JP2003292890A - Coating film-forming material - Google Patents
Coating film-forming materialInfo
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- JP2003292890A JP2003292890A JP2002095464A JP2002095464A JP2003292890A JP 2003292890 A JP2003292890 A JP 2003292890A JP 2002095464 A JP2002095464 A JP 2002095464A JP 2002095464 A JP2002095464 A JP 2002095464A JP 2003292890 A JP2003292890 A JP 2003292890A
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- Prior art keywords
- coating film
- forming material
- substrate
- heating
- film forming
- Prior art date
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Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、珪酸エステルとシ
リコーンオイルの混合物を使用した、塗膜形成用材料及
び塗膜形成方法並びに成形材料に関する。TECHNICAL FIELD The present invention relates to a coating film forming material, a coating film forming method, and a molding material which use a mixture of a silicate ester and a silicone oil.
【０００２】[0002]
【従来の技術】有機珪素化合物を使用したコーテイング
材料としては、セラミック表面に耐高温、耐酸化性の塗
膜形成するための室温硬化型の材料が知られているが
（米国特許第５，９８５、４３３号明細書）、この材料
は、アルキルトリシロキサンまたはアルキルトリアルコ
キシシロキサンとジアルキルジアルコキシシロキサンの
混合物を加水分解及び部分濃縮して得られる、液状ポリ
オルガノシロキサンからなるものであり、セラミック表
面に形成される塗膜は、Ｓｉ−Ｃ結合を多く含み、この
ため赤外から紫外の広範囲にそれに由来する吸収が生
じ、特に紫外光の吸収により光劣化の恐れがあり、光触
媒担持担体として使用する場合には性能上の問題を生じ
る。さらに、硬さも十分でないため変形がおこりやすい
という問題点を有していた。2. Description of the Related Art As a coating material using an organic silicon compound, a room temperature curing type material for forming a high temperature and oxidation resistant coating film on a ceramic surface is known (US Pat. No. 5,985). No. 433), this material is composed of a liquid polyorganosiloxane obtained by hydrolyzing and partially concentrating an alkyltrisiloxane or a mixture of an alkyltrialkoxysiloxane and a dialkyldialkoxysiloxane. The coating film formed contains a large amount of Si—C bonds, so that absorption due to it occurs in a wide range from infrared to ultraviolet, and there is a risk of photodegradation due to absorption of ultraviolet light in particular. In some cases performance problems arise. Furthermore, there is a problem that deformation is likely to occur due to insufficient hardness.
【０００３】また、ガラス容器コーテイング用エマルジ
ョン組成物として、特定のアルコキシシランまたはその
部分加水分解物、珪素原子に結合した水酸基を有する特
定の分岐状ポリオルガノシロキサン樹脂、アルキル変性
シリコーンオイル、ジメチルシリコーンオイル、炭化水
素溶剤、揮発性シリコーン、界面活性剤及び水からなる
組成物が知られているが（特開２０００−６３７５６
号）、該組成物は、その組成が複雑な上、形成される塗
膜は、上記と同様Ｓｉ−Ｃ結合を多く含み同様な問題点
を有しており、さらに、この組成物は、水を多量に含む
エマルジョンであるため、厚膜を形成することができな
い。Further, as an emulsion composition for coating a glass container, a specific alkoxysilane or a partial hydrolyzate thereof, a specific branched polyorganosiloxane resin having a hydroxyl group bonded to a silicon atom, an alkyl-modified silicone oil, and a dimethyl silicone oil. , A hydrocarbon solvent, a volatile silicone, a surfactant and water are known (Japanese Patent Application Laid-Open No. 2000-63756).
No.), the composition has a complicated composition, and the coating film formed has a large number of Si—C bonds as described above and has the same problems. Since it is an emulsion containing a large amount of, it is not possible to form a thick film.
