JP2003342311A - Resin composition, and prepreg, laminated sheet and multilayer printed circuit board prepared by using it - Google Patents

Resin composition, and prepreg, laminated sheet and multilayer printed circuit board prepared by using it

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Publication number
JP2003342311A
JP2003342311A JP2002154158A JP2002154158A JP2003342311A JP 2003342311 A JP2003342311 A JP 2003342311A JP 2002154158 A JP2002154158 A JP 2002154158A JP 2002154158 A JP2002154158 A JP 2002154158A JP 2003342311 A JP2003342311 A JP 2003342311A
Authority
JP
Japan
Prior art keywords
resin composition
prepreg
weight
composition according
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002154158A
Other languages
Japanese (ja)
Other versions
JP4499344B2 (en
Inventor
Satoru Amo
天羽  悟
Shinji Yamada
真治 山田
Takao Ishikawa
敬郎 石川
Akio Takahashi
昭雄 高橋
Yoshihiro Nakamura
吉宏 中村
Akinori Hanawa
明徳 塙
Toshiyuki Iijima
利行 飯島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
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Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP2002154158A priority Critical patent/JP4499344B2/en
Publication of JP2003342311A publication Critical patent/JP2003342311A/en
Application granted granted Critical
Publication of JP4499344B2 publication Critical patent/JP4499344B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Reinforced Plastic Materials (AREA)
  • Laminated Bodies (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a resin composition with low permittivity and dielectric loss tangent, providing a flame-retardant cured product, and a prepreg, a laminated sheet and a multilayer printed circuit board prepared by using it. <P>SOLUTION: The resin composition comprises a cross-liking component with a wt. average molecular wt. of 1,000 or less and having a multifunctional styrene group of formula 1 (wherein R is an optionally substituted hydrocarbon; R<SP>2</SP>, R<SP>3</SP>and R<SP>4</SP>are each a H atom or a 1-6C hydrocarbon group; R<SP>5</SP>, R<SP>6</SP>, R<SP>7</SP>and R<SP>8</SP>are each a H atom or a 1-20C hydrocarbon group; and n is an integer of 2 or more) and a bromine compound, used for preparation of the prepreg, the laminated sheet and the multilayer printed circuit board. <P>COPYRIGHT: (C)2004,JPO

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は高周波信号に対応す
るための誘電損失の小さな多層プリント回路板、導体付
積層板、プリプレグ、並びに、これらに用いる難燃性で
低誘電正接の樹脂組成物に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a multilayer printed circuit board having a small dielectric loss for dealing with high frequency signals, a laminated board with a conductor, a prepreg, and a flame-retardant and low dielectric loss tangent resin composition used therefor. .

【0002】[0002]

【従来の技術】近年、PHS,携帯電話等の情報通信機
器の信号帯域,コンピュータのCPUクロックタイムは
GHz帯に達し、高周波数化が進行している。
2. Description of the Related Art In recent years, the signal band of information communication devices such as PHS and mobile phones and the CPU clock time of computers have reached the GHz band, and higher frequencies have been developed.

【0003】電気信号の誘電損失は、回路を形成する絶
縁体の比誘電率の平方根,誘電正接および使用される信
号の周波数の積に比例する。そのため、使用される信号
の周波数が高いほど誘電損失が大きくなる。
The dielectric loss of an electrical signal is proportional to the product of the square root of the dielectric constant of the insulator forming the circuit, the dielectric loss tangent and the frequency of the signal used. Therefore, the higher the frequency of the signal used, the larger the dielectric loss.

【0004】誘電損失は、電気信号を減衰させて信号の
信頼性を損なうので、これを抑制するために絶縁体には
誘電率,誘電正接の小さな材料を選定する必要がある。
絶縁体の低誘電率化および低誘電正接化には、分子構造
中の極性基の除去が有効である。こうしたものとして
は、フッ素樹脂,硬化性ポリオレフィン,シアネートエ
ステル系樹脂,硬化性ポリフェニレンオキサイド,アリ
ル変性ポリフェニレンエーテル,ジビニルベンゼンまた
はジビニルナフタレンで変性したポリエーテルイミド等
が提案されている。
Since the dielectric loss attenuates the electric signal and impairs the reliability of the signal, it is necessary to select a material having a small dielectric constant and a small dielectric loss tangent for the insulator in order to suppress it.
Removal of polar groups from the molecular structure is effective for lowering the dielectric constant and lowering the dielectric loss tangent of the insulator. As such materials, fluororesins, curable polyolefins, cyanate ester resins, curable polyphenylene oxides, allyl-modified polyphenylene ethers, and polyetherimides modified with divinylbenzene or divinylnaphthalene have been proposed.

【0005】例えば、ポリテトラフルオロエチレン(P
TFE)に代表されるフッ素樹脂は、誘電率,誘電正接
共に低く、高周波信号を扱う基板材料に使用されてい
る。これに対して、有機溶剤に可溶で取り扱い易い、非
フッ素系の低誘電率で低誘電正接の樹脂も種々検討され
てきた。
For example, polytetrafluoroethylene (P
Fluororesin typified by TFE) has a low dielectric constant and a low dielectric loss tangent and is used as a substrate material for handling high frequency signals. On the other hand, various non-fluorine-based resins having a low dielectric constant and a low dielectric loss tangent, which are soluble in an organic solvent and are easy to handle, have been studied.

【0006】例えば、特開平8−208856号公報の
ポリブタジエン等のジエン系ポリマーをガラスクロスに
含浸して過酸化物で硬化した例、特開平10−1583
37号公報のノルボルネン系付加型重合体にエポキシ基
を導入し、硬化性を付与した環状ポリオレフィンの例が
ある。
For example, an example in which a glass cloth is impregnated with a diene polymer such as polybutadiene disclosed in JP-A-8-208856 and cured with a peroxide, is disclosed in JP-A-10-1583.
There is an example of a cyclic polyolefin in which an epoxy group is introduced into a norbornene-based addition type polymer disclosed in Japanese Patent No. 37 to impart curability.

【0007】また、特開平11−124491号公報の
シアネートエステル,ジエン系ポリマーおよびエポキシ
樹脂を加熱してBステージ化した例、特開平9−118
759号公報のポリフェニレンオキサイド,ジエン系ポ
リマーおよびトリアリルイソシアネートからなる変性樹
脂の例がある。
Further, an example in which the cyanate ester, diene polymer and epoxy resin described in JP-A-11-124491 are heated to the B stage, JP-A-9-118.
There is an example of a modified resin composed of polyphenylene oxide, a diene-based polymer and triallyl isocyanate disclosed in Japanese Patent No. 759.

【0008】また、特開平9−246429号公報のア
リル化ポリフェニレンエーテルおよびトリアリルイソシ
アネート等からなる樹脂組成物の例がある。
Further, there is an example of a resin composition composed of allylated polyphenylene ether, triallyl isocyanate and the like, which is disclosed in JP-A-9-246429.

【0009】さらに、特開平5−156159号公報の
ポリエーテルイミドとスチレン,ジビニルベンゼンまた
はジビニルナフタレンとをアロイ化した例がある。さら
にまた、特開平5−78552号記載のジヒドロキシ化
合物とクロロメチルスチレンからウイリアムソン反応で
合成した例えばヒドロキノンビス(ビニルベンジル)エ
ーテルとノボラックフェノール樹脂からなる樹脂組成物
の例等が挙げられる。
Further, there is an example in which polyether imide and styrene, divinylbenzene or divinylnaphthalene described in JP-A-5-156159 are alloyed. Furthermore, examples of resin compositions composed of, for example, hydroquinone bis (vinylbenzyl) ether and novolac phenol resin synthesized by a Williamson reaction from a dihydroxy compound and chloromethylstyrene described in JP-A-5-78552 can be given.

