JP2003222905A - Method for manufacturing liquid crystal display device and repairing method therefor - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid crystal display device allowed to repair a disconnected place when a gate line or a source line is disconnected and a repairing method therefor. <P>SOLUTION: When the gate line 102 (or the source line 107) is disconnected, laser light is irradiated at the opposite ends of a disconnected portion 110 from the upper surface or the rear of a glass substrate. A conductive line 104 formed between the gate line 102 and the source line 107 conducts to the gate line 102 (or the source line 107) through a laser-irradiated place 111 to repair the disconnected portion. As a result, a line defect caused by the disconnection is avoided. <P>COPYRIGHT: (C)2003,JPO

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a liquid crystal display device in which the disconnection can be easily repaired even when the gate line or the source line of the liquid crystal body is broken in the array forming process of the liquid crystal display device. And a method for repairing the same.

[0002]

2. Description of the Related Art In recent years, the popularity of personal computers has rapidly increased due to the price reduction of personal computers. In addition, monitors are shifting from CRT monitors, which have been the mainstream in the past, to liquid crystal monitors. In order to accelerate the spread of LCD monitors, it is necessary to provide high-quality products at lower prices. For that purpose, yield improvement is essential.

A conventional method of manufacturing a liquid crystal display device will be described below.

FIG. 3 is a sectional view showing a method of manufacturing the conventional liquid crystal display device. In FIG. 3, 201 is a glass substrate, 202 is a gate line, 203 is an interlayer insulating film A,
Reference numeral 204 is a semiconductor layer, 205 is a source pattern, 206 is an interlayer insulating film B, and 207 is a transparent electrode.

When manufacturing the liquid crystal display device having the above structure,
First, a metal material is formed on the glass substrate 201 by a sputtering method, and then a photoresist is applied thereon. A resist pattern serving as a mold for forming the gate line is formed by photolithography, and the gate line 202 is formed by dry etching using the resist pattern as a mold. After that, on the gate line 202,
An interlayer insulating film A203 is formed. A silicon nitride film is used as the interlayer insulating film A203. Further, a semiconductor layer 204 is formed on the interlayer insulating film A203, and a source pattern 205 such as a source line / source electrode / drain electrode is formed thereon. Similarly to the gate line 202, the source pattern 205 is also formed by forming a metal material by a sputtering method and then applying a photoresist thereon. A resist pattern serving as a mold for forming the source pattern is formed by photolithography, and the resist pattern is formed as a mold by dry etching. Finally, the interlayer insulating film B206 is formed on the source pattern 205, and the transparent electrode 207 is formed on the interlayer insulating film B206.

[0006]

However, in the structure of the above-mentioned conventional example, if the gate line or the source line is broken during the array forming process, it cannot be repaired, so that a line defect occurs when the screen is turned on. However, there is a problem that the chip becomes defective.

In order to solve the above-mentioned conventional problems, the present invention provides a method of manufacturing a liquid crystal display device capable of repairing a broken line when a gate line or a source line is broken, and a repairing method thereof. The purpose is to provide.

[0008]

To achieve this object, a method of manufacturing a liquid crystal display device according to the present invention comprises a step of forming a gate line on a glass substrate in an array forming step of the liquid crystal display device, A step of forming a first interlayer insulating film on the gate line, and on the first interlayer insulating film,
Forming a conductive line directly above the gate line and between the gate lines in a direction orthogonal to the gate line; forming a second interlayer insulating film on the conductive line; A step of forming a semiconductor layer on the interlayer insulating film, and a step of forming a source line, a source electrode, and a drain electrode on the semiconductor layer directly above the conductive line formed in a direction orthogonal to the gate line. A step of forming a third interlayer insulating film on the source line, a step of forming a contact hole in the third interlayer insulating film for connecting the drain electrode and a pixel, and the third interlayer insulating film. A step of forming a transparent conductive film on the pixel portion of the insulating film.

In the method of manufacturing a liquid crystal display device according to the present invention, when the gate line or the source line is broken during the formation process, laser light is irradiated from the upper surface or the back surface of the glass substrate to both ends of the broken portion. By
The gate line or the source line can be electrically connected to the conductive line formed between the gate line and the source line to repair the disconnection portion. This makes it possible to avoid a line defect caused by the disconnection.

Further, according to the present invention, in the array forming process of the liquid crystal display device, the gate line or the source line is
When the wire is broken in the process of forming the gate line or the source line, by irradiating the both ends of the broken part from the upper surface or the back surface of the glass substrate,
A repairing method for repairing a disconnection portion by electrically connecting a conductive line formed between the gate line and the source line. Thereby, the line defect caused by the disconnection can be easily repaired.

[0011]

BEST MODE FOR CARRYING OUT THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

(First Embodiment) FIG. 1 is a sectional view of a liquid crystal display device showing a first embodiment of the present invention. In FIG. 1, 101 is a glass substrate, 102 is a gate line,
103 is an interlayer insulating film a, 104 is a conductive line, 105
Is an interlayer insulating film b, 106 is a semiconductor layer, 107 is a source pattern, 108 is an interlayer insulating film c, and 109 is a transparent electrode. Further, FIG. 2 shows a plan view which is the first embodiment of the present invention.

