JP2003332696A5 - - Google Patents

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Publication number
JP2003332696A5
JP2003332696A5 JP2003129259A JP2003129259A JP2003332696A5 JP 2003332696 A5 JP2003332696 A5 JP 2003332696A5 JP 2003129259 A JP2003129259 A JP 2003129259A JP 2003129259 A JP2003129259 A JP 2003129259A JP 2003332696 A5 JP2003332696 A5 JP 2003332696A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2003129259A
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Japanese (ja)
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JP2003332696A (ja
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Publication date
Priority claimed from US10/140,625 external-priority patent/US6756325B2/en
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Publication of JP2003332696A publication Critical patent/JP2003332696A/ja
Publication of JP2003332696A5 publication Critical patent/JP2003332696A5/ja
Withdrawn legal-status Critical Current

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JP2003129259A 2002-05-07 2003-05-07 長波長窒化インジウムガリウム砒素(InGaAsN)活性領域の製作方法 Withdrawn JP2003332696A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/140,625 US6756325B2 (en) 2002-05-07 2002-05-07 Method for producing a long wavelength indium gallium arsenide nitride(InGaAsN) active region
US140625 2002-05-07

Publications (2)

Publication Number Publication Date
JP2003332696A JP2003332696A (ja) 2003-11-21
JP2003332696A5 true JP2003332696A5 (https=) 2006-06-22

Family

ID=29249790

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003129259A Withdrawn JP2003332696A (ja) 2002-05-07 2003-05-07 長波長窒化インジウムガリウム砒素(InGaAsN)活性領域の製作方法

Country Status (3)

Country Link
US (2) US6756325B2 (https=)
EP (1) EP1361601A3 (https=)
JP (1) JP2003332696A (https=)