【0010】一方、前述の絶縁材料には、適用製品の安
全性の観点から難燃化が必須の事項である。従来から赤
燐,燐酸エステル,含窒素化合物,ハロゲン化物,金属
水和物,金属酸化物等の難燃剤の添加が検討されてき
た。例えば、メラミン等の窒素化合物,ポリオールおよ
び有機リン酸エステルを複合して用いる特開平4−11
7442号公報の例がある。
On the other hand, it is essential for the above-mentioned insulating material to make it flame-retardant from the viewpoint of safety of applied products. Conventionally, the addition of flame retardants such as red phosphorus, phosphoric acid esters, nitrogen-containing compounds, halides, metal hydrates, metal oxides has been studied. For example, a compound of a nitrogen compound such as melamine, a polyol and an organic phosphate is used in combination.
There is an example of the 7442 publication.

【0011】金属酸化物を用いた特開平9−10482
1号公報や、金属水和物とチタン酸カリウムを用いた
例、リン化合物と含窒素化合物を用いた特開2000−
26553号公報、赤燐と金属水和物を用いた特開20
00−106041号公報がある。
Japanese Patent Application Laid-Open No. 9-10482 using a metal oxide
No. 1, JP-A 2000-using a metal hydrate and potassium titanate, and a phosphorus compound and a nitrogen-containing compound.
Japanese Patent No. 26553, JP-A-2000-58, which uses red phosphorus and a metal hydrate.
There is a publication of No. 00-106041.

【0012】また、ハロゲン化物を用いた特開平6−1
06676号公報など多数の例が挙げられる。
Further, JP-A 6-1 using a halide.
There are many examples such as Japanese Patent Publication No. 06676.

【0013】[0013]

【発明が解決しようとする課題】上記のような低誘電
率,低誘電正接材を用いて難燃化を図った材料において
も、今後の高周波機器に対応するためには誘電特性が十
分ではない。
However, even in the case of a material made flame-retardant by using a material having a low dielectric constant and a low dielectric loss tangent as described above, the dielectric characteristics are not sufficient to support future high frequency equipment. .

【0014】本発明の目的は、従来材に比べて優れた誘
電特性を有する多官能スチレン化合物を含む低誘電正接
の樹脂組成物の低誘電率および低誘電正接性を損なうこ
となく、難燃化を図った難燃性の樹脂組成物を提供する
ことにある。
The object of the present invention is to achieve flame retardancy without impairing the low dielectric constant and low dielectric loss tangent of a resin composition having a low dielectric loss tangent containing a polyfunctional styrene compound having excellent dielectric properties as compared with conventional materials. Another object of the present invention is to provide a flame-retardant resin composition.

【0015】また、上記樹脂組成物を用いたプリプレ
グ,積層板および多層プリント回路板を提供することに
ある。
Another object of the present invention is to provide a prepreg, a laminated board and a multilayer printed circuit board using the above resin composition.

【0016】[0016]

【課題を解決するための手段】多官能スチレン化合物の
硬化物は極めて低い誘電率と誘電正接を有し、その値は
測定周波数10GHzにおいて誘電率が約2.5、誘電
正接が0.002未満である。
[Means for Solving the Problems] A cured product of a polyfunctional styrene compound has an extremely low dielectric constant and dielectric loss tangent, which are about 2.5 at a measurement frequency of 10 GHz and less than 0.002. Is.

【0017】上記特性を損なわずに樹脂組成物の硬化物
に、難燃性を付与する難燃剤を種々検討した結果、組成
物中にブロム化合物を添加した場合、難燃性が付与でき
ることを確認した。特に、1,2−ビス(ペンタブロモ
フェニル)エタン、1,2−ビス(テトラブロモフタル
イミド)エタンは、構造中に極性基を持たないこと、お
よび、Br含有率が高いことから、その添加量が少なく
ても難燃効果が高く、誘電率への影響が少ない。
As a result of various studies on flame retardants which impart flame retardancy to a cured product of a resin composition without impairing the above-mentioned properties, it was confirmed that flame retardancy can be imparted when a bromine compound is added to the composition. did. In particular, 1,2-bis (pentabromophenyl) ethane and 1,2-bis (tetrabromophthalimido) ethane have no polar group in the structure and have a high Br content, so the addition amount thereof is high. Even if it is small, the flame retardant effect is high and the effect on the dielectric constant is small.

【0018】さらにアンチモン系化合物を添加すること
によって、ブロム化合物の添加量を一層低減することが
できる。なお、本発明の樹脂組成物はプリプレグ,積層
板,多層プリント回路板に加工することができる。
By adding an antimony compound, the amount of the bromine compound added can be further reduced. The resin composition of the present invention can be processed into a prepreg, a laminated board and a multilayer printed circuit board.

【0019】次ぎに本発明の樹脂組成物およびその硬化
物について説明する。本発明の樹脂組成物は、式〔1〕
Next, the resin composition of the present invention and its cured product will be described. The resin composition of the present invention has the formula [1]

【0020】[0020]

【化2】 (式中、Rは置換基を有していてもよい炭化水素を、R
2,R3,R4は互いに異なってもよい水素原子または炭
素数1〜6の炭化水素基を、R5,R6,R7,R8は異な
ってもよい水素原子または炭素数1〜20の炭化水素基
を、nは2以上の整数を表す)で示される多官能のスチ
レン基を有する重量平均分子量1000以下の架橋成分
を含み、かつ、ブロム化合物を含有することを特徴とす
る樹脂組成物である。
[Chemical 2] (In the formula, R represents a hydrocarbon which may have a substituent,
2 , R 3 and R 4 are hydrogen atoms which may be different from each other or a hydrocarbon group having 1 to 6 carbon atoms, and R 5 , R 6 , R 7 and R 8 are hydrogen atoms which may be different from each other or a carbon atom having 1 to 6 carbon atoms. A resin containing a polyfunctional styrene group represented by 20 hydrocarbon groups and n representing an integer of 2 or more) and a crosslinking component having a weight average molecular weight of 1000 or less and containing a bromine compound. It is a composition.

【0021】上記ブロム化合物は特に制限はないが、ブ
ロム含有率が高く難燃効果が高い1,2−ビス(ペンタ
ブロモフェニル)エタン、1,2−ビス(テトラブロモ
フタルイミド)エタンが好ましい。その添加量は、組成
物中の樹脂成分を100重量部として1〜30重量部と
することが望ましく、本範囲で十分な難燃性を得ること
ができる。
The bromine compound is not particularly limited, but 1,2-bis (pentabromophenyl) ethane and 1,2-bis (tetrabromophthalimide) ethane having a high bromine content and a high flame retarding effect are preferable. The addition amount is preferably 1 to 30 parts by weight based on 100 parts by weight of the resin component in the composition, and sufficient flame retardancy can be obtained within this range.

【0022】上記範囲よりもブロム化合物の添加量が少
ない場合は、十分な難燃効果が得られない場合があり、
また、上記範囲よりも添加量が多いと誘電特性の低下、
耐熱性の低下等の問題を生じる場合がある。
When the amount of the bromine compound added is less than the above range, a sufficient flame retardant effect may not be obtained,
In addition, if the addition amount is larger than the above range, the dielectric properties deteriorate,
Problems such as deterioration of heat resistance may occur.