【０００４】[0004]
【発明が解決しようとする課題】そこで、本発明の課題
は、上記従来技術の問題を解決するとともに、簡単な組
成で、特に基材上に厚膜を形成することが可能であり、
かつ基材との密着性、耐熱性、光安定性に優れた、シリ
カを主成分とした塗膜形成用材料をあるいは成形材料を
提供することにある。Therefore, an object of the present invention is to solve the above-mentioned problems of the prior art and to form a thick film with a simple composition, especially on a substrate,
Another object of the present invention is to provide a coating material or a molding material containing silica as a main component, which is excellent in adhesion to a substrate, heat resistance, and light stability.
【０００５】[0005]
【課題を解決するための手段】本発明者は、上記課題を
解決すべく鋭意研究の結果、珪酸エステルとシリコーン
オイルの混合物を８０〜３５０℃の温度で加熱すること
により得られた液体を使用して、基材に塗布した場合、
極めて優れた基材との密着性を有する塗膜が形成可能で
あるとともに、特に半導体デバイスの高誘電体等に用い
る厚膜形成等に好適であり、シリカを主成分とする優れ
た塗膜形成材料あるいは成形材料となり得ることを見い
だし、本発明を完成させるに至ったものである。As a result of intensive studies to solve the above-mentioned problems, the present inventor has used a liquid obtained by heating a mixture of silicate ester and silicone oil at a temperature of 80 to 350 ° C. Then, when applied to the substrate,
It is possible to form a coating film that has extremely excellent adhesion to a substrate, and is particularly suitable for forming a thick film used for high dielectric materials of semiconductor devices, etc., and an excellent coating film containing silica as a main component. The inventors have found that they can be used as materials or molding materials, and have completed the present invention.
【０００６】すなわち、本発明は以下の（１）〜（１
０）に係るものである。
（１） 珪酸エステルとシリコーンオイルの混合物を８
０〜３５０℃の温度で加熱することにより得られた液状
物からなることを特徴とする、塗膜形成用材料。
（２） 塗膜が半導体デバイス用高誘電率厚膜である
（１）に記載の塗膜形成用材料。
（３）塗膜が、ガラス、セラミック、金属、プラスチッ
クまたはコンクリートから選ばれる基材に形成されるも
のである、（１）に記載の塗膜形成用材料。
（４）塗膜が撥水性を付与するものである、（３）に記
載の塗膜形成用材料。
（５）塗膜が金属基材に耐食性を付与するものである、
（３）に記載の塗膜形成用材料。
（６）（１）に記載の塗膜形成材料により塗膜が形成さ
れた基材。
（７）塗膜が多孔質である（６）記載の基材。
（８）珪酸エステルとシリコーンオイルの混合物を８０
〜３５０℃の温度で加熱することにより得られた液体か
らなることを特徴とする成形材料。
（９）（８）に記載の成形材料を使用して成形された物
品。
（１０）多孔質である（９）に記載の物品。
（１１）珪酸エステルとシリコーンオイルの混合物を８
０〜３５０℃の以下の温度で加熱することにより得られ
た液体を、ガラス、セラミック、金属、プラスチックま
たはコンクリートから選ばれる基材に塗布した後、加熱
または非加熱条件下で硬化させることを特徴とする、塗
膜の形成方法。That is, the present invention provides the following (1) to (1
0). (1) Add a mixture of silicate ester and silicone oil to 8
A coating film-forming material comprising a liquid material obtained by heating at a temperature of 0 to 350 ° C. (2) The coating film forming material according to (1), wherein the coating film is a high dielectric constant thick film for semiconductor devices. (3) The coating film forming material according to (1), wherein the coating film is formed on a substrate selected from glass, ceramic, metal, plastic or concrete. (4) The coating film forming material according to (3), wherein the coating film imparts water repellency. (5) The coating film imparts corrosion resistance to the metal substrate,
The coating film forming material according to (3). (6) A substrate on which a coating film is formed by the coating film forming material according to (1). (7) The substrate according to (6), wherein the coating film is porous. (8) Add a mixture of silicate ester and silicone oil to 80
A molding material comprising a liquid obtained by heating at a temperature of ˜350 ° C. (9) An article molded using the molding material according to (8). (10) The article according to (9), which is porous. (11) Add a mixture of silicate ester and silicone oil to 8
A liquid obtained by heating at a temperature of 0 to 350 ° C. below is applied to a substrate selected from glass, ceramic, metal, plastic or concrete, and then cured under heating or non-heating conditions. And a method for forming a coating film.