When manufacturing the liquid crystal display device of the present invention, first, a metal material is formed on the glass substrate 101 by a sputtering method, and then a photoresist is applied thereon. A resist pattern serving as a mold for forming the gate line is formed by photolithography, and the gate line 1 is formed by dry etching using the resist pattern as a mold.
02 is formed.

After that, an interlayer insulating film a103 is formed on the gate line 102. A silicon nitride film is used as the interlayer insulating film a103.

Further, after depositing a metal material on the interlayer insulating film a103 by a sputtering method, a photoresist is applied. A resist pattern serving as a mold for forming a conductive line is formed by photolithography, and the conductive line 104 is formed by a dry etching method using the resist pattern as a mold. Here, the conductive line 10
4 is formed immediately above the gate line and between adjacent gate lines in a direction orthogonal to the gate line.

Further, an interlayer insulating film b105 is formed on the conductive line 104, and a semiconductor layer 106 is formed on the interlayer insulating film b105.

On the semiconductor layer 106, a source line
The source pattern 107 of the source electrode / drain electrode is formed. The source pattern 107 is also the gate line 102.
Similarly to the above, a metal material is formed by a sputtering method, and then a photoresist is applied thereon. A resist pattern serving as a mold for forming a source pattern is formed by a photolithography method, and the resist pattern is used as a mold by a dry etching method. Here, the source line is formed immediately above the conductive line 104.

Further, an interlayer insulating film c108 is formed on the source pattern 107, and this interlayer insulating film c108 is
A contact hole for connecting the drain electrode and the pixel is formed.

Finally, a transparent electrode 109 is formed on the interlayer insulating film c108.

In this embodiment, the materials and methods used in the conventional method for manufacturing a liquid crystal display device are
It can be used as appropriate.

(Second Embodiment) FIG. 4 is a plan view showing a second embodiment of the present invention. In FIG. 4, 110
Indicates a disconnection portion, and 111 indicates a laser irradiation portion.

When the source line 107 (or the gate line 102) is broken, laser light is applied to both ends of the broken portion 110 from the upper surface or the back surface of the glass substrate. As a result, the gate line 102 and the source line 1
The disconnection is repaired by electrically connecting the conductive line 104 and the gate line 102 (or the source line 107) formed between 07 through the laser irradiation portion 111.

[0023]

As described above, according to the manufacturing method of the present invention, when the gate line or the source line is broken, the gate electrode is irradiated with laser light from the upper surface or the back surface of the glass substrate to both ends of the broken portion. It is possible to provide an excellent liquid crystal display device capable of repairing a disconnection portion by electrically connecting a conductive line formed between a line and a source line to a gate line or a source line. Further, the present invention can realize an excellent repair method.

[Brief description of drawings]

FIG. 1 is a sectional view of a liquid crystal display device according to a first embodiment of the present invention.

FIG. 2 is a plan view of the liquid crystal display device according to the first embodiment of the present invention.

FIG. 3 is a cross-sectional view of a conventional liquid crystal display device.

FIG. 4 is a plan view showing a repairing method according to a second embodiment of the present invention.

[Explanation of symbols]

101 glass substrate 102 gate line 103 interlayer insulating film a 104 conductive line 105 interlayer insulating film b 106 semiconductor layer 107 Source pattern 108 interlayer insulating film c 109 transparent electrode 110 disconnection 111 Laser irradiation point 201 glass substrate 202 gate line 203 Interlayer insulating film A 204 semiconductor layer 205 source pattern 206 Interlayer insulation film B 207 transparent electrode

Continued front page    F-term (reference) 2H092 JA24 JA37 JA41 JB22 JB31                       JB73 MA52 NA15 NA29                 5F033 GG04 HH00 PP15 VV01 VV15                       XX36                 5F110 AA27 BB01 CC07 DD02 EE02                       EE44 HL02 HL23 NN02 NN24                       NN72

Claims (3)

[Claims] 1. A step of forming a gate line on a glass substrate, a step of forming a first interlayer insulating film on the gate line, and a step of forming the first interlayer insulating film in an array forming step of a liquid crystal display device. Forming a conductive line directly above the gate line and between the gate lines in a direction orthogonal to the gate line; forming a second interlayer insulating film on the conductive line; A step of forming a semiconductor layer on the second interlayer insulating film, and a source line, a source electrode, and a drain electrode directly above the conductive line formed on the semiconductor layer in a direction orthogonal to the gate line. A step of forming, a step of forming a third interlayer insulating film on the source line, and a contact hole for connecting the drain electrode and the pixel to the third interlayer insulating film. Method of manufacturing a liquid crystal display device for forming, forming a transparent conductive film on the pixel portion of the said third interlayer insulating film, characterized in that it has a. 2. When the gate line or the source line according to claim 1 is broken in the process of forming the gate line or the source line, the both ends of the broken portion are irradiated with laser light from the upper surface or the back surface of the glass substrate, A method for manufacturing a liquid crystal display device, comprising: connecting a gate line or a source line to a conductive line formed between the gate line and the source line to repair a disconnection portion. 3. In the process of forming an array of a liquid crystal display device, if the gate line or the source line is broken during the process of forming the array, laser light is irradiated from the upper surface or the back surface of the glass substrate to both ends of the broken portion. Due to
A method of repairing, characterized in that the gate line or the source line is electrically connected to a conductive line formed between the gate line and the source line to repair the disconnection portion.