【0023】また、難燃助剤としてアンチモン化合物を
添加することによって、ブロム化合物の添加量を低減す
ることができる。アンチモン化合物としては、三酸化ア
ンチモン,四酸化アンチモン,五酸化アンチモン,アン
チモン酸ソーダが挙げられる。その添加量は0.1〜1
0重量部の範囲が好ましい。この範囲よりも添加量が少
ないと難燃性の向上が認められない場合があり、逆に多
いと誘電特性が低下する場合がある。
The addition amount of the bromine compound can be reduced by adding the antimony compound as the flame retardant aid. Examples of the antimony compound include antimony trioxide, antimony tetraoxide, antimony pentoxide, and sodium antimonate. The addition amount is 0.1-1
A range of 0 parts by weight is preferred. If the amount added is less than this range, the flame retardancy may not be improved, and if the amount is more than the range, the dielectric properties may deteriorate.

【0024】本発明の組成物では、さらに高分子量体を
添加することによって、樹脂組成物に成膜性,強度,伸
び,接着性を付与することができる。
In the composition of the present invention, a film-forming property, strength, elongation and adhesiveness can be imparted to the resin composition by further adding a high molecular weight substance.

【0025】該高分子量体としてはブタジエン,イソプ
レン,スチレン,メチルスチレン,エチルスチレン,ジ
ビニルベンゼン,アクリル酸エステル,アクリロニトリ
ル,N−フェニルマレイミドおよびN−ビニルフェニル
マレイミドの少なくとも一種からなる重合体,置換基を
有していてもよいポリフェニレンオキサイド,並びに脂
環式構造を有するポリオレフィン等が挙げられる。
Examples of the high molecular weight polymer include butadiene, isoprene, styrene, methylstyrene, ethylstyrene, divinylbenzene, acrylic acid ester, acrylonitrile, N-phenylmaleimide and N-vinylphenylmaleimide, and a substituent group. Examples thereof include polyphenylene oxide which may have, and polyolefin having an alicyclic structure.

【0026】上記高分子量体の添加量には特に制限はな
いが、架橋成分が5〜95重量部,高分子量体が95〜
5重量部の範囲が好ましい。この範囲内で強度,伸び,
接着力の向上等目的に応じて組成を調整できる。特に好
ましい範囲としては架橋成分が50〜80重量部、高分
子量体が50〜20重量部の範囲で、これにより高分子
量体が架橋性の官能基を有していない場合でも耐溶剤性
が保たれる。
The amount of the above-mentioned polymer to be added is not particularly limited, but the crosslinking component is 5 to 95 parts by weight, and the polymer is 95 to 100 parts by weight.
A range of 5 parts by weight is preferred. Within this range, strength, elongation,
The composition can be adjusted according to the purpose such as improvement in adhesive strength. Particularly preferable ranges are 50 to 80 parts by weight of the cross-linking component and 50 to 20 parts by weight of the high molecular weight substance, whereby the solvent resistance is maintained even when the high molecular weight substance does not have a crosslinkable functional group. Be drunk

【0027】さらに、本発明の樹脂組成物にはスチレン
基を重合し得る硬化触媒、または、スチレン基の重合を
抑制し得る重合禁止剤を添加することによって、熱硬化
効率の向上,保存安定性の向上を図ることができる。
Further, by adding a curing catalyst capable of polymerizing styrene groups or a polymerization inhibitor capable of suppressing the polymerization of styrene groups to the resin composition of the present invention, the thermosetting efficiency is improved and the storage stability is improved. Can be improved.

【0028】本発明に用いられる多官能スチレン化合物
は硬化触媒を添加しなくとも硬化することができるが、
硬化触媒を添加することによって、多官能スチレン化合
物の硬化を促進することができる。これにより低温での
硬化が可能となる。
The polyfunctional styrene compound used in the present invention can be cured without adding a curing catalyst.
By adding a curing catalyst, it is possible to accelerate the curing of the polyfunctional styrene compound. This allows curing at low temperatures.

【0029】その添加量としては誘電率,誘電正接に影
響を与えない範囲に設定することが好ましく、組成物中
の樹脂成分の総量を100重量部に対し0.0005〜
10重量部とすることが望ましい。
The addition amount is preferably set in a range that does not affect the dielectric constant and the dielectric loss tangent, and the total amount of the resin components in the composition is 0.0005 to 100 parts by weight.
It is desirable to use 10 parts by weight.

【0030】スチレン基の重合を開始し得るカチオンま
たはラジカル活性種を、熱または光によって生成する硬
化触媒を以下に示す。
The curing catalysts that generate cation or radical active species capable of initiating the polymerization of styrene groups by heat or light are shown below.

【0031】カチオン重合開始剤としてはBF4、P
4、AsF6、SbF6を対アニオンとするジアリルヨ
ードニウム塩,トリアリルスルホニウム塩および脂肪族
スルホニウム塩が挙げられる。こうしたものとして旭電
化工業製SP−70、172、CP−66、日本曹達製
CI−2855、2823、三新化学工業製SI−10
0LおよびSI−150L等の市販品を使用することが
できる。
As the cationic polymerization initiator, BF 4 , P
Examples thereof include diallyl iodonium salts, triallyl sulfonium salts and aliphatic sulfonium salts having F 4 , AsF 6 and SbF 6 as counter anions. As such, Asahi Denka Kogyo SP-70, 172, CP-66, Nippon Soda CI-2855, 2823, Sanshin Chemical Industry SI-10.
Commercial products such as 0L and SI-150L can be used.

【0032】ラジカル重合開始剤としては、ベンゾイン
およびベンゾインメチルのようなベンゾイン系化合物,
アセトフェノンおよび2,2−ジメトキシ−2−フェニ
ルアセトフェノンのようなアセトフェノン系化合物,チ
オキサントンおよび2,4−ジエチルチオキサントンの
ようなチオキサンソン系化合物,4,4'−ジアジドカル
コン,2,6−ビス(4'−アジドベンザル)シクロヘキ
サノンおよび4,4'−ジアジドベンゾフェノンのような
ビスアジド化合物、アゾビスイソブチルニトリル、2,
2−アゾビスプロパン、m,m'−アゾキシスチレンおよ
びヒドラゾンのようなアゾ化合物、並びに、2,5−ジ
メチル−2,5−ジ(t−ブチルパーオキシ)ヘキサン
および2,5−ジメチル−2,5−ジ(t−ブチルパーオ
キシ)ヘキシン−3、ジクミルパーオキシドのような有
機過酸化物等が挙げられる。
As the radical polymerization initiator, benzoin compounds such as benzoin and benzoinmethyl,
Acetophenone compounds such as acetophenone and 2,2-dimethoxy-2-phenylacetophenone, thioxanthone compounds such as thioxanthone and 2,4-diethylthioxanthone, 4,4′-diazidochalcone, 2,6-bis (4 Bisazide compounds such as'-azidobenzal) cyclohexanone and 4,4'-diazidobenzophenone, azobisisobutylnitrile, 2,
Azo compounds such as 2-azobispropane, m, m'-azoxystyrene and hydrazone, and 2,5-dimethyl-2,5-di (t-butylperoxy) hexane and 2,5-dimethyl- Examples include organic peroxides such as 2,5-di (t-butylperoxy) hexyne-3 and dicumyl peroxide.

【0033】特に、官能基を持たない化合物の水素引き
抜きを生じ、架橋成分と高分子量体間の架橋をもたらし
得る有機過酸化物またはビスアジド化合物を添加するこ
とが望ましい。
In particular, it is desirable to add an organic peroxide or bisazide compound which can cause hydrogen abstraction of a compound having no functional group and bring about crosslinking between the crosslinking component and the high molecular weight compound.

