JP2004004227A5 - - Google Patents
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- JP2004004227A5 JP2004004227A5 JP2002158822A JP2002158822A JP2004004227A5 JP 2004004227 A5 JP2004004227 A5 JP 2004004227A5 JP 2002158822 A JP2002158822 A JP 2002158822A JP 2002158822 A JP2002158822 A JP 2002158822A JP 2004004227 A5 JP2004004227 A5 JP 2004004227A5
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- JP
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- group
- hydrogen atom
- general formula
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Priority Applications (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002158822A JP4018454B2 (ja) | 2002-05-31 | 2002-05-31 | ポジ型レジスト組成物 |
| US10/448,041 US6939662B2 (en) | 2002-05-31 | 2003-05-30 | Positive-working resist composition |
| KR1020030034881A KR100955454B1 (ko) | 2002-05-31 | 2003-05-30 | 포지티브 레지스트 조성물 |
| AT03012142T ATE525676T1 (de) | 2002-05-31 | 2003-06-02 | Positiv arbeitende resistzusammensetzung |
| EP10188667.9A EP2278399B1 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| EP10188665A EP2278397A3 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| EP03012142A EP1367440B1 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| EP10188666A EP2278398A3 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| EP10188668A EP2278400A3 (en) | 2002-05-31 | 2003-06-02 | Positive-working resist composition |
| KR1020090108795A KR100947853B1 (ko) | 2002-05-31 | 2009-11-11 | 포지티브 레지스트 조성물 및 이를 이용한 패턴형성방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002158822A JP4018454B2 (ja) | 2002-05-31 | 2002-05-31 | ポジ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004004227A JP2004004227A (ja) | 2004-01-08 |
| JP2004004227A5 true JP2004004227A5 (US07494231-20090224-C00006.png) | 2005-09-22 |
| JP4018454B2 JP4018454B2 (ja) | 2007-12-05 |
Family
ID=30428864
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002158822A Expired - Fee Related JP4018454B2 (ja) | 2002-05-31 | 2002-05-31 | ポジ型レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4018454B2 (US07494231-20090224-C00006.png) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005275283A (ja) | 2004-03-26 | 2005-10-06 | Fuji Photo Film Co Ltd | 電子線、ｅｕｖ光又はｘ線用ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP4738803B2 (ja) * | 2004-12-14 | 2011-08-03 | 東京応化工業株式会社 | 高分子化合物、ポジ型レジスト組成物、およびレジストパターン形成方法 |
| WO2006129800A1 (ja) * | 2005-06-03 | 2006-12-07 | Daikin Industries, Ltd. | パターン形成用表面処理剤 |
| JP2008268920A (ja) * | 2007-03-28 | 2008-11-06 | Fujifilm Corp | ポジ型レジスト組成物およびパターン形成方法 |
| TWI485517B (zh) | 2007-04-18 | 2015-05-21 | Daikin Ind Ltd | 撥液阻劑組成物 |
| CN102333797B (zh) * | 2009-02-23 | 2014-08-13 | Jsr株式会社 | 化合物、含氟原子聚合物和放射线敏感性树脂组合物 |
| JP5825248B2 (ja) * | 2012-12-12 | 2015-12-02 | 信越化学工業株式会社 | ポジ型レジスト材料並びにこれを用いたパターン形成方法 |
| JP6065942B2 (ja) * | 2015-06-12 | 2017-01-25 | 信越化学工業株式会社 | 高分子化合物 |
| WO2017170167A1 (ja) * | 2016-03-30 | 2017-10-05 | 東京応化工業株式会社 | 表面処理方法、及び表面処理液 |
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2002
- 2002-05-31 JP JP2002158822A patent/JP4018454B2/ja not_active Expired - Fee Related