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US6697404B1 (en) * 1996-08-30 2004-02-24 Ricoh Company, Ltd. Laser diode operable in 1.3μm or 1.5μm wavelength band with improved efficiency
US20030219917A1 (en) * 1998-12-21 2003-11-27 Johnson Ralph H. System and method using migration enhanced epitaxy for flattening active layers and the mechanical stabilization of quantum wells associated with vertical cavity surface emitting lasers
US6674785B2 (en) * 2000-09-21 2004-01-06 Ricoh Company, Ltd. Vertical-cavity, surface-emission type laser diode and fabrication process thereof
US20040161006A1 (en) * 2003-02-18 2004-08-19 Ying-Lan Chang Method and apparatus for improving wavelength stability for InGaAsN devices
WO2006039341A2 (en) 2004-10-01 2006-04-13 Finisar Corporation Vertical cavity surface emitting laser having multiple top-side contacts
US7860137B2 (en) 2004-10-01 2010-12-28 Finisar Corporation Vertical cavity surface emitting laser with undoped top mirror
JP4925601B2 (ja) 2005-04-18 2012-05-09 三菱電機株式会社 半導体装置
US7764721B2 (en) * 2005-12-15 2010-07-27 Palo Alto Research Center Incorporated System for adjusting the wavelength light output of a semiconductor device using hydrogenation
US7526007B2 (en) * 2005-12-15 2009-04-28 Palo Alto Research Center Incorporated Buried lateral index guided lasers and lasers with lateral current blocking layers
US20070153851A1 (en) * 2005-12-15 2007-07-05 Palo Alto Research Center Incorporated On-chip integration of passive and active optical components enabled by hydrogenation
US7843982B2 (en) * 2005-12-15 2010-11-30 Palo Alto Research Center Incorporated High power semiconductor device to output light with low-absorbtive facet window
WO2009009111A2 (en) * 2007-07-10 2009-01-15 The Board Of Trustees Of The Leland Stanford Junior University GaInNAsSB SOLAR CELLS GROWN BY MOLECULAR BEAM EPITAXY
US20100006023A1 (en) * 2008-07-11 2010-01-14 Palo Alto Research Center Incorporated Method For Preparing Films And Devices Under High Nitrogen Chemical Potential
US20100319764A1 (en) * 2009-06-23 2010-12-23 Solar Junction Corp. Functional Integration Of Dilute Nitrides Into High Efficiency III-V Solar Cells
US20110114163A1 (en) * 2009-11-18 2011-05-19 Solar Junction Corporation Multijunction solar cells formed on n-doped substrates
US20110232730A1 (en) 2010-03-29 2011-09-29 Solar Junction Corp. Lattice matchable alloy for solar cells
US9214580B2 (en) 2010-10-28 2015-12-15 Solar Junction Corporation Multi-junction solar cell with dilute nitride sub-cell having graded doping
US8962991B2 (en) 2011-02-25 2015-02-24 Solar Junction Corporation Pseudomorphic window layer for multijunction solar cells
US8927066B2 (en) * 2011-04-29 2015-01-06 Applied Materials, Inc. Method and apparatus for gas delivery
US8766087B2 (en) 2011-05-10 2014-07-01 Solar Junction Corporation Window structure for solar cell
EP2780945A4 (en) * 2011-11-14 2015-11-04 Quantum Electro Opto Sys Sdn OPTICAL INCLINED CHARGE DEVICES AND METHODS
US9159873B2 (en) 2011-11-14 2015-10-13 Quantum Electro Opto Systems Sdn. Bhd. High speed optical tilted charge devices and methods
WO2013074530A2 (en) 2011-11-15 2013-05-23 Solar Junction Corporation High efficiency multijunction solar cells
US9153724B2 (en) 2012-04-09 2015-10-06 Solar Junction Corporation Reverse heterojunctions for solar cells
US8860005B1 (en) * 2013-08-08 2014-10-14 International Business Machines Corporation Thin light emitting diode and fabrication method
DE102013225632A1 (de) * 2013-12-11 2015-06-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zur Herstellung einer Schicht
SG11201606353TA (en) 2014-02-05 2016-09-29 Solar Junction Corp Monolithic multijunction power converter
US9865769B2 (en) 2015-03-23 2018-01-09 International Business Machines Corporation Back contact LED through spalling
US20170110613A1 (en) 2015-10-19 2017-04-20 Solar Junction Corporation High efficiency multijunction photovoltaic cells
WO2018063391A1 (en) * 2016-09-30 2018-04-05 Intel Corporation High performance light emitting diode and monolithic multi-color pixel
WO2019010037A1 (en) 2017-07-06 2019-01-10 Solar Junction Corporation HYBRID MOCVD / MBE EPITAXIAL GROWTH OF MULTI-JUNCTION SOLAR CELLS ADAPTED TO THE HIGH-PERFORMANCE NETWORK
EP3669402A1 (en) 2017-09-27 2020-06-24 Array Photonics, Inc. Short wavelength infrared optoelectronic devices having a dilute nitride layer
US11211514B2 (en) 2019-03-11 2021-12-28 Array Photonics, Inc. Short wavelength infrared optoelectronic devices having graded or stepped dilute nitride active regions
GB2617567A (en) * 2022-04-11 2023-10-18 Iqe Plc Method and system for mixed group V precursor process
GB2634209A (en) * 2023-09-27 2025-04-09 Iqe Plc Semiconductor structures

Family Cites Families (12)

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JP3445653B2 (ja) * 1994-03-23 2003-09-08 士郎 酒井 発光素子
JP2917913B2 (ja) * 1996-06-10 1999-07-12 日本電気株式会社 半導体光素子の製造方法
US6233264B1 (en) * 1996-08-27 2001-05-15 Ricoh Company, Ltd. Optical semiconductor device having an active layer containing N
US5719895A (en) * 1996-09-25 1998-02-17 Picolight Incorporated Extended wavelength strained layer lasers having short period superlattices
US6764928B1 (en) * 1997-02-20 2004-07-20 Semiconductor Energy Laboratory Co., Ltd. Method of manufacturing an El display device
JP3683669B2 (ja) * 1997-03-21 2005-08-17 株式会社リコー 半導体発光素子
WO1998044539A1 (en) * 1997-03-28 1998-10-08 Sharp Kabushiki Kaisha Method for manufacturing compound semiconductors
JPH1174485A (ja) * 1997-06-30 1999-03-16 Toshiba Corp 半導体装置およびその製造方法
US5944913A (en) * 1997-11-26 1999-08-31 Sandia Corporation High-efficiency solar cell and method for fabrication
US6150677A (en) * 1998-02-19 2000-11-21 Sumitomo Electric Industries, Ltd. Method of crystal growth of compound semiconductor, compound semiconductor device and method of manufacturing the device
US6207973B1 (en) * 1998-08-19 2001-03-27 Ricoh Company, Ltd. Light emitting devices with layered III-V semiconductor structures
US6764926B2 (en) * 2002-03-25 2004-07-20 Agilent Technologies, Inc. Method for obtaining high quality InGaAsN semiconductor devices

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