【0034】重合禁止剤は、本発明の組成物の保存安定
性を増す働きをするもので、その添加量は誘電特性、硬
化時の反応性を著しく阻害しないような範囲であること
が好ましい。組成物中の樹脂成分の合計100重量部に
対して、0.0005〜5重量部とすることが望まし
い。重合禁止剤を前記範囲で添加すると、保存時の余計
な架橋反応を抑制でき、また、硬化時に著しい硬化障害
をもたらすこともない。
The polymerization inhibitor functions to increase the storage stability of the composition of the present invention, and the addition amount thereof is preferably within a range that does not significantly impair the dielectric properties and the reactivity during curing. It is desirable to add 0.0005 to 5 parts by weight to 100 parts by weight of the total resin components in the composition. When the polymerization inhibitor is added within the above range, an unnecessary crosslinking reaction during storage can be suppressed, and no significant curing trouble is caused during curing.

【0035】こうした重合禁止剤としては、ハイドロキ
ノン,p−ベンゾキノン,クロラニル,トリメチルキノ
ン,4−t−ブチルピロカテコール等のキノン類および
芳香族ジオール類が挙げられる。
Examples of such polymerization inhibitors include quinones such as hydroquinone, p-benzoquinone, chloranil, trimethylquinone and 4-t-butylpyrocatechol, and aromatic diols.

【0036】本発明の組成物は、有機または無機のクロ
スまたは不織布に含浸し、乾燥させることによりプリプ
レグとして用いる。プリプレグの基材については特に制
限はなく、各種ガラスクロス,ガラス不織布,アラミド
不織布および多孔質PTFE等を用いることができる。
The composition of the present invention is used as a prepreg by impregnating an organic or inorganic cloth or nonwoven fabric and drying it. The base material of the prepreg is not particularly limited, and various glass cloths, glass non-woven fabrics, aramid non-woven fabrics, porous PTFE and the like can be used.

【0037】プリプレグは、樹脂組成物を用いて作製し
たワニスに、基材となるクロスまたは不織布を浸漬する
ことで含浸し、これを乾燥することにより作製される。
含浸後の乾燥条件は樹脂組成物にもよるが、例えば、溶
媒としてトルエンを使用した場合は、80〜130℃,
30〜90分程度乾燥することが好ましい。
The prepreg is produced by immersing a cloth or a non-woven fabric, which is a base material, in a varnish produced by using the resin composition, and then drying it.
Drying conditions after impregnation depend on the resin composition, but when toluene is used as a solvent, for example, 80 to 130 ° C,
It is preferable to dry for about 30 to 90 minutes.

【0038】本発明のプリプレグに電解銅箔等の導体箔
を重ね、加熱プレス加工することによって、表面に導体
層を有する積層板を作製する。銅箔の厚さは12〜36
μm程度が好ましい。プレス加工の条件は用いる樹脂組
成物によるが、例えば、高分子量体としてポリフェニレ
ンエーテルを使用した場合には、150〜240℃、1
〜5MPaで1〜3時間成形するのが好ましい。
By laminating a conductor foil such as an electrolytic copper foil on the prepreg of the present invention and subjecting it to hot pressing, a laminate having a conductor layer on the surface is produced. The thickness of the copper foil is 12-36
About μm is preferable. The pressing conditions depend on the resin composition used, but for example, when polyphenylene ether is used as the high molecular weight substance, 150 to 240 ° C., 1
It is preferable to mold at 1-3 MPa for 1-3 hours.

【0039】上記積層板の導体層を通常のエッチング法
によって配線加工し、これを前記プリプレグを介して複
数積層し、加熱プレス加工によって多層化し、多層プリ
ント回路板を作製する。このようにして得られた多層プ
リント回路板は誘電率,誘電正接が低く,難燃性を有す
る。即ち、伝送特性と安全性に優れた多層プリント回路
板となる。
Wiring is performed on the conductor layers of the above-mentioned laminated board, a plurality of the conductor layers are laminated through the prepreg, and the layers are multilayered by hot pressing to produce a multilayer printed circuit board. The multilayer printed circuit board thus obtained has a low dielectric constant and a low dielectric loss tangent, and is flame retardant. That is, the multilayer printed circuit board has excellent transmission characteristics and safety.

【0040】[0040]

【発明の実施の形態】以下に本発明を実施例、並びに、
比較例を示して説明する。なお、説明中に部とあるの
は、特に断りのない限り重量部を指す。
BEST MODE FOR CARRYING OUT THE INVENTION The present invention will be described below with reference to Examples and
A comparative example will be described. In the description, “part” means “part by weight” unless otherwise specified.

【0041】表1,2に本発明の実施例と比較例の組成
およびその特性を示す。
Tables 1 and 2 show the compositions and characteristics of the examples of the present invention and comparative examples.

【0042】[0042]

【表1】 [Table 1]

【表2】 以下に実施例および比較例に使用した試薬の名称,合成
方法,ワニスの調製法および硬化物の評価方法を説明す
る。
[Table 2] The names of reagents used in Examples and Comparative Examples, synthesis methods, varnish preparation methods, and cured product evaluation methods are described below.

【0043】(1) 1,2−ビス(ビニルフェニル)
エタン(BVPEと呼ぶ)の合成 BVPEは、以下に示す公知の方法で合成した。500
mlの3つ口フラスコにグリニャール反応用粒状マグネ
シウム(関東化学製)5.36g(220mmol)を
採り、滴下ロート、窒素導入管およびセプタムキャップ
を取り付けた。窒素気流下、スターラによってマグネシ
ウム粒を攪拌しながら、系全体をドライヤーで加熱脱水
した。
(1) 1,2-bis (vinylphenyl)
Synthesis of ethane (called BVPE) BVPE was synthesized by a known method shown below. 500
5.36 g (220 mmol) of granular magnesium for Grignard reaction (manufactured by Kanto Kagaku Co., Ltd.) was placed in a ml three-necked flask, and a dropping funnel, a nitrogen introduction tube and a septum cap were attached. The whole system was heated and dehydrated with a dryer while stirring the magnesium particles with a stirrer under a nitrogen stream.

【0044】乾燥テトラヒドロフラン300mlをシリ
ンジに採り、セプタムキャップを通じて注入した。溶液
を−5℃に冷却後、滴下ロートを用いてビニルベンジル
クロライド(VBC、東京化成製)30.5g(200
mmol)を、約4時間かけて滴下した。滴下終了後、
0℃/20時間攪拌を続けた。反応終了後、反応溶液を
ろ過して残存マグネシウムを除き、エバポレータで濃縮
した。
300 ml of dry tetrahydrofuran was taken in a syringe and injected through a septum cap. After cooling the solution to −5 ° C., 30.5 g of vinylbenzyl chloride (VBC, manufactured by Tokyo Kasei) using a dropping funnel (200
mmol) was added dropwise over about 4 hours. After the dropping is completed,
Stirring was continued at 0 ° C./20 hours. After completion of the reaction, the reaction solution was filtered to remove residual magnesium, and concentrated with an evaporator.

【0045】該濃縮溶液をヘキサンで希釈し、3.6%
塩酸水溶液で1回、純水で3回洗浄し、次いで硫酸マグ
ネシウムで脱水した。
The concentrated solution was diluted with hexane to give 3.6%
It was washed once with an aqueous hydrochloric acid solution and three times with pure water, and then dehydrated with magnesium sulfate.