【０００７】[0007]
【発明の実施の形態】本発明の塗膜形成用材料は、珪酸
エステルとシリコーンオイルの混合物を主成分とし、こ
れを加熱することにより得られた若干粘凋な液体からな
るものである。本発明において使用する珪酸エステルと
しては、例えば、テトラメトキシオルトシリケート、テ
トラエトキシオルトシリケート、テトラプロポキシオル
トシリケート等のテトラアルコキシオルトシリケートが
挙げられる。また、シリコーンオイルは、直鎖状のジメ
チルポリシロキサンであって、グリセリンと同程度の粘
度を持つものが好ましい。BEST MODE FOR CARRYING OUT THE INVENTION The coating film forming material of the present invention comprises a mixture of silicate ester and silicone oil as a main component, and a slightly viscous liquid obtained by heating the mixture. Examples of the silicic acid ester used in the present invention include tetraalkoxy orthosilicates such as tetramethoxy orthosilicate, tetraethoxy orthosilicate, and tetrapropoxy orthosilicate. The silicone oil is preferably linear dimethylpolysiloxane and has a viscosity similar to that of glycerin.
【０００８】本発明の塗膜形成用材料には、上記主成分
の他、希釈剤としての低沸点有機溶剤、たとえばノルマ
ルヘキサン、シクロヘキサン、ベンゼンなどを使用で
き、顔料として酸化亜鉛粉末、酸化チタン粉末、チタン
酸バリウム粉末等、各種フェライト粉末等の無機粉末、
あるいはフィラーとしてカーボン粉末、ダイヤモンド粉
末等の炭素質粉末、そのほか貴金属粉末、磁性合金粉末
等の金属粉末等も添加できる。一方、高温にせずに使用
する場合には、光学的性質を持つ有機物たとえば２−メ
チル４−ニトロアニリン、ポリマー粒子等も添加でき
る。多孔体を得たいときには、加熱により分解しガス化
する物質たとえば尿素等を添加することも可能である。
さらに、塗膜の亀裂を防止するため、あるいはＳｉ−Ｃ
結合の残留を抑制するためには、オレイン酸等の脂肪酸
を使用することが有効である。また、これらの脂肪酸の
使用は大気中の水分を徐々に吸収し、微細なシリカ粒子
を基板上に沈積させる点で有利である。In the coating film forming material of the present invention, in addition to the above main components, a low boiling point organic solvent as a diluent, for example, normal hexane, cyclohexane, benzene and the like can be used, and zinc oxide powder, titanium oxide powder as a pigment. , Inorganic powders such as various ferrite powders such as barium titanate powder,
Alternatively, carbon powder such as carbon powder or diamond powder, or metal powder such as noble metal powder or magnetic alloy powder may be added as a filler. On the other hand, when it is used at a high temperature, organic substances having optical properties such as 2-methyl-4-nitroaniline and polymer particles can be added. When it is desired to obtain a porous body, it is possible to add a substance that decomposes and gasifies by heating, such as urea.
In addition, to prevent cracks in the coating film, or Si-C
The use of fatty acids such as oleic acid is effective for suppressing the residual bond. Further, the use of these fatty acids is advantageous in that it gradually absorbs moisture in the atmosphere and deposits fine silica particles on the substrate.
