JP2004009156A5 - - Google Patents

Download PDF

Info

Publication number
JP2004009156A5
JP2004009156A5 JP2002162142A JP2002162142A JP2004009156A5 JP 2004009156 A5 JP2004009156 A5 JP 2004009156A5 JP 2002162142 A JP2002162142 A JP 2002162142A JP 2002162142 A JP2002162142 A JP 2002162142A JP 2004009156 A5 JP2004009156 A5 JP 2004009156A5
Authority
JP
Japan
Prior art keywords
width
groove
depth
minimum distance
preferable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002162142A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004009156A (ja
JP3849582B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2002162142A external-priority patent/JP3849582B2/ja
Priority to JP2002162142A priority Critical patent/JP3849582B2/ja
Priority to EP03012509A priority patent/EP1369204B1/en
Priority to KR1020030035237A priority patent/KR100669301B1/ko
Priority to US10/449,196 priority patent/US20040014413A1/en
Priority to TW092114938A priority patent/TWI250572B/zh
Priority to DE60308946T priority patent/DE60308946T2/de
Priority to CNB031406815A priority patent/CN100492597C/zh
Publication of JP2004009156A publication Critical patent/JP2004009156A/ja
Publication of JP2004009156A5 publication Critical patent/JP2004009156A5/ja
Publication of JP3849582B2 publication Critical patent/JP3849582B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP2002162142A 2002-06-03 2002-06-03 研磨パッド及び複層型研磨パッド Expired - Lifetime JP3849582B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2002162142A JP3849582B2 (ja) 2002-06-03 2002-06-03 研磨パッド及び複層型研磨パッド
TW092114938A TWI250572B (en) 2002-06-03 2003-06-02 Polishing pad and multi-layer polishing pad
KR1020030035237A KR100669301B1 (ko) 2002-06-03 2003-06-02 연마 패드 및 복층형 연마 패드
US10/449,196 US20040014413A1 (en) 2002-06-03 2003-06-02 Polishing pad and multi-layer polishing pad
EP03012509A EP1369204B1 (en) 2002-06-03 2003-06-02 Polishing pad and process for manufacturing a polishing pad
DE60308946T DE60308946T2 (de) 2002-06-03 2003-06-02 Polierkissen und Verfahren zur Herstellung eines Polierkissens
CNB031406815A CN100492597C (zh) 2002-06-03 2003-06-03 抛光垫及其制备、使用方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002162142A JP3849582B2 (ja) 2002-06-03 2002-06-03 研磨パッド及び複層型研磨パッド

Publications (3)

Publication Number Publication Date
JP2004009156A JP2004009156A (ja) 2004-01-15
JP2004009156A5 true JP2004009156A5 (https=) 2005-05-26
JP3849582B2 JP3849582B2 (ja) 2006-11-22

Family

ID=30430993

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002162142A Expired - Lifetime JP3849582B2 (ja) 2002-06-03 2002-06-03 研磨パッド及び複層型研磨パッド

Country Status (1)

Country Link
JP (1) JP3849582B2 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4616571B2 (ja) * 2004-03-31 2011-01-19 東洋ゴム工業株式会社 研磨パッド
JP2006114885A (ja) * 2004-09-17 2006-04-27 Jsr Corp 化学機械研磨パッド及び化学機械研磨方法
JP3769581B1 (ja) 2005-05-18 2006-04-26 東洋ゴム工業株式会社 研磨パッドおよびその製造方法
KR100721196B1 (ko) * 2005-05-24 2007-05-23 주식회사 하이닉스반도체 연마패드 및 이를 이용한 화학적기계적연마장치
CN102498549A (zh) * 2009-07-16 2012-06-13 嘉柏微电子材料股份公司 沟槽式化学机械抛光抛光垫
US9211628B2 (en) * 2011-01-26 2015-12-15 Nexplanar Corporation Polishing pad with concentric or approximately concentric polygon groove pattern
TWI599447B (zh) * 2013-10-18 2017-09-21 卡博特微電子公司 具有偏移同心溝槽圖樣之邊緣排除區的ｃｍｐ拋光墊
US10625393B2 (en) * 2017-06-08 2020-04-21 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pads having offset circumferential grooves for improved removal rate and polishing uniformity
CN113547450B (zh) * 2021-09-22 2022-01-07 湖北鼎汇微电子材料有限公司 抛光垫、研磨设备及半导体器件的制造方法

Similar Documents

Publication Publication Date Title
USD512811S1 (en) Pair of rally pads
JP2002334587A5 (https=)
JP2004536771A5 (https=)
JP2006505687A5 (https=)
JP2004538039A5 (https=)
ES2165719T3 (es) Utensilio de escritura.
DE60209235D1 (de) Geprägte unterlagsscheibe
DE60325925D1 (de) Polierkissen
JPH09511103A5 (https=)
JP2004009156A5 (https=)
USD473518S1 (en) Power column
DE60202306D1 (de) Mehrscheibenbremsenstrukturasymmetrie
JP2004034319A5 (https=)
AU2003293424A8 (en) File with high-traction surface
DE10196777T1 (de) Plattenlaufwerk-Gleitstück mit Texturierten Pads
DE60132328D1 (de) Bestimmung des minimum- oder des maximumwertes in einem datensatz
USD513610S1 (en) Compact disc player
USD532528S1 (en) Block
JP2004179494A5 (https=)
ATE516919T1 (de) Schleifscheibe
DE60326180D1 (de) Edelstein mit facetten
ITBO20030625A1 (it) "coppo con maggiore capacita' di tenuta pluviale ed eolica".
RU2001132746A (ru) Средство для лечения геморрагической лихорадки с почечным синдромом
ITBA20010036A0 (it) Dispositivo per ottenere un effetto satinato,ovvero superfici levigate e lisce ma non lucide,su materiali litoidi.
ITRM20000535A0 (it) Scarpe con carbone dolce nella soletta.