JP6382175B2 - Raw material vaporization supply apparatus and raw material vaporization supply method - Google Patents

Description

  The present invention relates to a raw material vaporization supply apparatus and a raw material vaporization supply method.

Conventionally, a manufacturing process is known in which a liquid raw material is vaporized and the vaporized raw material is chemically reacted. For example, in an optical fiber manufacturing process, a liquid raw material such as silicon tetrachloride (SiCl ₄ ) or germanium tetrachloride (GeCl ₄ ) is vaporized, and the vaporized raw material is subjected to a flame hydrolysis reaction with a burner to generate glass particles. The process is being performed.

  In the step of producing the glass fine particles, in order to supply a raw material in a liquid phase at normal temperature and pressure to a supply device such as a burner, the raw material container containing the raw material may be heated to vaporize the raw material. Has been done. In addition, in order to supply the vaporized raw material in the raw material container to the supply apparatus in a gas phase state, the piping and the apparatus from the raw material container to the raw material supply apparatus are heated and temperature-controlled. Yes. This is because even a part of the supply line from the raw material container to the apparatus to be supplied is below the boiling point, the gas phase state of the raw material cannot be maintained.

JP 2004-161555 A

  However, with the increase in size of equipment, it is becoming difficult to maintain the entire length of the supply line from the raw material container to the supply target apparatus at a high temperature. Then, the trial which lowers the temperature which a raw material vaporizes by providing a pressure reduction pump between a vaporization container and a to-be-supplied apparatus, and depressurizing a vaporization container is proposed (refer patent document 1). However, adding a device between the vaporization container and the supply target device may cause a new problem. For example, when a device such as a pump is added between the vaporization container and the supply target device, the raw material may be contaminated by the device. In addition, by providing a device that affects the air flow of the vaporized raw material, there is a possibility that the raw material may locally aggregate at that location, and it may be necessary to heat the supply line more than the boiling point of the raw material.

  The present invention has been made in view of the above, and an object thereof is to provide a raw material vaporizing and supplying apparatus and a raw material that do not excessively heat the supply line in comparison with the standard boiling point of the raw material and that cause less contamination of the raw material. It is to provide a vaporization supply method.

  In order to solve the above-described problems and achieve the object, a raw material vaporization supply apparatus according to one aspect of the present invention is a raw material vaporization supply apparatus that supplies a liquid phase raw material to a supply apparatus in a state of vaporization at room temperature and normal pressure. The raw material container for storing the liquid phase raw material, the heater for heating the raw material stored in the raw material container, and the raw material vaporized by the heater from the raw material container to the apparatus to be supplied A supply line for supplying, a decompressor for decompressing the inside of the raw material container, and a decompression line equipped with the decompressor, wherein the decompression line is provided separately from the supply line It is characterized by.

  Further, in the raw material vaporization supply device according to one aspect of the present invention, a heat insulating portion that blocks heat from the heater is provided in the vicinity of the suction port for sucking the gas in the raw material container of the decompression line. It is characterized by that.

  The raw material vaporization supply apparatus according to one aspect of the present invention is characterized in that the decompression line is provided with a cooler for cooling the decompression line.

  In the raw material vaporization supply apparatus according to one aspect of the present invention, the inside of the raw material container is depressurized by the decompressor to a pressure lower than atmospheric pressure and higher than the inside of the supply target apparatus. It is characterized by that.

  The raw material vaporization supply method according to one embodiment of the present invention is a raw material vaporization supply method for supplying a liquid phase raw material to a supply apparatus in a state where the liquid phase raw material is vaporized at room temperature and normal pressure, and the liquid phase raw material is accommodated. A pressure reducing step for reducing the pressure inside the raw material container via a pressure reducing line; a heating step for heating the raw material to a temperature higher than the boiling point of the raw material at the pressure reduced in the pressure reducing step; and the pressure reducing line; And a supply step of supplying the raw material vaporized in the heating step to the supply target device through a separately provided supply line.

  The raw material vaporization supply method according to an aspect of the present invention further includes a recovery step of recovering at least a part of the raw material sucked into the decompression line.

  Further, in the raw material vaporization supply method according to one aspect of the present invention, in the decompression step, the inside of the raw material container is decompressed to a pressure lower than the atmospheric pressure and higher than the inside of the supplied apparatus. Features.