【０００９】また、本発明の塗膜形成用材料を得るに
は、珪酸エステルとシリコーンオイルの主成分、及び所
望により添加剤を加え混合した原料混合物を加熱する
が、この加熱温度は８０〜３５０℃であり、好ましくは
１２０〜２００℃である。また、この加熱操作は、上記
温度範囲内で、連続的あるいは段階的に昇温して行うの
が望ましく、全体の加熱時間は約３時間である。また、
この際、気化した物質を一部還流しながら行うのがよ
い。In order to obtain the coating film forming material of the present invention, the raw material mixture obtained by mixing the main components of silicate ester and silicone oil and, if desired, additives is heated, and the heating temperature is 80 to 350. ℃, and preferably 120 to 200 ℃. Further, this heating operation is preferably carried out by raising the temperature continuously or stepwise within the above temperature range, and the total heating time is about 3 hours. Also,
At this time, it is preferable to partially reflux the vaporized substance.
【００１０】この加熱操作により得られるものは透明で
若干粘凋な液状物である。この液状物からなる本発明の
塗膜形成用材料を用いて、ガラス、セラミック、金属、
プラスチックまたはコンクリートから選ばれる基材に塗
膜を形成するには、これら基材に当該液状物を室温〜２
５０℃で塗布した後、そのまま又は湿気を含んだ大気等
に曝し、又は蒸留水その他の水溶液に浸漬処理をした後
の条件下において室温放置あるいは加熱して硬化させ
る。硬化させるときにも、気体、液体、超臨界流体等の
雰囲気に曝すことができ、紫外線、可視光、赤外線、マ
イクロ波等を照射することもでき、電磁場を作用させる
こともできる。加熱する場合の加熱温度は、３５０℃以
下で、そのとき硬化時間は１０時間以内程度でよい。ま
た、室温放置の場合は硬化時間は２０時間以内程度であ
る。The product obtained by this heating operation is a transparent and slightly viscous liquid substance. Using the coating film forming material of the present invention consisting of this liquid material, glass, ceramics, metals,
To form a coating film on a base material selected from plastic or concrete, the liquid material is applied to these base materials at room temperature to 2
After coating at 50 ° C., it is left at room temperature or heated to cure under the conditions as it is, exposed to an atmosphere containing moisture, or immersed in distilled water or other aqueous solution. Even when it is cured, it can be exposed to an atmosphere of gas, liquid, supercritical fluid, etc., can be irradiated with ultraviolet rays, visible light, infrared rays, microwaves, etc., and an electromagnetic field can be applied. The heating temperature in the case of heating is 350 ° C. or lower, and at that time, the curing time may be about 10 hours or less. When left at room temperature, the curing time is about 20 hours or less.
【００１１】これにより得られる塗膜は、撥水性で、か
つ基材と強固に結合した密着性のものであり、亀裂もほ
とんどみられず、しかも耐熱性に富むものである。した
がって、本発明の塗膜形成用材料は、セラミックス、金
属、プラスチック、コンクリート等の基材に撥水性の塗
膜を形成するのに好適であり、これにより、霜、氷の付
着も防止でき、また、金属材料の耐食性塗膜としても優
れるほか、本発明の塗膜材料によれば厚さ５ミクロンか
ら５ミリ以上の厚膜が形成可能であるので、例えば、半
導体デバイス用の高誘電率厚膜としても最適である。The coating film thus obtained is water-repellent and adheres firmly to the substrate, has few cracks, and is highly heat-resistant. Therefore, the coating film-forming material of the present invention is suitable for forming a water-repellent coating film on a substrate such as ceramics, metal, plastic, or concrete, which can prevent adhesion of frost and ice. Further, in addition to being excellent as a corrosion-resistant coating film of a metal material, the coating material of the present invention can form a thick film having a thickness of 5 microns to 5 mm or more. It is also optimal as a film.
