JP2003249362A - Organic electroluminescent image display device and its manufacturing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an organic electroluminescent image display device with a transparent electrode layer free from breaking and an organic electroluminescence cell layer for developing stable luminescence leading to high quality image display, and its manufacturing method enabling simple manufacturing of the device. <P>SOLUTION: The organic electroluminescent image display device comprises a color filter layer, a color change fluorescent material layer, a transparent protecting layer, the transparent electrode layer, the organic electroluminescence cell layer, and a back electrode layer provided in sequence on a transparent substrate. A dummy pattern consisting of laminated colored layers in plural colors exists at a predetermined site outside the end of a color change fluorescent material layer formation area. The transparent protecting layer is provided on the transparent substrate to cover the dummy pattern and the color change fluorescent material layer. The transparent electrode layer is arranged on the transparent protecting layer in such a band form that it rides over a range from the transparent substrate to the color change fluorescent material layer where the dummy pattern exists. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to an organic electroluminescent image display device and a method for manufacturing the same.

[0002]

2. Description of the Related Art Organic electroluminescence (E
The L) element has advantages such as high visibility due to self-coloring, being an all-solid-state display unlike a liquid crystal display, being hardly affected by temperature changes, and having a wide viewing angle. Practical application is progressing as a pixel of a device. As an image display device using an organic EL element, (1) an organic EL element layer of three primary colors is formed in a predetermined pattern for each emission color, (2) an organic EL element layer of white emission is used, and three primary colors are used. To be displayed through the color filter of (3) Blue-emitting organic EL
It has been proposed that an element layer is used and a color conversion phosphor layer using a fluorescent dye is provided to convert blue light into green fluorescence or red fluorescence to display three primary colors.

However, in the organic EL image display device of the above (1), although the extraction efficiency of each colored light is high, it is difficult to make the characteristics of the organic EL elements of each color uniform, and further, the three primary colors are formed in a fine pattern. The process of forming the organic EL element layer is complicated, which makes mass production difficult.
Further, in the organic EL image display device of the above (2), when white light is separated by the color filters of the three primary colors, the emission efficiency of one of the three primary colors is reduced to one third of the white light, and the extraction efficiency is poor. Therefore, a high-efficiency white organic EL element is required, but a white organic EL element with sufficient brightness can be obtained stably.
The element has not been obtained yet. On the other hand, in the organic EL image display device of the above (3), since the conversion efficiency of the color conversion phosphor layer is determined by the product of the light absorption efficiency and the fluorescence efficiency, the fluorescence having the high light absorption efficiency and the fluorescence efficiency is obtained. By using a dye, three primary color light emission with extremely high conversion efficiency is possible.

Since the organic EL element is deteriorated by gases such as water vapor, oxygen, organic monomers, and low molecular components generated from the color conversion phosphor layer, etc., the organic EL element layer is directly formed on the color conversion phosphor layer. Therefore, it is necessary to cover the above-mentioned gas by covering the color conversion phosphor layer with a transparent protective layer. Then, a transparent electrode is formed in a predetermined pattern on the transparent protective layer, and an organic EL element layer is formed on the transparent electrode.
The back electrode layer will be formed. Further, there is a difference in the conversion performance of the phosphors corresponding to each color, and when it is necessary to make the thickness of the color conversion phosphor layer different for each color in order to obtain a desired color tone, there is a step between the color conversion phosphor layers. Occurs. When such a step exists, the thickness of the organic EL element layer becomes uneven, and stable light emission cannot be obtained. However, by forming the above transparent protective layer, it is necessary to eliminate such a step. You can Therefore, in the organic EL image display device, the transparent protective layer formed so as to cover the color conversion phosphor layer has an essential structure.

[0005]

However, in order to obtain a color conversion phosphor layer having high light absorption efficiency and fluorescence efficiency, it is necessary to make the color conversion phosphor layer thicker. The thicker the color conversion phosphor layer is, the thicker the color conversion phosphor layer becomes. , The step at the end becomes large. Then, the size of this step difference is reflected in the transparent protective layer formed so as to cover the color conversion phosphor layer. On the other hand, the strip-shaped transparent electrode layer formed on the transparent protective layer from the peripheral terminal portion to the pixel region is generally formed by forming a transparent electrode film by a vacuum film forming method and pattern etching this. For this reason, at the stepped portion of the transparent protective layer generated at the end portion of the color conversion phosphor layer described above, film formation failure or disconnection due to stress during the etching process is likely to occur, causing a disconnection in the transparent electrode layer. There is a problem that it is easy.

The present invention has been made in view of such circumstances, and there is no breakage of the transparent electrode layer, stable light emission of the organic electroluminescence element layer is obtained, and high quality image display is possible. It is an object of the present invention to provide an electroluminescent image display device and a manufacturing method capable of easily manufacturing such a device.

[0007]

In order to achieve such an object, an organic electroluminescent image display device of the present invention comprises a transparent base material and a color filter layer sequentially provided on the transparent base material. , A color conversion phosphor layer, a transparent protective layer, a transparent electrode layer, an organic electroluminescence element layer, and at least a back electrode layer, a colored layer of a plurality of colors at a predetermined portion outside the end of the color conversion phosphor layer. Is laminated on the transparent substrate, the transparent protective layer is provided on the transparent substrate so as to cover the color conversion phosphor layer and the dummy pattern, and the transparent electrode layer is provided with the dummy pattern. The transparent base material is arranged in a strip shape on the transparent protective layer so as to ride on the color conversion phosphor layer from the transparent base material.

As another aspect of the present invention, the thickness of the color conversion phosphor layer is in the range of 2 to 15 μm, and the thickness of the dummy pattern is 1/10 of the thickness of the color conversion phosphor layer.
The configuration is such that it is within the range of to 1/1. In addition, as another aspect of the present invention, the configuration is such that the dummy pattern is in contact with the tip of the band-shaped color conversion phosphor layer. As another aspect of the present invention, a black matrix having a predetermined opening pattern is provided between the transparent substrate and the color filter. Further, as another aspect of the present invention, the organic electroluminescence element layer emits blue light, the color conversion phosphor layer converts the blue light into green fluorescence and emits light, and the blue light emits red fluorescence. And a red conversion layer that emits light after being converted into.

According to the method of manufacturing an organic electroluminescent image display device of the present invention, a colored layer of a plurality of colors is formed in a band shape for each color on a transparent substrate to form a color filter layer, and the color filter layer of each color is formed. A step of forming a dummy pattern by laminating a colored layer on a predetermined portion outside the end portion of the band-shaped formation region, a color conversion phosphor layer is formed on the color filter layer, and the color conversion phosphor layer and the dummy pattern are formed. A step of forming a transparent protective layer on the transparent base material so as to cover the transparent base material, and a transparent electrode layer in a strip shape so as to ride on the color conversion phosphor layer from the transparent base material at the portion where the dummy pattern is arranged. A step of forming, a step of forming an organic electroluminescence element layer in a strip shape so as to intersect with the transparent electrode layer, and a step of forming a back electrode layer on the organic electroluminescence element layer. It was configured such that.

In the present invention as described above, the step at the end of the color conversion phosphor layer is alleviated by the dummy pattern,
The step formed on the transparent protective layer formed so as to cover the dummy pattern and the color conversion phosphor layer becomes small, and the disconnection of the transparent electrode layer is prevented.

