JP2003500839A - 放電レーザのカットオフ・アセンブリを有する横流ファン及び振動調節方法 - Google Patents
放電レーザのカットオフ・アセンブリを有する横流ファン及び振動調節方法Info
- Publication number
- JP2003500839A JP2003500839A JP2000619064A JP2000619064A JP2003500839A JP 2003500839 A JP2003500839 A JP 2003500839A JP 2000619064 A JP2000619064 A JP 2000619064A JP 2000619064 A JP2000619064 A JP 2000619064A JP 2003500839 A JP2003500839 A JP 2003500839A
- Authority
- JP
- Japan
- Prior art keywords
- flow fan
- cross
- laser
- blade
- blade member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 17
- 239000000203 mixture Substances 0.000 claims abstract description 4
- 239000007789 gas Substances 0.000 claims description 46
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 20
- 238000005452 bending Methods 0.000 claims description 14
- 229910052759 nickel Inorganic materials 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 239000011737 fluorine Substances 0.000 claims description 7
- 229910052731 fluorine Inorganic materials 0.000 claims description 7
- VZPPHXVFMVZRTE-UHFFFAOYSA-N [Kr]F Chemical compound [Kr]F VZPPHXVFMVZRTE-UHFFFAOYSA-N 0.000 claims description 6
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- ISQINHMJILFLAQ-UHFFFAOYSA-N argon hydrofluoride Chemical compound F.[Ar] ISQINHMJILFLAQ-UHFFFAOYSA-N 0.000 claims description 6
- 229910001094 6061 aluminium alloy Inorganic materials 0.000 claims description 5
- 229910000838 Al alloy Inorganic materials 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 239000010949 copper Substances 0.000 claims description 4
- 239000000654 additive Substances 0.000 claims description 3
- 230000000996 additive effect Effects 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 238000005266 casting Methods 0.000 abstract description 19
- 238000003754 machining Methods 0.000 abstract description 10
- 238000003466 welding Methods 0.000 abstract description 9
- 239000000356 contaminant Substances 0.000 abstract description 7
- 238000010894 electron beam technology Methods 0.000 abstract description 5
- 239000003344 environmental pollutant Substances 0.000 abstract description 4
- 231100000719 pollutant Toxicity 0.000 abstract description 4
- 239000007787 solid Substances 0.000 abstract description 2
- 230000003134 recirculating effect Effects 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 230000035939 shock Effects 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000005495 investment casting Methods 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 229910000906 Bronze Inorganic materials 0.000 description 3
- 238000005219 brazing Methods 0.000 description 3
- 238000004512 die casting Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 230000002829 reductive effect Effects 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000000712 assembly Effects 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000010974 bronze Substances 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000002939 deleterious effect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000001360 synchronised effect Effects 0.000 description 2
- 206010068150 Acoustic shock Diseases 0.000 description 1
- 244000018436 Coriandrum sativum Species 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
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- 230000001419 dependent effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000007730 finishing process Methods 0.000 description 1
- 239000010438 granite Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 230000013011 mating Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000003954 pattern orientation Effects 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 230000010076 replication Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- General Physics & Mathematics (AREA)
- Structures Of Non-Positive Displacement Pumps (AREA)