【００１２】一方、本発明の上記液状物を用いて、多孔
質の塗膜を形成することができる。これには、例えば一
つの方法としては、塗布前の液体の状態で、後の加熱で
分解しガス化する物質、たとえば尿素等を添加してお
き、後の加熱を緩やかに行うなどのようにして多孔質と
する。もう一つの方法としては、石英粉などの粉末を大
量に含ませておき、加熱処理することで隙間にある適度
の量の液体が固化しバインダーとなり、粒子間に空隙が
最終的に形成されるようにする方法がある。On the other hand, a porous coating film can be formed using the above liquid material of the present invention. For this purpose, for example, one method is to add a substance that decomposes and gasifies after heating in the liquid state before coating, such as urea, and then perform the subsequent heating gently. And make it porous. As another method, a large amount of powder such as quartz powder is included, and by heat treatment, an appropriate amount of liquid in the gap solidifies and becomes a binder, and voids are finally formed between particles. There is a way to do so.
【００１３】このようにして、多孔質にした塗膜は、揮
発性の有機化合物を吸着、回収することができ、例えば
プラスチックあるいは石膏ボード表面に本発明の塗膜形
成材料による多孔質の塗膜を形成し、建材として使用し
た場合、ホルマリン等のホームシック症候群の原因物質
を除去可能であり、本発明の塗膜が耐熱性であることも
あわせて、本発明の利点の一つである。In this way, the porous coating film can adsorb and recover volatile organic compounds. For example, a porous coating film formed by the coating film forming material of the present invention on the surface of plastic or gypsum board. When it is used as a building material by forming a resin, it is possible to remove a causative agent of homesick syndrome such as formalin, and the heat resistance of the coating film of the present invention is one of the advantages of the present invention.
【００１４】さらに、本発明の上記液状物は成形材料と
しても使用できる。これには 例えば、当該液状物を蝋
等の離形剤を塗布した適当な成形型に充填して、室温放
置あるいは比較的低温で加熱して硬化して、型から取り
だして成型物品とすることができる。この成型物品は、
撥水性のほか、耐熱性にも富む。また、この成型物品を
上記の方法により多孔質化したものは、例えば、光劣化
がなく、光触媒担持用担体として有用であり、排ガスあ
るいは揮発性有害物質の浄化フィルターとしても使用で
きる。以下に本発明の実施例を示すが、本発明は特に実
施例に限定されるものではない。Further, the liquid material of the present invention can be used as a molding material. For this, for example, the liquid material is filled in an appropriate molding die coated with a release agent such as wax and left at room temperature or heated at a relatively low temperature to be cured, and the molded article is taken out from the die. You can This molded article is
In addition to water repellency, it also has excellent heat resistance. Further, the molded article obtained by making it porous by the above-mentioned method has no photodeterioration, is useful as a carrier for supporting a photocatalyst, and can be used as a filter for purifying exhaust gas or volatile harmful substances. Examples of the present invention will be shown below, but the present invention is not particularly limited to the examples.