  The raw material vaporization supply apparatus and the raw material vaporization supply method according to the present invention have an effect that the supply line is not excessively heated in comparison with the standard boiling point of the raw material and the contamination of the raw material is small.

FIG. 1 is a diagram schematically illustrating a configuration example of a manufacturing facility to which a raw material vaporization supply apparatus and a raw material vaporization supply method according to an embodiment of the present invention are applied. FIG. 2 is a diagram illustrating a schematic configuration of the material vaporization supply apparatus according to the first embodiment. FIG. 3 is a diagram illustrating a schematic configuration of a raw material vaporization supply apparatus according to the second embodiment. FIG. 4 is a graph showing the vapor pressure of silicon tetrachloride.

  Hereinafter, a raw material vaporization supply apparatus and a raw material vaporization supply method according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings. Note that the present invention is not limited to the embodiments described below. It should be noted that the drawings are schematic, and the relationship between the dimensions of each element, the ratio of each element, and the like may differ from the actual situation. Even between the drawings, there are cases in which portions having different dimensional relationships and ratios are included.

  FIG. 1 is a diagram schematically illustrating a configuration example of a manufacturing facility to which a raw material vaporization supply apparatus and a raw material vaporization supply method according to an embodiment of the present invention are applied. As shown in FIG. 1, the manufacturing facility 100 includes a raw material vaporization supply device 10, a mass flow controller 20, a supply target device 30, and a gas purification device 40. The production facility 100 is a facility for supplying a liquid phase raw material to the supply target device 30 in a vaporized state via the supply line 12 at a normal temperature and normal pressure housed in a raw material container 11 provided in the raw material vaporization supply device 10. is there. The configuration example of the manufacturing facility 100 shown in FIG. 1 assumes a facility for manufacturing a porous base material called a soot, which is a part of the optical fiber manufacturing process. Manufacturing equipment to which the raw material vaporization supply apparatus and raw material vaporization supply method according to the embodiment are applied is not limited to the equipment of this configuration.

  The configuration of the raw material vaporization supply apparatus 10 illustrated in FIG. 1 is only a basic configuration of the configuration of the raw material vaporization supply apparatus 10, and details will be described later with reference to the detailed drawings. As shown in FIG. 1, the raw material vaporization supply apparatus 10 includes a raw material container 11 for storing a liquid phase raw material at room temperature and normal pressure, and a supply of the vaporized raw material from the raw material container 11 to the supply target device 30. A supply line 12, a decompressor 14 for decompressing the inside of the raw material container 11, and a decompression line 13 including the decompressor 14 are provided. Further, the raw material container 11 is provided with a first heater 51 for heating the raw material, and the decompression line 13 is provided separately from the supply line 12.

  The raw material container 11 has a high sealing property so that the vaporized raw material does not leak out, and has a strength that can withstand the pressure reduction by the pressure reducer 14. Although the raw material accommodated in the raw material container 11 can be appropriately selected depending on the manufacturing equipment to which the raw material vaporization supply apparatus 10 is applied, for example, when applied to the soot manufacturing equipment, silicon tetrachloride or germanium tetrachloride is used. And octamethylcyclotetrasiloxane are envisaged. When silicon tetrachloride or germanium tetrachloride is used as the raw material, the first heater 51 provided in the raw material container 11 is preferably a heater capable of heating the raw material up to about 100 ° C. When tetrasiloxane is used, it is preferable to use a heater capable of heating the raw material up to about 200 ° C. Moreover, it is preferable that the raw material container 11 has the intensity | strength which can be pressure-reduced to about 0.1 atmosphere.

  The supply line 12 is a line for supplying the vaporized raw material to the supplied device 30, and a second heater 52 for appropriately maintaining the mass flow controller 20 and the raw material container 11 to the supplied device 30 at a high temperature. And are provided. In addition, it is preferable that the supply line 12 is configured not only to be heated by the second heater 52 but also to protect the supply line 12 with a heat insulating material so that heat from the supply line 12 is not released. In addition, the second heater 52 heats not only the supply line 12 but also the mass flow controller 20, and appropriately maintains the mass flow controller 20 at a high temperature so that the raw material does not aggregate in the mass flow controller 20.

  Depending on the application of the manufacturing facility 100, the supplied apparatus 30 includes not only the raw material supplied from the raw material vaporization supply apparatus 10, but also the raw material supplied from a separate raw material vaporization supply apparatus, dilution gas such as argon, and combustion Combustion gas that supports the above, dopants added to the glass base material to be manufactured, and the like can also be supplied. The supply line 12 is appropriately provided with a merging point for merging the supplies from these supply devices.