【0046】脱水溶液をシリカゲル(和光純薬製ワコー
ゲルC300)/ヘキサンのショートカラムに通して精
製し、真空乾燥してBVPEを得た。得られたBVPE
はm−m体(液状)、m−p体(液状)、p−p体(結
晶)の混合物であり、収率は90%であった。1H−N
MRによって構造を調べたところ、その値は文献値と一
致した(6H−ビニル:α−2H、6.7ppm、β−
4H:5.7、5.2ppm、8H−アロマティック:
7.1〜7.35ppm、4H−メチレン:2.9pp
m)。このBVPEを架橋成分として用いた。
The dewatered solution was purified by passing through a short column of silica gel (Wako gel C300 manufactured by Wako Pure Chemical Industries) / hexane and vacuum dried to obtain BVPE. The obtained BVPE
Is a mixture of m-m body (liquid), m-p body (liquid) and p-p body (crystal), and the yield was 90%. 1 H-N
When the structure was examined by MR, the value was in agreement with the literature value (6H-vinyl: α-2H, 6.7 ppm, β-
4H: 5.7, 5.2 ppm, 8H-aromatic:
7.1 to 7.35 ppm, 4H-methylene: 2.9 pp
m). This BVPE was used as a crosslinking component.

【0047】(2) その他の試薬 高分子量体;PPE:アルドリッチ製、ポリ−2,
6−ジメチル−1,4−フェニレンオキシド 難燃剤; SAYTEX8010:アルべマール浅野(株)製、
1,2−ビス(ペンタブロモフェニル)エタン SAYTEX BT−93:アルベマール浅野(株)
製、1,2−ビス(テトラブロモフタルイミド)エタン 難燃助剤;三酸化アンチモン:関東化学製 硬化触媒;25B:日本油脂製、2,5−ジメチル
−2,5−ビス(t−ブチルパーオキシ)ヘキシン−3 (3) ワニスの調製法 所定量の高分子量体,架橋成分およびブロム化合物,三
酸化アンチモン,クロロホルムをボールミルにて約8時
間攪拌して溶解,分散することによって樹脂組成物のワ
ニスを調製した。
(2) Other reagents Polymers; PPE: made by Aldrich, poly-2,
6-Dimethyl-1,4-phenylene oxide flame retardant; SAYTEX 8010: manufactured by Albemarle Asano Co., Ltd.
1,2-Bis (pentabromophenyl) ethane SAYTEX BT-93: Albemarle Asano Co., Ltd.
1,2-bis (tetrabromophthalimide) ethane flame retardant aid; antimony trioxide: Kanto Kagaku curing catalyst; 25B: Nippon Oil & Fats 2,5-dimethyl-2,5-bis (t-butylper) (Oxy) hexyne-3 (3) Method for preparing varnish A predetermined amount of a high molecular weight substance, a cross-linking component, a bromine compound, antimony trioxide and chloroform are dissolved and dispersed by stirring for about 8 hours in a ball mill to prepare a resin composition. A varnish was prepared.

【0048】(4) 樹脂板の作製 前記ワニスをPETフィルムに塗布して乾燥後、これを
剥離してポリテトラフロロエチレン製のスペーサ内に所
定量入れ、ポリイミドフィルムおよび鏡板を介し、真空
下で加熱,加圧して硬化物の樹脂板を得た。加熱条件は
120℃/30分、150℃/30分、180℃/10
0分で、プレス圧力1.5MPaの多段階加熱とした。
樹脂板の大きさは70mm×70mm×1.5mmとし
た。
(4) Preparation of Resin Plate The above-mentioned varnish was applied to a PET film, dried, and then peeled off and put in a predetermined amount in a spacer made of polytetrafluoroethylene, and the film was put under vacuum through a polyimide film and a mirror plate. A cured resin plate was obtained by heating and pressurizing. Heating conditions are 120 ° C / 30 minutes, 150 ° C / 30 minutes, 180 ° C / 10
In 0 minutes, multi-stage heating with a pressing pressure of 1.5 MPa was performed.
The size of the resin plate was 70 mm × 70 mm × 1.5 mm.

【0049】(5) プリプレグの作製 プリプレグは、前記ワニスをガラスクロス(日東紡製#
2116)に含浸し、室温にて約1時間、90℃で60
分間乾燥することにより作製した。
(5) Preparation of prepreg As the prepreg, the above-mentioned varnish was made into glass cloth (manufactured by Nitto Boseki #
2116) and allowed to stand at room temperature for about 1 hour at 90 ° C for 60 hours.
It was made by drying for a minute.

【0050】(6) プリプレグ硬化物の作製 積層板とした際の特性を知るため、前記のプリプレグを
10枚重ねて真空下、加熱および加圧して模擬基板を作
製した。加熱条件は120℃/30分、150℃/30
分、180℃/100分、プレス圧力1.5MPaの多
段階加熱とした。模擬基板は70mm×70mm×1.
5mmとした。
(6) Preparation of Cured Prepreg In order to know the characteristics of the laminated plate, 10 sheets of the above prepreg were stacked and heated and pressed under vacuum to prepare a simulated substrate. Heating conditions are 120 ° C / 30 minutes, 150 ° C / 30
Min, 180 ° C./100 minutes, and a multi-stage heating with a pressing pressure of 1.5 MPa. The simulated board is 70 mm x 70 mm x 1.
It was set to 5 mm.

【0051】(7) 誘電率および誘電正接の測定 誘電率、誘電正接の測定は、空胴共振器摂動法(アジレ
ントテクノロジー製、8722ES型ネットワークアナ
ライザー、関東電子応用開発製空胴共振器)によって、
10GHzでの値を観測した。
(7) Measurement of dielectric constant and dielectric loss tangent The dielectric constant and dielectric loss tangent are measured by the cavity resonator perturbation method (Agilent Technology, 8722ES type network analyzer, Kanto Electronics Application Development cavity resonator).
The value at 10 GHz was observed.

【0052】(8) 難燃性 難燃性は、サンプルサイズ70mm×3mm×1.5m
mの試料を用いてUL−94規格に基づき実施し、平均
燃焼時間と最大燃焼時間を観測した。
(8) Flame-retardant flame-retardant property is sample size 70 mm × 3 mm × 1.5 m
It carried out based on UL-94 standard using the sample of m, and observed the average burning time and the maximum burning time.

【0053】〔比較例1〕比較例1は、ブロム化合物を
添加していない樹脂組成物から作製した樹脂板である。
誘電特性は優れているものの、難燃剤を含んでいないた
め難燃性を有していなかった。
Comparative Example 1 Comparative Example 1 is a resin plate prepared from a resin composition containing no bromine compound.
Although it had excellent dielectric properties, it did not have flame retardancy because it contained no flame retardant.

【0054】〔実施例1〜3〕実施例1〜3は、所定の
組成物に種々の配合比でブロム化合物を添加した。ブロ
ム化合物であるSAYTEX8010を添加したことに
よって、比較例1に比べて燃焼時間が短くなることが分
かった。この時、誘電率は2.51〜2.53、誘電正接
は0.0028〜0.003と低い値を示した。これによ
り優れた誘電特性を有する難燃性の樹脂組成物が得られ
ることが分かった。
Examples 1 to 3 In Examples 1 to 3, the bromine compound was added to the predetermined composition at various compounding ratios. It was found that the burning time was shortened as compared with Comparative Example 1 by adding SAYTEX 8010 which is a bromine compound. At this time, the dielectric constant was 2.51 to 2.53 and the dielectric loss tangent was 0.0028 to 0.003, which were low values. It was found that a flame-retardant resin composition having excellent dielectric properties was obtained in this way.