【００１５】[0015]
【実施例１】1) TEOS（テトラエチルオルトシリケー
ト）10mlとシリコーンオイル（東芝シリコーン製、TSF
451−50）0．25mlを三角フラスコ中で混合した。
2) 小漏斗を液面に触れないように挿入し、200℃設定の
ホットプレート上で4hr、続いて250℃設定で0．5hr、一
部還流しながら加熱し、続いて300℃設定にして小漏斗
を取り去り4．5hr加熱した。なお、 小漏斗は、還流の
ほか、外部空気の流入をある程度抑制させるために用い
た。
3) オレイン酸25mlを混合した。少量を取り分けておい
た。
4) 普通の大気に室温で12hr曝し、シールをして2日間放
置した。液中に細かい粒子の沈殿が生じ、容器の底に沈
積していた。
5) 上澄み液を除去し、125℃設定のホットプレート上で
3日間加熱した。
6) オレイン酸20mlを注いだ。
7) 125℃設定ホットプレート上で18hr加熱し、続いて20
0℃設定で5hr加熱した後、上部の液を除去した。
8) 200℃設定ホットプレート上で35分間加熱し、続いて
250℃設定で20分間、さらに300℃設定で4hr加熱した。
9) 冷めてから蒸留水を注ぎ、2hr放置し、水を除去し
た。
10) 電気炉で、大気雰囲気中で270℃で6hr加熱した。容
器の底に茶色の密着性の膜ができていた。
11) 3)で取り分けた液を0．1ml注ぎ、なじませた。
12) ホットプレート上で200℃から徐々に300℃まで昇温
し、20hr加熱した。
このようにして得られた膜は密着性が良好で、厚み約10
0μm、茶色、撥水性であった。また、亀裂はほとんど見
られなかった。[Example 1] 1) TEOS (tetraethyl orthosilicate) 10 ml and silicone oil (manufactured by Toshiba Silicone, TSF)
451-50) 0.25 ml was mixed in an Erlenmeyer flask. 2) Insert the small funnel so that it does not touch the surface of the liquid, heat it on a hot plate set at 200 ° C for 4 hours, then at 250 ° C for 0.5 hour while partially refluxing, then set it at 300 ° C. The small funnel was removed and heated for 4.5 hours. The small funnel was used to suppress the inflow of external air to some extent in addition to the reflux. 3) 25 ml of oleic acid was mixed. I set aside a small amount. 4) It was exposed to ordinary air for 12 hours at room temperature, sealed, and left for 2 days. Fine particles were precipitated in the liquid and were deposited on the bottom of the container. 5) Remove the supernatant and place on a hot plate set at 125 ° C.
Heated for 3 days. 6) 20 ml of oleic acid was poured. 7) Heat on a hot plate set at 125 ° C for 18 hours, then 20
After heating at 0 ° C. setting for 5 hours, the upper liquid was removed. 8) Heat on a hot plate set at 200 ° C for 35 minutes, then
It was heated at 250 ° C. for 20 minutes, and further heated at 300 ° C. for 4 hours. 9) After cooling, distilled water was poured and left for 2 hours to remove water. 10) It was heated for 6 hours at 270 ° C in an air atmosphere in an electric furnace. A brown adhesive film was formed on the bottom of the container. 11) 0.1 ml of the liquid separated in 3) was poured and allowed to spread. 12) The temperature was gradually raised from 200 ° C to 300 ° C on a hot plate and heated for 20 hours. The film thus obtained has good adhesion and a thickness of about 10
It was 0 μm, brown and water repellent. Also, almost no cracks were seen.
【００１６】[0016]
【実施例2】a-1)TEOS（テトラエチルオルトシリケー
ト）400mlとシリコーンオイル（東芝シ
リコーン製、TSF 451−50）10mlを三角フラスコの中で
混合した。
a-2)漏斗を液面に触れないように挿入し、200℃設定の
ホットプレート上で16hr一部還流しながら加熱し、続い
て漏斗を除去し4hr加熱した。
b-1)内径2．4cmの円筒形ガラス瓶の中に石英粉（アルド
リッチ製）3．3gを入れた。
c-1)b-1)の試料にa-2)の液体を5ml注いだ。
c-2)200℃設定のホットプレート上で7日間加熱した。
c-3)電気炉で、大気雰囲気中で270℃で2．5hr加熱し
た。
このようしてに得られた膜は密着性で、厚み５ｍｍ、目
視で亀裂は見られず、白色、不透明、撥水性であり、多
孔性であった。Example 2 a-1) 400 ml of TEOS (tetraethyl orthosilicate) and 10 ml of silicone oil (TSF 451-50, manufactured by Toshiba Silicone) were mixed in an Erlenmeyer flask. a-2) The funnel was inserted so as not to touch the surface of the liquid, and the mixture was heated on a hot plate set at 200 ° C. for 16 hours while partially refluxing, subsequently, the funnel was removed and the mixture was heated for 4 hours. b-1) 3.3 g of quartz powder (made by Aldrich) was placed in a cylindrical glass bottle having an inner diameter of 2.4 cm. 5 ml of the liquid of a-2) was poured into the sample of c-1) and b-1). c-2) Heated on a hot plate set at 200 ° C. for 7 days. c-3) It was heated in an electric furnace at 270 ° C. for 2.5 hours in an air atmosphere. The film thus obtained was adhesive, had a thickness of 5 mm, had no visible cracks, was white, opaque, water-repellent, and porous.