[0011]

DETAILED DESCRIPTION OF THE INVENTION The present invention will be described below with reference to the drawings. Organic Electroluminescent Image Display Device FIG. 1 shows an organic electroluminescent (E) device of the present invention.
L) FIG. 2 is a partial plan view showing an embodiment of the image display device, and FIG.
FIG. 3 is a vertical sectional view taken along line II, and FIG. 3 is a vertical sectional view taken along line III-III of the organic EL image display device shown in FIG. Incidentally, in FIG. 1, an auxiliary electrode 8 and a transparent electrode layer 9 which will be described later are provided.
In order to show, the blue organic EL element layer 10 and the back electrode layer 1
A part of 1 is shown in a cutout state. 1 to 3, the organic EL image display device 1 includes a transparent base material 2 and a strip-shaped red colored layer 4R and a green color through a black matrix 3 having a predetermined opening pattern on the transparent base material 2. Color filter layer 4 including layer 4G and blue coloring layer 4B
Is provided. On the color filter layer 4, a color conversion phosphor layer 5 including a red conversion phosphor layer 5R, a green conversion phosphor layer 5G and a blue conversion dummy layer 5B is formed. Then, the red conversion phosphor layer 5R is formed on the red colored layer 4R.
However, a green conversion phosphor layer 5G and a blue conversion dummy layer 5B are arranged in strips on the green coloring layer 4G and the blue coloring layer 4B, respectively.

On the outside of the end portion 5a of the color conversion phosphor layer 5 (see FIG. 2), dummy patterns 6 each formed by stacking colored layers 6G, 6R, 6B of three colors are formed, The dummy pattern 6 is thinner than the color conversion phosphor layer 5. The positional relationship between such a dummy pattern 6 and the color conversion phosphor layer 5 is shown in FIG. However, in FIG. 4, in order to show the states of the black matrix 3, the color filter layer 4, and the dummy pattern 6, a part of the color conversion phosphor layer 5 is cut away. In the example shown in FIG. 4, the dummy pattern 6 is arranged at a portion in contact with the tip portion (5a) of the band-shaped color conversion phosphor layer 5, but the color conversion phosphor layer 5 formed by the dummy pattern 6 is arranged. The dummy pattern 6 may be arranged at a position away from the tip portion (5a) of the color conversion phosphor layer 5 as long as the effect of reducing the level difference can be obtained.

A transparent protective layer 7 is provided on the transparent base material 2 so as to cover the dummy pattern 6 and the color conversion phosphor layer 5, and the auxiliary electrode 8 and the transparent electrode layer 9 are provided on the transparent protective layer 7. Are formed. FIG. 5 is a partial plan view showing a state in which the auxiliary electrode 8 and the transparent electrode layer 9 are thus formed on the transparent protective layer 7. As shown in FIG. 5, the auxiliary electrode 8 and the transparent electrode layer 9 are arranged in a strip shape on the transparent protective layer 7 from the peripheral terminal portion to the central pixel region, and are transparent at the portion where the dummy pattern 6 is arranged. The substrate 2 (peripheral terminal portion) rides on the color conversion phosphor layer 5 (pixel region).

In the organic EL image display device 1 of the present invention, the belt-shaped blue organic material is formed so as to intersect the belt-shaped transparent electrode layer 9 arranged as described above at a right angle and to be located on the opening of the black matrix 3. The EL element layer 10 and the back electrode layer 11 are formed on the transparent protective layer 7. In addition, the partition wall portion 15 is interposed via the insulating layer 13 so as to intersect the strip-shaped transparent electrode layer 9 at a right angle and to be located on the light shielding portion of the black matrix 3.
Are formed on the transparent protective layer 7. A dummy organic EL element layer 10 ′ and a back electrode layer 11 ′ are formed on the upper plane of the partition wall portion 15. These are the blue organic EL element layer 1 using the partition wall portion 15 as a patterning means.
0 and the back electrode layer 11 are formed as a result of removing the forming material by adhering it to the partition 15 so as not to reach the transparent electrode layer 9 in order to form a strip-shaped pattern. In the illustrated example, the insulating layer 13 is provided in a stripe shape only in the portion where the partition 15 is formed, but the present invention is not limited to this, and the transparent electrode layer 9 and the back electrode layer 11 are blue organic EL. The insulating layer 13 may be a lattice-shaped pattern having openings at respective portions (picture elements) intersecting with each other through the element layer 10.

In the organic EL image display device 1 of the present invention as described above, the blue light emitted from the blue organic EL element layer 10 is converted into red fluorescence by the red conversion phosphor layer 5R and the green conversion phosphor layer. The light is made green in 5G, and the blue light is transmitted through the blue conversion dummy layer 5B as it is. After that, the light of each color is color-corrected by the color filter layer 4 to display the three primary colors. Then, the step at the end of the color conversion phosphor layer 5 is alleviated by the dummy pattern 6, and the step generated in the transparent protective layer 7 formed so as to cover the dummy pattern 6 and the color conversion phosphor layer 5 is small. Has become. For this reason, the strip-shaped transparent electrode layer 9 formed on the transparent protective layer 7 has high reliability and high quality without disconnection at the step portion where the transparent base material 2 rides on the color conversion phosphor layer 5. Images can be displayed.

Although the constituent layers such as the color filter 4 are provided through the black matrix 3 in the above-described embodiment, the black matrix 3 may not be provided. Further, although the dummy pattern 6 has the three-layer structure of the colored layers 6R, 6G, and 6B in the above-described embodiment, the dummy pattern 6 is not limited to this.
Within the range in which the effect of
A two-layer structure including a colored layer may be used.

Further, the color conversion phosphor layer 5 is made of blue organic E
It is provided with a red conversion phosphor layer 5R and a green conversion phosphor layer 5G that convert blue light emitted from the L element layer 10 into red fluorescence and green fluorescence, but the invention is not limited to this, and the emission (blue) wavelength is provided. What is necessary is just to have a color conversion phosphor layer capable of converting to fluorescence of a longer wavelength. Then, by setting the combination with the color filter layer 4 that enhances the color purity by color-correcting the light of each color from the color conversion phosphor layer 5, it is possible to display the three primary colors.

Next, each component of the organic EL image display device 1 of the present invention will be described. Organic EL image display device 1
As the transparent base material 2 constituting the above, it is possible to use a material made of a glass material having a light transmitting property, a resin material, or a composite material thereof. The thickness of the transparent substrate 2 can be set in consideration of the material, the usage status of the image display device, and the like, and can be set to, for example, about 0.2 to 2.0 mm. Further, the color filter layer 4 corrects the light of each color from the color conversion phosphor layer 5 to enhance the color purity. Blue colored layer 4B and red colored layer 4 which compose the color filter layer 4.
The R and green colored layers 4G are made of appropriate materials according to the characteristics of blue light emission from the blue organic EL element layer 10, red fluorescence from the red conversion phosphor layer 5R, and green fluorescence from the green conversion phosphor layer 5G. It can be formed selectively, and for example, it can be formed using a resin composition prepared by dispersing one or more kinds of pigments such as azo, phthalocyanine and anthraquinone pigments in a photosensitive resin.