【0055】〔実施例4〜6〕実施例4〜6は、比較例
1の樹脂組成物にブロム化合物を種々の量添加した組成
物から樹脂板を作製した。ブロム化合物であるSAYT
EXBT−93を添加することにより難燃性が向上する
ことが確認された。この時、誘電率は2.52〜2.5
5、誘電正接は0.0026〜0.0032と低い値であ
った。これにより、優れた誘電特性を有する難燃性樹脂
組成物が得られることが分かった。
[Examples 4 to 6] In Examples 4 to 6, resin plates were prepared from compositions obtained by adding various amounts of bromine compounds to the resin composition of Comparative Example 1. SAYT which is a bromine compound
It was confirmed that flame retardancy was improved by adding EXBT-93. At this time, the dielectric constant is 2.52 to 2.5.
5, the dielectric loss tangent was a low value of 0.0026 to 0.0032. By this, it was found that a flame-retardant resin composition having excellent dielectric properties was obtained.

【0056】〔実施例7〕実施例1のワニスを用いてプ
リプレグを作製した。作製したプリプレグはタックフリ
ー性を有していた。本プリプレグを10枚重ね合わせて
真空下、加熱,加圧してプリプレグ硬化物を作製した。
Example 7 Using the varnish of Example 1, a prepreg was produced. The prepared prepreg had a tack-free property. Ten prepregs were superposed and heated and pressed under vacuum to prepare a prepreg cured product.

【0057】本プリプレグ硬化物の樹脂含有量は35w
t%であった。UL−94規格に従って難燃性試験を実
施したところ、平均燃焼時間は0.3秒、最大燃焼時間
は0.4秒とV−0相当の難燃性を得られることが分か
った。また、誘電率は3.12,誘電正接は0.0041
であった。
The resin content of the cured product of this prepreg is 35w.
It was t%. When a flame retardancy test was conducted according to the UL-94 standard, it was found that an average burning time of 0.3 seconds and a maximum burning time of 0.4 seconds were obtained, and flame retardancy equivalent to V-0 was obtained. The dielectric constant is 3.12 and the dielectric loss tangent is 0.0041.
Met.

【0058】本プリプレグに用いた樹脂組成物は優れた
溶融流動性を有し、多層プリント回路板の層間接着剤と
して好適に用いることができる。
The resin composition used in this prepreg has excellent melt fluidity and can be suitably used as an interlayer adhesive for a multilayer printed circuit board.

【0059】〔実施例8〕実施例7のプリプレグの両面
に電解銅箔の粗面を張り付け、真空下で加圧,加熱して
両面銅張積層板を作製した。加熱条件は120℃/30
分、150℃/30分、240℃/100分、プレス圧
力1.5MPaとした。
[Example 8] Rough surfaces of electrolytic copper foil were attached to both surfaces of the prepreg of Example 7, and pressed and heated under vacuum to produce a double-sided copper-clad laminate. Heating condition is 120 ℃ / 30
Min, 150 ° C./30 min, 240 ° C./100 min, and press pressure 1.5 MPa.

【0060】銅箔とプリプレグは良好な接着性を示し
た。これにより低誘電損失の多層プリント回路板の作製
が可能となった。
The copper foil and prepreg showed good adhesion. This made it possible to fabricate a multilayer printed circuit board with low dielectric loss.

【0061】〔実施例9〕図1は、本発明の多層プリン
ト回路板の作成工程の一例を示す模式断面図である。
[Embodiment 9] FIG. 1 is a schematic cross-sectional view showing an example of a process for producing a multilayer printed circuit board according to the present invention.

【0062】工程(A)では、実施例8と同様にして得
た樹脂基板1の両面に電解銅箔2を張り付けた両面銅張
積層板の片面にフォトレジスト3(日立化成工業製 H
S425)をラミネートしてフォトレジスト3の全面に
露光した。
In the step (A), a photoresist 3 (Hitachi Kasei Kogyo H, manufactured by Hitachi Chemical Co., Ltd.) was formed on one surface of a double-sided copper-clad laminate obtained by sticking electrolytic copper foils 2 on both surfaces of a resin substrate 1 obtained in the same manner as in Example 8.
S425) was laminated and the entire surface of the photoresist 3 was exposed.

【0063】次いで、フォトレジスト3を貼っていない
一方の面にフォトレジスト3(日立化成工業製 HS4
25)をラミネートしてテストパターンを露光し、未露
光部分のフォトレジストを1%炭酸ナトリウム液で現像
した。
Next, the photoresist 3 (HS4 manufactured by Hitachi Chemical Co., Ltd.) is formed on one surface on which the photoresist 3 is not attached.
25) was laminated to expose the test pattern, and the photoresist in the unexposed portion was developed with a 1% sodium carbonate solution.

【0064】工程(B)では、硫酸5%,過酸化水素5
%のエッチング液により、露出した銅箔をエッチング除
去して、両面銅張積層板の片面に導体配線を形成した。
In step (B), sulfuric acid 5% and hydrogen peroxide 5%
% Of the etching solution to remove the exposed copper foil by etching to form a conductor wiring on one surface of the double-sided copper-clad laminate.

【0065】工程(C)では,3%水酸化ナトリウム溶
液で残存するフォトレジスト3を除去し、片面に配線を
有する配線基板を得た。同様にして2枚の配線基板を作
製した。
In step (C), the remaining photoresist 3 was removed with a 3% sodium hydroxide solution to obtain a wiring board having wiring on one surface. Two wiring boards were produced in the same manner.

【0066】工程(D)では、二枚の配線基板の配線側
の面に実施例8のプリプレグ4を挟み、真空下、加熱,
加圧して多層化した。加熱条件は120℃/30分、1
50℃/30分、240℃/100分、プレス圧力1.
5MPaの多段階加熱とした。
In step (D), the prepreg 4 of Example 8 is sandwiched between the wiring-side surfaces of the two wiring boards and heated under vacuum.
Pressure was applied to form multiple layers. Heating conditions are 120 ° C / 30 minutes, 1
50 ° C / 30 minutes, 240 ° C / 100 minutes, press pressure 1.
It was a multi-stage heating of 5 MPa.

【0067】工程(E)では、作製した多層板の両面の
外装銅にフォトレジスト3(日立化成製HS425)を
ラミネートしてテストパターンを露光し、未露光部分の
フォトレジストを1%炭酸ナトリウム液で現像した。
In step (E), photoresist 3 (HS425 manufactured by Hitachi Chemical Co., Ltd.) is laminated on the exterior copper on both sides of the produced multilayer board to expose a test pattern, and the photoresist in the unexposed portion is exposed to a 1% sodium carbonate solution. Developed.

【0068】工程(F)では、硫酸5%、過酸化水素5
%のエッチング液により露出した銅箔をエッチング除去
し、3%水酸化ナトリウム溶液で残存するフォトレジス
トを除去して外装配線6を形成した。
In step (F), sulfuric acid 5% and hydrogen peroxide 5%
% Of the exposed copper foil by etching, and the remaining photoresist was removed with a 3% sodium hydroxide solution to form the exterior wiring 6.

【0069】工程(G)では、内層配線5と外装配線6
を接続するスルーホール7をドリル加工で形成した。
In the step (G), the inner layer wiring 5 and the outer wiring 6
A through hole 7 for connecting the above was formed by drilling.

【0070】工程(H)では、配線基板をめっき触媒の
コロイド溶液に浸して、スルーホール7内および基板表
面にめっき触媒8を付着形成した。
In step (H), the wiring board was dipped in a colloidal solution of the plating catalyst to deposit the plating catalyst 8 inside the through holes 7 and on the surface of the board.

【0071】工程(I)では、めっき触媒8を活性化処
理後、無電解めっき(日立化成工業製 CUST200
0)により、約1μmの種膜9を設けた。
In step (I), after the plating catalyst 8 is activated, electroless plating (CUST200 manufactured by Hitachi Chemical Co., Ltd.) is performed.
0), a seed film 9 of about 1 μm was provided.

