JP2003506568A5 - - Google Patents
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- Publication number
- JP2003506568A5 JP2003506568A5 JP2001516024A JP2001516024A JP2003506568A5 JP 2003506568 A5 JP2003506568 A5 JP 2003506568A5 JP 2001516024 A JP2001516024 A JP 2001516024A JP 2001516024 A JP2001516024 A JP 2001516024A JP 2003506568 A5 JP2003506568 A5 JP 2003506568A5
- Authority
- JP
- Japan
- Prior art keywords
- substituted
- unsubstituted
- hydrocarbon ring
- aromatic hydrocarbon
- ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 2
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- 125000006615 aromatic heterocyclic group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 1
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920005547 polycyclic aromatic hydrocarbon Polymers 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/368,740 | 1999-08-05 | ||
| US09/368,740 US6187506B1 (en) | 1999-08-05 | 1999-08-05 | Antireflective coating for photoresist compositions |
| PCT/EP2000/007228 WO2001011429A1 (en) | 1999-08-05 | 2000-07-27 | Antireflective coating for photoresist compositions |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003506568A JP2003506568A (ja) | 2003-02-18 |
| JP2003506568A5 true JP2003506568A5 (enExample) | 2007-09-13 |
| JP4714394B2 JP4714394B2 (ja) | 2011-06-29 |
Family
ID=23452540
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001516024A Expired - Lifetime JP4714394B2 (ja) | 1999-08-05 | 2000-07-27 | フォトレジスト組成物用の反射防止膜 |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US6187506B1 (enExample) |
| EP (1) | EP1210651B1 (enExample) |
| JP (1) | JP4714394B2 (enExample) |
| KR (1) | KR100694777B1 (enExample) |
| CN (1) | CN1196030C (enExample) |
| AT (1) | ATE424574T1 (enExample) |
| DE (1) | DE60041704D1 (enExample) |
| HK (1) | HK1048367A1 (enExample) |
| MY (1) | MY126933A (enExample) |
| TW (1) | TWI281941B (enExample) |
| WO (1) | WO2001011429A1 (enExample) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100687850B1 (ko) * | 2000-06-30 | 2007-02-27 | 주식회사 하이닉스반도체 | 유기반사방지막 조성물 및 그의 제조방법 |
| US6844131B2 (en) * | 2002-01-09 | 2005-01-18 | Clariant Finance (Bvi) Limited | Positive-working photoimageable bottom antireflective coating |
| US7070914B2 (en) | 2002-01-09 | 2006-07-04 | Az Electronic Materials Usa Corp. | Process for producing an image using a first minimum bottom antireflective coating composition |
| US6894104B2 (en) * | 2002-05-23 | 2005-05-17 | Brewer Science Inc. | Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers |
| US6733936B1 (en) | 2002-09-19 | 2004-05-11 | Integrated Device Technology, Inc. | Method for generating a swing curve and photoresist feature formed using swing curve |
| US7338742B2 (en) * | 2003-10-08 | 2008-03-04 | Hynix Semiconductor Inc. | Photoresist polymer and photoresist composition containing the same |
| US20050214674A1 (en) * | 2004-03-25 | 2005-09-29 | Yu Sui | Positive-working photoimageable bottom antireflective coating |
| US7691556B2 (en) * | 2004-09-15 | 2010-04-06 | Az Electronic Materials Usa Corp. | Antireflective compositions for photoresists |
| US20060057501A1 (en) * | 2004-09-15 | 2006-03-16 | Hengpeng Wu | Antireflective compositions for photoresists |
| US20060177772A1 (en) * | 2005-02-10 | 2006-08-10 | Abdallah David J | Process of imaging a photoresist with multiple antireflective coatings |
| US7238624B2 (en) * | 2005-03-01 | 2007-07-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and method for manufacturing semiconductor devices using a vacuum chamber |
| WO2006138637A1 (en) * | 2005-06-16 | 2006-12-28 | Rensselaer Polytechnic Institute | Curcumin and curcuminoid compounds, and use thereof as photosensitizers of onium salts |
| US7375172B2 (en) | 2005-07-06 | 2008-05-20 | International Business Machines Corporation | Underlayer compositions containing heterocyclic aromatic structures |
| US7553905B2 (en) * | 2005-10-31 | 2009-06-30 | Az Electronic Materials Usa Corp. | Anti-reflective coatings |
| US7736822B2 (en) * | 2006-02-13 | 2010-06-15 | Hoya Corporation | Resist underlayer coating forming composition for mask blank, mask blank and mask |