Among the color conversion phosphor layers 5 constituting the organic EL image display device 1, the red conversion phosphor layer 5R and the green conversion phosphor layer 5G are layers composed of a single fluorescent dye or a fluorescent dye in a resin. Is a layer containing. The fluorescent dye used in the red conversion phosphor layer 5R that converts blue light emission into red fluorescence is 4-dicyanomethylene-2-methyl-
Cyanine dye such as 6- (p-dimethylaminostyryl) -4H-pyran, pyridine such as 1-ethyl-2- [4- (p-dimethylaminophenyl) -1,3-butadienyl] -pyridinium-perchlorate Examples include dyes, rhodamine dyes such as rhodamine B and rhodamine 6G, and oxazine dyes. Further, as the fluorescent dye used for the green conversion phosphor layer 5G that converts blue light emission into green fluorescence, 2,3,5,6-1H, 4H-tetrahydro-8-
Trifluoromethylquinolidino (9,9a, 1-gh)
Coumarin, 3- (2'-benzothiazolyl) -7-diethylaminocoumarin, 3- (2'-benzimidazolyl) -7-N, N-diethylaminocoumarin, etc., coumarin dye, basic yellow 51, etc., coumarin dye, solvent Yellow 11, Solvent Yellow 11
Naphthalimide dyes such as 6 are listed. Further, various dyes such as direct dyes, acid dyes, basic dyes and disperse dyes can also be used if they have fluorescence. The above-mentioned fluorescent dyes can be used alone or in combination of two or more. When the red conversion phosphor layer 5R and the green conversion phosphor layer 5G contain a fluorescent dye in the resin, the content of the fluorescent dye should be determined in consideration of the fluorescent dye to be used, the thickness of the color conversion phosphor layer, and the like. The amount can be appropriately set by, for example, about 0.1 to 10% by weight with respect to the resin used. In addition, the blue conversion dummy layer 5
B is for transmitting the blue light emitted from the blue organic EL element layer 10 as it is and sending it to the color filter layer 4.
A transparent resin layer having substantially the same thickness as the red conversion phosphor layer 5R and the green conversion phosphor layer 5G can be used.

When the red conversion phosphor layer 5R and the green conversion phosphor layer 5G contain a fluorescent dye in the resin, the resin may be polymethylmethacrylate, polyacrylate, polycarbonate, polyvinyl alcohol, polyvinylpyrrolidone, hydroxy. Use transparent (visible light transmittance 50% or more) resin such as ethyl cellulose, carboxymethyl cellulose, polyvinyl chloride resin, melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin, polyester resin, maleic acid resin, polyamide resin be able to. When the pattern formation of the color conversion phosphor layer 5 is performed by a photolithography method, for example, a photocurable resist having a reactive vinyl group such as acrylic acid type, methacrylic acid type, polyvinyl cinnamate type, ring rubber type, etc. Resins can be used. Furthermore, these resins can be used for the blue conversion dummy layer 5B described above.

The thickness of the color conversion phosphor layer 5 is such that the red conversion phosphor layer 5R and the green conversion phosphor layer 5G sufficiently absorb the blue light emitted from the blue organic EL element layer 10 to generate fluorescence. It is necessary to make it possible to express the function to be performed, and it can be appropriately set in consideration of the fluorescent dye to be used, the fluorescent dye concentration, etc., for example, it can be about 2 to 15 μm, and the red conversion phosphor layer 5R The green conversion phosphor layer 5G and the green conversion phosphor layer 5G may have different thicknesses.

The dummy pattern 6 constituting the organic EL image display device 1 is provided outside the end portion 5a of the color conversion phosphor layer 5 and is a laminated body of the colored layers 6G, 6R and 6B. The colored layers 6G, 6R, which form the dummy pattern 6,
6B is a colored layer 4 that constitutes the color filter layer 4 described above.
It can be formed of the same material as G, 4R, 4B.
The thickness of such a dummy pattern 6 can be set to be equal to or less than the thickness of the color conversion phosphor layer 5 described above, and preferably in the range of 1/10 to 1/1 of the thickness of the color conversion phosphor layer 5. You can The length L of the dummy pattern 6 is 100.
˜2000 μm, and the width W is preferably substantially the same as or larger than the width of the strip-shaped transparent electrode layer 9, for example, (width of transparent electrode layer −20 μm) to (width of transparent electrode layer 9 + transparent electrode). It is preferable to set it in the range of (interlayer distance). In the illustrated example, the dummy pattern 6 is provided on the black matrix 3, but the dummy pattern 6 is not limited to this and may be provided on the transparent substrate 2.

The transparent protective layer 7 constituting the organic EL image display device 1 blocks the gases such as water vapor, oxygen, organic monomers and low molecular components generated from the color conversion phosphor layer 5 and the like, and is a blue organic EL element layer. When the step (surface irregularities) is present due to the protective function of preventing 10 from being deteriorated and the structure of the color conversion phosphor layer 5 and below, the step is eliminated to achieve flatness, and the blue organic EL element layer 10 It has a flattening action to prevent the occurrence of uneven thickness. Such a transparent protective layer 7
Can be formed of a transparent (visible light transmittance of 50% or more) resin. Specifically, an acrylate-based or methacrylate-based photocurable resin or thermosetting resin having a reactive vinyl group can be used. Further, as the transparent resin, polymethylmethacrylate, polyacrylate,
Polycarbonate, polyvinyl alcohol, polyvinylpyrrolidone, hydroxyethyl cellulose, carboxymethyl cellulose, polyvinyl chloride resin, melamine resin, phenol resin, alkyd resin, epoxy resin, polyurethane resin, polyester resin, maleic acid resin,
Polyamide resin or the like can be used. The transparent protective layer 7 has a smaller film thickness within a range where the above protective action and flattening action can be exhibited, in order to prevent light leakage due to a gap between the blue organic EL element layer 10 and the color conversion phosphor layer 5. Preferably, it can be in the range of 0.5 to 10 μm, for example.

In the present invention, it is preferable to provide an inorganic oxide film as an insulating transparent barrier layer on the transparent protective layer 7. This inorganic oxide film is composed of silicon oxide, aluminum oxide, titanium oxide, yttrium oxide, germanium oxide, zinc oxide, magnesium oxide, calcium oxide,
It can be formed by using one or more oxides such as boron oxide, strontium oxide, barium oxide, lead oxide, zirconium oxide, sodium oxide, lithium oxide and potassium oxide, and particularly silicon oxide, aluminum oxide, Titanium oxide can be preferably used. The thickness of the inorganic oxide film is 0.01 to 0.01 in consideration of the barrier property and the transparency.
It can be appropriately set within the range of 200 μm. Such an inorganic oxide film may have a multilayer structure of two or more layers, or may contain a nitride such as silicon nitride as an accessory component.

The auxiliary electrode 8 constituting the organic EL image display device 1 is generally made of a metal material, such as gold, silver, copper,
Examples thereof include magnesium alloys (MgAg and the like), aluminum alloys (AlLi, AlCa, AlMg and the like), metallic calcium and the like. Such an auxiliary electrode 8 is arranged so as to be located on the light shielding portion of the black matrix 3 from the peripheral terminal portion to the central pixel area.

As the material of the transparent electrode layer 9 constituting the organic EL image display device 1, a metal, an alloy, or a mixture thereof having a large work function (4 eV or more) can be used. For example, indium tin oxide (ITO). ), Indium oxide, zinc oxide, stannic oxide, and the like. The transparent electrode layer 9 is arranged in a strip shape so as to be located on the opening portion of the black matrix 3 and on the auxiliary electrode 8 from the peripheral terminal portion to the central pixel area. The sheet resistance of such a transparent electrode layer 9 is preferably several hundreds Ω / □ or less, and the thickness of the transparent electrode layer 9 is, for example, 10 nm to 1 μm, preferably 1 although it depends on the material.
It can be about 0 to 200 nm.