【0072】工程(J)では、フォトレジスト(日立化
成工業製 HN920)を配線基板の両面にラミネート
した。
In step (J), a photoresist (HN920 manufactured by Hitachi Chemical Co., Ltd.) was laminated on both surfaces of the wiring board.

【0073】工程(K)では、スルーホール7部分およ
び配線基板の端部をマスクして露光後、3%炭酸ナトリ
ウムで現像して開孔部10を設けた。
In step (K), the through hole 7 and the end of the wiring board were masked, exposed, and developed with 3% sodium carbonate to provide the opening 10.

【0074】工程(L)では、配線基板の端部に電極1
1を設け、電解めっきによりスルーホール7部分にめっ
き銅12を約18μm形成した。
In step (L), the electrode 1 is attached to the end of the wiring board.
No. 1 was provided, and plated copper 12 was formed to a thickness of about 18 μm in the through hole 7 portion by electrolytic plating.

【0075】工程(M)では、電極部分11を切断除去
し、残存するフォトレジストを5%水酸化ナトリウム水
溶液で除去した。
In step (M), the electrode portion 11 was cut and removed, and the remaining photoresist was removed with a 5% sodium hydroxide aqueous solution.

【0076】工程(N)では、硫酸5%、過酸化水素5
%のエッチング液に配線基板を浸して約1μmエッチン
グし、種膜9を除去することで多層プリント回路板を得
た。得られた多層プリント回路板は低誘電率,低誘電正
接で、かつ、高い難燃性を示した。
In the step (N), sulfuric acid 5% and hydrogen peroxide 5
The wiring board was dipped in an etching solution of 1% and etched by about 1 μm, and the seed film 9 was removed to obtain a multilayer printed circuit board. The obtained multilayer printed circuit board had a low dielectric constant, a low dielectric loss tangent, and high flame retardancy.

【0077】[0077]

【発明の効果】本発明によれば、誘電率、誘電正接が低
く、難燃性の硬化物を与える樹脂組成物が得られる。本
樹脂組成物は、高周波用電気部品の絶縁材料に好適であ
り、高周波信号用多層プリント回路板用のプリプレグ,
積層板へ用いた場合、低誘電損失と難燃性とが両立でき
ると云う優れた効果が得られる。
According to the present invention, a resin composition which has a low dielectric constant and a low dielectric loss tangent and gives a flame-retardant cured product can be obtained. The resin composition is suitable as an insulating material for high-frequency electric parts, and is suitable for use in prepregs for multi-layer printed circuit boards for high-frequency signals.
When it is used for a laminated board, an excellent effect that low dielectric loss and flame retardancy are compatible can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の多層プリント回路板の作製工程の一例
を示す模式断面図である。
FIG. 1 is a schematic cross-sectional view showing an example of a manufacturing process of a multilayer printed circuit board according to the present invention.

【符号の説明】[Explanation of symbols]

1…樹脂基板、2…電解銅箔、3…フォトレジスト、4
…プリプレグ、5…内層配線、6…外層配線、7…スル
ーホール、8…めっき触媒、9…種膜、10…開孔部、
11…電極、12…めっき銅。
1 ... Resin substrate, 2 ... Electrolytic copper foil, 3 ... Photoresist, 4
... prepreg, 5 ... inner layer wiring, 6 ... outer layer wiring, 7 ... through hole, 8 ... plating catalyst, 9 ... seed film, 10 ... open hole portion,
11 ... Electrode, 12 ... Plated copper.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C08J 5/24 CET C08J 5/24 CET 4J100 C08K 3/18 C08K 3/18 5/03 5/03 5/3417 5/3417 C08L 101/00 C08L 101/00 H05K 1/03 610 H05K 1/03 610H (72)発明者 山田 真治 茨城県日立市大みか町七丁目1番1号 株 式会社日立製作所日立研究所内 (72)発明者 石川 敬郎 茨城県日立市大みか町七丁目1番1号 株 式会社日立製作所日立研究所内 (72)発明者 高橋 昭雄 茨城県日立市大みか町七丁目1番1号 株 式会社日立製作所日立研究所内 (72)発明者 中村 吉宏 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館事業所内 (72)発明者 塙 明徳 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館事業所内 (72)発明者 飯島 利行 茨城県下館市大字小川1500番地 日立化成 工業株式会社下館事業所内 Fターム(参考) 4F072 AA04 AB02 AB08 AB28 AB29 AD02 AD05 AD09 AE02 AE07 AF02 AF14 AF15 AF20 AF27 AF29 AG03 AG16 AH21 AK05 AK13 4F100 AA29B AB17 AB33 AH05B AK02B AK08B AK12B AK25B AK27B AK29B AK54B AL05B AR00A AR00C BA02 BA03 BA06 BA10A BA10C CA02B CA30B DG15B EJ05B EJ821 EJ861 GB41 GB43 JA07B JG01A JG01C JG05 JJ07 YY00B 4J002 AC021 BB171 BC011 BC021 BC081 BG041 BG101 BH021 CH071 CM052 DE128 DE188 EA046 EB119 EB137 EC049 EE039 EE059 EK039 EQ019 ER019 ET009 EU027 EV299 EV309 EW179 FD132 FD137 FD138 FD146 FD159 FD209 GF00 GQ01 4J011 PA04 PA24 PA43 PA65 PA67 PA70 PA76 PA83 PB29 PB40 PC02 PC08 4J026 AA17 AA18 AA45 AA49 AA57 AA68 AA69 BA07 DB06 DB11 DB12 DB15 DB19 DB29 GA06 4J100 AB15P CA01 FA03 FA17 JA44 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) C08J 5/24 CET C08J 5/24 CET 4J100 C08K 3/18 C08K 3/18 5/03 5/03 5 / 3417 5/3417 C08L 101/00 C08L 101/00 H05K 1/03 610 H05K 1/03 610H (72) Inventor Shinji Yamada 7-1 Omika-cho, Hitachi City, Ibaraki Prefecture Hitachi Ltd. 72) Inventor Keiro Ishikawa 7-1, 1-1 Omika-cho, Hitachi City, Ibaraki Hitachi Ltd. Hitachi Research Laboratory (72) Inventor Akio Takahashi 7-1-1, Omika-cho, Hitachi City, Ibaraki Hitachi Hitachi Research Laboratory (72) Inventor Yoshihiro Nakamura 1500 Ogawa, Shimodate City, Ibaraki Prefecture Hitachi Chemical Co., Ltd. Shimodate Works (72) Inventor Hanawa Meitoku 1500 Ogawa Oita, Shimodate, Ibaraki Pref.Hitachi Kasei Kogyo Co., Ltd. Shimodate Business Office (72) Inventor Toshiyuki Iijima 1500 Ogawa, Shimodate, Ibaraki Shitadate Co., Ltd. AB29 AD02 AD05 AD09 AE02 AE07 AF02 AF14 AF15 AF20 AF27 AF29 AG03 AG16 AH21 AK05 AK13 4F100 AA29B AB17 AB33 AH05B AK02B AK08B AK12B AK25B AK27 GB JJ86 CG CABJ CA01B01 CA05B01 CA01B01B01 BA01 BA15 BA10 BA10 BA10 BA02 BA03 BA10 BA02 BA03 BA10 YY00B 4J002 AC021 BB171 BC011 BC021 BC081 BG041 BG101 BH021 CH071 CM052 DE128 DE188 EA046 EB119 EB137 EC049 EE0 PA0 PA0 PA0 PA0 PA6 PA6 PA6 PA6 PA6 PA6 PA6 PA6 PA6 PA06 PA06 PA06 PA06 PA06 FD 216 176 176 AA17 AA18 AA45 AA49 AA57 AA68 AA69 BA07 DB06 DB11 DB12 DB15 DB19 DB29 GA06 4J100 AB15P CA01 FA03 FA17 JA44

