WO2013019082A3 - Continuous production method for silicon tetrafluoride using silica and hydrogen fluoride - Google Patents

Continuous production method for silicon tetrafluoride using silica and hydrogen fluoride Download PDF

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Publication number
WO2013019082A3
WO2013019082A3 PCT/KR2012/006174 KR2012006174W WO2013019082A3 WO 2013019082 A3 WO2013019082 A3 WO 2013019082A3 KR 2012006174 W KR2012006174 W KR 2012006174W WO 2013019082 A3 WO2013019082 A3 WO 2013019082A3
Authority
WO
WIPO (PCT)
Prior art keywords
silica
hydrogen fluoride
silicon tetrafluoride
production method
continuous production
Prior art date
Application number
PCT/KR2012/006174
Other languages
French (fr)
Korean (ko)
Other versions
WO2013019082A2 (en
Inventor
강경훈
조연석
임태욱
김지혜
Original Assignee
주식회사 케이씨씨
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 케이씨씨 filed Critical 주식회사 케이씨씨
Publication of WO2013019082A2 publication Critical patent/WO2013019082A2/en
Publication of WO2013019082A3 publication Critical patent/WO2013019082A3/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/08Compounds containing halogen
    • C01B33/107Halogenated silanes
    • C01B33/10705Tetrafluoride
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/08Compounds containing halogen
    • C01B33/107Halogenated silanes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J15/00Chemical processes in general for reacting gaseous media with non-particulate solids, e.g. sheet material; Apparatus specially adapted therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Silicon Compounds (AREA)

Abstract

The present invention relates to a continuous production method for silicon tetrafluoride (SiF4) using silica (SiO2) and hydrogen fluoride (HF), and, more specifically, relates to a continuous production method for silicon tetrafluoride, wherein silica and hydrogen fluoride (HF) are reacted by filling a bed reactor with crystalline or amorphous silica in the solid state and blowing hydrogen fluoride gas directly therein, such that it is possible to continuously produce silicon tetrafluoride in a high yield, and it is possible to use diverse forms of silica as raw materials and hence it is possible to ensure relatively economic operation.
PCT/KR2012/006174 2011-08-04 2012-08-02 Continuous production method for silicon tetrafluoride using silica and hydrogen fluoride WO2013019082A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020110077661A KR20130015596A (en) 2011-08-04 2011-08-04 Method of continuously producing tetrafluorosilane by using silica and hydrogen fluoride
KR10-2011-0077661 2011-08-04

Publications (2)

Publication Number Publication Date
WO2013019082A2 WO2013019082A2 (en) 2013-02-07
WO2013019082A3 true WO2013019082A3 (en) 2013-06-13

Family

ID=47629812

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2012/006174 WO2013019082A2 (en) 2011-08-04 2012-08-02 Continuous production method for silicon tetrafluoride using silica and hydrogen fluoride

Country Status (2)

Country Link
KR (1) KR20130015596A (en)
WO (1) WO2013019082A2 (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4382071A (en) * 1980-07-02 1983-05-03 Central Glass Company, Limited Process of preparing silicon tetrafluoride by using hydrogen fluoride gas
JP2002114534A (en) * 2000-09-29 2002-04-16 Hitachi Cable Ltd Method for producing preform for optical fiber and apparatus therefor
JP2004093445A (en) * 2002-09-02 2004-03-25 Ishikawajima Harima Heavy Ind Co Ltd Waste volume decreasing method
KR20080070813A (en) * 2005-10-03 2008-07-31 스텔라 케미파 가부시키가이샤 Process for production of silicon tetrafluoride, and apparatus for the process

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4382071A (en) * 1980-07-02 1983-05-03 Central Glass Company, Limited Process of preparing silicon tetrafluoride by using hydrogen fluoride gas
JP2002114534A (en) * 2000-09-29 2002-04-16 Hitachi Cable Ltd Method for producing preform for optical fiber and apparatus therefor
JP2004093445A (en) * 2002-09-02 2004-03-25 Ishikawajima Harima Heavy Ind Co Ltd Waste volume decreasing method
KR20080070813A (en) * 2005-10-03 2008-07-31 스텔라 케미파 가부시키가이샤 Process for production of silicon tetrafluoride, and apparatus for the process

Also Published As

Publication number Publication date
KR20130015596A (en) 2013-02-14
WO2013019082A2 (en) 2013-02-07

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