The blue organic EL element layer 10 constituting the organic EL image display device 1 has a structure composed of a light emitting layer alone, a structure in which a hole injection layer is provided on the transparent electrode layer 9 side of the light emitting layer, and a back electrode of the light emitting layer. For example, an electron injection layer may be provided on the layer 11 side, a hole injection layer may be provided on the transparent electrode layer 9 side of the light emitting layer, and an electron injection layer may be provided on the back electrode layer 11 side. The light emitting layer forming the blue organic EL element layer 10 also has the following functions. -Injection function: A function that can inject holes from the anode or the hole injection layer when an electric field is applied, and can inject electrons from the cathode or the electron injection layer-Transport function: Injected charges (electrons and holes) Function of moving electrons by the force of an electric field, light emitting function: a function of providing a field for recombination of electrons and holes and connecting this to light emission

Examples of the material for the light emitting layer having such a function include, for example, benzothiazole-based, benzimidazole-based, benzoxazole-based fluorescent whitening agents and metal chelates disclosed in JP-A-8-279394. Oxynoid compounds, styrylbenzene compounds, distyrylpyrazine derivatives, aromatic dimethylidene compounds, and the like.

Specifically, a benzothiazole system such as 2-2 '-(p-phenylenedivinylene) -bishenzothiazole; 2- [2- [4- (2-benzimidazolyl) phenyl] vinyl] benzimidazole, 2- [2
-(4-Carboxyphenyl) vinyl] benzimidazole-based compounds such as benzimidazole;
7-di-t-pentyl-2-benzoxazolyl)-
1,3,4-thiadiazole, 4,4'-bis (5,7
Examples of optical brighteners such as benzoxazole-based compounds such as -t-pentyl-2-benzoxazolyl) stilbene and 2- [2- (4-chlorophenyl) vinyl] naphtho [1,2-d] oxazole. it can.

Examples of the metal chelated oxinoid compound include 8-hydroxyquinoline compounds such as tris (8-quinolinol) aluminum, bis (8-quinolinol) magnesium and bis (benzo [f] -8-quinolinol) zinc. Examples thereof include metal complexes and dilithium epinetridione.

As the styrylbenzene compound, 1,4-bis (2-methylstyryl) benzene, 1,4-bis (3-methylstyryl) benzene,
1,4-bis (4-methylstyryl) benzene, distyrylbenzene, 1,4-bis (2-ethylstyryl) benzene, 1,4-bis (3-ethylstyryl) benzene, 1,4-bis (2 -Methylstyryl) -2-methylbenzene, 1,4-bis (2-methylstyryl) -2-
Examples thereof include ethylbenzene.

As the above distyrylpyrazine derivative, 2,5-bis (4-methylstyryl) pyrazine, 2,5-bis (4-ethylstyryl) pyrazine,
2,5-bis [2- (1-naphthyl) vinyl] pyrazine, 2,5-bis (4-methoxystyryl) pyrazine,
2,5-bis [2- (4-biphenyl) vinyl] pyrazine, 2,5-bis [2- (1-pyrenyl) vinyl] pyrazine and the like can be mentioned.

The aromatic dimethylidyne compounds mentioned above include 1,4-phenylenedimethylidin, 4,
4-phenylene dimethylidene, 2,5-xylylene dimechilidene, 2,6-naphthylene dimechilidene, 1,
4-biphenylene dimethylidene, 1,4-p-terephenylene dimethylidene, 9,10-anthracenediylzilmethylidyne, 4,4'-bis (2,2-di-t
-Butylphenylvinyl) biphenyl, 4,4'-bis (2,2-diphenylvinyl) biphenyl and the like, and derivatives thereof.

Further, as a material for the light emitting layer, Japanese Patent Laid-Open No.
The general formula (Rs-
Q) The compound represented by 2-AL-OL can also be mentioned (wherein AL is a carbon atom 6 containing a benzene ring).
~ 24 hydrocarbons, OL is a phenylate ligand, Q is a substituted 8-quinolinolate ligand,
Rs represents an 8-quinolinolate substituent selected to sterically hinder the attachment of two or more substituted 8-quinolinolate ligands to the aluminum atom). In particular,
Bis (2-methyl-8-quinolinolato) (para-phenylphenolato) aluminum (III), bis (2-
Methyl-8-quinolinolate) (1-naphtholato) aluminum (III) and the like. The thickness of the light emitting layer is not particularly limited and may be, for example, about 5 nm to 5 μm.

The material for the hole injecting layer is any of those conventionally used as a hole injecting material for photoconductive materials and known materials for hole injecting layers for organic EL devices. Can be selected and used. The material of the hole injection layer has either hole injection or electron barrier properties, and may be either an organic substance or an inorganic substance. Specifically, triazole derivatives, oxadiazole derivatives, imidazole derivatives, polyarylalkane derivatives, pyrazoline derivatives, pyrazolone derivatives, phenylenediamine derivatives, arylamine derivatives, amino-substituted chalcone derivatives, oxazole derivatives,
Styrylanthracene derivative, fluorenone derivative, hydrazone derivative, stilbene derivative, silazane derivative,
Examples thereof include polysilane-based and aniline-based copolymers and dielectric polymer oligomers such as thiophene oligomers.

Further, as the material of the hole injection layer, a porphyrin compound, an aromatic tertiary amine compound, and a styrylamine compound can be mentioned. Examples of the porphyrin compound include polyfin, 1,10,15,20-
Tetraphenyl-21H, 23H-polyfin copper (I
I), aluminum phthalocyanine chloride, copper octamethylphthalocyanine and the like. Also,
Examples of aromatic tertiary amine compounds and styrylamine compounds include N, N, N ', N'-tetraphenyl-4,
4'-diaminophenyl, N, N'-diphenyl-N,
N'-bis (3-methylphenyl)-[1,1'-biphenyl] -4,4'-diamine, 4- (di-p-tolylamino) -4 '-[4 (di-p-tolylamino) styryl ] Stilbene, 3-methoxy-4′-N, N-diphenylaminostilbenzene, 4,4′-bis [N- (1
-Naphthyl) -N-phenylamino] biphenyl, 4,
4 ', 4 "-tris [N- (3-methylphenyl) -N
-Phenylamino] triphenylamine and the like can be mentioned. The thickness of the hole injection layer is not particularly limited and may be, for example, about 5 nm to 5 μm.

The material for the electron injecting layer may have a function of transmitting electrons injected from the cathode to the light emitting layer, and any material can be selected from conventionally known compounds. Can be used. Specifically, a nitro-substituted fluorene derivative, an anthraquinodimethane derivative, a diphenylquinone derivative, a thiopyran dioxide derivative, a heterocyclic tetracarboxylic acid anhydride such as naphthalene perylene, a carbodiimide, a fluorenylidene methane derivative, an anthraquinodimethane. And anthrone derivative, oxadiazole derivative, thiazole derivative in which oxygen atom of the above oxadiazole ring is substituted with sulfur atom, quinoxaline derivative having quinoxaline ring known as electron withdrawing group, tris (8-quinolinol)
A metal complex of an 8-quinolinol derivative such as aluminum,
Examples thereof include phthalocyanine, metal phthalocyanine, and distyrylpyrazine derivatives. The thickness of the electron injection layer is not particularly limited and may be, for example, about 5 nm to 5 μm.