【００１７】[0017]
【発明の効果】以上述べたように、本発明によれば、基
材に塗布した場合、極めて優れた基材との密着性を有
し、撥水性及び耐熱性を有する塗膜が形成可能であると
ともに、特に半導体デバイスの高誘電体等に用いる厚膜
形成等に好適であり、シリカを主成分とする優れた塗膜
形成材料を提供できる。また、本発明によれば、揮発性
の有害物質を効果的に除去するための多孔質の塗膜ある
いは成形物品の提供も可能である。As described above, according to the present invention, when applied to a substrate, a coating film having excellent adhesion to the substrate, water repellency and heat resistance can be formed. In addition, it is particularly suitable for forming a thick film used for a high dielectric of semiconductor devices and the like, and can provide an excellent coating film forming material containing silica as a main component. Further, according to the present invention, it is possible to provide a porous coating film or a molded article for effectively removing volatile harmful substances.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 ＦＩ テーマコート゛(参考） Ｃ０９Ｄ 5/08 Ｃ０９Ｄ 5/08 183/02 183/02 ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 7 Identification code FI theme code (reference) C09D 5/08 C09D 5/08 183/02 183/02
Claims (11)
を８０〜３５０℃の温度で加熱することにより得られた
液状物からなることを特徴とする、塗膜形成用材料。1. A coating film forming material comprising a liquid material obtained by heating a mixture of a silicate ester and a silicone oil at a temperature of 80 to 350 ° C.
る請求項１に記載の塗膜形成用材料。2. The coating film forming material according to claim 1, wherein the coating film is a high dielectric constant thick film for semiconductor devices.
スチックまたはコンクリートから選ばれる基材に形成さ
れるものである、請求項１に記載の塗膜形成用材料。3. The coating film forming material according to claim 1, wherein the coating film is formed on a substrate selected from glass, ceramics, metals, plastics or concrete.
項３に記載の塗膜形成用材料。4. The coating film forming material according to claim 3, wherein the coating film imparts water repellency.
ある、請求項３に記載の塗膜形成用材料。5. The coating film forming material according to claim 3, wherein the coating film imparts corrosion resistance to the metal substrate.
が形成された基材。6. A substrate on which a coating film is formed by the coating film forming material according to claim 1.
を８０〜３５０℃の温度で加熱することにより得られた
液体からなることを特徴とする成形材料。8. A molding material comprising a liquid obtained by heating a mixture of silicate ester and silicone oil at a temperature of 80 to 350 ° C.
された物品。9. An article molded using the molding material according to claim 8.
物を８０〜３５０℃の以下の温度で加熱することにより
得られた液体を、ガラス、セラミック、金属、プラスチ
ックまたはコンクリートから選ばれる基材に塗布した
後、加熱または非加熱条件下で硬化させることを特徴と
する、塗膜の形成方法。11. A liquid obtained by heating a mixture of silicate ester and silicone oil at a temperature of 80 to 350 ° C. below is applied to a substrate selected from glass, ceramic, metal, plastic or concrete. A method for forming a coating film, which comprises curing under heated or non-heated conditions.
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| JP2005132944A (en) * | 2003-10-30 | 2005-05-26 | Toshio Irie | Coating agent for fixing photocatalyst particles, photocatalyst particle fixing method and photocatalyst carrying member |
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