素成分を回収している状態を示す概念図である。
【図４】本発明の廃棄物減容方法の第２の例においてウラン成分を回収している状態を示す概念図である。
【図５】四フッ化ケイ素成分及び四フッ化ウラン成分の蒸気圧と温度の関係を示す線図である。
【符号の説明】
１　　廃棄物
７　　フッ化水素ガス
１６　ハロゲンガス
２５　四フッ化ケイ素
２６　水
２７　ケイ酸塩スラッジ
２９　廃棄物残渣
３１　ハロゲン化ウラン
３２　残渣
３３　ハロゲン化ウラン酸化物
３８　ハロゲン化ウラン固体[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a waste volume reducing method.
[0002]
[Prior art]
In a reactor fuel manufacturing facility, fine powder of various substances such as uranium generated during fuel production is captured by a filter installed in an exhaust gas treatment system so that the fine powder does not scatter outside the manufacturing facility. .
[0003]
Filters whose air permeability has been reduced due to an increase in captured fines are replaced with new ones and disposed of as waste.
[0004]
When disposing of the filter, the filter media (glass fiber) to which the fine powder is attached is separated from the metal casing, the filter media is incinerated, and the casing is compressed to obtain a volume. And stored in a waste storage facility.
[0005]
It has also been proposed to extract uranium adhering to the filter media with a solution of nitric acid or hydrochloric acid to make effective use of uranium.However, since a large amount of solution is required, the solution is ultimately required. Becomes secondary waste.
[0006]
Therefore, a method of recovering uranium from a filter without using a solution has been proposed.
[0007]
In this method, a halogenated gas heated to about 100 ° C. is passed through a filter to which uranium is attached to generate uranium halide in a gas phase, and the uranium halide is collected and cooled. To form a uranium halide solid (see Patent Document 1).
[0008]
[Patent Document 1]
JP-A-11-337688 (page 2-3, FIG. 1)
[0009]
[Problems to be solved by the invention]
However, the invention of Patent Document 1 has a main object of recovering uranium, and in particular, consideration is given to volume reduction of waste containing silicon dioxide components such as used filter media and containing uranium components. Not.
[0010]
The present invention has been made in view of the above-described circumstances, and has as its object to efficiently reduce the volume of waste containing a silicon dioxide component and a uranium component.
[0011]
[Means for Solving the Problems]
In order to achieve the above object, in the waste volume reducing method according to claim 1 of the present invention, hydrogen fluoride gas is added to waste containing a silicon dioxide component and a uranium component at a temperature of about 400 to 700K. The gas is blown to produce gaseous silicon tetrafluoride, which is collected and the silicon dioxide component is removed from the waste.
[0012]
In the waste volume reducing method according to the second aspect of the present invention, water is sprayed on the collected silicon tetrafluoride to generate silicate sludge.
[0013]
In the waste volume reduction method according to claim 3 of the present invention, uranium is reduced by heating the waste residue after collecting the silicon tetrafluoride to an atmosphere at a temperature of about 400 K or more, and halogen is added to the waste residue. A gas is blown to generate gaseous uranium halide and a residue, the gaseous uranium halide is collected, and water is sprayed on the uranium halide to generate a uranium halide oxide.
[0014]
In the waste volume reducing method according to claim 4 of the present invention, the waste residue after collecting the silicon tetrafluoride is heated to an atmosphere of about 400 K or more to reduce uranium, and the waste residue is halogenated. The gas is blown to produce gaseous uranium halide and a residue, the gaseous uranium halide is collected and the uranium halide is cooled to form a uranium halide solid.
[0015]
In the waste volume reducing method according to the first aspect of the present invention, hydrogen fluoride gas is blown into the waste to cause the silicon dioxide component in the waste to react with the hydrogen fluoride gas, thereby forming a gas phase. And selectively recovering the silicon component from the waste.
[0016]
In the waste volume reducing method according to claim 2 of the present invention, water is reacted with silicon tetrafluoride in a gas phase to generate silicate sludge, and a silicon component is selectively recovered from waste. .
[0017]
In the waste volume reducing method according to the third aspect of the present invention, the halogen gas is blown into the waste residue after removing the silicon dioxide component, whereby the uranium component in the waste is reacted with the halogen gas. After the uranium halide in the gas phase is generated, the uranium halide in the gas phase is reacted with water to generate a uranium halide oxide, and the uranium component is selectively recovered from the waste residue.