The material of the back electrode layer 11 constituting the organic EL image display device 1 is formed of a metal, an alloy or a mixture thereof having a low work function (4 eV or less). Specifically, sodium, sodium-potassium alloy, magnesium, lithium, magnesium / copper mixture, magnesium / silver mixture, magnesium / aluminum mixture,
Examples thereof include a magnesium / indium mixture, an aluminum / aluminum oxide (Al ₂ O ₃ ) mixture, indium, a lithium / aluminum mixture, a rare earth metal and the like.
Considering the electron injecting property and the durability against oxidation etc. as an electrode, a mixture of an electron injecting metal and a second metal which is a stable metal having a larger work function value is preferable, for example, a magnesium / silver mixture. ,magnesium/
Examples thereof include an aluminum mixture, a magnesium / indium mixture, an aluminum / aluminum oxide (Al ₂ O ₃ ) mixture, a lithium / aluminum mixture and the like. The sheet resistance of the back electrode layer 11 is preferably several hundreds Ω / □ or less, and therefore, the thickness of the back electrode layer 11 can be set to, for example, 10 nm to 1 μm, preferably about 50 to 200 nm.

The insulating layer 13 constituting the organic EL image display device 1 is formed so as to be located on the light shielding portion of the black matrix 3. The insulating layer 13 can be formed using, for example, the same photosensitive resin as the transparent protective layer 7 described above, a photosensitive resin such as a polyimide resin, and has a thickness of about 0.3 to 2.0 μm. You can

In the manufacturing method of the present invention, which will be described later, the partition wall portion 15 constituting the organic EL image display device 1 has the blue organic EL element layer 10 and the back electrode layer 11 so as to intersect the belt-shaped transparent electrode layer 9 at a right angle. It is a partition pattern for forming and in a strip shape. The partition 15 is formed by a photolithography method using a photosensitive resin similar to that of the transparent protective layer 7 described above or a photosensitive resin obtained by adding a dye, a pigment, carbon black or the like to the photosensitive resin. The height of the partition wall portion 15 can be set to about 2.0 to 10.0 μm, and the width can be set according to the width of the light shielding portion of the black matrix 3, etc., and is usually set to about 10 to 100 μm. You can

Organic electroluminescent image display device
Next, the organic electroluminescent (EL) of the present invention is manufactured.
An embodiment of a method for manufacturing an image display device is the above-mentioned organic E
The L image display device 1 will be described as an example with reference to the drawings.

(1) In the first step of the manufacturing method of the present invention, as shown in FIG. 6, the color filter layer 4 is formed on the transparent substrate 2 via the black matrix 3 and the color filter layer 4 is formed. The dummy pattern 6 is formed on the outer side of the end portion B ′ of the formation region B of. In FIG. 6, in order to show the state of the black matrix 3, the red colored layer 4
A part of R is shown in a cutout state. The black matrix 3 has a predetermined pattern with openings 3a and light-shielding parts 3b.
Is equipped with. Such a black matrix 3 is
Thickness 1000-by sputtering method, vacuum deposition method, etc.
A metal thin film of about 2000 Å chromium or a metal oxide thin film such as chromium oxide is formed and patterned to form a thin film, a polyimide resin containing a light shielding particle such as carbon fine particles, an acrylic resin, Forming a resin layer such as an epoxy resin and patterning the resin layer, a photosensitive resin layer containing carbon particles, light-shielding particles such as metal oxides is formed, and the photosensitive resin layer is formed. Any one such as one formed by patterning may be used.

In the color filter layer 4, the red coloring layer 4R, the green coloring layer 4G and the blue coloring layer 4B are arranged in a strip shape so as to cover the openings 3a of the black matrix 3, respectively, and a desired coloring material is applied. It can be formed by a pigment dispersion method using the contained photosensitive resin, and further can be formed by a known method such as a printing method, an electrodeposition method or a transfer method. The thickness of such a color filter layer 4 can be appropriately set according to the material of each colored layer, the fluorescence emitted from the color conversion phosphor layer 5, and the like.
It can be set in the range of about 1.0 to 2.0 μm. Then, when each of the colored layers (4R, 4G and 4B) is formed, the colored layer is formed in a predetermined shape outside the end B ′ of the formation region B of the color filter layer 4. Thus, the color filter layer 4 including the colored layers 4R, 4G, and 4B of three colors is formed, and at the same time, the dummy pattern 6 in which the colored layers 6R, 6G, and 6B of three colors are stacked can be formed.

For example, the green colored layer 4G and the red colored layer 4
When the colored layers are formed in the order of R and the blue colored layer 4B, the layer structure of the dummy pattern 6 formed outside the end portion B'of the formation region B of the color filter layer 4 and the striped colored layers (4R, 4G and 4B) are as shown in FIG. 7, respectively. Thus, the colored layers 6G, 6R, 6B
The thickness of the dummy pattern 6 in which is laminated is 1.5 to 6.0.
It becomes about μm.

(2) In the next step of the manufacturing method of the present invention, the band-shaped red conversion phosphor layer 5 is formed on the color filter layer 4.
The color conversion phosphor layer 5 including the R, green conversion phosphor layer 5G and the blue conversion dummy layer 5B is formed (see FIG. 4 above).
After that, the transparent protective layer 7 is formed on the transparent substrate 2 so as to cover the color conversion phosphor layer 5 and the dummy pattern 6. In the formation of the color conversion phosphor layer 5, the red conversion phosphor layer 5R is arranged on the red coloring layer 4R, the green conversion phosphor layer 5G is arranged on the green coloring layer 4G, and the blue conversion dummy layer 5B is formed. It is arranged on the blue colored layer 4B. When the red conversion phosphor layer 5R and the green conversion phosphor layer 5G forming the color conversion phosphor layer 5 are formed of a fluorescent dye alone, for example, in a band shape by a vacuum deposition method or a sputtering method via a desired pattern mask. Can be formed. Further, in the case of forming a layer containing a fluorescent dye in the resin, for example, a coating solution in which the fluorescent dye and the resin are dispersed or solubilized is applied by a method such as spin coating, roll coating or cast coating. The red conversion phosphor layer 5R and the green conversion phosphor layer 5G can be formed by a method of forming a film and patterning it by a photolithography method, a method of pattern printing the above coating liquid by a screen printing method or the like. Also,
The blue conversion dummy layer 5B is formed by applying a desired photosensitive resin coating material by a method such as spin coating, roll coating, or cast coating to form a film, and patterning it by a photolithography method. It can be formed by a pattern printing method such as a printing method.

Color-converting phosphor layer 5 thus formed
Are colored layers 6G, 6R, 6B of three colors on the outside of the end 5a.
The dummy patterns 6 each of which is stacked are arranged. In the illustrated example, the end portion 5a of the color conversion phosphor layer 5 and the end portion B'of the formation region B of the color filter layer 4 coincide with each other, but the color conversion phosphor layer formed by the dummy pattern 6 is used. The end portion B ′ is located outside the end portion 5a within the range in which the step reducing effect of 5 is obtained (the dummy pattern 6 is separated from the end portion 5a of the color conversion phosphor layer 5).
You may.

The above-mentioned transparent protective layer 7 is formed by applying it by a method such as spin coating, roll coating, cast coating or the like when the above-mentioned materials to be used are liquid, and the photocurable resin is required after irradiation with ultraviolet rays. The thermosetting resin is cured as it is after the film formation. When the material used is formed into a film, it can be attached directly or via an adhesive. In this way, the transparent protective layer 7 formed on the transparent base material 2 so as to cover the color conversion phosphor layer 5 and the dummy pattern 6 has the steps at the ends of the color conversion phosphor layer 5 alleviated by the dummy pattern 6. Because
The step formed on the transparent protective layer 7 in the portion where the dummy pattern 6 is formed is small.