  The decompression line 13 leads to a decompressor 14 for decompressing the inside of the raw material container 11. The decompressor 14 is a vacuum pump, for example, and decompresses the inside of the raw material container 11 to a pressure lower than the atmospheric pressure by sucking the gas inside the raw material container 11 through the decompression line 13. As a result, the raw material vaporized inside the raw material container 11 is also sucked into the decompression line 13, but by collecting at least a part of the raw material sucked into the decompression line 13 by a configuration as illustrated later, The raw material discharged from the decompression line 13 is configured to be reduced.

  The mass flow controller 20 is a control device that is provided in the middle of the supply line 12 and controls the mass flow rate of the raw material that flows through the supply line 12. The mass flow controller 20 includes a mass flow meter that measures the mass flow rate, and an electromagnetic valve that automatically adjusts the opening degree based on the measurement result of the mass flow meter. Various mass flow controllers exist depending on the type of the mass flow meter and the valve, but can be appropriately selected and used depending on the type of raw material flowing through the supply line 12 and the application using the raw material.

  The supplied apparatus 30 is, for example, a reaction vessel, and when applied to a soot production facility used for producing an optical fiber, a raw material such as silicon tetrachloride or germanium tetrachloride is subjected to a flame hydrolysis reaction with a burner in the reaction vessel. Glass fine particles are generated, and the generated glass fine particles are deposited to form soot P. The supplied device 30 includes a burner 31 to which raw materials are supplied via the supply line 12.

  A gas purification device 40 is connected to the supplied device 30 via a suction pump 41. The gas purification device 40 is a so-called scrubber, which collects glass particles floating inside the supplied device 30 and purifies the inside of the supplied device 30. All of the glass particles generated by the burner 31 are not necessarily deposited on the soot P. Therefore, it is necessary to remove the glass fine particles not deposited on the soot P from the supply apparatus 30.

  The suction pump 41 has a function of reducing the pressure inside the supplied device 30 as well as a function of sucking the glass fine particles floating inside the supplied device 30 and sending the glass fine particles to the glass fine particles. . Specifically, the suction pump 41 reduces the pressure inside the supplied apparatus 30 to a pressure lower than the inside of the raw material container 11. In this way, by setting the pressure inside the apparatus to be supplied 30 to be lower than that inside the raw material container 11, the pressure on the outlet side is lower than the inlet side of the mass flow controller 20 in the supply line 12, and the mass flow controller 20 The pressure difference is ensured to function stably. In the above description, the decompression conditions are described with the suction pump 41 as the main component. However, if the decompression conditions are described with the decompressor 14 as the main component, the pressure inside the raw material container 11 is higher than the interior of the apparatus to be supplied 30. It will be decompressed.

As described above, the decompressor 14 decompresses the inside of the raw material container 11 to a pressure lower than the atmospheric pressure. Further, the decompressor 14 depressurizes the inside of the raw material container 11 to a pressure higher than the inside of the supply target device 30. Therefore, when the atmospheric pressure is P ₀ , the pressure inside the raw material container 11 is P _1, and the inside of the apparatus to be supplied 30 is P ₂ , the decompressor 14 satisfies the following relational expression. It is preferable to reduce the pressure inside 11.
P ₂ <P ₁ <P ₀

(First embodiment)
FIG. 2 is a diagram illustrating a schematic configuration of the raw material vaporizer 10a according to the first embodiment. As shown in FIG. 2, the raw material vaporization supply device 10 a includes a raw material container 11 for storing a liquid phase raw material at room temperature and normal pressure, and a supply line 12 for supplying the vaporized raw material to the supply target device 30. And a decompression line 13 leading to a decompressor 14 for decompressing the inside of the raw material container 11. The raw material container 11 is provided with a first heater 51 for heating the raw material.

The pressure reducer 14 reduces the pressure inside the raw material container 11 via the pressure reduction line 13, and the first heater 51 supplies the raw material to a temperature higher than the boiling point of the raw material at the pressure reduced by the pressure reducer 14. Heat. Then, the raw material S _L of the liquid phase, phase transferred to raw material S _V of the gas phase by vaporization, so that the accumulated above the raw material container 11. The suction port 12 a of the supply line 12 is provided above the raw material container 11 so that the gas in the raw material container 11 can be sucked, and the vaporized raw material is supplied to the supply target device 30.

