JP2003515366A5 - - Google Patents
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- Publication number
- JP2003515366A5 JP2003515366A5 JP2001540572A JP2001540572A JP2003515366A5 JP 2003515366 A5 JP2003515366 A5 JP 2003515366A5 JP 2001540572 A JP2001540572 A JP 2001540572A JP 2001540572 A JP2001540572 A JP 2001540572A JP 2003515366 A5 JP2003515366 A5 JP 2003515366A5
- Authority
- JP
- Japan
- Prior art keywords
- ray
- dose
- voltage
- control signal
- current
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000003745 diagnosis Methods 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP99203923.0 | 1999-11-23 | ||
| EP99203923 | 1999-11-23 | ||
| PCT/EP2000/010727 WO2001039558A1 (en) | 1999-11-23 | 2000-10-30 | X-ray examination apparatus with exposure control |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003515366A JP2003515366A (ja) | 2003-05-07 |
| JP2003515366A5 true JP2003515366A5 (https=) | 2011-01-06 |
| JP4746808B2 JP4746808B2 (ja) | 2011-08-10 |
Family
ID=26075893
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001540572A Expired - Fee Related JP4746808B2 (ja) | 1999-11-23 | 2000-10-30 | 露光制御付きx線診断装置 |
Country Status (2)
| Country | Link |
|---|---|
| EP (1) | EP1151645B1 (https=) |
| JP (1) | JP4746808B2 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1850754B1 (en) * | 2005-02-11 | 2013-11-06 | Koninklijke Philips N.V. | Dose rate control in an x-ray system |
| US9615803B2 (en) | 2014-06-16 | 2017-04-11 | General Electric Company | System and method for determining X-ray exposure parameters |
| US9610057B2 (en) | 2014-06-16 | 2017-04-04 | General Electric Company | System and method for determining X-ray exposure parameters |
| KR101848408B1 (ko) * | 2016-10-14 | 2018-04-16 | 주식회사 뷰웍스 | 디텍터 센서를 이용한 자동 노출 제어 장치 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5262871A (en) * | 1989-11-13 | 1993-11-16 | Rutgers, The State University | Multiple resolution image sensor |
| DE4330787A1 (de) * | 1993-09-10 | 1995-03-23 | Siemens Ag | Verfahren zum Betrieb eines Röntgenbelichtungsautomaten |
| BE1007803A3 (nl) * | 1993-11-26 | 1995-10-24 | Philips Electronics Nv | Beeldopneemapparaat. |
| DE4435105C2 (de) * | 1994-09-30 | 2003-07-24 | Siemens Ag | Röntgendiagnostikeinrichtung mit einem Festkörperbildwandler und Verfahren zu deren Betrieb |
| DE19524857C2 (de) * | 1995-07-07 | 1998-04-09 | Siemens Ag | Bilddetektor |
| US5693948A (en) * | 1995-11-21 | 1997-12-02 | Loral Fairchild Corporation | Advanced CCD-based x-ray image sensor system |
| JP3670439B2 (ja) * | 1997-05-09 | 2005-07-13 | 株式会社日立メディコ | X線装置 |
| GB2332800B (en) * | 1997-12-18 | 2000-09-27 | Simage Oy | Device for imaging radiation |
-
2000
- 2000-10-30 JP JP2001540572A patent/JP4746808B2/ja not_active Expired - Fee Related
- 2000-10-30 EP EP00969573A patent/EP1151645B1/en not_active Expired - Lifetime
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