(3) In the next step of the manufacturing method of the present invention, the transparent substrate 2 is formed at the portion where the dummy pattern 6 is provided.
The auxiliary electrode 8 and the transparent electrode layer 9 are formed on the transparent protective layer 7 so as to run on the color conversion phosphor layer 5 (see FIG. 5 above). The auxiliary electrode 8 and the transparent electrode layer 9 can be formed into a desired shape by forming a thin film using the above materials by a vacuum deposition method or a sputtering method and performing pattern etching using the photolithography method. Since the step of the transparent protective layer 7 is small due to the dummy pattern 6 as described above, film formation failure (material adhesion failure at the step portion) during formation of the auxiliary electrode 8 and the transparent electrode layer 9,
Further, it is possible to prevent the occurrence of disconnection due to stress or the like during pattern etching. Therefore, the organic EL image display device having high reliability and capable of displaying high-quality images can be manufactured with a good manufacturing yield.

(4) In the next step of the manufacturing method of the present invention, first, the stripe-shaped insulating layer 13 is formed so as to intersect the strip-shaped transparent electrode layer 9 at a right angle and to be located on the light-shielding portion of the black matrix 3. Then, the barrier section 15 is formed on the insulating layer 13. Then, the blue organic EL element layer 10 is formed in a band shape so as to intersect with the transparent electrode layer 9, and the back electrode layer 11 is formed on the blue organic EL element layer 10. The insulating layer 13 is formed by vacuum vapor deposition using the insulating material described above.
A thin film can be formed by a sputtering method or the like, and this can be formed into a desired shape by pattern etching using a photolithography method.

The barrier portion 15 is a partition wall pattern for forming the blue organic EL element layer 10 and the back electrode layer 11 in a strip shape, and is made by spin coating the above-mentioned photosensitive resin material.
It can be formed by coating by a method such as roll coating or cast coating to form a film, which is then patterned by a photolithography method. Barrier part 1 formed in this way
5 is located on the light shielding part of the black matrix 3.
Therefore, the transparent electrode layer 9 located in the opening 3a of the black matrix 3 is exposed without the barrier 15 being formed.

The formation of the blue organic EL element layer 10 is
A film can be formed using the above-described light emitting layer material by a vacuum deposition method, a printing method such as an inkjet method, or the like.
In this method, the film is formed through a photomask (a mask for preventing film formation on the electrode terminals formed of the auxiliary electrode 8 and the transparent electrode layer 9 in the peripheral portion) having an opening corresponding to the image display region. As a result, the partition portions 15 serve as a mask pattern, and the light emitting layer material can pass through only between the partition portions 15 and reach the transparent electrode layer 9. As a result, without performing patterning such as photolithography,
The belt-shaped blue organic EL element layer 10 can be formed. In the formation of the blue organic EL element layer 10 using the partition wall portion 15 as described above, as shown in FIG. 1 and FIG.
Of the plurality of barrier portions 15 arranged, the end portion of the image display area is located on the upper plane of the partition wall portion 15 located at the most peripheral portion, and approximately half the width direction (image display area The dummy organic EL element layer 10 'is formed only on the side).

The structure in which the blue organic EL element layer 10 is not composed of the light emitting layer alone, but the structure in which the hole injection layer is provided on the transparent electrode layer 9 side of the light emitting layer, and the electron injection is made on the back electrode layer 11 side of the light emitting layer In the case of a structure including a layer, a structure including a hole injection layer on the transparent electrode layer 9 side of the light emitting layer and an electron injection layer on the back electrode layer 11 side, the above-described hole injection layer material and electron injection layer, respectively. By using the material to form a film by a vacuum deposition method, a printing method such as an inkjet method, or the like, it is possible to form a strip-shaped pattern, similarly to the above light emitting layer.

The back electrode layer 11 can be formed by using the above-mentioned electrode material by a vacuum vapor deposition method, a sputtering method or the like. Also here, the partition portions 15 serve as a mask pattern, and the electrode material can pass through only between the partition portions 15 and reach the blue organic EL element layer 10. Since it is not necessary to perform patterning such as photolithography, the characteristics of the blue organic EL element layer 10 are not deteriorated.

[0054]

EXAMPLES Next, the present invention will be described in more detail by showing examples. [Example]

Formation of Black Matrix As a transparent substrate, 550 mm × 650 mm, thickness 0.7
mm soda glass (Soda glass with SiO ₂ manufactured by Asahi Glass Co., Ltd.) was prepared. After cleaning this transparent substrate according to a standard method, a chromium thin film (thickness: 0.2 μm) is formed on one entire surface of the transparent substrate by a sputtering method, a photosensitive resist is applied on the chromium thin film, mask exposure,
Develop and etch chrome thin film, 70μm × 2
A black matrix having 70 μm rectangular openings at a 100 μm pitch in a matrix was formed.

Formation of Color Filter Layer and Dummy Pattern Next, colored layers of respective colors were formed by using three kinds of photosensitive paints for colored layers having the following compositions. That is, a photosensitive coating material for the green colored layer was applied to the entire surface of the transparent substrate on which the black matrix had been formed by spin coating, and prebaking (100 ° C., 5 minutes) was performed. Then, it exposed using the photomask for predetermined coloring layers. This photomask for colored layer was provided with an opening for a green colored layer and an opening for a dummy pattern (rectangle of 100 μm × 1000 μm) outside the end of the formation region of the colored layer of each color. Then, development is performed with a developing solution (0.05% KOH aqueous solution), and then post-baking (200 ° C., 60 minutes) is performed to form a strip-shaped (width 80 μm) green at a predetermined position with respect to the black matrix pattern. A colored layer (thickness: 2.0 μm) was formed, and a green colored layer for a dummy pattern was formed on the outer side of the end of the formation region of the colored layer of each color.

Similarly, a strip-shaped (width 80 μm) red color layer (thickness 2.0 μm) was formed at a predetermined position with respect to the black matrix pattern using the photosensitive coating material for the red color layer.
And a red colored layer for a dummy pattern was laminated on the outside of the end of the colored layer forming region of each color. Further, using a photosensitive coating for the blue colored layer, a strip-shaped (width 80 μm)
m) blue colored layer (thickness: 2.0 μm) is formed, and a dummy pattern blue layer (thickness: 6.
0 μm) was formed.

(Red Colored Layer Photosensitive Paint) Dianthraquinonyl Red (Red-177) 1 part by weight Methyl methacrylate-methacrylic acid copolymer 8 parts by weight (methyl methacrylate: methacrylic acid = 2: 1) photoinitiator ... 1 part by weight (manufactured by Ciba Specialty Chemicals Co., Ltd. Irgacure 907) diglyme [Bis (2-methoxyethyl) Ether ] ... 90 parts by weight _{(CH 3 OCH 2 CH 2)} 2 O

(Photosensitive coating for green colored layer) Phthalocyanine green (Green-7) 1 part by weight Methyl methacrylate-methacrylic acid copolymer 8 parts by weight (methyl methacrylate: methacrylic acid = 2: 1) Photopolymerization initiator ... 1 part by weight (manufactured by Ciba Specialty Chemicals Co., Ltd. Irgacure 907) diglyme [Bis (2-methoxyethyl) Ether ] ... 90 parts by weight _{(CH 3 OCH 2 CH 2)} 2 O

(Photosensitive coating for blue colored layer) Phthalocyanine blue (α) (Blue-15: 1) 1 part by weight Methyl methacrylate-methacrylic acid copolymer 8 parts by weight (methyl methacrylate: methacrylic acid = 2: 1) photopolymerization initiator ... 1 part by weight (manufactured by Ciba Specialty Chemicals Corp. Irgacure 907) diglyme [Bis (2-methoxyethyl) Ether ] ... 90 parts by weight _{(CH 3 OCH 2 CH 2)} 2 O

Formation of Color Conversion Phosphor Layer Next, a blue conversion dummy layer coating liquid, a green conversion phosphor layer coating liquid, and a red conversion phosphor layer coating liquid having the following compositions were prepared. Next, a band-shaped pattern was printed on the blue colored layer by a screen printing method using the coating liquid for the blue conversion dummy layer, and baked (200 ° C., 60 minutes). As a result, a band-shaped (width 80 μm) blue conversion dummy layer (thickness 15 μm) was formed on the blue colored layer, and the dummy pattern was positioned outside the end of the formation region of this blue conversion dummy layer. .