[0018]
In the waste volume reducing method according to claim 4 of the present invention, halogen gas is blown into the waste residue after removing the silicon dioxide component, so that the uranium component in the waste is reacted with the halogen gas. After the uranium halide in the gas phase is generated, the uranium halide in the gas phase is cooled to form a uranium halide solid, and the uranium component is selectively recovered from the waste residue.
[0019]
BEST MODE FOR CARRYING OUT THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
[0020]
1 and 2 show a first example of the waste volume reducing method of the present invention.
[0021]
In this waste volume reduction method, a reaction vessel 2 into which a waste 1 containing a silicon dioxide component and a uranium component can be charged, a gas filling container 3 and a scrubber 4 for collecting a silicon component, and a gas filling container for collecting a uranium component Use is made of a volume-reducing treatment facility including a container 5 and a scrubber 6.
[0022]
The waste 1 is made of silicon dioxide, such as filter media with uranium components attached thereto, diatomaceous earth containing uranium components after use as a filter aid, silica precipitates containing uranium components, or silicon dioxide incinerated ash. Ingredients make up the majority.
[0023]
The reaction vessel 2 has a heater (not shown) for heating the space into which the waste 1 is charged to a predetermined temperature atmosphere.
[0024]
The gas filling container 3 is filled with hydrogen fluoride gas (HF) 7.
[0025]
The gas discharge port of the gas-filled container 3 and the inside of the reaction container 2 have a valve 8 at an intermediate portion and are configured such that the downstream end in the gas flow direction can communicate with a pipe 9 passing through the bottom of the reaction container 2. Have been.
[0026]
The scrubber 4 has a product gas inlet, a purified gas outlet, and a water supply port.
[0027]
The product gas inlet of the scrubber 4 and the inside of the reaction vessel 2 are configured such that they have a valve 10 at an intermediate portion and that the upstream end in the gas flow direction can be communicated by a pipe 11 penetrating the top of the reaction vessel 2. ing.
[0028]
Further, a pipe 13 connected to an exhaust gas treatment facility via a condenser 12 for removing liquid components is connected to a purified gas outlet of the scrubber 4.
[0029]
Further, a pipe 15 connected to a water supply main pipe (not shown) via a valve 14 is connected to a water supply port of the scrubber 4.
[0030]
The gas filling container 5 is filled with a halogen gas 16 such as chlorine (Cl), fluorine (F), and chlorine fluoride (ClF 3 ).
[0031]
The gas discharge port of the gas-filled container 5 and the inside of the reaction vessel 2 have a valve 17 at an intermediate portion, and a downstream end in the gas flow direction can be communicated with a pipe 18 passing through the bottom of the reaction vessel 2. Have been.
[0032]
The scrubber 6 has a product gas inlet, a purified gas outlet, and a water supply port.
[0033]
The product gas inlet of the scrubber 6 and the inside of the reaction vessel 2 are configured such that a valve 19 is provided at an intermediate portion and the upstream end in the gas flow direction can be communicated by a pipe 20 penetrating the top of the reaction vessel 2. ing.
[0034]
Further, a pipe 22 connected to an exhaust gas treatment facility via a condenser 21 for removing liquid components is connected to a purified gas outlet of the scrubber 6.
[0035]
Further, a pipe 24 connected to a water supply main pipe (not shown) via a valve 23 is connected to a water supply port of the scrubber 6.
[0036]
When the volume of the waste 1 is reduced, as shown in FIG. 1, after the waste 1 is charged into the reaction vessel 2, the temperature of the space in which the waste 1 is charged by the heater attached to the reaction vessel 2. The atmosphere is set at about (1000 / 2.50)-(1000 / 1.43) K, that is, about 400-700K.
[0037]
Next, the valve 8 of the pipe 9 is opened, and the hydrogen fluoride gas 7 is fed from the gas filling container 3 to the inside of the reaction container 2 to generate gaseous silicon tetrafluoride (SiF 4 ) 25.
[0038]
At this time, due to the inflow of the hydrogen fluoride gas 7, the waste 1 inside the reaction vessel 2 flows, and the production of silicon tetrafluoride 25 is promoted.
