JP2003279727A5 - - Google Patents

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Publication number
JP2003279727A5
JP2003279727A5 JP2002083260A JP2002083260A JP2003279727A5 JP 2003279727 A5 JP2003279727 A5 JP 2003279727A5 JP 2002083260 A JP2002083260 A JP 2002083260A JP 2002083260 A JP2002083260 A JP 2002083260A JP 2003279727 A5 JP2003279727 A5 JP 2003279727A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2002083260A
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JP2003279727A (ja
JP4034979B2 (ja
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Publication date
Application filed filed Critical
Priority claimed from JP2002083260A external-priority patent/JP4034979B2/ja
Priority to JP2002083260A priority Critical patent/JP4034979B2/ja
Priority to US10/394,667 priority patent/US7247345B2/en
Priority to CN2007101121450A priority patent/CN101078107B/zh
Priority to CN2007101121446A priority patent/CN101078106B/zh
Priority to TW092106852A priority patent/TWI255906B/zh
Priority to KR1020030018487A priority patent/KR100972769B1/ko
Priority to CNB031082297A priority patent/CN100398694C/zh
Publication of JP2003279727A publication Critical patent/JP2003279727A/ja
Publication of JP2003279727A5 publication Critical patent/JP2003279727A5/ja
Priority to US11/819,838 priority patent/US7927472B2/en
Publication of JP4034979B2 publication Critical patent/JP4034979B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002083260A 2002-03-25 2002-03-25 光学膜厚制御方法及び光学膜厚制御装置並びに該光学膜厚制御方法を用いて作製した誘電体薄膜 Expired - Fee Related JP4034979B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2002083260A JP4034979B2 (ja) 2002-03-25 2002-03-25 光学膜厚制御方法及び光学膜厚制御装置並びに該光学膜厚制御方法を用いて作製した誘電体薄膜
US10/394,667 US7247345B2 (en) 2002-03-25 2003-03-24 Optical film thickness controlling method and apparatus, dielectric multilayer film and manufacturing apparatus thereof
CNB031082297A CN100398694C (zh) 2002-03-25 2003-03-25 光学薄膜厚度控制方法及装置，绝缘多层薄膜及制造装置
CN2007101121446A CN101078106B (zh) 2002-03-25 2003-03-25 绝缘多层薄膜制造装置
TW092106852A TWI255906B (en) 2002-03-25 2003-03-25 Optical film thickness controlling method, optical film thickness controlling apparatus, dielectric multilayer film manufacturing apparatus, and dielectric multilayer film manufactured using the same controlling apparatus or manufacturing apparatus
KR1020030018487A KR100972769B1 (ko) 2002-03-25 2003-03-25 광학 막 두께 제어 방법, 광학 막 두께 제어 장치, 유전체 다층막 제조 장치, 및 이러한 제어 장치 또는 제조 장치로 제조된 유전체 다층막
CN2007101121450A CN101078107B (zh) 2002-03-25 2003-03-25 绝缘多层薄膜制造装置
US11/819,838 US7927472B2 (en) 2002-03-25 2007-06-29 Optical film thickness controlling method, optical film thickness controlling apparatus, dielectric multilayer film manufacturing apparatus, and dielectric multilayer film manufactured using the same controlling apparatus or manufacturing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002083260A JP4034979B2 (ja) 2002-03-25 2002-03-25 光学膜厚制御方法及び光学膜厚制御装置並びに該光学膜厚制御方法を用いて作製した誘電体薄膜

Publications (3)

Publication Number Publication Date
JP2003279727A JP2003279727A (ja) 2003-10-02
JP2003279727A5 true JP2003279727A5 (ja) 2005-07-14
JP4034979B2 JP4034979B2 (ja) 2008-01-16

Family

ID=29231120

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002083260A Expired - Fee Related JP4034979B2 (ja) 2002-03-25 2002-03-25 光学膜厚制御方法及び光学膜厚制御装置並びに該光学膜厚制御方法を用いて作製した誘電体薄膜

Country Status (2)

Country Link
JP (1) JP4034979B2 (ja)
CN (2) CN101078107B (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5078813B2 (ja) * 2008-09-09 2012-11-21 株式会社シンクロン 薄膜形成方法及び薄膜形成装置
JP5126909B2 (ja) * 2010-10-08 2013-01-23 株式会社シンクロン 薄膜形成方法及び薄膜形成装置
CN102877026B (zh) * 2012-09-27 2014-12-24 中国科学院长春光学精密机械与物理研究所 多层膜器件真空沉积装置
CN102980522B (zh) * 2012-11-30 2015-06-03 中国科学院上海技术物理研究所 一种快速反演薄膜生长厚度的光学监控追迹方法
WO2014181620A1 (ja) * 2013-05-08 2014-11-13 コニカミノルタ株式会社 光学フィルムの製造方法
CN103673905B (zh) * 2013-12-31 2017-04-12 合波光电通信科技有限公司 一种磁控溅射镀光学膜膜厚监控方法
KR102169017B1 (ko) * 2014-01-10 2020-10-23 삼성디스플레이 주식회사 스퍼터링 장치 및 스퍼터링 방법
CN107726987B (zh) * 2017-10-19 2019-12-13 重庆理工大学 一种光学薄膜的膜厚监控方法
US10138539B1 (en) * 2018-04-03 2018-11-27 Shiping Cheng Method of managing coating uniformity with an optical thickness monitoring system

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3664295A (en) * 1970-11-02 1972-05-23 Gte Sylvania Inc Means for achieving a controlled gradient density coating on a light attenuation medium
GB8601176D0 (en) * 1986-01-17 1986-02-19 Infrared Eng Ltd Sensing
AU741691C (en) * 1997-05-16 2004-08-12 Hoya Kabushiki Kaisha Plastic optical component having a reflection prevention film and mechanism for making reflection prevention film thickness uniform
JP2002014208A (ja) * 2000-04-26 2002-01-18 Sharp Corp 光学フィルム、光反射フィルム、液晶表示パネル、光学フィルム製造方法および装置、型ローラ製造方法、ならびに光学フィルム貼付方法および装置

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