JP2003228160A5 - - Google Patents
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- JP2003228160A5 JP2003228160A5 JP2002029084A JP2002029084A JP2003228160A5 JP 2003228160 A5 JP2003228160 A5 JP 2003228160A5 JP 2002029084 A JP2002029084 A JP 2002029084A JP 2002029084 A JP2002029084 A JP 2002029084A JP 2003228160 A5 JP2003228160 A5 JP 2003228160A5
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002029084A JP4027108B2 (ja) | 2002-02-06 | 2002-02-06 | フォトマスク |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002029084A JP4027108B2 (ja) | 2002-02-06 | 2002-02-06 | フォトマスク |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003228160A JP2003228160A (ja) | 2003-08-15 |
| JP2003228160A5 true JP2003228160A5 (enExample) | 2005-08-11 |
| JP4027108B2 JP4027108B2 (ja) | 2007-12-26 |
Family
ID=27750016
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002029084A Expired - Fee Related JP4027108B2 (ja) | 2002-02-06 | 2002-02-06 | フォトマスク |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4027108B2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100345008C (zh) * | 2005-06-29 | 2007-10-24 | 浙江工业大学 | 一种超分辨微结构衍射光学元件的制作方法 |
| JP4967616B2 (ja) * | 2006-11-17 | 2012-07-04 | 凸版印刷株式会社 | 多段階段状素子並びにモールドの製造方法 |
| JP5008479B2 (ja) * | 2007-06-28 | 2012-08-22 | ラピスセミコンダクタ株式会社 | レジストパターンの形成方法及びフォトマスク |
| CN107643557A (zh) * | 2016-07-21 | 2018-01-30 | 擎中科技（上海）有限公司 | 一种光栅结构、立体显示装置及光栅结构的制作方法 |
| CN111856636B (zh) * | 2020-07-03 | 2021-10-22 | 中国科学技术大学 | 一种变间距光栅掩模线密度分布可控微调方法 |
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2002
- 2002-02-06 JP JP2002029084A patent/JP4027108B2/ja not_active Expired - Fee Related