| US7416834B2 (en) * | 2006-09-27 | 2008-08-26 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
| KR100886314B1 (ko) * | 2007-06-25 | 2009-03-04 | 금호석유화학 주식회사 | 유기반사방지막용 공중합체 및 이를 포함하는유기반사방지막 조성물 |
| US20090042133A1 (en) * | 2007-08-10 | 2009-02-12 | Zhong Xiang | Antireflective Coating Composition |
| US8088548B2 (en) * | 2007-10-23 | 2012-01-03 | Az Electronic Materials Usa Corp. | Bottom antireflective coating compositions |
| US8486591B2 (en) * | 2008-10-24 | 2013-07-16 | Cheil Industries Inc. | Photosensitive resin composition for color filter and color filter prepared using the same |
| US8455176B2 (en) * | 2008-11-12 | 2013-06-04 | Az Electronic Materials Usa Corp. | Coating composition |
| US20100230136A1 (en) * | 2009-03-12 | 2010-09-16 | Sumitomo Chemical Company, Limited | Method for producing resist pattern |
| US8632948B2 (en) * | 2009-09-30 | 2014-01-21 | Az Electronic Materials Usa Corp. | Positive-working photoimageable bottom antireflective coating |
| US8623589B2 (en) | 2011-06-06 | 2014-01-07 | Az Electronic Materials Usa Corp. | Bottom antireflective coating compositions and processes thereof |
| KR102255221B1 (ko) | 2013-12-27 | 2021-05-24 | 롬엔드하스전자재료코리아유한회사 | 나노리소그래피용 유기 바닥 반사방지 코팅 조성물 |
| CN113913075B (zh) * | 2021-10-25 | 2022-09-20 | 嘉庚创新实验室 | 一种抗反射涂层组合物及可交联聚合物 |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4491628A (en) | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
| DE3817012A1 (de) | 1988-05-19 | 1989-11-30 | Basf Ag | Positiv und negativ arbeitende strahlungsempfindliche gemische sowie verfahren zur herstellung von reliefmustern |
| EP0440374B1 (en) | 1990-01-30 | 1997-04-16 | Wako Pure Chemical Industries Ltd | Chemical amplified resist material |
| US5525457A (en) | 1994-12-09 | 1996-06-11 | Japan Synthetic Rubber Co., Ltd. | Reflection preventing film and process for forming resist pattern using the same |
| JP2956824B2 (ja) * | 1995-06-15 | 1999-10-04 | 東京応化工業株式会社 | ポジ型レジスト膜形成用塗布液 |
| US5693691A (en) * | 1995-08-21 | 1997-12-02 | Brewer Science, Inc. | Thermosetting anti-reflective coatings compositions |
| JP3587413B2 (ja) * | 1995-12-20 | 2004-11-10 | 東京応化工業株式会社 | 化学増幅型レジスト組成物及びそれに用いる酸発生剤 |
| US5652297A (en) * | 1996-08-16 | 1997-07-29 | Hoechst Celanese Corporation | Aqueous antireflective coatings for photoresist compositions |
| US5652317A (en) * | 1996-08-16 | 1997-07-29 | Hoechst Celanese Corporation | Antireflective coatings for photoresist compositions |
| JP3679205B2 (ja) * | 1996-09-20 | 2005-08-03 | 富士写真フイルム株式会社 | ポジ型感光性組成物 |
| US5733714A (en) * | 1996-09-30 | 1998-03-31 | Clariant Finance (Bvi) Limited | Antireflective coating for photoresist compositions |
| TW464791B (en) * | 1996-09-30 | 2001-11-21 | Hoechst Celanese Corp | Bottom antireflective coatings containing an arylhydrazo dye |
| US5994430A (en) * | 1997-04-30 | 1999-11-30 | Clariant Finance Bvi) Limited | Antireflective coating compositions for photoresist compositions and use thereof |
| KR100236840B1 (ko) * | 1997-10-16 | 2000-01-15 | 유현식 | 가교형 광산발생제를 함유하는 포토레지스트 조성물 |
| KR100240825B1 (ko) * | 1997-12-05 | 2000-01-15 | 유현식 | 비오니움 광산 발생제 및 이를 함유한 포토레지스트 조성물 |
-
1999
- 1999-08-05 US US09/368,740 patent/US6187506B1/en not_active Expired - Lifetime
-
2000
- 2000-07-19 TW TW089114404A patent/TWI281941B/zh not_active IP Right Cessation
- 2000-07-27 DE DE60041704T patent/DE60041704D1/de not_active Expired - Lifetime
- 2000-07-27 WO PCT/EP2000/007228 patent/WO2001011429A1/en not_active Ceased
- 2000-07-27 JP JP2001516024A patent/JP4714394B2/ja not_active Expired - Lifetime
- 2000-07-27 KR KR1020027001515A patent/KR100694777B1/ko not_active Expired - Lifetime
- 2000-07-27 HK HK03100567.0A patent/HK1048367A1/zh unknown
- 2000-07-27 CN CNB008111677A patent/CN1196030C/zh not_active Expired - Lifetime
- 2000-07-27 AT AT00948003T patent/ATE424574T1/de not_active IP Right Cessation
- 2000-07-27 EP EP00948003A patent/EP1210651B1/en not_active Expired - Lifetime
- 2000-08-03 MY MYPI20003536 patent/MY126933A/en unknown
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