Furthermore, in the raw material vaporization supply apparatus 10 a according to the first embodiment, a heat insulating portion 15 that blocks heat from the first heater 51 is provided in the vicinity of the suction port 13 a of the decompression line 13. In the vicinity of the suction port 13a of the vacuum line 13, by the heat insulating part 15 blocks the heat from the first heater 51, the raw material S _V of the gas phase is cooled to a temperature lower than the boiling point, the suction port of the vacuum line 13 The raw material aggregates in the vicinity of 13a. Then, to recover the starting material S _L of the aggregate into the liquid phase by return line 16.

  As described above, the heat insulating portion 15 provided in the vicinity of the suction port 13 a of the decompression line 13 can recover at least a part of the raw material sucked into the decompression line 13. In addition, in the area | region where the heat from the 1st heater 51 is interrupted | blocked by the heat insulation part 15, collection | recovery of the raw material attracted | sucked by the decompression line 13 is lengthened by extending path length, such as arrange | positioning the decompression line 13 in a labyrinth form. It is also possible to improve the rate.

(Second Embodiment)
FIG. 3 is a diagram showing a schematic configuration of a raw material vaporizer 10b according to the second embodiment. As shown in FIG. 3, the raw material vaporization supply apparatus 10 b includes a raw material container 11 for storing a liquid phase raw material at room temperature and normal pressure, and a supply line 12 for supplying the vaporized raw material to the supply target device 30. And a decompression line 13 leading to a decompressor 14 for decompressing the inside of the raw material container 11. The raw material container 11 is provided with a first heater 51 for heating the raw material.

The pressure reducer 14 reduces the pressure inside the raw material container 11 via the pressure reduction line 13, and the first heater 51 supplies the raw material to a temperature higher than the boiling point of the raw material at the pressure reduced by the pressure reducer 14. Heat. Then, the raw material S _L of the liquid phase, phase transferred to raw material S _V of the gas phase by vaporization, so that the accumulated above the raw material container 11. The suction port 12 a of the supply line 12 is provided above the raw material container 11 so that the gas in the raw material container 11 can be sucked, and the vaporized raw material is supplied to the supply target device 30.

Furthermore, in the raw material vaporizer 10b according to the second embodiment, a cooler 17 that forcibly cools the decompression line 13 is provided between the suction port 13a of the decompression line 13 and the decompressor 14. The cooler 17 includes, for example, an inlet 17a and an outlet 17b, and forcibly cools the decompression line 13 by circulating a refrigerant from the inlet 17a to the outlet 17b. Material S _V of the gas phase in the vacuum line 13 which is forcibly cooled by the refrigerant is cooled to a lower temperature than the boiling point to agglomerate during the cooler 17. The material S _L of the aggregate into the liquid phase is recovered by return line 17c. Thus, the cooler 17 provided between the suction port 13 a of the decompression line 13 and the decompressor 14 can recover at least a part of the raw material sucked into the decompression line 13.

  In the raw material vaporizer 10b according to the second embodiment, the cooler 17 is provided between the suction port 13a of the decompression line 13 and the decompressor 14, but the decompressor 14 and the cooler 17 are replaced, and the decompressor 14 may be provided between the suction port 13 a of the decompression line 13 and the cooler 17. In this case, it is preferable to provide a purification device in the reflux line 17c.

(First embodiment)
Next, the Example using the raw material vaporization supply apparatus which concerns on embodiment described above is demonstrated.

  The first example is an example in the case where silicon tetrachloride is supplied to the supply target device 30 using the raw material vaporization supply device 10a according to the first embodiment.

  FIG. 4 is a graph showing the vapor pressure of silicon tetrachloride. The graph shown in FIG. 4 shows the relationship between the temperature of silicon tetrachloride and the vapor pressure, with the horizontal axis representing the temperature (° C.) of silicon tetrachloride and the vertical axis representing the vapor pressure (kPa) of silicon tetrachloride. As can be seen from the graph shown in FIG. 4, silicon tetrachloride has a temperature (standard boiling point) at which the vapor pressure becomes equal to the atmospheric pressure (= 101.325 kPa) at 57.6 ° C. Therefore, when the conventional raw material vaporizer is used, for example, it is necessary to set the first heater 51 to 60 ° C. and the second heater 52 to 70 ° C.