[0039]
In the reaction vessel 2, the fluorine component and the uranium component react to produce a uranium tetrafluoride (UF 4 ) component. As shown in FIG. Since it exhibits a higher vapor pressure P, the silicon dioxide component can be selectively collected from the waste 1 while suppressing volatilization of the uranium tetrafluoride component.
[0040]
Further, after closing the valve 8, the valve 10 in the pipe 11 is opened to introduce the gaseous silicon tetrafluoride 25 into the scrubber 4, and at the same time, the valve 14 in the pipe 15 is opened to introduce water into the scrubber 4. 26 is sprayed to produce silicate sludge 27.
[0041]
The gas 28 sent out from the scrubber 4 has its liquid removed by the condenser 12 and then flows into the exhaust treatment facility through the pipe 13.
[0042]
As described above, since the silicon component contained in the waste 1 is recovered as the silicate sludge 27 as the clearance waste, the volume of the waste 1 can be reduced.
[0043]
When the above-described gas-phase silicon tetrafluoride 25 is generated and when the silicate sludge 27 is generated, the valves 17, 19, and 23 of the pipes 18, 20, and 24 are closed.
[0044]
Thereafter, the valves 8, 10, and 14 are closed, and as shown in FIG. 2, the temperature atmosphere of the space inside the reaction vessel 2 in which the waste residue 29 containing the uranium component remains is attached to the reaction vessel 2. The heater is set to about (1000 / 1.43) K, that is, about 700K or more, to reduce the uranium component.
[0045]
Further, the uranium tetrafluoride component generated at the same time as the generation of the silicon tetrafluoride 25 (see FIG. 1) and contained in the waste residue 29 is volatilized.
[0046]
Next, the valve 17 of the pipe 18 is opened, the halogen gas 16 is fed from the gas filling vessel 5 into the reaction vessel 2, and the gaseous uranium halide 31 and the residue 32 are generated from the waste residue 29.
[0047]
Since the uranium halide 31 is generated according to the composition of the halogen gas 16, uranium chloride is generated when the halogen gas 16 is chlorine-based, and uranium fluoride is generated when the halogen gas 16 is fluorine-based. Is done.
[0048]
At this time, due to the inflow of the halogen gas 16, the waste residue 29 inside the reaction vessel 2 flows, and the generation of the uranium halide 31 is promoted.
[0049]
Furthermore, after closing the valve 17, the valve 19 of the line 20 is opened to introduce the gas phase uranium halide 31 into the scrubber 6, and at the same time, the valve 23 of the line 24 is opened to enter the scrubber 6. Water 26 is sprayed to produce uranium halide oxide 33.
[0050]
The gas 34 sent out from the scrubber 6 has its liquid removed by the condenser 21 and then flows into the exhaust treatment facility through the pipe 22.
[0051]
As described above, the uranium component contained in the waste residue 29 after selectively removing the silicon dioxide component from the waste 1 (see FIG. 1) is recovered as a reusable halogenated uranium oxide 33. In addition, the volume of the waste 1 can be reduced.
[0052]
In addition, when the uranium component is recovered, the valve 10 is closed, so that the particles containing the uranium component do not enter the pipe line 13 incorporating the scrubber 4 and the condenser 12, and the radiation inside the pipe 13 is removed. An increase in the amount can be suppressed.
[0053]
FIGS. 3 and 4 show a second example of the waste volume reducing method of the present invention. In the drawings, the portions denoted by the same reference numerals as those in FIGS. 1 and 2 represent the same items.
[0054]
In this waste volume reduction method, a reaction container 2 into which a waste 1 containing a silicon dioxide component and a uranium component can be charged, a gas filling container 3 and a scrubber 4 for recovering a silicon component, and a cooler for recovering a uranium component 35 is used.
[0055]
The cooler 35 has a product gas inlet and cools the gas flowing into the inside from the inlet.
[0056]
The product gas inlet of the cooler 35 and the inside of the reaction vessel 2 have a valve 36 at an intermediate portion and are configured such that the upstream end in the gas flow direction can communicate with a pipe 37 passing through the top of the reaction vessel 2. Have been.