- Lasers (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/310,786 US6034984A (en) | 1998-08-28 | 1999-05-12 | Tangential fan with cutoff assembly and vibration control for electric discharge laser |
| US09/310,786 | 1999-05-12 | ||
| US09/400,026 | 1999-09-21 | ||
| US09/400,026 US6144686A (en) | 1998-08-28 | 1999-09-21 | Tangential fan with cutoff assembly and vibration control for electric discharge laser |
| PCT/US2000/011290 WO2000070720A1 (en) | 1999-05-12 | 2000-04-25 | Tangential fan with cutoff assembly and vibration control for electric discharge laser |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003500839A true JP2003500839A (ja) | 2003-01-07 |
| JP2003500839A5 JP2003500839A5 (enExample) | 2007-06-28 |
Family
ID=26977584
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000619064A Pending JP2003500839A (ja) | 1999-05-12 | 2000-04-25 | 放電レーザのカットオフ・アセンブリを有する横流ファン及び振動調節方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6144686A (enExample) |
| EP (1) | EP1192689A4 (enExample) |
| JP (1) | JP2003500839A (enExample) |
| KR (1) | KR100681817B1 (enExample) |
| AU (1) | AU4669300A (enExample) |
| WO (1) | WO2000070720A1 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3697036B2 (ja) * | 1997-10-03 | 2005-09-21 | キヤノン株式会社 | 露光装置及びそれを用いた半導体製造方法 |
| US6847671B1 (en) | 2000-03-29 | 2005-01-25 | Lambda Physik Ag | Blower for gas laser |
| DE10156106A1 (de) * | 2001-11-16 | 2003-05-28 | Isaak Klaus | Verfahren zum Verbinden von Blechteilen |
| US8814522B2 (en) * | 2007-06-15 | 2014-08-26 | Cymer, Llc | Cross-flow fan impeller for a transversley excited, pulsed, gas discharge laser |
| WO2025093992A1 (en) * | 2023-11-01 | 2025-05-08 | Cymer, Llc | Gas discharge chamber blower fan with a textured surface |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4099143A (en) * | 1977-01-14 | 1978-07-04 | Universal Laser Corp. | Gas recirculating stabilized laser |
| JPH06101596B2 (ja) * | 1983-02-21 | 1994-12-12 | 株式会社小松製作所 | クロスフロ−型レ−ザ装置 |
| US4959840A (en) * | 1988-01-15 | 1990-09-25 | Cymer Laser Technologies | Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser |
| JPH04246873A (ja) * | 1991-02-01 | 1992-09-02 | Kawasaki Steel Corp | ガスレーザ装置 |
| JP3349722B2 (ja) * | 1992-08-25 | 2002-11-25 | 東芝キヤリア株式会社 | 空気調和機の室内ユニットおよびその梱包方法 |
| JP3107711B2 (ja) * | 1994-08-09 | 2000-11-13 | 株式会社東芝 | 横流ファン |
| US5748656A (en) * | 1996-01-05 | 1998-05-05 | Cymer, Inc. | Laser having improved beam quality and reduced operating cost |
| CA2190697C (en) * | 1996-01-31 | 2000-07-25 | Donald Glenn Larson | Blower motor with adjustable timing |
| US5657334A (en) * | 1996-02-15 | 1997-08-12 | Cymer, Inc. | External high voltage control for a laser system |
| US5771258A (en) * | 1997-02-11 | 1998-06-23 | Cymer, Inc. | Aerodynamic chamber design for high pulse repetition rate excimer lasers |
| US5870420A (en) * | 1997-08-18 | 1999-02-09 | Cymer, Inc. | Cross-flow blower with braces |
| US6023486A (en) * | 1998-08-28 | 2000-02-08 | Cymer, Inc. | Soldered fan assembly for electric discharge laser |
-
1999
- 1999-09-21 US US09/400,026 patent/US6144686A/en not_active Expired - Lifetime
-
2000
- 2000-04-25 WO PCT/US2000/011290 patent/WO2000070720A1/en not_active Ceased
- 2000-04-25 JP JP2000619064A patent/JP2003500839A/ja active Pending
- 2000-04-25 KR KR1020017014296A patent/KR100681817B1/ko not_active Expired - Lifetime
- 2000-04-25 EP EP00928454A patent/EP1192689A4/en not_active Withdrawn
- 2000-04-25 AU AU46693/00A patent/AU4669300A/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| EP1192689A4 (en) | 2006-03-15 |
| US6144686A (en) | 2000-11-07 |
| KR20010112484A (ko) | 2001-12-20 |
| AU4669300A (en) | 2000-12-05 |
| WO2000070720A1 (en) | 2000-11-23 |
| EP1192689A1 (en) | 2002-04-03 |
| KR100681817B1 (ko) | 2007-02-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070423 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20070423 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090330 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20091022 |