Then, a band-shaped pattern was printed on the green colored layer by a screen printing method using the coating liquid for the green conversion phosphor layer, and baked (200 ° C., 60 minutes). As a result, a band-shaped (width 80 μm) green conversion phosphor layer (thickness 15 μm) is formed on the green colored layer, and the dummy pattern is located outside the end of the formation region of the green conversion phosphor layer. And Similarly, using the coating liquid for the red conversion phosphor layer, a strip-shaped (width 80 μm) was formed on the red colored layer.
m) red conversion phosphor layer (thickness: 15 μm) was formed, and the dummy pattern was positioned outside the end of the region where the red conversion phosphor layer was formed.

As described above, the color conversion phosphor layer including the blue conversion dummy layer, the green conversion phosphor layer and the red conversion phosphor layer was formed. (Coating liquid for blue conversion dummy layer) -Methyl methacrylate-methacrylic acid copolymer ... 50 parts by weight (methyl methacrylate: methacrylic acid = 2: 1) -Diglyme [Bis (2-methoxyethyl) Ether] ... 50 parts by weight (CH ₃ OCH ₂ CH ₂ ) ₂ O

(Coating liquid for green conversion phosphor layer) Basic Yellow 51 3 parts by weight Methyl methacrylate-methacrylic acid copolymer 47 parts by weight (methyl methacrylate: methacrylic acid = 2: 1) Diglyme [Bis ( 2-methoxyethyl) Ether] 50 parts by weight (CH ₃ OCH ₂ CH ₂ ) ₂ O

(Coating liquid for red color conversion phosphor layer) Rhodamine B 3 parts by weight Methyl methacrylate-methacrylic acid copolymer 47 parts by weight (methyl methacrylate: methacrylic acid = 2: 1) Diglyme [Bis (2 -methoxyethyl) Ether] ... 50 parts by weight _{(CH 3 OCH 2 CH 2)} 2 O

Formation of Transparent Protective Layer Then, a transparent protective layer coating solution having the following composition was used, and after coating on a transparent substrate by spin coating, baking (2
Was carried out at 00 ° C. for 60 minutes). As a result, a transparent protective layer (thickness 10 μm) was formed so as to cover the color conversion phosphor layer and the dummy pattern.

Next, a silicon oxide film (thickness: 0.2 μm) was formed on the transparent protective layer by the sputtering method. (Coating liquid for transparent protective layer) Methyl methacrylate-methacrylic acid copolymer 18 parts by weight (methyl methacrylate: methacrylic acid = 2: 1) Photoinitiator 2 parts by weight (Ciba Specialty Chemicals Co., Ltd.) Irgacure 907) ・ Diglyme [Bis (2-methoxyethyl) Ether] ... 80 parts by weight (CH ₃ OCH ₂ CH ₂ ) ₂ O

Formation of Auxiliary Electrode Next, an aluminum thin film (thickness: 0.2 μm) is formed on the entire surface of the transparent protective layer by a sputtering method, a photosensitive resist is applied on the aluminum thin film, mask exposure and development are performed. The aluminum thin film was etched to form an auxiliary electrode. This auxiliary electrode is a stripe-shaped pattern in which the dummy pattern is present on the color conversion phosphor layer from the transparent substrate, and the width of the black matrix is 15 μm on the color conversion phosphor layer. The width of the terminal portion at the peripheral portion of the transparent substrate located on the light shielding portion was 80 μm.

Formation of Transparent Electrode Layer Next, an indium tin oxide (ITO) electrode film having a film thickness of 200 nm is formed on the transparent protective layer by a sputtering method so as to cover the above-mentioned auxiliary electrode, and a photosensitive film is formed on the ITO electrode film. A resist was applied, mask exposure, development, and etching of the ITO electrode film were performed to form a transparent electrode layer.
The transparent electrode layer is a strip-shaped pattern having a width of 80 μm that rides from the transparent base material onto the color conversion phosphor layer at the location where the dummy pattern is present. It was located on each colored layer and overlapped with the auxiliary electrode. In the above-mentioned formation of the auxiliary electrode and the transparent electrode layer, since the step existing at the end position of the color conversion phosphor layer is mitigated by the dummy pattern, it is possible to form the auxiliary electrode or the transparent electrode layer on the transparent protective layer. No film formation failure and no disconnection due to stress during pattern etching.

Formation of Insulating Layer and Partition Section Next, an insulating layer coating material having the following composition was applied to the entire surface by a spin coating method so as to cover the transparent electrode layer and prebaked (100 ° C., 5 minutes). After that, exposure is performed by using a predetermined insulating layer photomask, and a developing solution (0.05
% KOH aqueous solution) and then post-baked (200 ° C., 60 minutes) to form an insulating layer (thickness 2 μm) on the transparent protective layer. This insulating layer has the same pattern as the black matrix, and is located on the light-shielding portion of the black matrix.

(Coating for Insulating Layer) Methyl methacrylate-methacrylic acid copolymer: 9 parts by weight (methyl methacrylate: methacrylic acid = 2: 1) Photoinitiator: 1 part by weight (Ciba Specialty Chemicals Co., Ltd. ) Irgacure 907) diglyme [Bis (2-methoxyethyl) Ether ] ... 90 parts by weight _{(CH 3 OCH 2 CH 2)} 2 O

Next, a partition wall coating material having the following composition was applied on the entire surface by spin coating so as to cover the insulating layer, and prebaked (100 ° C., 5 minutes). After that, exposure is performed using a predetermined photomask for partition walls, and a developing solution (0.05
% KOH aqueous solution) and then post-baked (200 ° C., 60 minutes) to form partition walls on the insulating layer. The partition wall had a shape having a height of 5 μm, a lower (insulating layer side) width of 15 μm, and an upper width of 20 μm.

(Paint for partition wall) Carbon black 0.1 part by weight Methyl methacrylate-methacrylic acid copolymer 17.9 parts by weight (methyl methacrylate: methacrylic acid = 2: 1) Photoinitiator ... 2 parts by weight (manufactured by Ciba Specialty Chemicals Co., Ltd. Irgacure 907) diglyme [Bis (2-methoxyethyl) Ether ] ... 80 parts by weight (CH ₃ OCH ₂ CH _{2) 2} O

Formation of Blue Organic EL Element Layer Next, a blue organic E consisting of a hole injection layer, a light emitting layer, and an electron injection layer is formed by a vacuum evaporation method using the partition wall as a mask.
The L element layer was formed. That is, first, 4, 4 ', 4 "
-Tris [N- (3-methylphenyl) -N-phenylamino] triphenylamine was evaporated to a thickness of 200 nm to form a film, and then 4,4'-bis [N- (1-naphthyl) -N- Phenylamino] biphenyl was vapor-deposited to a thickness of 20 nm to form a film, thereby forming a hole injection layer. Then, 4,4'-bis (2,2-diphenylvinyl) biphenyl was vapor-deposited to a thickness of 50 nm to form a film, thereby forming a light emitting layer. Then, tris (8-quinolinol) aluminum was vapor-deposited to a thickness of 20 nm to form an electron injection layer. Blue organic E formed in this way
The L element layer exists as a strip-shaped pattern having a width of 280 μm between the partition portions, and a dummy blue organic EL element layer was formed on the upper surface of the partition portion with the same layer configuration.