[0057]
When the volume of the waste 1 is reduced, as shown in FIG. 3, after the waste 1 is charged into the reaction vessel 2, the reaction vessel 2 into which the waste 1 is charged by the heater attached to the reaction vessel 2. The temperature atmosphere of the inner space is set to about (1000 / 2.50) to (1000 / 1.43) K, that is, about 400 to 700K.
[0058]
Next, as in the case of the waste volume reducing method described with reference to FIGS. Then, silicon tetrafluoride (SiF 4 ) 25 in a gas phase is generated, the silicon tetrafluoride 25 is introduced into the scrubber 4, and water 26 is sprayed into the scrubber 4 to generate a silicate sludge 27.
[0059]
As described above, since the silicon component contained in the waste 1 is recovered as the silicate sludge 27 as the clearance waste, the volume of the waste 1 can be reduced.
[0060]
When the above-described gas-phase silicon tetrafluoride 25 is generated and when the silicate sludge 27 is generated, the valves 17 and 36 of the pipes 18 and 37 are closed.
[0061]
Thereafter, the valves 8, 10, and 14 are closed, and as shown in FIG. 4, the temperature atmosphere in the space inside the reaction vessel 2 in which the waste residue 29 containing the uranium component remains is attached to the reaction vessel 2. The temperature is set to about (1000 / 1.43) K, that is, about 700K or more by the heater to reduce the uranium component.
[0062]
Further, the uranium tetrafluoride component generated at the same time as the generation of the silicon tetrafluoride 25 (see FIG. 3) and contained in the waste residue 29 is volatilized.
[0063]
Next, the valve 17 of the conduit 18 is opened, and the halogen gas 16 is fed from the gas filling container 5 into the reaction container 2, thereby generating a uranium halide 31 and a residue 32 in a gas phase.
[0064]
Further, the valve 17 is closed, and the valve 36 of the conduit 37 is opened. The uranium halide 31 in the gas phase is introduced into the cooler 35 and cooled to form a uranium halide solid 38.
[0065]
As described above, the uranium component contained in the waste residue 29 after selectively removing the silicon dioxide component from the waste 1 (see FIG. 3) is recovered as a reusable uranium halide solid 38. The volume of the waste 1 can be reduced.
[0066]
Note that the waste volume reducing method of the present invention is not limited to the above-described embodiment, and it goes without saying that changes can be made without departing from the spirit of the present invention.
[0067]
【The invention's effect】
As described above, according to the waste volume reducing method of the present invention, the following excellent effects can be obtained.
[0068]
(1) In the waste volume reducing method according to claim 1 of the present invention, hydrogen fluoride gas is blown into the waste, and the silicon dioxide component contained in the waste is reacted with the hydrogen fluoride gas. Since silicon tetrafluoride in the gas phase is generated and the silicon component is selectively recovered from the waste, the volume of the waste can be reduced efficiently.
[0069]
(2) In the waste volume reduction method according to the second aspect of the present invention, water is reacted with silicon tetrafluoride in a gas phase to generate silicate sludge, and a silicon component is selectively extracted from the waste. The waste can be efficiently reduced in volume.
[0070]
(3) In the waste volume reducing method according to the third aspect of the present invention, the halogen gas is blown into the waste residue after the silicon dioxide component has been removed, and the halogen gas is introduced into the uranium component contained in the waste material. To produce gaseous uranium halide, and then reacting the uranium halide with water to produce a uranium halide oxide and recovering a uranium component from a waste residue. Further, the volume can be reduced more efficiently, and uranium can be reused.
[0071]
(4) In the waste volume reducing method according to the fourth aspect of the present invention, the halogen gas is blown into the waste residue after the silicon dioxide component has been removed, and the halogen gas is introduced into the uranium component contained in the waste material. To produce uranium halide in the gas phase, and then cooling the uranium halide to form a uranium halide solid and recovering the uranium component from the waste residue. Volume can be reduced, and uranium can be reused.
[Brief description of the drawings]
FIG. 1 is a conceptual diagram showing a state in which a silicon component is recovered in a first example of the waste volume reducing method of the present invention.
FIG. 2 is a conceptual diagram showing a state in which a uranium component is recovered in a first example of the waste volume reducing method of the present invention.
FIG. 3 is a conceptual diagram showing a state in which a silicon component is recovered in a second example of the waste volume reducing method of the present invention.