On the other hand, when supplied with silicon tetrachloride in the supply device 30 by using the raw material vaporizer supply apparatus 10a according to the first embodiment, reducing the pressure inside of the pressure P ₁ of the raw material container 11 to 80 kPa, inside of the supply device 30 it is possible to depressurize the pressure _{P 2} in 60 kPa. As a result, even if the first heater 51 is set to 55 ° C. and the second heater 52 is set to 60 ° C., the total amount of the raw material in the supply line 12 from the raw material vaporization supply device 10a to the supply target device 30 is It was possible to operate the equipment properly without agglomeration. That is, when silicon tetrachloride is supplied to the supply target device 30 using the raw material vaporization supply apparatus 10a according to the first embodiment, the energy cost is not excessively heated in comparison with the standard boiling point of the raw material. It was shown that can be suppressed. Further, when silicon tetrachloride is supplied to the supply target device 30 using the raw material vaporization supply device 10a according to the first embodiment, it is not necessary to add an unnecessary device in the middle of the supply line 12, so that contamination of the raw material is also caused. Less is suppressed.

(Second embodiment)
2nd Example is an Example at the time of supplying silicon tetrachloride to the to-be-supplied apparatus 30 using the raw material vaporization supply apparatus 10b which concerns on 2nd Embodiment. As described in the first embodiment, when the conventional raw material vaporizer is used, for example, it is necessary to set the first heater 51 to 60 ° C. and the second heater 52 to 70 ° C. was there.

On the other hand, when supplied with silicon tetrachloride in the supply device 30 by using the raw material vaporizer supply apparatus 10b according to the second embodiment, depressurizing the inside of the pressure P ₁ of the raw material container 11 to 40 kPa, inside of the supply device 30 it is possible to depressurize the pressure _{P 2} in 20 kPa. As a result, even if the first heater 51 is set to 45 ° C. and the second heater 52 is set to 50 ° C., the total amount of the raw material in the entire supply line 12 from the raw material vaporization supply device 10b to the supply target device 30 is It was possible to operate the equipment properly without agglomeration. That is, when silicon tetrachloride is supplied to the supply target device 30 using the raw material vaporization supply apparatus 10a according to the second embodiment, the energy cost can be further suppressed as compared with the raw material vaporization supply apparatus 10a according to the first embodiment. It was shown that it can be done.

(Third embodiment)
The third example is an example when germanium tetrachloride is supplied to the supply target device 30 by using the raw material vaporization supply device 10b according to the second embodiment.

  From the graph similar to FIG. 4 showing the relationship between the temperature and vapor pressure of germanium tetrachloride, the temperature (standard boiling point) at which the vapor pressure of germanium tetrachloride becomes equal to the atmospheric pressure (= 101.325 kPa) is 84 ° C. Recognize. Therefore, when the conventional raw material vaporizer is used, for example, the first heater 51 needs to be set to 85 ° C. and the second heater 52 needs to be set to 90 ° C.

On the other hand, when supplied with silicon tetrachloride in the supply device 30 by using the raw material vaporizer supply apparatus 10a according to the second embodiment, depressurizing the inside of the pressure P ₁ of the raw material container 11 to 40 kPa, inside of the supply device 30 it is possible to depressurize the pressure _{P 2} in 20 kPa. As a result, even if the first heater 51 is set to 60 ° C. and the second heater 52 is set to 65 ° C., the total amount of the raw material in the supply line 12 from the raw material vaporization supply device 10a to the supply target device 30 is It was possible to operate the equipment properly without agglomeration. That is, the material vaporization and supply apparatus 10b according to the second embodiment can reduce the energy cost without excessively heating the supply line 12 with respect to the boiling point of the raw material even in germanium tetrachloride having a standard boiling point higher than that of silicon tetrachloride. It was shown that it can be suppressed.

(Fourth embodiment)
The fourth example is an example when octamethylcyclotetrasiloxane is supplied to the supply target device 30 using the raw material vaporization supply device 10a according to the first embodiment.

  From the same graph as FIG. 4 showing the relationship between the temperature and vapor pressure of octamethylcyclotetrasiloxane, the temperature (standard boiling point) at which the vapor pressure of octamethylcyclotetrasiloxane becomes equal to atmospheric pressure (= 101.325 kPa) is 175 ° C. It can be seen that it is. Therefore, when the conventional raw material vaporization supply apparatus is used, for example, the first heater 51 needs to be set to 180 ° C. and the second heater 52 needs to be set to 200 ° C.