Claims (11)

【特許請求の範囲】[Claims] 【請求項1】 式1 【化1】 (式中、Rは置換基を有していてもよい炭化水素を、R
2,R3,R4は互いに異なってもよい水素原子または炭
素数1〜6の炭化水素基を、R5,R6,R7,R8は異な
ってもよい水素原子または炭素数1〜20の炭化水素基
を、nは2以上の整数を表す)で示される多官能のスチ
レン基を有する重量平均分子量1000以下の架橋成分
を含み、かつ、ブロム化合物を含有することを特徴とす
る樹脂組成物。
1. Formula 1 (In the formula, R represents a hydrocarbon which may have a substituent,
2 , R 3 and R 4 are hydrogen atoms which may be different from each other or a hydrocarbon group having 1 to 6 carbon atoms, and R 5 , R 6 , R 7 and R 8 are hydrogen atoms which may be different from each other or a carbon atom having 1 to 6 carbon atoms. A resin containing a polyfunctional styrene group represented by 20 hydrocarbon groups and n representing an integer of 2 or more) and a crosslinking component having a weight average molecular weight of 1000 or less and containing a bromine compound. Composition.
【請求項2】 前記樹脂組成物が、高分子量体を含有す
ることを特徴とする請求項1に記載の樹脂組成物。
2. The resin composition according to claim 1, wherein the resin composition contains a high molecular weight material.
【請求項3】 前記高分子量体がブタジエン,イソプレ
ン,スチレン,メチルスチレン,エチルスチレン,ジビ
ニルベンゼン,アクリル酸エステル,アクリロニトリ
ル,N−フェニルマレイミドおよびN−ビニルフェニル
マレイミドの少なくとも一種からなる重合体、置換基を
有していてもよいポリフェニレンオキサイド、または、
脂環式構造を有するポリオレフィン樹脂である請求項2
に記載の組成物。
3. A polymer comprising at least one of butadiene, isoprene, styrene, methylstyrene, ethylstyrene, divinylbenzene, acrylic acid ester, acrylonitrile, N-phenylmaleimide and N-vinylphenylmaleimide, wherein the high molecular weight polymer is a substituted compound. A polyphenylene oxide which may have a group, or
A polyolefin resin having an alicyclic structure.
The composition according to.
【請求項4】 前記樹脂組成物が、アンチモン化合物を
含有する請求項1に記載の樹脂組成物。
4. The resin composition according to claim 1, wherein the resin composition contains an antimony compound.
【請求項5】 前記アンチモン化合物が三酸化アンチモ
ン,四酸化アンチモン,五酸化アンチモンまたはアンチ
モン酸ソーダである請求項4に記載の樹脂組成物。
5. The resin composition according to claim 4, wherein the antimony compound is antimony trioxide, antimony tetraoxide, antimony pentaoxide or sodium antimonate.
【請求項6】 前記樹脂組成物が、スチレン基を重合し
得る硬化触媒またはスチレン基の重合を抑制し得る重合
禁止剤を含有する請求項1〜5のいずれかに記載の樹脂
組成物。
6. The resin composition according to claim 1, wherein the resin composition contains a curing catalyst capable of polymerizing a styrene group or a polymerization inhibitor capable of suppressing the polymerization of the styrene group.
【請求項7】 前記樹脂組成物中の樹脂成分の総量を1
00重量部として、前記ブロム化合物の添加量が1〜3
0重量部、アンチモン化合物の添加量が0.1〜10重
量部、硬化触媒の添加量が0.0005〜10重量部で
あり、重合禁止剤の添加量が0.0005〜5重量部で
ある請求項1〜6のいずれかに記載の樹脂組成物。
7. The total amount of resin components in the resin composition is 1
The amount of the bromine compound added is 1 to 3 parts by weight.
0 parts by weight, the addition amount of the antimony compound is 0.1 to 10 parts by weight, the addition amount of the curing catalyst is 0.0005 to 10 parts by weight, and the addition amount of the polymerization inhibitor is 0.0005 to 5 parts by weight. The resin composition according to claim 1.
【請求項8】 前記ブロム化物が1,2−ビス(ペンタ
ブロモフェニル)エタン、または、1,2−ビス(テト
ラブロモフタルイミド)エタンである請求項1に記載の
樹脂組成物。
8. The resin composition according to claim 1, wherein the bromide is 1,2-bis (pentabromophenyl) ethane or 1,2-bis (tetrabromophthalimido) ethane.
【請求項9】 請求項1〜8のいずれかに記載の樹脂組
成物を、有機または無機のクロスまたは不織布に含浸,
乾燥させてなることを特徴とするプリプレグ。
9. An organic or inorganic cloth or nonwoven fabric is impregnated with the resin composition according to any one of claims 1 to 8,
A prepreg characterized by being dried.
【請求項10】 請求項9に記載のプリプレグまたはそ
の硬化物の少なくとも片面に導体層が設けられているこ
とを特徴とする積層板。
10. A laminate comprising a prepreg according to claim 9 or a cured product of the prepreg, wherein a conductor layer is provided on at least one surface of the prepreg.
【請求項11】 請求項10に記載の積層板の導体層に
配線加工を施した後、プリプレグを介して該積層板を2
枚以上積層,接着したことを特徴とする多層プリント回
路板。
11. The conductor layer of the laminated plate according to claim 10 is subjected to wiring processing, and then the laminated plate is laminated with a prepreg.
A multi-layer printed circuit board characterized by being laminated and bonded together.
JP2002154158A 2002-05-28 2002-05-28 Resin composition and prepreg, laminate and multilayer printed circuit board using the same Expired - Fee Related JP4499344B2 (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7638564B2 (en) 2005-10-04 2009-12-29 Hitachi Chemical Co., Ltd. Low dielectric loss tangent-resin varnish, prepreg, laminated sheet, and printed wiring board using the varnish
US8492898B2 (en) 2007-02-19 2013-07-23 Semblant Global Limited Printed circuit boards
US8995146B2 (en) 2010-02-23 2015-03-31 Semblant Limited Electrical assembly and method
US9055700B2 (en) 2008-08-18 2015-06-09 Semblant Limited Apparatus with a multi-layer coating and method of forming the same
US11786930B2 (en) 2016-12-13 2023-10-17 Hzo, Inc. Protective coating

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105754318B (en) * 2014-12-19 2019-02-19 广东生益科技股份有限公司 A kind of compositions of thermosetting resin and its application

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7638564B2 (en) 2005-10-04 2009-12-29 Hitachi Chemical Co., Ltd. Low dielectric loss tangent-resin varnish, prepreg, laminated sheet, and printed wiring board using the varnish
US8492898B2 (en) 2007-02-19 2013-07-23 Semblant Global Limited Printed circuit boards
US9648720B2 (en) 2007-02-19 2017-05-09 Semblant Global Limited Method for manufacturing printed circuit boards
US9055700B2 (en) 2008-08-18 2015-06-09 Semblant Limited Apparatus with a multi-layer coating and method of forming the same
US8995146B2 (en) 2010-02-23 2015-03-31 Semblant Limited Electrical assembly and method
US11786930B2 (en) 2016-12-13 2023-10-17 Hzo, Inc. Protective coating

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