FIG. 4 is a conceptual diagram showing a state in which uranium components are being recovered in a second example of the waste volume reducing method of the present invention.
FIG. 5 is a diagram showing a relationship between a vapor pressure of a silicon tetrafluoride component and a uranium tetrafluoride component and temperature.
[Explanation of symbols]
REFERENCE SIGNS LIST 1 waste 7 hydrogen fluoride gas 16 halogen gas 25 silicon tetrafluoride 26 water 27 silicate sludge 29 waste residue 31 uranium halide 32 residue 33 uranium halide oxide 38 uranium halide solid

Claims (4)

約４００〜７００Ｋの温度雰囲気で、二酸化ケイ素成分及びウラン成分を含んだ廃棄物にフッ化水素ガスを吹き込んで気相の四フッ化ケイ素を生成し、該四フッ化ケイ素を収集して廃棄物中から二酸化ケイ素成分を取り除くことを特徴とする廃棄物減容方法。In a temperature atmosphere of about 400 to 700K, hydrogen fluoride gas is blown into a waste containing a silicon dioxide component and a uranium component to generate gaseous silicon tetrafluoride, and the silicon tetrafluoride is collected and collected. A waste volume reducing method comprising removing a silicon dioxide component from the inside. 収集した四フッ化ケイ素に水を噴霧して、ケイ酸塩スラッジを生成する請求項１に記載の廃棄物減容方法。The waste volume reducing method according to claim 1, wherein water is sprayed on the collected silicon tetrafluoride to produce silicate sludge. 四フッ化ケイ素を収集した後の廃棄物残渣を、約７００Ｋ以上の温度雰囲気に加熱してウランを還元し、廃棄物残渣にハロゲンガスを吹き込んで、気相のハロゲン化ウランと残渣を生成し、気相のハロゲン化ウランを収集し且つ当該ハロゲン化ウランに水を噴霧してハロゲン化ウラン酸化物を生成する請求項２の記載の廃棄物減容方法。The waste residue after collecting the silicon tetrafluoride is heated to an atmosphere of about 700K or more to reduce uranium, and a halogen gas is blown into the waste residue to produce gaseous uranium halide and the residue. 3. The method for reducing waste volume according to claim 2, wherein the uranium halide in the gas phase is collected and the uranium halide is sprayed with water to produce a uranium halide oxide. 四フッ化ケイ素を収集した後の廃棄物残渣を、約７００Ｋ以上の温度雰囲気に加熱してウランを還元し、廃棄物残渣にハロゲンガスを吹き込んで、気相のハロゲン化ウランと残渣を生成し、気相のハロゲン化ウランを収集し且つ当該ハロゲン化ウランを冷却して、ハロゲン化ウラン固体を形成させる請求項２に記載の廃棄物減容方法。The waste residue after collecting the silicon tetrafluoride is heated to an atmosphere of about 700K or more to reduce uranium, and a halogen gas is blown into the waste residue to produce gaseous uranium halide and the residue. The method of claim 2, wherein the uranium halide in the gas phase is collected and the uranium halide is cooled to form a uranium halide solid.
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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008116245A (en) * 2006-11-01 2008-05-22 Radioactive Waste Management Funding & Research Center Decontamination method and facility for uranium waste
JP2010249680A (en) * 2009-04-16 2010-11-04 Mitsubishi Nuclear Fuel Co Ltd Method for treating radioactive solid waste composed mainly of silica ingredient
WO2013019082A2 (en) * 2011-08-04 2013-02-07 주식회사 케이씨씨 Continuous production method for silicon tetrafluoride using silica and hydrogen fluoride

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008116245A (en) * 2006-11-01 2008-05-22 Radioactive Waste Management Funding & Research Center Decontamination method and facility for uranium waste
JP2010249680A (en) * 2009-04-16 2010-11-04 Mitsubishi Nuclear Fuel Co Ltd Method for treating radioactive solid waste composed mainly of silica ingredient
WO2013019082A2 (en) * 2011-08-04 2013-02-07 주식회사 케이씨씨 Continuous production method for silicon tetrafluoride using silica and hydrogen fluoride
WO2013019082A3 (en) * 2011-08-04 2013-06-13 주식회사 케이씨씨 Continuous production method for silicon tetrafluoride using silica and hydrogen fluoride

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