On the other hand, when the octamethylcyclotetrasiloxane by using the raw material vaporizer supply apparatus 10a according to the first embodiment is supplied to the supply device 30, reducing the pressure inside of the pressure P ₁ of the raw material container 11 to 10 kPa, the supply device 30 it can be depressurized interior of the pressure _{P 2} of the 9 kPa. As a result, even if the first heater 51 is set to 120 ° C. and the second heater 52 is set to 130 ° C., the total amount of the raw material in the supply line 12 from the raw material vaporization supply device 10a to the supply target device 30 is It was possible to operate the equipment properly without agglomeration. That is, the raw material vaporization and supply apparatus 10a according to the first embodiment, that is, the raw material vaporization and supply apparatus 10b according to the second embodiment is the same as the raw material of octamethylcyclotetrasiloxane having a higher standard boiling point than germanium tetrachloride. In comparison with the standard boiling point, it was shown that the energy cost can be suppressed without excessively heating the supply line 12.

  As mentioned above, although embodiment of this invention was described concretely, this invention is not limited to the above-mentioned embodiment, Various deformation | transformation based on the technical idea of this invention is possible. For example, in the above-described embodiment, a soot production facility that is a part of an optical fiber production process is assumed, and silicon tetrachloride, germanium tetrachloride, and octamethylcyclotetrasiloxane used in this are used as examples of the present invention. Although the embodiment has been described, the same effect can be obtained in general applications in which the liquid phase raw material is vaporized and supplied to the apparatus to be supplied at normal temperature and pressure. Moreover, the numerical value quoted in the above-mentioned embodiment is only an example, and you may use a numerical value different from this as needed. Moreover, what comprised the above-mentioned each component suitably combined is also contained in this invention. Further effects and modifications can be easily derived by those skilled in the art.

DESCRIPTION OF SYMBOLS 100 Manufacturing equipment 10,10a, 10b Raw material vaporization supply apparatus 11 Raw material container 12 Supply line 12a Supply line suction port 13 Decompression line 13a Decompression line suction port 14 Decompression device 15 Heat insulation part 16, 17c Reflux line 17 Cooler 17a Inlet 17b Discharge port 20 Mass flow controller 30 Device to be supplied 40 Gas purification device 41 Suction pump 51 First heater 52 Second heater

Claims (6)

A raw material vaporizing and supplying apparatus that supplies liquid phase raw material to a supplied apparatus in a state of being vaporized at room temperature and normal pressure,
A raw material container for containing the liquid phase raw material;
A heater for heating the raw material contained in the raw material container;
A supply line for supplying the raw material vaporized by the heater from the raw material container to a supply device;
A decompressor for decompressing the inside of the raw material container;
A decompression line comprising the decompressor;
With
The decompression line is provided separately from the supply line,
A raw material vaporization and supply apparatus, wherein a heat insulating portion for blocking heat from the heater is provided in the vicinity of the suction port for sucking the gas in the raw material container of the decompression line.   The raw material vaporization supply apparatus according to claim 1, wherein the decompression line is provided with a cooler that cools the decompression line.   The raw material vaporization according to claim 1 or 2, wherein the inside of the raw material container is depressurized by the decompressor to a pressure lower than atmospheric pressure and higher than the inside of the apparatus to be supplied. Feeding device. A raw material vaporization and supply method for supplying a liquid phase raw material to a supply apparatus in a state of vaporizing a liquid phase raw material at room temperature and normal pressure,
A pressure reducing step of reducing the pressure inside the raw material container containing the liquid phase raw material via a pressure reducing line;
A heating step of heating the raw material with a heater to a temperature higher than the boiling point of the raw material at the pressure reduced in the pressure reduction step;
A supply step of supplying the material vaporized in the heating step to the supply apparatus through a supply line provided separately from the decompression line;
Have
A raw material vaporization and supply method, wherein heat from the heater is shielded by a heat insulating portion provided in the vicinity of an inlet for sucking gas in the raw material container of the decompression line.   The raw material vaporization supply method according to claim 4, further comprising a recovery step of recovering at least a part of the raw material sucked into the decompression line.   6. The raw material vaporization and supply method according to claim 4 or 5, wherein, in the decompression step, the inside of the raw material container is decompressed to a pressure lower than atmospheric pressure and higher than the inside of the supply target device. .

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