Formation of Back Electrode Layer Next, using the above partition wall as a mask, magnesium and silver are simultaneously vapor-deposited by a vacuum vapor deposition method (magnesium vapor deposition rate = 1.3 to 1.4 nm / sec, silver vapor deposition rate = 0.1n
m / sec) to form a back electrode layer (thickness: 200 nm) made of a magnesium / silver mixture. The back electrode layer thus formed was present on the blue organic EL element layer as a belt-shaped pattern having a width of 280 μm, and a dummy back electrode layer was also formed on the upper surface of the partition.

As described above, an organic EL image display device was obtained. By applying a voltage of 5.0 V DC to the transparent electrode layer and the back electrode layer of this organic EL image display device, the blue organic E at a desired portion where the transparent electrode layer and the back electrode layer intersect with each other.
The L element layer was made to emit light. Then, after the color conversion in the color conversion phosphor layer, or the light is transmitted as it is and the color is corrected in the color filter layer, the CIE chromaticity coordinates (JIS Z 870
1) was measured. As a result, x = 0.
64, y = 0.33 red emission, CIE chromaticity coordinate x =
Green emission of 0.30 and y = 0.60 and blue emission of x = 0.15 and y = 0.06 on CIE chromaticity coordinates were confirmed, and three-primary-color image display was possible.

[Comparative Example] A transparent electrode layer was formed in the same manner as in Example except that the dummy pattern formed by stacking the colored layers was not formed. However, at the stepped portion existing at the end portion of the color conversion phosphor layer, film formation failure occurs during the formation of the auxiliary electrode or the transparent electrode layer, and wire breakage occurs due to stress during pattern etching, etc. 204/55
It was 20. Then, in the same manner as in the example, the blue organic E
An L element layer and a back electrode layer were formed to obtain an organic EL image display device. A voltage was applied to this organic EL image display device in the same manner as in the example, and the image display quality was observed. However, a defective light emission due to the occurrence of the above disconnection was observed, and a good three-primary-color image display was not obtained.

[0078]

As described above in detail, according to the present invention, the dummy pattern reduces the step at the end portion of the color conversion phosphor layer, and is formed so as to cover the dummy pattern and the color conversion phosphor layer. The level difference generated in the transparent protective layer is small, and the strip-shaped transparent electrode layer formed on this transparent protective layer prevents the occurrence of wire breakage due to film formation failure during formation, stress during etching, etc. This allows
An organic electroluminescent image display device having high reliability and capable of displaying high-quality images can be manufactured with a good manufacturing yield.

[Brief description of drawings]

FIG. 1 is a partial plan view showing an embodiment of an organic electroluminescent image display device of the present invention.

FIG. 2 is a vertical sectional view taken along line II-II of the organic electroluminescent image display device shown in FIG.

FIG. 3 is a vertical sectional view taken along line III-III of the organic electroluminescent image display device shown in FIG.

FIG. 4 is a partial plan view showing a positional relationship between a dummy pattern and a color conversion phosphor layer in the organic electroluminescent image display device of the present invention.

FIG. 5 is a partial plan view showing a positional relationship between a dummy pattern and a transparent electrode layer in the organic electroluminescent image display device of the present invention.

FIG. 6 is a diagram illustrating the method of manufacturing the organic electroluminescent image display device of the present invention, and is a partial plan view showing the positional relationship between the black matrix and the color filter layer.

FIG. 7 is a diagram for explaining the method for manufacturing the organic electroluminescent image display device of the present invention, which is a partial cross-sectional view showing the relationship between the colored layer of each color and the layer structure of the dummy pattern.

[Explanation of symbols] 1. Organic electroluminescent image display device 2 ... Transparent base material 3 ... Black matrix 4 ... Color filter layer 4R, 4G, 4B ... Colored layer 5 ... Color conversion phosphor layer 5a ... Edge of color conversion phosphor layer 5R ... Red conversion phosphor layer 5G ... Green conversion phosphor layer 5B ... Blue conversion dummy layer 6 ... Dummy pattern 6R, 6G, 6B ... Colored layer 7 ... Transparent protective layer 8 ... Auxiliary electrode 9 ... Transparent electrode layer 10 ... Organic electroluminescence element layer 11 ... Back electrode layer 13 ... Insulating layer 15 ... Partition wall B: Area where color filter layer is formed B '... Edge of color filter layer forming region

   ─────────────────────────────────────────────────── ─── Continued front page    (72) Inventor Koji Arai             1-1-1, Ichigaya-Kagacho, Shinjuku-ku, Tokyo             Dai Nippon Printing Co., Ltd. F term (reference) 3K007 AB04 AB08 AB11 AB18 BB06                       DB03 FA01

Claims (6)

[Claims] 1. A transparent substrate, a color filter layer, a color conversion phosphor layer, a transparent protective layer, which are sequentially provided on the transparent substrate,
A transparent electrode layer, an organic electroluminescence element layer, and, and at least a back electrode layer, having a dummy pattern in which a plurality of colored layers are laminated at a predetermined portion outside the end of the color conversion phosphor layer, The transparent protective layer is provided on the transparent base material so as to cover the color conversion phosphor layer and the dummy pattern, and the transparent electrode layer is colored from the transparent base material at a portion where the dummy pattern is provided. An organic electroluminescent image display device, which is arranged on the transparent protective layer in a strip shape so as to ride on the conversion phosphor layer. 2. The thickness of the color conversion phosphor layer is 2 to 15 μm.
2. The organic electroluminescent device according to claim 1, wherein the thickness of the dummy pattern is within a range of 1/10 to 1/1 of the thickness of the color conversion phosphor layer. Image display device. 3. The organic electroluminescent image display device according to claim 1, wherein the dummy pattern is in contact with the tip of the band-shaped color conversion phosphor layer. 4. The organic electroluminescent device according to claim 1, further comprising a black matrix having a predetermined opening pattern between the transparent substrate and the color filter. Cent image display device. 5. The organic electroluminescence element layer emits blue light, and the color conversion phosphor layer converts a blue light into a green fluorescence to emit light, and a blue conversion light into a red fluorescence to emit light. The organic electroluminescent image display device according to any one of claims 1 to 4, further comprising a red color conversion layer. 6. A color filter layer is formed by forming colored layers of a plurality of colors on a transparent substrate for each color to form a color filter layer, and the colored layer is provided at a predetermined portion outside an end portion of the band-shaped formation region of the color filter layer of each color. A step of forming a dummy pattern by laminating, a color conversion phosphor layer is formed on the color filter layer, and a transparent protective layer is formed on the transparent substrate so as to cover the color conversion phosphor layer and the dummy pattern. A step of forming, a step of forming a transparent electrode layer in a strip shape so as to ride on the color conversion phosphor layer from the transparent base material at a portion where the dummy pattern is arranged, an organic layer which intersects with the transparent electrode layer Forming a back electrode layer on the organic electroluminescent element layer and forming the electroluminescent element layer in a strip shape, and an organic electroluminescent image display device characterized by the above-mentioned. Manufacturing method.